JPH0158876B2 - - Google Patents
Info
- Publication number
- JPH0158876B2 JPH0158876B2 JP56191049A JP19104981A JPH0158876B2 JP H0158876 B2 JPH0158876 B2 JP H0158876B2 JP 56191049 A JP56191049 A JP 56191049A JP 19104981 A JP19104981 A JP 19104981A JP H0158876 B2 JPH0158876 B2 JP H0158876B2
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- laser
- comb
- oscillation
- shaped electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000010355 oscillation Effects 0.000 claims description 22
- 239000004065 semiconductor Substances 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 claims description 10
- 238000010897 surface acoustic wave method Methods 0.000 claims description 7
- 230000001902 propagating effect Effects 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 14
- 238000004891 communication Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000005684 electric field Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004943 liquid phase epitaxy Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1068—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using an acousto-optical device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1234—Actively induced grating, e.g. acoustically or electrically induced
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Description
【発明の詳細な説明】
この発明は、レーザ発振波長を任意に変えうる
可変波長半導体レーザに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a tunable wavelength semiconductor laser whose laser oscillation wavelength can be changed arbitrarily.
従来より、長距離光伝送のために開発された単
一縦モード発振を行なう半導体レーザとして、
GaAs−Ga1-xAlxAs2重ヘテロ構造DFB
(Distributed feedback)レーザ・ダイオードが
知られている。このレーザ・ダイオードは光閉じ
込め層上に1μm以下の一定周期のコルゲーシヨ
ンを形成したもので、コルゲーシヨンの周期Λに
よつて発振波長λが
λ=2nΛ/m …(1)
n;活性層の屈折率
m;ブラツク回折の次数
の関係で決まり、この発振波長λで単一波長発振
の縦モード動作が安定に行なわれるという利点が
ある。しかしながら、コルゲーシヨンの形成は、
その周期が通常1μm以下と小さいため、電子ビ
ーム露光法やホログラフイツクな方法によらなけ
ればならず、GaAs活性層等の光閉じ込め層上に
これらの方法でコルゲーシヨンを形成したのち
Ga1-xAlxAs層を成長させる必要があるため、熱
損傷が生じる問題があり、また製造工程が複雑で
あるという欠点がある。しかも発振波長はコルゲ
ーシヨンの周期で決まり安定である反面、可変と
することができないことにより、多重通信の一手
法である波長多重通信への応用展開の途が閉ざさ
れているという問題もある。 Conventionally, semiconductor lasers that perform single longitudinal mode oscillation were developed for long-distance optical transmission.
GaAs−Ga 1-x Al x As double heterostructure DFB
(Distributed feedback) laser diodes are known. This laser diode has a corrugation with a constant period of 1 μm or less formed on an optical confinement layer, and the oscillation wavelength λ depends on the period Λ of the corrugation. λ=2nΛ/m...(1) n; refractive index of the active layer m: Determined by the order of black diffraction, and has the advantage that longitudinal mode operation of single wavelength oscillation is stably performed at this oscillation wavelength λ. However, the formation of corrugations
Since the period is usually small, less than 1 μm, it is necessary to use electron beam exposure or holographic methods, and after forming corrugations on an optical confinement layer such as a GaAs active layer using these methods,
The disadvantage is that the Ga 1-x Al x As layer needs to be grown, which causes thermal damage, and the manufacturing process is complicated. Moreover, while the oscillation wavelength is determined by the corrugation period and is stable, it cannot be made variable, which is a problem in that the application to wavelength division multiplexing communication, which is a method of multiplex communication, is closed.
この発明は、製造が容易で安定な単一縦モード
発振が可能であり、発振波長を可変とすることが
でき、しかもレーザ光ビームの拡がりを小さくで
きる可変波長半導体レーザを提供することを目的
とする。 An object of the present invention is to provide a tunable wavelength semiconductor laser that is easy to manufacture, is capable of stable single longitudinal mode oscillation, can vary the oscillation wavelength, and can reduce the spread of the laser beam. do.
この発明による可変波長半導体レーザは、光閉
じ込め層上に表面弾性波を発生する櫛形電極超音
波振動子が設けられ、伝搬する表面弾性波の拡が
りをおさえるよう櫛形電極が円弧状に形成され、
櫛形電極超音波振動子の振動周波数を変化させる
ことによつて、レーザ発振波長を変化させること
を特徴とする。 In the tunable wavelength semiconductor laser according to the present invention, a comb-shaped electrode ultrasonic vibrator that generates a surface acoustic wave is provided on an optical confinement layer, and the comb-shaped electrode is formed in an arc shape to suppress the spread of the propagating surface acoustic wave.
It is characterized in that the laser oscillation wavelength is changed by changing the vibration frequency of the comb-shaped electrode ultrasonic vibrator.
したがつて、通常のレーザ・ダイオードの光閉
じ込め層上に櫛形電極超音波振動子を形成するだ
けでよいので製造が容易であり、しかも櫛形電極
超音波振動子の振動周波数を変えることによつて
レーザ発振波長を変えることができるため、波長
多重通信にも有効に応用できる。また、櫛形電極
が円弧状に形成されているから、発生した表面弾
性波の拡がりがおさえられ、その結果レーザ光ビ
ームの拡がりを小さくでき、しかも櫛形電極に印
加する高周波電力が小さくてすみ、光の閉じ込め
効果も大きいのでレーザ発振効率が高くなる。 Therefore, manufacturing is easy because it is only necessary to form a comb-shaped electrode ultrasonic vibrator on the optical confinement layer of a normal laser diode, and furthermore, by changing the vibration frequency of the comb-shaped electrode ultrasonic vibrator, Since the laser oscillation wavelength can be changed, it can also be effectively applied to wavelength multiplexing communications. In addition, since the comb-shaped electrodes are formed in an arc shape, the spread of the generated surface acoustic waves is suppressed, and as a result, the spread of the laser beam can be reduced, and the high-frequency power applied to the comb-shaped electrodes can be small. Since the confinement effect is also large, the laser oscillation efficiency becomes high.
以下、図面を参照してこの発明の実施例につい
て詳述する。 Embodiments of the present invention will be described in detail below with reference to the drawings.
第1図はこの発明を2重ヘテロ構造レーザ・ダ
イオードに適用した第1の実施例を示している。
2重ヘテロ構造レーザ・ダイオードは、n−
GaAs単結晶基板1に液相エピタキシー技術を用
いてn−Ga1-xAlxAs層2、p−GaAs層3、p−
Ga1-xAlxAs層4およびP−GaAs5を成長させ、
両面に電極6,7を設けてなる。このダイオード
に順方向電流を流すと、この電流がしきい値を超
えたときに、p−GaAs層3がキヤリヤおよび光
の閉じ込めを行なう活性層となつてレーザ光Aを
出射する。 FIG. 1 shows a first embodiment in which the invention is applied to a double heterostructure laser diode.
The dual heterostructure laser diode is n-
Using liquid phase epitaxy technology on a GaAs single crystal substrate 1, an n-Ga 1-x Al x As layer 2, a p-GaAs layer 3, a p-
Grow Ga 1-x Al x As layer 4 and P-GaAs 5,
Electrodes 6 and 7 are provided on both sides. When a forward current is passed through this diode, when this current exceeds a threshold value, the p-GaAs layer 3 becomes an active layer that carries and confines light, and emits laser light A.
この2重ヘテロ構造レーザ・ダイオードの一部
をエツチング技術などによつて切り欠き、p−
GaAs層3を露出させこの層3の上に絶縁膜8を
形成し、この絶縁膜8上に櫛形電極超音波振動子
10(以下IDT((インター・デジタル・トランス
デユーサ))という)を設ける。このIDT10は、
発生した表面弾性波(以下SAWという)の回折
効果による拡がりをおさえ、均一に伝搬するよう
に円弧状に形成されている。 A part of this double heterostructure laser diode is cut out using etching technology, and the p-
The GaAs layer 3 is exposed and an insulating film 8 is formed on this layer 3, and a comb-shaped electrode ultrasonic transducer 10 (hereinafter referred to as IDT ((inter-digital transducer)) is provided on this insulating film 8. . This IDT10 is
It is formed in an arc shape to prevent the generated surface acoustic waves (hereinafter referred to as SAW) from spreading due to the diffraction effect and propagate uniformly.
この第1図の構成において、IDT10に周波数
fの電界を印加すると、SAWが発生し、p−
GaAs層3上に沿つて光出射方向に伝搬する。こ
のSAWにより、従来のDFBレーザ・ダイオード
におけるコルゲーシヨンと同様な効果が生じ、単
一縦モード発振を生じさせることができる。すな
わちSAWの波長をΛとすれば、第(1)式で示した
波長λのレーザ光が得られる。そしてIDT10の
印加電界の周波数fを変化させてSAWの波長Λ
を△Λ変化させると、第(1)式より
△λ=2n△Λ/m …(2)
SAWの伝搬速度をVとすると
V=fΛ
したがつて、
△f=△Λ×(−f2/V) …(3)
第(3)式を第(2)式に代入すると、
△λ=−2nV△f/f2m …(4)
となり、IDT10の発振周波数を△f変化させれ
ばレーザ発振波長を△λ変化させることができ
る。 In the configuration shown in FIG. 1, when an electric field of frequency f is applied to the IDT 10, SAW is generated and p-
The light propagates along the GaAs layer 3 in the light emission direction. This SAW produces an effect similar to corrugation in conventional DFB laser diodes, allowing single longitudinal mode oscillation to occur. That is, if the wavelength of the SAW is Λ, a laser beam with a wavelength λ shown in equation (1) can be obtained. Then, by changing the frequency f of the applied electric field of IDT10, the SAW wavelength Λ
When changing △Λ, from equation (1), △λ=2n△Λ/m...(2) If the SAW propagation speed is V, then V=fΛ Therefore, △f=△Λ×(−f 2 /V) ...(3) Substituting equation (3) into equation (2), △λ=-2nV△f/f 2 m ...(4) If the oscillation frequency of IDT10 is changed by △f, The laser oscillation wavelength can be changed by Δλ.
たとえば第(4)式において、m=1、V=3300
(m/s)、n=3.37、f=20(GHz)、△f=2
(GHz)とすると、
△λ=0.11(μm)
となり、IDT10の発振周波数が20(GHz)のと
き1μmの波長のレーザ光が得られているとすれ
ば、IDT10の発振周波数を2(GHz)に変える
とレーザ光の波長を1100(Å)変えられることが
分る。 For example, in equation (4), m=1, V=3300
(m/s), n=3.37, f=20 (GHz), △f=2
(GHz), △λ=0.11 (μm), and if the oscillation frequency of IDT10 is 20 (GHz) and a laser beam with a wavelength of 1 μm is obtained, then the oscillation frequency of IDT10 is 2 (GHz). It can be seen that the wavelength of the laser beam can be changed by 1100 (Å) by changing it to .
また、IDT10は円弧状に形成されているか
ら、発振モードや出射するレーザ光の拡がりなど
をおさえることができる。第2図aは、直線状に
形成されたIDT11を示している。このIDT11
では、回折効果によつて、発生したSAWは次式
で表わされる角度θだけ拡がつて伝搬し、この結
果レーザの発振モードやレーザ光の拡がりが生じ
る。 Furthermore, since the IDT 10 is formed in an arc shape, it is possible to suppress the oscillation mode and the spread of the emitted laser light. FIG. 2a shows an IDT 11 formed in a straight line. This IDT11
Then, due to the diffraction effect, the generated SAW spreads and propagates by an angle θ expressed by the following equation, and as a result, the laser oscillation mode and the laser beam spread.
Θ∝Λ/D …(5)
D;交叉幅
しかしながら、この発明におけるIDT10は円
弧状に形成されているので、第2図bに示すよう
に、SAWは収束する方向に伝搬し、角度Θの拡
がりを考慮してもほぼ平行に伝搬する。この結
果、レーザ光Aの拡がりがおさえられるととも
に、発振モードが安定する。また光の閉じ込め効
果が大きくなるのでレーザ発振効率が高まり、
IDT10に印加する高周波電界のパワーも少なく
てすむ。 Θ∝Λ/D...(5) D: Cross width However, since the IDT 10 in this invention is formed in an arc shape, the SAW propagates in the direction of convergence, as shown in Figure 2b, and the angle Θ Even considering the spread, the waves propagate almost in parallel. As a result, the spread of the laser beam A is suppressed and the oscillation mode is stabilized. In addition, the light confinement effect increases, increasing laser oscillation efficiency.
The power of the high frequency electric field applied to the IDT 10 can also be reduced.
第3図は第2の実施例を示すもので、この発明
をITG(集積2重導波路形)レーザ・ダイオード
に適用したものである。この図において、ITGレ
ーザ・ダイオードは、n−GaAs基板21と、こ
の基板21上に形成されたGa1-xAlxAs層22,
24,26、GaAs活性層23,25およびp−
GaAs層27と、電極28,29と、絶縁膜30
とにより構成されている。このITGレーザ・ダイ
オードにおいて、光閉じ込め層であるGaAs活性
層23に平行な絶縁膜30の表面に円弧状のIDT
10が形成されている。 FIG. 3 shows a second embodiment, in which the invention is applied to an ITG (integrated dual waveguide) laser diode. In this figure, the ITG laser diode consists of an n-GaAs substrate 21, a Ga 1-x Al x As layer 22 formed on this substrate 21,
24, 26, GaAs active layers 23, 25 and p-
GaAs layer 27, electrodes 28, 29, and insulating film 30
It is composed of. In this ITG laser diode, an arc-shaped IDT is formed on the surface of the insulating film 30 parallel to the GaAs active layer 23, which is the optical confinement layer.
10 are formed.
このIDT10に高周波電界を印加するとSAW
が光閉じ込め層であるGaAs活性層23上に伝搬
され、DBFレーザ・ダイオードにおけるコルゲ
ーシヨンと同様の機能が達成できる。IDT10の
周波数を変えることによりレーザ発振波長を変え
ることができることおよびIDT10が円弧状であ
るためにレーザ光の拡がりをおさえられることは
上述と同様である。 When a high frequency electric field is applied to this IDT10, SAW
is propagated onto the GaAs active layer 23, which is an optical confinement layer, and a function similar to corrugation in a DBF laser diode can be achieved. As described above, the laser oscillation wavelength can be changed by changing the frequency of the IDT 10, and the spread of the laser beam can be suppressed because the IDT 10 has an arc shape.
この発明によつて得られた可変波長半導体レー
ザは、波長多重通信に効果的に適用できる。すな
わち第4図に示すように、中央処理装置41から
の制御信号により、この発明による可変波長半導
体レーザ42から、波長の異なるレーザ光信号を
発射し、光フアイバ43を経て光分波装置44に
送る。この光分波装置44には1、2…nの各チ
ヤンネルの光フアイバ45が接続されており、波
長毎にスイツチして各波長のレーザ光信号をリア
ルタイムで各光フアイバ45に伝搬する。この発
明による可変波長半導体レーザ42は、1個で
も、制御信号によつて波長の異つたレーザ光信号
を得ることができるため、波長多重通信システム
を簡易に構成することができ、このシステムに適
用すると大きな効果が得られる。また、レーザ光
の拡がりがおさえられるから、光フアイバ43へ
の光結合も容易となる。 The tunable wavelength semiconductor laser obtained by the present invention can be effectively applied to wavelength division multiplexing communications. That is, as shown in FIG. 4, in response to a control signal from a central processing unit 41, laser light signals of different wavelengths are emitted from a tunable wavelength semiconductor laser 42 according to the present invention, and are transmitted through an optical fiber 43 to an optical demultiplexing device 44. send. Optical fibers 45 for each channel of 1, 2, . Since even one tunable wavelength semiconductor laser 42 according to the present invention can obtain laser light signals with different wavelengths depending on the control signal, it is possible to easily configure a wavelength division multiplexing communication system, and it can be applied to this system. This will give you a big effect. Furthermore, since the spread of the laser beam is suppressed, optical coupling to the optical fiber 43 is also facilitated.
この発明は上述のDFBレーザ・ダイオードや
ITGレーザ・ダイオード以外の半導体レーザにも
適用できるのはいうまでもなく、GaAs系以外の
半導体についてもそれがSAWを伝搬させるため
に圧電性をもつものであれば適用できる。 This invention is applicable to the above-mentioned DFB laser diode and
Needless to say, the present invention can be applied to semiconductor lasers other than ITG laser diodes, and can also be applied to semiconductors other than GaAs-based semiconductors as long as they have piezoelectricity to propagate SAW.
第1図はこの発明の第1実施例を示す斜視図、
第2図は表面弾性波の拡がりの様子を示す図、第
3図は第2の実施例を示す斜視図、第4図は波長
多重通信装置を示すブロツク図である。
3,23……GaAs層(光閉じ込め層)、10
……櫛形電極超音波振動子。
FIG. 1 is a perspective view showing a first embodiment of the invention;
FIG. 2 is a diagram showing the spread of surface acoustic waves, FIG. 3 is a perspective view showing a second embodiment, and FIG. 4 is a block diagram showing a wavelength division multiplexing communication device. 3, 23...GaAs layer (light confinement layer), 10
...Comb-shaped electrode ultrasonic transducer.
Claims (1)
電極超音波振動子が設けられ、伝搬する表面弾性
波の拡がりをおさえるよう櫛形電極が円弧状に形
成され、櫛形電極超音波振動子の振動周波数の変
化によつて、レーザ発振波長が変化する、可変波
長半導体レーザ。1 A comb-shaped electrode ultrasonic transducer that generates surface acoustic waves is provided on the optical confinement layer, and the comb-shaped electrode is formed in an arc shape to suppress the spread of the propagating surface acoustic waves, and the vibration frequency of the comb-shaped electrode ultrasonic transducer is A tunable wavelength semiconductor laser whose laser oscillation wavelength changes depending on changes in the wavelength.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56191049A JPS5892288A (en) | 1981-11-27 | 1981-11-27 | Variable wavelength semiconductor laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56191049A JPS5892288A (en) | 1981-11-27 | 1981-11-27 | Variable wavelength semiconductor laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5892288A JPS5892288A (en) | 1983-06-01 |
| JPH0158876B2 true JPH0158876B2 (en) | 1989-12-13 |
Family
ID=16268035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56191049A Granted JPS5892288A (en) | 1981-11-27 | 1981-11-27 | Variable wavelength semiconductor laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5892288A (en) |
-
1981
- 1981-11-27 JP JP56191049A patent/JPS5892288A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5892288A (en) | 1983-06-01 |
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