JPH0312145B2 - - Google Patents
Info
- Publication number
- JPH0312145B2 JPH0312145B2 JP16720783A JP16720783A JPH0312145B2 JP H0312145 B2 JPH0312145 B2 JP H0312145B2 JP 16720783 A JP16720783 A JP 16720783A JP 16720783 A JP16720783 A JP 16720783A JP H0312145 B2 JPH0312145 B2 JP H0312145B2
- Authority
- JP
- Japan
- Prior art keywords
- stainless steel
- copper plating
- firing
- copper
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010949 copper Substances 0.000 claims description 49
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 47
- 229910052802 copper Inorganic materials 0.000 claims description 47
- 238000007747 plating Methods 0.000 claims description 41
- 229910001220 stainless steel Inorganic materials 0.000 claims description 32
- 239000010935 stainless steel Substances 0.000 claims description 31
- 238000010304 firing Methods 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 13
- 230000001590 oxidative effect Effects 0.000 claims description 4
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 238000001556 precipitation Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 210000004905 finger nail Anatomy 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1813—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by radiant energy
- C23C18/1817—Heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1827—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
- C23C18/1831—Use of metal, e.g. activation, sensitisation with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Description
本発明はステンレス鋼への銅メツキ方法に関す
る。
従来より家庭用品をはじめとして種々の工業的
製品に銅メツキが施されれているが、軟鋼その他
の鉄合金を素材とした製品では、長期使用によつ
て銅メツキが摩耗すると錆が発生するという問題
があるため、ステンレス鋼を素材とすることが試
みられている。しかし、ステンレス鋼に直接電解
銅メツキあるいは化学銅メツキできないため実用
化されていないのが現状である。他方、耐衝撃性
に劣るガラス製魔法瓶に代り、近年、ステンレス
鋼を材料とする金属製魔法瓶が実用に供されるよ
うになつてきている。ステンレス鋼は、耐食性に
優れ、機構的強度も強く、熱伝導率も小さいとい
う利点があるが、熱輻射率が著しく大きいため、
ガラス製魔法瓶と同様に、ステンレス鋼製魔法瓶
の真空空間を包囲する内外瓶の壁面に銀鏡を形成
させ輻射による熱移動を減少させることが、例え
ば、特公昭57−22571号公報および特開昭57−
75621号公報にて提案され、また、後者にはニツ
ケルメツキを介して銅メツキすることが開示され
ている。銀鏡層を形成したステンレス鋼製魔法瓶
は、実用上充分な保温力を示すが、銀のコストが
著しく高いため、魔法瓶の製造コストが著しく高
くなる問題がある。また、ニツケルメツキを介在
させて銅メツキを形成した魔法瓶も実用上充分な
保温性を示すが、ステンレス鋼素地そのままでは
銅メツキを形成することができないため、ニツケ
ルメツキを形成しなければならず、しかも、内瓶
および外瓶を構成する各部材、例えば、胴部材、
首部材、底部材毎にメツキした後、接合しなけれ
ばならないため、製造工程が煩雑で多大の工数を
要するという問題があつた。
本発明は、これらの問題を解決し、均質で密着
性が良く、良質の銅メツキをステンレス鋼表面に
容易に形成することができる方法を提供すること
を目的とし、その要旨は、ステンレス鋼を酸化性
雰囲気中で焼成し、次いで該ステンレス鋼表面に
化学銅メツキすることを特徴とするステンレス鋼
への銅メツキ方法にある。
すなわち、本発明はステンレス鋼の素地そのま
までは化学銅メツキしても、下記化学反応により
素地表面に発生すると水素によつて銅の析出が阻
害され、たとえ析出したとしてもひび割れしたり
剥離してしまうため、良好な銅メツキをすること
は不可能であるが、ステンレス鋼素地表面が適度
に酸化されると、酸化第2鉄を主体とする酸化被
膜が形成され、この酸化被膜が銅の析出を促進さ
せ、密着性の良好な銅メツキ層を形成することを
可能にするという知見に基ずいて完成されたもの
である。
アルカリ性二価銅溶液における化学反応は次の
通りである。
Cu+++2e-→Cu↓
2HCHO+2OH-→
2HCOO-+2H2O+2e-+H2↑
本発明の好ましい実施態様ににおいては、銅の
析出を促進させるため、酸化被膜形成後、化学銅
メツキするに先立つて、塩化パラジウム主成分と
する溶液に浸漬させて前記酸化被膜表面を活性化
させることが行なわれる。また、塩化パラジウム
を主成分とする溶液に浸漬する代りに、あるいは
該溶液に浸漬した後、塩化第1錫を主成分とする
溶液に浸漬して、活性化することが行なわれる。
他の好ましい実施態様においては、銅メツキ層
のステンレス鋼表面への強固な密着性を保証する
ため、焼成処理は250〜550℃、好ましくは、300
〜450℃で行なうのがよく、また、その時間は温
度によつて異なるが、通常5〜180分、好ましく
は、10〜60分が適当である。焼成温度が250℃未
満では充分な酸化被膜が形成されないか、あるい
はその形成に長時間を要し、製造コストの上昇を
招くためであり、550℃を超えるとステンレス鋼
素地が変態することからである。また、焼成時間
は前記温度範囲内であれば任意に設定できるが、
5分未満では焼成温度が低い場合に充分な酸化被
膜が形成し難く、180分を超えると焼成温度が高
い場合に、必要以上の焼成処理をすることになり
エネルギー損失が多くなる他、再び銅の析出が阻
害されるようになるので、前記範囲で焼成するの
が望ましい。
本発明方法によれば、ステンレス鋼への銅メツ
キは、まず、焼成処理によりステンレス鋼表面を
酸化させ、次いで、化学銅メツキ浴に浸漬するこ
とにより行なわれるが、その酸化の度合いは、焼
成後のステンレス鋼表面の光沢度が焼成前の研摩
表面の光沢度にべて10〜50低下する範囲が好適で
ある。これは、光沢度の低下が10未満となる程度
の酸化ではステンレス鋼表面に銅析出反応させる
ことができず、また、光沢度が50を超えて低下す
る過度の酸化では銅析出反応させることが困難と
なるからである。このような現象の起る原因は、
完全に解明されていないが、無焼成あるいはこれ
に近い状態では銅の析出に寄与する酸化第2鉄が
充分に形成されず、過度に酸化させると表面に酸
化第2鉄が存在しなくなり、ほとんど酸化クロム
のみになつて銅の析出を阻害するからであると推
測される。通常、前記焼成条件下で焼成を行なう
限り、ステンレス鋼表面の光沢度の変化は前記範
囲におさまるので、焼成後、特に光沢度を測定す
る必要はない。また、ステンレス鋼としては、オ
ーステナイト系、フエライト系、ステアナイト系
等いずれも問題はない。
酸化被膜を形成したステンレス鋼への化学銅メ
ツキは、そのままでも行なうことができるが、銅
の析出を促進させ実用可能な銅メツキ被膜を形成
するため、金、白金、パラジウムおよび銀のいず
れか一種の貴金属を含む浴中に短時間、通常、5
秒〜5分間常温で浸漬するのが好ましい。また、
その後、ハロゲン化第1錫を主成分とする浴中に
短時間常温で浸漬して活性化するのが好ましい。
化学銅メツキ浴としては、アルカリ性銅浴であ
れば、添加剤含有の有無にかかわりなく特に制限
はなく、市販のものを使用すればよい。
以下、本発明の実施例について説明する。
実施例 1
0.3mm厚のステンレス鋼(SUS 304)の試験片
(50×150mm)を用意し、これをバフ研摩した後、
トリクレンおよびアセトンを用いて脱脂し、次い
で空気中350℃で20分間焼成した。次に、塩化パ
ラジウム0.1g/の水溶液中に常温にて30秒間
浸漬した後、塩化第1錫10ppmの水溶液中に常温
にて10秒間浸漬し、水洗した。これを下記処方に
より調整した化学銅メツキ浴中に、22℃で10分間
浸漬して、ステンレス鋼表面に銅の析出させ、水
洗、乾燥したところ、平滑で密着性のよい良質の
銅メツキを形成することができた。
(化学銅メツキ浴の処方)
ロツセル塩170gを1の水に溶解させた後、
水酸化ナトリウム50gを溶解させ、さらに硫酸銅
35gを溶解させて得た液をA液とする一方、ホル
ムアルデヒド40w/v%水溶液をB液とし、これ
らを100:30の比率で混合して化学銅メツキ浴と
する。
このようにして得たメツキ層の密着度を調べる
ため、爪先で強くこすつてみたが、全く剥離する
ことがなく、また、高真空中450℃で数時間放置
しても異常は認められなかつた。
なお、バフ研摩し脱脂した後の試験片表面の光
沢度は122で、焼成処理後の光沢度は101と焼成前
に比べて21低下していた。この光沢度の値は、
JIS Z8741に規定される測定法に基ずき、ガス試
験機(株)製デジタル変角光沢計(型式:UGV−
4D)を用いて、入射角60°、標準サンプルの光沢
度91.1を1/4の22.8に設定して求めた値である。
比較例 1
実施例1において、焼成処理を省略した以外は
全く同じ方法、条件で化学銅メツキしたところ、
試験片表面にひび割れした銅メツキ層が所々に形
成されているだけで、爪で強くすると大部分が剥
離した。
実施例2〜7および参考例1〜3
実施例1において、焼成条件を表1に示す条件
に変えた以外は全く同様にして化学銅メツキし
た。
それらの結果を焼成後の光沢度および比較例1
の結果と共に表1に示す。
The present invention relates to a method for copper plating stainless steel. Copper plating has traditionally been applied to household goods and various other industrial products, but it is said that products made from mild steel and other iron alloys will rust when the copper plating wears out after long-term use. Due to these problems, attempts have been made to use stainless steel as the material. However, it is currently not put to practical use because direct electrolytic copper plating or chemical copper plating cannot be applied to stainless steel. On the other hand, in recent years, metal thermos flasks made of stainless steel have come into practical use in place of glass thermos flasks that have poor impact resistance. Stainless steel has the advantages of excellent corrosion resistance, strong mechanical strength, and low thermal conductivity, but it has a significantly high thermal emissivity.
Similar to glass thermos flasks, it has been reported, for example, in Japanese Patent Publication No. 57-22571 and Japanese Unexamined Patent Publication No. 57-57, that heat transfer due to radiation is reduced by forming silver mirrors on the walls of the inner and outer bottles that surround the vacuum space of stainless steel thermos flasks. −
This was proposed in Japanese Patent No. 75621, and the latter also discloses copper plating via nickel plating. A stainless steel thermos flask with a silver mirror layer exhibits sufficient heat retaining power for practical purposes, but since the cost of silver is extremely high, there is a problem in that the manufacturing cost of the thermos flask is extremely high. Additionally, a thermos flask with a copper plating formed with a nickel plating interposed therein also exhibits sufficient heat retention for practical purposes, but since the copper plating cannot be formed on the stainless steel base as it is, the nickel plating must be formed. Each member constituting the inner bottle and outer bottle, for example, a body member,
Since the neck member and the bottom member must be plated and then joined together, there is a problem in that the manufacturing process is complicated and requires a large number of man-hours. The purpose of the present invention is to solve these problems and provide a method that can easily form a homogeneous, adhesive, and high-quality copper plating on a stainless steel surface. A method for copper plating stainless steel, which is characterized by firing in an oxidizing atmosphere and then chemically copper plating the surface of the stainless steel. In other words, in the present invention, even if the stainless steel substrate is chemically plated with copper, if it occurs on the surface of the substrate due to the chemical reaction described below, the precipitation of copper will be inhibited by hydrogen, and even if it does precipitate, it will crack or peel. Therefore, it is impossible to achieve good copper plating, but when the surface of the stainless steel base is moderately oxidized, an oxide film consisting mainly of ferric oxide is formed, and this oxide film prevents copper precipitation. This was completed based on the knowledge that it is possible to accelerate the formation of a copper plating layer with good adhesion. The chemical reaction in alkaline divalent copper solution is as follows. Cu ++ +2e - →Cu↓ 2HCHO+2OH - → 2HCOO - +2H 2 O+2e - +H 2 ↑ In a preferred embodiment of the present invention, in order to promote copper precipitation, after the oxide film is formed and before chemical copper plating, The surface of the oxide film is activated by immersing it in a solution containing palladium chloride as a main component. Further, instead of immersing in a solution containing palladium chloride as the main component, or after immersing in the solution, activation is performed by immersing in a solution containing stannous chloride as the main component. In another preferred embodiment, the firing process is performed at 250-550°C, preferably at 300°C, to ensure strong adhesion of the copper plating layer to the stainless steel surface.
It is preferable to carry out the reaction at a temperature of -450°C, and the time varies depending on the temperature, but it is usually 5 to 180 minutes, preferably 10 to 60 minutes. This is because if the firing temperature is less than 250°C, a sufficient oxide film will not be formed or it will take a long time to form, leading to an increase in manufacturing costs, and if the firing temperature exceeds 550°C, the stainless steel base will undergo transformation. be. In addition, the firing time can be set arbitrarily as long as it is within the above temperature range, but
If it is less than 5 minutes, it will be difficult to form a sufficient oxide film when the firing temperature is low, and if it exceeds 180 minutes, if the firing temperature is high, the firing process will be performed more than necessary, which will increase the energy loss and cause the copper to burn again. It is desirable to perform the firing within the above range because the precipitation of . According to the method of the present invention, copper plating on stainless steel is performed by first oxidizing the surface of the stainless steel by firing treatment, and then immersing it in a chemical copper plating bath, but the degree of oxidation changes after firing. It is preferable that the glossiness of the stainless steel surface is 10 to 50 lower than the glossiness of the polished surface before firing. This is because oxidation that causes a decrease in gloss of less than 10 cannot cause a copper precipitation reaction on the stainless steel surface, and excessive oxidation that causes a decrease in gloss of more than 50 cannot cause a copper precipitation reaction. This is because it becomes difficult. The cause of this phenomenon is
Although it is not completely understood, in unfired or similar conditions, sufficient ferric oxide, which contributes to copper precipitation, is not formed, and when oxidized excessively, there is no ferric oxide on the surface, and almost no ferric oxide exists on the surface. It is presumed that this is because only chromium oxide is present, which inhibits the precipitation of copper. Usually, as long as the firing is carried out under the above-mentioned firing conditions, the change in the glossiness of the stainless steel surface will fall within the above-mentioned range, so there is no need to particularly measure the glossiness after firing. Further, as the stainless steel, there is no problem with any of the austenitic, ferrite, and steanite stainless steels. Chemical copper plating on stainless steel with an oxide film can be performed as is, but in order to promote copper precipitation and form a practical copper plating film, one of gold, platinum, palladium, and silver is used. of precious metals for a short period of time, usually 5
It is preferable to immerse at room temperature for seconds to 5 minutes. Also,
Thereafter, it is preferable to activate it by immersing it in a bath containing stannous halide as a main component at room temperature for a short period of time. The chemical copper plating bath is not particularly limited as long as it is an alkaline copper bath, regardless of whether it contains additives, and any commercially available bath may be used. Examples of the present invention will be described below. Example 1 A 0.3 mm thick stainless steel (SUS 304) test piece (50 x 150 mm) was prepared, and after buffing it,
It was degreased using trichlene and acetone and then calcined in air at 350°C for 20 minutes. Next, it was immersed in an aqueous solution containing 0.1 g of palladium chloride for 30 seconds at room temperature, then immersed in an aqueous solution containing 10 ppm of tin chloride for 10 seconds at room temperature, and washed with water. This was immersed in a chemical copper plating bath prepared according to the following recipe at 22℃ for 10 minutes to deposit copper on the stainless steel surface, then washed with water and dried to form a smooth, high-quality copper plating with good adhesion. We were able to. (Formulation of chemical copper plating bath) After dissolving 170g of Lotusel salt in 1 water,
Dissolve 50g of sodium hydroxide and add copper sulfate.
The solution obtained by dissolving 35 g is called Solution A, while the 40 w/v% formaldehyde aqueous solution is called Solution B, and these are mixed at a ratio of 100:30 to prepare a chemical copper plating bath. In order to check the adhesion of the plating layer obtained in this way, I rubbed it strongly with my fingertips, but it did not peel off at all, and no abnormality was observed even after it was left in a high vacuum at 450°C for several hours. . The gloss of the surface of the test piece after buffing and degreasing was 122, and the gloss after firing was 101, which was 21 lower than before firing. This gloss value is
Based on the measurement method specified in JIS Z8741, a digital variable angle gloss meter (Model: UGV-) manufactured by Gas Test Instruments Co., Ltd.
4D), the incident angle is 60°, and the standard sample's glossiness of 91.1 is set to 22.8, which is 1/4. Comparative Example 1 Chemical copper plating was performed using the same method and conditions as in Example 1 except that the firing process was omitted.
A cracked copper plating layer was only formed here and there on the surface of the test piece, and most of it peeled off when pressed with a fingernail. Examples 2 to 7 and Reference Examples 1 to 3 Chemical copper plating was carried out in exactly the same manner as in Example 1 except that the firing conditions were changed to those shown in Table 1. These results were compared to the gloss level after firing and Comparative Example 1.
The results are shown in Table 1.
【表】【table】
【表】
以上の説明から明らかなように、本発明によれ
ば、焼成後、化学銅メツキするという簡単な操作
で、従来ニツケルメツキ等を介在させない限り密
着性が良好で良質の銅メツキを得ることが不可能
であつとものが可能になる。また、本発明方法を
ステンレス鋼製魔法瓶などの高真空断熱容器の製
造に適用した場合、従来のニツケルメツキを介在
させる場合のように煩雑な工程を必要とせず、内
外瓶構成部材を焼成し、二重壁構造に組立てた
後、化学銅メツキするだけでよいので作業性が向
上し、しかも、銅メツキは銀メツキ層と同等の熱
輻射率を有するので、保温力に優れた高真空断熱
容器を安価に製造することができるなど優れた効
果を奏する。また、内外瓶を焼成する過程におい
て、ステンレス鋼からの脱ガス作用もあり、真空
排気時間の短縮時間になるという効果もある。[Table] As is clear from the above description, according to the present invention, high-quality copper plating with good adhesion can be obtained by the simple operation of chemical copper plating after firing, unless conventional nickel plating or the like is used. Things that are impossible become possible. Furthermore, when the method of the present invention is applied to the production of high-vacuum insulation containers such as stainless steel thermos flasks, it is possible to sinter the inner and outer bottle components without requiring the complicated process of intervening conventional nickel plating. After assembling the heavy-walled structure, it is only necessary to apply chemical copper plating, which improves work efficiency.Moreover, copper plating has the same thermal emissivity as a silver plating layer, so it is possible to create a high-vacuum insulated container with excellent heat retention. It has excellent effects such as being able to be manufactured at low cost. In addition, in the process of firing the inner and outer bottles, there is also a degassing effect from the stainless steel, which has the effect of shortening the evacuation time.
Claims (1)
いで該ステンレス鋼表面に化学銅メツキすること
を特徴とするステンレス鋼への銅メツキ方法。 2 化学銅メツキするに先立つて、前記焼成され
たステンレス鋼表面を塩化パラジウム水溶液で活
性化する特許請求の範囲第1項に記載の方法。 3 ステンレス鋼を酸化性雰囲気中、250〜550℃
で焼成する特許請求の範囲第1項または第2項に
記載の方法。[Claims] 1. A method for copper plating stainless steel, which comprises firing the stainless steel in an oxidizing atmosphere, and then chemically plating the surface of the stainless steel with copper. 2. The method of claim 1, wherein the fired stainless steel surface is activated with an aqueous palladium chloride solution prior to chemical copper plating. 3 Stainless steel in an oxidizing atmosphere at 250-550℃
3. The method according to claim 1 or 2, wherein the method is performed by firing with.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16720783A JPS6059071A (en) | 1983-09-09 | 1983-09-09 | Method for plating stainless steel with copper |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16720783A JPS6059071A (en) | 1983-09-09 | 1983-09-09 | Method for plating stainless steel with copper |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6059071A JPS6059071A (en) | 1985-04-05 |
| JPH0312145B2 true JPH0312145B2 (en) | 1991-02-19 |
Family
ID=15845404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16720783A Granted JPS6059071A (en) | 1983-09-09 | 1983-09-09 | Method for plating stainless steel with copper |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6059071A (en) |
-
1983
- 1983-09-09 JP JP16720783A patent/JPS6059071A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6059071A (en) | 1985-04-05 |
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