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JPH0135509B2 - - Google Patents
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JPH0135509B2 - - Google Patents

Info

Publication number
JPH0135509B2
JPH0135509B2 JP58177634A JP17763483A JPH0135509B2 JP H0135509 B2 JPH0135509 B2 JP H0135509B2 JP 58177634 A JP58177634 A JP 58177634A JP 17763483 A JP17763483 A JP 17763483A JP H0135509 B2 JPH0135509 B2 JP H0135509B2
Authority
JP
Japan
Prior art keywords
electron beam
laser
region
current
laser tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58177634A
Other languages
Japanese (ja)
Other versions
JPS6070787A (en
Inventor
Tamio Hara
Manabu Hamagaki
Yoshiro Sadamoto
Toshihiko Tsuchide
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP17763483A priority Critical patent/JPS6070787A/en
Publication of JPS6070787A publication Critical patent/JPS6070787A/en
Publication of JPH0135509B2 publication Critical patent/JPH0135509B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09707Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using an electron or ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Lasers (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)

Description

【発明の詳細な説明】 本発明はレーザー発振装置に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a laser oscillation device.

イオンレーザーの発振には多くの場合放電励起
法が用いられた。しかし、放電励起方式では生成
される電子の大部分は低エネルギー領域にあり、
イオンを励起できる高エネルギー電子はほんの一
部だけである。高エネルギー電子を増大させるに
は大電流放電としなければならないが、それでは
イオンを励起できない不要の低エネルギー電子も
増大しさせることゝなり、結局イオンを励起する
ための放電の利用効率は著しく低くなる。又、電
流密度を高くし、そして高エネルギー電子の比率
を高くするには細いレーザー管を使用しなければ
ならない。しかし、それではレーザーの出力は大
きくすることはできない。レーザーの出力を高め
効率よく発生させるには、レーザー媒質を励起で
きる高エネルギー電子を外部から入射させる、電
子ビーム励起法が有望と考えられている。しかし
従来の電子ビーム励起レーザー装置では、陰極の
前面に負のポテンシヤルバリヤができ、陰極表面
から引き出されこのバリヤを越えた電子が加速さ
れるようになる(空間電荷制御)。ビーム電流を
増加するには加速電圧を高くすればよいが、それ
ではビーム電流の増大と電子の運動エネルギーの
増大との双方が同時に行なわれ、これらの独立し
て制御することはできない。ビーム電流も2〜
3KVの加速電圧の時でさえ1A程度であり、これ
より大巾に増加させることは困難であつた。
In many cases, discharge excitation was used to generate ion lasers. However, in the discharge excitation method, most of the electrons generated are in the low energy region,
Only a small number of high-energy electrons can excite ions. In order to increase the number of high-energy electrons, it is necessary to use a large current discharge, but this also increases the number of unnecessary low-energy electrons that cannot excite ions, and the efficiency of using the discharge to excite ions becomes extremely low. . Also, narrow laser tubes must be used to increase the current density and the proportion of high-energy electrons. However, it is not possible to increase the output of the laser. Electron beam excitation, which involves externally injecting high-energy electrons that can excite a laser medium, is considered to be a promising method for increasing laser output and generating it efficiently. However, in conventional electron beam excitation laser devices, a negative potential barrier is created in front of the cathode, and electrons that are extracted from the cathode surface and cross this barrier are accelerated (space charge control). The beam current can be increased by increasing the accelerating voltage, but this increases both the beam current and the kinetic energy of the electrons at the same time, and these cannot be controlled independently. Beam current is also 2~
Even at an accelerating voltage of 3KV, it was only about 1A, and it was difficult to increase it much more than this.

電子ビーム励起レーザーの研究は主として金属
蒸気レーザーを中心として行なわれてきた。これ
らの研究結果から電子ビームの入力電力を増加さ
せれば、まだレーザー出力の増加が期待できる。
しかし、電子ビームの加速電圧を高くしすぎると
レーザー媒質を充分に励起することなく透過して
しまうので、加速電圧を大きくしてビーム電流を
大きくするのではなく、加速電圧と電子ビーム電
流とが独立に制御でき、それによつてレーザー媒
質を充分に励起できるエネルギーの大電流電子ビ
ームを発生することがレーザー出力の増大という
課題に対する最も有利な解決である。
Research on electron beam pumped lasers has mainly focused on metal vapor lasers. Based on these research results, we can expect to increase the laser output by increasing the input power of the electron beam.
However, if the accelerating voltage of the electron beam is made too high, the laser medium will be transmitted through the laser medium without being sufficiently excited, so instead of increasing the accelerating voltage and increasing the beam current, The most advantageous solution to the problem of increasing laser power is to generate a high current electron beam that can be controlled independently and thereby has sufficient energy to excite the laser medium.

本発明の目的は、レーザー発振効率が高く、か
つレーザー出力が大きいレーザー装置を提供する
ことである。
An object of the present invention is to provide a laser device with high laser oscillation efficiency and large laser output.

この目的は空間電荷制限を排除して放電でつく
つたプラズマ(プラズマ陰極)から引出した電子
流を加速しレーザー媒質に衝突させてこれを励起
することにより達成する。
This objective is achieved by eliminating the space charge limitation and accelerating the electron flow extracted from the plasma (plasma cathode) created by the discharge and impinging on the laser medium to excite it.

プラズマ陰極は放電電流に比例して電子流が引
き出せるが、プラズマ陰極から加速して電子ビー
ムを真空中へ引き出す時空間電荷制限を受けるの
でこのままでは大きなビーム電流は得られない。
空間電荷制限を解消するため加速領域に中性気体
を導入して、その電離によつて生じた正イオンを
加速電界の下で陰極に向け移動させ空間電荷を中
和させて消減させようとしたが、加速領域で放電
が起き易く、安定な電子ビームは得られなかつ
た。
A plasma cathode can draw an electron current in proportion to the discharge current, but a large beam current cannot be obtained as it is because it is subject to space-time charge limitations that accelerate the electron beam from the plasma cathode and draw it into the vacuum.
In order to eliminate the space charge limitation, a neutral gas was introduced into the acceleration region, and the positive ions generated by the ionization were moved toward the cathode under the accelerating electric field to neutralize and eliminate the space charge. However, discharge easily occurs in the acceleration region, making it impossible to obtain a stable electron beam.

本発明では、加速領域の下流側の別の領域に中
性気体を導入し、加速された電子ビームによりそ
の領域で中性気体を電離し、生じた正イオンを加
速領域を通して逆流させ空間電荷を中和させてこ
れを消減させる。この結果プラズマ陰極から流入
する電子流は自由な加速を受けることができ、又
電子ビーム電流は放電電流を制御することによつ
て制御できる。
In the present invention, a neutral gas is introduced into another region downstream of the acceleration region, the neutral gas is ionized in that region by an accelerated electron beam, and the generated positive ions flow back through the acceleration region to create a space charge. Neutralize and reduce this. As a result, the electron flow flowing from the plasma cathode can be freely accelerated, and the electron beam current can be controlled by controlling the discharge current.

従つて、レーザー媒質に衝突してこれを励起す
るような運動エネルギーを電子に与えるように加
速電圧を調整し、これとは独立して放電電流を調
整して広範囲にビーム電流の大きさを調整し、所
要の大きさのビーム出力を得ることができる。引
き出す電子ビームの径は放電励起方式の様なきび
しい条件を受けないので、レーザー管の断面積も
大きくすることができ、このことはレーザーの出
力を大きくする上で有利である。
Therefore, the acceleration voltage is adjusted to give the electrons kinetic energy that excites them when they collide with the laser medium, and the discharge current is adjusted independently of this to adjust the beam current size over a wide range. However, it is possible to obtain a beam output of the required size. Since the diameter of the extracted electron beam is not subject to severe conditions as in the discharge excitation method, the cross-sectional area of the laser tube can also be increased, which is advantageous in increasing the output of the laser.

本発明の実施例を以下に添付図を参照して詳細
に説明する。
Embodiments of the invention will be described in detail below with reference to the accompanying drawings.

本発明の電子ビーム励起レーザー装置の構造を
原理的に示す第1図を参照する。
Reference is made to FIG. 1, which shows the principle of the structure of the electron beam excitation laser device of the present invention.

1はプラズマ領域、2は電子ビーム加速領域、
3は加速領域に生じる空間電荷を中和するための
イオンを生成する領域であり、これらの領域が電
子ビーム源を構成している。4はイオン生成領域
3に接続したレーザー管であり、5と6はレーザ
ー管内に発生したレーザー光を反復反射する一対
のレーザーミラーであり、そして7は電子ビーム
を加速するために加速電圧を印加するための可変
電源である。
1 is a plasma region, 2 is an electron beam acceleration region,
Reference numeral 3 denotes a region that generates ions for neutralizing space charges generated in the acceleration region, and these regions constitute an electron beam source. 4 is a laser tube connected to the ion generation region 3, 5 and 6 are a pair of laser mirrors that repeatedly reflect the laser light generated in the laser tube, and 7 is an accelerating voltage applied to accelerate the electron beam. It is a variable power supply for

第2図は電子ビーム励起レーザー装置のやゝ詳
細な構造を示す。
FIG. 2 shows a more detailed structure of the electron beam excitation laser device.

アルゴンガスを導入口14から導入し、ホロー
陰極8と陽極9との間の空間を0.8Torrに保つ
て、ホロー陰極8と陽極9,10,11の間で5
−15アンペアの定常放電を行なう。19は電源、
20は電流計を示す。長さ40cm程度の加速領域
(電極11と電極12との間)を0.1mTorr、空
間電荷を中和するためのイオンを生成する領域
(電極12と電極13との間)を0.7mTorrに固
定して加速領域に加速電圧を印加すると電子ビー
ムが発生し、イオン生成領域を通り、レーザー管
4に入射する。電子ビームをレーザー管に沿つて
導き入れるため外部磁場を矢印の方向に加える。
中性気体は排気口16,17,18から真空ポン
プにより排出される。
Argon gas is introduced from the inlet 14, the space between the hollow cathode 8 and the anode 9 is maintained at 0.8 Torr, and the space between the hollow cathode 8 and the anodes 9, 10, 11 is
Perform a steady discharge of −15 amperes. 19 is the power supply,
20 indicates an ammeter. The acceleration region (between electrodes 11 and 12) with a length of about 40 cm was fixed at 0.1 mTorr, and the region for generating ions for neutralizing space charges (between electrodes 12 and 13) was fixed at 0.7 mTorr. When an acceleration voltage is applied to the acceleration region, an electron beam is generated, passes through the ion generation region, and enters the laser tube 4. Apply an external magnetic field in the direction of the arrow to guide the electron beam along the laser tube.
The neutral gas is exhausted from the exhaust ports 16, 17, 18 by a vacuum pump.

レーザー管へ入射される電子ビーム電流(電流
計21で計測)は3−11Aまで、加速電圧にかか
わらず、制御することができた。さらに、アルゴ
ンガスを導入口15から導入し、レーザー管内平
均圧が15mTorr付近になるようにする。電子ビ
ーム電流が3A以上の時、レーザー管の軸と光学
軸とを一致させて配置した光学共振器内で、電子
ビームによつて高密度のプラズマが生成されアル
ゴンの1価イオンの488CÅにおけるレーザー発
振が観測された。
The electron beam current incident on the laser tube (measured with ammeter 21) could be controlled up to 3-11A, regardless of the accelerating voltage. Further, argon gas is introduced from the inlet 15 so that the average pressure inside the laser tube becomes around 15 mTorr. When the electron beam current is 3A or more, a high-density plasma is generated by the electron beam in an optical resonator arranged so that the axis of the laser tube and the optical axis coincide, and a laser beam of monovalent ions of argon at 488CÅ is generated. Oscillation was observed.

第3図は一例として電子ビーム電流8.5Aのと
きのレーザー出力が加速電圧に対してどのように
変化するかを示す。この図からレーザー発振に対
して加速電圧の最適値が存在することが明らかで
ある。又、加速電圧を120Vに固定し、電子ビー
ム電流を11Aまで増加させるとレーザー出力は単
調な増加を続けていき、まだ飽和する傾向はみせ
ない。
FIG. 3 shows, as an example, how the laser output changes with respect to the accelerating voltage when the electron beam current is 8.5 A. It is clear from this figure that there is an optimum value of the accelerating voltage for laser oscillation. Furthermore, when the accelerating voltage is fixed at 120 V and the electron beam current is increased to 11 A, the laser output continues to increase monotonically, and there is no tendency to saturate yet.

叙上から明らかなように、本発明の電子ビーム
励起レーザー発振装置では基本的な運転条件であ
る電子ビームのエネルギー、電子ビームの電流及
びレーザー管のレーザー媒質の密度がすべて独立
に制御できるため、理想に近いレーザー装置の運
転が可能となる。
As is clear from the above description, in the electron beam excitation laser oscillation device of the present invention, the basic operating conditions such as the energy of the electron beam, the current of the electron beam, and the density of the laser medium of the laser tube can all be controlled independently. It becomes possible to operate a laser device close to the ideal.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の大電流電子ビーム励起レーザ
ー発振装置の構成を原理的に示す略図である。第
2図は本発明の実施例を示す。第3図はレーザー
出力と加速電圧との関係を表わすグラフである。 図中:1:プラズマ領域、2:電子ビーム加速
領域、3:イオン生成領域、4:レーザー管、
5;6:レーザーミラー、7:可変加速電圧源。
FIG. 1 is a schematic diagram showing the principle of the configuration of a large current electron beam excitation laser oscillation device according to the present invention. FIG. 2 shows an embodiment of the invention. FIG. 3 is a graph showing the relationship between laser output and acceleration voltage. In the figure: 1: plasma region, 2: electron beam acceleration region, 3: ion generation region, 4: laser tube,
5; 6: Laser mirror, 7: Variable accelerating voltage source.

Claims (1)

【特許請求の範囲】[Claims] 1 プラズマ領域と電子ビーム加速領域と加速領
域に生ずる空間電荷を中和するためのイオンを生
成する領域とを含む電子ビーム源、この電子ビー
ム源の電子ビームの出力端に接続されたレーザー
管、このレーザー管内に発生したレーザー光を反
復反射する位置に設定した一対のミラー及び前記
のレーザー管に入射する電子ビームを加速するた
めに印加する加速電圧を調整する手段を備えたこ
とを特徴とするレーザー発振装置。
1. An electron beam source including a plasma region, an electron beam acceleration region, and a region that generates ions for neutralizing space charges generated in the acceleration region; a laser tube connected to the electron beam output end of the electron beam source; It is characterized by comprising a pair of mirrors set at a position to repeatedly reflect the laser light generated within the laser tube, and means for adjusting an accelerating voltage applied to accelerate the electron beam incident on the laser tube. Laser oscillation device.
JP17763483A 1983-09-26 1983-09-26 Laser oscillator Granted JPS6070787A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17763483A JPS6070787A (en) 1983-09-26 1983-09-26 Laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17763483A JPS6070787A (en) 1983-09-26 1983-09-26 Laser oscillator

Publications (2)

Publication Number Publication Date
JPS6070787A JPS6070787A (en) 1985-04-22
JPH0135509B2 true JPH0135509B2 (en) 1989-07-25

Family

ID=16034425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17763483A Granted JPS6070787A (en) 1983-09-26 1983-09-26 Laser oscillator

Country Status (1)

Country Link
JP (1) JPS6070787A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04106709A (en) * 1990-08-27 1992-04-08 Fuji Photo Film Co Ltd Magnetic head

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3828274A (en) * 1970-05-25 1974-08-06 Atomic Energy Commission Electron beam-pumped gas laser system
US4008444A (en) * 1976-01-19 1977-02-15 Avco Everett Research Laboratory, Inc. Feedback control of a laser output

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04106709A (en) * 1990-08-27 1992-04-08 Fuji Photo Film Co Ltd Magnetic head

Also Published As

Publication number Publication date
JPS6070787A (en) 1985-04-22

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