Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0243718B2 - - Google Patents
[go: Go Back, main page]

JPH0243718B2 - - Google Patents

Info

Publication number
JPH0243718B2
JPH0243718B2 JP57171212A JP17121282A JPH0243718B2 JP H0243718 B2 JPH0243718 B2 JP H0243718B2 JP 57171212 A JP57171212 A JP 57171212A JP 17121282 A JP17121282 A JP 17121282A JP H0243718 B2 JPH0243718 B2 JP H0243718B2
Authority
JP
Japan
Prior art keywords
crucible
melt
crystal
partition wall
thermal convection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57171212A
Other languages
Japanese (ja)
Other versions
JPS5964590A (en
Inventor
Akira Oosawa
Koichiro Pponda
Ritsuo Takizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17121282A priority Critical patent/JPS5964590A/en
Publication of JPS5964590A publication Critical patent/JPS5964590A/en
Publication of JPH0243718B2 publication Critical patent/JPH0243718B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/30Mechanisms for rotating or moving either the melt or the crystal
    • C30B15/305Stirring of the melt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【発明の詳細な説明】 (a) 発明の技術分野 本発明は融液の熱対流を抑制できる結晶成長用
坩堝の構造に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field of the Invention The present invention relates to a structure of a crucible for crystal growth that can suppress thermal convection of a melt.

(b) 技術の背景 現在の半導体集積回路はシリコン(Si)のよう
な単体半導体或はガリウム砒素(GaAs)、イン
ジウム燐(InP)などの化合物半導体単結晶より
切り出した結晶基板(ウエハ)を用いて形成され
ている。
(b) Background of technology Current semiconductor integrated circuits use crystal substrates (wafers) cut from single crystal semiconductors such as silicon (Si) or compound semiconductors such as gallium arsenide (GaAs) and indium phosphide (InP). It is formed by

こゝで単結晶の成長方法には引上げ法(略称
CZ法)と浮遊帯域法(略称FZ法)の2つの方法
があるが大口径の大型結晶の成長にはCZが適し
ている。
Here, the method of growing single crystals is the pulling method (abbreviated as
There are two methods: the CZ method) and the floating zone method (abbreviated as the FZ method), but CZ is suitable for growing large crystals with large diameters.

本発明はCZ法による結晶育成に用いられる坩
堝の構造に関するものである。
The present invention relates to the structure of a crucible used for crystal growth by the CZ method.

(c) 従来技術と問題点 単結晶の成長に用いられる坩堝は溶融させる材
料により白金(Pt)、石英(SiO2)、窒化硼素
(BN)など各種の材料からなるものが使い分け
られている。
(c) Conventional technology and problems Crucibles used to grow single crystals are made of various materials, such as platinum (Pt), quartz (SiO 2 ), and boron nitride (BN), depending on the material to be melted.

本発明は融液の対流を抑制する効果のある坩堝
の構造に関するものであり、以下現在最も大口径
の結晶の引上げを行つており、熱対流の影響が大
きいSiを例として説明する。
The present invention relates to a structure of a crucible that is effective in suppressing convection of melt, and will be explained below using Si as an example, which is currently used to pull crystals with the largest diameter and is greatly affected by thermal convection.

Si単結晶育成用坩堝としては石英製のものが用
いられており、また窒化硅素(Si3N4)を更にこ
の内張りとしたものもあり、これを用いて直径4
〔インチ〕或は5〔インチ〕長さ1〔m〕程度のも
のが引上げ法により製作されている。
A crucible made of quartz is used as a crucible for growing Si single crystals, and there is also one that is further lined with silicon nitride (Si 3 N 4 ), which is used to grow crucibles with a diameter of 4
[inch] or 5 [inch] lengths of about 1 [m] are manufactured by the pulling method.

第1図はかゝる石英製の坩堝1を用いてSi単結
晶の引上げを行う坩堝周辺部の状態図である。上
記のように巨大な単結晶を育成させるには直径約
300〔mm〕、厚さ約5〔mm〕の坩堝の中に約20〔Kg〕
の高純度Si多結晶を充填し、アルゴン(Ar)な
どの不活性雰囲気中で坩堝1を囲んで設けられて
いるカーボンヒータ2に通電しSi多結晶を加熱溶
解して融液3とする。
FIG. 1 is a diagram showing the state around the crucible in which a Si single crystal is pulled using such a crucible 1 made of quartz. To grow a huge single crystal as shown above, the diameter is approximately
Approximately 20 [Kg] in a crucible of 300 [mm] and thickness of approximately 5 [mm]
The crucible is filled with high-purity Si polycrystals, and a carbon heater 2 provided surrounding the crucible 1 is energized in an inert atmosphere such as argon (Ar) to heat and melt the Si polycrystals to form a melt 3.

次に引上げ軸に固定されている種結晶4を融液
3に浸漬するが、この際種結晶4の先端が僅かに
融解する状態の温度に融液3は維持されており、
平衡状態を保ち乍ら融液3の温度を徐々に降下さ
せて必要とする直径にまで結晶5を太らせると共
に引上げ軸を徐々に引上げることにより直胴形の
単結晶5の育成が行われる。
Next, the seed crystal 4 fixed to the pulling shaft is immersed in the melt 3, but at this time, the melt 3 is maintained at a temperature such that the tip of the seed crystal 4 is slightly melted.
While maintaining an equilibrium state, the temperature of the melt 3 is gradually lowered to thicken the crystal 5 to the required diameter, and the pulling shaft is gradually pulled up to grow a straight-shaped single crystal 5. .

こゝでSiは融点が1410〔℃〕であるため坩堝底
部の融液3の温度はそれよりも数10〔℃〕高く、
また坩堝1の径および深さが大きいため坩堝1の
底部より内壁に沿つて矢印6で示す熱対流が生じ
ている。
Here, since the melting point of Si is 1410 [℃], the temperature of the melt 3 at the bottom of the crucible is several tens of degrees [℃] higher than that.
Further, since the diameter and depth of crucible 1 are large, thermal convection as shown by arrow 6 occurs from the bottom of crucible 1 along the inner wall.

然しこの熱対流は定常的なものでなく乱流を伴
つているために熱の揺ぎが大きく、そのため結晶
5の成長方向に沿つて不純物の濃度分布が異る成
長縞を生ずる。そこでこれを解決する方法として
引上げ軸と坩堝1をそれぞれ反対方向に低速回転
させることにより横方向の強制流を作り、これに
より熱対流を抑制する方法がとられているが大直
径Si単結晶引上げの場合は流量が多いために充分
な効果が顕われていない。
However, since this thermal convection is not steady but accompanied by turbulence, the heat fluctuates greatly, resulting in growth stripes with different impurity concentration distributions along the growth direction of the crystal 5. To solve this problem, the pulling shaft and crucible 1 are rotated at low speeds in opposite directions to create a lateral forced flow, thereby suppressing thermal convection. In the case of , the sufficient effect is not realized because the flow rate is large.

(d) 発明の目的 本発明は熱対流を抑制して高品質な単結晶を得
ることが可能な坩堝の構造を提供することを目的
とする。
(d) Purpose of the Invention The purpose of the present invention is to provide a crucible structure capable of suppressing thermal convection and obtaining a high-quality single crystal.

(e) 発明の構成 本発明の目的は坩堝の内側に円筒状で上下の外
縁部に複数の突起部をもち、融液中で浮上する隔
壁を備えてなることを特徴とする結晶成長用坩堝
の使用により達成することができる。
(e) Structure of the Invention The object of the present invention is to provide a crucible for crystal growth, characterized in that the inside of the crucible is cylindrical, has a plurality of protrusions on the upper and lower outer edges, and has partition walls that float in the melt. This can be achieved by using

(f) 発明の実施例 第2図は熱対流を抑制するための本発明一実施
例に係る隔壁が融液の液位に応じて上下に移動可
能とした構造を有する坩堝の側面図A、上面図
B、そして隔壁の斜視図Cである。
(f) Embodiment of the Invention FIG. 2 is a side view A of a crucible having a structure in which a partition wall according to an embodiment of the present invention for suppressing thermal convection is movable up and down depending on the liquid level of the melt. They are a top view B and a perspective view C of the partition wall.

本発明は熱対流が坩堝内の融液の表面と底部と
の温度差により坩堝の側壁に沿つて生じることに
着目し側壁に沿つて隔壁を設けるものである。
The present invention focuses on the fact that thermal convection occurs along the side walls of the crucible due to the temperature difference between the surface and bottom of the melt in the crucible, and provides partition walls along the side walls.

すなわち第2図において本実施例に係る隔壁1
7は坩堝11と同心円状をなし、その内径は結晶
成長用を行う場合に障害とならぬよう充分大きく
とつてありまた隔壁17の深さは約30〔mm〕と坩
堝11の深さに対し充分に浅くとつてある。こゝ
で隔壁17は坩堝11と同質材料のものからなり
この実施例の場合は坩堝と同じ石英(SiO2)製
である。この隔壁17の条件は融液13と反応し
たり侵されたりしないこと以外に比重が融液13
より小さく浮上することが必要である。
That is, in FIG. 2, the partition wall 1 according to this embodiment
7 forms a concentric circle with the crucible 11, and its inner diameter is set to be sufficiently large so as not to become an obstacle during crystal growth. It is sufficiently shallow. The partition wall 17 is made of the same material as the crucible 11, and in this embodiment is made of quartz (SiO 2 ), the same as the crucible. The conditions for this partition wall 17 are that it does not react with or be eroded by the melt 13, and that the specific gravity is lower than that of the melt 13.
It is necessary to float smaller.

本実施例の場合、Siの比重は2.33、一方SiO2
比重は2.20であつて、隔壁17は常に融液13上
に浮遊している。次にこの隔壁17の周縁には上
下に複数個(本実施例では4個)の突起部18,
18′があり浮遊する隔壁17のストツパ乃至位
置決めの役をしている。そして特に隔壁17下部
の突起部18′を設けることで隔壁17が左右に
上下運動をするのを抑制することが可能となる。
In the case of this embodiment, the specific gravity of Si is 2.33, while the specific gravity of SiO 2 is 2.20, and the partition walls 17 are always floating on the melt 13. Next, on the periphery of the partition wall 17, a plurality of (four in this embodiment) protrusions 18 are provided on the upper and lower sides.
18' serves as a stopper or positioning of the floating partition wall 17. Particularly, by providing the protrusion 18' at the lower part of the partition wall 17, it is possible to suppress the partition wall 17 from moving up and down in the left and right directions.

育成される結晶は4〔インチ〕或は5〔インチ〕
径で坩堝11の中央即ち隔壁17に囲まれた領域
の中央から引き上げられるが、この結晶育成中に
装置の覗き窓を通じて結晶が成長するメニスカス
ラインを観測する必要があり、この際隔壁17の
存在が視野を妨げるものであつてはならない。
The crystal size to be grown is 4 [inches] or 5 [inches].
The diameter of the crystal is pulled up from the center of the crucible 11, that is, the center of the area surrounded by the partition wall 17. During this crystal growth, it is necessary to observe the meniscus line where the crystal grows through the viewing window of the device, and in this case, the presence of the partition wall 17 must be observed. must not obstruct the view.

具体的な実施例を挙げれば径12〔インチ〕高さ
約250〔mm〕の直胴形坩堝を用いて4〔インチ〕或
5〔インチ〕のSi単結晶を引上げる場合、隔壁1
7の突起部18,18′の幅Wとして50〔mm〕以下
にとればよい。
To give a specific example, when pulling a Si single crystal of 4 [inches] or 5 [inches] using a straight body crucible with a diameter of 12 [inches] and a height of about 250 [mm], the partition wall 1
The width W of the projections 18, 18' of No. 7 may be set to 50 [mm] or less.

また隔壁17の厚さは坩堝の厚さの半分程度で
よく本実施例の場合は約3〔mm〕である。
Further, the thickness of the partition wall 17 may be about half the thickness of the crucible, and in this embodiment, it is about 3 mm.

かゝる隔壁17を用いる場合、単結晶の育成が
進むに従つて液位が低下し遂には隔壁17が坩堝
11に着底し、熱対流阻止の効果が無くなるよう
に思われるが、液位に比例して熱対流の影響は無
くなるので着底しても支障はない。かかる本実施
例では隔壁17が着脱可能であるため、坩堝11
及び隔壁17の洗浄を容易に行えるという利点が
ある。
When such a partition wall 17 is used, as the growth of the single crystal progresses, the liquid level decreases and the partition wall 17 finally bottoms out in the crucible 11, and it seems that the effect of preventing thermal convection is lost. Since the influence of thermal convection disappears in proportion to , there is no problem even if it hits the bottom. In this embodiment, since the partition wall 17 is removable, the crucible 11
Another advantage is that the partition wall 17 can be easily cleaned.

(g) 発明の効果 本発明の実施により成長縞のない単結晶の成長
が可能となり結晶の品質を向上することができ
た。
(g) Effects of the Invention By carrying out the present invention, it was possible to grow a single crystal without growth striations, and the quality of the crystal could be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は結晶の育成を説明する断面図、第2図
A,Bは本発明の実施例にかかる坩堝の構造を示
す断面図及び平面図であり、また第2図Cは本発
明にかかる仕切板の構成を示す外観斜視図、であ
る。 図において1,11は坩堝、2はカーボンヒー
タ、3,13は融液、5は結晶、17は隔壁、1
8,18′は突起部。
FIG. 1 is a cross-sectional view for explaining crystal growth, FIGS. 2A and B are cross-sectional views and plan views showing the structure of a crucible according to an embodiment of the present invention, and FIG. 2 C is a cross-sectional view for explaining the crystal growth. FIG. 3 is an external perspective view showing the configuration of a partition plate. In the figure, 1 and 11 are crucibles, 2 is a carbon heater, 3 and 13 are melts, 5 is crystals, 17 is a partition wall, 1
8 and 18' are protrusions.

Claims (1)

【特許請求の範囲】 1 結晶成長用の融液を保持し、該融液に種結晶
を浸漬し、徐々に引き上げて結晶成長を行うのに
使用する坩堝が、 該坩堝の内側に円筒状で上下の外縁部に複数の
突起部をもち、融液中で浮上する融壁を備えてな
ることを特徴とする結晶成長用坩堝。
[Claims] 1. A crucible that holds a melt for crystal growth and is used to immerse a seed crystal in the melt and gradually pull it up to grow the crystal. A crucible for crystal growth characterized by having a plurality of protrusions on the upper and lower outer edges and a melt wall that floats in the melt.
JP17121282A 1982-09-30 1982-09-30 Crucible for crystal growth Granted JPS5964590A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17121282A JPS5964590A (en) 1982-09-30 1982-09-30 Crucible for crystal growth

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17121282A JPS5964590A (en) 1982-09-30 1982-09-30 Crucible for crystal growth

Publications (2)

Publication Number Publication Date
JPS5964590A JPS5964590A (en) 1984-04-12
JPH0243718B2 true JPH0243718B2 (en) 1990-10-01

Family

ID=15919110

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17121282A Granted JPS5964590A (en) 1982-09-30 1982-09-30 Crucible for crystal growth

Country Status (1)

Country Link
JP (1) JPS5964590A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0925192A (en) * 1995-07-07 1997-01-28 Nec Corp Crucible for growing single crystal and method for growing single crystal

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5891097A (en) * 1981-11-24 1983-05-30 Hitachi Ltd Producing device for single crystal

Also Published As

Publication number Publication date
JPS5964590A (en) 1984-04-12

Similar Documents

Publication Publication Date Title
US4329195A (en) Lateral pulling growth of crystal ribbons
US4874458A (en) Single crystal growing method having improved melt control
EP0261498A2 (en) Crystal pulling apparatus
US4322263A (en) Method for horizontal ribbon crystal growth
US5064497A (en) Crystal growth method and apparatus
US5114528A (en) Edge-defined contact heater apparatus and method for floating zone crystal growth
US4944925A (en) Apparatus for producing single crystals
JPH0139998B2 (en)
US4957712A (en) Apparatus for manufacturing single silicon crystal
EP0104741A1 (en) Process for growing crystalline material
JPH0243718B2 (en)
JP2690419B2 (en) Single crystal growing method and apparatus
JPS598695A (en) Crystal growth apparatus
JPS6236096A (en) Production of single crystal and device therefor
JPH0680493A (en) Method for crystal growth and crucible for use therefor
JPH0733303B2 (en) Crystal growth equipment
JP2814796B2 (en) Method and apparatus for producing single crystal
JPS5812228B2 (en) Crystal growth equipment and crystal growth method
US4217167A (en) Method of growing large low defect, monocrystals of BeO
JPS5964589A (en) Method for growing crystal
JP3042168B2 (en) Single crystal manufacturing equipment
JPS60195082A (en) Apparatus for producing semiconductor crystal
JP2717685B2 (en) Method and apparatus for crystal growth by Czochralski method
JPS59111994A (en) How to grow crystals
JPS60122791A (en) Pulling up method of crystal under liquid sealing