JPH0141719B2 - - Google Patents
Info
- Publication number
- JPH0141719B2 JPH0141719B2 JP27764185A JP27764185A JPH0141719B2 JP H0141719 B2 JPH0141719 B2 JP H0141719B2 JP 27764185 A JP27764185 A JP 27764185A JP 27764185 A JP27764185 A JP 27764185A JP H0141719 B2 JPH0141719 B2 JP H0141719B2
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- plated
- plating
- cobalt
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 142
- 238000007747 plating Methods 0.000 claims description 74
- 229910052759 nickel Inorganic materials 0.000 claims description 71
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 35
- 229910017052 cobalt Inorganic materials 0.000 claims description 34
- 239000010941 cobalt Substances 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 32
- 239000002184 metal Substances 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 19
- 230000005611 electricity Effects 0.000 claims description 5
- 239000003792 electrolyte Substances 0.000 claims description 5
- 229910000831 Steel Inorganic materials 0.000 description 12
- 238000005323 electroforming Methods 0.000 description 12
- 239000010959 steel Substances 0.000 description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- ZGDWHDKHJKZZIQ-UHFFFAOYSA-N cobalt nickel Chemical compound [Co].[Ni].[Ni].[Ni] ZGDWHDKHJKZZIQ-UHFFFAOYSA-N 0.000 description 1
- WLQXLCXXAPYDIU-UHFFFAOYSA-L cobalt(2+);disulfamate Chemical compound [Co+2].NS([O-])(=O)=O.NS([O-])(=O)=O WLQXLCXXAPYDIU-UHFFFAOYSA-L 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Description
(産業上の利用分野)
本発明は、電気ニツケルメツキ方法、特に深い
凹部を持つ形状の物体にニツケルメツキを施す方
法の改良に関するものである。
(従来技術)
電気メツキは安価な金属の表面を他の金属で被
覆し、優れた特性を持たせる事ができるため、ま
た、物品の表面を緻密に覆い、精密な形状模写が
できるため、装飾、防食、表面硬化、電鋳その
他、多用途にわたつて利用されている。特に、電
気ニツケルメツキは、ニツケルの優れた性質より
非常に広範囲にわたつて活用される技術である。
しかしながら、電気ニツケルメツキを例えばリツ
プ溝型鋼のような断面C字状物のように、深い凹
部を持ちニツケル陽極に対して影になる部分のあ
る物体に施す場合には、影の部分の電流密度が低
く該部分のメツキの付きまわりが悪く良好な結果
を得にくい。そこで、上述のような影になる部分
に補助陽極を近接し、該部分の電流密度を高めて
メツキの付きまわりを向上させる方法が一般に採
用され、補助陽極として純ニツケル塊、ニツケル
に0.01〜0.1%の微量の硫黄又は燐を添加したも
の、チタン又はチタンの表面に白金メツキを施し
たもの等を被メツキ物にあわせて加工したものが
一般に使用されている。
しかし、これら従来の補助陽極は、全て陽極電
位が高く通電性が悪く陽極電流効率が悪い。ま
た、その他特に、純ニツケルを利用した場合に
は、不溶解のニツケル粒が発生し、メツキ液中に
分散し、それが原因で被メツキ物表面が多硬質状
になりざらつき、析出ニツケルのクラツクの原因
となる。ニツケルに0.01〜0.1%の微量の硫黄又
は燐を含んだ材料を利用する場合は、純ニツケル
を利用する場合より陽極電位は低くなるが、不溶
解ニツケル粒がメツキ液中へ分散、含有し、硫黄
又は燐がメツキ液中に不純物となり混入し析出ニ
ツケルの脆化、硬度の高化、電着応力の増大をき
たす。チタンはチタン表面に白金メツキを施した
補助陽極は、不溶解で極端に電極表面での抵抗が
高く、陽極での酸化応力、その他の副反応が起
り、スルフアミン酸ニツケル液や硫酸ニツケル液
ではスルフアミン酸塩や硫酸塩の分解がおこり、
析出ニツケルは上述の場合同様に脆化する。ま
た、主目的である補助陽極としての効果は、極め
て低いものである。その他に、鋼管の内面等に、
ニツケルメツキを施す場合、鋼管内に、ニツケル
陽極、又は上述の燐添加ニツケル、チタン、被チ
タン等を挿入して行うが、管内面メツキの際は陽
極の大きさに制約を受けるため電流密度の向上が
図れずメツキ作業に時間を要した。
(発明が解決しようとする問題点)
本発明は上述の欠点に着目し、管状物、断面C
の字状物についても一様に、また、平滑にかつ電
流効率よく被メツキ物にニツケル被覆を行いうる
ニツケルメツキ法を提供する事を目的とする。
(問題を解決するための手段)
そこで、上述の目的を達成するために本発明者
は鋭意研究を重ね、その結果、スルフアミン酸ニ
ツケルメツキ、硫酸ニツケル塩メツキ、ワツト液
によるニツケルメツキ等による電気ニツケルメツ
キ法においてコバルトを補助陽極として使用した
場合、メツキ槽内でのコバルト補助陽極の溶解性
がきわめてよく、つまり陽極電流効率が高く、被
メツキ物の低電流密度部位への電流密度の向上効
果が大きく、かつスラツジの発生も少なくメツキ
仕上げ面を平滑または光沢を均一に仕上げる事が
でき、析出ニツケルの脆化も無く良好なニツケル
メツキを施す事ができる旨を知見するに至つた。
また、特殊な使用方法としてコバルトを補助陽極
としてではなく主たる陽極として使用しても上述
同様良好なニツケルメツキを施す事ができる旨を
も知見した。これは、ニツケルとコバルトの標準
酸化還元電位が
ニツケル Ni2+2e-=Ni Eo=−0.250
コバルト Co2++2e-=Co Eo=−0.277
であり、コバルトの方がニツケルよりもイオン化
し易いからメツキ槽内で溶解がよく、またコバル
トの溶解量は主力であるニツケルアノードの溶解
量と比較すれば微量であり、その微量のコバルト
が被メツキ物のメツキ槽内で合金となつて含まれ
高硬度ニツケルメツキとなるからであると考えら
れる。
またコバルト自体は加工性が悪い欠点があり、
被メツキ物形状が複雑である場合には被メツキ物
に近接させるべく被メツキ物に合致させて加工す
る事は困難であるが比較的加工性が良好であり、
かつメツキ液等に悪影響の無い、ニツケル、チタ
ン、鉄、その他の金属塊を予め被メツキ物に合致
させて加工し、該金属塊の表面にコバルトを厚く
メツキして該金属塊を補助陽極として使用する事
により上述の欠点は解消される。即ち、本発明は
1つは予め被メツキ物の低電流密度部位に近接可
能に成形した金属塊表面にコバルトメツキを施
し、該コバルトメツキ金属塊が被メツキ物の低電
流密度部位に近接した状態にコバルトメツキ金属
塊および被メツキ物をニツケル電解液を満たした
ニツケルメツキ槽中に浸漬し、またニツケル電極
も同様にニツケルメツキ槽内に浸漬して直流電源
の陽極にニツケル電極とコバルトメツキ金属塊
を、陰極に被メツキ物を接続し通電して行う事を
特徴とするニツケルメツキ法であり、今1つは、
予め被メツキ物のメツキ希望部位に近接可能に成
形した金属塊表面にコバルトメツキを施し、該コ
バルトメツキ金属塊と被メツキ物をニツケル電解
液を満たしたニツケルメツキ槽内に両者を近接し
て浸漬し、直流電源の陽極にコバルトメツキ金属
塊、陰極に被メツキ物を接続し通電して行う事を
特徴とするニツケルメツキ法である。
(実施例)
以下更に、本発明の具体的実施例について説明
する。
実施例 1
第1図は、本発明の方法を電鋳に応用したもの
であり、コバルトニツケル金属塊を補助陽極とし
て使用するものである。第1図中1は、表面に導
電加工が施された電鋳母型であり断面が凹型形状
である。該母型全表面にわたつてメツキ被覆を形
成させる際、通常補助陽極を使用しない場合は電
鋳母型の窪んだ部分2がニツケル電極3に対して
影になり電流密度が低くなる。
図中4は本発明の主たる特徴であるコバルトメ
ツキ金属塊であり、第2図のように電鋳母型の窪
みの低電流密度部分2に近接可能に予め成形し脱
脂、水洗処理したチタン塊5を表1の組成の液6
(スルフアミン酸コバルト液)で満たしたコバル
トメツキ槽中へコバルト電極8と共に浸漬し、直
流電源9の陽極にコバルト電極8を、他方陰極に
チタン塊5を接続し、電流密度0.5〜5A/dm2を
通電し、チタン塊5の表面に3〜5mmの厚さのコ
バルトメツキ10を施したものである。
(Industrial Application Field) The present invention relates to an electric nickel plating method, particularly to an improvement in a method of nickel plating an object having a shape with a deep recess. (Prior art) Electroplating can coat the surface of inexpensive metals with other metals to give them superior properties, and it is also useful for decoration because it can densely cover the surface of objects and reproduce precise shapes. It is used for a variety of purposes, including corrosion protection, surface hardening, electroforming, and more. In particular, electric nickel plating is a technology that is widely used due to the excellent properties of nickel.
However, when electric nickel plating is applied to an object that has a deep recess and a shaded area relative to the nickel anode, such as a C-shaped cross section such as lip groove steel, the current density in the shaded area is It is difficult to obtain good results because the coverage of the plating is low and the coverage of the area is poor. Therefore, a method is generally adopted in which an auxiliary anode is placed close to the shadowed area as described above to increase the current density in that area and improve the coverage of the plating. % of sulfur or phosphorus added, titanium or titanium whose surface is plated with platinum, and processed according to the object to be plated. However, all of these conventional auxiliary anodes have a high anode potential, poor conductivity, and poor anode current efficiency. In addition, especially when pure nickel is used, undissolved nickel grains are generated and dispersed in the plating solution, which causes the surface of the plated object to become hard and rough, causing cracks in the precipitated nickel. It causes When using nickel containing a trace amount of sulfur or phosphorus of 0.01 to 0.1%, the anode potential will be lower than when using pure nickel, but insoluble nickel particles will be dispersed and contained in the plating solution, Sulfur or phosphorus becomes an impurity in the plating solution, causing embrittlement of the deposited nickel, increased hardness, and increased electrodeposition stress. The auxiliary anode, which has titanium plated with platinum, is insoluble and has extremely high resistance on the electrode surface, causing oxidation stress and other side reactions at the anode. Decomposition of acid salts and sulfates occurs,
The precipitated nickel becomes brittle in the same way as in the case described above. Furthermore, its effectiveness as an auxiliary anode, which is its main purpose, is extremely low. In addition, on the inner surface of steel pipes, etc.
When performing nickel plating, it is done by inserting a nickel anode or the above-mentioned phosphorous-added nickel, titanium, titanium, etc. into the steel pipe, but when plating the inner surface of the tube, it is difficult to improve the current density because it is limited by the size of the anode. It took a long time to do the plating work because I couldn't plan it properly. (Problems to be Solved by the Invention) The present invention focuses on the above-mentioned drawbacks,
It is an object of the present invention to provide a nickel plating method that can uniformly, smoothly and efficiently apply nickel to an object to be plated, even on an object shaped like a square. (Means for Solving the Problem) Therefore, in order to achieve the above-mentioned object, the present inventor has made extensive research, and as a result, has developed an electric nickel plating method using sulfamic acid nickel plating, nickel sulfate salt plating, nickel plating using Watt's solution, etc. When cobalt is used as an auxiliary anode, the solubility of the cobalt auxiliary anode in the plating tank is extremely good, which means that the anode current efficiency is high, and the effect of increasing current density to low current density parts of the object to be plated is large. It has been found that the plated surface can be finished with a smooth or uniform gloss with less occurrence of sludge, and that it is possible to perform good nickel plating without causing embrittlement of the precipitated nickel.
It has also been found that as a special method of use, cobalt can be used as the main anode instead of as an auxiliary anode to provide good nickel plating as described above. This is because the standard redox potential of nickel and cobalt is Nickel Ni 2 +2e - = Ni Eo = -0.250 Cobalt Co 2+ +2e - = Co Eo = -0.277, and cobalt is easier to ionize than nickel. It dissolves well in the plating tank, and the amount of cobalt dissolved is very small compared to the amount dissolved in the mainstay nickel anode, and this very small amount of cobalt forms an alloy in the plating tank of the object to be plated, resulting in high hardness. This is thought to be because it becomes nickel-metsuki. In addition, cobalt itself has the disadvantage of poor workability.
If the shape of the object to be plated is complex, it is difficult to process it so that it matches the object to be plated, but it has relatively good workability.
A lump of nickel, titanium, iron, or other metal that does not have a negative effect on the plating solution, etc. is processed in advance to match the object to be plated, and the surface of the metal lump is plated with a thick layer of cobalt, and the metal lump is used as an auxiliary anode. By using it, the above-mentioned drawbacks are eliminated. That is, one aspect of the present invention is to apply cobalt plating to the surface of a metal lump that has been formed in advance so that it can be approached to a low current density part of the object to be plated, and to apply cobalt plating to the surface of the metal lump that has been formed in advance so as to be close to the low current density part of the object to be plated. The cobalt plating metal lump and the object to be plated are immersed in a nickel plating tank filled with a nickel electrolyte, and the nickel electrode is similarly immersed in the nickel plating tank, and the nickel electrode and cobalt plating metal lump are connected to the anode of a DC power supply. The nickel plating method is characterized by connecting the object to be plated to the cathode and applying electricity.
Cobalt plating is applied to the surface of a metal lump that has been formed in advance so that it can be approached to the desired part of the object to be plated, and the cobalt-plated metal lump and the object to be plated are immersed closely in a nickel plating tank filled with a nickel electrolyte. This is a nickel plating method characterized by connecting the cobalt plating metal block to the anode of a DC power source and the object to be plated to the cathode and applying electricity. (Example) Specific examples of the present invention will be further described below. Example 1 FIG. 1 shows an application of the method of the present invention to electroforming, in which a cobalt nickel metal ingot is used as an auxiliary anode. Reference numeral 1 in FIG. 1 is an electroforming mother mold whose surface is electrically conductive and has a concave cross section. When a plating coating is formed over the entire surface of the mother mold, usually when an auxiliary anode is not used, the recessed portion 2 of the electroforming mother mold shadows the nickel electrode 3, resulting in a low current density. 4 in the figure is a cobalt-plated metal ingot, which is the main feature of the present invention, and as shown in Fig. 2, the titanium ingot has been preformed, degreased, and washed so as to be close to the low current density part 2 of the depression of the electroforming mold. 5 to liquid 6 having the composition shown in Table 1.
The cobalt electrode 8 and the cobalt electrode 8 were immersed in a cobalt plating bath filled with (cobalt sulfamate solution), the cobalt electrode 8 was connected to the anode of the DC power supply 9, and the titanium lump 5 was connected to the other cathode, and the current density was 0.5 to 5 A/dm 2 . A cobalt plating 10 with a thickness of 3 to 5 mm is applied to the surface of the titanium block 5 by applying electricity.
【表】
上述の電鋳母型1およびニツケル電極3を表2
の組成のニツケルメツキ液11(スレフアミン酸
ニツケル液)で満たしたニツケルメツキ槽12中
に浸漬し、さらに先述のコバルトメツキ金属塊4
を電鋳母型1の窪みの電流密度部分2に5〜20mm
に近接して固定し、直流電源13の陽極を銅板の
表面に絶縁加工を施した給電体15を介してコバ
ルトメツキ金属塊4に接続し、電源14の陽極は
ニツケル電極3に接続する。[Table] Table 2 shows the electroforming master mold 1 and nickel electrode 3 described above.
It is immersed in a nickel plating tank 12 filled with a nickel plating solution 11 (sulfur amic acid nickel solution) having a composition of
5 to 20 mm to the current density part 2 of the depression of the electroforming mother mold 1.
The anode of the DC power supply 13 is connected to the cobalt-plated metal block 4 via a power supply 15 whose surface is insulated, and the anode of the power supply 14 is connected to the nickel electrode 3.
【表】
また、両電源の陰極は電鋳母型1に給電体16
を用いて接続する。そして、それぞれ1〜6A/
dm2の電流密度で通電し、ニツケルを適度に析出
させることにより析出ニツケルの脆化なく電鋳母
型1の窪みの低電流密度部分についても一様かつ
十分な厚さのニツケル被覆を得ることができる。
なお、メツキ作業中メツキ液11をかるく撹拌
すればよりよい結果が得られる。
実施例 2
本発明は、コバルトメツキを施した金属塊をニ
ツケルメツキ法の陽極として使用するものであり
実施例のようにニツケル陽極を主陽極として、本
発明の金属塊を補助陽極として使用する事が好ま
しいが、特殊な場合には以下の実施例のように本
発明のコバルトメツキを施した金属塊を主陽極と
する事も可能である。
本発明を鋼管の内面にメツキを施す場合の応用
例を以下に示す。第3図は本発明に係るニツケル
メツキ法を鋼管の内面にニツケルメツキを施す際
に応用したものである。図中15は内径φ50〜
φ500の鋼管である。16は鋼管15の内径の1/8
〜3/4の外径を有するチタン丸棒17を実施例1
の第2図に示す方法により表面にコバルトメツキ
槽18を被着したコバルトメツキ金属塊である。
そして第3図のように、コバルトメツキ金属塊1
6を鋼管の中心に位置するように、表2の組成の
メツキ液19を満たしたメツキ棒20中に浸漬
し、直流電源21の陽極をコバルトメツキ金属塊
に接続し、直流電源の陰極を鋼管15に接続し、
電流密度1〜6A/dm2の電流密度で通電する事
により鋼管15の内面にニツケルメツキを良好に
析出させる事ができる。
(効果)
本発明は、ニツケルメツキ用の補助陽極として
コバルトを使用する事により、従来の陽極に比べ
て陽極電流効率が高く、被メツキ物の低電流部位
の電流密度を向上させる効果が大きく、かつスラ
ツジの発生も少なくメツキ仕上げ面を平滑または
光沢を均一に仕上げる事ができ、析出ニツケルの
脆化もなくニツケルメツキを施す事ができる効果
があり、また被メツキ物の低電流部位の形状にあ
わせて比較的加工性のよい金属を選定し、予め加
工して該加工物にコバルトメツキを施してそれを
補助陽極として使用する事により、コバルトの加
工性の悪いと言う、補助陽極として使用するにあ
たつての重大な欠点を回避して簡単に作業を行う
事ができる効果があり、断面Cの字形状物の内側
の影の部分の通常のニツケルメツキ方法では電流
密度が低く、メツキの付きが悪い部分や管状物の
内部についても他の部分と同様に良好なニツケル
メツキを施す事ができる効果がある。
また、コバルトメツキを被着した金属塊を主陽
極として使用する事により、被メツキ物の被メツ
キ面積に対して十分な表面積を持つ陽極を挿入不
可能な場所についても、十分かつ短時間でメツキ
作業を行う事ができる。[Table] In addition, the cathodes of both power supplies are placed on the electroforming mother mold 1 and the power supply body 16.
Connect using. And each 1~6A/
To obtain a uniform and sufficient thickness of nickel coating even on the low current density portion of the recess of the electroforming mold 1 without causing embrittlement of the precipitated nickel by applying current at a current density of dm 2 and precipitating nickel appropriately. Can be done. Incidentally, better results can be obtained if the plating liquid 11 is slightly stirred during the plating operation. Example 2 The present invention uses a cobalt-plated metal lump as an anode for the nickel plating method.As in the example, the nickel anode can be used as the main anode, and the metal lump of the invention can be used as the auxiliary anode. Although this is preferred, in special cases it is also possible to use the cobalt-plated metal block of the present invention as the main anode, as shown in the following embodiments. An example of application of the present invention to plating the inner surface of a steel pipe is shown below. FIG. 3 shows an application of the nickel plating method according to the present invention to nickel plating the inner surface of a steel pipe. In the figure, 15 indicates an inner diameter of φ50~
It is a φ500 steel pipe. 16 is 1/8 of the inner diameter of steel pipe 15
Example 1 A titanium round bar 17 with an outer diameter of ~3/4
This is a cobalt-plated metal lump having a cobalt-plated tank 18 coated on its surface by the method shown in FIG.
And as shown in Figure 3, cobalt plated metal block 1
6 is immersed in the plating rod 20 filled with the plating liquid 19 having the composition shown in Table 2 so as to be located in the center of the steel pipe, and the anode of the DC power supply 21 is connected to the cobalt plating metal block, and the cathode of the DC power supply is connected to the steel pipe. Connect to 15,
Nickel plating can be favorably deposited on the inner surface of the steel pipe 15 by applying current at a current density of 1 to 6 A/dm 2 . (Effects) By using cobalt as an auxiliary anode for nickel plating, the present invention has higher anode current efficiency than conventional anodes, and has a large effect of improving current density in low current areas of the object to be plated. It has the effect of reducing the occurrence of sludge, making it possible to finish the plated surface with a smooth or uniform gloss, and making it possible to perform nickel plating without causing embrittlement of the precipitated nickel.It also has the effect of being able to perform nickel plating according to the shape of the low current area of the object to be plated. By selecting a metal with relatively good workability, processing it in advance, applying cobalt plating to the workpiece, and using it as an auxiliary anode, it is possible to eliminate the possibility of using it as an auxiliary anode, where cobalt has poor workability. This has the effect of making it easier to work by avoiding the serious drawbacks that occur when nickel plating occurs, and the current density is low when using the normal nickel plating method on the inner shaded area of objects with a C-shaped cross section, resulting in poor plating. There is an effect that good nickel plating can be applied to the inside of the parts and tubular objects as well as other parts. In addition, by using a metal block coated with cobalt plating as the main anode, it is possible to plate areas where it is impossible to insert an anode with a sufficient surface area for the area to be plated, in a sufficient amount of time and in a short time. I can do the work.
第1図は、本発明のニツケルメツキ法を電鋳に
応用した場合の説明図であり、第2図は予め成形
した金属塊にコバルトメツキを施す際の説明図で
あり、第3図は本考案のニツケルメツキ法を鋼管
の内面のメツキに応用したものである。
1……電鋳母型(被メツキ物)、2……低電流
部位、3……ニツケル電極、4,16……コバル
トメツキ金属塊、11,19……電解液、12,
20……ニツケルメツキ槽、13,14,21…
…直流電源、15……鋼管(被メツキ物)。
Fig. 1 is an explanatory diagram when the nickel plating method of the present invention is applied to electroforming, Fig. 2 is an explanatory diagram when applying cobalt plating to a preformed metal lump, and Fig. 3 is an explanatory diagram when applying the nickel plating method of the present invention to electroforming. This is an application of the Nickel plating method described above to plating the inner surface of steel pipes. 1... Electroforming mother mold (object to be plated), 2... Low current part, 3... Nickel electrode, 4, 16... Cobalt plating metal lump, 11, 19... Electrolyte, 12,
20...Nickelmetsuki tank, 13, 14, 21...
...DC power supply, 15... Steel pipe (object to be plated).
Claims (1)
可能に成形した金属塊表面に、コバルトメツキを
施し、該コバルトメツキ金属塊が被メツキ物の低
電流密度部位に近接した状態にコバルトメツキ金
属塊および、被メツキ物をニツケル電解液を満た
したニツケルメツキ槽中に浸漬し、またニツケル
電極も同様にニツケルメツキ槽内に浸漬して直流
電源の陽極にニツケル電極とコバルトメツキ金属
塊を、陰極に被メツキ物を接続し、通電して行う
事を特徴とするニツケルメツキ法。 2 予め、被メツキ物のメツキ希望部位に、近接
可能に、成形した金属塊表面に、コバルトメツキ
を施し、該コバルトメツキ金属塊と被メツキ物を
ニツケル電解液を満たしたニツケルメツキ槽内に
両者を近接して浸漬し、直流電源の陽極にコバル
トメツキ金属塊、陰極に被メツキ物を接続し、通
電して行う事を特徴とするニツケルメツキ法。[Scope of Claims] 1 Cobalt plating is applied to the surface of a metal lump formed in advance so that it can be brought close to a low current density area of the object to be plated, and the cobalt plated metal lump is brought close to the low current density area of the object to be plated. In this state, the cobalt plating metal lump and the object to be plated are immersed in a nickel plating tank filled with nickel electrolyte, and the nickel electrode is similarly immersed in the nickel plating tank, and the nickel electrode and the cobalt plating metal are connected to the anode of the DC power supply. The nickel plating method is characterized by connecting the mass to the cathode to the object to be plated and applying electricity. 2 Cobalt plating is applied to the surface of the formed metal lump in advance so that it can be approached to the desired part of the object to be plated, and the cobalt-plated metal lump and the object to be plated are placed in a nickel plating tank filled with nickel electrolyte. The nickel plating method is characterized by immersing them in close proximity, connecting the cobalt plating metal block to the anode of a DC power supply, and the object to be plated to the cathode, and applying electricity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27764185A JPS62136595A (en) | 1985-12-09 | 1985-12-09 | Nickel plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27764185A JPS62136595A (en) | 1985-12-09 | 1985-12-09 | Nickel plating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62136595A JPS62136595A (en) | 1987-06-19 |
| JPH0141719B2 true JPH0141719B2 (en) | 1989-09-07 |
Family
ID=17586259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27764185A Granted JPS62136595A (en) | 1985-12-09 | 1985-12-09 | Nickel plating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62136595A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060042932A1 (en) * | 2004-08-25 | 2006-03-02 | Rosenzweig Mark A | Apparatus and method for electroplating a workpiece |
| CN104099658A (en) * | 2014-08-04 | 2014-10-15 | 葛婕 | Auxiliary anode for use in acid zinc-nickel alloy electroplating |
| JP2018042966A (en) * | 2016-09-13 | 2018-03-22 | 恵美子 新居 | Decorative Product Plating Process and Decorative Product |
| CN115058759B (en) * | 2022-07-04 | 2024-05-24 | 厦门海辰新材料科技有限公司 | Electroplating equipment and film plating machine |
-
1985
- 1985-12-09 JP JP27764185A patent/JPS62136595A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62136595A (en) | 1987-06-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6877650B2 (en) | Method of manufacturing electrode catalyst | |
| US4033837A (en) | Plated metallic cathode | |
| CN105063676A (en) | Method for electroplating hard chromium by using trivalent chromium | |
| CN107904632B (en) | Electroplating equipment | |
| CN110453261B (en) | Material surface modification method and device based on electrochemistry | |
| JPH0141719B2 (en) | ||
| CN107620116A (en) | A kind of powder metallurgy zirconium-base alloy surface treatment method | |
| US3111464A (en) | Electrodeposition of chromium and chromium alloys | |
| US3515650A (en) | Method of electroplating nickel on an aluminum article | |
| CN103572339B (en) | A kind of method at surface of low-carbon steel electroplated Ni-Mn alloy | |
| Diggin | Nickel plating from the sulphamate solution | |
| US3769181A (en) | Method of simultaneously electroplating and machining a metal surface | |
| SE441011B (en) | PROCEDURE FOR ELECTROLYTIC EXPOSURE OF LAYER OF NICKEL ALLOYS | |
| CN103849908A (en) | Trivalent chromium plating liquid and method for electrically depositing chromium plating layer in trivalent chromium plating liquid | |
| US3054737A (en) | Process and bath for electrosmoothing ferrous metals | |
| KR860001221A (en) | Metal Plating Method of Stainless Steel | |
| JP2004265695A (en) | Fuel cell separator | |
| JPS62297492A (en) | Method for plating aluminum by electrolytic activation | |
| US3207680A (en) | Method of electrodepositing iridium | |
| US2574305A (en) | Activating process for plating | |
| JP3262588B2 (en) | Electric Ni / P alloy plating bath | |
| US4177129A (en) | Plated metallic cathode | |
| JP3224401B2 (en) | Electrodeposition method of metal coating | |
| JPH08260198A (en) | Surface treatment method for aluminum material | |
| US3373092A (en) | Electrodeposition of platinum group metals on titanium |