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JPH0145748B2 - - Google Patents
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JPH0145748B2 - - Google Patents

Info

Publication number
JPH0145748B2
JPH0145748B2 JP56106731A JP10673181A JPH0145748B2 JP H0145748 B2 JPH0145748 B2 JP H0145748B2 JP 56106731 A JP56106731 A JP 56106731A JP 10673181 A JP10673181 A JP 10673181A JP H0145748 B2 JPH0145748 B2 JP H0145748B2
Authority
JP
Japan
Prior art keywords
frequency
node
substrate
oscillation
substrate bias
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56106731A
Other languages
Japanese (ja)
Other versions
JPS589352A (en
Inventor
Zenzo Oda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP56106731A priority Critical patent/JPS589352A/en
Publication of JPS589352A publication Critical patent/JPS589352A/en
Publication of JPH0145748B2 publication Critical patent/JPH0145748B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05FSYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
    • G05F3/00Non-retroactive systems for regulating electric variables by using an uncontrolled element, or an uncontrolled combination of elements, such element or such combination having self-regulating properties
    • G05F3/02Regulating voltage or current
    • G05F3/08Regulating voltage or current wherein the variable is DC
    • G05F3/10Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics
    • G05F3/16Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics being semiconductor devices
    • G05F3/20Regulating voltage or current wherein the variable is DC using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations
    • G05F3/205Substrate bias-voltage generators

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Nonlinear Science (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Automation & Control Theory (AREA)
  • Semiconductor Integrated Circuits (AREA)

Description

【発明の詳細な説明】 本発明は、半導体集積回路(以下ICと記す)
の基板バイアス発生回路に関し、その目的は消費
電力の少ない基板バイアス発生回路を提供する事
にある。
[Detailed Description of the Invention] The present invention relates to a semiconductor integrated circuit (hereinafter referred to as IC)
The purpose of this substrate bias generation circuit is to provide a substrate bias generation circuit with low power consumption.

ICにおいて基板バイアス発生回路が使われて
いるのは、NチヤネルMOSIC、中でもスタデイ
ツク形およびダイナミツク形ランダムアクセスメ
モリ(RAM)に多い。これはNチヤネルMOSが
エンハンスメント形になりにくい事、RAMに高
速化の要求が強い事、実装密度を上げる為にIC
の端子数を減らし、更には、電源の数を減らして
システム設計を容易にしたい事などが原因となつ
ている。NチヤネルMOSICの基板バイアスの与
え方を歴史的に省ると、NチヤネルMOSICが実
用化された当初は基板は接地線と同電位であつ
た。しかし、これでエンハンスメント形で動作す
るMOSFETを作ろうとすると、基板の不純物濃
度を上げなければならず、内部のN形拡散層とP
形基板の接合容量が大きく、動作速度が上らなか
つた。
In ICs, substrate bias generation circuits are often used in N-channel MOSICs, especially in study type and dynamic type random access memories (RAM). This is because N-channel MOS is difficult to become an enhancement type, there is a strong demand for higher speed RAM, and IC
This is due to the desire to simplify system design by reducing the number of terminals and further reducing the number of power supplies. Looking back at the history of how substrate bias is applied to N-channel MOSICs, when N-channel MOSICs were first put into practical use, the substrate was at the same potential as the ground line. However, if you try to make a MOSFET that operates in the enhancement mode with this, you will have to increase the impurity concentration of the substrate, and the internal N-type diffusion layer and P
The junction capacitance of the shaped substrate was large, making it difficult to increase the operating speed.

この為、次には高速化すべく、基板の不純物濃
度を下げて、基板にマイナスのバイアスを外部か
ら別電源によつて与えてエンハンスメント形で動
作させるようになつた。
Therefore, in order to increase the speed, the impurity concentration of the substrate was lowered and a negative bias was applied to the substrate from an external source using a separate power supply to operate in an enhancement mode.

この方法は高速化のメリツトがある一方で、端
子数および電源数が増えるというデメリツトもあ
る。これを解決すべく考案されたのが、第1図、
第2図および第3図に示す基板バイアス発生回路
である。第1図はNチヤンネルMOSICの基板バ
イアス発生回路のポンプに相当する部分であり、
第2図はPチヤンネルMOSICの基板バイアス発
生回路のポンプに相当する部分である。図中にお
いて、101,201は基板、102,202は
節点、103,203は電源線、110,210
はダイオード、120,220は静電容量、13
0,230はMOSFET、131,231はドレ
イン、132,232はゲート、133,233
はソースを各々示している。そして静電容量12
0,220の一方の端子104,204に第3図
の出力303が接続されて、一組の基板バイアス
発生回路が形成される。第3図は発振回路であ
り、301はインバータの入力、302は同出
力、310はインバータ、320はバツフア、3
30は抵抗成分、340,350は容量成分を
各々示している。第1図をもとに説明すると、基
板バイアス発生回路は第3図の発振回路の出力す
る交流信号に基づき基板101に発生した多数キ
ヤリアをポンプの如く汲み上げて接地線103に
流し出し、基板にマイナスのバイアスをかけよう
とするものである。
While this method has the advantage of increasing speed, it also has the disadvantage of increasing the number of terminals and power supplies. Figure 1 was devised to solve this problem.
This is the substrate bias generation circuit shown in FIGS. 2 and 3. Figure 1 shows the part corresponding to the pump of the N-channel MOSIC substrate bias generation circuit.
FIG. 2 shows a portion corresponding to the pump of a P-channel MOSIC substrate bias generation circuit. In the figure, 101, 201 are substrates, 102, 202 are nodes, 103, 203 are power lines, 110, 210
is a diode, 120 and 220 are capacitances, 13
0,230 is MOSFET, 131,231 is drain, 132,232 is gate, 133,233
indicates the source. and capacitance 12
The output 303 in FIG. 3 is connected to one terminal 104, 204 of the transistors 0 and 220, forming a set of substrate bias generation circuits. Figure 3 shows an oscillation circuit, where 301 is the input of the inverter, 302 is the output, 310 is the inverter, 320 is the buffer, 3
Reference numeral 30 indicates a resistance component, and reference numerals 340 and 350 indicate capacitance components. Explaining based on FIG. 1, the substrate bias generation circuit pumps up a large number of carriers generated on the substrate 101 like a pump based on the AC signal output from the oscillation circuit of FIG. This is an attempt to create a negative bias.

従つてIC内部に発振回路を必要とし、この発
振回路による電力の消費を伴うことになる。しか
もIC全体が動作状態の時も待機状態の時も一定
の電力を消費する。
Therefore, an oscillation circuit is required inside the IC, and this oscillation circuit consumes power. Furthermore, the entire IC consumes a certain amount of power both when it is in operation and when it is in standby mode.

本発明は、かかる欠点を是正しようとするもの
であり、半導体集積回路のトランジスタが形成さ
れる基板と第1の節点の間に形成される第1の電
流経路と、前記第1の節点と電源線の間に形成さ
れる第2の電流経路と、発振手段と、該発振手段
の出力端である第2の節点と前記第1の節点の間
に接続され前記発振手段の出力信号に応じて充放
電される容量成分とを具備してなる基板バイアス
発生回路に於いて、前記発振手段は、前記半導体
集積回路の動作状態又は待機状態を示す制御信号
に基づき、前記動作状態の時に第1の周波数で発
振し、前記待機状態の時に前記第1の周波数より
低い第2の周波数で発振するように発振周波数を
切換える手段を有することを特徴とする。以下実
施例について説明する。
The present invention aims to correct such drawbacks, and includes a first current path formed between a substrate on which a transistor of a semiconductor integrated circuit is formed and a first node, and a first current path formed between the first node and a power source. a second current path formed between the wires, an oscillating means, a second node that is an output end of the oscillating means, and a second node connected between the first node and responsive to an output signal of the oscillating means; In the substrate bias generation circuit comprising a capacitance component that is charged and discharged, the oscillation means generates a first signal when the semiconductor integrated circuit is in the operating state based on a control signal indicating an operating state or a standby state of the semiconductor integrated circuit. The device is characterized in that it has means for switching the oscillation frequency so that it oscillates at a frequency and oscillates at a second frequency lower than the first frequency when in the standby state. Examples will be described below.

第4図は本発明の一実施例であり、前述の発振
回路に相当する。この例ではMOSFET431及
び432が抵抗の役割を果している。404は
ICの外部又は内部から与えられる制御信号であ
る。たとえば、RAMの動作状態の時“1”、待
機状態の時“0”であるとすると、動作状態では
MOSFET432が導通状態、431は非導通状
態、待機状態ではその逆となり、431の導通抵
抗を432のそれより大きく設計すれば抵抗値が
変り、発振周波数が下がるため、待機状態では電
力の消費を減らすことができる。すなわち本発明
の基板バイアス発生回路はICの待機状態のとき
に発振回路の発振周波数を決定する抵抗値等の定
数を変更して、発振周波数を下げ、それにより消
費電力を低減するものである。待機状態ではIC
の極く一部しか動作しない為、基板と逆バイアス
された拡散層の充放電々流も、MOSFETが飽和
領域で動作する時に基板に流れ出す電流も極めて
少なくなるため発振周波数を落して基板から汲み
上げる多数キヤリアの量即わち電流を少なくして
も機能上差しつかえない。また待機状態ではIC
の他の部分での消費電力が少くなるため、発振回
路で消費する電力を減らす事が全体の消費電力の
減少に大きく貢献する。
FIG. 4 shows an embodiment of the present invention, which corresponds to the oscillation circuit described above. In this example, MOSFETs 431 and 432 play the role of resistors. 404 is
This is a control signal given from outside or inside the IC. For example, if the RAM is "1" in the operating state and "0" in the standby state, then in the operating state
MOSFET 432 is in a conductive state, 431 is in a non-conductive state, and vice versa in a standby state.If the conduction resistance of 431 is designed to be larger than that of 432, the resistance value will change and the oscillation frequency will be lowered, reducing power consumption in a standby state. be able to. That is, the substrate bias generation circuit of the present invention lowers the oscillation frequency by changing constants such as resistance values that determine the oscillation frequency of the oscillation circuit when the IC is in a standby state, thereby reducing power consumption. IC in standby state
Since only a small portion of the MOSFET operates, the charging and discharging current between the substrate and the reverse biased diffusion layer and the current flowing into the substrate when the MOSFET operates in the saturation region are extremely small, so the oscillation frequency is lowered and pumped from the substrate. There is no functional problem even if the amount of majority carriers, that is, the current, is reduced. Also, in standby mode, the IC
Since power consumption in other parts of the device is reduced, reducing the power consumed by the oscillation circuit greatly contributes to reducing overall power consumption.

第5図は本発明の別の実施例である。抵抗成分
の部分が、スイツチの役目を果すMOSFETと抵
抗に分割されている。抵抗値を上げて特に低い周
波数を得たい場合に有効である。抵抗としてはポ
リシリコンその他高抵抗値が得られるものなら何
でも良い。
FIG. 5 shows another embodiment of the invention. The resistance component is divided into a MOSFET that acts as a switch and a resistor. This is effective when you want to obtain a particularly low frequency by increasing the resistance value. The resistor may be made of polysilicon or any other material that can provide a high resistance value.

本発明は、動作状態と待機状態の区分があるも
ので、待機状態で特に低消費電力を要求されIC
一般に有効である。
The present invention has a distinction between an operating state and a standby state, and an IC that requires particularly low power consumption in the standby state.
Generally valid.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はNチヤネルMOSICの基板バイアス発
生回路でポンプに相当する部分、101は基板、
102は節点、103は電源線(接地線)、11
0はダイオード、120は静電容量、130は
MOSFET、131はドレイン、132はゲー
ト、133はソース。 第2図はPチヤネルMOSICの基板バイアス発
生回路でポンプに相当する部分、201は基板、
202は節点、203は電源線、210はダイオ
ード、220は静電容量、230はMOSFET、
231はドレイン、232はゲート、233はソ
ース。 第3図は従来の発振回路、301はインバータ
の入力、302は同出力、303は発振回路の出
力、310はインバータ、320はバツフア、3
30は抵抗成分、340,350は容量成分。 第4図は本発明の第1の実施例、401はイン
バータの入力、402は同出力、403は発振回
路の出力、404は制御信号、410はインバー
タ、420はバツフア、431,432は
MOSFET。 第5図は本発明の第2の実施例、501はイン
バータの入力、502は同出力、503は発振回
路の出力、504は制御信号、510はインバー
タ、520はバツフア、531,532は
MOSFET、533,534は抵抗。
Figure 1 shows the part corresponding to the pump in an N-channel MOSIC substrate bias generation circuit, 101 is the substrate,
102 is a node, 103 is a power line (grounding line), 11
0 is a diode, 120 is capacitance, 130 is
MOSFET, 131 is the drain, 132 is the gate, and 133 is the source. Figure 2 shows the part corresponding to the pump in the P-channel MOSIC substrate bias generation circuit, 201 is the substrate,
202 is a node, 203 is a power line, 210 is a diode, 220 is a capacitance, 230 is a MOSFET,
231 is a drain, 232 is a gate, and 233 is a source. Figure 3 shows a conventional oscillation circuit, 301 is the input of the inverter, 302 is the output, 303 is the output of the oscillation circuit, 310 is the inverter, 320 is the buffer, 3
30 is a resistance component, and 340 and 350 are capacitance components. FIG. 4 shows the first embodiment of the present invention, 401 is the input of the inverter, 402 is the output, 403 is the output of the oscillation circuit, 404 is the control signal, 410 is the inverter, 420 is the buffer, 431 and 432 are the
MOSFET. FIG. 5 shows a second embodiment of the present invention, 501 is the input of the inverter, 502 is the output, 503 is the output of the oscillation circuit, 504 is the control signal, 510 is the inverter, 520 is the buffer, 531 and 532 are the
MOSFET, 533 and 534 are resistors.

Claims (1)

【特許請求の範囲】[Claims] 1 半導体集積回路のトランジスタが形成される
基板と第1の節点の間に形成される第1の電流経
路と、前記第1の節点と電源線の間に形成される
第2の電流経路と、発振手段と、該発振手段の出
力端である第2の節点と前記第1の節点の間に接
続され前記発振手段の出力信号に応じて充放電さ
れる容量成分とを具備してなる基板バイアス発生
回路に於いて、前記発振手段は、前記半導体集積
回路の動作状態又は待機状態を示す制御信号に基
づき、前記動作状態の時に第1の周波数で発振
し、前記待機状態の時に前記第1の周波数より低
い第2の周波数で発振するように発振周波数を切
換える手段を有することを特徴とする基板バイア
ス発生回路。
1. A first current path formed between a substrate on which a transistor of a semiconductor integrated circuit is formed and a first node, and a second current path formed between the first node and a power supply line; A substrate bias comprising an oscillation means and a capacitance component connected between a second node which is an output end of the oscillation means and the first node and charged and discharged according to an output signal of the oscillation means. In the generating circuit, the oscillation means oscillates at a first frequency when in the operating state and oscillates at the first frequency when in the standby state based on a control signal indicating an operating state or a standby state of the semiconductor integrated circuit. 1. A substrate bias generation circuit comprising means for switching an oscillation frequency so as to oscillate at a second frequency lower than the second frequency.
JP56106731A 1981-07-08 1981-07-08 Substrate bias generation circuit Granted JPS589352A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56106731A JPS589352A (en) 1981-07-08 1981-07-08 Substrate bias generation circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56106731A JPS589352A (en) 1981-07-08 1981-07-08 Substrate bias generation circuit

Publications (2)

Publication Number Publication Date
JPS589352A JPS589352A (en) 1983-01-19
JPH0145748B2 true JPH0145748B2 (en) 1989-10-04

Family

ID=14441073

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56106731A Granted JPS589352A (en) 1981-07-08 1981-07-08 Substrate bias generation circuit

Country Status (1)

Country Link
JP (1) JPS589352A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001274265A (en) * 2000-03-28 2001-10-05 Mitsubishi Electric Corp Semiconductor device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033314B2 (en) * 1979-11-22 1985-08-02 富士通株式会社 Substrate bias voltage generation circuit

Also Published As

Publication number Publication date
JPS589352A (en) 1983-01-19

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