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JPH0137353B2 - - Google Patents
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JPH0137353B2 - - Google Patents

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Publication number
JPH0137353B2
JPH0137353B2 JP17711381A JP17711381A JPH0137353B2 JP H0137353 B2 JPH0137353 B2 JP H0137353B2 JP 17711381 A JP17711381 A JP 17711381A JP 17711381 A JP17711381 A JP 17711381A JP H0137353 B2 JPH0137353 B2 JP H0137353B2
Authority
JP
Japan
Prior art keywords
glaze
thin film
glazed
metal
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17711381A
Other languages
Japanese (ja)
Other versions
JPS5879886A (en
Inventor
Tooru Mashida
Sumeo Matsushita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP17711381A priority Critical patent/JPS5879886A/en
Publication of JPS5879886A publication Critical patent/JPS5879886A/en
Publication of JPH0137353B2 publication Critical patent/JPH0137353B2/ja
Granted legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 この発明は新規な模様面をもつ装飾体の製造法
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a decorative body having a novel patterned surface.

透明誘電体薄膜の示す干渉色は古くから多くの
人の注意をひき、貝がらを使つたらでん、真珠、
魚鱗の象嵌など天然品を使つた装飾体が好んで作
られているが、最近は薄膜製造技術の進歩により
人工的に作つた透明誘電体薄膜の干渉色を利用し
た装飾体が多数見られるようになつた。これらの
装飾体は、ガラス、金属板、金属箔に透明誘電体
を真空蒸着またはスパツタリング、イオンプレー
テイング、気相成長などの方法により適当厚さの
皮膜として付着せしめ、光の干渉色を示すように
したものである。しかし、これらの干渉色を示す
表面は、光沢をもつ一様な平面または曲面であつ
て連続薄膜であり、干渉色面は美しいが単調であ
る。
The interference colors exhibited by transparent dielectric thin films have long attracted the attention of many people, and the use of shells to make cod dens, pearls, etc.
Decorations using natural products such as inlays of fish scales are preferred, but recently, with advances in thin film manufacturing technology, many decorations are being made that utilize the interference colors of artificially created transparent dielectric thin films. It became. These decorations are made by attaching a transparent dielectric material to glass, metal plates, or metal foils as a film of appropriate thickness by vacuum evaporation, sputtering, ion plating, vapor phase growth, or other methods, so that they exhibit light interference colors. This is what I did. However, the surfaces exhibiting these interference colors are glossy, uniform planes or curved surfaces, and are continuous thin films, and although the interference color surfaces are beautiful, they are monotonous.

この発明は、光の干渉色を利用した装飾体を目
的とする点では上記従来法と同じであるが、それ
よりももつと複雑で深遠な光干渉模様層を発現せ
しめんとするものである。
This invention is the same as the above-mentioned conventional method in that it aims to create a decorative object that utilizes the interference colors of light, but it also aims to create a more complex and profound optical interference pattern layer. .

すなわち、この発明は、釉を施した基体の釉面
に真空蒸着、スパツタリング、イオンプレーテイ
ング、気相成長およびメツキのいずれかの方法で
金属薄膜を形成し、さらにその上に上記いずれか
の方法で無機化合物の薄膜を形成し、これを釉が
半流動性となる温度で高温処理し、美的模様を示
す光干渉性表面層を形成することを特徴とする装
飾体の製造法を要旨とするものである。
That is, this invention forms a metal thin film on the glazed surface of a glazed substrate by any one of vacuum evaporation, sputtering, ion plating, vapor phase growth, and plating, and further forms a metal thin film on the glazed surface by any of the above methods. The gist of the present invention is a method for producing a decorative body, which is characterized by forming a thin film of an inorganic compound in a glaze and treating it at a high temperature at which the glaze becomes semi-fluid to form a light-coherent surface layer exhibiting an aesthetic pattern. It is something.

本発明に用いる基体としては、銅、銀、金、
鉄、鋼、ステンレスその他の合金などの金属、セ
ラミツク、陶磁器、ガラスなどの耐熱性材料が挙
げられる。
Substrates used in the present invention include copper, silver, gold,
Examples include metals such as iron, steel, stainless steel, and other alloys, and heat-resistant materials such as ceramics, ceramics, and glass.

釉としては、陶磁器用の釉と金属用の釉(ホー
ロー釉、七宝釉)があるが、上記基体の材質に合
せて、適当な釉を適宜選択して用いる。釉は無
色、有色、不透明のいずれでもよい。基体に対す
る釉掛けは従来知られている方法で行なえばよ
い。
Glazes include glazes for ceramics and glazes for metals (enamel glaze, cloisonné glaze), and an appropriate glaze is selected and used depending on the material of the substrate. The glaze may be colorless, colored, or opaque. The substrate may be glazed by a conventionally known method.

釉を施した基体は、ついでその釉面に金属薄膜
を形成するが、その方法は、真空蒸着、スパツタ
リング、イオンプレーテイング、気相成長および
メツキのいずれかの方法による。この生成する金
属薄膜の材質としては、Fe,Cr,Ni,Cu,Au,
Ag,Pt,Zn,Ti,Mn,Al,Mg,Zr,Si,Pb,
Sn,In,Sb,Co,Mo,W,Bi,鋼、合金など
種々のものが用いられる。
A thin metal film is then formed on the glazed surface of the glazed substrate by any one of vacuum evaporation, sputtering, ion plating, vapor phase growth, and plating. The materials of the metal thin film produced include Fe, Cr, Ni, Cu, Au,
Ag, Pt, Zn, Ti, Mn, Al, Mg, Zr, Si, Pb,
Various materials such as Sn, In, Sb, Co, Mo, W, Bi, steel, and alloys are used.

金属薄膜の厚さは、材質によつて多少変動はあ
るが、下層の釉の半流動によつて破れる程度の厚
さがよい。
The thickness of the metal thin film varies depending on the material, but it should be thick enough to be broken by the semi-fluidity of the underlying glaze.

金属薄膜の上にはさらに無機化合物薄膜を形成
するが、その方法は、上記金属薄膜を形成させた
方法のうち、真空蒸着、スパツタリング、イオン
プレーテイング、気相成長のいずれかの方法によ
る。これらの方法はかなり精密な技術を必要とし
たり、金属薄膜製作より時間がかかつたりする。
無機化合物としては、Fe,Cr,Ni,Cu,Zn,
Ti,Mn,Al,Mg,Zr,Si,Pb,Sn,In,Sb,
Co,Ce,Mo,W,Bi,Vなどの酸化物、Cd,
Sb,Znの硫化物、Ca,Li,Mg,Naのフツ化
物、NaF・AlF3,CaO・SiO2などの複合化合物、
ガラス、宝石、合金の酸化物などが用いられ、こ
れらが薄膜として形成される。いずれの薄膜も干
渉色を示すものである。
An inorganic compound thin film is further formed on the metal thin film using any of the methods used to form the metal thin film, such as vacuum evaporation, sputtering, ion plating, and vapor phase growth. These methods require fairly precise techniques and are more time-consuming than metal thin film fabrication.
Inorganic compounds include Fe, Cr, Ni, Cu, Zn,
Ti, Mn, Al, Mg, Zr, Si, Pb, Sn, In, Sb,
Oxides such as Co, Ce, Mo, W, Bi, V, Cd,
Sb, Zn sulfides, Ca, Li, Mg, Na fluorides, complex compounds such as NaF/AlF 3 , CaO/SiO 2 ,
Glass, gemstones, oxides of alloys, etc. are used, and these are formed as thin films. All thin films exhibit interference colors.

こうしてできた金属薄膜、無機化合物薄膜をつ
けた施釉基体は高温処理を行なうが、この際、電
気炉、窯業炉のほかバーナー加熱、赤外線加熱、
誘電または誘導加熱などの加熱方法が用いられ
る。高温処理温度は、釉が半流動性を示す程度が
よい。釉の種類により異なるが、300〜1600℃の
範囲で殆んどの場合充分である。
The glazed substrate coated with the metal thin film or inorganic compound thin film produced in this way is subjected to high-temperature treatment, which can be done using burner heating, infrared heating, in addition to electric furnaces and ceramic furnaces.
Heating methods such as dielectric or induction heating are used. The high temperature treatment temperature is preferably such that the glaze exhibits semi-fluidity. Although it varies depending on the type of glaze, a temperature range of 300 to 1600°C is sufficient in most cases.

また、高温処理の目的は、釉を半流動性にし
て、金属薄膜や無機化合物薄膜にき裂、しわ、
条、泡などを生じさせて模様に変化を与えること
にもある。図はその状態を判り易く説明するため
のものであるが、上記方法により釉面に作つた金
属薄膜や無機化合物薄膜は、顕微鏡で観察する
と、太いき裂1から細いき裂2まで不規則に割れ
たり、しわ3、条4、泡穴5が生じたり、突沸部
6によつて下地の釉が現れたりする。これは釉が
ガラス転移点に達して起る急激な容積変化と、薄
膜の機械的強度との関係によつて起るものと推定
される。
The purpose of high-temperature treatment is to make the glaze semi-fluid and prevent cracks, wrinkles, etc. from forming in the thin metal film or inorganic compound film.
It also creates stripes, bubbles, etc. to change the pattern. The figure is intended to explain the condition in an easy-to-understand manner, but when the thin metal film or inorganic compound film formed on the glaze surface by the above method is observed under a microscope, it shows irregular cracks ranging from thick cracks 1 to thin cracks 2. Cracks, wrinkles 3, streaks 4, and bubble holes 5 may occur, and the underlying glaze may appear due to bumps 6. This is presumed to be caused by the relationship between the rapid volume change that occurs when the glaze reaches its glass transition point and the mechanical strength of the thin film.

そして、金属薄膜は高温で半流動性になつた釉
に溶解されることは少ないが、その酸化物は容易
に釉に溶解されてその干渉色を失なう。
Although the metal thin film is rarely dissolved in the glaze, which becomes semi-fluid at high temperatures, its oxide is easily dissolved in the glaze and loses its interference color.

したがつて、高温処理の温度条件、温度むら、
薄膜の厚さ、同厚さむらなどにより、また、高温
処理時間により、上記の作用が複雑にからみ合
い、基体表面の薄膜には無機酸化物層および金属
層に複雑なき裂、しわ、条などが生じ、また、金
属酸化物が釉に溶解されて消失し、そこは釉の地
模様になつたり、泡や突沸ができて、凹凸表面に
なつてマツト調になつたり、従来の単純な干渉色
模様とは異なつた複雑で深遠な味わいをもつて干
渉色模様が得られる。
Therefore, the temperature conditions of high-temperature treatment, temperature unevenness,
Due to the thickness of the thin film, uneven thickness, etc., and the high temperature treatment time, the above effects are intertwined in a complicated manner, and the thin film on the surface of the substrate has complex cracks, wrinkles, stripes, etc. in the inorganic oxide layer and the metal layer. In addition, the metal oxide dissolves in the glaze and disappears, forming the background pattern of the glaze, forming bubbles and bumps, creating an uneven surface that becomes matte, and creating a matte-like appearance due to the conventional simple interference. An interference color pattern can be obtained with a complex and profound taste different from that of a color pattern.

さらに高温処理によつて、薄膜層を強固に釉と
結合させることができ、摩擦、摩耗に耐えるよう
になる。
Furthermore, the high temperature treatment allows the thin film layer to be firmly bonded to the glaze, making it resistant to friction and wear.

高温処理時間は上記の複雑な作用を考えて、望
みの模様が現われるところに設定すればよい。
The high-temperature treatment time may be set at a time where the desired pattern appears, taking into account the above-mentioned complex effects.

以下、実施例について説明する。 Examples will be described below.

実施例 1 清浄にした鉄板に低温ホーロー釉(融点550℃)
を施して釉掛けしたホーロー板を作り、これを真
空蒸着装置に入れてFeを釉面に厚さ約0.9ミクロ
ンに蒸着し、この基板をスパツタリング装置に入
れ、ガラス板をターゲツトとして、上記Fe蒸着
面にさらに20分スパツタリングを行ない、鮮やか
な干渉色を示す基板を得た。これを電気炉に入
れ、600℃に1分間熱処理することにより、大小
のひび割れの入つたマツト調の干渉色模様をもつ
た基板を得た。
Example 1 Low-temperature enamel glaze (melting point 550℃) on a cleaned iron plate
A glazed enamel plate is made by applying this process, and this is placed in a vacuum evaporation device to deposit Fe to a thickness of approximately 0.9 microns on the glazed surface.This substrate is placed in a sputtering device, and the above-mentioned Fe evaporation is performed using the glass plate as a target. The surface was sputtered for an additional 20 minutes to obtain a substrate exhibiting bright interference colors. This was placed in an electric furnace and heat treated at 600°C for 1 minute to obtain a substrate with a matt-like interference color pattern with large and small cracks.

実施例 2 清浄にしたセラミツク板に釉(融点800℃)を
施し、釉掛けしたセラミツク板を金属クロムをタ
ーゲツトとしたスパツタリング装置に入れ、釉面
に金属クロム薄膜を作り、次に同じ装置を用い、
アルゴンガスのほかに微量の酸素を導入して、ス
パツタリングを行なうことにより、金属薄膜の上
に、さらに鮮やかな干渉色を示す酸化クロムの薄
膜を形成させた。これを炉(850℃)で3分間処
理することにより、部分的に種々の干渉色を示
す、ひび割れ、条、穴の入つた薄膜をもつたセラ
ミツク板を得た。
Example 2 A glaze (melting point: 800°C) was applied to a cleaned ceramic plate, the glazed ceramic plate was placed in a sputtering device that targeted metallic chromium, a thin film of metallic chromium was formed on the glazed surface, and then the same device was used to form a thin film of metallic chromium. ,
By introducing a small amount of oxygen in addition to argon gas and performing sputtering, they were able to form a thin film of chromium oxide that shows even more vivid interference colors on the thin metal film. By treating this in a furnace (850°C) for 3 minutes, a ceramic plate was obtained that had a thin film with cracks, striations, and holes that partially exhibited various interference colors.

以上のようにこの発明によれば、新規な模様面
をもつ装飾体が得られ、これは装飾品、食器、建
材、工芸品などとして極めて有用なものである。
As described above, according to the present invention, a decorative body having a novel patterned surface can be obtained, which is extremely useful as ornaments, tableware, building materials, crafts, etc.

【図面の簡単な説明】[Brief explanation of drawings]

図はこの発明の製品の表面状態の説明図であ
る。 1…太いき裂、2…細いき裂、3…しわ、4…
条、5…泡穴、6…突沸部。
The figure is an explanatory view of the surface condition of the product of the present invention. 1... Thick crack, 2... Thin crack, 3... Wrinkle, 4...
strip, 5... bubble hole, 6... bumping part.

Claims (1)

【特許請求の範囲】[Claims] 1 釉を施した基体の釉面に真空蒸着、スパツタ
リング、イオンプレーテイング、気相成長および
メツキのいずれかの方法で金属薄膜を形成し、さ
らにその上に上記いずれかの方法で無機化合物薄
膜を形成し、これを釉が半流動性となる温度で高
温処理し、美的模様を示す光干渉性表面層を形成
することを特徴とする装飾体の製造法。
1. Form a metal thin film on the glazed surface of the glazed substrate by vacuum evaporation, sputtering, ion plating, vapor phase growth, or plating, and then apply an inorganic compound thin film on top of it by any of the above methods. 1. A method for producing a decorative body, which comprises forming a glaze and subjecting it to high temperature treatment at a temperature at which the glaze becomes semi-fluid to form a light interference surface layer exhibiting an aesthetic pattern.
JP17711381A 1981-11-06 1981-11-06 Manufacture of dressing body Granted JPS5879886A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17711381A JPS5879886A (en) 1981-11-06 1981-11-06 Manufacture of dressing body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17711381A JPS5879886A (en) 1981-11-06 1981-11-06 Manufacture of dressing body

Publications (2)

Publication Number Publication Date
JPS5879886A JPS5879886A (en) 1983-05-13
JPH0137353B2 true JPH0137353B2 (en) 1989-08-07

Family

ID=16025380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17711381A Granted JPS5879886A (en) 1981-11-06 1981-11-06 Manufacture of dressing body

Country Status (1)

Country Link
JP (1) JPS5879886A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102276294B (en) * 2011-07-15 2012-12-12 广东长城集团股份有限公司 Copper red glaze and production method thereof, and method for preparing ceramic product therefrom

Also Published As

Publication number Publication date
JPS5879886A (en) 1983-05-13

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