JPH02170306A - Ferromagnetic ferroelectric oxide and manufacture of thin film thereof - Google Patents
Ferromagnetic ferroelectric oxide and manufacture of thin film thereofInfo
- Publication number
- JPH02170306A JPH02170306A JP32537688A JP32537688A JPH02170306A JP H02170306 A JPH02170306 A JP H02170306A JP 32537688 A JP32537688 A JP 32537688A JP 32537688 A JP32537688 A JP 32537688A JP H02170306 A JPH02170306 A JP H02170306A
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- Japan
- Prior art keywords
- composition
- oxide
- ferromagnetic
- ferroelectric oxide
- thin film
- Prior art date
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- 230000005294 ferromagnetic effect Effects 0.000 title claims abstract description 20
- 239000010409 thin film Substances 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000203 mixture Substances 0.000 claims abstract description 58
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims description 22
- 239000010408 film Substances 0.000 claims description 17
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 238000003980 solgel method Methods 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims 1
- 229910052748 manganese Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical compound [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 claims 1
- 229910000314 transition metal oxide Inorganic materials 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 abstract 2
- 229910000416 bismuth oxide Inorganic materials 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- 230000005291 magnetic effect Effects 0.000 description 14
- 230000005621 ferroelectricity Effects 0.000 description 12
- 230000005307 ferromagnetism Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000011160 research Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 230000002269 spontaneous effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229910002902 BiFeO3 Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 210000004907 gland Anatomy 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- RXPAJWPEYBDXOG-UHFFFAOYSA-N hydron;methyl 4-methoxypyridine-2-carboxylate;chloride Chemical compound Cl.COC(=O)C1=CC(OC)=CC=N1 RXPAJWPEYBDXOG-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910002059 quaternary alloy Inorganic materials 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Inorganic Insulating Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、多機能性薄膜を形成することのできる強磁
性強誘電体酸化物およびはその薄膜の製造方法に関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a ferromagnetic ferroelectric oxide capable of forming a multifunctional thin film and a method for manufacturing the thin film.
近年、民生用、産業用を問わず、多くの分野の機器が、
超LSI等の半導体デバイス技術の発達に伴ってインテ
リジェント化、スマート化して来ているが、これらの最
新の装置には、高度な性能を有したセンサー、トランス
デユーサ。In recent years, equipment in many fields, both consumer and industrial, has
With the development of semiconductor device technology such as VLSI, they are becoming more intelligent and smart, and these latest devices are equipped with sensors and transducers with advanced performance.
アクチュエータが高密度半導体メモリ、高密度論理演算
素子とともに不可欠の要素となってきている。この様な
状況に対応すべく、センサ。Actuators have become essential elements along with high-density semiconductor memory and high-density logic operation elements. Sensors are designed to handle situations like this.
トランスデユーサ、アクチュエータの新機能デバイスの
研究も盛んとなってきているが、これら機能デバイスを
より高性能・多様化する為の新機能材料の研究も盛んで
ある。Research into new functional devices such as transducers and actuators is becoming more active, and research into new functional materials to improve the performance and diversification of these functional devices is also active.
強磁性強誘電体は上記した民生用及び産業機器・ニーズ
とは無関係に物性論的興味から研究されていた時期があ
った。この時期に於いては、ABO,ペロブスカイト構
造のA又はBサイトに鉄等の磁性イオンを置換するもの
(スモレンスキー等: Tekl+n1chsskoy
Fiz 281958) 、酸化クロム(Cr、O3
)(Rado : Phys Rev Lett、 6
1961)。There was a time when ferromagnetic and ferroelectric materials were studied out of interest in physical properties, unrelated to the consumer and industrial equipment and needs mentioned above. At this time, ABO, a perovskite structure in which a magnetic ion such as iron is substituted at the A or B site (Smolensky et al.: Tekl+n1chsskoy
Fiz 281958), chromium oxide (Cr, O3
) (Rado: Phys Rev Lett, 6
1961).
γフェライト(y −Fe、O3)(Rado et
al PhysRev、B121977)、 Niボラ
サイト(Ni、 Bt Ox x I)(Ascher
at al : J、^pp1.Phys 37−1
966) が強磁性強誘電性を示す材料として注目を
浴び、これらの材料の応用の可能性についての検討も行
なわれた。(V、E、Wood at al : Ma
gnetoelectricPhenomena in
Crytals ads A、J、Freeman
et a1しかしながら、これらの材料はいずれも、強
磁性強誘電性を示す体積分率が極めて小さかったり、強
磁性強誘電性を示す温度領域が低すぎて実用には供せな
いというのが実情であった。γ ferrite (y-Fe, O3) (Rado et
al PhysRev, B121977), Ni borasite (Ni, Bt Ox x I) (Ascher
at al: J, ^pp1. Phys 37-1
966) has attracted attention as a material exhibiting ferromagnetism and ferroelectricity, and studies have been conducted on the potential applications of these materials. (V, E, Wood at al: Ma
Gnetoelectric Phenomena in
Crystals ads A, J, Freeman
et a1 However, the reality is that these materials cannot be put to practical use because the volume fraction in which they exhibit ferromagnetism and ferroelectricity is extremely small, and the temperature range in which they exhibit ferromagnetism and ferroelectricity is too low. there were.
これに対し、この発明者はx −BiFeO,−(1−
x )ABO3,x = O〜1という組成を有した酸
化物系に注目し、1!続的に研究を行なってきている。On the other hand, this inventor x -BiFeO,-(1-
x) Focusing on the oxide system with the composition ABO3, x = O~1, 1! We are continuing to conduct research.
その経過は1例えば、電気学会マグネティックス研究会
資料MAG−86−73(1986)P49〜P58゜
日本応用磁気学会誌Vol 10. Na 2 (19
86) P323〜P326. 電気学会マグネティッ
クス研究会資料NAG−88−15(1988)P35
〜P44等に記載している。The progress is as follows:1 For example, IEEJ Magnetics Research Group Material MAG-86-73 (1986) P49-P58゜Journal of Applied Magnetics, Japan Vol. 10. Na2 (19
86) P323-P326. IEEJ Magnetics Study Group Material NAG-88-15 (1988) P35
It is described on page 44 etc.
これらの文献に記載した従来の組成は
xBiFao、 −(1−x )ABO,と表現できる
、 いわゆる化学量論的組成であって、室温で大きな強
磁性強誘電性を示すという、従来の強磁性強誘電体には
見られない画期的な材料であることがわかった。The conventional composition described in these documents is a so-called stoichiometric composition that can be expressed as xBiFao, -(1-x)ABO, and is a conventional ferromagnetic composition that exhibits large ferromagnetism and ferroelectricity at room temperature. It turned out to be a revolutionary material not found in ferroelectrics.
しかしながら該ペロブスカイト1IIt造を有する化学
量論的組成物は前記した如く室温で大きな強磁性強誘電
性を有する画期的材料ではあるものの特性面、安定性の
面で更に改善の余地が残されていないわけではなかった
。However, although the stoichiometric composition having the perovskite 1IIIt structure is an innovative material that has large ferromagnetism and ferroelectricity at room temperature as described above, there is still room for further improvement in terms of properties and stability. It wasn't like there wasn't one.
即ち1強磁性体単独材料の磁気特性1強誘電体単独材料
の強誘電特性の個々の最良レベルに達していない分を改
善の余地とし、そこに−歩でも迫るという改善を目指し
た研究を行うことは!義のあることである。In other words, 1) Magnetic properties of ferromagnetic materials 1) Ferroelectric properties of ferroelectric materials that have not reached their respective best levels will be considered as room for improvement, and research will be conducted with the aim of improving the ferroelectric properties of ferromagnetic materials to come even one step closer. That's true! It is righteous.
この発明は、この様な観点に立ち、従来の化学量論的組
成という枠から外れ、非化学量論組成に視点を換えた結
果から生じた発明であり。From this perspective, this invention was created as a result of changing the perspective from the conventional framework of stoichiometric composition to non-stoichiometric composition.
その目的は従来以上のより良い性能を有した強磁性強誘
電性を提供しようというものである。The aim is to provide ferromagnetism and ferroelectricity with better performance than ever before.
〔課題を解決するための手段及び作用〕発明者は組成実
験をくり返した結果、好ましい調合組成がxBiFeo
、−(1−x)ABO,x= O〜1といったプロブス
カイト相化学量論的よりも、むしろ非化学量論的組成と
なるように調合した方が良いということを実験的に確認
した。即ち、xBiFao3−(1−x)ABO,x=
o 〜1という組成からFe、O,−Bi2O,−AB
O,三元系、又はFe2O。[Means and effects for solving the problem] As a result of repeated composition experiments, the inventor found that the preferred composition was xBiFeo.
, -(1-x)ABO, x=O~1 It was experimentally confirmed that it is better to prepare the composition to have a non-stoichiometric composition rather than a stoichiometric one. That is, xBiFao3-(1-x)ABO,x=
From the composition o ~ 1, Fe, O, -Bi2O, -AB
O, ternary system, or Fe2O.
−[3i、 O,−TMOx −ABO,(TM :鉄
属元素)という四元系へ組成変更して強誘電強磁性特性
を改良すると同時に安定性を改善しようというものであ
る。The idea is to change the composition to a quaternary system of -[3i, O, -TMOx -ABO, (TM: iron element) to improve the ferroelectric and ferromagnetic properties as well as the stability.
第1図、第3図に従来の組成系とこの発明による組成系
との関係を示した。従来の組成は第1図、第3図に示し
た様に直線A−A’及びB−B’線上にある。これに対
しこの発明はこの腺から酸化鉄の多い側ヘズラした組成
となっている。この様に調合組成を化学量論的組成から
ズラし、かつ非晶質構造を実現させることによって1強
磁性と強誘電性を共存させ、しかも、化学量論的調合組
成では得られなかった安定性が得られる様になった。FIGS. 1 and 3 show the relationship between the conventional composition system and the composition system according to the present invention. The conventional composition lies on straight lines AA' and BB' as shown in FIGS. 1 and 3. In contrast, the composition of the present invention is shifted from this gland to the side with more iron oxide. In this way, by shifting the composition from the stoichiometric composition and realizing an amorphous structure, ferromagnetism and ferroelectricity coexist, and moreover, it is possible to achieve stability that could not be obtained with a stoichiometric composition. Now I can have sex.
(第1実施例)
試料作製は先ずスパッタ装置を用い、カソード板上に直
径12■のステンレス製シャーレを置き、その中にBi
□03. a−Fe203. PBTiO,及びPbO
の混合粉末を充填したものをターゲットとして用いた。(First Example) First, a sample was prepared using a sputtering device. A stainless steel petri dish with a diameter of 12 cm was placed on the cathode plate, and Bi was placed in it.
□03. a-Fe203. PBTiO, and PbO
A target filled with mixed powder was used.
なお、PbOはスパッタ中、釦の蒸発による損失を補填
する目的でPbTi0.に対し5%〜10%過剰に加え
た。スパッタガスはArと02の4:1混合ガスで合成
圧力を4 X 10−”Torrと一定にした。スパッ
タガス圧が0.ITorr以上になると、スパッタ率は
改善されるが、多くの試料が村上状態の悪い粉末状のも
のとなってしまう、基板にはCorning 7059
ガラスとSi−ウェーハ(100)面を用い基板温度を
370℃〜400℃。It should be noted that PbO was added to PbTi0. It was added in an excess of 5% to 10%. The sputtering gas was a 4:1 mixed gas of Ar and 02, and the combined pressure was kept constant at 4 x 10-''Torr.When the sputtering gas pressure exceeded 0.ITorr, the sputtering rate was improved, but many samples Murakami: Corning 7059 is used for the substrate, which results in a powdery product with poor condition.
Glass and Si-wafer (100) surfaces were used, and the substrate temperature was 370°C to 400°C.
高周波投入電力3001+1で1〜6時間スパッタした
。Sputtering was performed for 1 to 6 hours at a high frequency input power of 3001+1.
この様にして得た薄膜はいずれも琥珀色をした表面光沢
のある透明なもので、その後この試料を大気中で500
〜800℃の温度で1〜2時間熱処理した。All of the thin films obtained in this way were amber in color and transparent with a glossy surface.
Heat treatment was performed at a temperature of ~800°C for 1-2 hours.
以上の様な製造プロセスを固定しておいてターゲット組
成を口i20. 、 a −Fe20. 、 PbT
i0.を3元として第1図の様に変化させ、各々につい
て磁気特性とrtI′lt特性を測定した。磁気特性は
VSM(試料振動型磁力計)で、誘電特性は試料表面に
アルミニウム電極を蒸着し、各々ヒステリシスカーブを
測定し、自発磁化4πMs、自発分極Psの大きさで強
磁性及び強誘電性を評価した。表1に各組成ごとの特性
結果と最適な熱処理温度を示す。この最適温度から更に
熱処理温度を上昇させると全般に結晶化し、同時にマイ
クロクラックが見られる様になり、膜厚方向の耐圧が低
下し、誘電特性の測定が殆ど不可能になる。表1に於て
誘電的安定性は2回目以降の残留分極Psの測定値に再
現性が乏しいものX。While fixing the manufacturing process as described above, the target composition is set to i20. , a-Fe20. , PbT
i0. The three elements were varied as shown in FIG. 1, and the magnetic properties and rtI'lt properties were measured for each element. The magnetic properties were measured using a VSM (vibrating sample magnetometer), and the dielectric properties were measured by depositing an aluminum electrode on the sample surface and measuring the hysteresis curve for each. Ferromagnetism and ferroelectricity were determined by the magnitude of spontaneous magnetization 4πMs and spontaneous polarization Ps. evaluated. Table 1 shows the characteristic results and optimum heat treatment temperature for each composition. If the heat treatment temperature is further increased from this optimum temperature, crystallization occurs throughout the film, and at the same time microcracks appear, the withstand voltage in the film thickness direction decreases, and measurement of dielectric properties becomes almost impossible. In Table 1, the dielectric stability indicates that the remanence polarization Ps measured from the second time onwards has poor reproducibility.
再現性が有るが測定中にゆらぐものΔ、再現性が良く、
ゆらぎが少ないものに0の印がつけである。これらの表
からも明らかな如く、第1図に示す従来組成Nα11〜
Nα17及び&21に比べこの実施例では磁気特性が良
くなり、かっ誘電安定性が増していることがわかる。試
料111a50,2゜3.4,5,6,7,8,9,1
0,1.51で囲まれた領域の組成が今回の提案による
ものであるが、この領域より外側、例えばNα51.
l 、 10゜9からなる辺より外側はPbTi0iが
極めて少い組成であり、自発分極の大きさが強磁性値v
i電体と言えないくらいに小さくなる。又、Na 6〜
9からなる辺より外側は従来組成に近くなり改良の効果
がなくなる。44,5.6からなる辺より外側、Nα5
0,2,3.4からなる辺の外側。There is reproducibility, but there is fluctuation during measurement Δ, reproducibility is good,
Those with little fluctuation are marked with 0. As is clear from these tables, the conventional composition Nα11~ shown in Figure 1
It can be seen that compared to Nα17 and &21, this example has better magnetic properties and increased dielectric stability. Sample 111a50,2゜3.4,5,6,7,8,9,1
The composition of the region surrounded by Nα51.0 and Nα51.
The area outside the side consisting of 10°9 has a composition with extremely little PbTi0i, and the magnitude of the spontaneous polarization is equal to the ferromagnetic value v
It becomes so small that it cannot be called an i-electric body. Also, Na 6~
The area outside the side consisting of 9 becomes close to the conventional composition and the improvement effect is lost. Outside the side consisting of 44, 5.6, Nα5
The outside of the side consisting of 0, 2, 3.4.
Nα50.51からなる辺の外側についても同様である
。なお、熱処理の効果はいずれの組成でも顕著であり、
従来例(Nα11〜Nα17とNa20)と同様である
。即ち、熱処理を行わない、アズブローンの状態では強
磁性9強誘電性ともヒステリシスカーブが殆ど検出され
ないのに対し、この実施例による組成領域では700℃
熱処理膜はX線解析測定では、いずれも第2図(a)(
b)の様にハローパターンが12DIされ非晶質である
が強磁性1強誘電性も両ヒステリシスが観測された。The same applies to the outside of the side consisting of Nα50.51. Furthermore, the effect of heat treatment is remarkable for both compositions.
This is the same as the conventional example (Nα11 to Nα17 and Na20). That is, in the as-blown state without heat treatment, almost no hysteresis curve is detected for both ferromagnetism and ferroelectricity, whereas in the composition range according to this example, hysteresis curves of 700°C
X-ray analysis of the heat-treated films shows that they are both shown in Figure 2 (a) (
As shown in b), the halo pattern has 12 DI and is amorphous, but both hysteresis was observed for ferromagnetism and ferroelectricity.
これを例えば770℃〜800℃迄熱処理温度を上げる
と結晶化すると同時に磁化の大きさが急速に減少してし
まう。又、結晶とともにに膜−面に不透明化がおこり、
vI電電圧圧一挙に低下し、誘電特性が計1定できなく
なってくる。なお、誘(表1)
サンプルNα FもO,Bi2へ
PbTi0. 4 πMs Ps 熱処理温度(K
G) (μd(切 (”C)
0.5 2.0 001 6900.819
001 690
0.5 14 002 690
1、s 1.5 006 7002.5 1
4 007 700
4 0.7 013 680
4 06 011 (i801 0.7
003 680
0.7 15 002 680
0.08
0.12
0.10
安定性
型持性が測定できる熱処理温度に於いて、比誘電率εr
、 tanδは組成によらずεr〜20. tanδ
〜0.02程度であった。If the heat treatment temperature is increased to, for example, 770° C. to 800° C., the magnetization will rapidly decrease at the same time as crystallization occurs. In addition, opacity occurs on the film surface along with crystals,
The vI voltage and voltage drop all at once, and the dielectric properties can no longer be determined. In addition, the sample NαF (Table 1) also has PbTi0. 4 πMs Ps Heat treatment temperature (K
G) (μd(cut (”C) 0.5 2.0 001 6900.819
001 690 0.5 14 002 690 1, s 1.5 006 7002.5 1
4 007 700 4 0.7 013 680 4 06 011 (i801 0.7
003 680 0.7 15 002 680 0.08 0.12 0.10 At the heat treatment temperature at which stability and shape retention can be measured, the dielectric constant εr
, tan δ is εr~20. regardless of the composition. tanδ
It was about 0.02.
〔第2実施例〕
この実施例は、 Fe2O5−Bi、O,−AIIO,
系のABO。[Second Example] In this example, Fe2O5-Bi, O, -AIIO,
ABO of the system.
をBaTi0□とした組成に関するものである。三成分
系組成図(第3図)に文献(電気学会マグネティクス研
究会資料NAG −88−15(1988)P35)に
示した組成、即ち(BiFeO3)l−x(ABO3)
x x = 0〜1に一致する様に調合した時の組成と
、この実施例の組成領域との関係を示した。表2に特性
値を示す。This relates to a composition in which BaTi0□ is used. The composition shown in the literature (IEEJ Magnetics Study Group material NAG-88-15 (1988) P35) in the ternary system composition diagram (Figure 3), that is, (BiFeO3)l-x(ABO3)
The relationship between the composition when compounded to match x x = 0 to 1 and the composition range of this example is shown. Table 2 shows the characteristic values.
第3図の様にNα22〜42の組成になる様にα−Fe
、O,、Bi、03 、 B1TiO3の各粉末を調合
し、ボールミルで16時時間式混合を行い、脱水、乾燥
後、直径+2amのステンレス製シャーレに充填し、こ
れをターゲットとしてRFマグネトロトンスパッタ装置
でスパッタした。スパッタ条件は、アルゴンガス圧:r
a素ガス圧=4:1.合計ガス圧=4〜6X10すTo
rr RFパワー3001 、基板温度50〜500℃
、基板はSiウェーハ、電極間隔5 cm 。As shown in Figure 3, α-Fe is
, O, , Bi, 03, and B1TiO3 powders were mixed in a ball mill for 16 hours, dehydrated and dried, and then filled into a stainless steel Petri dish with a diameter of +2 am, using this as a target in an RF magnetotroton sputtering device. It sputtered. The sputtering conditions are argon gas pressure: r
a Elementary gas pressure = 4:1. Total gas pressure = 4~6X10S To
rr RF power 3001, substrate temperature 50-500℃
, the substrate was a Si wafer, and the electrode spacing was 5 cm.
ターゲットはアノード上に設置し2〜6時間スパッタリ
ングを行った。こうして作成された膜は膜圧0.5〜2
.0μmで琥珀色を示し、近赤外領域では反射防止膜を
つけて、90%以上の透過率を持つ透明で平滑な表面を
持つ資料が得られる(第4図)、スパッタ時の基板温度
を室温〜400℃に変えて成膜したが特性に本質的に影
響は見られなかった。成膜後400℃〜800℃大気中
で3時間熱処理を行った。表2に示したのは熱処理後の
値であり、熱処理をしないと強磁性2強誘電性ともに観
測されない、又、熱処理温度が高すぎても膜が結晶化す
ると同時にマイクロクラックの発生によって白濁し不透
明になってくる。The target was placed on the anode, and sputtering was performed for 2 to 6 hours. The film thus created has a film thickness of 0.5 to 2.
.. It exhibits an amber color at 0 μm, and by applying an antireflection film in the near-infrared region, a material with a transparent and smooth surface with a transmittance of 90% or more can be obtained (Figure 4).The substrate temperature during sputtering can be adjusted to Although the film was formed at a temperature varying from room temperature to 400° C., essentially no effect on the properties was observed. After film formation, heat treatment was performed in the atmosphere at 400°C to 800°C for 3 hours. Table 2 shows the values after heat treatment.If heat treatment is not performed, neither ferromagnetism nor ferroelectricity will be observed.Also, if the heat treatment temperature is too high, the film will crystallize and at the same time become cloudy due to the generation of microcracks. It becomes opaque.
そして残留磁化も低下し、強誘電性は電極間ショートで
測定不能となってしまう、この最適熱処理温度は組成に
よってことなるが、傾向としてFs、03− Bi、O
,−BaTi0.系に於いてBaTi0iの混合率が大
きいほど、高温側にズレ、又、最適熱処理温度における
残留磁化4πMsや残留分極(表2)
サンプル尚
Fe203Bi、03BaTiO34πMs Ps
熱処理温度(KG) (μC/(社)(”C)
9 05 0.5 2.0 0.01 6
209 0.2 0.8 19 0.01
6208 15 0.5 1.3 0.0
2 6208 05 1.5 1.2 0
.07 7007 0.5 2.5 1.2
0.12 7005.5 05 4 1.7
0,13 7004.5 1,5 4
0.7 0.12 6803.5 .2,5 4
0.7 0.10 6804 3
3 0.7 0.07 6804.5 3.
5 2 06 0.03 6805 4
1 07 0.02 6206.7
2.6 0.7 15 0.13 620安定
性
40’ 7 2 1 1.4 0.08
680 041 6 2 2 1.3
0.12 680 042 5 2 3
1.0 0.10 700 0は小さくなる
ことが確認された。この実施例の組成範囲、即ち、第3
図の斜線を施した領域内で表2に示した温度で熱処理し
たところ、全て非晶質状態であった。なお、第3図の斜
線領域外組成では、同図B−B’線上の従来例(Nα3
2〜39)を凌ぐ特性は得られていない。なお、特性測
定方法は第1実施例と同様に行った。The residual magnetization also decreases, and ferroelectricity becomes unmeasurable due to a short between the electrodes.The optimal heat treatment temperature varies depending on the composition, but the tendency is for Fs, 03-Bi, O
, -BaTi0. The larger the mixing ratio of BaTiOi in the system, the higher the temperature shift, and the residual magnetization 4πMs and remanent polarization at the optimum heat treatment temperature (Table 2).
Heat treatment temperature (KG) (μC/(”C)) 9 05 0.5 2.0 0.01 6
209 0.2 0.8 19 0.01
6208 15 0.5 1.3 0.0
2 6208 05 1.5 1.2 0
.. 07 7007 0.5 2.5 1.2
0.12 7005.5 05 4 1.7
0,13 7004.5 1,5 4
0.7 0.12 6803.5 . 2,5 4
0.7 0.10 6804 3
3 0.7 0.07 6804.5 3.
5 2 06 0.03 6805 4
1 07 0.02 6206.7
2.6 0.7 15 0.13 620 Stability 40' 7 2 1 1.4 0.08
680 041 6 2 2 1.3
0.12 680 042 5 2 3
It was confirmed that 1.0 0.10 700 0 becomes smaller. The composition range of this example, i.e.
When heat treatment was performed at the temperatures shown in Table 2 within the shaded area in the figure, all of the samples were in an amorphous state. In addition, for the composition outside the shaded area in FIG. 3, the conventional example (Nα3
2 to 39) have not been obtained. The characteristics were measured in the same manner as in the first example.
(第3実施例)
この実施例はFe、0.−Bi、0.−A[IO,なる
組成系に対して、第4の成分子NOxを加えた組成系で
あり、Tn+とじて、Ti、 V、 Cr、 Km、
Fa、 Cb、 Ni。(Third Example) This example uses Fe, 0. -Bi, 0. -A [IO, is a composition system in which a fourth component NOx is added, and as Tn+, Ti, V, Cr, Km,
Fa, Cb, Ni.
Cuとし、かつFez o3− BiTMOx −Pb
Ti0. として調合した。Cu and Fezo3-BiTMOx-Pb
Ti0. It was prepared as
(表3)
サンプルNa Fe、O,Bi2O,BaTiO34
32,6T阿=Ti4.2
44〃 鉗=V 4.2
45 LI TM−Cr4.246 7
/ TM:Mn 4.247ノ’TM”Ga4.2
48 〃 T湘Ni4.2
49 u TMCu 4.24πMs P
s 熱処理温度
(KG) (μc/ac (’C)
1.5 0,11 750
試料の作成方法は第1実施例と同じで、熱処理温度のみ
組成ごとに異なる場合があるというだけである。第3実
施例に於いて、磁気、誘電特性とも従来組成NQII〜
&17. Nα21.Nα32〜Nα39と同程度であ
るが、誘電的安定性が良くなっている。第1〜第3実施
例と従来例の組成的な差は後者が化学量的組成になって
いるのに対し、前者が非化学量論的組成となっていると
いう点で共通しているが、このことがHR的安定性にど
の様に関係しているかは、今後の研究成果を持たないと
わからない、なお、透明度はNo47(Co)がやや悪
い他は第4図と同様な特性を示した。(Table 3) Sample Na Fe, O, Bi2O, BaTiO34
32,6T A=Ti4.2 44〃 Force=V4.2 45 LI TM-Cr4.246 7
/ TM:Mn 4.247ノ'TM"Ga4.2 48 〃TxiangNi4.2 49 u TMCu 4.24πMs P
s Heat treatment temperature (KG) (μc/ac ('C) 1.5 0,11 750 The method of preparing the sample is the same as in the first example, only the heat treatment temperature may differ depending on the composition. In the third embodiment, both the magnetic and dielectric properties had the conventional composition NQII~
&17. Nα21. Although it is comparable to Nα32 to Nα39, the dielectric stability is improved. The difference in composition between the first to third embodiments and the conventional example is that the latter has a stoichiometric composition, while the former has a non-stoichiometric composition. How this is related to HR stability will not be known until future research results are obtained.However, the transparency of No. 47 (Co) is slightly worse, but the characteristics are similar to those shown in Figure 4. Ta.
(第4実施例)
この実施例は組成的には第1〜第3実施例と同じでゾル
・ゲル法で成膜する点が異なる。第1〜第3実施例にも
記したが、磁気ヒステリシスと誘電ヒステリシスが同時
に観測される試料はいづれもガラス状態であることがわ
かっている。(Fourth Example) This example is the same as the first to third examples in terms of composition, except that the film is formed by a sol-gel method. As described in the first to third embodiments, it is known that all samples in which magnetic hysteresis and dielectric hysteresis are simultaneously observed are in a glass state.
ゾル・ゲル法の代表的な手法の一つとして金属アルコキ
シド液を原料とし、この溶液を加水分解と熱処理をする
ことによって酸化物を作製する方法があり、ある一定の
温度以下であれば熱処理をしても非晶質状態を実現でき
ることがわかっている。One of the typical sol-gel methods is to use a metal alkoxide solution as a raw material and to produce oxides by hydrolyzing and heat-treating this solution. It is known that an amorphous state can be achieved even if
この実施例は以上の点に注目し、ゾル・ゲル法で薄膜強
磁性強誘電体を製造した例である。This example focuses on the above points and is an example of manufacturing a thin film ferromagnetic ferroelectric material by the sol-gel method.
組成をFe、 03− Bi、 0.− BaTi0.
とした時にライて以下に示す。The composition is Fe, 03-Bi, 0. - BaTi0.
It is shown below when it is executed.
出発原料は8aイソプロコキシド
(Ba(0・nc、o7)a’)とテトライソプロピル
チタネート(Ti (0・nC,H,L )を用いた。As starting materials, 8a isoprokoxide (Ba(0·nc, o7)a') and tetraisopropyl titanate (Ti(0·nC, H, L)) were used.
但し、前者は金属バリウムとアルコール(n−C,H,
01l)の直接反応によって合成した0両者を混合し、
1時間撹拌する0次に、この溶液に硝酸鉄(Fe(No
、)39H,O) 。However, the former is metal barium and alcohol (n-C, H,
Mixing both 0 synthesized by direct reaction of 01l),
This solution was then stirred for 1 hour.
,)39H,O).
硝酸ビスマス(Bi(No3)35+(20) 、アル
コール(n −C,H7011)及び硝酸の混合溶液を
同じ温度に保って滴下し、撹拌をつづける。この実施例
での組成はFa : Bi : (Ba+Ti) =
5 : 2 : 3の原子量比になる様な配合にしてい
る。この撹拌混合時に水和物からの水分で加水分解反応
が起こり、ゲル化する。この状態でシリコンやジルコニ
ア基板を浸漬し成膜する。ゲルの状態では黄褐色を呈し
ている。過剰アルコールを除くため、0150℃加熱を
するか■約80℃に保ち、減圧乾燥する。その後、この
生成膜を500℃〜800℃で熱処理を行った。この組
成、製法に於いて、熱処理条件を考えた時のX線回折を
見ると第5図に示す様になるが、乾燥方法によって第6
図(a)(b)に示すように磁気ヒステリシス曲線の表
れ方に大きな差異を生じていることが判る。乾燥方法■
はペロブスカイト相の回折線が見られるが、これが第6
図(b)に示す様な室温での磁気ヒステリシスに関与し
ているとは思えない。従って、xi回折ピークとして現
れない構造、即ち非晶質性が関与していると考えられる
。乾燥方法のでは790℃熱処理でも明確なX線回折ピ
ークは現れていない。A mixed solution of bismuth nitrate (Bi(No3)35+(20), alcohol (n-C, H7011), and nitric acid is added dropwise while keeping the same temperature, and stirring is continued.The composition in this example is Fa: Bi: ( Ba+Ti) =
The composition is such that the atomic weight ratio is 5:2:3. During this stirring and mixing, water from the hydrate causes a hydrolysis reaction, resulting in gelation. In this state, a silicon or zirconia substrate is immersed to form a film. In the gel state, it has a yellowish brown color. To remove excess alcohol, heat to 0.150°C or keep at about 80°C and dry under reduced pressure. Thereafter, this produced film was heat-treated at 500°C to 800°C. When considering the heat treatment conditions for this composition and manufacturing method, the X-ray diffraction results are as shown in Figure 5, but depending on the drying method,
As shown in Figures (a) and (b), it can be seen that there is a large difference in the way the magnetic hysteresis curves appear. Drying method■
The diffraction line of the perovskite phase is seen, and this is the 6th phase.
It does not seem to be involved in the magnetic hysteresis at room temperature as shown in Figure (b). Therefore, it is thought that the structure that does not appear as an xi diffraction peak, that is, the amorphous nature is involved. In the drying method, no clear X-ray diffraction peak appeared even after heat treatment at 790°C.
以上、この実施例に於ける組成はB1Fe0x−ABO
,という化学量論的組成からズした組成で調合していて
、ズレない組成の場合(文献日本学術振興会アモルファ
ス材料第147委員会:第20回研究会資料1988年
6月、P13〜P19)に比べ強磁性強誘電特性は改善
されていて、誘電安定性も改善されていた0強磁性は第
6図(a)(b)に示した様に大きな値を示しているし
、又強誘電性もPs=O,lμc/aJ と比較的大き
な値を示している。As mentioned above, the composition in this example is B1Fe0x-ABO
, and the composition does not deviate from the stoichiometric composition. The ferromagnetic and ferroelectric properties have been improved compared to the ferromagnetic properties, and the dielectric stability has also been improved.The 0 ferromagnetism shows large values as shown in Figure 6 (a) and (b). The properties also show relatively large values, Ps=O, lμc/aJ.
以上の様にFe2O,−si、o、−ABO,(ABO
,はペロブスカイト型強誘体)系又は、 Fe、O,−
Bi、O,−TMOx−ABO3(TMは遷移金属元素
)系組成でRFスパッタ又はゾル・ゲル法で薄膜を形成
し、ガラス状態を損わない温度で熱処理することによっ
て、安定で透光性の高い強磁性強誘電性膜が得られ、新
しい多機能性薄膜として、センサ、トランスデユーサ、
アクチュエータ、光制御機能デバスイ等に応用できるよ
うになる。As mentioned above, Fe2O, -si, o, -ABO, (ABO
, is a perovskite type ferroelectric) system or Fe, O, -
By forming a thin film with Bi, O, -TMOx-ABO3 (TM is a transition metal element) composition by RF sputtering or sol-gel method, and heat-treating it at a temperature that does not damage the glass state, a stable and translucent film is created. A highly ferromagnetic and ferroelectric film can be obtained, and can be used as a new multifunctional thin film for sensors, transducers,
It will be possible to apply it to actuators, optical control function devices, etc.
第1図は、この発明の一実施例を説明するための組成系
図、第2図(a)(b)は、同実施例を説明するための
X、1回折測定図、第3図は。
この発明の他の実施例を説明するための組成系図、第4
図は、同例を説明するための光透過率の波長依存特性を
示す図、第5図(a)(b)は、この実施例で形成した
薄膜の熱処理後のX腺回折測定図、第6図(a)(b)
は、同例の磁気ヒステリシス曲線図である。
R填創10
石6
M、爆11■FIG. 1 is a compositional diagram for explaining an example of the present invention, FIGS. 2(a) and 2(b) are X and 1 diffraction measurement diagrams for explaining the same example, and FIG. 3 is a diagram for explaining the same example. Compositional tree for explaining other embodiments of this invention, No. 4
5(a) and 5(b) are X-ray diffraction measurement diagrams of the thin film formed in this example after heat treatment. Figure 6 (a) (b)
is a magnetic hysteresis curve diagram of the same example. R filling wound 10 stone 6 M, explosion 11■
Claims (5)
_2O_3)−ペロブスカイト型強誘電体酸化物(AB
O_3)を主成分とした三元酸化物からなることを特徴
とする強磁性強誘電体酸化物。(1) Iron oxide (Fe_2O_3) Bismuth monoxide (Bi
_2O_3)-Perovskite ferroelectric oxide (AB
A ferromagnetic ferroelectric oxide characterized by being composed of a ternary oxide containing O_3) as a main component.
,Co,Ni,Cuの酸化物のいづれか1つ、又は複数
の酸化物を加えてなる四元系以上の多元系酸化物からな
ることを特徴とする請求項1記載の強磁性強誘電体酸化
物。(2) The above composition includes transition metal oxides such as Ti, V, and Mn.
, Co, Ni, Cu oxide, or a quaternary or higher multi-component oxide formed by adding one or more oxides. thing.
ていることを特徴とする請求項1または2記載の強磁性
強誘電体酸化物。(3) The ferromagnetic ferroelectric oxide according to claim 1 or 2, wherein the ferromagnetic ferroelectric oxide has a glass-like structure.
徴とする請求項1,2または3記載の強磁性強誘電体酸
化物。(4) The ferromagnetic ferroelectric oxide according to claim 1, 2 or 3, wherein the ferromagnetic ferroelectric oxide is a thin film.
パッタリング,ゾルゲル法等のガラス状態で成膜できる
成膜手段を用いて薄膜を成膜した後、熱処理を行うこと
を特徴とする強磁性強誘電体酸化物薄膜の製造方法。(5) The ferromagnetic ferroelectric oxide of claim 4 is formed into a thin film using a film forming method capable of forming a film in a glass state, such as vacuum evaporation, sputtering, or sol-gel method, and then heat treatment is performed. A method for producing a ferromagnetic ferroelectric oxide thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32537688A JPH02170306A (en) | 1988-12-23 | 1988-12-23 | Ferromagnetic ferroelectric oxide and manufacture of thin film thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32537688A JPH02170306A (en) | 1988-12-23 | 1988-12-23 | Ferromagnetic ferroelectric oxide and manufacture of thin film thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02170306A true JPH02170306A (en) | 1990-07-02 |
Family
ID=18176143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32537688A Pending JPH02170306A (en) | 1988-12-23 | 1988-12-23 | Ferromagnetic ferroelectric oxide and manufacture of thin film thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02170306A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5164349A (en) * | 1990-06-29 | 1992-11-17 | Ube Industries Ltd. | Electromagnetic effect material |
| WO2006028005A1 (en) * | 2004-09-08 | 2006-03-16 | Kyoto University | Ferromagnetic ferroelectric substance and process for producing the same |
| JP2008285350A (en) * | 2007-05-16 | 2008-11-27 | Sophia School Corp | Room temperature magnetic ferroelectric superlattice and method of manufacturing the same |
-
1988
- 1988-12-23 JP JP32537688A patent/JPH02170306A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5164349A (en) * | 1990-06-29 | 1992-11-17 | Ube Industries Ltd. | Electromagnetic effect material |
| WO2006028005A1 (en) * | 2004-09-08 | 2006-03-16 | Kyoto University | Ferromagnetic ferroelectric substance and process for producing the same |
| JPWO2006028005A1 (en) * | 2004-09-08 | 2008-05-08 | 国立大学法人京都大学 | Ferromagnetic ferroelectric and manufacturing method thereof |
| JP2008285350A (en) * | 2007-05-16 | 2008-11-27 | Sophia School Corp | Room temperature magnetic ferroelectric superlattice and method of manufacturing the same |
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