JPH0227212B2 - - Google Patents
Info
- Publication number
- JPH0227212B2 JPH0227212B2 JP56179581A JP17958181A JPH0227212B2 JP H0227212 B2 JPH0227212 B2 JP H0227212B2 JP 56179581 A JP56179581 A JP 56179581A JP 17958181 A JP17958181 A JP 17958181A JP H0227212 B2 JPH0227212 B2 JP H0227212B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- liquefied gas
- chamber
- liquefied
- retention chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
- F17C13/021—Special adaptations of indicating, measuring, or monitoring equipment having the height as the parameter
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2203/00—Vessel construction, in particular walls or details thereof
- F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
- F17C2203/0602—Wall structures; Special features thereof
- F17C2203/0612—Wall structures
- F17C2203/0626—Multiple walls
- F17C2203/0629—Two walls
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0323—Valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2221/00—Handled fluid, in particular type of fluid
- F17C2221/01—Pure fluids
- F17C2221/014—Nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
- F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
- F17C2223/0146—Two-phase
- F17C2223/0153—Liquefied gas, e.g. LPG, GPL
- F17C2223/0161—Liquefied gas, e.g. LPG, GPL cryogenic, e.g. LNG, GNL, PLNG
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
- F17C2250/04—Indicating or measuring of parameters as input values
- F17C2250/0404—Parameters indicated or measured
- F17C2250/0408—Level of content in the vessel
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Vacuum Packaging (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Description
(産業上の利用分野)
本発明は液化ガスを液状のまま注入する装置に
関し特に大気に開放状態にある非発泡性飲料又は
一般食品等を満した容器に液化ガスを注入し、そ
の後、密封することにより液化ガス封入容器を製
造する際に、液化ガスを定量注入するのに好適な
液化ガス定量注入装置に関する。
(従来の技術)
近年、非発泡性飲料又は一般食品を薄肉金属缶
に充填する際に、缶の変形又は破損を防止するた
めに窒素ガスその他の不活性ガスを封入し缶内圧
力を高めることが行なわれている。この不活性ガ
スを封入する方法とては、カーボネーター等を用
いて予め飲料中に不活状ガスを溶解させた後に缶
体を密封充填する方法或は缶体に飲料を充填した
後に液化不活性ガスを注入し、その後に蓋を巻締
して密封する方法が公知である。前者によるとき
は、缶内圧を高めるために必要な量の不活性ガス
を飲料中に溶解させるためには飲料を室温以下に
冷却し加圧下で溶解させる必要があり、更に密封
充填後に湯殺菌等の加熱処理を行なう必要があ
り、工程数が増えコスト高となる。
他方、後者によるときは室温或は加熱殺菌処理
後の比較的高温の飲料をそのまま用いて実施でき
る利点を有するが、反面個々の缶体に注入する液
化不活性ガス量は極めて少量であるため超低温の
液化不活性ガスを精度よく計量投入することが重
要である。
特に実施に当り、後者によるときは液化不活性
ガスが非常に気化し易く、液化不活性ガス貯蔵容
器から送給管を介して注入ノズルにより液化不活
性ガスを注入する際に、通常の真空断熱等の手段
では送給管中で気化ガスが発生し易く注入ノズル
から気液混合の状態で噴出して缶体へ定量注入す
るのが困難である。更に注入ノズルは、室温或は
加熱殺菌処理後の比較的高温の飲料が満たされた
缶体が一定間隔で連続的に送られてくる位置に臨
んでいるため、ノズル周辺部に大気中の水蒸気が
氷結し、液化不活性ガスの微量注入を阻害し缶体
の充填密封の連続運転に支障をきたすという問題
があつた。
このため、特開昭56−109996号公報に掲載の液
化ガス定量注入装置が提案されているが、これは
前記した送給管における気化ガス発生による問
題、更に注入ノズル周辺部における水蒸気の氷結
の問題の改良に向けられている。しかしながら、
前記問題に加えて液化不活性ガスを注入するまで
の間、一定量の液化不活性ガスを装置内に滞留さ
せておく方式のものにあつては、液化不活性ガス
を連続的に注入することによつて滞留量が変化し
た滞留室内の液化不活性ガス液面上にある気化ガ
スの圧力が変動して注入ノズルからの注入量が一
定せず定量的な微量注入が困難となる問題があつ
た。このため前記発明にあつても滞留室内の液化
不活性ガスの液面位置を一定に保つ制御装置と滞
留室内の圧力を一定に保圧する制御装置を備える
ことが提案されているが実際の操業にあつては滞
留室内の液化不活性ガスの液面位置を一定に保つ
ために補充する液化不活性ガスの流入によつて、
また液化不活性ガスの注入ノズルからの噴出によ
つておこる液化不活性ガスの流動のために滞留室
の条件が変動し、この変動により液化不活性ガス
の滴下量が変化し、定量的な微量注入が阻害され
ていた。
本発明はかかる従来の欠点を解消し、微量の液
化ガス、特に液化窒素ガスの如く液化不活性ガス
又は炭酸ガスの如く活性ガスを確実に定量的に高
速で連続して注入することができる液化ガス定量
注入装置を提供するもので、断熱された液化ガス
滞留室と、該室内の液化ガスに接続し缶体位置検
出器によつて開閉する開閉弁装置を備えた注入ノ
ズルと、該室内の液化ガス液面の位置検知器と該
室内の圧力調整器と、該室内の液化ガス表面下の
位置と液化ガス貯蔵器内の液化ガス表面下の位置
とを接続する液化ガス供給路と、該供給路の滞留
室への流入口に設けた液化ガス流動緩和装置と、
前記位置検知器の検出信号により滞留室内に液化
ガス貯蔵器内の液化ガスを供給し該室内の液化ガ
スの液面の高さを所定の位置に保持せしめる液化
ガス供給制御装置とから成ることを特徴とする。
本発明の実施の一例を示す第1図及び第2図に
従つて更に詳説すれば次の通りである。
第1図はその実施装置の概略図を示すもので、
(1)は液化不活性ガスである液化窒素ガス(以下
「LN2ガス」という)の注入器、(2)はLN2ガスの
貯蔵器、3は該貯蔵器2から注入器1へのLN2ガ
スの供給量を制御する供給制御装置である。注入
器1は詳細に第2図示の如く、LN2ガス滞留室4
を備え、該滞留室4は真空断熱室5によつて囲繞
されており、該室内のLN2ガス液面下に開口する
LN2ガス供給管路6により貯蔵器2に接続してい
る。該滞留室4の底部には滞留するLN2ガスを流
出させる注入ノズル7と該ノズル7を開閉する開
閉弁装置8を備え、他方ノズル7を低温に保持
し、且つ空気中の水分の氷結を防止するため滞留
室4の上部には滞留するLN2ガス液面上に存する
気化窒素ガス(以下「N2ガス」という)に接続
する気化ガス放出管路9の他端を注入ノズル7を
囲繞する空間10に臨ませて設けると共に該管路
9に圧力検出器11及びN2ガスを排気自在とす
る例えばリリーフ弁などの圧力調整器12を介在
させた。13は静電容量センサーなどを用いた滞
留室4内のLN2ガス液面位置検知器であり、第1
図示の指示調節計又はコンピユーター等を用いた
液面制御の装置14に接続する。また滞留室4内
には、滞留するLN2ガスが揺動するのを防止する
ための浮游させた揺動抑制板15と該室4への
LN2ガス供給管路6の出口に臨ませて、貫通孔1
6を設けた流動緩和装置17とを設けた。前記注
入ノズル7は缶内容物に衝突してLN2ガスを飛散
させないために注入する缶体18の移動方向に沿
つて曲折し注入速度に応じて垂直方向に対して
45゜〜80゜の曲げ角度を有し交換自在とするためノ
ズルクランプ19により取付けた。また前記開閉
弁装置8は、滞留室4内を貫通する弁棒20をソ
レノイドによる駆動装置21で第1図示の缶体1
8を検出する缶体検出器22の検出信号により制
御装置23により駆動するようにした。
LN2ガス供給制御装置3は前記した第2図示の
滞留室4に設けた検知器13によりLN2ガス液面
の高さ位置を検知して検知信号を液面制御装置1
4に伝え加圧用N2ガスの貯蔵器24からLN2ガ
スの貯蔵器2の気化ガス領域に接続する加圧用
N2ガス供給路である管路25に介してN2ガスを
送給しLN2ガス貯蔵器2内のLN2ガスを加圧して
LN2ガスを管路6により滞留室4に供給し滞留室
4内のLN2ガスの液面の高さ位置を所定の位置に
保持するように動作する加圧ガス供給管路25に
設けた例えば電空変換レギユレータ等を用いた圧
力調整弁26を有する。
以上の如く構成したので、まず、滞留室4内の
圧力は気化ガス放出管9に介在させた圧力調整器
12により所定の値に保持されている。そして缶
体検出器22によつて注入ノズル7下に缶体18
が移送されて来たとき、開閉弁装置8が作動して
注入器1の滞留室4から注入ノズル7を介して、
微量の一定量のLN2ガスが缶体18に滴下され
る。このLN2ガスの連続注入動作中に滞留室4内
のLN2ガス液面の位置が降下するときはLN2ガス
の液面位置検知器13の検知信号により液面制御
装置14が作動してN2ガス貯蔵器24とLN2ガ
ス貯蔵器2とを接続する加圧ガス供給管路25の
圧力調整弁26を作動させて、LN2ガス貯蔵器2
のLN2ガスへの加圧圧力を増加し該貯蔵器2内の
LN2ガスを滞留室4に供給しLN2ガス液面位置を
所定の位置に保持する。他方、該滞留室4内の
LN2ガス液面位置が所定の位置より上昇した場
合、液面位置検知器13の検知信号により液面制
御装置14が圧力調整弁26を作動させ、LN2ガ
ス貯蔵器2のLN2ガスの加圧圧力を降下して滞留
室4への流量を減少させてLN2ガス液面位置を所
定の位置に保持する。この滞留室4へのLN2ガス
の供給の際に流動緩和装置17によつて滞留室4
内のLN2ガスの流動が緩和され更にLN2ガスの流
出及び開閉弁装置8の作動によつてLN2ガスが揺
動するのを揺動抑制板15により抑制し、従つて
LN2ガスの注入ノズル7からの流出を安定させ
る。更に、滞留室4内のLN2ガスの流動、断熱条
件の変化等によつて滞留室4内のLN2ガス液面上
のN2ガスの圧力が変動し、圧力が上昇するとき
は、気化ガス放出管路9を介して圧力調整器12
によりN2ガスを排出し滞留室4内の圧力を所定
の値に保持し、LN2ガスの注入ノズル7からの流
出を安定させる。
前記実施装置にあつてはLN2ガス注入の際に
LN2ガスの流動と揺動とを防止するために流動緩
和装置17と揺動抑制板15とを併用したが例え
ば流動緩和装置17をLN2ガス供給管路6の流入
口のみならず該流入口の位置に対応せしめて滞留
室4内の全周に亘つて設けることのみによつても
本発明の目的は達せられる。
更に好ましくは、前記機械的制御に加えて0.32
ml程度の微量であるLN2ガスを定量的に注入する
ためには、通常好適として使用されるノズル直径
1.0〜4.0mmの注入ノズル7の場合には、更に滞留
室4内のN2ガス圧を0.1〜0.5Kg/cm2の範囲に保つ
ことが重要である。即ち、滞留室4内のN2ガス
圧が0.1Kg/cm2以下では注入ノズル7の滴下が圧
力調整器12の調圧精度の面から不安定となり定
量注入が困難となる。逆にN2ガス圧を0.5Kg/cm2
以上とすると定量注入という点では問題がないが
LN2ガスの射出力が大となるため注入する缶体1
8の内容物に衝突した際にLN2ガスが細粒状に飛
び散る傾向があり、所定量のLN2ガスを缶体18
中に止めることができないため缶内圧力のバラツ
キが大きくなる。また、前記滞留室4のN2ガス
圧を圧力調整器12により0.1〜0.5Kg/cm2に保持
する場合であつても連続的に定量注入を行なう際
には、滞留室4中のN2ガスの滞留容積がLN2ガ
スの容積の1〜5倍に設計することによつてN2
ガス圧の変動を少なくすることが好ましい。即
ち、N2ガスの滞留容積がLN2ガスの容積の1倍
以下では、圧力調整器12の制御によつても圧力
の変動が大きくLN2ガスの定量注入に支障が生じ
ることが多く、他方、5倍以上とするときはN2
ガス圧の変動を少なくすることができる反面、滞
留室4の容積が大となり外部よりの熱の侵入が大
となり気化ガスの発生量が増す他本発明の装置自
在も大型化して従来から用いられている蓋体巻締
装置に付設することが困難となる。
次に前記定量注入装置により実験した例を説明
する。まず、95℃の水を充填した缶胴厚さ0.11mm
202DぶりきDI缶に毎分350缶の速度でLN2ガスを
充填して2秒後にアルミニウム蓋を巻締め、缶体
温度を20℃に下げて試験缶体(20缶)内圧を測定
した結果を示せば別表の通りである。
(Industrial Application Field) The present invention relates to an apparatus for injecting liquefied gas in a liquid state, and particularly for injecting liquefied gas into a container filled with a non-foaming beverage or general food that is open to the atmosphere, and then sealing the container. In particular, the present invention relates to a liquefied gas metering injection device suitable for metering liquefied gas when manufacturing a liquefied gas sealed container. (Prior art) In recent years, when filling non-sparkling beverages or general foods into thin-walled metal cans, nitrogen gas or other inert gas has been filled in to increase the pressure inside the can in order to prevent the can from deforming or breaking. is being carried out. The method of filling this inert gas is to first dissolve the inert gas in the beverage using a carbonator or the like and then seal the can body, or to fill the can body with the beverage and then liquefy it. A method is known in which active gas is injected and the lid is then sealed. In the former case, in order to dissolve the necessary amount of inert gas into the beverage to increase the internal pressure of the can, it is necessary to cool the beverage to below room temperature and dissolve it under pressure. It is necessary to perform heat treatment, which increases the number of steps and increases costs. On the other hand, the latter method has the advantage that it can be carried out using drinks at room temperature or relatively high temperature after heat sterilization, but on the other hand, the amount of liquefied inert gas injected into each can is extremely small, so it is difficult to use ultra-low temperature. It is important to accurately measure and inject the liquefied inert gas. In particular, when implementing the latter method, the liquefied inert gas is very easy to vaporize, so when injecting the liquefied inert gas from the liquefied inert gas storage container through the feed pipe and the injection nozzle, it is necessary to use ordinary vacuum insulation. With such means, vaporized gas is likely to be generated in the feed pipe, and it is difficult to eject a gas-liquid mixture from the injection nozzle and inject a fixed amount into the can body. Furthermore, since the injection nozzle faces the position where cans filled with beverages at room temperature or at a relatively high temperature after heat sterilization are continuously fed at regular intervals, water vapor in the atmosphere is generated around the nozzle. There was a problem in that the water froze, obstructing the injection of small amounts of liquefied inert gas, and disrupting the continuous operation of filling and sealing cans. For this reason, a quantitative liquefied gas injection device has been proposed in Japanese Patent Application Laid-Open No. 56-109996, but this has problems due to the generation of vaporized gas in the feed pipe, as well as the freezing of water vapor around the injection nozzle. It is aimed at improving the problem. however,
In addition to the above-mentioned problem, in the case of a system in which a certain amount of liquefied inert gas is retained in the device until the liquefied inert gas is injected, the liquefied inert gas must be continuously injected. The pressure of the vaporized gas above the liquid level of the liquefied inert gas in the retention chamber fluctuates due to the amount of retention changed due to the amount of liquefied inert gas in the retention chamber, and the amount of injection from the injection nozzle is not constant, making quantitative micro-injection difficult. Ta. For this reason, even in the above invention, it has been proposed to include a control device for keeping the level of the liquefied inert gas in the retention chamber constant and a control device for keeping the pressure in the retention chamber constant. In order to keep the liquid level of the liquefied inert gas in the retention chamber constant, the liquefied inert gas is replenished by the inflow.
In addition, the conditions in the retention chamber fluctuate due to the flow of liquefied inert gas caused by the jetting from the liquefied inert gas injection nozzle, and this fluctuation changes the dripping amount of liquefied inert gas, resulting in a quantitative trace amount. injection was inhibited. The present invention eliminates such conventional drawbacks and makes it possible to reliably quantitatively and continuously inject a trace amount of liquefied gas, particularly liquefied inert gas such as liquefied nitrogen gas, or active gas such as carbon dioxide gas, at high speed. This provides a gas metering injection device, which includes an insulated liquefied gas retention chamber, an injection nozzle equipped with an on-off valve device connected to the liquefied gas in the chamber and opened and closed by a can body position detector, and a liquefied gas liquid level position detector, a pressure regulator in the chamber, a liquefied gas supply path connecting a position below the surface of the liquefied gas in the chamber and a position below the surface of the liquefied gas in the liquefied gas storage device; a liquefied gas flow mitigation device provided at the inlet of the supply path to the retention chamber;
and a liquefied gas supply control device that supplies liquefied gas in the liquefied gas storage device into the retention chamber according to the detection signal of the position detector and maintains the level of the liquefied gas in the chamber at a predetermined position. Features. A more detailed explanation will be given below with reference to FIGS. 1 and 2 showing an example of the implementation of the present invention. Figure 1 shows a schematic diagram of the implementation equipment.
(1) is an injector for liquefied nitrogen gas (hereinafter referred to as "LN 2 gas"), which is a liquefied inert gas, (2) is a storage device for LN 2 gas, and 3 is an injector for injecting LN gas from storage 2 to injector 1. This is a supply control device that controls the supply amount of two gases. The injector 1 has an LN 2 gas retention chamber 4 as shown in detail in the second diagram.
The retention chamber 4 is surrounded by a vacuum insulation chamber 5, which opens below the LN 2 gas liquid level in the chamber.
It is connected to the reservoir 2 by an LN 2 gas supply line 6 . The bottom of the retention chamber 4 is equipped with an injection nozzle 7 for discharging the retained LN 2 gas and an on-off valve device 8 for opening and closing the nozzle 7, while maintaining the nozzle 7 at a low temperature and preventing moisture in the air from freezing. In order to prevent this, the other end of the vaporized gas discharge pipe 9 connected to the vaporized nitrogen gas (hereinafter referred to as "N 2 gas") existing above the LN 2 gas liquid surface that is stagnated is connected to the injection nozzle 7 in the upper part of the retention chamber 4. A pressure detector 11 and a pressure regulator 12, such as a relief valve, which can freely exhaust N 2 gas are interposed in the conduit 9. 13 is a LN 2 gas liquid level position detector in the retention chamber 4 using a capacitance sensor, etc.;
It is connected to a liquid level control device 14 using an indicating controller or a computer as shown in the figure. In addition, inside the retention chamber 4, there is a floating rocking suppression plate 15 for preventing the staying LN 2 gas from rocking, and
Through hole 1 facing the outlet of LN 2 gas supply pipe 6
6 and a flow relaxation device 17 were provided. The injection nozzle 7 is bent along the moving direction of the can body 18 to be injected to prevent the LN 2 gas from scattering by colliding with the contents of the can, and is bent relative to the vertical direction according to the injection speed.
It has a bending angle of 45° to 80° and is attached by a nozzle clamp 19 to be replaceable. Further, the on-off valve device 8 moves a valve rod 20 penetrating through the retention chamber 4 to the can body 1 shown in the first figure using a drive device 21 using a solenoid.
The controller 23 is driven by a detection signal from a can body detector 22 that detects 8. The LN 2 gas supply control device 3 detects the height position of the LN 2 gas liquid level using the detector 13 provided in the retention chamber 4 shown in the second diagram, and sends a detection signal to the liquid level control device 1.
4 for pressurization to connect the vaporized gas region of the LN 2 gas reservoir 2 from the N 2 gas reservoir 24 for pressurization.
N2 gas is supplied through the pipe line 25, which is the N2 gas supply line, and the LN2 gas in the LN2 gas storage device 2 is pressurized.
The pressurized gas supply pipe 25 is provided in a pressurized gas supply pipe 25 that operates to supply LN 2 gas to the retention chamber 4 through the pipe 6 and maintain the liquid level of the LN 2 gas in the retention chamber 4 at a predetermined position. For example, it has a pressure regulating valve 26 using an electro-pneumatic conversion regulator or the like. With the above structure, first, the pressure inside the retention chamber 4 is maintained at a predetermined value by the pressure regulator 12 interposed in the vaporized gas discharge pipe 9. Then, the can body 18 is detected under the injection nozzle 7 by the can body detector 22.
When the liquid is transferred, the on-off valve device 8 is activated and the liquid is transferred from the retention chamber 4 of the injector 1 through the injection nozzle 7.
A small amount of LN 2 gas is dripped into the can body 18 . When the LN 2 gas liquid level in the retention chamber 4 falls during this continuous injection of LN 2 gas, the liquid level control device 14 is activated by the detection signal from the LN 2 gas liquid level position detector 13. The pressure regulating valve 26 of the pressurized gas supply pipe 25 connecting the N 2 gas storage 24 and the LN 2 gas storage 2 is operated, and the LN 2 gas storage 2 is
Increase the pressurization pressure to the LN 2 gas in the reservoir 2.
LN 2 gas is supplied to the retention chamber 4 to maintain the LN 2 gas liquid level at a predetermined position. On the other hand, in the retention chamber 4
When the LN 2 gas liquid level rises above a predetermined position, the liquid level control device 14 operates the pressure regulating valve 26 based on the detection signal from the liquid level position detector 13, and the LN 2 gas in the LN 2 gas storage 2 is increased . The pressurization pressure is lowered to reduce the flow rate to the retention chamber 4 to maintain the LN 2 gas liquid level at a predetermined position. When LN 2 gas is supplied to the retention chamber 4, the flow relaxation device 17
The flow of the LN 2 gas inside is relaxed, and furthermore, the swinging of the LN 2 gas due to the outflow of the LN 2 gas and the operation of the on-off valve device 8 is suppressed by the swing suppressing plate 15.
Stabilize the outflow of LN 2 gas from the injection nozzle 7. Furthermore, when the pressure of N2 gas above the LN2 gas liquid level in the retention chamber 4 fluctuates due to the flow of LN2 gas in the retention chamber 4, changes in insulation conditions, etc., and the pressure increases, vaporization occurs. Pressure regulator 12 via gas release line 9
The N 2 gas is discharged and the pressure in the retention chamber 4 is maintained at a predetermined value, thereby stabilizing the outflow of the LN 2 gas from the injection nozzle 7. In the case of the above implementation equipment, when injecting LN2 gas
In order to prevent the flow and vibration of LN 2 gas , the flow relaxation device 17 and the vibration suppression plate 15 are used in combination. The object of the present invention can also be achieved simply by providing the retaining chamber 4 over the entire circumference in correspondence with the position of the inlet. More preferably, in addition to the mechanical control, 0.32
The nozzle diameter is usually suitable for quantitatively injecting a small amount of LN2 gas on the order of ml.
In the case of an injection nozzle 7 of 1.0 to 4.0 mm, it is further important to maintain the N 2 gas pressure in the retention chamber 4 in the range of 0.1 to 0.5 Kg/cm 2 . That is, if the N 2 gas pressure in the retention chamber 4 is less than 0.1 kg/cm 2 , the dripping from the injection nozzle 7 becomes unstable due to the pressure regulation accuracy of the pressure regulator 12, making it difficult to inject a constant amount. Conversely, increase the N2 gas pressure to 0.5Kg/ cm2
Given the above, there is no problem in terms of quantitative injection.
Canister 1 to be injected because the injection force of LN2 gas is large
LN 2 gas tends to scatter in fine particles when it collides with the contents of can 18 .
Since it cannot be stopped inside the can, the pressure inside the can will vary widely. Furthermore, even when the N 2 gas pressure in the retention chamber 4 is maintained at 0.1 to 0.5 Kg/cm 2 by the pressure regulator 12, when continuously injecting a fixed amount, the N 2 gas pressure in the retention chamber 4 is N2 by designing the gas retention volume to be 1 to 5 times the volume of LN2 gas.
It is preferable to reduce fluctuations in gas pressure. In other words, when the retention volume of N 2 gas is less than 1 times the volume of LN 2 gas, the pressure fluctuates greatly even when controlled by the pressure regulator 12, which often impedes the quantitative injection of LN 2 gas. , if it is 5 times or more, N 2
Although fluctuations in gas pressure can be reduced, the volume of the retention chamber 4 becomes large, which increases heat intrusion from the outside and increases the amount of vaporized gas generated. This makes it difficult to attach the lid to the lid tightening device. Next, an example of an experiment conducted using the quantitative injection device will be described. First, the can body thickness is 0.11mm filled with water at 95℃.
Results of filling 202D tin DI cans with LN 2 gas at a rate of 350 cans per minute, tightening the aluminum lid after 2 seconds, lowering the can body temperature to 20°C, and measuring the internal pressure of the test cans (20 cans). If shown, it is as shown in the attached table.
【表】
以上の実施例1、2は通常95℃の水を充填して
20℃の缶体温度に下げた場合に缶胴が変形しない
ために必要な缶内圧0.50Kg/cm2以上であり、また
試験缶体においても缶内圧にバラツキが少く良好
であつた。
(発明の効果)
以上の説明から明らかなように本発明によると
きは、液化ガス滞留室内の液化ガスの液面位置を
一定に制御し且つ該滞留室内の内圧を所定圧に保
圧すると共に、液化ガスを連続注入する際には、
液化ガス貯蔵器内の液化ガスの液面下の位置と滞
留室内の液化ガスの液面下の位置へ液化ガスを供
給するので、供給される液化ガスには気化ガスが
混入することなく従つて液化ガスの供給によつて
滞留室内の液化ガスが気化ガスの混入による流動
が防止し得て、更に滞留室内の液化ガスの注入口
に液化ガス流動緩和装置を設けたので、液化ガス
の流入に伴う滞留室内の液化ガスの流動が緩和さ
れて微量の液化ガスを定量的に確実に注入するこ
とができる効果がある。[Table] In Examples 1 and 2 above, water is usually filled with water at 95℃.
The can internal pressure was 0.50 Kg/cm 2 or higher, which is necessary for the can body to not deform when the can body temperature is lowered to 20°C, and the can body also showed good results with little variation in can internal pressure. (Effects of the Invention) As is clear from the above description, according to the present invention, the liquid level position of the liquefied gas in the liquefied gas retention chamber is controlled constant, the internal pressure in the retention chamber is maintained at a predetermined pressure, and the liquefied gas is When injecting gas continuously,
Since the liquefied gas is supplied to a position below the liquid level of the liquefied gas in the liquefied gas storage device and a position below the liquid level of the liquefied gas in the retention chamber, the supplied liquefied gas is not mixed with vaporized gas. By supplying liquefied gas, the liquefied gas in the retention chamber can be prevented from flowing due to mixing with vaporized gas, and furthermore, a liquefied gas flow mitigation device is installed at the liquefied gas injection port in the retention chamber, so that the inflow of liquefied gas can be prevented. The accompanying flow of liquefied gas in the retention chamber is relaxed, and a trace amount of liquefied gas can be quantitatively and reliably injected.
図示するものは本発明の実施の一例を示すもの
で、第1図は全体概略図、第2図は第1図の注入
器の截断面図である。
2……液化ガス貯蔵器、3……液化ガス供給制
御装置、4……液化ガス滞留室、6……液化ガス
供給路、7……注入ノズル、8……開閉弁装置、
12……圧力調整器、13……位置検出器、17
……流動緩和装置、24……加圧気化ガス貯蔵
器、25……加圧ガス供給管路、26……圧力調
整弁。
The drawings show an example of the implementation of the present invention, and FIG. 1 is a general schematic diagram, and FIG. 2 is a cutaway sectional view of the syringe shown in FIG. 1. 2... Liquefied gas storage device, 3... Liquefied gas supply control device, 4... Liquefied gas retention chamber, 6... Liquefied gas supply path, 7... Injection nozzle, 8... Opening/closing valve device,
12...Pressure regulator, 13...Position detector, 17
... Flow relaxation device, 24 ... Pressurized vaporized gas storage device, 25 ... Pressurized gas supply pipe, 26 ... Pressure adjustment valve.
Claims (1)
ガスに接続し缶体位置検出器によつて開閉する開
閉弁装置を備えた注入ノズルと、該室内の液化ガ
ス液面の位置検知器と該室内の圧力調整器と、該
室内の液化ガス表面下の位置と液化ガス貯蔵器内
の液化ガス表面下の位置とを接続する液化ガス供
給路と、該供給路の滞留室への流入口に設けた液
化ガス流動緩和装置と、前記位置検知器の検出信
号により滞留室内に液化ガス貯蔵器内の液化ガス
を供給し該室内の液化ガスの液面の高さを所定の
位置に保持せしめる液化ガス供給制御装置とから
成ることを特徴とする液化ガス定量注入装置。 2 前記液化ガス供給制御装置が、液化ガス貯蔵
器内の気化ガス領域に加圧用気化ガス供給路で接
続した加圧用気化ガス貯蔵器と、該加圧用気化ガ
ス供給路に介在させた圧力調整弁とから成ること
を特徴とする特許請求の範囲第1項記載の液化ガ
ス定量注入装置。 3 前記注入ノズルのノズル直径を1.0〜4.0mmと
し前記液化ガス滞留室内の圧力を0.5Kg/cm2以下
に制御したことを特徴とする特許請求の範囲第1
項記載の液化ガス定量注入装置。 4 前記液化ガス滞留室内の気化ガスの容積を該
室内の液化ガスの容積の1〜5倍に制御したこと
を特徴とする特許請求の範囲第1項記載の液化ガ
ス定量注入装置。[Claims] 1. An insulated liquefied gas retention chamber, an injection nozzle equipped with an on-off valve device connected to the liquefied gas in the chamber and opened and closed by a can body position detector, and a liquefied gas liquid in the chamber. a surface position detector, a pressure regulator in the chamber, a liquefied gas supply path connecting a position below the surface of the liquefied gas in the chamber and a position below the surface of the liquefied gas in the liquefied gas storage device; A liquefied gas flow relaxation device provided at the inlet to the retention chamber and a detection signal from the position detector supply the liquefied gas in the liquefied gas storage device into the retention chamber and measure the height of the liquid level of the liquefied gas in the chamber. A liquefied gas metering injection device comprising a liquefied gas supply control device for holding the liquefied gas in a predetermined position. 2. The liquefied gas supply control device includes a pressurized vaporized gas storage device connected to a vaporized gas region in the liquefied gas storage device through a pressurized vaporized gas supply path, and a pressure regulating valve interposed in the pressurized vaporized gas supply path. A liquefied gas metering injection device according to claim 1, characterized in that the device comprises: 3. Claim 1, characterized in that the injection nozzle has a nozzle diameter of 1.0 to 4.0 mm, and the pressure inside the liquefied gas retention chamber is controlled to 0.5 Kg/cm 2 or less.
The liquefied gas metering injection device described in Section 1. 4. The liquefied gas metering injection device according to claim 1, wherein the volume of the vaporized gas in the liquefied gas retention chamber is controlled to be 1 to 5 times the volume of the liquefied gas in the chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17958181A JPS58137698A (en) | 1981-11-11 | 1981-11-11 | Liquefied gas metering injection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17958181A JPS58137698A (en) | 1981-11-11 | 1981-11-11 | Liquefied gas metering injection device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58137698A JPS58137698A (en) | 1983-08-16 |
| JPH0227212B2 true JPH0227212B2 (en) | 1990-06-15 |
Family
ID=16068224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17958181A Granted JPS58137698A (en) | 1981-11-11 | 1981-11-11 | Liquefied gas metering injection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58137698A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4662154A (en) * | 1984-10-12 | 1987-05-05 | Continental Can Company, Inc. | Liquid inert gas dispenser and control |
| CN103398287A (en) * | 2013-07-29 | 2013-11-20 | 山东新华医疗器械股份有限公司 | Gas supply device capable of setting amount of gas freely |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5924932B2 (en) * | 1980-12-03 | 1984-06-13 | 東洋製罐株式会社 | Liquefied inert gas drip filling equipment |
-
1981
- 1981-11-11 JP JP17958181A patent/JPS58137698A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58137698A (en) | 1983-08-16 |
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