JPH0241591B2 - - Google Patents
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- Publication number
- JPH0241591B2 JPH0241591B2 JP5512082A JP5512082A JPH0241591B2 JP H0241591 B2 JPH0241591 B2 JP H0241591B2 JP 5512082 A JP5512082 A JP 5512082A JP 5512082 A JP5512082 A JP 5512082A JP H0241591 B2 JPH0241591 B2 JP H0241591B2
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- JP
- Japan
- Prior art keywords
- alloy
- layer
- plating
- wire
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000463 material Substances 0.000 claims description 59
- 238000000576 coating method Methods 0.000 claims description 24
- 239000011248 coating agent Substances 0.000 claims description 23
- 229910052709 silver Inorganic materials 0.000 claims description 20
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 17
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000007747 plating Methods 0.000 description 34
- 230000000052 comparative effect Effects 0.000 description 15
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 229910052725 zinc Inorganic materials 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 229910000990 Ni alloy Inorganic materials 0.000 description 4
- 229910007567 Zn-Ni Inorganic materials 0.000 description 4
- 229910007614 Zn—Ni Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- 229910001245 Sb alloy Inorganic materials 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 241000080590 Niso Species 0.000 description 2
- 229910007565 Zn—Cu Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910017944 Ag—Cu Inorganic materials 0.000 description 1
- 229910017980 Ag—Sn Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910007610 Zn—Sn Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- WBTCZEPSIIFINA-MSFWTACDSA-J dipotassium;antimony(3+);(2r,3r)-2,3-dioxidobutanedioate;trihydrate Chemical compound O.O.O.[K+].[K+].[Sb+3].[Sb+3].[O-]C(=O)[C@H]([O-])[C@@H]([O-])C([O-])=O.[O-]C(=O)[C@H]([O-])[C@@H]([O-])C([O-])=O WBTCZEPSIIFINA-MSFWTACDSA-J 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000012761 high-performance material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Lead Frames For Integrated Circuits (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Description
本発明は、耐食性、半田付け性が優れ、これ等
の特性が高温環境に晒されても劣化しない密着性
の優れたAg被覆Cu系材料(以下Ag被覆材料と略
記)と、その製造方法に関するものである。
一般にCu系基材上にAg又はAg合金層を形成し
たAg被覆材料は基材の特性に加えてAg特有の優
れた耐食性と半田付け性を有するため、従来から
種々の用途に用いられている。例えばCu又はCu
合金線条材を基材とし、該基材上に厚さ0.5〜10μ
のAg層を形成したAg被覆材料は、基材の機械的
強度に加えてAgの優れた耐食性と半田付け性を
有する経済的な高性能材料として知られており、
電子部品のリード材や電子機器内の導電体として
広く用いられている。
このようなAg被覆材料を焼鈍処理などの加熱
処理をするか、又は高温状態で使用するなど、大
気中で高温環境に晒すと、大気中の酸素がAg層
内部に活発に浸透して基材表面を酸化し、基材と
Ag層間の密着性を低下して半田付け強度の低下
を招き、電気接続の信頼性を損なうばかりか、基
材がAg層内に拡散してAg被覆材料の外観を損な
うと共に、半田付け性や電気接触抵抗を著しく損
なう欠点があつた。従つて、高温環境に晒される
Ag被覆材料では銀層を厚くしなければならず、
これがAg被覆材料のコストアツプの原因となつ
ている。
このようなAg被覆材料ではAg層内にCu等が拡
散するのを防止するため、基材とAg層間にNi又
はNi合金からなる中間層を設けたものが実用化
されている。Ni又はNi合金層はCu等の拡散バリ
ヤーとして作用し、Cu等がAg層の表面に進出す
るのを抑えるため、Ag層の厚さを薄くしてもAg
被覆材料の表面品質の低下は起らず経済的である
とされている。しかしながら、Ni又はNi合金中
間層は、Cu等の拡散を防止するも、Ag層内部へ
の酸素の進入を防止することができず、Ag層を
通して浸入した酸素によりNi又はNi合金中間層
の表面が酸化し、Ni系中間層とAg層との密着性
を低下する欠点があつた。
本発明はこれに鑑み種々検討の結果、焼鈍処
理、その他の加熱処理又は高温状態での使用のよ
うに、大気中で高温環境に晒されても耐食性、半
田付け性、密着性、電気接触性等を損なうことの
ないAg被覆材料と、その製造方法を開発したも
のである。
即ち、本発明Ag被覆材料はCu系基材上にAg又
はAg合金層を形成したAg被覆材料において、Cu
系基材とAg又はAg合金層間にZn又はZn含有量
が50%以上のZn合金からなる中間層を設けたこ
とを特徴とするものである。
また、本発明Ag被覆材料の製造方法はCu系基
材上にAg又はAg合金層を形成したAg被覆材料
の製造において、Cu系基材にZn又はZn含有量が
50%以上のZn合金を0.01〜3.0μの厚さにメツキし
た後、Ag又はAg合金をメツキすることを特徴と
するものである。
本発明Ag被覆材料はCu又はCu合金或いはCu
又はCu合金を被覆した銅覆鋼材や銅覆Al材を基
材とし、それ等基材上にZn又はZn含有量が50%
以上のZn合金からなる中間層を設け、該中間層
上にAg又はAg合金層を形成したもので中間層に
は純Znの外、Zn含有量が50%以上のZn−Ni、Zn
−Cu、Zn−Sn、Zn−Cd等の合金が用いられ、
Ag又はAg合金層としては純Agの外、Ag−Cu、
Ag−Sb、Ag−Se、Ag−Sn、Ag−In等の合金が
用いられる。しかして中間層の厚さは少なくとも
0.01μ以上、3.0μ以下とすることが望ましく、ま
たAg又はAg合金層の厚さは少なくとも0.1μ以上
とすることが望ましい。
このように本発明Ag被覆材料は中間層にZn又
はZn含有量が50%以上のZn合金を用いたもので、
高温環境に晒されると大気中の酸素がAg又はAg
合金層の内部に拡散浸透してくるが、酸素は中間
層であるZn又はZn合金によつて阻止され、Cu系
基材の酸化が非常に遅くなる。また中間層から
Znの一部が基材とAg又はAg合金層の双方に拡散
し、基材内に拡散したZnは基材構成元素がAg又
はAg合金層へ拡散するのを阻止するため、Ag被
覆材料の外観、耐食性及び半田付け性を損なうこ
とがなく、Ag又はAg合金層内に拡散したZnは、
該層内に均一に分散し、層内への酸素の拡散を著
しく低下させるため、中間層の表面はもとより基
材表面や、その内部も酸化されることがなく、
Ag又はAg合金層の密着性を損なうようなことが
ない。
しかして中間層の厚さを0.01〜3.0μとしたのは
0.01μ未満では上記効果が充分でなく、また3.0μ
を越えてもより大きな効果が期待できず、使用条
件によつては過剰のZnがAg層面に拡散してAgの
外観を損なうようになるため望ましくない。また
中間層を純Zn又はZn含有量が50%以上のZn合金
で形成したのは、Zn含有量が50%未満のZn合金
は上記効果が有効に発揮できず、たとえ発揮でき
たとしても厚い中間層が必要となり、実用上不経
済である。
このような本発明Ag被覆材料は次のようにし
て造られる。即ち、Cu系基材上にクラツド法、
メツキ法等によりZn又はZn合金からなる中間層
と、その上にAg又はAg合金層を形成して造るこ
ともできるが、特に基材を通常の手段により脱
脂、活性化した後、基材上にZn又はZn合金を電
気メツキ又は化学メツキし、その上に連続して
Ag又はAg合金を電気メツキ又は化学メツキする
ことが最適である。
以下、本発明を実施例について説明する。
実施例 1
直径0.6mmの純Cu線を連続的に供給し、これを
巻き取るライン上に下記処理槽を設け、順次通過
させて連続的に処理し、Cu線上に厚さ0.05μのZn
をメツキした後、厚さ1.5μのAgをメツキして本
発明Ag被覆Cu線を製造した。
The present invention relates to an Ag-coated Cu-based material (hereinafter abbreviated as Ag-coated material) that has excellent corrosion resistance and solderability, and has excellent adhesion that does not deteriorate even when exposed to high-temperature environments, and a method for producing the same. It is something. In general, Ag coating materials, which are formed by forming an Ag or Ag alloy layer on a Cu base material, have the characteristics of the base material as well as the excellent corrosion resistance and solderability characteristic of Ag, so they have been used for various purposes. . For example Cu or Cu
An alloy wire material is used as a base material, and a thickness of 0.5 to 10μ is applied to the base material.
The Ag coating material with the Ag layer formed on it is known as an economical, high-performance material that has the excellent corrosion resistance and solderability of Ag in addition to the mechanical strength of the base material.
It is widely used as a lead material for electronic components and as a conductor in electronic devices. When such Ag coating materials are subjected to heat treatment such as annealing treatment or exposed to high temperature environments in the atmosphere, such as when used in high temperature conditions, oxygen in the atmosphere actively penetrates into the Ag layer and damages the base material. Oxidize the surface and bond with the base material.
Not only does this reduce the adhesion between the Ag layers, leading to a decrease in soldering strength, which impairs the reliability of the electrical connection, but the base material also diffuses into the Ag layer, impairing the appearance of the Ag coating material, and reducing solderability. There was a drawback that the electrical contact resistance was significantly impaired. Therefore, exposed to high temperature environment
Ag-coated materials require thicker silver layers;
This is the cause of the cost increase of Ag coating materials. In such Ag coating materials, materials in which an intermediate layer made of Ni or Ni alloy is provided between the base material and the Ag layer have been put into practical use in order to prevent Cu and the like from diffusing into the Ag layer. The Ni or Ni alloy layer acts as a diffusion barrier for Cu, etc., and prevents Cu, etc. from advancing to the surface of the Ag layer.
It is said that the surface quality of the coating material does not deteriorate and is economical. However, although the Ni or Ni alloy intermediate layer prevents the diffusion of Cu, etc., it cannot prevent oxygen from entering into the Ag layer, and oxygen that has penetrated through the Ag layer may cause the surface of the Ni or Ni alloy intermediate layer to had the disadvantage of oxidizing and reducing the adhesion between the Ni-based intermediate layer and the Ag layer. In view of this, as a result of various studies, the present invention has been developed to provide corrosion resistance, solderability, adhesion, and electrical contact properties even when exposed to high-temperature environments in the atmosphere, such as annealing treatment, other heat treatments, or use in high-temperature conditions. We have developed an Ag coating material that does not damage the materials, etc., and a method for manufacturing it. That is, the Ag coating material of the present invention is an Ag coating material in which an Ag or Ag alloy layer is formed on a Cu base material.
The invention is characterized in that an intermediate layer made of Zn or a Zn alloy having a Zn content of 50% or more is provided between the base material and the Ag or Ag alloy layer. In addition, in the method for producing the Ag coating material of the present invention, in the production of the Ag coating material in which an Ag or Ag alloy layer is formed on the Cu base material, Zn or Zn content is added to the Cu base material.
It is characterized by plating 50% or more Zn alloy to a thickness of 0.01 to 3.0μ, and then plating Ag or Ag alloy. The Ag coating material of the present invention is Cu or Cu alloy or Cu
Or, the base material is copper-clad steel material coated with Cu alloy or copper-clad Al material, and Zn or Zn content is 50% on the base material.
An intermediate layer made of the above Zn alloy is provided, and an Ag or Ag alloy layer is formed on the intermediate layer.
-Alloys such as Cu, Zn-Sn, and Zn-Cd are used,
In addition to pure Ag, Ag-Cu,
Alloys such as Ag-Sb, Ag-Se, Ag-Sn, and Ag-In are used. However, the thickness of the intermediate layer is at least
The thickness is preferably 0.01μ or more and 3.0μ or less, and the thickness of the Ag or Ag alloy layer is preferably at least 0.1μ or more. As described above, the Ag coating material of the present invention uses Zn or a Zn alloy with a Zn content of 50% or more in the intermediate layer,
When exposed to high temperature environments, oxygen in the atmosphere changes to Ag or Ag.
Oxygen diffuses into the interior of the alloy layer, but is blocked by the intermediate layer of Zn or Zn alloy, and the oxidation of the Cu-based base material becomes extremely slow. Also from the middle class
Some of the Zn diffuses into both the base material and the Ag or Ag alloy layer, and the Zn diffused into the base material prevents the constituent elements of the base material from diffusing into the Ag or Ag alloy layer. Zn diffused into Ag or Ag alloy layer without impairing appearance, corrosion resistance and solderability.
Because it is uniformly dispersed within the layer and significantly reduces the diffusion of oxygen into the layer, not only the surface of the intermediate layer but also the surface of the base material and its interior are not oxidized.
There is no possibility that the adhesion of Ag or Ag alloy layer will be impaired. However, the reason for setting the thickness of the intermediate layer to 0.01 to 3.0μ is that
If it is less than 0.01μ, the above effect will not be sufficient, and if it is less than 3.0μ
Even if it exceeds this value, no greater effect can be expected, and depending on the conditions of use, excessive Zn may diffuse onto the surface of the Ag layer, impairing the appearance of the Ag, which is not desirable. In addition, the reason why the intermediate layer is made of pure Zn or a Zn alloy with a Zn content of 50% or more is because a Zn alloy with a Zn content of less than 50% cannot effectively exhibit the above effects, and even if it can, it is thick. This requires a middle class, which is uneconomical in practice. Such an Ag-coated material of the present invention is produced as follows. In other words, cladding method on Cu base material,
It can also be made by forming an intermediate layer made of Zn or Zn alloy and an Ag or Ag alloy layer thereon by the plating method, etc., but in particular, after degreasing and activating the base material by normal means, electroplated or chemically plated with Zn or Zn alloy, and then
Electroplating or chemical plating of Ag or Ag alloys is optimal. Hereinafter, the present invention will be described with reference to examples. Example 1 A pure Cu wire with a diameter of 0.6 mm is continuously supplied, and the following treatment tank is installed on the line that winds it up.
After plating, Ag with a thickness of 1.5μ was plated to produce an Ag-coated Cu wire of the present invention.
【表】【table】
【表】
実施例 2
実施例1において(5)のZnメツキ時間を延長し、
Cu線上に厚さ0.5μのZnをメツキした後、厚さ
1.5μのAgをメツキして本発明Ag被覆Cu線を製造
した。
実施例 3
実施例2と同様にして、Cu線上に厚さ1.0μの
Znをメツキした後、厚さ1.5μのAgをメツキして
本発明Ag被覆Cu線を製造した。
実施例 4
実施例1において(5)のZnメツキ槽に代えて、
下記Zn−Ni合金メツキ槽を設け、Cu線上に厚さ
0.1μのZn−Ni合金(Zn含有量約70%)をメツキ
した後、厚さ1.5μのAgをメツキして本発明Ag被
覆Cu線を製造した。
Zn−Ni合金メツキ槽
NiSO4・6H2O 180g/
ZnSO4・7H2O 80g/
H3BO3 30g/
NH4Cl 10g/
浴温 50%
電流密度 1A/dm2
処理時間 55秒
実施例 5
実施例1において(8)のAgメツキ槽に代えて、
下記Ag−Sb合金メツキ槽を設け、Cu線上に厚さ
0.05μのZnをメツキした後、厚さ1.5μのAg−Sb合
金(Sb含有量約2%)をメツキして本発明Ag被
覆Cu線を製造した。
Ag−Sb合金メツキ槽
AgCN 12g/
KCN 40g/
酒石酸アンチモニルカリ 25g/
酒石酸カリウムナトリウム 25g/
電流密度 4A/dm2
処理時間 40秒
比較例 1
実施例1において(5)のZnメツキ槽におけるZn
メツキ時間を短縮し、Cu線上に厚さ0.005μのZn
をメツキした後、厚さ1.5μのAgをメツキして本
発明Ag被覆Cu線を製造した。
比較例 2
実施例1において(5)のZnメツキ槽におけるZn
メツキ時間を延長し、Cu線上に厚さ4.0μのZnを
メツキした後、厚さ1.5μのAgをメツキして本発
明Ag被覆Cu線を製造した。
比較例 3
実施例1において(5)のZnメツキ槽に代えて、
下記Zn−Cu合金メツキ槽を設け、Cu線に厚さ
0.1μのZn−Cu合金(Zn含有量約30%)即ち黄銅
をメツキした後、厚さ1.5μのAgをメツキして本
発明Ag被覆Cu線を製造した。
Zn−Ni合金メツキ槽
CuCN 30g/
Zn(CN)2 10g/
NaCN 50g/
Na2CO3 30g/
浴温 30℃
処理時間 30秒
比較例 4
実施例1において(5)のZnメツキ槽に代えて、
下記の処理槽を設け、Cu線上に厚さ0.5μのNiを
メツキした後、厚さ1.5μのAgをメツキして本発
明Ag被覆Cu線を製造した。
Niメツキ槽 NiSO2 240g/
NiCl2 50g/
H3BO3 30g/
電流時間 5A/dm2
処理時間 30秒
比較例 5
実施例1において(5)のZnメツキ槽を省略し、
Cu線上に直接厚さ1.5μのAgをメツキしてAg被覆
Cu線を製造した。
比較例 6
比較例5において(8)のメツキ時間を2倍にし、
Cu線上に直接厚さ3.0μのAgをメツキしてAg被覆
Cu線を製造した。
これ等のAg被覆Cu線について、ダイオード組
立工程を模してH2気流中、310℃の温度で15分間
加熱し、次いで大気中、250℃の温度で10時間加
熱し、各加熱処理後に270℃の温度に保持した共
晶ハンダ浴中に5秒間デイプして半田付着量を目
視により比較した。また上記両加熱処理後の線に
ついて、ケージ長さ160mmで80回捻回し、Ag被覆
の剥離状態を比較してAg層の密着性を調べた。
これ等の結果を第1表に示す。[Table] Example 2 Extending the Zn plating time in (5) in Example 1,
After plating Zn with a thickness of 0.5μ on the Cu wire, the thickness
The Ag-coated Cu wire of the present invention was manufactured by plating with 1.5 μm of Ag. Example 3 In the same manner as in Example 2, a 1.0μ thick layer was deposited on the Cu wire.
After plating with Zn, it was plated with Ag to a thickness of 1.5 μm to produce an Ag-coated Cu wire of the present invention. Example 4 In place of the Zn plating tank in (5) in Example 1,
The following Zn-Ni alloy plating tank was installed, and the thickness was set on the Cu wire.
After plating a Zn-Ni alloy (Zn content: about 70%) with a thickness of 0.1μ, a layer of Ag with a thickness of 1.5μ was plated to produce an Ag-coated Cu wire of the present invention. Zn-Ni alloy plating bath NiSO 4・6H 2 O 180g / ZnSO 4・7H 2 O 80g / H 3 BO 3 30g / NH 4 Cl 10g / Bath temperature 50% Current density 1A/dm 2 Processing time 55 seconds Example 5 In Example 1, instead of the Ag plating tank (8),
The following Ag-Sb alloy plating bath is installed, and the thickness is set on the Cu wire.
After plating with 0.05μ of Zn, a 1.5μ of thick Ag-Sb alloy (Sb content: about 2%) was plated to produce an Ag-coated Cu wire of the present invention. Ag-Sb alloy plating tank AgCN 12g/ KCN 40g/ Potassium antimonyl tartrate 25g/ Potassium sodium tartrate 25g/ Current density 4A/dm 2 Processing time 40 seconds Comparative example 1 Zn in the Zn plating tank (5) in Example 1
Reduces plating time and creates 0.005μ thick Zn on Cu wire.
After plating, Ag with a thickness of 1.5 μm was plated to produce an Ag-coated Cu wire of the present invention. Comparative Example 2 Zn in the Zn plating tank (5) in Example 1
After extending the plating time and plating Zn to a thickness of 4.0 μm on the Cu wire, the wire was plated with Ag to a thickness of 1.5 μm to produce an Ag-coated Cu wire of the present invention. Comparative Example 3 In place of the Zn plating tank in (5) in Example 1,
The following Zn-Cu alloy plating bath is installed, and the thickness of the Cu wire is
After plating a Zn--Cu alloy (Zn content: about 30%), that is, brass, with a thickness of 0.1μ, a layer of Ag with a thickness of 1.5μ was plated to produce an Ag-coated Cu wire of the present invention. Zn-Ni alloy plating tank CuCN 30g/ Zn(CN) 2 10g/ NaCN 50g/ Na 2 CO 3 30g/ Bath temperature 30°C Processing time 30 seconds Comparative example 4 In place of the Zn plating tank (5) in Example 1 ,
The following treatment tank was provided, and after plating Ni to a thickness of 0.5μ on the Cu wire, Ag was plated to a thickness of 1.5μ to produce an Ag-coated Cu wire of the present invention. Ni plating tank NiSO 2 240g / NiCl 2 50g / H 3 BO 3 30g / Current time 5A/dm 2 Processing time 30 seconds Comparative example 5 In Example 1, the Zn plating tank (5) was omitted,
Ag coating by plating 1.5μ thick Ag directly on Cu wire
Manufactured Cu wire. Comparative Example 6 In Comparative Example 5, the plating time in (8) was doubled,
Ag coating by plating 3.0μ thick Ag directly on Cu wire
Manufactured Cu wire. These Ag-coated Cu wires were heated at a temperature of 310°C for 15 minutes in a H2 stream, simulating the diode assembly process, and then heated at a temperature of 250°C in air for 10 hours, and after each heat treatment The solder coatings were dipped for 5 seconds in a eutectic solder bath maintained at a temperature of .degree. C., and the amount of solder adhesion was visually compared. In addition, the wires after both of the above heat treatments were twisted 80 times with a cage length of 160 mm, and the adhesion of the Ag layer was examined by comparing the peeling state of the Ag coating.
These results are shown in Table 1.
【表】
第1表中H2気流中310℃の温度で15分間加熱は
Siチツプの半田付けに相当し、大気中250℃の温
度で10時間加熱はモールド処理に相当し、それぞ
れダイオード組立時と組立後の半田付けや密着性
を示すもので、第1表から明らかなように、本発
明Ag被覆Cu線は何れもSiチツプの半田付けにお
いて90%以上の半田付け性を示し、ダイオード組
立後の半田付け性とAg被膜の密着性が優れてい
ることが判る。
これに対しZn中間層の厚さを0.005μとした比較
例1及び4.0μとした比較例2、更にZn中間層とし
てZn含有量が30%のZn−Cu合金をメツキした比
較例3のAg被覆Cu線では何れも半田付け性が劣
化しており、特に比較例1及び3のAg被覆Cu線
ではAg被覆の密着性が著しく低下していること
が判る。比較例2ではZn過剰のための黄色への
変色が見られた。
また中間層にNiを用いた比較例4のAg被覆Cu
線では大気中の加熱により、Ni中間層が酸化し、
Ag被膜の密着性が著しく劣化するばかりか、半
田付け性も著しく低下しており、さらに中間層を
用いることなく直接Cu線上にAgを被覆した比較
例5、6においてもCuの酸化によりAg被膜の密
着性及び半田付け性が著しく低下しており、厚さ
3μ程度のAg被覆ではなお不十分であることが判
る。
尚、以上の例は比較的高温の加熱であるが、よ
り低温の加熱では比較例2によるAg被覆Cu線で
もZnがAg層の表面に過剰に拡散することがなく
実用的であり得ることは前記の通りである。また
以上の説明は何れも線材について説明したがこれ
に限るものではなく、板材、条材、型材等につい
ても全く同様の結果が得られるものである。
このように大気中で高温に晒されるAg被覆材
料には少なくとも厚さ5μ以上のAg被覆が必要と
されていたが、本発明によれば、Zn又はZn合金
からなる中間層を設けることにより、薄いAg被
覆ではるかに優れた特性が得られるもので、省
Agの点からも優れており、工業上顕著な効果を
奏するものである。[Table] In Table 1, heating for 15 minutes at a temperature of 310℃ in H2 air flow is
This is equivalent to soldering a Si chip, and heating in the atmosphere at a temperature of 250°C for 10 hours is equivalent to molding.It indicates the soldering and adhesion properties during and after assembly of the diode, respectively, which is clear from Table 1. As can be seen, all of the Ag-coated Cu wires of the present invention exhibit a solderability of 90% or more when soldering Si chips, and it can be seen that the solderability after diode assembly and the adhesion of the Ag film are excellent. On the other hand, Comparative Example 1 in which the thickness of the Zn intermediate layer was 0.005 μm, Comparative Example 2 in which the thickness was 4.0 μm, and Comparative Example 3 in which the Zn intermediate layer was plated with a Zn-Cu alloy with a Zn content of 30%. It can be seen that the solderability of all the coated Cu wires is deteriorated, and in particular, the adhesion of the Ag coating is significantly lowered for the Ag coated Cu wires of Comparative Examples 1 and 3. In Comparative Example 2, discoloration to yellow due to excess Zn was observed. In addition, Ag-coated Cu of Comparative Example 4 using Ni in the intermediate layer
In the wire, the Ni intermediate layer is oxidized by heating in the atmosphere,
Not only did the adhesion of the Ag film deteriorate significantly, but the solderability also deteriorated significantly, and even in Comparative Examples 5 and 6, in which Ag was directly coated on the Cu wire without using an intermediate layer, the Ag film was damaged due to oxidation of Cu. The adhesion and solderability of the
It can be seen that the Ag coating of about 3μ is still insufficient. Although the above example involves heating at a relatively high temperature, it is possible that even the Ag-coated Cu wire according to Comparative Example 2 can be practical at lower heating temperatures because Zn does not diffuse excessively to the surface of the Ag layer. As mentioned above. Further, although the above explanations have been made regarding wire rods, the present invention is not limited to this, and the same results can be obtained with plate materials, strip materials, mold materials, etc. Thus, Ag coating materials exposed to high temperatures in the atmosphere required an Ag coating with a thickness of at least 5μ, but according to the present invention, by providing an intermediate layer made of Zn or Zn alloy, Much better properties can be obtained with a thin Ag coating, which saves money.
It is also superior in terms of Ag and has remarkable industrial effects.
Claims (1)
Ag被覆材料において、Cu系基材とAg又はAg合
金層間にZn又はZn含有量が50%以上のZn合金か
らなる中間層を設けたことを特徴とするAg被覆
Cu系材料。 2 中間層の厚さを0.01〜3.0μとする特許請求の
範囲第1項記載のAg被覆Cu系材料。 3 Cu系基材上にAg又はAg合金層を形成した
Ag被覆材料の製造において、Cu系基材上にZn又
はZn含有量が50%以上のZn合金を0.01〜3.0μの厚
さにメツキした後、Ag又はAg合金をメツキする
ことを特徴とするAg被覆Cu系材料の製造方法。[Claims] 1. Ag or Ag alloy layer formed on a Cu base material
In the Ag coating material, an intermediate layer made of Zn or a Zn alloy with a Zn content of 50% or more is provided between the Cu base material and the Ag or Ag alloy layer.
Cu-based material. 2. The Ag-coated Cu-based material according to claim 1, wherein the intermediate layer has a thickness of 0.01 to 3.0μ. 3 Ag or Ag alloy layer formed on Cu base material
In the production of Ag-coated materials, Zn or a Zn alloy with a Zn content of 50% or more is plated on a Cu base material to a thickness of 0.01 to 3.0μ, and then Ag or an Ag alloy is plated. A method for producing Ag-coated Cu-based materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5512082A JPS58181888A (en) | 1982-04-02 | 1982-04-02 | Silver coating material and preparation thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5512082A JPS58181888A (en) | 1982-04-02 | 1982-04-02 | Silver coating material and preparation thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58181888A JPS58181888A (en) | 1983-10-24 |
| JPH0241591B2 true JPH0241591B2 (en) | 1990-09-18 |
Family
ID=12989891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5512082A Granted JPS58181888A (en) | 1982-04-02 | 1982-04-02 | Silver coating material and preparation thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58181888A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000062341A1 (en) * | 1999-04-08 | 2000-10-19 | Shinko Electric Industries Co., Ltd. | Lead frame for semiconductor device |
| CN115210409A (en) * | 2020-03-09 | 2022-10-18 | 同和金属技术有限公司 | Silver-plated material and method for producing same |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS601853A (en) * | 1983-06-17 | 1985-01-08 | Hitachi Cable Ltd | Leadframe for semiconductor |
| JPS60201651A (en) * | 1984-03-26 | 1985-10-12 | Hitachi Cable Ltd | Lead frame for semiconductor |
| JP2009079250A (en) * | 2007-09-26 | 2009-04-16 | Dowa Metaltech Kk | Copper or copper alloy member having silver alloy layer formed as outermost surface layer, and manufacturing method therefor |
| JP5879093B2 (en) * | 2011-10-26 | 2016-03-08 | 株式会社フジクラ | Connector manufacturing method and silver plating method |
| JP5767662B2 (en) * | 2013-02-24 | 2015-08-19 | 古河電気工業株式会社 | TERMINAL MATERIAL, ITS MANUFACTURING METHOD AND TERMINAL MANUFACTURING METHOD |
-
1982
- 1982-04-02 JP JP5512082A patent/JPS58181888A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000062341A1 (en) * | 1999-04-08 | 2000-10-19 | Shinko Electric Industries Co., Ltd. | Lead frame for semiconductor device |
| CN115210409A (en) * | 2020-03-09 | 2022-10-18 | 同和金属技术有限公司 | Silver-plated material and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58181888A (en) | 1983-10-24 |
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