JPH0158442B2 - - Google Patents
Info
- Publication number
- JPH0158442B2 JPH0158442B2 JP56005942A JP594281A JPH0158442B2 JP H0158442 B2 JPH0158442 B2 JP H0158442B2 JP 56005942 A JP56005942 A JP 56005942A JP 594281 A JP594281 A JP 594281A JP H0158442 B2 JPH0158442 B2 JP H0158442B2
- Authority
- JP
- Japan
- Prior art keywords
- interference
- inspected
- defect
- image
- reference mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Description
【発明の詳細な説明】
本発明は被検査物体表面の微小な凹凸の有無
を、光の干渉を用いて検査する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of inspecting the presence or absence of minute irregularities on the surface of an object to be inspected using optical interference.
被検査物体表面の干渉像を得るための干渉光学
系の一例を第1図に示す。レーザ光線等のコヒー
レント光源1から出た光線をビームスプリツタ2
によつて2光束に分け、一方の光束を対物レンズ
3を通して被検査物体4の表面に投影し、他方の
光束を対物レンズ5(一般的に対物レンズ3と等
しい倍率)を通して参照鏡6投影する。参照鏡6
は対物レンズ5の視野内において、高い平面精度
を有する鏡面である。被検査物体4および参照鏡
6からの反射光はそれぞれ対物レンズ3,5によ
つて集光され、ビームスプリツタ2で合成され、
干渉像として像面7に結像する。 FIG. 1 shows an example of an interference optical system for obtaining an interference image of the surface of an object to be inspected. A beam splitter 2 transmits a beam emitted from a coherent light source 1 such as a laser beam.
One beam is projected onto the surface of the object to be inspected 4 through an objective lens 3, and the other beam is projected onto a reference mirror 6 through an objective lens 5 (generally with the same magnification as the objective lens 3). . Reference mirror 6
is a mirror surface with high planar accuracy within the field of view of the objective lens 5. The reflected lights from the object to be inspected 4 and the reference mirror 6 are focused by objective lenses 3 and 5, respectively, and combined by a beam splitter 2.
An image is formed on the image plane 7 as an interference image.
この場合の干渉原理は、ビームスプリツタ2の
反射面で同図を折返し、ビームスプリツタ2によ
る参照鏡6の虚像を被検査物体4の表面に重ねる
ことによつて説明される。 The principle of interference in this case will be explained by folding back the figure at the reflecting surface of the beam splitter 2 and superimposing the virtual image of the reference mirror 6 formed by the beam splitter 2 on the surface of the object 4 to be inspected.
第2図で折返した参照鏡表面の虚像9が破線で
示されている。ここで被検査物体表面8と参照鏡
表面の虚像9とがまつたく平行であると仮定す
る。そうするとその間隔10が、使用する光線の
波長をλとして、1/4λの奇数倍であれば、干渉
によつて互いの反射光は弱め合う。したがつて像
面7には暗い干渉強度の一様な像20ができる。
一方間隔10が1/4λの偶数倍であれば、反射光
は強め合い、像面7は明るい干渉強度の一様な像
になる。すなわち、参照鏡の位置を光軸方向に移
動すると像面は明暗を繰返し、間隔10が1/2λ
の整数倍になる毎に、像面7は明るさの極大値と
なる。 A virtual image 9 of the folded reference mirror surface is shown in FIG. 2 by a broken line. Here, it is assumed that the surface of the object to be inspected 8 and the virtual image 9 of the reference mirror surface are perfectly parallel. Then, if the interval 10 is an odd multiple of 1/4λ, where λ is the wavelength of the light beam used, the reflected lights weaken each other due to interference. Therefore, a dark image 20 with uniform interference intensity is formed on the image plane 7.
On the other hand, if the interval 10 is an even number multiple of 1/4λ, the reflected lights will strengthen each other, and the image plane 7 will become a bright image with uniform interference intensity. In other words, when the position of the reference mirror is moved in the optical axis direction, the image plane repeats brightness and darkness, and the interval 10 becomes 1/2λ.
The image plane 7 has a maximum brightness every time the brightness increases by an integral multiple of .
この関係は横軸に間隔の変化21をとり、縦軸
に干渉強度22をとると、第3図のようになる。
23は明るさ変化である。 This relationship becomes as shown in FIG. 3 when the horizontal axis represents the change in interval 21 and the vertical axis represents the interference intensity 22.
23 is a brightness change.
このような干渉の特性を踏まえた上で、第4図
でこれを微小欠陥の有無の検査に適用する場合を
考える。被検査物体表面8上で、背景24の中に
背景24より窪んだ微小な欠陥25があるとす
る。今この欠陥25の深さ26が1/8λであると
すると、背景24と欠陥25の干渉強度は第5図
のグラフに示すようになる。すなわち間隔の変化
21に対し、背景24の明るさ変化27は実線で
示すように1/2nλ(n:正の整数)で極大値にな
る(第3図とまつたく同じである)が、欠陥の明
るさ変化28は破線で示すように、背景24の明
るさ変化27より1/8λ遅れた位相で変化する。 Considering the characteristics of such interference, the case where it is applied to the inspection for the presence or absence of minute defects will be considered in FIG. 4. Assume that there is a minute defect 25 in the background 24 that is recessed from the background 24 on the surface 8 of the object to be inspected. Assuming that the depth 26 of this defect 25 is 1/8λ, the interference intensity between the background 24 and the defect 25 will be as shown in the graph of FIG. In other words, the brightness change 27 of the background 24 with respect to the interval change 21 reaches a maximum value at 1/2nλ (n: a positive integer) as shown by the solid line (this is exactly the same as in Fig. 3), but the defect The brightness change 28 of the background 24 changes with a phase delayed by 1/8λ from the brightness change 27 of the background 24, as shown by the broken line.
欠陥25の有無を認識できるためには、背景2
4と欠陥25との間の明るさの差、すなわち背景
24に対する欠陥25のコントラストが必要であ
るが、このグラフでは、干渉の条件である間隔の
変化21により、このコントラストが変化ること
を表わしている。ここで背景24と欠陥25との
間の明るさの差が増大、すなわち欠陥25のコン
トラストが最大になる条件は間隔29,30の2
カ所あるが、間隔29では第6図のように、像面
7には背景24の明るい干渉像34の中に欠陥2
5の暗い干渉像33が現れ、又間隔30では図示
していないが、両者の明暗が逆転したものとな
る。このような条件のもとでは、被検査物体の移
動又は照射光もしくは干渉像の走査(以下移動等
と略す)により、像面7内を十分なコントラスト
を持つた欠陥25の干渉像33が移動等の方向3
5に横切るので、検出は容易である。 In order to be able to recognize the presence or absence of defect 25, background 2 is required.
4 and the defect 25, that is, the contrast of the defect 25 against the background 24, is required, but this graph shows that this contrast changes with a change in the spacing 21, which is a condition for interference. ing. Here, the condition where the difference in brightness between the background 24 and the defect 25 increases, that is, the contrast of the defect 25 becomes maximum, is 2 in the interval 29, 30.
However, at the interval 29, as shown in FIG.
A dark interference image 33 of No. 5 appears, and although not shown at interval 30, the brightness and darkness of the two are reversed. Under such conditions, the interference image 33 of the defect 25 with sufficient contrast moves within the image plane 7 due to movement of the object to be inspected or scanning of the irradiation light or interference image (hereinafter referred to as movement, etc.). etc. direction 3
5, so detection is easy.
しかし一方において、間隔31,32の条件の
もとでは、背景24と欠陥25との間に明るさの
差がなく、例えば間隔31では第7図に示すよう
に、欠陥25の干渉像33は背景24の干渉像3
4に対してまつたくコントラストを持たず、欠陥
25の検出は不可能となる。このことは干渉方式
の本質的な欠点であり、背景に対する欠陥の凹凸
量が1/4λより小さいすべての欠陥に対して起り
得ることである。すなわち参照鏡、被検査物体に
生じる振動等をまつたくなくし、被検査物体表面
のわずかなうねりに追従して波長の数十分の1の
オーダで間隔をコントロールし得たとしても、存
在する欠陥の凹凸の大きさが一定でない限り、最
適な間隔の値がないわけで、見落しは避け得ない
ことである。 However, on the other hand, under the conditions of the intervals 31 and 32, there is no difference in brightness between the background 24 and the defect 25, and for example, at the interval 31, as shown in FIG. 7, the interference image 33 of the defect 25 is Interference image 3 of background 24
4, the defect 25 cannot be detected. This is an essential drawback of the interference method, and can occur for all defects whose unevenness relative to the background is smaller than 1/4λ. In other words, even if it is possible to completely eliminate vibrations that occur in the reference mirror and the object to be inspected, and to follow the slight waviness of the surface of the object to be inspected and control the spacing to the order of several tenths of the wavelength, the defects that still exist Unless the size of the irregularities is constant, there is no optimal value for the spacing, and oversights are unavoidable.
本発明の目的は、上記した従来方法の欠点をな
くし、光の干渉を用いて見落しなく微小凹凸欠陥
の検査を行う方法を提供することにある。 SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the conventional methods described above and to provide a method for inspecting minute unevenness defects without overlooking them using optical interference.
本発明の要点は干渉縞を積極的に活用すること
を考えたことである。すなわち、検出範囲内で必
ず明暗1対以上の干渉縞を生じるようにし、この
範囲内で干渉の条件が異るようにすることであ
る。 The key point of the present invention is to consider the active use of interference fringes. In other words, one or more pairs of bright and dark interference fringes are always generated within the detection range, and the interference conditions are varied within this range.
以下本発明の一実施例を説明する。 An embodiment of the present invention will be described below.
干渉縞を生じさせる方法は、既知の通り、一般
に参照鏡を傾けて行う。すなわち第8図のよう
に、今被検査物体の移動等の方向をxとして、参
照鏡をy方向には被検査物体表面8と平行にし、
x方向にだけ図示の如き角度36に傾ける。この
ようにすると、被検査物体表面8からの反射光
と、参照鏡表面の虚像9からの反射光が干渉によ
つて弱め合う間隔41の位置に、暗い干渉縞44
が生じる。又間隔41と1/2λの間隔43だけ異
る間隔42にも干渉縞45が生じる。 As is known, interference fringes are generally generated by tilting a reference mirror. That is, as shown in FIG. 8, the direction of movement of the object to be inspected is set to x, and the reference mirror is set parallel to the surface 8 of the object to be inspected in the y direction.
Tilt only in the x direction at an angle 36 as shown. In this way, the light reflected from the surface 8 of the object to be inspected and the light reflected from the virtual image 9 of the reference mirror surface weaken each other due to interference, and dark interference fringes 44 are formed at the position of the interval 41.
occurs. Interference fringes 45 also occur at a distance 42 which is different from the distance 41 by a distance 43 of 1/2λ.
このような条件のもとで、欠陥25が被検査物
体の移動等によつて、像面7をx方向すなわち図
の左から右へ横切るとする。欠陥25の干渉像3
3は、欠陥25の底面と参照鏡表面の虚像9との
間隔46が間隔41と等しい位置47にさしかか
つた時、干渉縞44と同じ明るさすなわち最も暗
い状態となる。この位置47は、欠陥25の深さ
26が1/8λであれば、2本の干渉縞44,45
の間隔48が1/2λの高低差を示しているので、
この間隔48の1/4の距離49だけ干渉縞44の
位置から右に来た位置になる。 Under these conditions, it is assumed that the defect 25 crosses the image plane 7 in the x direction, that is, from left to right in the figure, due to movement of the object to be inspected or the like. Interference image 3 of defect 25
3 reaches a position 47 where the distance 46 between the bottom surface of the defect 25 and the virtual image 9 on the reference mirror surface is equal to the distance 41, the brightness is the same as that of the interference fringes 44, that is, the darkest state is reached. At this position 47, if the depth 26 of the defect 25 is 1/8λ, the two interference fringes 44, 45
Since the interval 48 indicates a height difference of 1/2λ,
The position is located to the right of the position of the interference fringes 44 by a distance 49 that is 1/4 of this interval 48.
欠陥25が移動するにつれ、第5図から予想で
きる通り、欠陥25のコントラストは次第に減少
し、位置50ではついにコントラストゼロとな
り、認識不可能となる。しかしさらに移動する
と、次第にコントラストが増加し、位置51で再
び最大になる。この時のコントラストは、位置4
7と逆に、欠陥25部分が周辺より明るい。 As the defect 25 moves, as can be expected from FIG. 5, the contrast of the defect 25 gradually decreases until it reaches zero contrast at position 50, making it unrecognizable. However, as we move further, the contrast gradually increases until it reaches a maximum again at position 51. The contrast at this time is at position 4.
7, the defect 25 portion is brighter than the surrounding area.
このようにして、被検査物体の移動等の方向に
沿つて干渉の条件を変化させることにより、場所
により欠陥にコントラストをつけることができ
る。どの場所でよいコントラストになるかは欠陥
の凹凸量によつて決まるわけであるが、検出器で
検出できる範囲内(目視で検出するなら像面内)
に干渉縞を少なくとも明暗1対以上生じるように
しておけば、その範囲内でコントラストが最大と
なる場所が必ず1〜2ヶ所発生し、欠陥の検出が
可能となる。 In this way, by changing the interference conditions along the direction of movement of the object to be inspected, it is possible to provide contrast to defects depending on the location. The location where good contrast is obtained is determined by the amount of unevenness of the defect, but within the range that can be detected by a detector (in the image plane if detected visually)
If at least one pair of bright and dark interference fringes is generated in each area, there will always be one or two locations where the contrast is maximum within that range, making it possible to detect defects.
なおこの際同時に、移動等の方向と直角な方向
に干渉の条件が異り、干渉縞が斜めに発生したと
してもさしつかえはない。このような状態は、参
照鏡がy方向に傾くか、被検査物体表面のうねり
によつてy方向に傾きがある場合に起る。この場
合でも被検査物体を移動等し、全検査範囲にわた
つて移動方向又は走査方向に1対以上の干渉縞が
生じるよう参照鏡をあらかじめ調整すれば、問題
はない。 Note that at the same time, there is no problem even if the interference conditions are different in the direction perpendicular to the direction of movement, etc., and interference fringes are generated obliquely. Such a situation occurs when the reference mirror is tilted in the y direction or when there is a tilt in the y direction due to undulations on the surface of the object to be inspected. Even in this case, there is no problem if the object to be inspected is moved, etc., and the reference mirror is adjusted in advance so that one or more pairs of interference fringes are generated in the moving direction or scanning direction over the entire inspection range.
上記したように、本方法を用いれば、干渉法の
検出感度のよさはそのままに、本質的な欠点であ
つたコントラスト不足による見落しを防ぎ、信頼
性のある欠陥検出を行うことができる。 As described above, by using this method, it is possible to prevent overlooking due to lack of contrast, which was an essential drawback, and to perform reliable defect detection while maintaining the high detection sensitivity of interferometry.
第1図は干渉光学系の一例を示す図、第2図は
干渉の原理を示す図、第3図は干渉強度を示す
図、第4図ないし第7図は干渉像を欠陥検出に用
いた場合の欠点を示す図、第8図は本発明による
干渉を用いた欠陥検出原理を示す図である。
1:コヒーレント光源、4:被検査物体、2
5:欠陥、33:干渉像、44,45:干渉縞。
Figure 1 shows an example of an interference optical system, Figure 2 shows the principle of interference, Figure 3 shows interference intensity, and Figures 4 to 7 show interference images used for defect detection. FIG. 8 is a diagram showing the defect detection principle using interference according to the present invention. 1: coherent light source, 4: object to be inspected, 2
5: Defect, 33: Interference image, 44, 45: Interference fringes.
Claims (1)
る光線を用いて被検査物体表面の干渉像を得るた
めの干渉光学系と、像面に配置した光電検出器
と、検査のために被検査物体の移動又は照射光に
よる被検査物体の走査もしくは干渉像の検出器上
での走査を行う手段とを有し、干渉像から被検査
物体表面の凹凸等の欠陥の有無を検査する方法に
おいて、被検査物体の移動方向、又は照射光もし
くは干渉像の走査方向に、少なくとも明暗一対以
上の本数の干渉縞を発生させ、被検査物体表面の
干渉像を用いて検査を行うことを特徴とする表面
欠陥検査方法。1. A coherent light source, an interference optical system for obtaining an interference image of the surface of an object to be inspected using the light rays emitted from this light source, a photoelectric detector placed on the image plane, and movement of the object to be inspected for inspection. or means for scanning the object to be inspected with irradiation light or scanning the interference image on a detector, and in a method for inspecting the presence or absence of defects such as irregularities on the surface of the object to be inspected from the interference image, the object to be inspected. A surface defect inspection method characterized by generating at least one pair of bright and dark interference fringes in the moving direction of the object or in the scanning direction of the irradiation light or the interference image, and performing an inspection using the interference image of the surface of the object to be inspected. .
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP594281A JPS57120805A (en) | 1981-01-20 | 1981-01-20 | Inspecting method of surface defect |
| US06/695,231 US4647196A (en) | 1981-01-20 | 1985-01-28 | Surface flaw detection method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP594281A JPS57120805A (en) | 1981-01-20 | 1981-01-20 | Inspecting method of surface defect |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57120805A JPS57120805A (en) | 1982-07-28 |
| JPH0158442B2 true JPH0158442B2 (en) | 1989-12-12 |
Family
ID=11624947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP594281A Granted JPS57120805A (en) | 1981-01-20 | 1981-01-20 | Inspecting method of surface defect |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57120805A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0356543U (en) * | 1989-10-03 | 1991-05-30 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5823565B2 (en) * | 1977-07-08 | 1983-05-16 | 日本電信電話株式会社 | Planar shape measurement method |
-
1981
- 1981-01-20 JP JP594281A patent/JPS57120805A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0356543U (en) * | 1989-10-03 | 1991-05-30 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57120805A (en) | 1982-07-28 |
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