JPH0153729B2 - - Google Patents
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- Publication number
- JPH0153729B2 JPH0153729B2 JP57167251A JP16725182A JPH0153729B2 JP H0153729 B2 JPH0153729 B2 JP H0153729B2 JP 57167251 A JP57167251 A JP 57167251A JP 16725182 A JP16725182 A JP 16725182A JP H0153729 B2 JPH0153729 B2 JP H0153729B2
- Authority
- JP
- Japan
- Prior art keywords
- cadmium
- tellurium
- mercury
- crystal layer
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Radiation Pyrometers (AREA)
- Light Receiving Elements (AREA)
Description
【発明の詳細な説明】
本発明は、赤外線検出素子の構造に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the structure of an infrared detection element.
水銀カドミウムテルル(Hg1-XCdxTe)結晶
は、水銀とカドミウムの組成比を変えることによ
り、該結晶のエネルギーギヤツプを−0.3eVから
1.6eVまで変えることができる。特にX=0.2の組
成の結晶は、10μm帯赤外線検出素子材料として
重要である。このような赤外線検出素子では、検
出素子を一列に、または二次元的に多数個配列し
てアレイとして用いる場合が多い。 Mercury cadmium telluride (Hg 1-X Cd x Te) crystal can be made by changing the composition ratio of mercury and cadmium to increase the energy gap of the crystal from −0.3 eV.
It can be changed up to 1.6eV. In particular, a crystal with a composition of X=0.2 is important as a material for a 10 μm band infrared detection element. Such infrared detection elements are often used as an array by arranging a large number of detection elements in a line or two-dimensionally.
まず従来の赤外線検出素子アレイの構造につい
て述べる。 First, the structure of a conventional infrared detection element array will be described.
第1図aは光伝導型素子アレイの平面図、同図
bは同図aのA−A線における断面図を示す。こ
こで1はカドミウムテルル(CdTe)基板、2は
水銀カドミウムテルル結晶層、3はたとえばイン
ジウム/金(In/Au)のような金属多層からな
る電極、4はたとえば金線からなる金属細線、5
は該金線4の電極3への圧着部である。 FIG. 1a shows a plan view of the photoconductive element array, and FIG. 1b shows a sectional view taken along line A--A in FIG. 1a. Here, 1 is a cadmium tellurium (CdTe) substrate, 2 is a mercury cadmium telluride crystal layer, 3 is an electrode made of a metal multilayer such as indium/gold (In/Au), 4 is a thin metal wire made of, for example, a gold wire, and 5
is the portion where the gold wire 4 is crimped onto the electrode 3.
以下、該アレイの製造方法を説明する。半絶縁
性のカドミウムテルル(CdTe)基板1上に水銀
カドミウムテルル結晶層2を、例えば周知の液相
エピタキシヤル成長法を用いてエピタキシヤル成
長を行なつて形成する。その後、素子間の分離を
行なうために、ホトレジスト膜を被着形成し、写
真蝕刻法を用いて第1図aで示す水銀カドミウム
テルル結晶層2と電極3の形状にパターンを形成
する。該パターニングしたレジスト膜をマスクと
して、臭素とメチルアルコールの混合液で水銀カ
ドミウムテルル結晶層2をカドミウムテルル基板
1までエツチングする。この後、エツチングで残
つた水銀カドミウムテルル結晶層2の両端に電極
金属層を順次蒸着等の方法で付着させて、第1図
aで示す電極3の形状に形成する。以上の過程が
終了した後、上記カドミウムテルル基板1を所定
の位置にセツトして、外部端子(図示せず)と電
気的に接続するため、金線4でワイヤボンデイン
グを行なう。 The method for manufacturing the array will be described below. A mercury-cadmium-tellurium crystal layer 2 is formed on a semi-insulating cadmium tellurium (CdTe) substrate 1 by epitaxial growth using, for example, a well-known liquid phase epitaxial growth method. Thereafter, in order to separate the elements, a photoresist film is deposited, and a pattern is formed in the shape of the mercury-cadmium-tellurium crystal layer 2 and the electrode 3 shown in FIG. 1A using photolithography. Using the patterned resist film as a mask, the mercury-cadmium-tellurium crystal layer 2 is etched down to the cadmium-tellurium substrate 1 with a mixed solution of bromine and methyl alcohol. Thereafter, electrode metal layers are successively deposited on both ends of the mercury-cadmium-tellurium crystal layer 2 remaining after etching by a method such as vapor deposition to form the shape of the electrode 3 shown in FIG. 1a. After the above process is completed, the cadmium tellurium substrate 1 is set in a predetermined position, and wire bonding is performed using gold wires 4 in order to electrically connect it to an external terminal (not shown).
以上説明したような従来方法でアレイ素子を製
造する場合、ワイヤボンデイングの過程が最も問
題である。水銀カドミウムテルル結晶層2は非常
に脆弱で、容易に傷つき、金線4がはずれやすい
欠点がある。この欠点を改善するために、従来、
第2図a,bのような素子構造が考案された。こ
の構造は脆弱な水銀カドミウムテルル結晶層2上
ではなく、水銀カドミウムテルル結晶層2より硬
いカドミウムテルル基板1上にボンデイング用の
電極13を形成するのを目的としている。第2図
aはその平面図で、同図bは同図aのB−B線に
おける断面図である。ここで、13はたとえばイ
ンジウム/金(In/Au)のような、水銀カドミ
ウムテルル結晶層2とのオーミツク接触を兼ねた
ボンデイング用電極である。 When manufacturing array elements using the conventional method as described above, the wire bonding process is the most problematic. The mercury-cadmium-tellurium crystal layer 2 is very fragile and easily damaged, and has the disadvantage that the gold wire 4 is easily detached. In order to improve this drawback, conventionally,
A device structure as shown in FIGS. 2a and 2b was devised. This structure is intended to form the bonding electrode 13 not on the fragile mercury-cadmium-tellurium crystal layer 2 but on the cadmium-tellurium substrate 1 which is harder than the mercury-cadmium-tellurium crystal layer 2. FIG. 2a is a plan view thereof, and FIG. 2b is a sectional view taken along line BB in FIG. 2a. Here, 13 is a bonding electrode made of, for example, indium/gold (In/Au), which also serves as an ohmic contact with the mercury-cadmium-tellurium crystal layer 2.
しかしながらこの従来構造においても、第3図
に示すように、ボンダーのキヤピラリー7で金線
4を圧着した後引き上げる時、カドミウムテルル
の脆弱さのため電極13も一緒に引き上げてしま
う事が多く、これはカドミウムテルルと電極金属
との付着力が充分でないためと考えられる。一般
にアレイ素子では、数10個から数百個のボンデイ
ングを行なう必要があり、しかもその中の1つが
はずれてもアレイ素子として使えなくなり、上記
従来の構造では、アレイを作製することには困難
がつきまとつている。 However, even in this conventional structure, as shown in Fig. 3, when the gold wire 4 is crimped and pulled up with the capillary 7 of the bonder, the electrode 13 is often pulled up together with it due to the fragility of cadmium tellurium. This is thought to be due to insufficient adhesion between the cadmium telluride and the electrode metal. In general, it is necessary to bond several tens to hundreds of elements in an array element, and even if one of them comes off, the array element cannot be used anymore, making it difficult to fabricate an array with the conventional structure described above. It's haunting me.
本発明は以上の点に鑑みてなされたもので、カ
ドミウムテルル基板上に、水銀カドミウムテルル
結晶層に隣接する硫化亜鉛又はセレン化亜鉛から
なる中間層を形成し、上記水銀カドミウムテルル
結晶層とオーミツク接触し、その一部が上記中間
層上に付着されたワイヤボンデイング用電極を設
けることにより、ボンデイング時に電極がはがれ
ることがなく、赤外線検出素子アレイを容易に製
造できる赤外線検出素子を提供することを目的と
している。 The present invention has been made in view of the above points, and includes forming an intermediate layer made of zinc sulfide or zinc selenide adjacent to a mercury-cadmium-tellurium crystal layer on a cadmium-tellurium substrate, and forming an interlayer between the mercury-cadmium-tellurium crystal layer and the ohmic layer. An object of the present invention is to provide an infrared detecting element in which an infrared detecting element array can be easily manufactured without peeling off the electrode during bonding by providing a wire bonding electrode that is in contact with the intermediate layer and a part of the electrode is attached on the intermediate layer. The purpose is
第4図は、本発明の一実施例による赤外線検出
素子の断面図である。図において第1図ないし第
3図と同一符号は同一又は相当部分を示し、8は
中間層としての硫化亜鉛(ZnS)層である。 FIG. 4 is a sectional view of an infrared detection element according to an embodiment of the present invention. In the figures, the same reference numerals as in FIGS. 1 to 3 indicate the same or corresponding parts, and 8 is a zinc sulfide (ZnS) layer as an intermediate layer.
この構造では、第2図に示した従来の構造の素
子の少なくともボンデイング用電極13の一部の
下に硫化亜鉛層8を付着させることを特徴とし、
該硫化亜鉛層8は、蒸着法、スパツタ法又は化学
的蒸着法(CVD法)のいずれでも、これを付着
させることが可能である。硫化亜鉛はカドミウム
テルルにくらべて十分に硬い材料であるうえ、カ
ドミウムテルルおよび電極金属との付着力も強
い。従つて、ワイヤボンデイング時の圧力および
張力に十分耐え得る硫化亜鉛層8を形成でき、ま
た該硫化亜鉛層8上に付着したボンデイング用電
極13と該硫化亜鉛層8との付着力も充分である
ため、ワイヤボンデイング時の電極のはがれをな
くすることができる。 This structure is characterized in that a zinc sulfide layer 8 is deposited under at least a portion of the bonding electrode 13 of the element having the conventional structure shown in FIG.
The zinc sulfide layer 8 can be deposited by vapor deposition, sputtering, or chemical vapor deposition (CVD). Zinc sulfide is a material that is sufficiently harder than cadmium tellurium, and also has strong adhesion to cadmium tellurium and electrode metals. Therefore, it is possible to form a zinc sulfide layer 8 that can sufficiently withstand the pressure and tension during wire bonding, and the adhesion between the bonding electrode 13 attached on the zinc sulfide layer 8 and the zinc sulfide layer 8 is also sufficient. Therefore, it is possible to eliminate peeling of the electrode during wire bonding.
なお、これまで光伝導型素子についてのみ説明
してきたが、本発明は光起電力型素子にも適用で
きるのは当然である。 Although only the photoconductive type element has been described so far, it goes without saying that the present invention can also be applied to a photovoltaic type element.
また、上記実施例で述べた中間層としての硫化
亜鉛層は、電極と水銀カドミウムテルル結晶層と
の接触部分があるかぎり、いくら広くてもよく、
また、水銀カドミウムテルル結晶層上にあつても
良い。さらに上記中間層は、セレン化亜鉛
(ZnSe)層であつてもよい。 Furthermore, the zinc sulfide layer as the intermediate layer described in the above embodiments may be as wide as it is as long as there is a contact area between the electrode and the mercury-cadmium-tellurium crystal layer.
Alternatively, it may be placed on a mercury cadmium telluride crystal layer. Further, the intermediate layer may be a zinc selenide (ZnSe) layer.
以上のように、本発明に係る赤外線検出素子に
よれば、硫化亜鉛又はセレン化亜鉛からなる中間
層をカドミウムテルル基板とワイヤボンデイング
用電極との間に付着形成したので、1本の失敗も
なくワイヤボンデイングを行なうことができ、数
百のアレイも容易に製造できるという大きな効果
がある。 As described above, according to the infrared detection element according to the present invention, since the intermediate layer made of zinc sulfide or zinc selenide is deposited between the cadmium telluride substrate and the wire bonding electrode, there is no possibility of a single failure. A major advantage is that wire bonding can be performed and arrays of several hundred can be easily manufactured.
第1図aは従来の光伝導型赤外線検出素子アレ
イの平面図、第1図bは同図aのA−A線断面
図、第2図aは他の従来の光伝導型赤外線検出素
子アレイの平面図、第2図bは同図aのB−B線
断面図、第3図は第2図bにおけるワイヤボンデ
イング時の状態を示す図、第4図は本発明の一実
施例による赤外線検出素子の断面図である。
1……カドミウムテルル基板、2……水銀カド
ミウムテルル結晶層、8……中間層(硫化亜鉛
層)、13……ワイヤボンデイング用電極。なお、
図中同一符号は同一部分又は相当部分を示す。
Figure 1a is a plan view of a conventional photoconductive infrared detection element array, Figure 1b is a sectional view taken along line A-A in Figure 2a, and Figure 2a is another conventional photoconductive infrared detection element array. 2b is a sectional view taken along the line B-B in FIG. 2a, FIG. 3 is a diagram showing the state of wire bonding in FIG. 2b, and FIG. FIG. 3 is a cross-sectional view of a detection element. DESCRIPTION OF SYMBOLS 1... Cadmium tellurium substrate, 2... Mercury cadmium telluride crystal layer, 8... Intermediate layer (zinc sulfide layer), 13... Wire bonding electrode. In addition,
The same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
ドミウムテルル結晶層と、上記カドミウムテルル
基板上に上記水銀カドミウムテルル結晶層に隣接
して付着形成された硫化亜鉛又はセレン化亜鉛か
らなる中間層と、上記水銀カドミウムテルル結晶
層とオーミツク接触しその一部が上記中間層上に
付着されたワイヤボンデイング用電極とを備えた
ことを特徴とする赤外線検出素子。1. A mercury-cadmium-tellurium crystal layer formed on a cadmium-tellurium substrate; an intermediate layer made of zinc sulfide or zinc selenide deposited on the cadmium-tellurium substrate adjacent to the mercury-cadmium-tellurium crystal layer; An infrared detecting element comprising a wire bonding electrode that is in ohmic contact with a cadmium tellurium crystal layer and a part of the wire bonding electrode is attached on the intermediate layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57167251A JPS5956126A (en) | 1982-09-24 | 1982-09-24 | Infrared detecting element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57167251A JPS5956126A (en) | 1982-09-24 | 1982-09-24 | Infrared detecting element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5956126A JPS5956126A (en) | 1984-03-31 |
| JPH0153729B2 true JPH0153729B2 (en) | 1989-11-15 |
Family
ID=15846259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57167251A Granted JPS5956126A (en) | 1982-09-24 | 1982-09-24 | Infrared detecting element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5956126A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4876222A (en) * | 1987-09-25 | 1989-10-24 | Texas Instrument Incorporated | Semiconductor passivation |
| KR20030056676A (en) * | 2001-12-28 | 2003-07-04 | 주식회사 케이이씨 | infrared detector and method of fabricating the same |
| CN115249749B (en) * | 2021-04-25 | 2024-01-16 | 同方威视技术股份有限公司 | Cadmium zinc telluride detector packaging structure |
-
1982
- 1982-09-24 JP JP57167251A patent/JPS5956126A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5956126A (en) | 1984-03-31 |
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