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JPH0134277Y2 - - Google Patents
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JPH0134277Y2 - - Google Patents

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Publication number
JPH0134277Y2
JPH0134277Y2 JP4703582U JP4703582U JPH0134277Y2 JP H0134277 Y2 JPH0134277 Y2 JP H0134277Y2 JP 4703582 U JP4703582 U JP 4703582U JP 4703582 U JP4703582 U JP 4703582U JP H0134277 Y2 JPH0134277 Y2 JP H0134277Y2
Authority
JP
Japan
Prior art keywords
anode
sample
ray
rays
ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4703582U
Other languages
Japanese (ja)
Other versions
JPS58150260U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4703582U priority Critical patent/JPS58150260U/en
Publication of JPS58150260U publication Critical patent/JPS58150260U/en
Application granted granted Critical
Publication of JPH0134277Y2 publication Critical patent/JPH0134277Y2/ja
Granted legal-status Critical Current

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Description

【考案の詳細な説明】 本考案はX線光電子分光分析装置におけるX線
源装置に関する。
[Detailed Description of the Invention] The present invention relates to an X-ray source device in an X-ray photoelectron spectrometer.

X線光電子分光分析は試料の表面分析法の一つ
であるが、試料面を電子線で照射して試料から放
射される2次電子とかX線を検出する方法が試料
面の極めて浅い部分の分析を行うものであるのに
対し、数百オングストローム程度の深さまでの分
析ができる所に特徴があり、しかも試料面から深
さ方向に分析を行うのに試料面をイオン衝撃等の
手段で削除しながら表面分析を行つて行く方法と
異り、完全に非破壊的な分析法である所にもう一
つの特徴がある。
X-ray photoelectron spectroscopy is a method for analyzing the surface of a sample, but it is a method that irradiates the sample surface with an electron beam and detects secondary electrons or X-rays emitted from the sample. Although it is a device that performs analysis, it is unique in that it can perform analysis to a depth of several hundred angstroms, and in order to perform analysis from the sample surface in the depth direction, the sample surface is removed by means such as ion bombardment. Another feature of this method is that it is a completely non-destructive analysis method, unlike methods that perform surface analysis.

X線光電子分光分析で分析できる深さは使用す
るX線(種々な元素の特性X線を使う)のエネル
ギーが高い程大となるが、反面特性X線のスペク
トル幅は一般に高エネルギーのもの程大であり、
それに応じてX線光電子のスペクトルのピーク幅
を広くなる。即ち試料を励起するX線のエネルギ
ーが大である程X線光電子分光の分解能が低くな
る。従つて試料励起用X線のエネルギーは分析し
ようとする深さに応じてその深さまで分析できる
範囲で最低エネルギーの特性X線を選択するのが
望ましい。このため従来のX線光電子分光分析で
は分析目的に応じてX線源を取換えるようにして
いた。しかしX線光電子分光分析装置でX線源を
取換えると云うのは大変面倒であり、一つの試料
を表面の浅い所から深い所まで可及的に高分解能
で分析するために、一つの試料に対してX線源を
順次交換して分析を行うと云つた方法は操作とし
て甚だしく面倒な上非常に長時間を要することに
なつて、特別な場合以外には実行は困難である。
The depth that can be analyzed with X-ray photoelectron spectroscopy increases as the energy of the X-rays used (characteristic X-rays of various elements are used) increases; however, on the other hand, the spectral width of characteristic X-rays generally increases as the energy increases. large,
Correspondingly, the peak width of the spectrum of X-ray photoelectrons becomes wider. That is, the higher the energy of the X-rays that excite the sample, the lower the resolution of X-ray photoelectron spectroscopy. Therefore, as for the energy of the sample excitation X-ray, it is desirable to select a characteristic X-ray with the lowest energy within the range that allows analysis to be performed to that depth, depending on the depth to be analyzed. For this reason, in conventional X-ray photoelectron spectroscopy, the X-ray source has to be replaced depending on the purpose of analysis. However, it is very troublesome to replace the X-ray source in an X-ray photoelectron spectrometer. However, the method of performing analysis by sequentially replacing the X-ray source is extremely troublesome and takes a very long time, and is difficult to implement except in special cases.

本考案は上述したような状況に鑑み、X線光電
子分光分析装置で、単に電気的な切換え操作だけ
で複数種のX線源の任意の一つを選択して分析を
行い得るようにすることを目的としてなされたも
ので、試料を取巻いて複数種のX線源を配列し、
アノードの形状を試料のX線照射に最適な形状と
したX線源装置を提供するものである。以下実施
例によつて本考案を説明する。
In view of the above-mentioned circumstances, the present invention aims to enable an X-ray photoelectron spectrometer to select any one of multiple types of X-ray sources for analysis simply by electrical switching operations. It was developed for the purpose of arranging multiple types of X-ray sources around the sample.
The present invention provides an X-ray source device in which the shape of the anode is optimal for X-ray irradiation of a sample. The present invention will be explained below with reference to Examples.

第1図は本考案の一実施例を示す。A1,A3
はアノードで第2図に示すようにアノードA2,
A4と共に一個の円環を構成するように配列され
ている。各アノードは円環状に曲成された角形管
の冷却ブロツクBに取付けられており、同ブロツ
クBには冷却水が流してある。各アノードA1〜
A4は夫々材質が異つている。Wはウエネルト電
極でアノードA1〜A4の下方にあつて、アノー
ドA1〜A4が構成している円環と平行同軸の環
状板であり、このウエネルト電極の下方にフイラ
メントFがアノードの構成している円環と平行同
軸の環状に配置されている。Sは試料であつてア
ノードA1〜A4が形成している環の中心位置稍
下寄りにセツトされる。アノードA1〜A4の各
内側面はその中心に立てた垂線が試料Sの中心位
置に向うように面の傾斜が決められ、かつアノー
ドが作る円環の中心軸に対して回転対称的な形状
である。換言すれば各アノードの内側面はアノー
ドが作る円環の中心軸を軸とする凹円錐状面の一
部をなしている。フイラメントFは第3図に示す
ように円環状であり、アノードA1〜A4の隣同
士のアノード間の境界に対応する位置に端子L1
〜L4が熔接してある。この構成で例えば端子L
1,L2間に電源を接続すると、電流は主として
フイラメントのF1部分に流れてF1を点灯す
る。このときフイラメントF4,F3,F2と流
れる電流もあるが、この部分の抵抗はF1部分の
3倍であり、従つて電流は1/3でフイラメントを
赤熱するのに足りないからこの部分からの熱電子
放出はなされない。第4図はフイラメントF1〜
F4の選択切換え回路を示し、SWは2極切換え
スイツチである。
FIG. 1 shows an embodiment of the present invention. A1, A3
is an anode and as shown in Fig. 2, anode A2,
They are arranged to form a circular ring together with A4. Each anode is attached to a cooling block B, which is a rectangular tube bent into an annular shape, and cooling water flows through the cooling block B. Each anode A1~
A4 sheets are made of different materials. W is a Wehnelt electrode that is located below the anodes A1 to A4 and is an annular plate that is parallel and coaxial with the annular ring that the anodes A1 to A4 make up, and below this Wehnelt electrode is a filament F that makes up the anode. It is arranged in an annular shape parallel to and coaxial with the torus. S is a sample and is set slightly below the center position of the ring formed by the anodes A1 to A4. Each of the inner surfaces of the anodes A1 to A4 has a slope determined so that a perpendicular line erected at its center points toward the center position of the sample S, and is rotationally symmetrical with respect to the central axis of the ring formed by the anodes. be. In other words, the inner surface of each anode forms part of a concave conical surface whose axis is the central axis of the ring formed by the anode. The filament F has an annular shape as shown in FIG. 3, and has a terminal L1 at a position corresponding to the boundary between adjacent anodes A1 to A4.
~L4 is welded. With this configuration, for example, terminal L
When a power source is connected between F1 and L2, current mainly flows through the F1 portion of the filament, lighting F1. At this time, some current flows through filaments F4, F3, and F2, but the resistance of this part is three times that of F1, so the current is 1/3, which is not enough to make the filament red-hot, so the heat from this part is No electrons are emitted. Figure 4 shows filament F1~
The selection switching circuit of F4 is shown, and SW is a two-pole selection switch.

第1図に戻つて、試料Sの周囲には筒Pが立て
られ、この筒にはX線透過窓Vが設けられてい
る。各窓には厚さ2μ程度のアルミ箔が張つてあ
る。筒Pの内外共真空であるが、X線源と試料と
の間を窓Vで距てるのはフイラメントFから放出
された電子の一部が試料Sに当つて散乱されたり
2次電子を放出させたりしてX線光電子検出時の
バツクグラウンドを高めるのを防ぐためである。
Returning to FIG. 1, a cylinder P is erected around the sample S, and an X-ray transparent window V is provided in this cylinder. Each window is covered with aluminum foil approximately 2μ thick. Both the inside and outside of the tube P are vacuum, but the reason why there is a window V separating the X-ray source and the sample is to prevent some of the electrons emitted from the filament F from hitting the sample S and being scattered or emitting secondary electrons. This is to prevent background from increasing during X-ray photoelectron detection.

前述した所によつて例えばフイラメントF1に
通電すると、F1から放出された熱電子はアノー
ドA1に当つてA1からX線を放出させる。A1
から放出されたX線は窓Vを通して試料Sを照射
する。アノードA1〜A4は電気的には一体で同
時に高電圧が印加されている。フイラメントF1
〜F4の何れかを選択して通電することにより対
応するアノードからX線を発射させることができ
る。
For example, when the filament F1 is energized as described above, thermionic electrons emitted from F1 hit the anode A1 and cause A1 to emit X-rays. A1
The X-rays emitted from the window irradiate the sample S through the window V. The anodes A1 to A4 are electrically integrated and a high voltage is simultaneously applied to them. Filament F1
By selecting any one of F4 and energizing it, X-rays can be emitted from the corresponding anode.

アノードを電子線で照射したときアノードから
は連続X線と特性X線とが放射されるが、連続X
線が全ての方向に略均一か或は斜方向に稍強く放
射されるのに対して特性X線はアノード面の垂線
からの傾き角の余弦に略比例した強度で放射され
るので、アノード面の垂線方向において強い性質
がある。X線光電子分光では試料を励起するX線
はエネルギーが既知の一定値であることが必要な
ので、特性X線が用いられる。本考案ではアノー
ド面は試料に向う凹円錐面状となつているから特
性X線は試料上に集中する傾向を示し、X線照射
効率が高い。
When an anode is irradiated with an electron beam, continuous X-rays and characteristic X-rays are emitted from the anode.
Whereas characteristic X-rays are emitted almost uniformly in all directions or slightly strongly in oblique directions, characteristic It has a strong property in the perpendicular direction. In X-ray photoelectron spectroscopy, characteristic X-rays are used because the X-rays that excite the sample must have a known and constant energy. In the present invention, since the anode surface has a concave conical shape facing the sample, characteristic X-rays tend to concentrate on the sample, resulting in high X-ray irradiation efficiency.

本考案X線源装置は上述したような構成で、複
数のX線源が試料を取巻いて円環状に配置され、
何れのX線源のフイラメントに通電するかでX線
源を選択しているので、X線源を一々取扱えるの
に比し、X線源を換えて分析を行う操作が非常に
簡単となり、アノード面が試料に向う凹円錐状面
なので、前述したように試料のX線照射効率が高
く高感度の分析が可能となる。
The X-ray source device of the present invention has the above-described configuration, in which a plurality of X-ray sources are arranged in an annular shape surrounding the sample,
Since the X-ray source is selected based on which X-ray source's filament is energized, it is much easier to change the X-ray source and perform analysis, compared to handling each X-ray source one by one. Since the anode surface is a concave conical surface facing the sample, as described above, the X-ray irradiation efficiency of the sample is high and highly sensitive analysis is possible.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案の一実施例を示し、第1図は縦断
面図、第2図は平面図、第3図は底面図、第4図
はフイラメント通電切換回路の回路図である。 A1〜A4……アノード、W……エーネルト電
極、F,F1〜F4……フイラメント、S……試
料、B……冷却ブロツク、P……筒、V……X線
透過窓、SW……フイラメント切換え用スイツ
チ。
The drawings show an embodiment of the present invention; FIG. 1 is a longitudinal sectional view, FIG. 2 is a plan view, FIG. 3 is a bottom view, and FIG. 4 is a circuit diagram of a filament energization switching circuit. A1-A4...Anode, W...Ehnert electrode, F, F1-F4...Filament, S...Sample, B...Cooling block, P...Cylinder, V...X-ray transmission window, SW...Filament Changeover switch.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 材質の異る複数個のアノードを円環状に配置
し、これらのアノードによつて構成される円環の
内面が同円環の中心に立てた垂線を軸とする円錐
面状となるように各アノードの内面の形を凹円錐
状面の一部とし、アノードが作る上記円環と平行
な面で同円環と同軸的に環状にフイラメントを配
置し、上記各アノードに対応する部分毎にフイラ
メント加熱電流を流し得るようにし、上記アノー
ドが作る円環の中心位置に試料をセツトする場所
を設けたX線源装置。
A plurality of anodes made of different materials are arranged in a ring shape, and each anode is arranged so that the inner surface of the ring formed by these anodes forms a conical surface whose axis is a perpendicular line erected at the center of the ring. The inner surface of the anode is a part of a concave conical surface, and filaments are arranged in an annular manner coaxially with the annular ring on a plane parallel to the annular ring formed by the anode. An X-ray source device that allows a heating current to flow and has a place for setting a sample at the center of a ring formed by the anode.
JP4703582U 1982-03-31 1982-03-31 X-ray source device Granted JPS58150260U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4703582U JPS58150260U (en) 1982-03-31 1982-03-31 X-ray source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4703582U JPS58150260U (en) 1982-03-31 1982-03-31 X-ray source device

Publications (2)

Publication Number Publication Date
JPS58150260U JPS58150260U (en) 1983-10-08
JPH0134277Y2 true JPH0134277Y2 (en) 1989-10-18

Family

ID=30058010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4703582U Granted JPS58150260U (en) 1982-03-31 1982-03-31 X-ray source device

Country Status (1)

Country Link
JP (1) JPS58150260U (en)

Also Published As

Publication number Publication date
JPS58150260U (en) 1983-10-08

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