JPH0216394B2 - - Google Patents
Info
- Publication number
- JPH0216394B2 JPH0216394B2 JP4534386A JP4534386A JPH0216394B2 JP H0216394 B2 JPH0216394 B2 JP H0216394B2 JP 4534386 A JP4534386 A JP 4534386A JP 4534386 A JP4534386 A JP 4534386A JP H0216394 B2 JPH0216394 B2 JP H0216394B2
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- power supply
- electroplating
- pattern
- sliding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing of the conductive pattern
- H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Electroplating Methods And Accessories (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は絶縁性部材平面上の金属パターンに
電気めつきする方法、プリント配線基板表面の、
エツチングにより形成された銅の回路パターンに
電気めつきする方法、及びその装置に関する。Detailed Description of the Invention (Industrial Field of Application) This invention relates to a method of electroplating a metal pattern on a plane of an insulating member, a method of electroplating a metal pattern on a plane of an insulating member,
This invention relates to a method and apparatus for electroplating a copper circuit pattern formed by etching.
(従来の技術)
従来、工業製品を電気めつきする場合、これを
一個ずつ吊るすか、まとめて篭に入れその篭を吊
り、めつき液槽外側に沿わした陰極棒から吊具を
通して各製品に電流が通るようにしている。(Conventional technology) Conventionally, when electroplating industrial products, each product was hung one by one, or all of them were placed in a basket and the basket was hung, and each product was attached to the product through a hanging device from a cathode rod along the outside of the plating solution tank. It allows current to flow through it.
従つて、絶縁性部材平面上の一部分だけに載つ
た金属パターン(模様)にめつきしようとする
と、電気めつきでなく、他のめつき法によらねば
ならなかつた。 Therefore, in order to plate a metal pattern on only a portion of the plane of the insulating member, it is necessary to use other plating methods instead of electroplating.
(発明が解決しようとする問題点)
例えばプリント配線基板の製造工程中、エツチ
ングにより表面の銅はくを回路パターンの形に残
した状態にしてしまうと、以後、このパターンの
上に電気めつきすることは不可能となる。(Problem to be Solved by the Invention) For example, during the manufacturing process of printed wiring boards, if the copper foil on the surface is left in the shape of a circuit pattern by etching, then electroplating will be carried out on top of this pattern. It becomes impossible to do so.
エツチングにより形成した回路パターンの端縁
部は銅はくの地はだが出ている。これを耐食金属
で被覆するには、予め銅はく表面にはんだめつき
しておき、エツチング後昇温させる事により、表
面のはんだが端縁部へ流れ落ちるようにする方
法、あるいは、直接、溶融はんだに接触させて端
縁部もはんだめつきする方法がある。 At the edge of the circuit pattern formed by etching, the copper foil is exposed. To coat this with a corrosion-resistant metal, solder is applied to the surface of the copper foil in advance, and the temperature is raised after etching so that the solder on the surface flows down to the edges, or directly. There is a method in which the edges are also soldered by bringing them into contact with molten solder.
しかし、はんだめつきは弗化物、鉛を排出する
ため公害問題を生じ、その対策が面倒になる事、
配線板の場合、回路の端子部分に金めつきする前
に、はんだを除去する余分な作業が加わる事、基
板を余分に加熱するため、ひずみやすい事等、問
題であつた。 However, soldering causes pollution problems because it emits fluoride and lead, and countermeasures can be troublesome.
In the case of wiring boards, problems include the extra work of removing solder before gold-plating the circuit terminals, and the extra heating of the board, which tends to cause distortion.
この発明は絶縁性基板平面上の局部的金属パタ
ーンにでも電気めつきを可能にする事により、上
述の問題点を一掃するだけでなく、電気めつきの
用途も広げ得る、という着想にもとづくものであ
る。 This invention is based on the idea that by making electroplating possible even on localized metal patterns on the plane of an insulating substrate, it not only eliminates the above-mentioned problems, but also expands the applications of electroplating. be.
(問題点を解決するための手段)
この発明は(1)絶縁性部材平面上の金属パターン
に電気めつきする方法において、摺動又は転動給
電面のみ露出させ、他部は水密被覆した陰極と裸
の陽極とをめつき液槽に漬け、上記部材を、その
金属パターン面を上記給電面と相対摺動又は転動
接触させつゝ、上記めつき液槽に漬けることを特
徴とするパターン電気めつき法。(2)プリント配線
基板表面の、エツチングにより形成した銅の回路
パターンに電気めつきする装置において、めつき
液槽の液面及び底面沿いに漬けた上下の陽極板
と、横長の摺動又は転動給電面のみ露出させ、他
部は水密被覆した陰極板二枚の、上記給電面を上
下に対向させ、その間隙を上記基板がその両面を
摺動又は転動接触させて通過し得るようにした一
対を、順次、上記上下陽極板の間に水平に並べ設
けた上下陰極配列と、その上下陰極配列の一端か
ら、上記上下給電面間隙へ次々と送り込まれる上
記基板を送り進めて配列他端から排出するよう、
各上下陰極板の間々に配設した上下送りローラ
と、を備えることを特徴とするパターン電気めつ
き装置である。(Means for Solving the Problems) This invention provides (1) a method of electroplating a metal pattern on a plane of an insulating member, in which only the sliding or rolling power supply surface is exposed, and the other parts are covered with a watertight cathode. and a bare anode are immersed in a plating liquid bath, and the above member is immersed in the plating liquid bath while its metal pattern surface is in relative sliding or rolling contact with the power supply surface. Electroplating method. (2) In a device for electroplating a copper circuit pattern formed by etching on the surface of a printed wiring board, the upper and lower anode plates immersed along the liquid level and bottom of the plating bath are moved horizontally by sliding or rolling. Two cathode plates with only the dynamic power supply surface exposed and the other parts watertightly coated, the power supply surfaces of which are vertically opposed to each other, so that the substrate can pass through the gap with both surfaces in sliding or rolling contact. The pairs of substrates are sequentially arranged horizontally between the upper and lower anode plates, and the substrates are fed one after another from one end of the upper and lower cathode arrays into the gap between the upper and lower power feeding surfaces, and are discharged from the other end of the array. to do,
This is a pattern electroplating device characterized by comprising a vertical feed roller disposed between upper and lower cathode plates.
(作用)
この発明のパターン電気めつき法は、めつき液
に漬けた陰極に摺動又は転動給電面を設け、絶縁
性部材のめつきすべき金属パターンとこれを直
接、摺動又は転動接触させて、電気めつきに必要
な電位及び電流を保持する。移動させながらめつ
きするから、パターンそのものに陰極を当てゝ
も、めつきムラを生じない。そして次々と送られ
るパターンを連続してめつきし得る。(Function) In the pattern electroplating method of the present invention, a sliding or rolling power supply surface is provided on the cathode immersed in a plating solution, and the sliding or rolling power supply surface is directly connected to the metal pattern to be plated on the insulating member. in dynamic contact to maintain the potential and current necessary for electroplating. Since plating is performed while moving, uneven plating will not occur even if the cathode is applied to the pattern itself. Then, the patterns sent one after another can be plated in succession.
陰極は給電面だけ露出させて水密被覆したか
ら、これをめつき液に漬けても、給電面がめつき
されるだけで、無駄が少く、交換も容易である。 Since the cathode is covered with a watertight coating with only the power supply surface exposed, even if it is immersed in a plating solution, only the power supply surface is plated, so there is little waste and replacement is easy.
またこの発明のパターン電気めつき装置は、め
つき液槽の液面及び底面沿いに上下の陽極板を漬
け、それらの間に水平に上下陰極配列を設け、そ
の上下給電面間に基板を進める上下送りローラを
付設したから、基板の両面に回路パターンがある
ものも、次々と送りローラへ送つて自動的に、両
面均等にめつきし得る。 Further, in the pattern electroplating apparatus of the present invention, upper and lower anode plates are immersed along the liquid level and bottom of the plating liquid tank, upper and lower cathode arrays are provided horizontally between them, and the substrate is advanced between the upper and lower power supply surfaces. Since the upper and lower feed rollers are attached, even substrates with circuit patterns on both sides can be sent one after another to the feed rollers and automatically plated evenly on both sides.
(実施例)
第1,2図はこの発明の基本的実施例を示す。
平面上の金属パターンをもつ絶縁性部材は、以下
の実施例ではプリント配線基板Mとする。(Embodiment) Figures 1 and 2 show a basic embodiment of the present invention.
The insulating member having a metal pattern on a plane is a printed wiring board M in the following embodiments.
図の1はめつき液槽、2は陽極、3は陰極、4
はその摺動給電面、5は基板Mを槽内で送る送り
ローラ、6,7は槽1への基板入口、出口であ
る。 In the figure, 1 is the plating liquid tank, 2 is the anode, 3 is the cathode, 4
5 is a feeding roller for feeding the substrate M in the tank, and 6 and 7 are the substrate entrance and exit to the tank 1.
めつき液槽1は通常の槽の両端槽壁に基板Mを
さし込む入口6と出口7を設けたもので、入口
6、出口7ともに、液が多く洩れ出ないようスポ
ンジを開口縁に取付けシールする。陽極2は通常
の帯状板であるが、陰極3は第3図に例示するよ
うに、銅板3aの端面に摺動給電面となる銅線ブ
ラシ4を付け、その他の外周は樹脂3bにより水
密被覆したものである。 The plating liquid tank 1 is a conventional tank with an inlet 6 and an outlet 7 for inserting the substrate M into the tank walls at both ends.A sponge is placed around the opening edge of both the inlet 6 and the outlet 7 to prevent too much liquid from leaking out. Install and seal. The anode 2 is a normal strip-shaped plate, but the cathode 3 is a copper plate 3a with a copper wire brush 4 attached to the end face to serve as a sliding power supply surface, and the other outer periphery is watertightly covered with resin 3b, as illustrated in FIG. This is what I did.
なお、陰極3の給電面として、ブラシ4は市販
品をそのまゝ使えて好都合であるが、銅板平面を
そのまゝ摺動給電面とし、パターン面へ弾力的に
押付けられる構造にするとか、チタン、ネオジウ
ム等のブラシ又は転動給電ローラとする等、設計
者の周知技術にまかせる。 Although it is convenient to use a commercially available brush 4 as the power supply surface of the cathode 3, it is possible to use the plane of the copper plate as it is as a sliding power supply surface and to have a structure in which it is pressed elastically against the pattern surface. Leave it to the designer's well-known technology, such as using a brush made of titanium, neodymium, etc., or a rolling power supply roller.
めつきするパターン面に直接、ブラシ4を摺動
させる事は、すでにめつき済みの部分をブラシ4
でもつて引つかくようになるため、多少の不安は
あつたが、実験の結果、仕上つためつき面の品質
は全く問題がないことを確め得た。 Slide the brush 4 directly onto the pattern surface to be plated.
However, as a result of the experiment, I was able to confirm that there was no problem with the quality of the finished matte surface.
第4図はプリント配線基板Mのパターンの一例
で、そのCは回路、Hは裏面パターンとの導通
孔、Tは端子部である。絶縁板面に、このように
分散したパターンは、従来、電気めつき不能とさ
れていたのも無理はない。この発明により、はじ
めて可能になつたのである。 FIG. 4 shows an example of the pattern of the printed wiring board M, in which C is a circuit, H is a conductive hole with the back pattern, and T is a terminal portion. It is no wonder that such a dispersed pattern on the surface of an insulating plate has conventionally been considered impossible to electroplat. This invention made it possible for the first time.
従来の問題点として、さきに述べた金めつきす
る端子部とは第4図の多数並んだTのことで、
こゝにはんだが付くと、これを除去する作業がふ
えるのである。 The problem with the conventional method is that the gold-plated terminal section mentioned earlier refers to the many T's lined up in Figure 4.
If solder gets on this part, the work to remove it increases.
第5,6図には銅張り基板材表面の銅が、エツ
チングによりパターン回路Cとして残された断面
を拡大して示す。エツチングの前にエツチングレ
ジストRをめつきしておくと、図のようにパター
ン回路Cの予定幅より余分に出たオーバーリング
Oを生じており、その後のエツチングでは逆に、
回路C端縁にアンダーカツトUが生じている。
こゝは銅の地はだが露出している。 5 and 6 show enlarged cross-sections of the copper on the surface of the copper-clad substrate material left behind as a pattern circuit C by etching. If the etching resist R is plated before etching, an over ring O that extends beyond the planned width of the pattern circuit C will occur as shown in the figure, and in the subsequent etching, on the contrary,
An undercut U occurs at the edge of the circuit C.
Here, the bare copper is exposed.
この発明により、これを仕上めつき層8で被覆
すると、第6図のように完全に耐食性の回路Cと
なる。エツチングレジストRも仕上めつき層8
も、Sn−Ni又はSn−Co合金のいずれかを用い
た。 According to the invention, when this is coated with a final plating layer 8, a completely corrosion-resistant circuit C is obtained as shown in FIG. Etching resist R also finishing plating layer 8
Also, either Sn-Ni or Sn-Co alloy was used.
この発明のパターン電気めつき装置の実施例は
第7,8図に示す。めつき液槽1は外槽10の中
に入つているから、配線基板Mの入口6、出口7
や多数の送りローラ5の駆動軸5aを通す槽壁の
穴から、めつき液が流出しても外槽10に溜ま
る。溜まつた液はポンプ9により汲上げ、分配管
11の多数の小穴から、めつき液槽1へ均等に流
下させる。 An embodiment of the pattern electroplating apparatus of the present invention is shown in FIGS. 7 and 8. Since the plating liquid tank 1 is contained in the outer tank 10, the inlet 6 and outlet 7 of the wiring board M
Even if the plating liquid flows out from the holes in the tank wall through which the drive shafts 5a of the many feed rollers 5 pass, it collects in the outer tank 10. The accumulated liquid is pumped up by a pump 9 and uniformly flows down into the plating liquid tank 1 through a large number of small holes in a distribution pipe 11.
めつき液槽1内には上下の陽極板2aが水平に
配置され、その間に架枠12が固定され、その中
に全部の上下陰極3を取付けて陰極配列13を形
成している。 Upper and lower anode plates 2a are arranged horizontally in the plating liquid tank 1, a frame 12 is fixed between them, and all the upper and lower cathodes 3 are attached therein to form a cathode array 13.
各上下陰極3はローラ5を覆う形にして、陽極
板2a、ブラシ4間を遮断している。 Each of the upper and lower cathodes 3 covers the roller 5 to isolate the anode plate 2a and the brush 4 from each other.
各上下陰極3の間々に上下送りローラ5が配置
され、それぞれの駆動軸5aは外槽10の側壁外
面まで伸び出て軸受けされ、チエン車5bをつ
け、チエンと中間軸5cを介してモータ14によ
り同調駆動される。 A vertical feed roller 5 is disposed between each of the upper and lower cathodes 3, and each drive shaft 5a extends to the outer surface of the side wall of the outer tank 10 and is supported by a bearing. is synchronously driven by.
上下陽極板2a、各陰極3をそれぞれ+−電源
へつなぐ線は通常の樹脂被覆線とした。基板Mを
入口6へ挿入するのは人手によつたが、生産装置
ではコンベア等により自動供給し、出口から出た
ら自動搬出するのも容易である。 The wires connecting the upper and lower anode plates 2a and each cathode 3 to the + and - power supplies were ordinary resin-coated wires. Although it was necessary to manually insert the substrate M into the entrance 6, it is easy to automatically feed the substrate M using a conveyor or the like in a production device, and to automatically carry it out when it comes out of the exit.
以上、図示した実施例について説明したが、め
つきするパターンは電気回路に限らず、任意の金
属模様を対象とし、実施条件に応じて多様に変
化、応用し得ることは、いうまでもない。 Although the illustrated embodiments have been described above, it goes without saying that the pattern to be plated is not limited to electric circuits, but can be applied to any metal pattern, and can be varied and applied in a variety of ways depending on the implementation conditions.
(発明の効果)
この発明のパターン電気めつき法は、従来、陽
極のみめつき液に漬け、陰極は液に漬けず、被め
つき品に吊具等を介して接続していたのに対し、
陰極自体をめつき液に漬けたから、絶縁性部材の
平面上の小さな金属パターンに対しても、十分に
摺動又は転動給電でき、これに電気めつきでなけ
れば付けられない高融点、高硬度の金属をめつき
する道を開いた。(Effects of the Invention) In contrast to the conventional pattern electroplating method of the present invention, in which the anode was immersed in a glazing solution and the cathode was not immersed in the solution, but was connected to the plated item via a hanging tool, etc. ,
Since the cathode itself is immersed in the plating solution, it can be electrically supplied by sliding or rolling even to a small metal pattern on a flat surface of an insulating member. This paved the way for plating hard metals.
めつきすべきパターン上に陰極を当てゝも、そ
れは摺動又は転動する給電面であるから、めつき
ムラを生じない。また陰極を裸でめつき液に漬け
れば、電解金属を吸収するが、この発明は陰極の
給電面以外は水密被覆したから、その恐れがな
い。 Even if the cathode is placed on the pattern to be plated, since it is a sliding or rolling power supply surface, uneven plating will not occur. Furthermore, if the cathode is immersed bare in the plating solution, it will absorb electrolytic metal, but in the present invention, the cathode is coated with watertight coating except for the power supply surface, so there is no risk of this happening.
またこの発明のパターン電気めつき装置は上下
陰極配列に上下送りローラを組込んだため、両面
にプリント配線する基板を、その一端から挿入し
てやれば、他端から回路パターンにめつきした物
が次々と排出され、従来の吊具による基板送給に
比べ、生産性向上効果が著しい。そして、上下陰
極配列の上下に陽極板を配置したから、基板両面
のパターンのめつき品質が均等である。 Furthermore, since the pattern electroplating apparatus of the present invention incorporates the upper and lower cathode arrays and the upper and lower feed rollers, if a board to be printed on both sides is inserted from one end, the circuit patterns plated one after another from the other end. This has a significant productivity improvement effect compared to the conventional substrate feeding method using a hanging tool. Since the anode plates are arranged above and below the upper and lower cathode arrays, the plating quality of the patterns on both sides of the substrate is uniform.
第1,2図はこの発明一実施例の縦断面図、平
面図、第3図はその陰極の説明図、第4図はプリ
ント配線基板の一例平面図、第5,6図はエツチ
ング直後の配線回路断面拡大図と、仕上めつきし
た状態の断面図、第7,8図はこの発明装置の実
施例縦断面図、平面図である。
2,2a……陽極、3……陰極、4……摺動給
電面、5……送りローラ、13……陰極配列。
Figures 1 and 2 are a longitudinal sectional view and a plan view of an embodiment of this invention, Figure 3 is an explanatory diagram of the cathode, Figure 4 is a plane view of an example of a printed wiring board, and Figures 5 and 6 are after etching. An enlarged cross-sectional view of the wiring circuit, a cross-sectional view of the finished plated state, and FIGS. 7 and 8 are a vertical cross-sectional view and a plan view of an embodiment of the device of the present invention. 2, 2a...anode, 3...cathode, 4...sliding power supply surface, 5...feeding roller, 13...cathode arrangement.
Claims (1)
きする方法において、 摺動又は転動給電面のみ露出させ、他部は水密
被覆した陰極と裸の陽極とをめつき液槽に漬け、
上記部材を、その金属パターン面を上記給電面と
相対摺動又は転動接触させつゝ、上記めつき液槽
に漬けることを特徴とするパターン電気めつき
法。 2 プリント配線基板表面のエツチングにより形
成した銅の回路パターンに電気めつきする装置に
おいて、 めつき液槽の液面及び底面沿いに漬けた上下の
陽極板と、 横長の摺動又は転動給電面のみ露出させ、他部
は水密被覆した陰極板二枚の、上記給電面を上下
に対向させ、その間隙を上記基板がその両面を摺
動又は転動接触させて通過し得るようにした一対
を、順次、上記上下陽極板の間に水平に並べ設け
た上下陰極配列と、 その上下陰極配列の一端から、上記上下給電面
間隙へ次々と送り込まれる上記基板を送り進めて
配列他端から排出するよう、各上下陰極板の間々
に配設した上下送りローラと、 を備えることを特徴とするパターン電気めつき装
置。[Claims] 1. In a method of electroplating a metal pattern on a flat surface of an insulating member, only the sliding or rolling power supply surface is exposed, and the other parts are coated with a watertight cathode and a bare anode using a plating solution. Pickled in a tank,
A pattern electroplating method characterized in that the member is immersed in the plating solution bath while the metal pattern surface thereof is brought into relative sliding or rolling contact with the power supply surface. 2. In an apparatus for electroplating copper circuit patterns formed by etching the surface of a printed wiring board, the upper and lower anode plates are immersed along the liquid level and bottom of the plating liquid tank, and the horizontally elongated sliding or rolling power supply surface. A pair of cathode plates with only one part exposed and the other part watertightly coated, the power supply surfaces facing each other vertically, and the substrate passing through the gap by sliding or rolling contact on both surfaces. , sequentially, upper and lower cathode arrays arranged horizontally between the upper and lower anode plates, and the substrates that are successively fed into the gap between the upper and lower power feeding surfaces from one end of the upper and lower cathode arrays, and are discharged from the other end of the array; A pattern electroplating device comprising: a vertical feed roller disposed between upper and lower cathode plates;
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4534386A JPS62205298A (en) | 1986-03-04 | 1986-03-04 | Method and apparatus for patterned electroplating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4534386A JPS62205298A (en) | 1986-03-04 | 1986-03-04 | Method and apparatus for patterned electroplating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62205298A JPS62205298A (en) | 1987-09-09 |
| JPH0216394B2 true JPH0216394B2 (en) | 1990-04-17 |
Family
ID=12716640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4534386A Granted JPS62205298A (en) | 1986-03-04 | 1986-03-04 | Method and apparatus for patterned electroplating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62205298A (en) |
-
1986
- 1986-03-04 JP JP4534386A patent/JPS62205298A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62205298A (en) | 1987-09-09 |
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