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JPH0241163B2 - - Google Patents
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JPH0241163B2 - - Google Patents

Info

Publication number
JPH0241163B2
JPH0241163B2 JP56173190A JP17319081A JPH0241163B2 JP H0241163 B2 JPH0241163 B2 JP H0241163B2 JP 56173190 A JP56173190 A JP 56173190A JP 17319081 A JP17319081 A JP 17319081A JP H0241163 B2 JPH0241163 B2 JP H0241163B2
Authority
JP
Japan
Prior art keywords
heating table
heating
heated
parallel grooves
conveyance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56173190A
Other languages
Japanese (ja)
Other versions
JPS5875154A (en
Inventor
Isao Saegusa
Masamitsu Takanami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP56173190A priority Critical patent/JPS5875154A/en
Publication of JPS5875154A publication Critical patent/JPS5875154A/en
Publication of JPH0241163B2 publication Critical patent/JPH0241163B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/168Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Solid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】 本発明は加熱装置に関するものであり、とくに
基板(ガラス、金属、半導体など)の上に塗付さ
れた塗膜(フオトレジスト膜、保護膜、介在層、
絶縁層等)の均一な乾燥固化のための加熱装置に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a heating device, and particularly relates to a heating device, and in particular a heating device for heating a coating film (photoresist film, protective film, intervening layer, etc.) applied on a substrate (glass, metal, semiconductor, etc.).
This invention relates to a heating device for uniformly drying and solidifying materials (insulating layers, etc.).

従来上記のような被加熱体を連続工程の一環と
して加熱搬送する装置において、長時間の加熱を
行う必要がある場合には加熱装置は長大なものと
なり、流れ作業におけるその他の加工装置との関
係から無視できない大きなスペースを占拠し、問
題となつて来たものである。また加熱方法として
も上からの加熱のみでは塗膜の表面が先ず固化し
て、塗膜の中部や下層が固化する過程でその中に
気泡が取り残され、そのため膜表面に突起を生じ
たり、塗膜の内部の遅れた収縮により塗膜面に微
細な凹凸を生じたりする。
Conventionally, in the above-mentioned equipment that heats and transports objects to be heated as part of a continuous process, if long-term heating is required, the heating equipment becomes long, and the relationship with other processing equipment in the assembly line work becomes difficult. Since then, it has occupied a large space that cannot be ignored and has become a problem. In addition, if heating is performed only from above, the surface of the paint film will solidify first, and as the middle and lower layers of the paint film solidify, air bubbles will be left behind, causing protrusions on the film surface and Delayed shrinkage inside the film may cause minute irregularities on the coating surface.

本発明は上記のような従来の欠点を改善するも
ので、上記のような塗装された基板を下からの加
熱を重点的に行い上面からの加熱とを併せて塗膜
の均一な乾燥を行うもので、また間歇的な前進と
停止を繰返す搬送機構によつて加熱装置としての
長さを節約し、スペース的に小型でしかも可成り
長時間の加熱が行えるように塗膜内に生ずる気泡
による微細な表面突起の生起を防止することがで
きるものであつて、以下図示の実施例によつて本
発明を具体的に説明する。
The present invention improves the above-mentioned drawbacks of the conventional method, and focuses on heating the coated substrate from below, and in combination with heating from the top, uniformly dries the coating film. In addition, the length of the heating device is saved by a conveying mechanism that advances and stops intermittently, and the heating device is small in terms of space and can be heated for a considerable length of time. The present invention is capable of preventing the occurrence of minute surface protrusions, and the present invention will be specifically explained below using examples shown in the drawings.

第1図は本発明の加熱装置の正面の断面的な説
明図である。また第2図は加熱部の搬送状態を上
面から示した説明図、第3図は加熱台上の搬送の
説明図である。
FIG. 1 is a front sectional explanatory view of the heating device of the present invention. Further, FIG. 2 is an explanatory diagram showing the conveyance state of the heating section from above, and FIG. 3 is an explanatory diagram of the conveyance on the heating table.

加熱台1はヒーター(図示せず)が内蔵されて
おり、上面平滑な長尺型で水平に置かれ上面に始
端から終端まで連なる複数本の平行溝2(第3図
参照)を有する。この平行溝2の中にそれぞれ搬
送レール3が、上下動を伴つて円弧運動で前進後
退するリンク機構4を搬送レール3の両端部に取
付けることにより搬送レール3は加熱台1の上面
に出たり沈んだり、第1図の点線で示すように略
円弧運動を行つて水平を保ちつつ加熱台1上の被
加熱体Aを間歇的に前進、静止の繰返しによつて
先方に搬送するものである。すなわちこのリンク
機構4により搬送レール3が加熱台表面下にある
ときは被加熱体Aは加熱台1上に静止され、リン
ク機構により搬送レール3が加熱台1の上面より
出るときは被加熱体Aは水平を保つたままほぼ円
弧状に前進する搬送レール3の上に移つて搬送さ
れる。この運動が間歇的に繰返されるので被加熱
体Aは加熱台1上で先方に搬送される。
The heating table 1 has a built-in heater (not shown), is of an elongated type with a smooth upper surface, is placed horizontally, and has a plurality of parallel grooves 2 (see FIG. 3) extending from the starting end to the ending end on the upper surface. A transport rail 3 is placed in each of the parallel grooves 2, and a link mechanism 4 is attached to each end of the transport rail 3, which moves forward and backward in an arc while moving up and down. The object A to be heated on the heating table 1 is conveyed to the destination by moving forward and standing still intermittently while keeping the object horizontal by sinking or moving in a substantially circular arc as shown by the dotted line in Fig. 1. . In other words, when the transport rail 3 is below the surface of the heating table 1 by this link mechanism 4, the object to be heated A is held still on the heating table 1, and when the transport rail 3 comes out from the top surface of the heating table 1 by the link mechanism, the object to be heated is stopped. A is moved onto the transport rail 3, which moves forward in a substantially arc shape while remaining horizontal, and is transported. Since this movement is repeated intermittently, the object to be heated A is transported forward on the heating table 1.

被加熱体Aは常に上方から赤外線ヒーター5に
より加熱され、かつ加熱台1上に静置されている
時は加熱台1の上面からも能率よく直接加熱をう
ける。
The object to be heated A is always heated from above by the infrared heater 5, and when it is placed on the heating table 1, it is efficiently heated directly from the upper surface of the heating table 1.

間歇的に加熱台上を被加熱体Aを搬送する運動
はリンク機構4によつて行われる。すなわち搬送
レール3には矢印方向に回転する回転車6、逆T
字型クランク7および支持腕8よりなる一種のリ
ンク機構がとりつけられ、第1図の点線で示した
ように円弧運動により一定距離だけ先方(右方)
に被加熱体Aを進行させるものである。加熱台1
の始端および終端にはコンベアベルト9が接続し
加熱台1上に被加熱体Aを搬入あるいは搬出が行
われる。
The movement of intermittently conveying the heated object A on the heating table is performed by the link mechanism 4. That is, the conveyance rail 3 has a rotary wheel 6 rotating in the direction of the arrow, and an inverted T.
A type of link mechanism consisting of a letter-shaped crank 7 and a support arm 8 is installed, and as shown by the dotted line in Figure 1, it moves forward (to the right) a certain distance by circular motion.
The object to be heated A is moved forward. heating table 1
A conveyor belt 9 is connected to the starting and ending ends of the heating table 1, and the object to be heated A is carried onto or taken out from the heating table 1.

なお加熱時間を調節するには例えばリンク機構
の回転車6を連続的にしたり、間歇的にしたり、
または回転速度を調節する等の方法がある。
In addition, to adjust the heating time, for example, the rotating wheel 6 of the link mechanism may be made continuous or intermittently.
Alternatively, there are methods such as adjusting the rotation speed.

本発明の加熱装置は上述の通りであるので写真
乾板や超精密電子部品等の塗膜の加熱乾燥に通
し、塗膜全体を均一に加熱乾燥して表面平滑な膜
面を得るに優れた性能を示すものである。
Since the heating device of the present invention is as described above, it has excellent performance in heating and drying coating films of photographic plates, ultra-precision electronic parts, etc., and uniformly heating and drying the entire coating film to obtain a smooth surface. This shows that.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の加熱装置の正面の断面的な説
明図、第2図は同じくその加熱台の上面説明図、
第3図は搬送レールの運動の説明図である。 1……加熱台、2……平行溝、3……搬送レー
ル、4……リンク機構、5……赤外線ヒーター、
6……回転車、7……逆T字型クランク、8……
支持腕、9……コンベアベルト、A……被加熱
体。
FIG. 1 is a front sectional explanatory view of the heating device of the present invention, and FIG. 2 is a top explanatory view of the heating table.
FIG. 3 is an explanatory diagram of the movement of the transport rail. 1... Heating table, 2... Parallel groove, 3... Conveyance rail, 4... Link mechanism, 5... Infrared heater,
6...Rotating wheel, 7...Inverted T-shaped crank, 8...
Support arm, 9... Conveyor belt, A... Heated object.

Claims (1)

【特許請求の範囲】 1 上方で下向きに照射する赤外線ヒーターと、
その下に設けた長尺の上面平滑な加熱台よりな
り、 前記加熱台には始端から終端まで連なる複数本
の平行溝を設け、 該平行溝内それぞれに搬送レールを設けるとと
もに、 前記平行溝内で前記搬送レールそれぞれが加熱
台の上面以下にあるときは被加熱体は加熱台上で
残留静置され、前記搬送レールそれぞれが加熱台
面より上昇するときは搬送方向にほぼ円弧状に運
動して被加熱体を一定距離だけ搬送し、次いで加
熱台面より下降して後戻りすることにより被加熱
体を加熱台上に静置するように間歇的に繰返えす
リンク機構を、搬送レールの始端部および終端部
に取付けてなることを特徴とする加熱装置。
[Claims] 1. An infrared heater that irradiates downward from above;
It consists of a long heating table with a smooth upper surface provided under the heating table, and the heating table is provided with a plurality of parallel grooves extending from a starting end to a terminal end, a conveyor rail is provided in each of the parallel grooves, and a conveyor rail is provided in each of the parallel grooves, and When each of the conveyance rails is below the top surface of the heating table, the object to be heated remains stationary on the heating table, and when each of the conveyance rails rises above the surface of the heating table, it moves approximately in an arc in the conveyance direction. A link mechanism is installed at the starting end of the transport rail and intermittently repeats the process of transporting the object a certain distance, then descending from the heating table surface and returning to leave the object still on the heating table. A heating device characterized in that it is attached to the terminal end.
JP56173190A 1981-10-29 1981-10-29 Heater Granted JPS5875154A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56173190A JPS5875154A (en) 1981-10-29 1981-10-29 Heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56173190A JPS5875154A (en) 1981-10-29 1981-10-29 Heater

Publications (2)

Publication Number Publication Date
JPS5875154A JPS5875154A (en) 1983-05-06
JPH0241163B2 true JPH0241163B2 (en) 1990-09-14

Family

ID=15955757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56173190A Granted JPS5875154A (en) 1981-10-29 1981-10-29 Heater

Country Status (1)

Country Link
JP (1) JPS5875154A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59228731A (en) * 1983-06-09 1984-12-22 Toshiba Corp Wafer feeding device
JPS62183521A (en) * 1986-02-07 1987-08-11 Nec Kyushu Ltd Semiconductor device manufacturing equipment
JPS62172150U (en) * 1986-04-02 1987-10-31
JPH0257184U (en) * 1988-10-19 1990-04-25
JP4672538B2 (en) * 2005-12-06 2011-04-20 東京エレクトロン株式会社 Heat treatment device
JP2009052762A (en) * 2007-08-23 2009-03-12 Shimada Phys & Chem Ind Co Ltd Drying equipment
KR102513167B1 (en) 2018-06-15 2023-03-23 매슨 테크놀로지 인크 Method and apparatus for post-exposure bake process of workpiece

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913264U (en) * 1972-05-03 1974-02-04
JPS5432910Y2 (en) * 1974-07-18 1979-10-12
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS54149471A (en) * 1978-05-16 1979-11-22 Nec Corp Object moving unit
JPS5558516U (en) * 1978-10-11 1980-04-21

Also Published As

Publication number Publication date
JPS5875154A (en) 1983-05-06

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