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JPH0238676B2 - - Google Patents
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JPH0238676B2 - - Google Patents

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Publication number
JPH0238676B2
JPH0238676B2 JP60266812A JP26681285A JPH0238676B2 JP H0238676 B2 JPH0238676 B2 JP H0238676B2 JP 60266812 A JP60266812 A JP 60266812A JP 26681285 A JP26681285 A JP 26681285A JP H0238676 B2 JPH0238676 B2 JP H0238676B2
Authority
JP
Japan
Prior art keywords
porous layer
forming
substrate
plating solution
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60266812A
Other languages
Japanese (ja)
Other versions
JPS62127494A (en
Inventor
Yasuo Masuda
Tsutomu Takahashi
Yoshio Takizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP26681285A priority Critical patent/JPS62127494A/en
Priority to FI864684A priority patent/FI86475C/en
Priority to US06/934,652 priority patent/US4780373A/en
Priority to DE8686116447T priority patent/DE3680191D1/en
Priority to EP86116447A priority patent/EP0226861B1/en
Publication of JPS62127494A publication Critical patent/JPS62127494A/en
Priority to US07/222,142 priority patent/US4824530A/en
Publication of JPH0238676B2 publication Critical patent/JPH0238676B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

[産業上の利用分野] 本発明は、例えば空調用の熱交換器の蒸発管や
凝縮管の伝熱面、あるいはヒートパイプのウイツ
クなどを構成するのに好適な多孔質層の形成方法
に関し、特に、形成のためのコストが安く、伝熱
特性を向上させることができる多孔質層の形成方
法に関する。 [従来の技術] 内部の媒体と外部の媒体との熱交換を行わせる
ための伝熱管において、その伝熱効率を上げるた
めには、 (1) 伝熱面積を大きくする。 (2) 核沸騰を起こしやすくする。 (3) 毛細管現象を起こしやすくする。 (4) 乱流を起こしやすくする。 ことが有効とされている。 この(1)、(4)を満たすような方法として、銅管の
内面に螺旋状の溝を転造法などにより形成する方
法が用いられている。 また、(2)を満たすような方法としては、伝熱体
の表面に核沸騰の核となる多孔質層を形成する方
法が知られており、板状の伝熱体においては焼結
あるいはろう付け法によりそのような多孔質層を
形成することが行われている。 [発明が解決しようとする問題点] しかしながら、上記のような従来の方法におい
ては、それぞれ次のような問題点があつた。 すなわち、螺旋溝を形成する場合には、上記の
伝熱効率を上げる方法のうち、最も効果の高い核
沸騰現象を利用しておらず、また、転造工具の製
作技術上及び転造の技術上から、螺旋溝の条数や
ねじれの角度に制限があることなどの理由によ
り、通常の溝無し管と比べても熱特性値が1.2〜
1.5倍程度にしかならず、性能が不充分であつた。
また、製造において、転造工具と管内面の摩擦力
が大きいため、大きな加圧力を必要とし、従つて
大規模な装置を必要とするとともに、工具の寿命
が短くなつて、製作コストが高くなるという問題
点があつた。 一方、多孔質層を形成する方法においては、伝
熱管のような管状構造のものの内面に、焼結、ろ
う付けなどにより多孔質層を形成することは困難
であつた。また、金属表面にスクリーン印刷等に
よりパターンマスキングを施した後、電気鍍金す
ることにより多孔質層を形成することは可能であ
るが、この方法により管内面に多孔質層を形成す
ることは困難であり、また、印刷、焼き付け等の
複雑な工程を必要とし、製造コストが高くなると
いう問題点があつた。 [問題点を解決するための手段] 本発明は、上記のような問題点を解決するため
に、金属製の基体の表面に絶縁性の薄膜を形成し
た後、該基体を陰極とし、可溶性の陽極を用い、
陽極スライムが生成される陽極電流密度域におい
て電気鍍金を行い、上記基体の表面に、樹枝状、
粒状の金属を析出させるようにしたものである。 [作用] この方法において基体表面に多孔質層が形成さ
れる機構は、次のように考えられる。可溶性陽極
を用いて高い電流密度で鍍金を行うと、陰極であ
る基体の表面に形成された絶縁性薄膜の特に薄い
部分あるいはとぎれた部分において、初期電析が
起こり、無数の鍍金針状核が形成され、多孔質電
析層の基礎が形成される。次に、陽極が溶解され
てその表面上に粉状の陽極金属(スライム)が生
成され、この陽極スライムは鍍金液の移動ととも
に陰極の基体表面に運ばれ、厚さ方向に成長しつ
つある初期電析部の鍍金針状核に取り込まれる。
このスライムは導電性を有するので、さらにこれ
を核として次の電析金属の成長が起こり、多方向
への針状的な成長と、相互に絡み合つた架橋構造
を伴いつつ、鍍金液の流動あるいは電流密度など
の条件に応じて樹枝状金属または粒状金属からな
る多孔質層が容易に形成される。なお、陽極電流
密度は、可溶性陽極の材料の種類により異なる
が、20A/dm2以下では充分な陽極スライムが生
成されないので、20A/dm2以上であることが好
ましい。 絶縁性薄膜を構成する物質としては、薄膜層が
容易に得られ、その薄膜が適度な絶縁性すなわち
適度な絶縁欠陥を有することが要求され、そのた
め、鍍金液に溶けにくい油が好ましい。特に、油
が抽伸加工時に工具と基体との摩擦を防止するた
めに用いられる潤滑油である場合には、金属基体
を抽伸すると同時に絶縁性薄膜を形成できる利点
がある。基体と鍍金液の相対移動速度は0.5〜5
m/secが好ましく、これ以下では、基体表面へ
の金属イオンの移動が妨げられてもろい電析膜し
か得られず、またこれ以上にしても、エネルギー
コストが増大するのみで特段の効果が認められな
い。 [実施例] 以下、本発明の方法を伝熱体に対して応用した
例について具体的に述べる。 実施例 1 第1図に示すように、外径9.52mm、肉厚0.35mm
の銅管1を長さ1000mmに切断し、その内面にトリ
クレン洗浄を施して清浄化し、シリコンオイルを
エタノールで3倍に希釈した溶液を通して塗布し
た後、エタノールを蒸発させて除去して内面にシ
リコンオイルの被膜2を形成した。この銅管1内
に、樹脂製のスペーサ3をスパイラル状に巻き付
けた銅製の外径4mmφのワイヤ4を挿入し、両端
に張力をかけてたわみを矯正した。 そして、銅管1内に硫酸銅鍍金液(硫酸銅200
g/、硫酸50g/)を貯槽5からケミカルポ
ンプ6により循環させながら、銅管1を陰極に、
ワイヤ4を陽極にして、鍍金液の温度30℃、陰極
電流密度17A/dm2、陽極電流密度310A/dm2
鍍金液の流速1.5m/sの条件下で15分間鍍金を
施し、銅管1の内面に、第2図に示すような、粒
状の多孔質層からなる厚さ50μの電着金属層を得
た。 なお、この銅管1の内面を水洗し、乾燥した
後、銅管1を万力で押し潰すテストを行つたが、
電着金属層の剥離、脱落は全く見られず、優れた
密着性と強度を示した。 上記のように製作した銅管について、第3図に
示すような熱特性試験装置により、次の表に示す
ような条件下で熱特性を測定した。 この装置中、Tは温度センサ、Pは圧力計、
PDは差圧計、10はポンプ、11はバルブ、1
2は流量計、13は膨張弁、14はコンプレツ
サ、15はサブコンデンサ、16はサブエバポレ
ータ、17は恒温水槽であり、18が供試管とし
ての銅管である。この熱特性試験装置において
は、供試管18の内部にコンプレツサ14から供
給される冷媒が流され、外部には恒温水槽17か
らの温水が冷媒に対向して流されるようになつて
いる。恒温水の温度は各冷媒流量に対応して、冷
媒系が安定するように制御した。
[Industrial Application Field] The present invention relates to a method for forming a porous layer suitable for forming, for example, a heat transfer surface of an evaporation tube or a condensation tube of an air conditioning heat exchanger, or a heat pipe wick, etc. In particular, the present invention relates to a method of forming a porous layer that is inexpensive to form and can improve heat transfer properties. [Prior Art] In order to increase the heat transfer efficiency of a heat transfer tube for exchanging heat between an internal medium and an external medium, (1) the heat transfer area must be increased; (2) Make nucleate boiling more likely. (3) Facilitate capillary action. (4) Make turbulence more likely. It is said that this is effective. As a method that satisfies (1) and (4), a method is used in which a spiral groove is formed on the inner surface of a copper tube by a rolling method or the like. In addition, as a method to satisfy (2), there is a known method of forming a porous layer on the surface of the heat transfer body, which becomes the core of nucleate boiling. Such a porous layer is formed by a deposition method. [Problems to be Solved by the Invention] However, the above conventional methods have the following problems. In other words, when forming spiral grooves, the nucleate boiling phenomenon, which is the most effective of the above methods for increasing heat transfer efficiency, is not used, and there are also Therefore, due to the limitations on the number of spiral grooves and the angle of twist, the thermal characteristic value is 1.2~1.2 compared to ordinary grooveless pipes.
The increase was only about 1.5 times, and the performance was insufficient.
In addition, during manufacturing, the frictional force between the rolling tool and the inner surface of the tube is large, so a large pressing force is required, which in turn requires large-scale equipment, shortens the life of the tool, and increases production costs. There was a problem. On the other hand, in the method of forming a porous layer, it is difficult to form a porous layer on the inner surface of a tubular structure such as a heat exchanger tube by sintering, brazing, etc. Additionally, it is possible to form a porous layer by applying pattern masking to the metal surface by screen printing, etc., and then electroplating, but it is difficult to form a porous layer on the inner surface of the tube using this method. Moreover, there was a problem in that it required complicated processes such as printing and baking, resulting in high manufacturing costs. [Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention forms an insulating thin film on the surface of a metal base, uses the base as a cathode, and uses a soluble Using an anode,
Electroplating is performed in the anode current density region where anode slime is generated, and dendritic,
It is designed to precipitate granular metal. [Operation] The mechanism by which a porous layer is formed on the surface of the substrate in this method is thought to be as follows. When plating is performed at a high current density using a soluble anode, initial electrodeposition occurs in particularly thin or broken parts of the insulating thin film formed on the surface of the substrate, which is the cathode, and countless plating needle-like nuclei are formed. formed, forming the basis of a porous electrodeposited layer. Next, the anode is melted and a powdered anode metal (slime) is generated on its surface, and this anode slime is carried to the cathode substrate surface with the movement of the plating solution, and the initial stage is growing in the thickness direction. It is taken into the plating needle-like core of the electrodeposited area.
Since this slime has conductivity, further growth of the next deposited metal occurs using this slime as a nucleus, and the flow of the plating solution is accompanied by acicular growth in multiple directions and an intertwined cross-linked structure. Alternatively, a porous layer made of dendritic metal or granular metal can be easily formed depending on conditions such as current density. Although the anode current density varies depending on the type of material of the soluble anode, it is preferably 20 A/dm 2 or more, since sufficient anode slime is not generated at 20 A/dm 2 or less. As the substance constituting the insulating thin film, it is required that a thin film layer can be easily obtained and that the thin film has appropriate insulation properties, that is, appropriate insulation defects, and therefore oil that is difficult to dissolve in the plating solution is preferred. Particularly, when the oil is a lubricating oil used to prevent friction between the tool and the base during drawing, there is an advantage that an insulating thin film can be formed at the same time as the metal base is drawn. The relative movement speed between the substrate and the plating solution is 0.5 to 5.
m/sec is preferable; if it is less than this, the movement of metal ions to the substrate surface will be hindered and only a brittle deposited film will be obtained, and if it is more than this, the energy cost will only increase and no particular effect will be observed. I can't. [Example] Hereinafter, an example in which the method of the present invention is applied to a heat transfer body will be specifically described. Example 1 As shown in Figure 1, the outer diameter is 9.52 mm and the wall thickness is 0.35 mm.
Copper tube 1 is cut to a length of 1000 mm, its inner surface is cleaned by trichlene cleaning, silicone oil is applied through a solution diluted 3 times with ethanol, the ethanol is removed by evaporation, and the inner surface is coated with silicone. An oil film 2 was formed. A copper wire 4 having an outer diameter of 4 mm and having a resin spacer 3 wound therein in a spiral was inserted into the copper tube 1, and tension was applied to both ends to correct the deflection. Then, put copper sulfate plating solution (copper sulfate 200
While circulating sulfuric acid (g/g/, sulfuric acid 50 g/) from the storage tank 5 with the chemical pump 6, the copper tube 1 is used as the cathode,
Wire 4 is used as an anode, plating solution temperature is 30°C, cathode current density is 17A/dm 2 , anode current density is 310A/dm 2 ,
Plating was performed for 15 minutes at a plating solution flow rate of 1.5 m/s to obtain a 50μ thick electrodeposited metal layer consisting of a granular porous layer as shown in Figure 2 on the inner surface of the copper tube 1. Ta. In addition, after washing the inner surface of the copper tube 1 with water and drying it, a test was conducted in which the copper tube 1 was crushed in a vise.
No peeling or falling off of the electrodeposited metal layer was observed, demonstrating excellent adhesion and strength. The thermal characteristics of the copper tubes manufactured as described above were measured using a thermal characteristics testing apparatus as shown in FIG. 3 under the conditions shown in the following table. In this device, T is a temperature sensor, P is a pressure gauge,
PD is a differential pressure gauge, 10 is a pump, 11 is a valve, 1
2 is a flow meter, 13 is an expansion valve, 14 is a compressor, 15 is a sub-condenser, 16 is a sub-evaporator, 17 is a constant temperature water tank, and 18 is a copper tube as a test tube. In this thermal property testing apparatus, a refrigerant supplied from a compressor 14 is flowed inside the test tube 18, and hot water from a constant temperature water tank 17 is flowed outside against the refrigerant. The temperature of the constant temperature water was controlled in accordance with each refrigerant flow rate so that the refrigerant system was stabilized.

【表】 なお、この図中、矢印A,A′は、それぞれ蒸
発試験の場合の冷媒及び水の流れる方向を示し、
矢印B,B′はそれぞれ凝縮試験の場合の冷媒及
び水の流れる方向を示している。 この試験の結果、本発明の方法によつて得られ
た実施例1の銅管1は、その内側の境膜伝熱係数
が第4図にCとして示すような値を示し、同図に
Dとして示した通常の銅管に比べて約10倍の優れ
た熱特性を有することが判つた。 実施例 2 上記実施例1の素材と同一形状の銅管の内面
に、転造により螺旋溝を形成し、その後、実施例
1の同一の前処理及び鍍金を行つて、第5図に示
すような多孔質層を形成した。そして、同様の方
法で伝熱特性の測定を行つた結果、第4図にEと
して示すような優れた熱伝達特性を示した。 実施例 3 上記実施例1と同一の素材につき、同一の前処
理を施し、鍍金条件を、鍍金液の温度30℃、陰極
電流密度27A/dm2、陽極電流密度500A/dm2
鍍金液の移動速度1.5m/sとして10分間鍍金を
施し、第6図のような樹枝状の多孔質層を得た。
前例と同様の方法で伝熱特性を測定し、第4図に
Fとして示すような特性値を得た。 なお、これらの実施例においては、基体として
銅管を用いたが、本発明の実施はこれに限られる
ことなく、銅以外の金属、あるいは平板状部材に
応用してもよい。表面に絶縁性の薄膜を形成しな
くてもよく、また、可溶性陽極として基体と同一
の金属を用いずに異種の金属を多孔質層として電
折させてもよい。また、この発明は伝熱体への実
施に限られるものではない。 [発明の効果] 以上詳述したように、本発明は、金属製の基体
の表面に絶縁性の薄膜を形成した後、該金属製の
基体を陰極とし、可溶性の陽極を用い、陽極スラ
イムが生成される陽極電流密度域において電気鍍
金を行い、上記基体の表面に、樹枝状、粒状の金
属を析出させるようにしたものであるので、細い
管体の内面などにも多孔質層を容易に形成するこ
とができ、従つて、核沸騰を利用した伝熱特性の
良い伝熱体を効率的に製造することができるとと
もに、そのための素材や装置として複雑な、ある
いは大規模なものを必要としないので製造コスト
が安いなどの利点を有する。また、鍍金液の移動
速度や鍍金の条件を変化させることによつて、目
的に合つた種々の形状の多孔質層を形成できる等
の優れた効果を奏する。
[Table] In this figure, arrows A and A' indicate the flow directions of refrigerant and water, respectively, in the case of the evaporation test.
Arrows B and B' indicate the flow directions of refrigerant and water, respectively, in the case of the condensation test. As a result of this test, the copper tube 1 of Example 1 obtained by the method of the present invention showed a film heat transfer coefficient on the inside thereof as shown as C in FIG. It was found that the thermal properties were approximately 10 times better than that of ordinary copper tubes. Example 2 A spiral groove was formed on the inner surface of a copper tube having the same shape as the material in Example 1 by rolling, and then the same pretreatment and plating as in Example 1 were performed to obtain a material as shown in FIG. A porous layer was formed. The heat transfer characteristics were measured using the same method, and as a result, excellent heat transfer characteristics were shown as E in FIG. Example 3 The same material as in Example 1 was subjected to the same pretreatment, and the plating conditions were as follows: plating solution temperature: 30°C, cathode current density: 27A/dm 2 , anode current density: 500A/dm 2 ,
Plating was carried out for 10 minutes at a moving speed of the plating solution of 1.5 m/s to obtain a dendritic porous layer as shown in FIG.
The heat transfer characteristics were measured in the same manner as in the previous example, and the characteristic values shown as F in FIG. 4 were obtained. In these Examples, a copper tube was used as the base, but the present invention is not limited thereto, and may be applied to metals other than copper or flat members. It is not necessary to form an insulating thin film on the surface, and instead of using the same metal as the base as the soluble anode, a different metal may be electrolytically deposited to form a porous layer. Further, the present invention is not limited to implementation on heat transfer bodies. [Effects of the Invention] As detailed above, the present invention forms an insulating thin film on the surface of a metal base, uses the metal base as a cathode, uses a soluble anode, and produces an anode slime. Electroplating is performed in the generated anode current density region to deposit dendritic and granular metal on the surface of the substrate, making it easy to form a porous layer even on the inner surface of a thin tube. Therefore, it is possible to efficiently manufacture a heat transfer body with good heat transfer characteristics using nucleate boiling, and it does not require complicated or large-scale materials or equipment. It has advantages such as low manufacturing cost. Furthermore, by changing the moving speed of the plating solution and the plating conditions, excellent effects such as the ability to form porous layers of various shapes suited to the purpose can be achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の方法の実施例を示す概略図、
第2図は本発明の方法により形成された第1実施
例の多孔質層の表面の形状を示す図面、第3図は
伝熱特性を試験するための装置の概略図、第4図
は本発明の方法を適用して製造された伝熱体の伝
熱特性を示すグラフ、第5図は本発明の第2実施
例の多孔質層の図面、第6図は第3実施例の多孔
質層の図面である。 1……基体、2……絶縁性薄膜、4……可溶性
陽極。
FIG. 1 is a schematic diagram showing an embodiment of the method of the present invention;
FIG. 2 is a diagram showing the surface shape of the porous layer of the first example formed by the method of the present invention, FIG. 3 is a schematic diagram of an apparatus for testing heat transfer characteristics, and FIG. 4 is a diagram of the present invention. A graph showing the heat transfer characteristics of the heat transfer body manufactured by applying the method of the invention, FIG. 5 is a diagram of the porous layer of the second embodiment of the present invention, and FIG. 6 is a diagram of the porous layer of the third embodiment. FIG. 1...Substrate, 2...Insulating thin film, 4...Soluble anode.

Claims (1)

【特許請求の範囲】 1 金属製の基体の表面に絶縁性の薄膜を形成し
た後、該基体を陰極とし、可溶性の陽極を用い、
陽極スライムが生成される陽極電流密度域におい
て電気鍍金を行い、上記基体の表面に、樹枝状あ
るいは粒状の金属を析出させることを特徴とする
多孔質層の形成方法。 2 上記基体が銅製であり、鍍金液が硫酸銅鍍金
液であることを特徴とする特許請求の範囲第1項
記載の多孔質層の形成方法。 3 上記基体が管状であることを特徴とする特許
請求の範囲第2項記載の多孔質層の形成方法。 4 上記基体と鍍金液とを相対的に移動させるこ
とを特徴とする特許請求の範囲第3項記載の多孔
質層の形成方法。 5 上記基体と鍍金液の相対的移動速度が0.5〜
5m/secであることを特徴とする特許請求の範
囲第4項記載の多孔質層の形成方法。 6 陽極電流密度が20A/dm2以上であることを
特徴とする特許請求の範囲第3項記載の多孔質層
の形成方法。
[Claims] 1. After forming an insulating thin film on the surface of a metal substrate, using the substrate as a cathode and a soluble anode,
A method for forming a porous layer, which comprises performing electroplating in an anode current density region where anode slime is generated, and depositing dendritic or granular metal on the surface of the substrate. 2. The method for forming a porous layer according to claim 1, wherein the substrate is made of copper and the plating solution is a copper sulfate plating solution. 3. The method for forming a porous layer according to claim 2, wherein the substrate is tubular. 4. The method of forming a porous layer according to claim 3, characterized in that the substrate and the plating solution are moved relative to each other. 5 The relative movement speed of the above substrate and plating solution is 0.5~
5. The method for forming a porous layer according to claim 4, wherein the rate is 5 m/sec. 6. The method for forming a porous layer according to claim 3, wherein the anode current density is 20 A/dm 2 or more.
JP26681285A 1985-11-27 1985-11-27 Formation of porous layer Granted JPS62127494A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP26681285A JPS62127494A (en) 1985-11-27 1985-11-27 Formation of porous layer
FI864684A FI86475C (en) 1985-11-27 1986-11-18 Heat transfer material and its manufacturing process
US06/934,652 US4780373A (en) 1985-11-27 1986-11-25 Heat-transfer material
DE8686116447T DE3680191D1 (en) 1985-11-27 1986-11-27 HEAT EXCHANGE ELEMENT AND METHOD FOR THE PRODUCTION THEREOF.
EP86116447A EP0226861B1 (en) 1985-11-27 1986-11-27 Heat-transfer material and method of producing same
US07/222,142 US4824530A (en) 1985-11-27 1988-07-21 Method of producing heat-transfer material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26681285A JPS62127494A (en) 1985-11-27 1985-11-27 Formation of porous layer

Publications (2)

Publication Number Publication Date
JPS62127494A JPS62127494A (en) 1987-06-09
JPH0238676B2 true JPH0238676B2 (en) 1990-08-31

Family

ID=17436014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26681285A Granted JPS62127494A (en) 1985-11-27 1985-11-27 Formation of porous layer

Country Status (1)

Country Link
JP (1) JPS62127494A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4018264A (en) * 1975-04-28 1977-04-19 Borg-Warner Corporation Boiling heat transfer surface and method

Also Published As

Publication number Publication date
JPS62127494A (en) 1987-06-09

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