JPH02304B2 - - Google Patents
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- Publication number
- JPH02304B2 JPH02304B2 JP5539985A JP5539985A JPH02304B2 JP H02304 B2 JPH02304 B2 JP H02304B2 JP 5539985 A JP5539985 A JP 5539985A JP 5539985 A JP5539985 A JP 5539985A JP H02304 B2 JPH02304 B2 JP H02304B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- core
- optical fiber
- gas
- gecl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma- or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、内付化学気相堆積法による光フアイ
バ母材の製造方法の改良に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an improvement in a method for manufacturing an optical fiber preform by an internal chemical vapor deposition method.
石英系光フアイバ母材の1つの製造方法である
内付化学気相堆積法は、ガラスの原料である
SiCl4、GeCl4、POCl3、BBr3等の原料ガスを酸
素とともに、加熱した石英管内に送込み、石英管
の内壁面にクラツド堆積層と、クラツド堆積層よ
りも屈折率の大きいコア堆積層を堆積合成する方
法である。 The internal chemical vapor deposition method, which is one of the manufacturing methods for the quartz-based optical fiber base material, is a raw material for glass.
Raw material gases such as SiCl 4 , GeCl 4 , POCl 3 , and BBr 3 are sent together with oxygen into a heated quartz tube, forming a cladding layer on the inner wall of the quartz tube and a core layer having a higher refractive index than the cladding layer. This is a method of depositing and synthesizing.
この際、光フアイバ母材を紡糸して得られた光
フアイバの伝送損失の低いことは勿論のこと、堆
積層の形成時間が速いことの要望が強い。 At this time, there is a strong demand that the optical fiber obtained by spinning the optical fiber base material not only has a low transmission loss, but also that the formation time of the deposited layer is quick.
第3図は内付化学気相堆積法による光フアイバ
母材の製造方法を示す断面図であつて、1は光フ
アイバのクラツドを形成する、例えば外径25mm、
内径22mm、長さ800mmの石英管である。 FIG. 3 is a cross-sectional view showing a method of manufacturing an optical fiber base material by internal chemical vapor deposition method, in which 1 is a material forming the cladding of the optical fiber, for example, an outer diameter of 25 mm;
It is a quartz tube with an inner diameter of 22 mm and a length of 800 mm.
石英管1の両端には石英管1をガラス旋盤7に
装着して回転させるサポート管が融着され、この
2つのサポート管のうち、ガラス旋盤7のベツド
上に装着された駆動側チヤツク5に支持されるの
が排気側サポート管3であり、従動側チヤツク6
に支持されるのが投入側サポート管2である。 Support tubes for mounting and rotating the quartz tube 1 on a glass lathe 7 are fused to both ends of the quartz tube 1, and one of these two support tubes is attached to a driving chuck 5 mounted on the bed of the glass lathe 7. The exhaust side support pipe 3 is supported, and the driven side chuck 6
The input side support pipe 2 is supported by the input side support pipe 2.
投入側サポート管2の端末は絞られて、回転ジ
ヨイント9を介して原料ガス供給装置10に連結
されている。 The end of the input side support pipe 2 is constricted and connected to a raw material gas supply device 10 via a rotation joint 9.
原料ガス供給装置10は、ガラスの原料である
SiCl4、GeCl4、POCl3、BBr3等の原料ガス及び
O2を蓄え、所望の温度(例えば40℃)で、原料
ガスごとに所定の供給量に調整して石英管1に供
給する装置である。 The raw material gas supply device 10 is a raw material for glass.
Raw material gases such as SiCl 4 , GeCl 4 , POCl 3 , BBr 3 and
This is a device that stores O 2 and supplies it to the quartz tube 1 at a desired temperature (for example, 40° C.), adjusting the supply amount to a predetermined amount for each raw material gas.
ガラス旋盤7のベツド上を、石英管1の軸心に
平行して往復運動する酸水素バーナー8は、石英
管1の外周面を1300℃乃至1600℃に加熱し、原料
ガスに石英管1内で熱酸化反応を起こさせるもの
である。 The oxyhydrogen burner 8, which reciprocates on the bed of the glass lathe 7 parallel to the axis of the quartz tube 1, heats the outer peripheral surface of the quartz tube 1 to 1300°C to 1600°C, and injects the raw material gas into the quartz tube 1. This causes a thermal oxidation reaction.
この酸水素バーナー8の前進(投入側サポート
管2側より排気側サポート管3側への移動を云
う、符号X1で示す)は通常20cm/分であり、後
退(符号X2で示す)速度は、例えば500cm/分と
早い速度である。 The forward movement of this oxyhydrogen burner 8 (movement from the input side support pipe 2 side to the exhaust side support pipe 3 side, indicated by the symbol X 1 ) is normally 20 cm/min, and the backward speed (indicated by the symbol X 2 ) is 20 cm/min. is a fast speed of 500 cm/min, for example.
したがつて、長さ80cmの石英管1に、1層のガ
ラス層を堆積する時間は4分以上を要していた。
また、コア堆積層数は、屈折率分布形状を滑らか
にするため、通常50層は必要であるので、コア堆
積層の形成には、200分以上の長時間を要してい
た。 Therefore, it took more than 4 minutes to deposit one glass layer on the 80 cm long quartz tube 1.
Further, since 50 core deposited layers are normally required in order to smooth the refractive index distribution shape, it takes a long time of 200 minutes or more to form the core deposited layer.
この酸水素バーナー8の移動速度を早くして、
光フアイバ母材の製造時間を短縮するため、従来
は下記の手段が行われている。
By increasing the moving speed of this oxyhydrogen burner 8,
In order to shorten the manufacturing time of the optical fiber base material, the following measures have been conventionally taken.
酸水素バーナー8の前進速度を25cm/分にして
繰り返し移動し、石英管1にSiCl4ガスを1000
c.c./分、POCl3ガスを100c.c./分の供給量で供給
して、SiO2−P2O5のクラツド堆積層21を5層、
石英管1の内壁面に形成している。 The oxyhydrogen burner 8 was moved repeatedly at a forward speed of 25 cm/min, and SiCl 4 gas was poured into the quartz tube 1 at a rate of 1000 cm/min.
cc/min, POCl 3 gas was supplied at a supply rate of 100 c.c./min, and five layers of SiO 2 -P 2 O 5 cladding deposited layer 21 were formed.
It is formed on the inner wall surface of the quartz tube 1.
その後、クラツド堆積層21の内面に、
SiO2−GeO2−P2O5
の組成のコア堆積層22を50層形成するようにし
ている。 Thereafter, 50 core deposit layers 22 having a composition of SiO 2 --GeO 2 --P 2 O 5 are formed on the inner surface of the clad deposit layer 21.
第2図は縦軸に原料ガスの供給流量(c.c./分)
を、横軸にコア堆積層数を示し、曲線M1は
GeCl4の供給流量であり、直線N1はSiCl4の供給
流量である。 In Figure 2, the vertical axis shows the supply flow rate (cc/min) of raw material gas.
, the horizontal axis shows the number of core deposited layers, and the curve M 1 is
It is the supply flow rate of GeCl4 , and the straight line N1 is the supply flow rate of SiCl4 .
SiCl4ガス、及びO2はコア堆積層22の形成全
過程を通じて一定で、供給流量は1000c.c./分であ
り、POCl3ガスは350c.c./分で一定である。 SiCl 4 gas and O 2 are constant throughout the formation process of the core deposit layer 22, and the supply flow rate is 1000 c.c./min, and the POCl 3 gas is constant at 350 c.c./min.
そして、GeCl4の量は、光フアイバの屈折率分
布曲線がほぼ梯形である屈折率分布指数が4にな
るようにするために、コア堆積層数の初期には、
ほぼ150c.c./分で少なく、コア堆積層22の層数
の増加とともに、漸増して曲線M1のようにして
いる。そして、コア堆積層22の最内側層である
50層目においては、1800c.c./分である。 The amount of GeCl 4 is determined at the initial stage of the number of core deposited layers in order to make the refractive index distribution curve of the optical fiber almost trapezoidal and the refractive index distribution index to be 4.
It is low at approximately 150 c.c./min, and gradually increases as the number of core deposited layers 22 increases, as shown by curve M1 . This is the innermost layer of the core deposit layer 22.
In the 50th layer, it is 1800c.c./min.
従来は上述のように屈折率分布指数を調整形成
するのに、SiCl4ガスは一定にしGeCl4ガスの供給
量を調整供給して、酸水素バーナー8の移動速度
を早くして、光フアイバ母材の製造時間を短縮し
ている。 Conventionally, to adjust and form the refractive index distribution index as described above, the SiCl 4 gas was kept constant and the GeCl 4 gas supply amount was adjusted and supplied, and the moving speed of the oxyhydrogen burner 8 was increased to form the optical fiber matrix. It shortens the manufacturing time of materials.
〔発明が解決しようとする問題点〕
しかしながら上記従来の製造方法による光フア
イバ母材を紡糸して、得られた光フアイバは、波
長1.3μmの光波の伝送損失が0.68dB/Kmと低損失
であるが、波長0.85μmの光波の伝送損失が
2.85dB/Kmと高いという問題点がある。[Problems to be solved by the invention] However, the optical fiber obtained by spinning the optical fiber base material by the above conventional manufacturing method has a low transmission loss of 0.68 dB/Km for light waves with a wavelength of 1.3 μm. However, the transmission loss of light waves with a wavelength of 0.85 μm is
There is a problem that it is high at 2.85dB/Km.
上記従来の問題点を解決するため本発明にいて
は、GeCl4ガスの供給量を、コア堆積層の中間堆
積層形成時に、初期堆積層及び後期堆積層形成時
よりも多くし、且つSiCl4ガスの供給量を、該コ
ア堆積層の初期層形成時より層数の増加とともに
減じて供給するようにして、光フアイバのコアの
屈折率分布曲線が所望になるように調整形成する
ものである。
In order to solve the above conventional problems, in the present invention, the amount of GeCl 4 gas supplied is made larger when forming the intermediate deposited layer of the core deposited layer than when forming the initial deposited layer and the later deposited layer , and The amount of gas supplied is decreased as the number of layers increases from when the core deposited layer is initially formed, so that the refractive index distribution curve of the core of the optical fiber is adjusted to a desired value. .
従来方法で得られた光フアイバが、波長1.3μm
で伝送損失が小さく、波長0.85μmで伝送損失が
大きいのは、コア堆積層中に生成されるGeOの
紫外吸収するに起因する。
The optical fiber obtained using the conventional method has a wavelength of 1.3 μm.
The reason why the transmission loss is small at the wavelength of 0.85 μm and large at the wavelength of 0.85 μm is due to the ultraviolet absorption of GeO generated in the core deposited layer.
このGeOは、酸水素バーナーの移動速度が早
く、且つ、GeCl4の供給量が多いので、所定に期
待する、
GeCl4+O2→GeO2+2Cl2
の酸化反応時間が不足で、
2GeCl4+O2→GeO+4Cl2
の反応により生成されるものである。 This GeO has a fast moving speed in the oxyhydrogen burner and a large amount of GeCl 4 to be supplied, so the expected oxidation reaction time of GeCl 4 +O 2 →GeO 2 +2Cl 2 is insufficient, and 2GeCl 4 +O 2 →It is produced by the reaction of GeO + 4Cl 2 .
上記本発明の手段によれば、酸水素バーナーの
移動時間が早いにもかかわらず、GeCl4ガスが所
定に少なく調整供給されるので、GeCl4ガスが過
供給とならない。よつて、GeO2の生成時間が確
保され、GeOが生成されない。 According to the means of the present invention, GeCl 4 gas is adjusted to be supplied in a predetermined small amount even though the oxyhydrogen burner moves quickly, so that GeCl 4 gas is not oversupplied. Therefore, the generation time for GeO 2 is secured, and GeO is not generated.
また、SiCl4ガスの供給量が、コア堆積層の初
期層形成時より層数の増加とともに減じて、最終
堆積層形成時には、GeCl4ガスの供給量より少な
く供給するので、コアの所望の屈折率分布曲線が
得られる。 In addition, the amount of SiCl 4 gas supplied decreases as the number of layers increases from when the initial layer of the core deposited layer is formed, and when the final deposited layer is formed, it is supplied less than the amount of GeCl 4 gas, so that the desired refraction of the core can be achieved. A rate distribution curve is obtained.
第1図は本発明の1実施例の、原料ガス供給組
成図である。
FIG. 1 is a raw material gas supply composition diagram in one embodiment of the present invention.
本発明は、第3図に示す装置を使用し、酸水素
バーナー8の前進速度を25cm/分にして繰り返し
移動し、石英管1にSiCl4ガスを1000c.c./分、
POCl3ガスを100c.c./分、O2を1000c.c./分の供給
量で供給してSiO2−P2O5のクラツド堆積層21
を5層、石英管1の内壁面に従来と同様に形成し
ている。 The present invention uses the apparatus shown in FIG. 3, moves the oxyhydrogen burner 8 repeatedly at a forward speed of 25 cm/min, and feeds SiCl 4 gas into the quartz tube 1 at 1000 c.c./min.
A cladding layer 21 of SiO 2 -P 2 O 5 is formed by supplying POCl 3 gas at a supply rate of 100 c.c./min and O 2 at a supply rate of 1000 c.c./min.
Five layers are formed on the inner wall surface of the quartz tube 1 in the same manner as before.
その後、クラツド堆積層21の内面に、
SiO2−GeO2−P2O5
の組成のコア堆積層22を50層形成するようにし
ている。 Thereafter, 50 core deposit layers 22 having a composition of SiO 2 --GeO 2 --P 2 O 5 are formed on the inner surface of the clad deposit layer 21.
この場合、それぞれの原料ガスの供給量は、第
3図の原料ガス供給組成図に示すような供給量で
ある。 In this case, the supply amount of each raw material gas is as shown in the raw material gas supply composition diagram of FIG. 3.
第3図は縦軸に原料ガス供給流量(c.c./分)
を、横軸にコア堆積層数を示し、曲線M2は
GeCl4ガスの供給流量であり、直線N2はSiCl4の
供給流量である。 Figure 3 shows the raw material gas supply flow rate (cc/min) on the vertical axis.
, the horizontal axis shows the number of core deposited layers, and the curve M 2 is
It is the supply flow rate of GeCl4 gas, and the straight line N2 is the supply flow rate of SiCl4 .
O2はコア堆積層22の形成全過程を通じて一
定で、1000c.c./分であり、POCl3ガスはコア堆積
層22の最初の1層目の形成時には1500c.c./分で
供給し、その後は層数の増加とともに、定量ずつ
直線的に減じて、最終の堆積層形成時である50層
目には、500c.c./分になるようにしている。 O 2 is constant throughout the formation process of the core deposit layer 22 at a rate of 1000 c.c./min, and POCl 3 gas is supplied at a rate of 1500 c.c./min during the formation of the first layer of the core deposit layer 22. , thereafter, as the number of layers increases, the amount is linearly reduced by a fixed amount until the final deposited layer is formed, at the 50th layer, at 500 c.c./min.
一方、GeCl4の供給量はコア堆積層22の最初
の1層目は150c.c./分で、以後層数の増加ととも
に漸増し、中間層の25層目でほぼ1400c.c./分の最
高値となり、その後、層数の増加とともに漸減し
て、最終の堆積層形成時である50層目には、800
c.c./分になるようにしている。 On the other hand, the supply rate of GeCl 4 is 150 c.c./min for the first layer of the core deposit layer 22, and gradually increases as the number of layers increases, and is approximately 1400 c.c./min for the 25th intermediate layer. reaches its highest value, and then gradually decreases as the number of layers increases, reaching 800 at the 50th layer when the final deposited layer is formed.
cc/min.
このように、光フアイバの屈折率を高くする添
加物原料であるGeCl4ガスを、中高の曲線M2に
したがつて供給し、光フアイバの屈折率分布曲線
がほぼ梯形である屈折率分布指数が4になるよう
にしている。 In this way, GeCl 4 gas, which is an additive raw material that increases the refractive index of the optical fiber, is supplied according to the medium-high curve M 2 , and the refractive index distribution index that the refractive index distribution curve of the optical fiber is almost trapezoidal is obtained. is set to 4.
このようにして得られた光フアイバ母材は、後
期のコア堆積層形成時に、従来方法に比較して著
しくGeCl4ガスの供給量が少ないので、GeOが生
成量が極めて少ない。 In the optical fiber base material obtained in this way, the amount of GeCl 4 gas supplied during the latter stage of core deposition layer formation is significantly lower than in the conventional method, so the amount of GeO produced is extremely small.
よつて、このような光フアイバ母材を紡糸して
得られた光フアイバは、波長1.3μmの光波の伝送
損失がほぼ0.68dB/Kmで低損失であることは勿
論のこと、波長0.85μmの光波の伝送損失も
2.30dB/Kmとなり、従来に比較して0.5dB/Km低
くすることができた。 Therefore, the optical fiber obtained by spinning such an optical fiber base material not only has a low transmission loss of approximately 0.68 dB/Km for light waves with a wavelength of 1.3 μm, but also has a low transmission loss of approximately 0.68 dB/Km for light waves with a wavelength of 0.85 μm. Transmission loss of light waves
2.30dB/Km, which is 0.5dB/Km lower than the conventional model.
以上説明したように本発明は、波長0.85μmの
短波長帯においても、伝送損失が少なく、且つ、
光フアイバ母材の製造時間が短い等、実用上で優
れた効果がある。
As explained above, the present invention has low transmission loss even in the short wavelength band of 0.85 μm, and
It has excellent practical effects, such as shortening the manufacturing time of the optical fiber base material.
第1図は本発明の1実施例の原料ガス供給組成
図、第2図は従来の原料ガス供給組成図、第3図
は内付化学気相堆積法による光フアイバ母材の製
造方法を示す断面図である。
図において、1は石英管、2は投入側サポート
管、3は排気側サポート管、5は駆動側チヤツ
ク、6は従動側チヤツク、7はガラス旋盤、8は
酸水素バーナー、9は回転ジヨイント、10は原
料ガス供給装置、21はクラツド堆積層、22は
コア堆積層、M1,M2はGeCl4供給曲線、N1,N2
はSiCl4供給曲線を示す。
Fig. 1 shows a raw material gas supply composition diagram of an embodiment of the present invention, Fig. 2 shows a conventional raw material gas supply composition diagram, and Fig. 3 shows a method for manufacturing an optical fiber base material by internal chemical vapor deposition method. FIG. In the figure, 1 is a quartz tube, 2 is an input side support pipe, 3 is an exhaust side support pipe, 5 is a drive side chuck, 6 is a driven side chuck, 7 is a glass lathe, 8 is an oxyhydrogen burner, 9 is a rotating joint, 10 is a raw material gas supply device, 21 is a cladding layer, 22 is a core layer, M 1 and M 2 are GeCl 4 supply curves, N 1 and N 2
shows the SiCl4 supply curve.
Claims (1)
製造において、GeCl4ガスの石英管への供給量
は、コア堆積層の中間堆積層形成時に、初期堆積
層及び後期堆積層形成時よりも多くし、且つ
SiCl4ガスの供給量は、該コア堆積層の初期層形
成時より層数の増加とともに減じるように供給し
て、コア堆積層を形成するようにしたことを特徴
とする光フアイバ母材の製造方法。1. In the production of optical fiber base material by internal chemical vapor deposition, the amount of GeCl 4 gas supplied to the quartz tube is higher when forming the intermediate layer of the core layer than when forming the initial layer and the later layer. increase and
Production of an optical fiber base material characterized in that the supply amount of SiCl 4 gas is supplied such that it decreases as the number of layers increases from the time of initial layer formation of the core deposited layer to form the core deposited layer. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5539985A JPS61222934A (en) | 1985-03-19 | 1985-03-19 | Production of optical fiber preform |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5539985A JPS61222934A (en) | 1985-03-19 | 1985-03-19 | Production of optical fiber preform |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61222934A JPS61222934A (en) | 1986-10-03 |
| JPH02304B2 true JPH02304B2 (en) | 1990-01-05 |
Family
ID=12997452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5539985A Granted JPS61222934A (en) | 1985-03-19 | 1985-03-19 | Production of optical fiber preform |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61222934A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4022769B2 (en) * | 2003-11-20 | 2007-12-19 | 住友電気工業株式会社 | Glass pipe processing method |
-
1985
- 1985-03-19 JP JP5539985A patent/JPS61222934A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61222934A (en) | 1986-10-03 |
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