JPH0251249B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for producing a liquid phase epitaxial growth solution used in liquid phase epitaxial growth.

BACKGROUND ART Liquid phase epitaxial growth is widely used in the production of compound semiconductor devices such as semiconductor lasers, but when growing a crystal, a predetermined amount of the necessary material must be weighed. If this weighing operation is performed every time the crystal is grown, it will be quite time-consuming, so recently, as shown in Japanese Patent Application Laid-Open No. 59-89411, a device like the one shown in Fig. Material solutions are being manufactured. In FIG. 5, 11 is a solution storage jig, 12 is a solution storage recess, 1
3 is an auxiliary solution storage jig, 14 is an auxiliary solution storage part,
15 is a solution reservoir, 16 is a solution, 17 is a slide rod for an auxiliary solution storage jig, and 18 is a slide rod for a solution reservoir. To explain the manufacturing method here, first, as shown in FIG. be done. Subsequently, as shown in FIG. 5b, by sliding the solution reservoir 15 on the auxiliary solution storage jig 13 using the solution reservoir slide rod 18, a portion of the solution 16 is distributed into the auxiliary solution storage section 14.
Furthermore, the auxiliary solution storage jig 13 is slid by the auxiliary solution storage jig slide rod 17 so that the auxiliary solution storage section 14 is positioned above the solution storage recess 12, and the distributed solution is moved into the solution storage recess 12. (Figure 5c). After this, the auxiliary solution storage jig 13 is installed in the auxiliary solution storage part 1 as shown in FIG. 5a.
4 is slid to be positioned above and outside the solution storage recess 12, and by repeating the above steps, the remainder of the solution 16 is distributed into the solution storage recess 12 via the auxiliary solution storage 14.

Problems to be Solved by the Invention In the above method, the composition of the solution 16 cannot be made completely uniform when it is melted and mixed at a temperature higher than the saturation temperature. Separate the solution storage recesses 1 so that they are uniform.
However, as mentioned above, three sliding steps are required to distribute a portion of the solution 16 into the solution storage recess 12, and this sliding step must be repeated many times. First, there was a drawback that increasing the amount of solution 16 would further increase the number of slide steps. The present invention solves the above-mentioned drawbacks, improves workability by reducing the number of sliding steps, and enables a large number of solutions to be distributed with a uniform composition, thereby achieving liquid phase epitaxial growth with a uniform composition. It is an object of the present invention to provide a method for producing a material solution for liquid phase epitaxial growth provided with a layer.

Means for Solving the Problems The present invention provides a solution storage jig having a plurality of solution storage recesses, a slider having a plurality of through holes corresponding to the solution storage recesses, and a slider having a plurality of solution storage recesses and a slider located on the slider. Using an auxiliary solution reservoir having a plurality of through holes at the bottom corresponding to the through holes of the slider and a solution reservoir located above the auxiliary solution reservoir, the solution in the solution reservoir is transferred to the auxiliary solution reservoir, and then the solution in the auxiliary solution reservoir is transferred to the auxiliary solution reservoir. The above object is achieved by simultaneously distributing the solution to the solution storage recess in the solution storage jig through the lower through-hole of the solution reservoir and the through-hole of the slider.

Effects The present invention uses the above-described structure to move the solution dissolved and mixed in the solution reservoir to the auxiliary solution reservoir, thereby improving the positional compositional non-uniformity that exists at the top and bottom of the solution when the solution is in the solution reservoir. Furthermore, by simultaneously distributing the solutions to the solution storage recesses through the through-holes of the slider, it is possible to eliminate variations in composition among the individual solutions distributed.

EXAMPLES The present invention will be described in detail below with reference to the drawings. FIG. 1 is a sectional view of a manufacturing jig used in a manufacturing method according to an embodiment of the present invention. In the figure 2
1 is a solution storage jig, 22 is a solution storage recess, 23 is a slider, 24 is an auxiliary solution reservoir, 25 is a solution reservoir, 26 is a solution, 27 is a slide rod for the slider, and 28 is a slide rod for the solution reservoir. The solution storage jig 21 has a removable bottom portion in order to take out the solution dispensed into the solution storage recess 22. The slider 23 has a through hole 29 corresponding to the upper opening 30 of the solution storage recess 22, and is positioned so that the through hole is outside the upper opening 30 in the initial state of the manufacturing process, which will be explained later. I'll keep it. The auxiliary solution reservoir 24 is located on the slider 23, and has through holes 29 at positions corresponding to the upper openings 30 of the solution storage recesses 22 with the slider 23 sandwiched between them. Also, in the upper part, there is a through hole 29 for moving the solution 26 in the solution reservoir 25.
have. Solution reservoir 25 is auxiliary solution reservoir 24
An auxiliary solution reservoir 24 located at the top and a solution 26 at the bottom.
In the initial state of the manufacturing process, the through hole 29 is positioned outside the upper through hole 29 of the auxiliary solution reservoir 24. In order to dissolve and mix the solution 26 as uniformly as possible and to prevent positional non-uniformity of composition, the solution reservoir 25 is shaped so that its dimensions in the horizontal and height directions do not differ significantly. The bottom is tapered to allow the solution to flow down into the auxiliary solution reservoir 24. The auxiliary solution reservoir 24 is large in the horizontal direction and small in the height direction.
Make the volume so that all of 6 will flow down and it will be almost full.

Generally, the solution is kept at a temperature higher than the saturation temperature in the solution reservoir 25 for a certain period of time to dissolve and mix, but the solution is not completely uniformly dissolved, and the composition is particularly non-uniform between the upper and lower parts. If the solution is distributed sequentially from the lower through-hole of the solution reservoir 25, there will be variations in composition between the solutions distributed at the beginning and at the end. Therefore, liquid phase epitaxially grown layers obtained using these solutions also have compositional variations and problems. In this embodiment, such a problem is solved by once draining the solution in the solution reservoir into the auxiliary solution reservoir 24. That is, as mentioned above, by pouring the solution into the auxiliary solution reservoir 24, which is large in the horizontal direction and small in the height direction, the solution is spread uniformly, and if this state is maintained for an appropriate period of time, the liquid that exists when it is in the solution reservoir is It is possible to eliminate the positional non-uniformity of the composition. Further, as described later, in this state, the solution is transferred to the slider 23.
By simultaneously distributing the solution into the solution storage recess 22 through the through hole 29 of the slider 23 by the movement of the slider 23, the distributed individual solutions are free from variations during distribution and each solution has a uniform composition. Next, to explain the manufacturing process, first, a predetermined amount of the necessary semiconductor material is placed in the solution reservoir 25, and then heated to a temperature above the saturation temperature for a certain period of time based on the positional relationship of each jig as shown in Figure 1. Dissolve and mix to obtain solution 16.

Next, as shown in FIG.
1 to the upper through-hole 29 of the auxiliary solution reservoir 24, and the solution 26 is poured into the auxiliary solution reservoir 24. At this time, the solution 26 spreads uniformly in the horizontal direction as described above, and remains there for a certain period of time (which may be shorter than the certain period of time in the solution reservoir).
By maintaining the positional composition, non-uniformity is eliminated. Next, as shown in FIG. 3, the slider 23 is slid using the slider slide rod 27 so that each through hole 29 of the slider 23 corresponds to the lower through hole 31 of the auxiliary solution reservoir 24, and the solution is removed. 26 is simultaneously distributed into the solution storage 22 to form a solution 26'. After the solution 26' has cooled to room temperature, it is taken out by removing the bottom of the solution storage jig 21, as shown in FIG. Through the above process, it can be used as a semiconductor material in solution.
Quaternary mixed crystal using In, InP, InAs, and GaAs
As a result of producing an InGaAsP growth solution and investigating the composition between the liquid-phase epitaxial growth layers, a uniform composition was obtained. Also, the time required to keep the solution constant by pouring it into the auxiliary solution reservoir is
Approximately 20 minutes is sufficient, and the sliding process only needs to be performed twice, which is much easier than the conventional method.

Effects of the Invention As explained above, the present invention eliminates the positional uniformity of the composition of the solution by pouring the solution in the solution reservoir into an auxiliary solution reservoir having a large horizontal dimension and spreading it uniformly. By simultaneously distributing the solution from the auxiliary solution reservoir to the solution storage recess, there is no compositional variation between the distributed solutions, and therefore no compositional variation is observed between the liquid phase epitaxial growth layers grown using the solution. , and its usefulness is great because the manufacturing method is simple.

[Brief explanation of the drawing]

1 to 4 are cross-sectional process diagrams showing the manufacturing process of a liquid phase epitaxial growth solution according to an embodiment of the present invention, and FIG. 5 shows a manufacturing process of a conventional liquid phase epitaxial growth solution. It is a cross-sectional process diagram. 11, 21... Solution storage jig, 12, 22...
Solution storage recess, 13... Auxiliary solution storage jig, 14
... Auxiliary solution storage section, 23 ... Slider, 24
...Auxiliary solution reservoir, 15,25...Solution reservoir, 1
6, 26...Solution, 17...Sliding rod for auxiliary solution storage jig, 27...Sliding rod for slider,
18, 28... Slide rod for solution reservoir.

Claims (1)

[Claims] 1. A solution storage jig having a plurality of solution storage recesses, a slider located on the solution storage jig and having a plurality of through holes corresponding to the solution storage recesses, and a slider located on the slider and having a plurality of through holes corresponding to the solution storage recesses. An auxiliary solution reservoir having a plurality of through holes at its lower part corresponding to the solution storage recess and the through holes of the slider, and a solution reservoir located above the auxiliary solution reservoir, and a solution reservoir for liquid phase epitaxial growth in the solution reservoir. After the materials to be used are prepared, dissolved and mixed to form a solution, the solution is transferred to an auxiliary solution reservoir, and then the solution is stored in the solution storage jig through the lower through-hole of the auxiliary solution reservoir and the through-hole of the slider. 1. A method for producing a solution for liquid phase epitaxial growth, which comprises distributing the solution into a recess to produce a solution for liquid phase epitaxial growth.