JPH0245708B2 - - Google Patents
Info
- Publication number
- JPH0245708B2 JPH0245708B2 JP58016253A JP1625383A JPH0245708B2 JP H0245708 B2 JPH0245708 B2 JP H0245708B2 JP 58016253 A JP58016253 A JP 58016253A JP 1625383 A JP1625383 A JP 1625383A JP H0245708 B2 JPH0245708 B2 JP H0245708B2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- precious metal
- lead
- plating
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
Landscapes
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】
本発明は貴金属メツキ部を有する所望形態の金
属製品を製造する方法に係り、特にリード先端部
に貴金属メツキ部を施したリードフレームの製造
に好適な方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a metal product having a desired shape having a precious metal plated portion, and particularly relates to a method suitable for manufacturing a lead frame having a precious metal plated portion at the lead end. .
従来、半導体集積回路(IC)素子のパツケー
ジングには第1図に例示されるようなリードフレ
ーム1が用いられている。このリードフレーム1
は、IC素子を搭載する中央部のアイランド部2
とその周辺の、IC素子上の電極とコネクター線
で接続される複数の外部リード3とを多数連続的
に形成したもので、アイランド部2及び外部リー
ド3のアイランド側先端部に金、銀等の貴金属メ
ツキが施されている(但し、アイランド部2には
貴金属メツキを施さない場合もある)。従来この
ようなリードフレーム1は、鉄、鉄合金、銅、銅
合金の薄板または条材を素材とし、この素材にフ
オトエツチングまたはプレス打抜き加工を施して
不要部分をくり抜いた後、少なくともリード先端
を露出するようなマスクを用いてメツキ処理(こ
れを部分メツキと呼ぶ)を行なうことにより製造
している。近年、IC素子の集積度が向上するの
に伴つてリード数の多いリードフレームが必要に
なり、リードの厚さ及び幅は一層薄く且つ細いも
のになつてきている。そのような繊細なリードを
有するリードフレームに部分メツキを施そうとす
れば、ハンドリングの機会が増え、どうしてもリ
ード曲り等の不良を発生させ易い。また、上記の
ような部分メツキ法によれば第2図に示すよう
に、貴金属はリード3上面4のみならず側面5に
もメツキされるが、この側面5のメツキは本来全
く不必要であり、貴金属を浪費していることにな
る。 Conventionally, a lead frame 1 as illustrated in FIG. 1 has been used for packaging semiconductor integrated circuit (IC) elements. This lead frame 1
is the island part 2 in the center where the IC element is mounted.
A large number of external leads 3 connected to the electrodes on the IC element and the connector wires are continuously formed around the island part 2 and the tips of the external leads 3 on the island side. (However, the island portion 2 may not be plated with precious metal.) Conventionally, such a lead frame 1 is made of a thin plate or strip of iron, iron alloy, copper, or copper alloy, and after photo etching or press punching is performed on this material to cut out unnecessary parts, at least the lead tips are cut out. It is manufactured by performing a plating process (this is called partial plating) using a mask that exposes the surface. In recent years, as the degree of integration of IC devices has improved, lead frames with a large number of leads have become necessary, and the thickness and width of the leads have become thinner and narrower. If partial plating is attempted on a lead frame having such delicate leads, the chances of handling will increase and defects such as lead bending will inevitably occur. Furthermore, according to the above-described partial plating method, as shown in FIG. 2, the precious metal is plated not only on the top surface 4 of the lead 3 but also on the side surface 5, but this plating on the side surface 5 is originally completely unnecessary. , you are wasting precious metals.
本発明の目的は上記従来法の欠点を解消し、必
要な部分にのみ貴金属メツキを施したリードフレ
ームのような繊細な金属製品を歩留り良く製造し
得る方法を提供することにある。この目的を達成
するため本発明は、鉄、鉄合金、銅、銅合金を素
材とする薄板または条材にフオトレジストを塗布
し、貴金属メツキを施すべき部分をフオトレジス
トの露光、現像により露出させ、この露出部分に
貴金属をメツキし、更に上記フオトレジストに所
望のパターンを露光、現像して素材の金属面の一
部を露光せしめ、フオトレジストをマスクとして
エツチングを行なつた後、残留フオトレジストを
剥離することを特徴とする。 SUMMARY OF THE INVENTION An object of the present invention is to provide a method that eliminates the drawbacks of the conventional methods described above and can manufacture delicate metal products such as lead frames with a high yield in which precious metal plating is applied only to necessary parts. In order to achieve this object, the present invention applies photoresist to a thin plate or strip made of iron, iron alloy, copper, or copper alloy, and exposes the area to be plated with precious metal by exposing and developing the photoresist. This exposed area is plated with precious metal, and a desired pattern is exposed and developed on the photoresist to expose a part of the metal surface of the material. After etching is performed using the photoresist as a mask, the remaining photoresist is removed. It is characterized by peeling off.
以下本発明をリードフレームを製造する場合に
ついて説明する。 The present invention will be described below with reference to the case of manufacturing a lead frame.
第3図は本発明法によりリード先端の上面部分
にのみ貴金属メツキが施こされたリードフレーム
の製造工程を下記の(A)〜(F)の各工程毎に概念的に
示した断面図である。 Figure 3 is a cross-sectional view conceptually showing each of the following steps (A) to (F) in the manufacturing process of a lead frame in which precious metal plating is applied only to the top surface of the lead tip using the method of the present invention. be.
(A) 鉄、鉄合金、銅、銅合金の素材6の全面にフ
オトレジスト7を塗布する。塗布厚さは数ミク
ロン程度で良い。フオトレジストにはネガ型と
ポジ型とがあるが、露光マスクとの組合せを適
当にすれば何れの方法を用いても差し支えな
い。ここではポジ型フオトレジストを使用する
場合について述べる。(A) Photoresist 7 is applied to the entire surface of material 6 made of iron, iron alloy, copper, or copper alloy. The coating thickness may be approximately several microns. There are two types of photoresists: negative type and positive type, and either method may be used as long as it is properly combined with an exposure mask. Here, we will discuss the case of using a positive photoresist.
(B) リード先端の貴金属メツキを施すべき部分8
のみが露光され、他の部分は露光されないよう
にしたパターンのフオトマスクを用いて露光
し、感光したフオトレジスト部分を溶剤で除去
し(これを現像という)、リード先端の貴金属
メツキを施すべき部分8の素材6を露出せしめ
る。(B) Part 8 of the lead tip where precious metal plating should be applied
Using a photomask with a pattern in which only the lead tip is exposed and other parts are not exposed, the exposed photoresist part is removed with a solvent (this is called development), and the part 8 of the lead tip to be plated with precious metal is removed. The material 6 is exposed.
(C) この素材をメツキ装置に供し、素材6の露出
部分に貴金属9を電着せしめる。貴金属メツキ
の前に下地メツキしてもよい。メツキ装置は素
材形状によりバツチ式、連続式の何れを用いて
もよい。(C) This material is subjected to a plating device, and the noble metal 9 is electrodeposited on the exposed portion of the material 6. Base plating may be applied before precious metal plating. The plating device may be either a batch type or a continuous type depending on the shape of the material.
(D) 次にリードフレームパターンのフオトマスク
を用いて両面露光し、現像してリード間および
リードとアイランド間10の素材を露出せしめ
る。((B)及び(D)工程の露光位置合せは大切であ
るが、この位置合せは通常の手段で行なうこと
ができる。)
(E) これをエツチングに供すれば素材6は両面の
露出部10から順次内部に向かつて食刻され、
終りには両面の食刻穴が貫通するに至る。塩化
第二鉄をエツチング溶液として用いると、鉄
系、銅系何れの素材にも適用できる。(D) Next, both sides are exposed using a photomask with a lead frame pattern, and developed to expose the material 10 between the leads and between the leads and the islands. (Exposure alignment in steps (B) and (D) is important, but this alignment can be done by normal means.) (E) If this is subjected to etching, the material 6 will have exposed areas on both sides. Starting from 10, it is etched towards the inside in order,
At the end, the etched holes on both sides pass through. When ferric chloride is used as an etching solution, it can be applied to both iron-based and copper-based materials.
(F) 残留する未感光フオトレジストを剥離すれ
ば、第4図に示すようなリード3の先端上面に
のみ貴金属メツキ部9を有するリードフレーム
11が得られる。(F) By peeling off the remaining unexposed photoresist, a lead frame 11 having noble metal plated portions 9 only on the top surfaces of the tips of the leads 3 as shown in FIG. 4 is obtained.
メツキする貴金属が銀である場合、上記(E)のエ
ツチング工程でエツチング液により表面が酸化さ
れるので、酸化被膜を除去する工程(E)工程または
(F)工程の後に入れればよい。銀の酸化皮膜は希硝
酸その他の化学研磨液で容易に除去することがで
きる。 If the precious metal to be plated is silver, the surface will be oxidized by the etching solution in the above etching step (E), so the step (E) to remove the oxide film or
(F) It can be added after the process. The silver oxide film can be easily removed with dilute nitric acid or other chemical polishing liquid.
また、上記(E)のエツチング工程において、貴金
属メツキ層はマスクとして作用するが、メツキ層
とフオトレジストが密着していないと境界にエツ
チング液が浸入し、メツキ層周囲に食刻による窪
みができることがある。これを防止するには(E)工
程の直前にフオトレジストのベーキング処理を行
なうとよい。例えば150℃で30分程度熱処理する。
そのようにすればメツキ層とその周囲のレジスト
が充分密着する。 In addition, in the etching process (E) above, the noble metal plating layer acts as a mask, but if the plating layer and photoresist are not in close contact, the etching solution will penetrate into the boundary, creating a depression around the plating layer due to etching. There is. To prevent this, it is recommended to perform a baking process on the photoresist immediately before the step (E). For example, heat treatment at 150°C for about 30 minutes.
In this way, the plating layer and the resist around it will be in close contact with each other.
本発明によれば、貴金属メツキは素材が薄板ま
たは条材の状態で施され、不要部分のくり抜きは
最終工程で行なわれることになるので、貴金属の
無駄がなく、リード曲りの発生頻度を大幅に低減
させることができ、特に貴金属メツキ部を有する
微細な金属製品の製造コスト抵下に大いに寄与す
ることができる。 According to the present invention, precious metal plating is performed on the material in the form of a thin plate or strip, and unnecessary parts are cut out in the final process, so precious metal is not wasted and the frequency of lead bending is greatly reduced. In particular, it can greatly contribute to lowering the manufacturing cost of fine metal products having precious metal plated parts.
第1図はリード先端に貴金属メツキした従来の
ICリードフレームを示す平面図、第2図は上記
リードフレーム先端部の拡大斜視図、第3図は本
発明の方法による素材の変化を工程ごとの素材の
断面で示した概略図、第4図は本発明によりリー
ド先端上面にのみスポツト的に貴金属メツキが施
こされたリードフレームの平面図である。
3……リード;6……素材;9……貴金属メツ
キ部。
Figure 1 shows a conventional lead with precious metal plating at the tip.
FIG. 2 is an enlarged perspective view of the tip of the lead frame; FIG. 3 is a schematic diagram showing changes in the material according to the method of the present invention in cross-section of the material at each step; FIG. 4 FIG. 1 is a plan view of a lead frame in which precious metal plating is applied in spots only to the top surface of the lead tips according to the present invention. 3...Lead; 6...Material; 9...Precious metal plating part.
Claims (1)
たは条材にフオトレジストを塗布し、貴金属メツ
キを施すべき部分をフオトレジストの露光、現像
により露出させ、この露出部分に貴金属をメツキ
し、さらに上記フオトレジストに所望のパターン
を露光、現像して素材の金属面の一部を露出せし
め、フオトレジストをマスクとしてエツチングを
行なつた後、残留フオトレジストを剥離すること
を特徴とする貴金属メツキ部を有する金属製品の
製造法。1 Apply photoresist to a thin plate or strip made of iron, iron alloy, copper, or copper alloy, expose the area to be plated with precious metal by exposing and developing the photoresist, and plate this exposed area with precious metal. , further comprising exposing and developing a desired pattern on the photoresist to expose a part of the metal surface of the material, etching using the photoresist as a mask, and then peeling off the remaining photoresist. A method for manufacturing metal products with plating parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58016253A JPS59143071A (en) | 1983-02-04 | 1983-02-04 | Production of metallic product having noble metal-plated part |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58016253A JPS59143071A (en) | 1983-02-04 | 1983-02-04 | Production of metallic product having noble metal-plated part |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59143071A JPS59143071A (en) | 1984-08-16 |
| JPH0245708B2 true JPH0245708B2 (en) | 1990-10-11 |
Family
ID=11911394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58016253A Granted JPS59143071A (en) | 1983-02-04 | 1983-02-04 | Production of metallic product having noble metal-plated part |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59143071A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5448653A (en) * | 1977-09-27 | 1979-04-17 | Toshiba Corp | Etching of metal plate |
-
1983
- 1983-02-04 JP JP58016253A patent/JPS59143071A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59143071A (en) | 1984-08-16 |
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