JPH0235232B2 - RENZOKUSHIKIROORAHAASUGATASHOSEIRO - Google Patents
RENZOKUSHIKIROORAHAASUGATASHOSEIROInfo
- Publication number
- JPH0235232B2 JPH0235232B2 JP1273787A JP1273787A JPH0235232B2 JP H0235232 B2 JPH0235232 B2 JP H0235232B2 JP 1273787 A JP1273787 A JP 1273787A JP 1273787 A JP1273787 A JP 1273787A JP H0235232 B2 JPH0235232 B2 JP H0235232B2
- Authority
- JP
- Japan
- Prior art keywords
- zone
- furnace
- atmosphere
- heating zone
- atmospheric gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010304 firing Methods 0.000 claims description 22
- 239000012298 atmosphere Substances 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 15
- 238000001816 cooling Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 description 17
- 238000000605 extraction Methods 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Landscapes
- Tunnel Furnaces (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【発明の詳細な説明】
本発明は連続式ローラハース型焼成炉、特に、
板状の処理材、たとえば、厚膜ハイブリツドIC
基板の厚膜焼成に最適な焼成炉に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a continuous roller hearth type firing furnace, in particular,
Plate-shaped processed materials, e.g. thick film hybrid IC
The present invention relates to a firing furnace that is optimal for firing thick films on substrates.
(従来技術とその問題点)
従来、厚膜ハイブリツドIC基板を焼成する焼
成炉として、種々なものが提案されているが、一
般に、実開昭58−107171号公報に開示のようなメ
ツシユベルト炉が使用されている。(Prior art and its problems) Various firing furnaces have been proposed for firing thick film hybrid IC substrates, but generally a mesh belt furnace as disclosed in Japanese Utility Model Application Publication No. 107171/1983 has been proposed. It is used.
すなわち、処理材はメツシユベルト上に複数列
水平に載置して炉内搬送され、ふく射加熱により
焼成され、そのとき、導体ペーストから発生する
アウトガスは、乾燥空気を自然対流、または、強
制的に送気することにより除去されている。 In other words, the treated material is placed horizontally in multiple rows on a mesh belt, transported into a furnace, and fired by radiation heating. At that time, the outgas generated from the conductive paste is removed by drying air by natural convection or by forced air flow. It has been removed due to concern.
ところで、厚膜ハイブリツドIC用基板の焼成
においては、ペーストがAg−Pd、Auペーストの
場合、導体抵抗、ハンダ食われ性、ハンダ濡れ
性、接着強度等の特性から雰囲気ガスの露点を低
く一定に保持する必要がある。また、Cu等のペ
ーストでは、O2濃度を低く一定に保持する必要
から炉内雰囲気をクリーンに保持する必要があ
る。 By the way, when baking thick-film hybrid IC boards, when the paste is Ag-Pd or Au paste, it is necessary to keep the dew point of the atmospheric gas low and constant due to characteristics such as conductor resistance, solder erosion resistance, solder wettability, and adhesive strength. need to be retained. Furthermore, in the case of pastes such as Cu, it is necessary to keep the O 2 concentration low and constant, so it is necessary to keep the atmosphere inside the furnace clean.
しかしながら、メツシユベルト炉では炉の出入
口にどうしても開口部が存在し、炉内雰囲気の完
全なシールは本質的に不可能で、雰囲気ガスの露
点あるいはO2濃度を正確に、一定に保持するこ
とは非常に困難であるばかりか、アウトガスが炉
内に滞留しやすい。 However, mesh belt furnaces inevitably have openings at the entrance and exit of the furnace, so it is essentially impossible to completely seal the atmosphere inside the furnace, and it is extremely difficult to maintain the dew point or O 2 concentration of the atmospheric gas accurately and constant. Not only is it difficult to remove the gas, but also the outgas tends to remain in the furnace.
また、基板の搬送は、前述したように、メツシ
ユベルト上に水平に載置して行なうため、生産性
を高めるには、炉幅を大きくするか、炉長を長く
してベルトスピードを上げるかであり、いずれに
しても設置スペースが大となる。 In addition, as mentioned above, the substrates are transported horizontally on the mesh belt, so in order to increase productivity, it is necessary to increase the belt speed by increasing the furnace width or the furnace length. In either case, the installation space will be large.
さらに、板状のセラミツク等の焼成に際して
は、処理材の両面を均一に焼成することは極めて
困難であり、また、処理材の載置位置によるバラ
ツキが生じるという問題点を有していた。 Furthermore, when firing plate-shaped ceramics, etc., it is extremely difficult to uniformly fire both sides of the treated material, and there are also problems in that variations occur depending on the placement position of the treated material.
(問題点を解決すべき手段)
したがつて、本発明は、焼成炉を、予熱帯、加
熱帯、冷却帯を備えた連続式ローラハース型焼成
炉とし、該炉の入口側と出口側とに真空ベスチブ
ルを配設するとともに、前記各帯域内に、底部プ
レナムチヤンバを有するバツフルと、該バツフル
天井部に設けた循環フアンとにより、前記バツフ
ル内で真空ベスチブルの上方流れ、また該バツフ
ル外で雰囲気の下方流れをもつ雰囲気循環路を形
成し、かつ予熱帯と加熱帯の雰囲気循環路に間接
加熱手段を、また、冷却帯の雰囲気循環路にクー
ラを設ける一方、予熱帯に雰囲気ガス排出口を、
加熱帯と冷却帯に雰囲気ガス供給口を設け、か
つ、炉内搬送手段として処理材を竪方向に保持す
るトレイを備えたものである。(Means to Solve the Problems) Therefore, the present invention provides a continuous roller hearth type firing furnace equipped with a preheating zone, a heating zone, and a cooling zone, and the furnace has an inlet side and an outlet side. A vacuum vestible is disposed, and within each zone, a buttful having a bottom plenum chamber and a circulation fan provided on the ceiling of the buttful allow the upward flow of the vacuum vestible within the buttful and the atmosphere outside the buttful. An atmosphere circulation path with a downward flow is formed, an indirect heating means is provided in the atmosphere circulation path of the preheating zone and the heating zone, a cooler is provided in the atmosphere circulation path of the cooling zone, and an atmospheric gas discharge port is provided in the preheating zone.
Atmospheric gas supply ports are provided in the heating zone and the cooling zone, and a tray is provided as an in-furnace conveying means for vertically holding the processing material.
(実施例)
つぎに、本発明を一実施例を示す図面にしたが
つて説明する。(Example) Next, the present invention will be described with reference to drawings showing one example.
図面は、本発明にかかる連続式ローラハース型
焼成炉Tを、厚膜ハイブリツドIC基板の焼成に
使用する場合を示し、大略、バーンアウト帯(予
熱帯)1、焼成帯(加熱帯)2、冷却帯3および
バーンアウト帯1の前部と冷却帯3の後部に設け
た真空ベスチブル4a,4bと、炉Tの底部に設
けたハースローラ5と、炉内搬送手段として基板
(処理材)Wを竪方向に保持してハースローラ5
上を搬送するトレイ6からなる。 The drawing shows a case where the continuous roller hearth type firing furnace T according to the present invention is used for firing a thick film hybrid IC substrate, and roughly shows a burnout zone (pre-heating zone) 1, a firing zone (heating zone) 2, and a cooling zone. Vacuum bestibles 4a and 4b provided at the front of the belt 3 and the burnout zone 1 and the rear of the cooling zone 3, a hearth roller 5 provided at the bottom of the furnace T, and a substrate (processing material) W are vertically moved as a means for transporting the substrate (processing material) in the furnace. Hold the hearth roller 5 in the direction
It consists of a tray 6 that is conveyed on top.
なお、7は装入テーブル、8は抽出テーブルで
ある。 Note that 7 is a charging table and 8 is an extraction table.
前記バーンアウト帯1と焼成帯2とは、前者が
2区画室に、後者が3区画室に区画されている
が、各区画室は第2図に示す構成からなる。 The burnout zone 1 and the firing zone 2 are divided into two compartments in the former and three compartments in the latter, and each compartment has the configuration shown in FIG.
すなわち、各区画室内には、炉壁9と所定間隔
を有するバツフル10が設けられ、このバツフル
10の底部には上面および下面に多数の孔12a
を有するプレナムチヤンバ11が設けてある。 That is, a buttful 10 having a predetermined distance from the furnace wall 9 is provided in each compartment, and the bottom of this buffle 10 has a large number of holes 12a on the upper and lower surfaces.
A plenum chamber 11 is provided having a plenum chamber.
また、前記バツフル10の上部には、パンチン
グメタル等の多孔板12および天井部には循環フ
アン14が配置されている。そして、前記バツフ
ル10とプレナムチヤンバ11と循環フアン14
により雰囲気循環路13を形成し、この雰囲気循
環路13にはエレクトロチユーブ、ヒータ、ラジ
アントチユーブ等の間接加熱手段15が設けてあ
る。 Further, a perforated plate 12 made of punching metal or the like is disposed above the buffer 10, and a circulation fan 14 is disposed on the ceiling. Then, the bath full 10, the plenum chamber 11 and the circulation fan 14
This forms an atmosphere circulation path 13, and this atmosphere circulation path 13 is provided with indirect heating means 15 such as an electrotube, a heater, and a radiant tube.
前記冷却帯3も前記バーンアウト帯1および焼
成帯2とほぼ同様構成をなし、加熱手段15の代
わりにクーラ16が設けてある点においてのみ相
異する。 The cooling zone 3 has almost the same structure as the burnout zone 1 and the firing zone 2, and differs only in that a cooler 16 is provided instead of the heating means 15.
そして、前記焼成帯2と冷却帯3の各抽出側に
は、N2等の雰囲気ガス供給口17が、また、バ
ーンアウト帯1の装入側には雰囲気ガス排気口1
8が設けてあり、バーンアウト帯1にて導体ペー
ストから発生するアウトガスが焼成帯2に流入し
ないようになつている。なお、処理材Wの種類に
より焼成帯2の炉長方向において複数箇所に、ま
た、バーンアウト帯1の抽出側に、それぞれ雰囲
気ガス供給口17を設けてもよい。 An atmospheric gas supply port 17 such as N2 is provided on each extraction side of the firing zone 2 and cooling zone 3, and an atmospheric gas exhaust port 17 is provided on the charging side of the burnout zone 1.
8 is provided to prevent outgas generated from the conductive paste in the burnout zone 1 from flowing into the firing zone 2. Incidentally, depending on the type of material W to be treated, the atmospheric gas supply ports 17 may be provided at a plurality of locations in the furnace length direction of the firing zone 2, and on the extraction side of the burnout zone 1, respectively.
その他、図において、19aを真空ベスチブル
4a,4bの装入扉、19bは抽出扉、20は中
間扉である。 In addition, in the figure, 19a is the charging door of the vacuum bestibles 4a and 4b, 19b is the extraction door, and 20 is the intermediate door.
一方、前記トレイ6は、第3図、第4図に示す
ように、枠体からなるトレイ本体6aの底部に、
搬送方向と直角に設けた保持ラツク6bを有し、
基板Wはこの保持ラツク6bに竪方向に起立状態
で載置するようになつている。 On the other hand, as shown in FIGS. 3 and 4, the tray 6 has a tray main body 6a formed of a frame with a
It has a holding rack 6b provided perpendicular to the conveyance direction,
The substrate W is placed on this holding rack 6b in an upright position in the vertical direction.
つぎに、前記構成からなる連続式ローラハース
型焼成炉Tの操業について説明する。 Next, the operation of the continuous roller hearth type firing furnace T having the above configuration will be explained.
まず、前記のように基板Wを載置したトレイ6
を装入側真空ベスチブル4a内に装入し、ここで
ベスチブル4a内を排気し、N2雰囲気としたの
ち、抽出扉19bを開き、ハースローラ5の駆動
により、バーンアウト帯1に装入する。このバー
ンアウト帯1の各区画室は約600℃に制御され、
第2図に示すように、炉内雰囲気(N2雰囲気)
は循環フアン14によつて吸引され、雰囲気循環
路13の側壁に至り、下部のプレナムチヤンバ1
1から上方に噴出する。この噴出雰囲気ガスは、
下部プレナムチヤンバ11および上部の多孔板1
2により、炉幅方向での偏流が矯正されて、基板
W間の空間を上方に向けて、所定流速で流れる。
基板Wは前記雰囲気流れにより、その表裏を均一
に対流加熱され、また、基板W上の導体ペースト
から発生するアウトガスは雰囲気ガスによつて掃
気され、基板Wと導体ペーストとの接着強度が阻
害されることがない。その後、この雰囲気ガスは
循環するとともに、その一部は雰囲気ガス排気口
18から排出される。 First, the tray 6 on which the substrate W is placed as described above.
is charged into the charging-side vacuum bestible 4a, where the inside of the bestible 4a is evacuated to create an N 2 atmosphere, the extraction door 19b is opened, and the hearth roller 5 is driven to charge the sample into the burnout zone 1. Each compartment in this burnout zone 1 is controlled at approximately 600℃,
As shown in Figure 2, the atmosphere inside the furnace ( N2 atmosphere)
is sucked by the circulation fan 14, reaches the side wall of the atmosphere circulation path 13, and reaches the lower plenum chamber 1.
It erupts upward from 1. This ejected atmospheric gas is
Lower plenum chamber 11 and upper perforated plate 1
2, the drift in the oven width direction is corrected, and the flow flows upward in the space between the substrates W at a predetermined flow rate.
The substrate W is uniformly convectively heated on its front and back sides by the atmospheric flow, and outgas generated from the conductive paste on the substrate W is scavenged by the atmospheric gas, inhibiting the adhesive strength between the substrate W and the conductive paste. Never. Thereafter, this atmospheric gas is circulated and a portion of it is exhausted from the atmospheric gas exhaust port 18.
なお、前記雰囲気ガスのプレナムチヤンバ11
から噴出され、基板W表面を掃気する雰囲気ガス
の流速は、Cuペーストの場合、0.01〜0.1Nm/
secである。 In addition, the plenum chamber 11 of the atmospheric gas
In the case of Cu paste, the flow rate of the atmospheric gas ejected from the substrate W to scavenge the surface of the substrate W is 0.01 to 0.1 Nm/
sec.
その後、ハースローラ5の駆動により、前記ト
レイ6は右方の区画室へ、また、新たなトレイ6
が装入側真空ベスチブル4aからバーンアウト帯
1へ新たに装入される。 Thereafter, by driving the hearth roller 5, the tray 6 is moved to the right compartment and a new tray 6 is moved.
is newly charged from the charging side vacuum bestible 4a to the burnout zone 1.
このようにして、順次、トレイ6に載置された
基板Wは焼成帯2に至り、ここで、前記同様にし
て、約900℃で焼成され、中間扉20の開放によ
り冷却帯3に至り、ここで、所定温度に冷却され
て、この後、抽出側真空ベスチブル4bから抽出
テーブル8上に抽出される。 In this way, the substrates W placed on the tray 6 sequentially reach the firing zone 2, where they are fired at about 900°C in the same manner as described above, and when the intermediate door 20 is opened, they reach the cooling zone 3. Here, it is cooled to a predetermined temperature, and then extracted onto the extraction table 8 from the extraction side vacuum bestible 4b.
なお、前記実施例では、処理材Wとして厚膜ハ
イブリツドIC基板を使用する場合について述べ
たが、板状のセラミツク等でもよく、また、処理
材Wをトレイ本体6aの両側壁間に掛け渡した棒
材にクリツプ等を用いて吊り下げるようにしても
よいことは勿論である。 In the above embodiment, a thick film hybrid IC substrate is used as the processing material W, but a plate-shaped ceramic or the like may also be used. Of course, it is also possible to hang the bar using a clip or the like.
(発明の効果)
以上の説明で明らかなように、本発明によれ
ば、従来のようにメツシユベルトを使用せず、ロ
ーラハースとしてあるので、メツシユベルトのよ
うに炉の出入口に開口を形成しない。しかも、炉
の前後には真空ベスチブルが設けてあるため、ロ
ーラハースであることと相まつて炉内雰囲気をほ
ぼ完全にシールすることができる。したがつて、
炉内を安定した雰囲気とすることができ、良質な
焼成を行うことができる。(Effects of the Invention) As is clear from the above description, according to the present invention, unlike the conventional mesh belt, a roller hearth is used instead of using a mesh belt, so unlike a mesh belt, an opening is not formed at the entrance and exit of the furnace. Moreover, since vacuum vestibules are provided before and after the furnace, together with the roller hearth, the atmosphere inside the furnace can be almost completely sealed. Therefore,
A stable atmosphere can be created in the furnace, and high-quality firing can be performed.
しかも、バツフルの底部にプレナムチヤンバを
設け、処理材はトレイに竪方向に位置させている
ため、バツフル内の雰囲気流れは、炉幅方向で均
一な流れ(速度分布)となり、しかも、処理材間
を所定流速で流れることになるので、炉内の炉巾
方向の温度分布が均一となるとともに、各処理材
表裏面を均一に対流加熱し、かつ、処理材から発
生するアウトガスを予熱帯に設けた雰囲気ガス排
出口から強制的に掃気させ、均一で良質な焼成を
行える。また、設置スペースを大きくすることな
く生産性を向上させることができる。 Furthermore, a plenum chamber is provided at the bottom of the buttful, and the processing material is placed vertically on the tray, so the atmosphere flow inside the buttfull is uniform in the width direction of the furnace (velocity distribution), and the flow between the processing materials is uniform. Since the flow flows at a predetermined velocity, the temperature distribution in the furnace width direction is uniform, and the front and back surfaces of each treated material are uniformly heated by convection, and the outgas generated from the treated materials is disposed in a pre-heating zone. Air is forcibly scavenged from the atmospheric gas outlet to ensure uniform and high quality firing. Furthermore, productivity can be improved without increasing the installation space.
第1図は本発明にかかる連続式ローラハース型
焼成炉の概略断面図、第2図は第1図の−線
断面図、第3図は第2図の部分拡大図で、第4図
はトレイの説明図である。
1〜予熱帯(バーンアウト帯1)、2〜加熱帯
(焼成帯)、3〜冷却帯、4a,4b〜真空ベスチ
ブル、5〜ハースローラ、6〜トレイ、10〜バ
ツフル、11〜プレナムチヤンバ、12〜多孔
板、13〜雰囲気循環路、14〜循環フアン、1
5〜加熱手段、16〜クーラ、17〜雰囲気ガス
供給口、18〜雰囲気ガス排気口、W〜処理材
(基板)。
Fig. 1 is a schematic sectional view of a continuous roller hearth type firing furnace according to the present invention, Fig. 2 is a sectional view taken along the - line in Fig. 1, Fig. 3 is a partially enlarged view of Fig. 2, and Fig. 4 is a tray FIG. 1 - Pre-preparation zone (burnout zone 1), 2 - heating zone (firing zone), 3 - cooling zone, 4a, 4b - vacuum bestible, 5 - hearth roller, 6 - tray, 10 - buttful, 11 - plenum chamber, 12 - Perforated plate, 13 - atmosphere circulation path, 14 - circulation fan, 1
5 - heating means, 16 - cooler, 17 - atmospheric gas supply port, 18 - atmospheric gas exhaust port, W - processing material (substrate).
Claims (1)
ラハース型焼成炉において、該炉の入口側と出口
側とに真空ベスチブルを配設するとともに、前記
各帯域内に、底部プレナムチヤンバを有するバツ
フルと、該バツフル天井部に設けた循環フアンと
により、前記バツフル内で雰囲気の上方流れ、ま
た該バツフル外で雰囲気の下方流れをもつ雰囲気
循環路を形成し、かつ予熱帯と加熱帯の雰囲気循
環路に間接加熱手段を、また、冷却帯の雰囲気循
環路にクーラを設ける一方、予熱帯に雰囲気ガス
排出口を、加熱帯と冷却帯に雰囲気ガス供給口を
設け、かつ、炉内搬送手段として処理材を竪方向
に保持するトレイを備えたことを特徴とする連続
式ローラハース型焼成炉。1. A continuous roller hearth type firing furnace equipped with a pre-heating zone, a heating zone, and a cooling zone, in which a vacuum bestible is provided on the inlet side and the outlet side of the furnace, and a bottom plenum chamber with a bottom plenum chamber is provided in each zone. , and a circulation fan installed in the ceiling of the buttful to form an atmosphere circulation path with an upward flow of the atmosphere inside the butthole and a downward flow of the atmosphere outside the butthole, and an atmosphere circulation path for the pre-heating zone and the heating zone. In addition, a cooler is provided in the atmosphere circulation path of the cooling zone, an atmospheric gas discharge port is provided in the pre-heating zone, and an atmospheric gas supply port is provided in the heating zone and the cooling zone. A continuous roller hearth type kiln characterized by being equipped with a tray that holds materials vertically.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1273787A JPH0235232B2 (en) | 1987-01-20 | 1987-01-20 | RENZOKUSHIKIROORAHAASUGATASHOSEIRO |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1273787A JPH0235232B2 (en) | 1987-01-20 | 1987-01-20 | RENZOKUSHIKIROORAHAASUGATASHOSEIRO |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63180076A JPS63180076A (en) | 1988-07-25 |
| JPH0235232B2 true JPH0235232B2 (en) | 1990-08-09 |
Family
ID=11813743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1273787A Expired - Lifetime JPH0235232B2 (en) | 1987-01-20 | 1987-01-20 | RENZOKUSHIKIROORAHAASUGATASHOSEIRO |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0235232B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005027216A1 (en) * | 2005-06-13 | 2006-12-21 | Basf Ag | Apparatus and method for continuous catalytic debinding with improved flow conditions |
| JP4943087B2 (en) * | 2006-08-11 | 2012-05-30 | 大学共同利用機関法人自然科学研究機構 | Continuous firing furnace and continuous firing method |
| JP4943088B2 (en) * | 2006-08-11 | 2012-05-30 | 美濃窯業株式会社 | Continuous firing equipment |
| JP2008249297A (en) * | 2007-03-30 | 2008-10-16 | Nec Corp | Conveying heating apparatus and method |
-
1987
- 1987-01-20 JP JP1273787A patent/JPH0235232B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63180076A (en) | 1988-07-25 |
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