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JPH0224386B2 - - Google Patents
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JPH0224386B2 - - Google Patents

Info

Publication number
JPH0224386B2
JPH0224386B2 JP18208484A JP18208484A JPH0224386B2 JP H0224386 B2 JPH0224386 B2 JP H0224386B2 JP 18208484 A JP18208484 A JP 18208484A JP 18208484 A JP18208484 A JP 18208484A JP H0224386 B2 JPH0224386 B2 JP H0224386B2
Authority
JP
Japan
Prior art keywords
photodiode
light
receiving element
chip
shows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18208484A
Other languages
Japanese (ja)
Other versions
JPS6158281A (en
Inventor
Naonori Okabayashi
Hisao Nagao
Masaru Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP59182084A priority Critical patent/JPS6158281A/en
Publication of JPS6158281A publication Critical patent/JPS6158281A/en
Publication of JPH0224386B2 publication Critical patent/JPH0224386B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/221Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction

Landscapes

  • Light Receiving Elements (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)

Description

【発明の詳細な説明】 <技術分野> 本発明は特に高速応答を要求されるホトカプラ
の受光チツプの構造の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Technical Field> The present invention relates to an improvement in the structure of a light-receiving chip of a photocoupler, which particularly requires high-speed response.

<従来技術> 従来、ホトカプラは発光素子と受光素子の組み
合わせによつて構成され、パルストランスに替わ
る信号インターフエイス用の素子として発展して
きた。又、近年のマイコンの普及によりその用途
は拡大し、高速応答、低電流、駆動の機能が要求
されている。
<Prior Art> Conventionally, a photocoupler is constructed by a combination of a light emitting element and a light receiving element, and has been developed as a signal interface element in place of a pulse transformer. In addition, with the spread of microcomputers in recent years, their uses have expanded, and high-speed response, low current, and drive functions are required.

一般にホトカプラにおける受光素子の光電流は
Drift成分とDifusion成分からなる。受光素子と
してホトダイオードを使つた場合の光電流応答特
性を第2図に示す。同図aが発光素子に印加され
る駆動パルス、同図bが受光素子の光電流波形で
ある。ここで、低電流駆動(すなわち、高感度)
の高速応答が要求されるホトカプラにおいては第
2図bのDifusion成分である寿命時間の長い光電
流が応答特性の遅れの原因となる。第3図は従来
の受光素子(ホトダイオード)の構造を示す。同
図において1はP型基板、2はN型エピタキシヤ
ル層、3はP+アイソレーシヨン層、4は透明な
絶縁層である。この構造においては、ホトダイオ
ード周辺部において多くののDifusion成分の光電
流を発生させる光子を遮断する手段をもつていな
い。一方、第4図は前面光に対しチツプ周辺部に
メタル等により遮光手段5を設けて上記欠点をカ
バーしたホトダイオードの構造を示す。
Generally, the photocurrent of the photodetector in a photocoupler is
It consists of a drift component and a diffusion component. Figure 2 shows the photocurrent response characteristics when a photodiode is used as the light receiving element. Figure a shows the drive pulse applied to the light emitting element, and figure b shows the photocurrent waveform of the light receiving element. Here, low current drive (i.e. high sensitivity)
In photocouplers that require a high-speed response, the photocurrent with a long lifetime, which is the diffusion component shown in FIG. 2b, causes a delay in response characteristics. FIG. 3 shows the structure of a conventional light receiving element (photodiode). In the figure, 1 is a P type substrate, 2 is an N type epitaxial layer, 3 is a P + isolation layer, and 4 is a transparent insulating layer. This structure does not have a means for blocking photons that generate many diffusion component photocurrents in the peripheral area of the photodiode. On the other hand, FIG. 4 shows the structure of a photodiode in which a light shielding means 5 made of metal or the like is provided around the chip against front light to cover the above-mentioned drawbacks.

しかし、第4図の構造のものにおいても、ホト
ダイオードを半導体チツプエツジに隣接して配置
した構造を採用する場合、チツプ側面に照射され
た光による光子をひろう為にDifusion成分の光電
流を遮断することができなかつた。この問題を解
決する為には、チツプの側面壁にAgペースト等
の遮光材料を配置する等の方法が考えられるが、
材料費のアツプ、製造工数のアツプあるいは歩留
まりの低下等の要因があり、コスト高につながつ
てしまう。
However, even in the structure shown in Fig. 4, if a structure in which the photodiode is placed adjacent to the semiconductor chip edge is adopted, the photocurrent of the diffusion component is blocked in order to collect photons from the light irradiated on the side of the chip. I couldn't do it. In order to solve this problem, methods such as placing a light-shielding material such as Ag paste on the side walls of the chip can be considered.
There are factors such as an increase in material costs, an increase in manufacturing man-hours, and a decrease in yield, leading to higher costs.

<目的> 本発明は上記欠点を解消する為になされたもの
であり、チツプ側面より光子をひろい発生した
Difusion成分の光電流を信号検出用ホトダイオー
ドに影響しないようにした構造を提案するもので
ある。
<Purpose> The present invention was made in order to eliminate the above-mentioned drawbacks, and it is a method to generate photons by spreading them from the side of the chip.
We propose a structure in which the photocurrent of the diffusion component does not affect the signal detection photodiode.

<実施例> 第1図は本発明に係るホトカプラの一実施例の
受光素子の構造を示すもので同図aは一部側断面
図、同図bは一部平面図を示す。同図において1
はP型基板、2はN型エピタキシヤル層、3は
P+アイソレーシヨン層、4は透明な絶縁層であ
る。6はチツプの周辺部に設けられたN型エピタ
キシヤル層であり、上記P型基板1とN型エピタ
キシヤル層2とのPN接合からなる信号検出用の
第1のホトダイオードとは別個に、上記P型基板
1及びP+アイソレーシヨン層3とN型エピタキ
シヤル層6とのPN接合からなる第2のホトダイ
オードが形成される。7はメタル等による遮光手
段であり、該遮光手段7により前面からの光によ
るDifusion成分を防止している。
<Embodiment> FIG. 1 shows the structure of a light-receiving element of an embodiment of a photocoupler according to the present invention, in which FIG. 1A shows a partial side sectional view and FIG. 1B shows a partial plan view. In the same figure, 1
is a P-type substrate, 2 is an N-type epitaxial layer, and 3 is a P-type substrate.
P + isolation layer 4 is a transparent insulating layer. Reference numeral 6 denotes an N-type epitaxial layer provided at the periphery of the chip, which is separate from the first photodiode for signal detection consisting of a PN junction between the P-type substrate 1 and the N-type epitaxial layer 2. A second photodiode is formed, which is composed of a PN junction between the P type substrate 1, the P + isolation layer 3, and the N type epitaxial layer 6. Reference numeral 7 denotes a light shielding means made of metal or the like, and the light shielding means 7 prevents diffusion components caused by light from the front.

第5図に以上の受光素子の等価回路を示す。同
図に示す如く信号検出用の第1のホトダイオード
8とは別個に第2のホトダイオード9が形成さ
れ、該第2のホトダイオード9のアノード及びカ
ソードは基板電位(アース)としている。
FIG. 5 shows an equivalent circuit of the above light receiving element. As shown in the figure, a second photodiode 9 is formed separately from the first photodiode 8 for signal detection, and the anode and cathode of the second photodiode 9 are set at a substrate potential (ground).

以上の構造の受光素子においてチツプ側面に照
射された光によつて励起された光電流は第1のホ
トダイオード8に到達することなく、第2のホト
ダイオード9により吸収されてしまう。すなわ
ち、チツプ側面からのDifusion成分は第1のホト
ダイオード8の出力に影響しなくなる。つまり前
面光に対しては、メタル等による遮光手段7を用
い、側面光に対しては第2のホトダイオード9に
よる吸収手段を用いることにより、光電流の
Difusion成分を極力おさえることが可能となる。
In the light receiving element having the above structure, the photocurrent excited by the light irradiated onto the side surface of the chip does not reach the first photodiode 8 but is absorbed by the second photodiode 9. That is, the diffusion component from the side surface of the chip no longer affects the output of the first photodiode 8. In other words, by using a light shielding means 7 made of metal or the like for front light, and by using absorption means by the second photodiode 9 for side light, the photocurrent can be reduced.
It becomes possible to suppress diffusion components as much as possible.

第6図に以上の受光素子を組み込んでなるホト
カプラの構造を示す。同図aは平面図、同図bは
側断面図、同図cは正面断面図である。10は赤
外発光ダイオードチツプ、11は受光素子チツプ
であり、これらは同一平面上に設置される。11
aは受光素子チツプ11内に設けられた信号検出
用の第1のホトダイオードであり、11bは上記
赤外発光ダイオードチツプ10と第1のホトダイ
オード11aの間に配置され、チツプ側面からの
Difusion成分の混入を防止する為の第2のホトダ
イオードである。又12は透光性樹脂、13はヒ
ートシンクである。尚、受光素子チツプ11はホ
トダイオードと、増幅・波形整形等の信号処理回
路を1チツプに集積化した素子(OPIC化受光素
子)である。同図の如き赤外発光ダイオードチツ
プ10と受光素子チツプ11とが同一平面上に設
置される構造のホトカプラでは受光素子チツプ1
1の側面からの光の影響が強く、本発明に係る構
造が極めて有利である。
FIG. 6 shows the structure of a photocoupler incorporating the above light receiving element. Figure a is a plan view, figure b is a side sectional view, and figure c is a front sectional view. 10 is an infrared light emitting diode chip, and 11 is a light receiving element chip, which are installed on the same plane. 11
a is a first photodiode for signal detection provided in the light receiving element chip 11; 11b is arranged between the infrared light emitting diode chip 10 and the first photodiode 11a;
This is a second photodiode for preventing mixing of diffusion components. Further, 12 is a transparent resin, and 13 is a heat sink. The light receiving element chip 11 is an element (OPIC light receiving element) in which a photodiode and a signal processing circuit such as amplification and waveform shaping are integrated into one chip. In a photocoupler having a structure in which an infrared light emitting diode chip 10 and a light receiving element chip 11 are installed on the same plane as shown in the figure, the light receiving element chip 1
The structure according to the present invention is extremely advantageous because the influence of light from one side is strong.

<効果> 本発明によれば高感度で高速応答のホトカプラ
を得ることができる。
<Effects> According to the present invention, a photocoupler with high sensitivity and high speed response can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係るホトカプラの一実施例の
受光素子の構造を示し、同図aは一部側断面図、
同図bは一部平面図、第2図は従来のホトカプラ
の光電流応答特性を示す波形図、第3図及び第4
図は従来の受光素子の側断面図、第5図は本発明
に係るホトカプラの一実施例の受光素子の等価回
路図、第6図は本発明に係るホトカプラの一実施
例の構造を示し、同図aは平面図、同図bは側断
面図、同図cは正面断面図を示す。 図中1:P型基板、2:N型エピタキシヤル
層、3:P+アイソレーシヨン層、4:絶縁層、
5:遮光手段、6:N型エピタキシヤル層、7:
遮光手段、8:第1のホトダイオード、9:第2
のホトダイオード、10:赤外発光ダイオードチ
ツプ、11:受光素子チツプ。
FIG. 1 shows the structure of a light-receiving element of an embodiment of the photocoupler according to the present invention, and FIG.
Figure b is a partial plan view, Figure 2 is a waveform diagram showing the photocurrent response characteristics of a conventional photocoupler, Figures 3 and 4.
The figure shows a side sectional view of a conventional light receiving element, FIG. 5 shows an equivalent circuit diagram of a light receiving element of an embodiment of a photocoupler according to the present invention, and FIG. 6 shows a structure of an embodiment of a photocoupler according to the present invention. Figure a shows a plan view, figure b shows a side sectional view, and figure c shows a front sectional view. In the figure, 1: P type substrate, 2: N type epitaxial layer, 3: P + isolation layer, 4: insulating layer,
5: Light shielding means, 6: N-type epitaxial layer, 7:
Light shielding means, 8: first photodiode, 9: second
photodiode, 10: infrared light emitting diode chip, 11: light receiving element chip.

Claims (1)

【特許請求の範囲】[Claims] 1 発光素子チツプと受光素子チツプを同一平面
上に設置してなり、上記受光素子チツプは信号検
出用ホトダイオードと該信号検出用ホトダイオー
ドとは別個のホトダイオードを有し、上記発光素
子チツプ側の上記受光素子チツプの側面近傍で上
記信号検出用ホトダイオードとの間に上記信号検
出用ホトダイオードとは別個のホトダイオードを
設けたことを特徴とするホトカプラ。
1 A light-emitting element chip and a light-receiving element chip are installed on the same plane, and the light-receiving element chip has a signal detection photodiode and a separate photodiode from the signal detection photodiode, and the light-receiving element chip is arranged on the side of the light-emitting element chip. A photocoupler characterized in that a photodiode separate from the signal detection photodiode is provided near the side surface of the element chip and between the signal detection photodiode and the signal detection photodiode.
JP59182084A 1984-08-29 1984-08-29 Photo coupler Granted JPS6158281A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59182084A JPS6158281A (en) 1984-08-29 1984-08-29 Photo coupler

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59182084A JPS6158281A (en) 1984-08-29 1984-08-29 Photo coupler

Publications (2)

Publication Number Publication Date
JPS6158281A JPS6158281A (en) 1986-03-25
JPH0224386B2 true JPH0224386B2 (en) 1990-05-29

Family

ID=16112077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59182084A Granted JPS6158281A (en) 1984-08-29 1984-08-29 Photo coupler

Country Status (1)

Country Link
JP (1) JPS6158281A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114784131B (en) * 2022-04-11 2023-05-16 西安微电子技术研究所 Photosensitive diode, photosensitive operational amplifier circuit and photosensitive chip

Also Published As

Publication number Publication date
JPS6158281A (en) 1986-03-25

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