JPH0256544B2 - - Google Patents
Info
- Publication number
- JPH0256544B2 JPH0256544B2 JP59166107A JP16610784A JPH0256544B2 JP H0256544 B2 JPH0256544 B2 JP H0256544B2 JP 59166107 A JP59166107 A JP 59166107A JP 16610784 A JP16610784 A JP 16610784A JP H0256544 B2 JPH0256544 B2 JP H0256544B2
- Authority
- JP
- Japan
- Prior art keywords
- valve
- vacuum processing
- valve body
- hole
- gate valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
- F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K5/00—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary
- F16K5/04—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary with plugs having cylindrical surfaces; Packings therefor
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Taps Or Cocks (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は仕切弁に係り、特に複数の真空処理室
間の気密を確保するための仕切弁に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a gate valve, and particularly to a gate valve for ensuring airtightness between a plurality of vacuum processing chambers.
第5図は従来の真空処理装置を示したもので、
入口側ロードロツク室1と出口側ロードロツク室
2との間に複数の真空処理室3,3…が設けられ
ており、各ロードロツク室1,2と真空処理室3
との間にはゲート弁4が、各真空処理室3の間に
は仕切弁5がそれぞれ介設されて各室を仕切つて
いる。
Figure 5 shows a conventional vacuum processing device.
A plurality of vacuum processing chambers 3, 3, .
A gate valve 4 is interposed between the vacuum processing chambers 3 and a gate valve 5 is interposed between the vacuum processing chambers 3 to partition each chamber.
このような真空処理装置においては、被処理物
を入口側ロードロツク室1に挿入して大気圧から
真空排気した後、ゲート弁4を開いて被処理物を
真空処理室3に順次送り、各真空処理室3におい
てスパツタリング、エツチングあるいは熱処理等
種々の真空処理が行なわれる。 In such a vacuum processing apparatus, the workpiece is inserted into the inlet-side load lock chamber 1 and evacuated from atmospheric pressure, and then the gate valve 4 is opened to send the workpiece to the vacuum processing chamber 3 one after another. Various vacuum treatments such as sputtering, etching, and heat treatment are performed in the treatment chamber 3.
そして、真空処理が終了した被処理物は、ゲー
ト弁4を通つて出口側ロードロツク室2に送ら
れ、ゲート弁4を閉じて出口側ロードロツク室2
を大気圧に戻した後取出される。 After the vacuum processing has been completed, the workpiece is sent to the outlet side load lock chamber 2 through the gate valve 4, and the gate valve 4 is closed and the workpiece is sent to the outlet side load lock chamber 2 through the gate valve 4.
is removed after returning it to atmospheric pressure.
第6図はこのような真空処理装置に適用される
ゲート弁4を示したもので、ケーシング6の対向
する側面には、被処理物を通すための開口7,7
が設けられ、ケーシング6の内部には、上記各開
口7,7を開閉する2つの弁体8,8が配置され
ており、各弁体8,8の間にリンク機構9および
スプリング10が介設されている。この弁体8は
ケーシング6の外部に設けられたエアシリンダ1
1のシヤフト12により上下動自在とされてお
り、弁体8が上昇したときに弁体8,8がスプリ
ング9の力に抗して離れ、開口7,7を閉塞する
ようになされている。 FIG. 6 shows a gate valve 4 applied to such a vacuum processing apparatus. Opposite sides of the casing 6 have openings 7, 7 for passing the object to be processed.
Two valve bodies 8, 8 for opening and closing the respective openings 7, 7 are arranged inside the casing 6, and a link mechanism 9 and a spring 10 are interposed between each valve body 8, 8. It is set up. This valve body 8 is connected to an air cylinder 1 provided outside the casing 6.
It is made vertically movable by the shaft 12 of 1, and when the valve body 8 is raised, the valve bodies 8, 8 are separated against the force of a spring 9, and the openings 7, 7 are closed.
従来は、このようなゲート弁4が仕切弁5とし
ても用いられており、ゲート弁4は大気と真空と
の気密を保つ必要上、強度あるいは気密性が重要
となり、構造が複雑かつ大型化してしまうため、
真空間の気密を保つ仕切弁の構造の簡素化、小型
化が望まれていた。 Conventionally, such a gate valve 4 has also been used as a gate valve 5, and since the gate valve 4 needs to maintain airtightness between the atmosphere and vacuum, strength or airtightness is important, and the structure has become complicated and large. To put it away,
It has been desired to simplify and downsize the structure of the gate valve that maintains the airtightness between the vacuum chambers.
本発明は上記した点に鑑みてなされたもので、
構造が簡単でありかつ小型化を図ることができ、
しかも、隣接する前記真空処理室間のガスの流通
を遮断し、かつ、万一弁座等に損傷がある場合に
おいても前記ガスの流通を遮断できる仕切弁を提
供することを目的とするものである。
The present invention has been made in view of the above points, and
It has a simple structure and can be made smaller.
Moreover, it is an object of the present invention to provide a gate valve that can shut off the flow of gas between adjacent vacuum processing chambers, and can also shut off the flow of gas even if the valve seat or the like is damaged. be.
上記目的を達成するため本発明に係る仕切弁
は、複数の真空処理室を仕切る仕切弁において、
仕切壁と仕切壁に形成された真直な円孔の一部に
よつて構成された弁座と、この弁座内に組込まれ
た直径方向に貫通し、かつ軸方向の開口長さが前
記真空処理室のほぼ上下方向の高さの全域にわた
る弁孔が設けられた円柱状の弁体とを有し、さら
に前記弁体の中心には軸線方向に沿つて上下に貫
通して外部と連通する連通孔が設けられたことを
その特徴とするものである。
In order to achieve the above object, the gate valve according to the present invention is a gate valve that partitions a plurality of vacuum processing chambers.
A valve seat configured by a partition wall and a part of a straight circular hole formed in the partition wall, and a valve seat built into the valve seat that penetrates in the diametrical direction and whose opening length in the axial direction is A cylindrical valve body is provided with a valve hole that covers almost the entire height of the processing chamber in the vertical direction, and further, the valve body has a cylindrical valve body provided with a valve hole that extends vertically through the center of the valve body and communicates with the outside. The feature is that a communicating hole is provided.
以下、本発明の実施例を第1図乃至第4図を参
照して説明する。
Embodiments of the present invention will be described below with reference to FIGS. 1 to 4.
本実施例においては、各真空処理室3,3の間
に円柱状の弁体13が、真空処理室3を貫通して
設けられており、この弁体13には直径方向に貫
通して被処理物を通す長方形状の弁孔14が設け
らるとともに、円心軸上を貫通して上記弁孔14
と外部とを連通する連通口15,15が設けられ
ている。この弁体13の直径方向対向位置の外周
面には、弁体13に回転自在に密接する弁座をそ
の一部として備えている仕切壁16が設けられて
いる。 In this embodiment, a cylindrical valve body 13 is provided between the vacuum processing chambers 3, 3, passing through the vacuum processing chamber 3, and passing through the valve body 13 in the diametrical direction. A rectangular valve hole 14 is provided through which the processed material passes, and the valve hole 14 passes through the center axis of the circle.
Communication ports 15, 15 are provided for communicating between the inside and the outside. A partition wall 16 is provided on the outer circumferential surface of the valve body 13 at a position opposite to the valve body 13 in the diametrical direction, and the partition wall 16 includes a valve seat as a part of which rotatably comes into close contact with the valve body 13 .
本実施例の場合、真空処理室3の内部で被処理
物の真空処理を行なうときは、第1図および第3
図に示すように、弁体13の弁孔14が仕切壁1
6により閉塞されるように弁体13を回転する。
このとき、連通孔15から図示しない真空排気装
置により弁孔14の内部を真空排気する。したが
つて、各真空処理室3,3から弁体13と仕切壁
16との間を通つて弁孔14の内部に侵入する不
活性ガス等が排気されてしまい、各真空処理室
3,3間を行き交うことを防止することができ
る。また、連通孔15から図示しないガス導入装
置により、各真空処理室3,3に漏れても影響の
ない例えばArガス等を導入しておくようにして
も、内部ガスの侵入を防止することができる。 In the case of this embodiment, when vacuum processing the workpiece inside the vacuum processing chamber 3, the
As shown in the figure, the valve hole 14 of the valve body 13 is connected to the partition wall 1.
6, the valve body 13 is rotated so that it is closed.
At this time, the inside of the valve hole 14 is evacuated from the communication hole 15 by a vacuum evacuation device (not shown). Therefore, inert gas etc. that enter the inside of the valve hole 14 through between the valve body 13 and the partition wall 16 are exhausted from each vacuum processing chamber 3, 3. It is possible to prevent them from going back and forth between the two. Further, even if a gas introduction device (not shown) is introduced from the communication hole 15 into each vacuum processing chamber 3, 3, for example, Ar gas, which has no effect even if it leaks, it is possible to prevent the internal gas from entering. can.
そして、1つの真空処理行程が終了したら、弁
体13を第2図および第4図に示すように90゜回
転させて、弁孔14を各真空処理室3,3に連通
させるようになされ、図示しない搬送装置により
被処理物を弁孔14から別の真空処理室に送るよ
うになされる。 When one vacuum processing process is completed, the valve body 13 is rotated 90 degrees as shown in FIGS. 2 and 4, so that the valve hole 14 communicates with each vacuum processing chamber 3, The object to be processed is transported from the valve hole 14 to another vacuum processing chamber by a transport device (not shown).
このような弁体13の回転動作は、エアシリン
ダの往復動によりリンクを介して行なつてもよい
し、モータ等の回転駆動源により行なつてもよ
い。 Such rotational operation of the valve body 13 may be performed via a link by reciprocating the air cylinder, or may be performed by a rotational drive source such as a motor.
したがつて、本実施例においては、簡単な構造
で小型化を図り気密性を高めることが可能とな
る。 Therefore, in this embodiment, it is possible to reduce the size and improve airtightness with a simple structure.
以上述べたように本発明に係る仕切弁は、直径
方向に貫通する弁孔を有する円柱状の弁体と、こ
の弁体の周面に密接して上記弁体を回転自在に支
持する弁座とを有し、上記弁体の回転により弁の
開閉を行い、上記弁体に連通孔を設けて構成した
ので、連通孔から真空排気あるいはガス導入を行
なうことにより各真空処理室間の気密性を保持
し、万一仕切弁のシール部に損傷がある時も、真
空処理室間のガスの流通を遮断することができ
る。この場合において、弁孔に処理に影響しない
ガスを置換加圧することにより、処理に影響せ
ず、各処理室の遮断を維持できる。また、本願発
明の弁孔は前記弁体の軸線方向の開口長さをほぼ
管路の上下方向一杯に設けることができるので、
仕切弁自体を大きくすることなく弁孔を大きく設
けることが可能となり、被処理物の通過を容易に
することができる。また、構造が簡単なので装置
の小型を図ることができ、経済性も高く、かつ、
信頼性も向上する等の効果を奏する。
As described above, the gate valve according to the present invention includes a cylindrical valve body having a diametrically penetrating valve hole, and a valve seat that rotatably supports the valve body in close contact with the circumferential surface of the valve body. The valve is opened and closed by rotating the valve body, and the valve body is provided with a communication hole, so that airtightness between each vacuum processing chamber can be maintained by evacuation or gas introduction through the communication hole. Even if the sealing part of the gate valve is damaged, gas flow between the vacuum processing chambers can be shut off. In this case, by replacing and pressurizing the valve hole with a gas that does not affect the processing, it is possible to maintain the isolation of each processing chamber without affecting the processing. In addition, since the valve hole of the present invention can be provided with an opening length in the axial direction of the valve body that is approximately the full length in the vertical direction of the pipe line,
It becomes possible to provide a large valve hole without enlarging the gate valve itself, and it is possible to facilitate passage of the object to be processed. In addition, since the structure is simple, the device can be made smaller, and is highly economical.
This has effects such as improved reliability.
第1図乃至第4図はそれぞれ本発明の一実施例
を示したもので、第1図および第3図は弁の閉状
態を示すそれぞれ平面断面図および正面断面図、
第2図および第4図は弁の開状態を示すそれぞれ
平面断面図および正面断面図、第5図は従来の真
空処理装置を示す概略構成図、第6図は従来のゲ
ート弁を示す縦断面図である。
1,2……ロードロツク室、3……真空処理
室、4……ゲート弁、5……仕切弁、6……ケー
シング、7……開口、8,13……弁体、9……
スプリング、10……リンク機構、11……エア
シリンダ、12……シヤフト、14……弁孔、1
5……連通孔、16……仕切壁。
1 to 4 each show an embodiment of the present invention, and FIGS. 1 and 3 are a plan sectional view and a front sectional view, respectively, showing the valve in a closed state;
Figures 2 and 4 are a plan sectional view and a front sectional view, respectively, showing the open state of the valve, Figure 5 is a schematic configuration diagram showing a conventional vacuum processing apparatus, and Figure 6 is a vertical cross-section showing a conventional gate valve. It is a diagram. 1, 2... Load lock chamber, 3... Vacuum processing chamber, 4... Gate valve, 5... Gate valve, 6... Casing, 7... Opening, 8, 13... Valve body, 9...
Spring, 10...Link mechanism, 11...Air cylinder, 12...Shaft, 14...Valve hole, 1
5...Communication hole, 16...Partition wall.
Claims (1)
と、この仕切壁に形成され真直な円孔の一部によ
つて構成された弁座と、この弁座内に組込まれ直
径方向に貫通し、かつ、軸方向の開口長さが上記
真空処理室のほぼ上下の高さの全域にわたる弁孔
が設けられた円柱状の弁体とを有し、さらに前記
弁体の中心には軸線方向に沿つて上下に貫通して
外部と連通する連通孔が設けられたことを特徴と
する仕切弁。1. A partition wall that partitions two adjacent vacuum processing chambers, a valve seat formed in this partition wall and constituted by a part of a straight circular hole, and a valve seat that is built into this valve seat and penetrates in the diametrical direction, and a cylindrical valve body provided with a valve hole whose opening length in the axial direction extends over the entire vertical height of the vacuum processing chamber; A gate valve characterized by being provided with a communication hole that passes through the top and bottom of the valve and communicates with the outside.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16610784A JPS6145175A (en) | 1984-08-08 | 1984-08-08 | Partition valve |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16610784A JPS6145175A (en) | 1984-08-08 | 1984-08-08 | Partition valve |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6145175A JPS6145175A (en) | 1986-03-05 |
| JPH0256544B2 true JPH0256544B2 (en) | 1990-11-30 |
Family
ID=15825145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16610784A Granted JPS6145175A (en) | 1984-08-08 | 1984-08-08 | Partition valve |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6145175A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS571184Y2 (en) * | 1978-01-25 | 1982-01-08 |
-
1984
- 1984-08-08 JP JP16610784A patent/JPS6145175A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6145175A (en) | 1986-03-05 |
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