JPH0232738B2 - - Google Patents
Info
- Publication number
- JPH0232738B2 JPH0232738B2 JP57103278A JP10327882A JPH0232738B2 JP H0232738 B2 JPH0232738 B2 JP H0232738B2 JP 57103278 A JP57103278 A JP 57103278A JP 10327882 A JP10327882 A JP 10327882A JP H0232738 B2 JPH0232738 B2 JP H0232738B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- objective lens
- aperture
- moving mechanism
- optical axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Description
【発明の詳細な説明】
本発明は透過結像型電子顕微鏡における試料位
置と対物レンズ絞りの位置を最適に保つための装
置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a device for optimally maintaining a sample position and an objective lens aperture position in a transmission imaging electron microscope.
従来の透過結像型電子顕微鏡においては、対物
レンズと試料の間の距離は固定された状態で像観
察が行われていた。即ち従来の試料移動機構は、
顕微鏡像の視野を変えるために試料を対物レンズ
光軸(Z軸)と垂直な面で水平移動させたり、光
軸に対して傾斜させたりしても、試料が光軸と交
わる位置は変化させることができず、一定に保た
れていた。しかしながら、より高分解能の顕微鏡
像を得ようとすると、対物レンズの球面収差係数
Csを観察条件に応じた最適値に保つため対物レ
ンズの励磁強度を或る値に固定することが要求さ
れるようになる。(例えば、特願昭55−141028)
この場合には顕微鏡像のフオーカスを合わせるた
めに対物レンズの励磁を変えることはできないの
で、対物レンズの物面位置まで試料の位置を光軸
Zに沿つて移動させることが必要となる。しかし
ながら、このように試料を光軸方向に移動させる
ことによつてフオーカスを合わせる方法において
は対物レンズ絞りが本来の機能を充分に発揮する
ことができなくなり像のコントラストが低下する
傾向のあることが発明者によつて確認された。 In conventional transmission imaging electron microscopes, image observation is performed with the distance between the objective lens and the sample fixed. In other words, the conventional sample movement mechanism is
Even if you move the sample horizontally in a plane perpendicular to the objective lens optical axis (Z-axis) or tilt it to the optical axis to change the field of view of the microscope image, the position where the sample intersects with the optical axis will change. It was not possible to do so and remained constant. However, when trying to obtain a higher resolution microscope image, the spherical aberration coefficient of the objective lens
In order to maintain Cs at an optimal value depending on observation conditions, it is required to fix the excitation intensity of the objective lens to a certain value. (For example, patent application 1984-141028)
In this case, it is not possible to change the excitation of the objective lens in order to focus the microscope image, so it is necessary to move the position of the sample along the optical axis Z to the object plane position of the objective lens. However, in this method of focusing by moving the sample in the optical axis direction, the objective lens diaphragm cannot fully perform its original function, and the contrast of the image tends to decrease. Confirmed by the inventor.
本発明はこのような問題を解決し、試料を対物
レンズの光軸方向へ移動させても顕微鏡像のコン
トラストが適正に保たれるようにすることを目的
とするもので、その装置は対物レンズの光軸方向
に試料位置を移動させる試料移動機構と、対物レ
ンズの絞り位置を前記光軸方向に移動させる対物
レンズ絞り移動機構と、該対物絞り移動機構を前
記試料移動機構の操作によつて変化する試料位置
を表す信号に基づいて自動的に制御するための手
段を備えたことを特徴とするものである。 The purpose of the present invention is to solve these problems and maintain the appropriate contrast of the microscope image even when the sample is moved in the direction of the optical axis of the objective lens. a sample moving mechanism that moves the sample position in the optical axis direction; an objective lens aperture moving mechanism that moves the aperture position of the objective lens in the optical axis direction; and the objective aperture moving mechanism is moved by the operation of the sample moving mechanism. The present invention is characterized in that it includes means for automatic control based on a signal representing a changing sample position.
第1図は本発明の一実施例装置の構成を示す略
図である。図中1は透過結像型電子顕微鏡の真空
鏡筒のうち対物レンズ2の周縁部を示すものであ
る。対物レンズ2はレンズ光軸Zの周囲に巻かれ
るレンズコイル3とそれを包むヨーク4及び2つ
の磁極片5,6から構成され、対物レンズ電源7
によつてレンズコイル3を励磁すると両磁極片
5,6の間に強力なレンズ磁場が形成される。該
レンズ磁場内には鏡筒1及びヨーク4を貫通して
光軸と直交する方向から試料保持体8と絞り保持
体9が挿入され、そのZ軸方向への移動を含めた
位置制御は夫々試料移動機構10と絞り移動機構
11によつて行われる。試料移動機構10から検
出される試料のZ軸方向の位置信号は中央制御装
置12において常にモニターされその位置が変化
した場合には新たな試料位置に対して最適な対物
レンズ絞りのZ軸位置が計算され、絞り位置制御
回路13に制御信号を発生して絞り移動機構11
を制御するように構成されている。 FIG. 1 is a schematic diagram showing the configuration of an apparatus according to an embodiment of the present invention. In the figure, reference numeral 1 indicates the peripheral portion of the objective lens 2 in the vacuum lens barrel of a transmission imaging electron microscope. The objective lens 2 is composed of a lens coil 3 wound around the lens optical axis Z, a yoke 4 surrounding it, and two magnetic pole pieces 5 and 6, and an objective lens power source 7.
When the lens coil 3 is excited by this, a strong lens magnetic field is formed between the two magnetic pole pieces 5 and 6. A sample holder 8 and an aperture holder 9 are inserted into the lens magnetic field from a direction perpendicular to the optical axis through the lens barrel 1 and yoke 4, and their positions, including movement in the Z-axis direction, are controlled by This is performed by a sample moving mechanism 10 and an aperture moving mechanism 11. The Z-axis position signal of the sample detected from the sample moving mechanism 10 is constantly monitored by the central controller 12, and when the position changes, the optimal Z-axis position of the objective lens aperture is determined for the new sample position. is calculated and generates a control signal to the aperture position control circuit 13 to move the aperture moving mechanism 11.
is configured to control.
第2図は、試料保持体7の先端に保持される試
料14と、絞り保持体9の先端に保持される対物
レンズ絞り15と、対物レンズ磁場主面16の位
置関係を示したものである。この図では、絞り1
5が理想的な位置にあるため、試料に略平行に入
射する電子線EBが形成する回折像面位置が絞り
15の位置と一致する。この状態では試料14中
において散乱を受けたりエネルギーを損失した透
過電子線は図中E1に示すように絞り15により
その通過が阻止されるので対物レンズの後段に配
置された結像レンズ系によつて結像される顕微鏡
像に充分なコントラストが得られる。 FIG. 2 shows the positional relationship between the sample 14 held at the tip of the sample holder 7, the objective lens diaphragm 15 held at the tip of the aperture holder 9, and the objective lens magnetic field main surface 16. . In this figure, aperture 1
5 is in an ideal position, the position of the diffraction image plane formed by the electron beam EB incident approximately parallel to the sample coincides with the position of the aperture 15. In this state, the transmitted electron beam that has been scattered or has lost energy in the sample 14 is blocked by the diaphragm 15, as shown by E1 in the figure, and is therefore stopped by the imaging lens system placed after the objective lens. Sufficient contrast can be obtained in the microscopic image formed by this method.
第3図は対物レンズのレンズ強度を弱めて、試
料14の位置を第2図のS1からS2へ移動させ
たのに対して、絞り14の対物レンズ主面16か
らの距離A1を変えないままの状態を示す。この
状態では電子線EBが形成する回折像面位置Dが
絞り15の位置と一致せずに下方にずれてしま
う。その結果、試料14においてエネルギー損失
もなく散乱されることもなく透過した電子線の一
部が絞り15によつてその通過を阻止されてしま
うため、顕微鏡像の明るさが減少し鮮明な顕微鏡
像を形成することができなくなる。従つてこの場
合には、絞り15を下方へずらせて第4図に示す
如く、対物レンズ主面16からA2の距離にある
回折像面位置即ち最適位置に一致させることが必
要となる。従来の装置においては、対物レンズ絞
り15の光軸方向の位置は固定されているが、第
1図の実施例装置においてはその位置を可変して
第4図に示すような最適状態に設定することがで
きる。 In Figure 3, the lens strength of the objective lens is weakened and the position of the sample 14 is moved from S1 to S2 in Figure 2, while the distance A1 of the aperture 14 from the objective lens main surface 16 remains unchanged. Indicates the status of In this state, the diffraction image plane position D formed by the electron beam EB does not match the position of the aperture 15 and shifts downward. As a result, a part of the electron beam that has passed through the sample 14 without energy loss or scattering is blocked by the aperture 15 from passing through the sample 14, so the brightness of the microscope image decreases and a clear microscope image is obtained. become unable to form. Therefore, in this case, it is necessary to shift the diaphragm 15 downward to match the position of the diffraction image plane at a distance of A2 from the principal surface 16 of the objective lens, ie, the optimum position, as shown in FIG. In conventional devices, the position of the objective lens diaphragm 15 in the optical axis direction is fixed, but in the embodiment shown in FIG. 1, the position is varied and set to the optimum state as shown in FIG. 4. be able to.
第4図に示すような最適状態に設定するために
は、先ず目的とする対物レンズの球面収差係数
Csを得るための対物レンズ励磁強度にレンズ電
源7の出力を調整する。次に蛍光板上に結像する
顕微鏡像を観察してフオーカスが合つていない場
合には、試料移動機構10を手動で操作してフオ
ーカスが合うように調整する。このような調整操
作によつて試料位置に関する電気信号が中央制御
装置12に印加されると対物レンズの焦点距離信
号と共に第4図における回折像面位置A2が演算
され、その結果を表わす制御信号が絞り位置制御
回路13にに印加されて絞り移動機構11を介し
て絞り15の光軸上の位置が移動して最適位置に
移動する。尚、前記対物レンズの焦点距離を表わ
す信号としては、レンズ電源7の出力に対応した
信号と端子17から中央制御装置12に印加され
る試料照射電子線EBの加速電圧信号から求めら
れる。 In order to set the optimum condition as shown in Figure 4, first set the spherical aberration coefficient of the objective lens.
The output of the lens power supply 7 is adjusted to the objective lens excitation intensity to obtain Cs. Next, the microscope image formed on the fluorescent screen is observed, and if it is not in focus, the sample moving mechanism 10 is manually operated to adjust the focus to be in focus. When an electric signal related to the sample position is applied to the central controller 12 through such an adjustment operation, the diffraction image plane position A2 in FIG. 4 is calculated together with the focal length signal of the objective lens, and a control signal representing the result is calculated. is applied to the aperture position control circuit 13, and the position of the aperture 15 on the optical axis is moved via the aperture moving mechanism 11 to the optimum position. The signal representing the focal length of the objective lens is obtained from a signal corresponding to the output of the lens power source 7 and an accelerating voltage signal of the sample irradiating electron beam EB applied from the terminal 17 to the central controller 12.
ところで、顕微鏡像を形成するのに用いる試料
透過電子線としては、試料中で散乱されなかつた
電子線を用いる場合だけではなく、観察目的によ
つては試料中で散乱された特定の回折電子線を用
いる場合もあり、この場合には第5図に示す如く
孔径Pの大きな対物レンズ絞り15aが用いられ
る。このような観察モードにおいて対物レンズの
励磁を変化(減少)させ、それに応じてフオーカ
ス合わせのために試料位置をS1からS2へ移動
させると同時に第4図の場合と同様に対物レンズ
絞り15aの位置をA1からA2へ移動させた場
合の電子線経路を第6図に示す。第6図から明ら
かな如く、対物レンズ絞り15aの光軸Z上の位
置が正しい位置に置かれていても、対物レンズ絞
り15aの孔径Pが一定であると、第5図におい
ては絞りを通過していた回折電子線の一部が通過
しなくなるため、第5図の状態で得られた顕微鏡
像の内容と第6図の状態で得られる顕微鏡像の内
容とは違つたものとなる。この違いをなくすため
には、第7図に示す如く、より大きな孔径Qを有
する対物レンズ絞りを用いることが必要となる。
通常の電子顕微鏡においては対物レンズ絞りとし
て孔径の異なつた数種類のものを用意しておき、
それらを交換して使用するための手段が絞り移動
機構に組み込まれるので、この交換機構を操作し
て第7図のような最適状態に近づけることができ
る。又、第1図の実施例装置において、絞り位置
の自動制御を行うだけではなく、上述した最適状
態が得られるような絞り孔径を演算し、該演算結
果にもつとも近い値の孔径を有する対物レンズ絞
りを自動的に交換するようにすることも容易であ
る。 By the way, the sample-transmitting electron beam used to form a microscopic image may not only be an electron beam that is not scattered in the sample, but also a specific diffracted electron beam that is scattered in the sample depending on the purpose of observation. In some cases, an objective lens aperture 15a having a large hole diameter P is used as shown in FIG. In such an observation mode, the excitation of the objective lens is changed (decreased), and the sample position is moved from S1 to S2 for focus adjustment accordingly, and at the same time, the position of the objective lens aperture 15a is changed as in the case of Fig. 4. FIG. 6 shows the electron beam path when moving from A1 to A2. As is clear from FIG. 6, even if the objective lens diaphragm 15a is placed at the correct position on the optical axis Z, if the aperture P of the objective lens diaphragm 15a is constant, the light passing through the diaphragm in FIG. Since a part of the diffracted electron beam that was previously being used no longer passes through, the contents of the microscope image obtained in the state shown in FIG. 5 are different from the contents of the microscope image obtained in the state shown in FIG. In order to eliminate this difference, it is necessary to use an objective lens aperture having a larger aperture diameter Q, as shown in FIG.
In an ordinary electron microscope, several types of objective lens apertures with different hole diameters are prepared.
Since a means for exchanging and using them is built into the aperture moving mechanism, this exchanging mechanism can be operated to bring the aperture closer to the optimal state as shown in FIG. In addition, the apparatus of the embodiment shown in FIG. 1 not only automatically controls the diaphragm position, but also calculates the diaphragm aperture diameter to obtain the above-mentioned optimum condition, and uses an objective lens having an aperture diameter as close as possible to the result of the calculation. It is also easy to automatically replace the aperture.
以上詳述したように、本発明装置においては、
対物レンズの光軸方向に試料位置を移動させる試
料移動機構と、対物レンズの絞り位置を前記光軸
方向に移動させる対物レンズ絞り移動機構と、該
対物絞り移動機構を前記試料移動機構の操作によ
つて変化する試料位置を表す信号に基づいて自動
的に制御するための手段を備えるようにしたた
め、試料位置を変化させても顕微鏡像の明るさや
コントラストの低下を抑えて常に鮮明な顕微鏡像
の観察を行うことができる。 As detailed above, in the device of the present invention,
A sample moving mechanism that moves the sample position in the optical axis direction of the objective lens, an objective lens aperture moving mechanism that moves the aperture position of the objective lens in the optical axis direction, and the objective aperture moving mechanism is used to operate the sample moving mechanism. The system is equipped with means for automatic control based on signals representing the changing sample position, so even if the sample position changes, the brightness and contrast of the microscope image is suppressed and the microscope image is always clear. Observations can be made.
第1図は本発明の一実施例装置を説明するため
の略図、第2図乃至第7図は本発明の原理を説明
するための略図である。
1:鏡筒、2:対物レンズ、3:レンズコイ
ル、4:ヨーク、5,6:磁極片、7:レンズ電
源、8:試料保持体、9:絞り保持体、10:試
料移動機構、11:絞り移動機構、12:中央制
御装置、13:絞り位置制御回路、14:試料、
15,15a,15b,:対物レンズ絞り、1
6:対物レンズ主面、17:端子。
FIG. 1 is a schematic diagram for explaining an embodiment of the present invention, and FIGS. 2 to 7 are schematic diagrams for explaining the principle of the present invention. 1: Lens barrel, 2: Objective lens, 3: Lens coil, 4: Yoke, 5, 6: Magnetic pole pieces, 7: Lens power supply, 8: Sample holder, 9: Aperture holder, 10: Sample moving mechanism, 11 : Aperture moving mechanism, 12: Central controller, 13: Aperture position control circuit, 14: Sample,
15, 15a, 15b,: Objective lens aperture, 1
6: Objective lens main surface, 17: Terminal.
Claims (1)
る試料移動機構と、対物レンズの絞り位置を前記
光軸方向に移動させる対物レンズ絞り移動機構
と、該対物絞り移動機構を前記試料移動機構の操
作によつて変化する試料位置を表す信号に基づい
て自動的に制御するための手段を備えたことを特
徴とする透過結像型電子顕微鏡。1. A sample moving mechanism that moves the sample position in the optical axis direction of the objective lens, an objective lens aperture moving mechanism that moves the aperture position of the objective lens in the optical axis direction, and the objective aperture moving mechanism is operated by the sample moving mechanism. 1. A transmission imaging electron microscope characterized by comprising means for automatic control based on a signal representing a sample position that changes depending on the conditions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57103278A JPS58128645A (en) | 1982-06-16 | 1982-06-16 | Transmission image formation-type electron microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57103278A JPS58128645A (en) | 1982-06-16 | 1982-06-16 | Transmission image formation-type electron microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58128645A JPS58128645A (en) | 1983-08-01 |
| JPH0232738B2 true JPH0232738B2 (en) | 1990-07-23 |
Family
ID=14349884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57103278A Granted JPS58128645A (en) | 1982-06-16 | 1982-06-16 | Transmission image formation-type electron microscope |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58128645A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55100658U (en) * | 1978-12-29 | 1980-07-12 |
-
1982
- 1982-06-16 JP JP57103278A patent/JPS58128645A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58128645A (en) | 1983-08-01 |
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