JPH0232844B2 - DODENSEIRYUSHIHOKAKUSOCHI - Google Patents
DODENSEIRYUSHIHOKAKUSOCHIInfo
- Publication number
- JPH0232844B2 JPH0232844B2 JP56071979A JP7197981A JPH0232844B2 JP H0232844 B2 JPH0232844 B2 JP H0232844B2 JP 56071979 A JP56071979 A JP 56071979A JP 7197981 A JP7197981 A JP 7197981A JP H0232844 B2 JPH0232844 B2 JP H0232844B2
- Authority
- JP
- Japan
- Prior art keywords
- conductive particle
- conductive particles
- metal container
- cylindrical metal
- capture device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02G—INSTALLATION OF ELECTRIC CABLES OR LINES, OR OF COMBINED OPTICAL AND ELECTRIC CABLES OR LINES
- H02G5/00—Installations of bus-bars
- H02G5/06—Totally-enclosed installations, e.g. in metal casings
- H02G5/063—Totally-enclosed installations, e.g. in metal casings filled with oil or gas
- H02G5/065—Particle traps
Landscapes
- Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Gas-Insulated Switchgears (AREA)
- Installation Of Bus-Bars (AREA)
Description
【発明の詳細な説明】
この発明はガス絶縁電気装置に取付けられ内部
に混入し絶縁破壊の引金になる導電性粒子を捕獲
する導電性粒子捕獲装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a conductive particle trapping device that is attached to a gas-insulated electrical device and traps conductive particles that enter the device and trigger dielectric breakdown.
以下、ガス絶縁母線(Gas Insulated Bus:
GIB)に取付けられる導電性粒子捕獲装置を例に
とり説明する。 Below, Gas Insulated Bus:
This will be explained using a conductive particle capture device attached to a GIB (Gib) as an example.
第1図Aは従来の導電性粒子捕獲装置が取付け
られたGIBをその一部を破砕して示す斜視図、第
1図Bは第1図AのIB−IB線での横断面図、第
1図Cは第1図BのIC−IC線での縦断面図であ
る。 Fig. 1A is a perspective view showing a partially broken GIB equipped with a conventional conductive particle capture device, Fig. 1B is a cross-sectional view taken along line IB-IB of Fig. 1A, FIG. 1C is a longitudinal sectional view taken along the line IC--IC in FIG. 1B.
図において、1は金属材料からなり内部に6フ
ツ化イオウ(SF6)などの絶縁性ガスが充満され
たGIBの円筒容器、2は円筒容器1内にその中心
軸に沿うように設けられ円筒容器1に対して高電
圧が印加された高電圧導体、3は絶縁材料からな
り高電圧導体1の所定部分にこの部分を取り囲ん
で固定された絶縁スペーサ、4は一方の端部が絶
縁スペーサ3の外周面部に互いに120度の等しい
角度間隔をおいてそれぞれ取付けられた他方の端
部が円筒容器1の内壁面にそれぞれ接触する3本
の金属ピン、5は絶縁スペーサ3の存在する部分
の円筒容器1の内壁面の下部の所定領域との間に
所定距離をおいて2本の金属ピン4によつて保持
され複数個の所定のスリツト5aが互いに平行に
形成されたスリツト形成金属板からなる従来の導
電性粒子捕獲装置である。この導電性粒子捕獲装
置5の高電圧導体2に沿う方向の長さは、この方
向の絶縁スペーサ3の長さよりその両側にそれぞ
れ所定長さだけ長くなるように構成されている。
なお導電性粒子捕獲装置5の電位は金属ピン4を
通して円筒容器1の電位になつている。 In the figure, 1 is a cylindrical GIB container made of a metal material and filled with an insulating gas such as sulfur hexafluoride (SF 6 ), and 2 is a cylindrical container installed along the central axis of the cylindrical container 1. A high voltage conductor to which a high voltage is applied to the container 1; 3 an insulating spacer made of an insulating material and fixed to a predetermined part of the high voltage conductor 1 surrounding this part; 4, one end of which is the insulating spacer 3; Three metal pins are attached at equal angular intervals of 120 degrees to each other on the outer peripheral surface of the cylindrical container 1, and the other end contacts the inner wall surface of the cylindrical container 1. It consists of a slit-formed metal plate held by two metal pins 4 at a predetermined distance from a predetermined area at the lower part of the inner wall surface of the container 1, and in which a plurality of predetermined slits 5a are formed parallel to each other. This is a conventional conductive particle capture device. The length of the conductive particle capture device 5 in the direction along the high voltage conductor 2 is configured to be longer than the length of the insulating spacer 3 in this direction by a predetermined length on each side thereof.
Note that the potential of the conductive particle capture device 5 is set to the potential of the cylindrical container 1 through the metal pin 4.
次に、この従来の導電性粒子捕獲装置5の作用
を、第1図Cの縦断面図で説明する。 Next, the operation of this conventional conductive particle trapping device 5 will be explained with reference to the longitudinal sectional view of FIG. 1C.
GISの円筒容器1内に混入した導電性粒子(図
示P)の大部分は、円筒容器1の内壁面の下部に
付着している場合が多い。このような導電性粒子
Pは、高電圧導体2と円筒容器1の内壁面との間
にできる電界にさらされるために、帯電し、この
電界によつて高電圧導体2へ向う方向の引力を受
ける。この電界による引力が導電性粒子(P)自
身の重力に打ち勝つと、導電性粒子(P)は、曲
線イで例示するように、浮上して、高電圧鎮体2
に近づいて行く。そして、導電性粒子(P)が高
電圧導体2に接近すると導電性粒子(P)と高電
圧導体2との間に放電が生じ、この放電によつて
導電性粒子(P)の帯電がなくなつて、導電性粒
子(P)が電界による引力を受けなくなるから、
重力によつて再び円筒容器1の内壁面に落下す
る。このような運動を繰返しながら、導電性粒子
(P)は、円筒容器1の内壁面の下部を移動して、
スリツト5aを通つて導電性粒子捕獲装置5の直
下の円筒容器1の内壁面の領域(以下この領域を
「直下の領域」と略称する)に達した場合には、
円筒容器1と導電性粒子捕獲装置5とが同電位で
あるから、導電性粒子捕獲装置5の直下の領域で
の電界が非常に弱い。従つて、導電性粒子捕獲装
置5の直下の領域内では、導電性粒子(P)は移
動することがなく、捕獲されたことになる。ま
た、曲線ロで例示するように、導電性粒子(P)
が導電性粒子捕獲装置5のスリツト5aを通るこ
となく、直接に導電性粒子捕獲装置5の直下の領
域内に達した場合でも、上述の場合と同様に捕獲
される。このようにして、導電性粒子捕獲装置5
の直下の領為以外の領域に存在する導電性粒子
(P)は、順次、導電性粒子捕獲装置5の直下の
領域内に捕獲されて、減少するので、高電圧導体
2と導電性粒子(P)との放電が引金となつて、
高電圧導体2と円筒容器1の内壁面との間に絶縁
破壊が生ずるのを抑制することができる。その
上、導電性粒子捕獲装置5の長さが、高電圧導体
2に沿う方向に、絶縁スペーサ3の長さよりその
両側にそれぞれ所定長さだけ長くなるように構成
されているので、導電性粒子(P)が絶縁スペー
サ3の沿面に付着する以前に、スリツト5aを通
つて導電性粒子捕獲装置5の直下の領域に捕獲さ
れる。従つて、絶縁スペーサ3の沿面に導電性粒
子(P)が付着することがなく、絶縁スペーサ3
の絶縁特性が低下するようなことがない。 Most of the conductive particles (indicated by P in the figure) mixed into the GIS cylindrical container 1 are often attached to the lower part of the inner wall surface of the cylindrical container 1. Such conductive particles P are charged because they are exposed to the electric field created between the high voltage conductor 2 and the inner wall surface of the cylindrical container 1, and due to this electric field, they exert an attractive force in the direction toward the high voltage conductor 2. receive. When the attractive force due to this electric field overcomes the gravity of the conductive particle (P) itself, the conductive particle (P) floats up to the surface of the high voltage suppressor 2, as illustrated by curve A.
approach. When the conductive particles (P) approach the high voltage conductor 2, a discharge occurs between the conductive particles (P) and the high voltage conductor 2, and due to this discharge, the conductive particles (P) are no longer charged. As a result, the conductive particles (P) no longer receive the attractive force due to the electric field.
It falls again onto the inner wall surface of the cylindrical container 1 due to gravity. While repeating such movement, the conductive particles (P) move under the inner wall surface of the cylindrical container 1,
When the particles pass through the slit 5a and reach the area of the inner wall surface of the cylindrical container 1 directly below the conductive particle capture device 5 (hereinafter this area will be abbreviated as the "directly below area"),
Since the cylindrical container 1 and the conductive particle capture device 5 are at the same potential, the electric field in the area directly under the conductive particle capture device 5 is very weak. Therefore, the conductive particles (P) do not move within the area directly under the conductive particle capture device 5 and are captured. In addition, as illustrated by curve B, conductive particles (P)
Even if the particles do not pass through the slit 5a of the conductive particle capture device 5 and directly reach the area immediately below the conductive particle capture device 5, they are captured in the same manner as in the above case. In this way, the conductive particle capture device 5
The conductive particles (P) existing in areas other than the area directly under the conductive particle capture device 5 are sequentially captured and reduced in the area directly under the conductive particle capture device 5. The discharge with P) is the trigger,
It is possible to suppress dielectric breakdown from occurring between the high voltage conductor 2 and the inner wall surface of the cylindrical container 1. Moreover, since the length of the conductive particle trapping device 5 is configured to be longer than the length of the insulating spacer 3 by a predetermined length on each side of the insulating spacer 3 in the direction along the high voltage conductor 2, the conductive particle trapping device 5 is Before (P) adheres to the creeping surface of the insulating spacer 3, it passes through the slit 5a and is captured in the region immediately below the conductive particle capture device 5. Therefore, conductive particles (P) do not adhere to the creeping surface of the insulating spacer 3, and the insulating spacer 3
There is no deterioration in the insulation properties of the
ところで、GIBの円筒容器1と高電圧導体2と
の間に交流電圧が印加された交流電界下では、こ
れらの間に円筒容器1内に充満された絶縁性ガス
によるイオン流が流れないが、これらの間に直流
電圧が印加された直流電界下では、交流電界下と
は状態が大きく異なり、常時、高電圧導体2から
円筒容器1の内壁面に向う方向に絶縁性ガスによ
るイオン流が流れ、このイオン流に伴う風が、第
1図Cの縦断面図に曲線ハで例示するように、吹
いている。従つて、交流電界下ででは、導電性粒
子(P)が捕獲されている導電性粒子捕獲装置5
の直下の領域内から外へ飛出すようなことがない
が、直流電界下では、上述のイオン流に伴う風
が、導電性粒子(P)をこれが捕獲されている導
電性粒子捕獲装置5の直下の領域内から吹出すよ
うに作用する。この作用によつて、従来の導電性
粒子捕獲装置5では、直流電界下において、その
直下の領域内に導電性粒子(P)を確実に捕獲す
ることができなくなり、高電圧導体2と円筒容器
1の内壁面との間に導電性粒子(P)による絶縁
破壊が生ずるのを有効に抑制することができない
という問題があつた。 By the way, under an AC electric field where an AC voltage is applied between the cylindrical container 1 and the high voltage conductor 2 of the GIB, an ion current due to the insulating gas filled in the cylindrical container 1 does not flow between them. Under a DC electric field where a DC voltage is applied between these, the situation is significantly different from under an AC electric field, and an ion current due to the insulating gas always flows in the direction from the high voltage conductor 2 toward the inner wall surface of the cylindrical container 1. A wind accompanying this ion flow is blowing as illustrated by curve C in the longitudinal cross-sectional view of FIG. 1C. Therefore, under an alternating current electric field, the conductive particle capture device 5 in which the conductive particles (P) are captured
However, under a DC electric field, the wind accompanying the above-mentioned ion flow causes the conductive particles (P) to fly out of the area directly under the conductive particle capture device 5 in which they are captured. It acts as if it blows out from within the area directly below. Due to this effect, the conventional conductive particle capture device 5 cannot reliably capture the conductive particles (P) in the area directly under the DC electric field, and the high voltage conductor 2 and the cylindrical container There was a problem in that it was not possible to effectively suppress dielectric breakdown caused by the conductive particles (P) between the conductive particles (P) and the inner wall surface of the conductive particles (P).
この発明は、上述の問題点に鑑みてなされたも
ので、直流両電界下において、絶縁性ガスによる
イオン流に伴う風の作用で導電性粒子が捕獲され
ている領域内から外へ吹出されないようにするこ
とによつて、直流電界下でも、交流電界下と同様
に、確実に導電性粒子を捕獲することができるよ
うにした導電性粒子捕獲装置を提供することを目
的とする。 This invention was made in view of the above-mentioned problems, and is designed to prevent conductive particles from being blown out from the captured area by the action of the wind accompanying the ion flow caused by the insulating gas under both DC electric fields. It is an object of the present invention to provide a conductive particle trapping device that can reliably trap conductive particles even under a direct current electric field as well as under an alternating current electric field.
第2図A,BおよびCはそれぞれ第1図に示し
たGIBに取付けられるこの発明の一実施例の導電
性粒子捕獲装置を示す平面図、正面図および側面
図である。 FIGS. 2A, B, and C are a plan view, a front view, and a side view, respectively, showing a conductive particle trapping device according to an embodiment of the present invention, which is attached to the GIB shown in FIG. 1.
図において、50はこの実施例の導電性粒子捕
獲装置で、51は、複数個の所定幅のスリツト5
1aが互いに平行に形成され、第1図に示した従
来例の導電性粒子捕獲装置5と同様のスリツト形
成金属板、52は複数個のスリツト51aのすべ
てを取囲むようにスリツト形成金属板51の下面
の周縁部に開口端部が固定されたわん状金属体で
ある。なお、第2図BおよびCにおいて一点鎖線
で示す1および2はそれぞれこの実施例の導電性
粒子捕獲装置50が第1図に示したGIBに取付け
られた場合におけるGIBの円筒容器および高電圧
導体の一部である。 In the figure, 50 is the conductive particle trapping device of this embodiment, and 51 is a plurality of slits 5 of a predetermined width.
1a are metal plates with slits formed parallel to each other and similar to the conventional conductive particle capture device 5 shown in FIG. It is a bowl-shaped metal body with an open end fixed to the periphery of the lower surface. Note that 1 and 2 indicated by dashed lines in FIGS. 2B and 2C represent the cylindrical container and high voltage conductor of the GIB when the conductive particle capture device 50 of this embodiment is attached to the GIB shown in FIG. 1, respectively. is part of.
この実施例の導電性粒子捕獲装置50が第1図
に示したGIBに取付けられた場合には、GIBの円
筒容器1と導電性粒子捕獲装置50とが同電位で
あるから、わん状金属体52の内部およびその直
下の領域での電界が非常に弱い。従つて、第1図
Cの縦断面図に曲線イで例示したと同様に、スリ
ツト形成金属板51のスリツト51aを通つた導
電性粒子はわん状金属体52の内部の捕獲され、
第1図Cの縦断面図に曲線ロで例示したと同様
に、スリツト51aを通ることなく、直接わん状
金属体52の直下の領域内に達した導電性粒子は
その直下の領域内に捕獲される。このように捕獲
された導電性粒子は、交流電界下においては、第
1図に示した従来の導電性粒子捕獲装置5と同様
に、わん状金属体52の内部およびその直下の領
域内から外へ飛出すようなことがない。また、直
流電界下においては、わん状金属体52の内部に
捕獲された導電性粒子は、上述の絶縁性ガスによ
るイオン流に伴う風の作用によつてわん状金属体
52の外部へ吹出されるようなことがなく、しか
も、わん状金属体52の直下の領域には上記イオ
ン流に伴う風の作用がないので、その直下の領域
内に捕獲された導電性粒子は、この領域の外へ吹
出されるようなことがない。従つて、この実施例
の導電性粒子捕獲装置では、直流電界下において
も、交流電界下におけると同様に、導電性粒子に
確実に捕獲することができるので、GIBの円筒容
器の内壁面と高電圧導体との間に導電性粒子によ
る絶縁破壊が生ずるのを有効に抑制することがで
きる。 When the conductive particle capture device 50 of this embodiment is attached to the GIB shown in FIG. 1, since the cylindrical container 1 of the GIB and the conductive particle capture device 50 are at the same potential, The electric field inside 52 and the area immediately below it is very weak. Therefore, as illustrated by curve A in the vertical cross-sectional view of FIG.
Similarly to the example illustrated by curve B in the vertical cross-sectional view of FIG. be done. Under an alternating current electric field, the conductive particles captured in this way are transported from the interior of the bowl-shaped metal body 52 and the area immediately below it to the outside, similar to the conventional conductive particle capture device 5 shown in FIG. There is no such thing as jumping out. Furthermore, under a DC electric field, the conductive particles captured inside the bowl-shaped metal body 52 are blown out to the outside of the bowl-shaped metal body 52 by the action of the wind accompanying the ion flow caused by the above-mentioned insulating gas. Moreover, since there is no wind effect accompanying the ion flow in the area directly under the bowl-shaped metal body 52, the conductive particles captured in the area directly under it will not flow outside this area. There is no chance of being blown out. Therefore, in the conductive particle trapping device of this embodiment, conductive particles can be captured as reliably under a DC electric field as under an AC electric field, so that the conductive particles can be captured at the same height as the inner wall surface of the cylindrical container of the GIB. It is possible to effectively suppress dielectric breakdown caused by conductive particles between the conductor and the voltage conductor.
この実施例では、スリツト形成金属板51を用
いたが、必ずしもこれはスリツト形成金属板に限
定する必要がなく、金網を含むその他の多孔金属
板を用いてもよい。 Although the slit-formed metal plate 51 is used in this embodiment, it is not necessarily limited to the slit-formed metal plate, and other porous metal plates including wire mesh may be used.
なお、これまで、円筒容器のGIBに取付けられ
る導電性粒子捕獲装置を例にとり述べたが、この
発明はこれに限らず、円筒容器以外の筒状金属容
器のGIBは言うまでもなく、筒状金属容器とこの
筒状金属容器の中心軸に沿うように設けられた高
電圧導体とを備えたガス絶縁電気装置一般に適用
することができる。 Although the conductive particle capture device attached to the GIB of a cylindrical container has been described as an example, the present invention is not limited to this, and it goes without saying that the present invention can be applied to a GIB of a cylindrical metal container other than a cylindrical container. The present invention can be applied to gas-insulated electric devices in general, including a high-voltage conductor provided along the central axis of the cylindrical metal container.
以上、説明したように、この発明の導電性粒子
捕獲装置では、ガス絶縁電気装置の筒状金属容器
内に混入した導電性粒子を捕獲する多孔金属板の
上記筒状金属容器側の表面に上記多孔金属板のす
べての孔をふさぐように開口端部が固定され上記
多孔金属板と同電位に保たれたわん状金属体を設
けたので、上記わん状金属体の内部およびその直
下の領域での電界が非常に弱い。従つて、上記多
孔金属板を通つた導電性粒子は上記わん状金属体
の内部に捕獲され、上記多孔金属板を通ることな
く、直接上記わん状金属体の直下の領域内に達し
た導電性粒子は上記領域内に捕獲される。このよ
うに捕獲された導電性粒子は、交流電界下におい
ては、上記わん状金属体の内部およびその直下の
領域内から外へ飛出すようなことがない。また、
直流電界下においては、上記わん状金属体の内部
に捕獲された導電性粒子は、絶縁性ガスによるイ
オン流に伴う風の作用によつて上記わん状金属体
の外部へ吹出されるようなことがなく、しかも、
上記わん状金属体の直下の領域には上記イオン流
に伴う風の作用がないので、上記領域内に捕獲さ
れた導電性粒子は、上記領域の外部へ吹出される
ようなことがない。よつて、交流電界下において
も、直流電界下においても、導電性粒子を確実に
捕獲することができるので、上記ガス絶縁電気装
置に混入導電性粒子による絶縁破壊が生ずるのを
有効に抑制することができる。 As described above, in the conductive particle capture device of the present invention, the surface of the porous metal plate on the side of the cylindrical metal container that captures the conductive particles mixed in the cylindrical metal container of the gas-insulated electrical equipment is A bowl-shaped metal body whose opening end was fixed and kept at the same potential as the porous metal plate so as to close all the holes in the porous metal plate was provided, so that the inside of the bowl-shaped metal body and the area immediately below it Electric field is very weak. Therefore, the conductive particles passing through the porous metal plate are captured inside the bowl-shaped metal body, and the conductive particles directly reach the area directly under the bowl-shaped metal body without passing through the porous metal plate. Particles are trapped within said area. The conductive particles captured in this manner do not fly out from inside the bowl-shaped metal body and the region immediately below it under an alternating current electric field. Also,
Under a direct current electric field, the conductive particles trapped inside the bowl-shaped metal body are blown out to the outside of the bowl-shaped metal body by the action of the wind accompanying the ion flow caused by the insulating gas. There is no
Since there is no wind effect associated with the ion flow in the region immediately below the bowl-shaped metal body, the conductive particles captured within the region are not blown out to the outside of the region. Therefore, it is possible to reliably capture conductive particles both under an AC electric field and under a DC electric field, thereby effectively suppressing dielectric breakdown caused by conductive particles mixed in the gas-insulated electrical device. Can be done.
第1図Aは従来の導電性粒子捕獲装置が取付け
られたGIBをその一部を破砕して示す斜視図、第
1図Bは第1図AのIB−IB線での横断面図、第
1図Cは第1図BのIC−IC線での縦断面図、第
2図A,BおよびCはそれぞれこの発明の一実施
例の導電性粒子捕獲装置を示す平面図、正面図お
よび側面図である。
図において、1は円筒容器(筒状金属容器)、
2は高電圧導体、50は上記実施例の導電性粒子
捕獲装置、51はスリツト形成金属板(多孔金属
板)、52はわん状金属体である。なお、図中同
一符号はそれぞれ同一もしくは相当部分を示す。
Fig. 1A is a perspective view showing a partially broken GIB equipped with a conventional conductive particle capture device, Fig. 1B is a cross-sectional view taken along line IB-IB of Fig. 1A, Figure 1C is a longitudinal sectional view taken along the IC-IC line in Figure 1B, and Figures 2A, B, and C are a plan view, front view, and side view, respectively, showing a conductive particle trapping device according to an embodiment of the present invention. It is a diagram. In the figure, 1 is a cylindrical container (cylindrical metal container),
2 is a high voltage conductor, 50 is the conductive particle capture device of the above embodiment, 51 is a slit-forming metal plate (porous metal plate), and 52 is a bowl-shaped metal body. Note that the same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
筒状金属容器の中心軸に沿うように設けられ上記
筒状金属容器に対して高電圧が印加された高電圧
導体とを有するガス絶縁電気装置の上記筒状金属
容器内にその内壁面の下部の所定領域との間に所
定距離をおいて設けられ上記筒状金属容器の電位
と同一の電位を有する多孔金属板を備え、上記内
壁面の上記所定領域に上記筒状金属容器内に混入
した導電性粒子を捕獲するようにしたものにおい
て、上記多孔金属板の上記筒状金属容器側の表面
に上記多孔金属板のすべての孔をふさぐように開
口端部が固定され上記多孔金属板と同電位に保た
れたわん状金属体を設けたことを特徴とする導電
性粒子捕獲装置。1. A gas-insulated electrical appliance comprising a cylindrical metal container filled with an insulating gas and a high voltage conductor provided along the central axis of the cylindrical metal container and to which a high voltage is applied to the cylindrical metal container. A porous metal plate is provided in the cylindrical metal container of the device at a predetermined distance from a predetermined region at the bottom of the inner wall surface thereof and has the same potential as that of the cylindrical metal container, and the inner wall surface in which conductive particles mixed into the cylindrical metal container are captured in the predetermined area of the cylindrical metal container, wherein all pores of the porous metal plate are plugged on the surface of the porous metal plate facing the cylindrical metal container. A conductive particle trapping device characterized in that it is provided with a bowl-shaped metal body whose opening end is fixed and kept at the same potential as the porous metal plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56071979A JPH0232844B2 (en) | 1981-05-13 | 1981-05-13 | DODENSEIRYUSHIHOKAKUSOCHI |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56071979A JPH0232844B2 (en) | 1981-05-13 | 1981-05-13 | DODENSEIRYUSHIHOKAKUSOCHI |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57186922A JPS57186922A (en) | 1982-11-17 |
| JPH0232844B2 true JPH0232844B2 (en) | 1990-07-24 |
Family
ID=13476085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56071979A Expired - Lifetime JPH0232844B2 (en) | 1981-05-13 | 1981-05-13 | DODENSEIRYUSHIHOKAKUSOCHI |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0232844B2 (en) |
-
1981
- 1981-05-13 JP JP56071979A patent/JPH0232844B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57186922A (en) | 1982-11-17 |
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