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JPH0142739B2 - - Google Patents
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JPH0142739B2 - - Google Patents

Info

Publication number
JPH0142739B2
JPH0142739B2 JP10371284A JP10371284A JPH0142739B2 JP H0142739 B2 JPH0142739 B2 JP H0142739B2 JP 10371284 A JP10371284 A JP 10371284A JP 10371284 A JP10371284 A JP 10371284A JP H0142739 B2 JPH0142739 B2 JP H0142739B2
Authority
JP
Japan
Prior art keywords
raw material
gas
condenser
pipe
mixed gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10371284A
Other languages
Japanese (ja)
Other versions
JPS60248228A (en
Inventor
Ichiro Tsucha
Masanobu Yoshida
Hiroaki Takimoto
Hiroshi Yokota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP10371284A priority Critical patent/JPS60248228A/en
Publication of JPS60248228A publication Critical patent/JPS60248228A/en
Publication of JPH0142739B2 publication Critical patent/JPH0142739B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices
    • B01J4/008Feed or outlet control devices
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/80Feeding the burner or the burner-heated deposition site
    • C03B2207/85Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)

Description

【発明の詳細な説明】 <技術分野> 本発明は光フアイバや半導体製造装置におい
て、精密に流量がコントロールされた原料ガスを
反応装置へ送るためのバブリング装置に係る。
DETAILED DESCRIPTION OF THE INVENTION <Technical Field> The present invention relates to a bubbling device for sending raw material gas whose flow rate is precisely controlled to a reaction device in optical fiber or semiconductor manufacturing equipment.

<従来技術> 光フアイバや半導体製造装置において原料液を
保つたバブラー容器にキヤリアガスを送給して原
料液をバブリングし、原料ガスとキヤリアガスの
混合気体にして配管を通じて反応装置へ送るバブ
リング装置は広く用いられている。このようなバ
ブリング装置においては混合気体中の原料ガスの
流量を精密にコントロールするための一方法とし
てバブラー容器に導入するキヤリアガスの流量を
精密にコントロールするとともに、混合気体が送
通する上記配管中に一定温度に保たれたコンデン
サを介装し、コンデンサによつて混合ガスをコン
デンサの温度における原料ガスの飽和蒸気とする
ことが知られている。このような従来のバブリン
グ装置の1例の構成図を第1図に示す。第1図に
示すバブリング装置によれば、気密なバブラー容
器1には原料液2が収容されるとともに、バブラ
ー容器1の外周面にはヒータ3が装着されてバブ
ラー容器1の原料液を所定の温度に保つている。
バブラー容器1には液2中に開放端を有する配管
4が挿入されている。配管4には精密流量計5が
介装されている。精密流量計5としては質量流量
計が広く用いられ、配管4内を流れバブラー容器
1へ供給されるキヤリアガスの流量を精密に測定
している。一方気密なバブラー容器1の原料液2
の上部空間に吸入端Pをもつ配管6が導出され、
配管6はコンデンサ7の巻管9の下端Qへ接続さ
れている。コンデンサ7は循環水等によつて一定
温度に保たれている。巻管9の上端Rには反応容
器(図示せず)に導かれる配管8が接続されてい
る。配管6と配管8には加熱手段(図示せず)が
設けられている。第1図に示す装置において、キ
ヤリアガスが精密流量計5で精密に流量コントロ
ールされ、配管4を通じてバブラー容器1の原料
液2内へ送給される。キヤリアガスはバブラー容
器1の原料液2をバブリングすることによつて、
バブラー容器1の原料液2の上部空間にキヤリア
ガスと原料ガスの混合ガスを充満する。キヤリア
ガスの流量が多い場合、通常混合ガスはバブラー
容器温度では原料ガスの飽和蒸気とはならないの
で、コンデンサ7の出口で混合ガスをコンデンサ
温度での原料ガスの飽和蒸気とするために原料液
2の液温はヒータ3によつてコンデンサ温度より
高く保たれる。通常原料液温度とコンデンサ温度
の差は5℃〜10℃である。バブラー容器上部の混
合ガスは配管6、コンデンサ7、配管8を経て反
応容器に導かれる。コンデンサ7は循環温水によ
つて一定温度に保たれており、コンデンサ7を通
過した混合ガスはコンデンサ温度まで冷却されコ
ンデンサ温度の飽和蒸気となる。この過程で過剰
の原料ガスはコンデンサ内の巻管9内で凝縮し、
凝縮した原料液は重力によつて巻管9から配管6
を経てバブラー容器1へ戻る。配管6及び配管8
はこれら配管内で混合ガスの原料ガスが凝縮しな
いようにコンデンサ温度以上に保たれる。かくし
てキヤリアガスの流量を精密に制御し混合ガスを
コンデンサ温度での飽和蒸気とすることにより、
原料ガスの分圧を一定にすることによつて原料ガ
スの流量が精密に制御された混合ガスを反応容器
へ送ることができる。しかしこのようなバブリン
グ装置では混合ガス流量が増加していくと、コン
デンサ内で凝縮しバブラー容器へ落下しようとす
る原料液と反応容器へ向う混合ガス流は向きが逆
のため、原料液の巻管9内での流れが阻害されて
配管6を通じてバブラー容器1へ戻ることができ
ずコンデンサ巻管9内に滞留したり、あるいはコ
ンデンサ7から反応容器の方へ流れるようにな
る。このような状態を放置しておくと滞留した凝
縮液によりコンデンサ7内の混合ガス流に対する
管内抵抗が増大し、原料ガスを反応容器へ安定し
て送れなくなつたり、コンデンサ巻管9内を逆流
した原料液が配管8に達し、高温の配管8内で再
気化し、反応容器へ送られることによつて、コン
デンサ7による原料ガスの流量制御の機能が失な
われ、目的を達することができなくなる。このよ
うな問題を解決する最も簡単な手段はコンデンサ
の巻管9の内径を太くすることである。しかしコ
ンデンサの巻管9の内径を太くするにはコンデン
サを大型にしなければならない欠点がある。また
コンデンサの巻管を複数本並列に接続して、巻管
1本当りの混合ガス流を減らす手段もあるが、こ
の場合混合ガス流を全ての巻管に一様に分流する
ことが難かしいのに加えてコンデンサ全体の大き
さも大きくなる欠点がある。
<Prior art> Bubbling devices are widely used in optical fiber and semiconductor manufacturing equipment, which supply a carrier gas to a bubbler container holding a raw material liquid to bubble the raw material liquid, convert it into a mixed gas of the raw material gas and carrier gas, and send it to a reaction device through piping. It is used. In such a bubbling device, as a method for precisely controlling the flow rate of the raw material gas in the mixed gas, the flow rate of the carrier gas introduced into the bubbler container is precisely controlled, and the flow rate of the carrier gas introduced into the bubbler container is precisely controlled. It is known that a condenser maintained at a constant temperature is interposed, and the condenser converts the mixed gas into saturated vapor of the raw material gas at the temperature of the condenser. A block diagram of an example of such a conventional bubbling device is shown in FIG. According to the bubbling device shown in FIG. 1, a raw material liquid 2 is stored in an airtight bubbler container 1, and a heater 3 is attached to the outer peripheral surface of the bubbler container 1 to control the raw material liquid in the bubbler container 1 to a predetermined level. Keeps at temperature.
A pipe 4 having an open end is inserted into the bubbler container 1 into the liquid 2. A precision flow meter 5 is interposed in the pipe 4. As the precision flowmeter 5, a mass flowmeter is widely used to precisely measure the flow rate of the carrier gas flowing through the pipe 4 and supplied to the bubbler container 1. On the other hand, the raw material liquid 2 in the airtight bubbler container 1
A pipe 6 having a suction end P is led out to the upper space of
The pipe 6 is connected to the lower end Q of the winding tube 9 of the condenser 7. The condenser 7 is kept at a constant temperature by circulating water or the like. A pipe 8 leading to a reaction container (not shown) is connected to the upper end R of the winding tube 9. The piping 6 and the piping 8 are provided with heating means (not shown). In the apparatus shown in FIG. 1, the flow rate of the carrier gas is precisely controlled by a precision flowmeter 5, and the carrier gas is fed into the raw material liquid 2 of the bubbler container 1 through the piping 4. The carrier gas is produced by bubbling the raw material liquid 2 in the bubbler container 1.
The space above the raw material liquid 2 in the bubbler container 1 is filled with a mixed gas of carrier gas and raw material gas. When the flow rate of the carrier gas is large, the mixed gas usually does not become saturated vapor of the raw material gas at the temperature of the bubbler container. The liquid temperature is kept higher than the capacitor temperature by the heater 3. Usually, the difference between the raw material liquid temperature and the capacitor temperature is 5°C to 10°C. The mixed gas in the upper part of the bubbler container is led to the reaction container via piping 6, condenser 7, and piping 8. The condenser 7 is kept at a constant temperature by circulating hot water, and the mixed gas that has passed through the condenser 7 is cooled to the condenser temperature and becomes saturated steam at the condenser temperature. In this process, excess raw material gas condenses in the winding tube 9 inside the condenser,
The condensed raw material liquid is transferred from the winding pipe 9 to the pipe 6 by gravity.
, and then return to bubbler container 1. Piping 6 and Piping 8
is kept above the condenser temperature to prevent the raw material gas of the mixed gas from condensing in these pipes. In this way, by precisely controlling the flow rate of the carrier gas and making the mixed gas a saturated vapor at the condenser temperature,
By keeping the partial pressure of the raw material gas constant, a mixed gas with a precisely controlled flow rate of the raw material gas can be sent to the reaction vessel. However, in such a bubbling device, as the mixed gas flow rate increases, the raw material liquid condenses in the condenser and falls into the bubbler container, and the mixed gas flow toward the reaction container is in the opposite direction. The flow within the pipe 9 is obstructed, and the water cannot return to the bubbler vessel 1 through the pipe 6, and instead remains in the condenser tube 9, or flows from the condenser 7 toward the reaction vessel. If this condition is left untreated, the accumulated condensate will increase the resistance in the pipe to the mixed gas flow in the condenser 7, making it impossible to stably send the raw material gas to the reaction vessel, or causing backflow inside the condenser tube 9. The raw material liquid reaches the pipe 8, is re-vaporized in the high-temperature pipe 8, and is sent to the reaction vessel, causing the condenser 7 to lose its function of controlling the flow rate of the raw material gas, making it impossible to achieve the purpose. It disappears. The simplest means to solve this problem is to increase the inner diameter of the condenser tube 9. However, in order to increase the inner diameter of the winding tube 9 of the capacitor, there is a drawback that the capacitor must be made larger. Another method is to connect multiple condenser winding tubes in parallel to reduce the mixed gas flow per winding tube, but in this case it is difficult to divide the mixed gas flow uniformly to all the winding tubes. In addition to this, there is a disadvantage that the overall size of the capacitor becomes large.

<発明の目的> 本発明はかかる従来技術の欠点に鑑みてなされ
たもので、安定して大流量の原料ガスを反応装置
に送ることを可能にしたバブリング装置を提供す
ることを目的とするものである。
<Object of the invention> The present invention has been made in view of the drawbacks of the prior art, and an object of the present invention is to provide a bubbling device that can stably send a large flow rate of raw material gas to a reaction device. It is.

<問題点解決の具体的手段> かかる目的を達成した第1の発明によるバブリ
ング装置の構成は、バブラー容器に保たれた液体
の原料をキヤリアガスでバブリングしてキヤリア
ガスと原料ガスの混合ガスを作り、該、混合ガス
を一定温度に保たれたコンデンサの巻管を通過さ
せて、該混合ガスをコンデンサの上記温度におけ
る原料ガスの飽和蒸気として反応装置に導くバブ
リング装置において、上記バブラー容器から反応
装置に上記混合ガスを供給する配管が、上記バブ
ラー容器の液体上部の空間から導出され、上記コ
ンデンサの巻管の上端から下端を経て、さらに下
端に設けられた2分岐管の一方の上方に向う分岐
を経て上記反応装置に導かれ、上記分岐管の他方
の下方に向う分岐は上記容器の液体中に開放され
ていることを特徴とするものである。
<Specific means for solving the problem> The configuration of the bubbling device according to the first invention that achieves the above object includes bubbling a liquid raw material kept in a bubbler container with a carrier gas to create a mixed gas of the carrier gas and the raw material gas, In the bubbling device, the mixed gas is passed through a winding tube of a condenser kept at a constant temperature, and the mixed gas is introduced into the reactor as saturated vapor of the raw material gas at the above-mentioned temperature of the condenser, from the bubbler container to the reactor. A pipe for supplying the mixed gas is led out from the space above the liquid in the bubbler container, passes from the upper end of the winding tube of the condenser to the lower end, and further connects an upward branch to one of the two branch pipes provided at the lower end. The other downward branch of the branch pipe is opened into the liquid in the container.

また第2の発明のバブリング装置の構成は、バ
ブラー容器に保たれた原料の液体をキヤリアガス
でバブリングしてキヤリアガスと原料ガスの混合
ガスを作り、該混合ガスを一定温度に保たれたコ
ンデンサの巻管を通過させて、該混合ガスを上記
コンデンサの温度における原料ガスの飽和蒸気と
して反応装置に導くバブリング装置において、上
記バブラー容器から反応装置に上記混合ガスを供
給する配管が、上記バブラー容器の液体上部空間
から導出され、上記コンデンサの巻管の上端から
下端を経、下端に設けられた2分岐管の一方の上
方に向う分岐を経て上記反応装置へ導かれ、上記
分岐管の他方の下方に向う分岐は液溜に導かれ、
該液溜の下端には開閉弁を経て上記バブラー容器
に開放された配管が導出されていることを特徴と
するものである。
Further, the configuration of the bubbling device of the second invention is such that a raw material liquid kept in a bubbler container is bubbled with a carrier gas to create a mixed gas of the carrier gas and the raw material gas, and the mixed gas is wrapped around a condenser kept at a constant temperature. In the bubbling device, the mixed gas is passed through a pipe and guided to the reaction device as saturated vapor of the raw material gas at the temperature of the condenser, and the pipe for supplying the mixed gas from the bubbler container to the reaction device is configured to supply the liquid in the bubbler container. It is led out from the upper space, passes from the upper end of the winding tube of the condenser to the lower end, passes through an upward branch of one of the two branch pipes provided at the lower end, is led to the reaction apparatus, and is led to the lower part of the other branch pipe. The opposite branch is led to a liquid reservoir,
The liquid reservoir is characterized in that a pipe that is open to the bubbler container is led out through an on-off valve to the lower end of the liquid reservoir.

<実施例> 本発明によるバブリング装置の実施例を図面に
従つて説明する。
<Example> An example of a bubbling device according to the present invention will be described with reference to the drawings.

第2図は本発明によるバブリング装置の構成図
である。第2図に示す如く、気密なバブラー容器
1には光フアイバや半導体製造用の原料液2が収
容されていて、その外周面にはヒータ3が装置さ
れている。ヒータ3は原料液2を所定の温度に保
つためのものである。バブラー容器1にはキヤリ
アガスを供給する配管4が原料液2中に挿入され
ている。配管4の途中には送給されるキヤリアガ
スの流量を測定する精密流量計5が介装されてい
る。精密流量計5としては質量流量計が広く用い
られる。一方バブラー容器1の原料液2の上部空
間に開放端Pをもつ配管6が導出されている。バ
ブラー容器1の原料液2の上部空間にはバブラー
容器1内へ送給されたキヤリアガスと原料液が気
化した原料ガスの混合ガスが充満され、配管6を
経てコンデンサ7の巻管9の上端Rへ供給され
る。巻管9の下端Qには2分岐管が設けてあり、
一方の上に向う分岐は配管11、配管8を経て反
応容器(図示せず)へ連通している。2分岐管の
他方の下方に向う分岐は開放端をバブラー容器の
原料液2の中へ挿入した配管10に連結してい
る。
FIG. 2 is a block diagram of a bubbling device according to the present invention. As shown in FIG. 2, an airtight bubbler container 1 contains a raw material liquid 2 for manufacturing optical fibers and semiconductors, and a heater 3 is installed on the outer peripheral surface of the container. The heater 3 is for maintaining the raw material liquid 2 at a predetermined temperature. A piping 4 for supplying carrier gas is inserted into the raw material liquid 2 in the bubbler container 1 . A precision flow meter 5 is interposed in the middle of the pipe 4 to measure the flow rate of the carrier gas being fed. As the precision flowmeter 5, a mass flowmeter is widely used. On the other hand, a pipe 6 having an open end P is led out into the space above the raw material liquid 2 in the bubbler container 1 . The space above the raw material liquid 2 in the bubbler container 1 is filled with a mixed gas of the carrier gas fed into the bubbler container 1 and the raw material gas obtained by vaporizing the raw material liquid. supplied to A two-branch pipe is provided at the lower end Q of the winding pipe 9,
One upward branch communicates with a reaction vessel (not shown) via piping 11 and piping 8. The other downward branch of the two-branch pipe has an open end connected to a pipe 10 inserted into the raw material liquid 2 of the bubbler container.

なお、コンデンサ7は循環温水によつて一定温
度に保たれている。配管6によつてコンデンサ7
の巻管9の上端Rへ供給された混合ガスはコンデ
ンサ7の巻管9内で所定の温度に冷却され、原料
ガスはその温度での飽和蒸気となる。この過程で
過剰の原料ガスは巻管9内で凝縮し、凝縮した原
料液は巻管9内を重力によつて落下し、分岐管、
配管10を経て原料液2中に戻る。また飽和蒸気
の原料ガスとキヤリアガスの混合ガスは巻管9の
下端Qの分岐管、配管11、配管8を経て反応容
器へ送られる。配管11は図示のものは直管であ
るが巻管であつてもよい。配管6及び配管8は管
内で混合ガス中の原料ガスが凝縮しないのに必要
な温度以上に保たれている。
Note that the condenser 7 is kept at a constant temperature by circulating hot water. Condenser 7 by pipe 6
The mixed gas supplied to the upper end R of the winding tube 9 of the condenser 7 is cooled to a predetermined temperature within the winding tube 9 of the condenser 7, and the raw material gas becomes saturated vapor at that temperature. In this process, excess raw material gas condenses inside the winding tube 9, and the condensed raw material liquid falls through the winding tube 9 due to gravity, leading to branch pipes,
It returns to the raw material liquid 2 via the pipe 10. Further, the mixed gas of the saturated steam raw material gas and the carrier gas is sent to the reaction vessel via the branch pipe at the lower end Q of the winding tube 9, the pipe 11, and the pipe 8. Although the illustrated pipe 11 is a straight pipe, it may be a wound pipe. The piping 6 and the piping 8 are maintained at a temperature higher than that required to prevent the raw material gas in the mixed gas from condensing within the pipes.

第2図に示す本発明によるバブリング装置を用
いて、原料ガスの流量が精密にコントロールされ
た混合ガスを反応容器へ送るのは以下の方法によ
る。キヤリアガスを精密流量計5で精密に流量を
コントロールして配管4を通じてバブラー容器1
内の原料液2内に導入する。バブラー容器1内で
キヤリアガスで原料液をバブリングすることによ
つてバブラー容器1上部ではキヤリアガスと原料
ガスの混合ガスとなる。キヤリアガスの流量が多
い場合、通常混合ガスはバブラー容器温度での原
料ガスの飽和蒸気とはならない。コンデンサ出口
で混合ガスをコンデンサ温度での原料ガスの飽和
蒸気とするために原料液2の液温はヒータ3によ
つてコンデンサ温度より高く保たれている。通常
原料液温とコンデンサ温度の温度差は5℃〜10℃
である。コンデンサ7内で混合ガスは配管6に沿
つてコンデンサ上部の巻管9の上端Rまで上昇し
た後、下向きの巻管9に沿つて下降し、巻管の下
端Qの2分岐管によつて一方の上方に向う分岐は
配管11に入り、コンデンサ内を通過し、コンデ
ンサ出口Sで配管8に連通されて反応容器へ送給
される。コンデンサ7は循環温水で一定温度に保
たれており、コンデンサ7を上から下へ通過した
混合ガスはコンデンサ温度まで冷却され、混合ガ
ス内の原料ガスはコンデンサ温度の飽和蒸気とな
る。この過程で過剰の原料ガスはコンデンサ内の
配管内で凝縮し、凝縮した原料液は配管にそつて
流下しバブラー容器1へ戻る。配管6のコンデン
サ7の入口からコンデンサ巻管9の上端Rまでに
配管6内で凝縮した原料液は垂直な配管6を通つ
て混合ガスと逆行して流下しバブラー容器1へ戻
る。なお、配管6内を流下する原料液は混合ガス
と逆行するが、配管6は直管であり、阻害されず
流下する。コンデンサ巻管9の上端Rから下端Q
までの間で凝縮した原料液は勾配の緩やかな巻管
9にそつて流下するが、混合ガス流と原料液の流
下の方向が同一であるため混合ガス流によつて原
料液の流れが阻害されることはなくむしろ加速さ
れて巻管9にそつて下端まで流れる。巻管9の下
端Qの分岐管を経て配管10を経てバブラー容器
1へ戻る。この際配管10の開放端Tは原料液2
中に設けられていることが望ましく、もしそうで
ないと混合ガスが配管10を通つてコンデンサ内
の配管11に進入し、配管8へ抜けてしまうので
コンデンサ温度における原料ガスの飽和蒸気が得
られない。分岐管を通過した混合ガスはコンデン
サ7に設けられた配管11を経て、コンデンサの
出口Sで接続された配管8を介して反応容器へ送
られる。配管11を混合ガスが通過するとき、原
料ガスはコンデンサの巻管で充分に冷却されてい
るため、配管11で凝縮する原料液は少なく、た
とえ凝縮されても、配管11は直管であるので混
合ガスと逆行しても流下する原料液に作用する重
力は大きく問題にならない。コンデンサ7に導入
される配管6及びコンデンサ7から導出される配
管8は共に配管内で原料ガスが凝縮しない必要温
度以上に保たれる。
Using the bubbling device according to the present invention shown in FIG. 2, a mixed gas whose flow rate of raw material gas is precisely controlled is sent to a reaction vessel by the following method. The flow rate of the carrier gas is precisely controlled using a precision flowmeter 5, and the carrier gas is passed through piping 4 to bubbler container 1.
into the raw material liquid 2 inside. By bubbling the raw material liquid with the carrier gas in the bubbler container 1, a mixed gas of the carrier gas and the raw material gas is formed in the upper part of the bubbler container 1. When the flow rate of the carrier gas is large, the mixed gas usually does not become saturated vapor of the raw material gas at the temperature of the bubbler container. The liquid temperature of the raw material liquid 2 is kept higher than the condenser temperature by the heater 3 in order to make the mixed gas into saturated vapor of the raw material gas at the condenser temperature at the condenser outlet. Normally the temperature difference between raw material liquid temperature and capacitor temperature is 5℃~10℃
It is. In the condenser 7, the mixed gas rises along the piping 6 to the upper end R of the winding tube 9 at the top of the condenser, then descends along the downward winding tube 9, and is transferred to one side by a two-branch pipe at the lower end Q of the winding tube. The upward branch enters the pipe 11, passes through the condenser, is communicated with the pipe 8 at the condenser outlet S, and is fed to the reaction vessel. The condenser 7 is kept at a constant temperature with circulating hot water, and the mixed gas that has passed through the condenser 7 from top to bottom is cooled to the condenser temperature, and the raw material gas in the mixed gas becomes saturated vapor at the condenser temperature. In this process, excess raw material gas is condensed in the piping inside the condenser, and the condensed raw material liquid flows down along the piping and returns to the bubbler container 1. The raw material liquid condensed in the pipe 6 from the inlet of the condenser 7 of the pipe 6 to the upper end R of the condenser winding tube 9 flows down through the vertical pipe 6 in a direction opposite to the mixed gas and returns to the bubbler container 1 . Note that although the raw material liquid flowing down inside the pipe 6 flows in the opposite direction to the mixed gas, the pipe 6 is a straight pipe and flows downward without being obstructed. From the upper end R to the lower end Q of the capacitor winding tube 9
The raw material liquid condensed between 1 and 2 flows down along the winding pipe 9 with a gentle slope, but since the flow direction of the mixed gas flow and the raw material liquid are the same, the flow of the raw material liquid is obstructed by the mixed gas flow. Rather, it is accelerated and flows along the winding tube 9 to the lower end. It returns to the bubbler container 1 through a branch pipe at the lower end Q of the winding tube 9 and through a piping 10. At this time, the open end T of the pipe 10 is connected to the raw material liquid 2.
If not, the mixed gas will enter the pipe 11 in the condenser through the pipe 10 and escape to the pipe 8, making it impossible to obtain saturated vapor of the source gas at the condenser temperature. . The mixed gas that has passed through the branch pipe passes through a pipe 11 provided in the condenser 7 and is sent to the reaction vessel via a pipe 8 connected at the outlet S of the condenser. When the mixed gas passes through the pipe 11, the raw material gas is sufficiently cooled by the winding tube of the condenser, so there is little raw material liquid condensed in the pipe 11, and even if it is condensed, the pipe 11 is a straight pipe. Even if it moves against the mixed gas, the gravity acting on the flowing raw material liquid does not pose a big problem. Both the pipe 6 introduced into the condenser 7 and the pipe 8 led out from the condenser 7 are maintained at a temperature higher than the required temperature so that the raw material gas does not condense within the pipes.

本発明によるバブリング装置によれば、キヤリ
アガスの流量をキヤリアガス流量計で精密に制御
し、コンデンサ7によつて原料ガスを飽和蒸気と
することによつて、大流量の所定の濃度の原料ガ
スを安定して反応容器へ送給することを可能とし
たものである。
According to the bubbling device of the present invention, the flow rate of the carrier gas is precisely controlled by the carrier gas flowmeter, and the raw material gas is made into saturated vapor by the condenser 7, thereby stabilizing the raw material gas at a predetermined concentration at a large flow rate. This makes it possible to feed the reactor to the reaction vessel.

第2図の装置を使つた場合、配管10から混合
ガスがコンデンサ内に入らないようにするため、
配管10の開放端Tは原料液内に開放されてい
る。このためバブラー容器1空隙部とコンデンサ
7の巻管の下端の分岐管部Qとの圧力差は、原料
液がこの圧力差で配管10内を上昇し、分岐管部
Qまで達する程大きくならないようにする必要が
ある。通常この間の圧力差は10mmH2O程度で、
原料液面の配管10内での上昇は1cm程度である
ので問題にならない。しかしこの問題をさらに解
決した本発明によるバブリング装置の他の実施例
を第3図に示す。
When using the device shown in Figure 2, in order to prevent mixed gas from entering the condenser from the pipe 10,
The open end T of the pipe 10 is open into the raw material liquid. Therefore, the pressure difference between the cavity of the bubbler container 1 and the branch pipe part Q at the lower end of the winding tube of the condenser 7 should not become so large that the raw material liquid rises in the pipe 10 due to this pressure difference and reaches the branch pipe part Q. It is necessary to Normally, the pressure difference during this period is about 10mmH 2 O,
The rise in the raw material liquid level within the pipe 10 is about 1 cm, so it is not a problem. However, another embodiment of the bubbling device according to the present invention, which further solves this problem, is shown in FIG.

第3図のものは第2図に示す実施例を比較する
と、コンデンサ7の下端Qに設けられた分岐管の
1方の上方に向う分岐は配管11に接続され、他
方の下方に向う分岐は配管10を経て、液溜1
2、開閉バルブ13、配管10を経て、配管10
の開放端Tはバブラー容器1に(必ずしも液中で
ある必要はない。)開放されている。第3図のも
のは配管10の部分でのみ第2図のものと相異
し、その他の部分は同一である。従つて第3図の
実施例では、コンデンサ7内の巻管9及び配管1
1で凝縮された原料液はそれぞれ巻管9内及び直
管11内を流下し、分岐管を経由して配管10を
通じてバブラー容器1へ戻される代りに、配管1
0の中途に設けられた液溜12に回収される。回
収された原料液はバブラー容器に原料液を供給し
ていない時に開閉弁13を開いて液溜12の原料
液をバブラー容器へ戻すものである。
Comparing the embodiment shown in FIG. 3 with the embodiment shown in FIG. 2, one upward branch of the branch pipe provided at the lower end Q of the condenser 7 is connected to the pipe 11, and the other downward branch is connected to the pipe 11. Via piping 10, liquid reservoir 1
2. Through the on-off valve 13 and piping 10, the piping 10
The open end T of is open to the bubbler container 1 (not necessarily in the liquid). The one in FIG. 3 differs from the one in FIG. 2 only in the piping 10, and the other parts are the same. Therefore, in the embodiment shown in FIG.
The raw material liquid condensed in step 1 flows down inside the winding pipe 9 and straight pipe 11, respectively, and instead of being returned to the bubbler container 1 via the branch pipe and through the pipe 10, it flows into the pipe 1.
The liquid is collected in a liquid reservoir 12 provided halfway through the process. When the recovered raw material liquid is not being supplied to the bubbler container, the on-off valve 13 is opened to return the raw material liquid in the liquid reservoir 12 to the bubbler container.

第3図に示すものは原料液回収用の配管10を
通じてバブラー容器1から混合ガスあるいは原料
液がコンデンサの方へ逆流することは全くない。
In the case shown in FIG. 3, there is no possibility that the mixed gas or the raw material liquid flows back toward the condenser from the bubbler container 1 through the pipe 10 for recovering the raw material liquid.

第4図は本発明によるバブリング装置の他の実
施例の概略構成図である。第2図に示す施例のも
のではコンデンサ内の巻管9を流れる混合ガスの
流速が速い場合、コンデンサ内の巻管9の下端Q
の分岐管において混合ガスと凝縮液のミストが完
全に分離されずに、配管11、配管8の混合ガス
に凝縮液が混合することが起る。第4図に示すも
のは、このような場合にも混合ガスと凝縮液を完
全に分離できるバブリング装置である。第4図に
示すものはコンデンサ7の巻管の下端Qの2分岐
管がガス溜14になつていて、ガス溜14から配
管11が配管8に連通され、ガス溜14から他の
配管10が分岐されて、凝縮された原料液をバブ
ラー容器1へ戻す構成になつているガス溜14に
じやま板15が設けてある。第4図に示す装置に
おいて、速い流速の混合ガスと凝縮液が巻管9の
下端のガス溜に流入すると、流速が下り、凝縮液
と混合ガスが分離される。またじやま板に凝縮液
がぶつかると混合ガスと凝縮液の分離性が更によ
くなる。じやま板で分離された原料液は配管10
を通つてバブラー容器へ戻り、混合ガスは巻管1
1,8を通つて反応容器へ送給される。もちろ
ん、第4図に示すじやま板15を有するガス溜1
4で第3図の2分岐管を構成することができる。
FIG. 4 is a schematic diagram of another embodiment of the bubbling device according to the present invention. In the embodiment shown in FIG. 2, when the flow rate of the mixed gas flowing through the winding tube 9 in the condenser is high, the lower end Q of the winding tube 9 in the condenser
The mist of the mixed gas and the condensate are not completely separated in the branch pipes, and the condensate may mix with the mixed gas in the pipes 11 and 8. What is shown in FIG. 4 is a bubbling device that can completely separate the mixed gas and condensate even in such a case. In the case shown in FIG. 4, a bifurcated pipe at the lower end Q of the winding tube of the condenser 7 serves as a gas reservoir 14, a pipe 11 is connected to the pipe 8 from the gas reservoir 14, and another pipe 10 is connected from the gas reservoir 14 to the pipe 8. A baffle plate 15 is provided in the gas reservoir 14 which is configured to branch and return the condensed raw material liquid to the bubbler container 1. In the apparatus shown in FIG. 4, when the mixed gas and condensate flowing at a high flow rate flow into the gas reservoir at the lower end of the winding tube 9, the flow rate decreases and the condensate and the mixed gas are separated. When the condensate collides with the cutting board, the separation of the mixed gas and condensate becomes even better. The raw material liquid separated by the cutting board is transferred to pipe 10.
The mixed gas returns to the bubbler container through the tube 1.
1 and 8 to the reaction vessel. Of course, the gas reservoir 1 having the jamb plate 15 shown in FIG.
4 can constitute the two-branch pipe shown in FIG.

第2図ないし第4図に示す本発明のバブリング
装置における配管6はコンデンサ7の中を直管で
進み、巻管9の上端Rで巻管に連結されているた
め、混合ガスが配管6のコンデンサ7の中の直管
部を通る際原料ガスが凝縮して配管6に沿つて流
下するが、大流量の混合ガスを流す際、この部分
での凝縮液の逆行を避けたい場合には、加熱され
ている配管6をコンデンサ7の上端までコンデン
サの外に配管して、上端でコンデンサへ導入すれ
ばよい。
The piping 6 in the bubbling device of the present invention shown in FIGS. 2 to 4 runs straight through the condenser 7 and is connected to the winding tube at the upper end R of the winding tube 9, so that the mixed gas flows through the pipe 6. When passing through the straight pipe section in the condenser 7, the raw material gas condenses and flows down along the pipe 6, but if you want to avoid the condensate flowing backwards in this section when flowing a large flow of mixed gas, The heated piping 6 may be piped outside the condenser to the upper end of the condenser 7 and introduced into the condenser at the upper end.

本発明によるバブリング装置の有効性を示す実
験例を以下に示す。バブラー容器1に原料液2と
して四塩化珪素SiCl4が保たれ、ヒータ3により
原料液温度を50℃に保ち、かかるバブラー容器1
に流量計で精密測定されたHeガスのキヤリアガ
スを供給し、混合ガスを作り、44℃に保つた従来
型のコンデンサと本発明のコンデンサ7に送給し
た場合について比較実験を行つた。従来型のバブ
リング装置の場合、コンデンサの巻管内径は10mm
であるが、He流量を400c.c./分として13分Heガ
スをコンデンサ7に流し続けた処、コンデンサ巻
管9内で原料液の滞留を起し、安定な原料ガスの
反応容器への供給ができなくなつた。第2図に示
す本発明のものの場合、コンデンサの巻管内径は
7.5mmであるが、Heガス流量を800c.c./分にして
1時間Heガスを連続して流してもコンデンサ内
での原料液の滞留が起らなかつた。
Experimental examples showing the effectiveness of the bubbling device according to the present invention are shown below. Silicon tetrachloride SiCl 4 is kept as a raw material liquid 2 in a bubbler container 1, and the temperature of the raw material liquid is maintained at 50°C by a heater 3.
A comparative experiment was conducted between a conventional condenser kept at 44°C and a condenser 7 of the present invention, in which a carrier gas of He gas, which was precisely measured with a flowmeter, was supplied to the gas mixture, and a mixed gas was prepared. In the case of conventional bubbling equipment, the inner diameter of the condenser tube is 10 mm.
However, when He gas was continued to flow into the condenser 7 for 13 minutes at a He flow rate of 400 c.c./min, the raw material liquid stagnation occurred in the condenser winding tube 9, and stable raw material gas did not flow into the reaction vessel. The supply was no longer available. In the case of the present invention shown in Fig. 2, the inner diameter of the condenser tube is
Although the diameter of the condenser was 7.5 mm, the raw material liquid did not stagnate in the condenser even when He gas was continuously flowed for 1 hour at a He gas flow rate of 800 c.c./min.

<発明の効果> 本発明によるバブリング装置によれば、コンデ
ンサの巻管に混合ガスを上端から下端に向けて送
給し、コンデンサ内で凝縮された原料液を巻管の
下端に設けられた分岐管を経て収集できるように
したため、コンデンサ内で凝縮した原料液の流下
方向と混合ガスの送給方向が一致し、原料濃度が
一定の大量の原料ガスを安定して反応装置へ送る
ことを可能にした。
<Effects of the Invention> According to the bubbling device according to the present invention, a mixed gas is fed to the winding tube of the condenser from the upper end to the lower end, and the raw material liquid condensed in the condenser is passed through the branch provided at the lower end of the winding tube. Because it can be collected through a pipe, the flow direction of the raw material liquid condensed in the condenser matches the feeding direction of the mixed gas, making it possible to stably send a large amount of raw material gas with a constant raw material concentration to the reactor. I made it.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のバブリング装置の構成図、第2
図は本発明によるバブリング装置の1実施例の構
成図、第3図は本発明の他の実施例の構成図、第
4図は本発明のさらに他の実施例の構成図であ
る。 図面中、1はバブラー容器、2は原料液、3は
ヒータ、4,6,8,10,11は配管、5はガ
ス流量計、7はコンデンサ、9は巻管、12は液
溜、13は開閉弁、14はガス溜、15はじやま
板である。
Figure 1 is a configuration diagram of a conventional bubbling device, Figure 2
3 is a block diagram of one embodiment of the bubbling device according to the present invention, FIG. 3 is a block diagram of another embodiment of the present invention, and FIG. 4 is a block diagram of still another embodiment of the present invention. In the drawing, 1 is a bubbler container, 2 is a raw material liquid, 3 is a heater, 4, 6, 8, 10, 11 are piping, 5 is a gas flow meter, 7 is a condenser, 9 is a winding tube, 12 is a liquid reservoir, 13 14 is an on-off valve, 14 is a gas reservoir, and 15 is a block board.

Claims (1)

【特許請求の範囲】 1 バブラー容器に保たれた液体の原料をキヤリ
アガスでバブリングしてキヤリアガスと原料ガス
の混合ガスを作り、該混合ガスを一定温度に保た
れたコンデンサの巻管を通過させて、該混合ガス
をコンデンサの上記温度における原料ガスの飽和
蒸気として反応装置に導くバブリング装置におい
て、上記バブラー容器から反応装置に上記混合ガ
スを供給する配管が、上記バブラー容器の液体上
部の空間から導出され、上記コンデンサの巻管の
上端から下端を経て、さらに下端に設けられた2
分岐管の一方の上方に向う分岐を経て上記反応装
置に導かれ、上記分岐管の他方の下方に向う分岐
は上記バブラー容器の液体中に開放されているこ
とを特徴とするバブリング装置。 2 上記2分岐管がじやま板を有したガス溜で構
成されていることを特徴とする特許請求の範囲第
1項記載のバブリング装置。 3 バブラー容器に保たれた原料の液体をキヤリ
アガスでバブリングしてキヤリアガスと原料ガス
の混合ガスを作り、該混合ガスを一定温度に保た
れたコンデンサの巻管を通過させて、該混合ガス
を上記コンデンサの温度における原料ガスの飽和
蒸気として反応装置に導くバブリング装置におい
て、上記バブラー容器から反応装置に上記混合ガ
スを供給する配管が、上記バブラー容器の液体上
部空間から導出され、上記コンデンサの巻管の上
端から下端を経、下端に設けられた2分岐管の一
方の上方に向う分岐を経て上記反応装置へ導か
れ、上記分岐管の他方の下方に向う分岐は液溜に
導かれ、該液溜の下端には開閉弁を経て上記バブ
ラー容器に開放された配管が導出されていること
を特徴とするバブリング装置。 4 上記2分岐管がじやま板を有したガス溜で構
成されていることを特徴とする特許請求の範囲第
3項記載のバブリング装置。
[Claims] 1. A liquid raw material kept in a bubbler container is bubbled with carrier gas to create a mixed gas of carrier gas and raw material gas, and the mixed gas is passed through a condenser tube kept at a constant temperature. , in the bubbling device for introducing the mixed gas to the reaction device as saturated vapor of the raw material gas at the above-mentioned temperature of the condenser, a pipe for supplying the mixed gas from the bubbler container to the reaction device is led out from the space above the liquid in the bubbler container. from the upper end of the winding tube of the capacitor to the lower end, and further provided at the lower end.
A bubbling device characterized in that the bubbling device is led to the reaction device through one of the branch pipes, and the other downward branch of the branch pipe is open to the liquid in the bubbler container. 2. The bubbling device according to claim 1, wherein the two-branch pipe is constituted by a gas reservoir having a wall plate. 3 Bubble the raw material liquid held in the bubbler container with carrier gas to create a mixed gas of carrier gas and raw material gas, and pass the mixed gas through the winding tube of a condenser kept at a constant temperature to convert the mixed gas into the above-mentioned In a bubbling device that introduces the raw material gas as saturated vapor at the temperature of the condenser to the reaction device, a pipe for supplying the mixed gas from the bubbler container to the reaction device is led out from the liquid upper space of the bubbler container, and is connected to the condenser tube. From the upper end to the lower end, the liquid is led to the reactor via one upward branch of the two-branch pipe provided at the lower end, and the other downward branch of the branch pipe is led to a liquid reservoir. A bubbling device characterized in that a pipe that is open to the bubbler container is led out from the lower end of the reservoir via an on-off valve. 4. The bubbling device according to claim 3, wherein the two-branch pipe is constituted by a gas reservoir having a wall plate.
JP10371284A 1984-05-24 1984-05-24 bubbling device Granted JPS60248228A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10371284A JPS60248228A (en) 1984-05-24 1984-05-24 bubbling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10371284A JPS60248228A (en) 1984-05-24 1984-05-24 bubbling device

Publications (2)

Publication Number Publication Date
JPS60248228A JPS60248228A (en) 1985-12-07
JPH0142739B2 true JPH0142739B2 (en) 1989-09-14

Family

ID=14361329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10371284A Granted JPS60248228A (en) 1984-05-24 1984-05-24 bubbling device

Country Status (1)

Country Link
JP (1) JPS60248228A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257232A (en) * 1985-05-08 1986-11-14 Nippon Tairan Kk Method for generating gaseous liquid material
JPH0621740U (en) * 1992-08-21 1994-03-22 徳山曹達株式会社 Mixed gas monomer feeder
JPH06196419A (en) * 1992-12-24 1994-07-15 Canon Inc Chemical vapor deposition apparatus and semiconductor device manufacturing method using the same
JP2996101B2 (en) 1994-08-05 1999-12-27 信越半導体株式会社 Liquid source gas supply method and apparatus
JP2969101B2 (en) * 1998-03-27 1999-11-02 アプリオリ株式会社 Condenser used for bubbling device
KR100990792B1 (en) * 2003-05-02 2010-10-29 신에쓰 가가꾸 고교 가부시끼가이샤 Supply device of porous glass base material raw gas

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JPS60248228A (en) 1985-12-07

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