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JPH0149404B2 - - Google Patents
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JPH0149404B2 - - Google Patents

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Publication number
JPH0149404B2
JPH0149404B2 JP146185A JP146185A JPH0149404B2 JP H0149404 B2 JPH0149404 B2 JP H0149404B2 JP 146185 A JP146185 A JP 146185A JP 146185 A JP146185 A JP 146185A JP H0149404 B2 JPH0149404 B2 JP H0149404B2
Authority
JP
Japan
Prior art keywords
reaction
wax
molecular weight
fluorine
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP146185A
Other languages
Japanese (ja)
Other versions
JPS61162503A (en
Inventor
Minoru Aramaki
Hiroaki Sakaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP146185A priority Critical patent/JPS61162503A/en
Priority to IT22683/85A priority patent/IT1191635B/en
Priority to US06/797,463 priority patent/US4711949A/en
Priority to FR8516773A priority patent/FR2573081B1/en
Priority to GB08528009A priority patent/GB2167072B/en
Priority to DE19853540280 priority patent/DE3540280A1/en
Publication of JPS61162503A publication Critical patent/JPS61162503A/en
Publication of JPH0149404B2 publication Critical patent/JPH0149404B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、含フツ素ポリマーの低分子量物の製
造方法に関し、更に詳しくはポリテトラフルオロ
エチレン等の含フツ素ポリマーと分子状フツ素、
ハロゲン化フツ化物、および希ガスのフツ化物の
少なくとも1種と接触反応させる低分子量化合物
(ワツクス)の製造方法に関するものである。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a method for producing a low molecular weight fluorine-containing polymer, and more specifically, a method for producing a low molecular weight fluorine-containing polymer, and more specifically, a method for producing a fluorine-containing polymer such as a fluorine-containing polymer such as polytetrafluoroethylene, a molecular fluorine-containing polymer,
The present invention relates to a method for producing a low molecular weight compound (wax) which is subjected to a catalytic reaction with at least one of a halogenated fluoride and a rare gas fluoride.

ポリテトラフルオロエチレン(PTFE)をはじ
めとする含フツ素ポリマーの低分子量物は潤滑性
能、低表面エネルギー性などに優れているため潤
滑剤や離型剤等に広く使用されている。
Low molecular weight fluorine-containing polymers such as polytetrafluoroethylene (PTFE) have excellent lubrication performance and low surface energy properties, so they are widely used as lubricants and mold release agents.

(従来の技術) なかでも低分子量のPTFEはテトラフルオロエ
チレン(TFE)ワツクスと呼ばれ種々の製法が
提案されており、TFEのテロメリゼーシヨンに
よるワツクスの製造方法は古くから知られ工業的
にも実施されている。
(Prior art) Among them, low molecular weight PTFE is called tetrafluoroethylene (TFE) wax, and various manufacturing methods have been proposed.The method for manufacturing wax by telomerization of TFE has been known for a long time and has been used industrially. is also being implemented.

しかしながら、これまでの多くの方法は例えば
テロゲンとなる化合物を反応媒体として使用する
ため(例えば特開昭51―41085号)温度など反応
条件の制御が困難であり、分子量などのコントロ
ール技術を必要とし、モノマーとテロゲンの分離
に問題が残る。また水性反応媒体を用いる方法も
知られているが、生成ワツクスの熱安定性の問
題、反応後のモノマーとテロマーとの分離が困難
である。
However, in many of the methods to date, it is difficult to control reaction conditions such as temperature because they use a compound that becomes a telogen as a reaction medium (for example, Japanese Patent Application Laid-Open No. 51-41085), and they require techniques to control molecular weight, etc. , problems remain in the separation of monomer and telogen. A method using an aqueous reaction medium is also known, but there are problems with the thermal stability of the wax produced and difficulty in separating the monomer and telomer after the reaction.

一方、PTFEを熱分解して低分子にする方法と
してけい素、アルミニウム、マグネシウム、黒鉛
の存在下低温での熱分解する方法(特公昭56―
25446号)。空気またはO2,SO2,NO等の劣化促
進剤の存在下熱分解する方法、更にはKNO3
NaNO3溶融塩中で加熱分解する方法などが知ら
れているが、原料PTFEが高価であるためスクラ
ツプ以外には使用しにくく、均一な製品が得られ
難いこと、発生する有毒な熱分解ガスの廃棄処理
が困難であることなど解決する問題がある。
On the other hand, as a method of thermally decomposing PTFE to make it into low-molecular molecules, there is a method of thermally decomposing it at low temperatures in the presence of silicon, aluminum, magnesium, and graphite.
No. 25446). A method of thermal decomposition in the presence of air or a deterioration accelerator such as O 2 , SO 2 , NO , etc.
Methods such as thermal decomposition in NaNO 3 molten salt are known, but the raw material PTFE is expensive, making it difficult to use for purposes other than scrap, making it difficult to obtain a uniform product, and reducing the amount of toxic pyrolysis gas generated. There are problems to be solved, such as the difficulty of disposal.

また最近開発された方法としてPTFEに放射線
(X線、γ線)を照射して分解させる方法として、
酸素および水素を添加し照射させることで少ない
放射線量で分解の効率化を図る改良方法(特公昭
56―8043号)なども知られている。しかし放射線
は一般に取扱いにくくコスト高であるため工業的
製法として採用するにはそれ相応の設備を必要と
する。
In addition, a recently developed method is to irradiate PTFE with radiation (X-rays, gamma rays) and decompose it.
An improved method of increasing the efficiency of decomposition with a small amount of radiation by adding oxygen and hydrogen and irradiating it (Tokuko Sho)
56-8043) are also known. However, since radiation is generally difficult to handle and expensive, appropriate equipment is required to employ it as an industrial manufacturing method.

(発明が解決しようとする問題点) 本発明者らは上記従来法の欠点解消として、新
規製法を種々検討した結果、含フツ素ポリマーを
分子状フツ素(F2)、ハロゲン化フツ化物および
希ガスのフツ化物の少なくとも1種と接触反応さ
せることで高収率でコントロールされた分子量分
布を持つ含フツ素ポリマーの低分子量物が得られ
ることを見い出し本発明に到達した。
(Problems to be Solved by the Invention) The present inventors have investigated various new production methods to overcome the drawbacks of the above-mentioned conventional methods. The present invention was achieved by discovering that a low molecular weight fluorine-containing polymer having a controlled molecular weight distribution can be obtained in high yield by carrying out a contact reaction with at least one fluoride of a rare gas.

(問題を解決するための手段) 本発明の具体的実施方法においては、各ポリマ
ーにより反応条件は異なるが、反応温度は250〜
550℃好ましくは350〜500℃において行われる。
250℃以下では接触反応に長時間を必要とし、550
℃以上では均一な製品が得られず該温度範囲にお
いては容易に低分子量化の反応が短時間に進行
し、ワツクス状のものが得られる。
(Means for solving the problem) In the specific implementation method of the present invention, reaction conditions vary depending on each polymer, but the reaction temperature is 250 to 250°C.
It is carried out at 550°C, preferably 350-500°C.
Below 250℃, contact reaction requires a long time, and 550℃
If the temperature is above 0.degree. C., a uniform product cannot be obtained, and in this temperature range, the reaction to lower the molecular weight easily proceeds in a short time, resulting in a wax-like product.

以下本発明を詳述する。 The present invention will be explained in detail below.

本発明における原料の含フツ素ポリマーは
PTFE、テトラフルオロエチレン―ヘキサフルオ
ロプロピレン共重合体(FEP)、テトラフルオロ
エチレン―パーフルオロアルコキシエチレン共重
合体(PFA)、クロロトリフルオロエチレン
(CTFE)―テトラフルオロエチレン共重合体
(ETFE)およびポリビニリデンフルオライド
(PvdF)、ポリビニルフルオライド(PVF)など
の粉末、ペレツト、シート状物スクラツプあるい
はフイラー入りのものなどいかなる形状のもので
も使用できる。供給するフツ素化剤としては、分
子状フツ素(F2)、フツ化塩素(ClF)、三フツ化
塩素(ClF3)、五フツ化塩素(ClF5)、フツ化臭
素(BrF)、三フツ化臭素(BrF3)、五フツ化臭
素(BrF5)、三フツ化ヨウ素(IF3)、五フツ化ヨ
ウ素(IF5)、七フツ化ヨウ素(IF7)、二フツ化キ
セノン(XeF2)、四フツ化キセノン(XeF4)、六
フツ化キセノン(XeF6)、フツ化クリプトン
(KrF2)等の化合物があげられる。上記フツ化物
はFラジカルを発生するフツ素化剤であり、Fラ
ジカルは含フツ素ポリマーの主鎖の切断および生
じたポリマーの末端ラジカルをカツプリング安定
化させ反応制御を容易にするものである。
The raw material fluorine-containing polymer in the present invention is
PTFE, tetrafluoroethylene-hexafluoropropylene copolymer (FEP), tetrafluoroethylene-perfluoroalkoxyethylene copolymer (PFA), chlorotrifluoroethylene (CTFE)-tetrafluoroethylene copolymer (ETFE) and Any form of powder such as vinylidene fluoride (PvdF) or polyvinyl fluoride (PVF), pellets, sheet-like scraps, or filled materials can be used. The fluorinating agents to be supplied include molecular fluorine (F 2 ), chlorine fluoride (ClF), chlorine trifluoride (ClF 3 ), chlorine pentafluoride (ClF 5 ), bromine fluoride (BrF), Bromine trifluoride (BrF 3 ), bromine pentafluoride (BrF 5 ), iodine trifluoride (IF 3 ), iodine pentafluoride (IF 5 ), iodine heptafluoride (IF 7 ), xenon difluoride ( Examples include compounds such as XeF 2 ), xenon tetrafluoride (XeF 4 ), xenon hexafluoride (XeF 6 ), and krypton fluoride (KrF 2 ). The above-mentioned fluoride is a fluorinating agent that generates F radicals, which cleave the main chain of the fluorine-containing polymer and couple and stabilize the terminal radicals of the resulting polymer, thereby facilitating reaction control.

これらフツ素化剤の添加量は含フツ素ポリマー
の種類、形状にもよるが含フツ素ポリマーの有姿
100重量部に対しFとして0.01重量部以上となる
よう供給(存在)させればよく0.01重量部より少
ないとワツクス化が行えない。なお、過剰に存在
する場合は未反応として残存するため、これを回
収再使用すればよいので特に問題はおこらない
が、大略10重量部程度迄の範囲で選択するのが望
ましい。
The amount of these fluorinating agents added depends on the type and shape of the fluorinated polymer, but
It is sufficient to supply (presence) F in an amount of 0.01 part by weight or more per 100 parts by weight, and wax cannot be formed if the amount is less than 0.01 part by weight. Note that if it is present in excess, it remains unreacted and can be recovered and reused, so no particular problem will occur, but it is desirable to select it within a range of approximately 10 parts by weight.

使用する反応器は気体と固体が接触するような
形態のものであれば、いずれのものでも使用でき
るが例えば、多段の反応棚を具備する強制循環式
の反応器、流動層などの気固接触が良好に行える
反応器が好ましい。ガスの圧力は高圧になればな
るほど速やかに反応するが、常圧においても充分
な反応速度を持つている。またフツ素化剤は純粋
なものでの使用はもちろんであるが窒素、アルゴ
ン、ヘリウム、四フツ化炭素等の不活性ガスで希
釈使用することもできる。
Any type of reactor can be used as long as it allows gas and solid to come into contact, but examples include forced circulation type reactors equipped with multiple reaction shelves, gas-solid contact reactors such as fluidized beds A reactor that can perform this well is preferred. The higher the gas pressure, the faster the reaction occurs, but the reaction rate is sufficient even at normal pressure. The fluorinating agent can of course be used in its pure form, but it can also be used diluted with an inert gas such as nitrogen, argon, helium, or carbon tetrafluoride.

本発明におけるフツ素化剤との反応では従来法
の熱分解による多量の不飽和の猛毒ガス副生に比
べ、反応で副生するガスは強力なフツ素化能を有
するフツ素化剤中で反応を行うため、極めて少な
く副生ガスはC3F8,C2F6,CF4等をはじめ、使用
するフツ素化剤によつて異なるが、フロン系化合
物、希ガスのXe,Krなど安全でかつ取り扱い容
易な化合物である。
In the reaction with the fluorinating agent in the present invention, compared to the large amount of unsaturated poisonous gas by-produced by thermal decomposition in the conventional method, the gas by-produced in the reaction is contained in the fluorinating agent which has a strong fluorinating ability. Due to the reaction, the amount of by-product gases is extremely small, including C 3 F 8 , C 2 F 6 , CF 4 , etc., and depending on the fluorinating agent used, fluorocarbon compounds, rare gases such as Xe, Kr, etc. It is a safe and easy-to-handle compound.

生成する低分子量フツ化物の分子量分布は、実
施例にも示す如く反応温度と反応時間によつて数
十万オーダから数千単位のオーダーで、その温度
の高さ及び時間の長さに大略比例して分子量を小
さく自由にコントロールすることができる。即
ち、含フツ素ポリマーの粒径が小さくフツ素化剤
の添加量を多くかつ高温域で行えば低分子量のも
のが取得できる。なお、生成物は活性なフツ素ラ
ジカルの存在下で分解を行つているため、末端は
OF3化されており、極めて安定である。また、カ
ーボンの折出が全くおこらないため極めて純白な
ものが取得される。
As shown in the examples, the molecular weight distribution of the low molecular weight fluoride produced is on the order of hundreds of thousands to several thousand units depending on the reaction temperature and reaction time, and is roughly proportional to the height of the temperature and the length of the reaction time. The molecular weight can be controlled freely. That is, if the particle size of the fluorine-containing polymer is small, the amount of fluorinating agent added is large, and the process is carried out in a high temperature range, a low molecular weight product can be obtained. Note that the product is decomposed in the presence of active fluorine radicals, so the terminal
It is converted into OF3 and is extremely stable. Furthermore, since no carbon precipitation occurs, an extremely pure white product can be obtained.

本発明において得られたこれら生成物は容易に
微粉砕することができ通常のハンマータイプの粉
砕機使用であれば平均粒径100μm、ジエツトミ
ルで粉砕すれば平均粒径0.1〜10μm程度まで微粉
砕できる。
These products obtained in the present invention can be easily pulverized to an average particle size of 100 μm using a normal hammer-type pulverizer, and 0.1 to 10 μm using a jet mill. .

以下実施例により本発明を更に詳述する。 The present invention will be explained in more detail with reference to Examples below.

実施例 1 厚み3mmのPTFEシート(焼結成形品)を3mm
角に切断したペレツト500gを強制的にガス撹拌
するためのフアンと加熱用ヒーターを具備した20
ニツケル製反応器に仕込み、N2ガス中で440℃
に昇温したのち、真空ポンプでN2ガスの一部を
抜き、F23gを導入して反応せしめた。反応開始
時のF2濃度は23%で圧力は常圧であつた。
Example 1 3mm thick PTFE sheet (sintered molded product)
20 equipped with a fan and heater for forcibly stirring 500g of pellets cut into squares.
Pour into a nickel reactor and heat at 440℃ in N2 gas.
After the temperature was raised to , part of the N 2 gas was removed using a vacuum pump, and 3 g of F 2 was introduced to cause a reaction. At the start of the reaction, the F 2 concentration was 23% and the pressure was normal pressure.

2時間反応させたところ、F2が消費され少量
のCF4,C2F6,C3F8ガスが副生、498gの純白溶
融状態のワツクスが得られた。固形分の収率は
99.6%であつた。このワツクスは融点305℃で、
米国特許第3067262号で示されている融点と分子
量の関係〔分子量=
200/685〔1/融点(〓)−1/600〕に従つて分子量
を 算出すると4600であつた。このワツクスを粗粉砕
したのち、ジエツトミルで微粉砕することによつ
て平均粒径5μmの微粒子粉末を得た。
When the reaction was carried out for 2 hours, F 2 was consumed and small amounts of CF 4 , C 2 F 6 and C 3 F 8 gases were produced as by-products, and 498 g of pure white molten wax was obtained. The solid content yield is
It was 99.6%. This wax has a melting point of 305℃,
The relationship between melting point and molecular weight shown in U.S. Patent No. 3,067,262 [molecular weight =
The molecular weight was calculated according to 200/685 [1/melting point (〓) - 1/600] and was 4,600. This wax was coarsely pulverized and then finely pulverized with a jet mill to obtain a fine powder with an average particle size of 5 μm.

実施例 2 PTFEモールテングパウダー500gとClF38gを
実施例1と同様の反応器中420℃で4時間反応さ
せた。生成した固体および気体を捕集したところ
49g(収率99.6%)のワツクス状のPTFEおよび
副生ガスとしてCClF3,CCl2F2,CCl3Fおよび少
量のCF4,C2F6,C3F8を得た。このワツクスを粉
砕したところ平均粒径7μmの微粉末を得た。こ
のワツクスの融点は310℃であり、平均分子量は
6100であつた。
Example 2 500 g of PTFE molding powder and 8 g of ClF 3 were reacted in the same reactor as in Example 1 at 420° C. for 4 hours. Collecting the generated solids and gases
49 g (yield 99.6%) of wax-like PTFE and by-product gases such as CClF 3 , CCl 2 F 2 , CCl 3 F and small amounts of CF 4 , C 2 F 6 , and C 3 F 8 were obtained. When this wax was pulverized, a fine powder with an average particle size of 7 μm was obtained. The melting point of this wax is 310℃, and the average molecular weight is
It was 6100.

実施例 3 実施例2と同じPTFE500gとXeF212gを同様
の反応器中400℃で2時間反応させた。生成した
固体および気体を捕集したところ497g(収率
99.4%)のワツクス状のPTFEおよび副生ガスと
してXeおよびCF4,C2F6,C3F8を得た。このワ
ツクスの融点は326℃であり、平均分子量は
105000であつた。なおこのものは容易に微粉砕で
きるものであつた。
Example 3 500 g of the same PTFE as in Example 2 and 12 g of XeF 2 were reacted at 400° C. for 2 hours in the same reactor. When the generated solid and gas were collected, 497g (yield
99.4%) wax-like PTFE and Xe and CF 4 , C 2 F 6 , C 3 F 8 as by-product gases were obtained. The melting point of this wax is 326℃, and the average molecular weight is
It was 105,000. Note that this material could be easily pulverized.

実施例 4 厚さ3mmのFEPシートを5mm角に切断したペ
レツト500gとPrF310gを同様に420℃で3時間
反応させたところ、495g(収率99.0%)のワツ
クスおよび副生ガスとしてCBrF3,CBr2F2
CBr3Fおよび少量のCF4,C2F6,C3F8を得た。ワ
ツクスの融点は240℃で容易に粉砕できるもので
あつた。
Example 4 When 500 g of pellets obtained by cutting a 3 mm thick FEP sheet into 5 mm squares and 10 g of PrF 3 were similarly reacted at 420°C for 3 hours, 495 g (yield 99.0%) of wax and CBrF 3 were produced as by-product gas. , CBr 2 F 2 ,
CBr 3 F and small amounts of CF 4 , C 2 F 6 and C 3 F 8 were obtained. The wax had a melting point of 240°C and could be easily crushed.

実施例 5 PFAペレツト(3mmφ×5mm)500gとIF38g
を400℃で6時間反応させたところ、490g(収率
98%)のワツクスと、副生ガスとしてClF3およ
び少量のCF4,C2F6,C3F8を得た。ワツクスの融
点は250℃で容易に粉砕できるものであつた。
Example 5 PFA pellets (3mmφ×5mm) 500g and IF 3 8g
When reacted at 400℃ for 6 hours, 490g (yield
ClF 3 and small amounts of CF 4 , C 2 F 6 , and C 3 F 8 were obtained as by-product gases. The wax had a melting point of 250°C and could be easily crushed.

実施例 6 CTFEパイプ(10mmφ)を10mmの長さに切断し
たものを500gとF2ガス3gを400℃で2時間反
応させたところ、480g(収率96%)のワツクス
および副生ガスとして少量のCF4,C2F6,CF3Cl
を得た。ワツクスの融点は236℃で容易に粉砕で
きるものであつた。
Example 6 When 500g of CTFE pipe (10mmφ) cut into 10mm length was reacted with 3g of F2 gas at 400℃ for 2 hours, 480g (yield 96%) of wax and a small amount of by-product gas were produced. CF 4 , C 2 F 6 , CF 3 Cl
I got it. The wax had a melting point of 236°C and could be easily crushed.

Claims (1)

【特許請求の範囲】[Claims] 1 含フツ素ポリマーを250〜550℃において、分
子状フツ素、ハロゲン化フツ化物、および希ガス
のフツ化物の少なくとも1種と接触反応させるこ
とを特徴とする含フツ素樹脂の低分子量物の製造
方法。
1. A low molecular weight product of a fluorine-containing resin, which is characterized in that a fluorine-containing polymer is subjected to a catalytic reaction at 250 to 550°C with at least one of molecular fluorine, a halogenated fluoride, and a rare gas fluoride. Production method.
JP146185A 1984-11-14 1985-01-10 Production of fluorine-containing oligomer resin Granted JPS61162503A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP146185A JPS61162503A (en) 1985-01-10 1985-01-10 Production of fluorine-containing oligomer resin
IT22683/85A IT1191635B (en) 1984-11-14 1985-10-31 CONVERSION PROCEDURE OF A HIGH POLYMER CONTAINING FLUORIDE IN A LOWER MOLECULAR WEIGHT POLYMET
US06/797,463 US4711949A (en) 1984-11-14 1985-11-13 Method of converting fluorine-containing high polymer into lower molecular weight polymer
FR8516773A FR2573081B1 (en) 1984-11-14 1985-11-13 PROCESS FOR CONVERSION OF A HIGH POLYMER CONTAINING FLUOR into a POLYMER OF LOWER MOLECULAR WEIGHT
GB08528009A GB2167072B (en) 1984-11-14 1985-11-13 Method of converting fluorine-containing high polymer into lower molecular weight polymer
DE19853540280 DE3540280A1 (en) 1984-11-14 1985-11-13 METHOD FOR CONVERTING FLUORINE HIGH POLYMERS TO POLYMERS WITH LOWER MOLECULAR WEIGHT

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JP146185A JPS61162503A (en) 1985-01-10 1985-01-10 Production of fluorine-containing oligomer resin

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JPS61162503A JPS61162503A (en) 1986-07-23
JPH0149404B2 true JPH0149404B2 (en) 1989-10-24

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