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JPH0313196B2 - - Google Patents
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JPH0313196B2 - - Google Patents

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Publication number
JPH0313196B2
JPH0313196B2 JP62233295A JP23329587A JPH0313196B2 JP H0313196 B2 JPH0313196 B2 JP H0313196B2 JP 62233295 A JP62233295 A JP 62233295A JP 23329587 A JP23329587 A JP 23329587A JP H0313196 B2 JPH0313196 B2 JP H0313196B2
Authority
JP
Japan
Prior art keywords
oxide
compound
sintered body
structural member
porous body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62233295A
Other languages
Japanese (ja)
Other versions
JPS6476986A (en
Inventor
Hideji Hayakawa
Tsuneo Komyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP23329587A priority Critical patent/JPS6476986A/en
Publication of JPS6476986A publication Critical patent/JPS6476986A/en
Publication of JPH0313196B2 publication Critical patent/JPH0313196B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

(産業上の利用分野) 本発明は高温用構造部材、およびその製造法に
関する。 (従来技術) 現在、純度95%以上の高純度炭化珪素等の焼結
体は高温での強度、耐熱衝撃性等の特性を利用し
て、高温用構造部材としての応用分野に使用され
つつある。しかしながら、かかる構造部材を高温
の酸化雰囲気中で使用する場合高純度炭化珪素焼
結体中の結晶は酸素と反応し、 SiC+3/202→SiO2+CO の反応式によつて酸化珪素に変化する。この際焼
結体内に体積膨張が発生し、焼結体に強度低下を
惹起する。従つて、高純度炭化珪素焼結体におい
ては、耐酸化性を向上させることが極めて重要な
ことである。これに対処する手段としては、高純
度の炭化珪素の微粉に予じめホウ酸等の焼結助材
を加えて焼結体組織の緻密化を図る手段と、炭化
珪素焼結体の開気孔中に珪素を圧入して緻密化を
図る手段が知られている。また、特開昭56−
52869号公報に示されているように、炭素珪素粒
子の表面にムライト被膜を形成する手段が知られ
ている。 (発明が解決しようとする問題点) ところで、上記した第1の手段においては、炭
化珪素微粉にホウ酸等の焼結助材を加えて混合、
成形し、高温の還元雰囲気中で焼成することによ
り耐酸化性に優れた高強度の緻密な焼結体を得る
ものであるが、焼成時に焼結体に大きな収縮が発
生するため大形、複雑な形状等の焼結体が得られ
ないという問題がある。 また、上記した第2の手段においては、焼結体
の開気孔中に珪素を圧入することにより耐酸化性
の優れた高強度の緻密な高温用構造部材を得るも
のであるが、珪素を高温度で熔融した状態で圧入
することから設備、処理費用が極めて高くなると
いう問題がある。 さらにまた、上記した第3の手段においては、
耐酸性の優れた高温用構造部材が得られるが未だ
十分なものとはいえない。 従つて、本発明の目的は、上記した問題を備え
ていない高温用構造部材、およびその製造法を提
供することにある。 (問題点を解決するための手段) しかして、本発明の第1の発明は高純度炭化珪
素からなる焼結多孔体の少なくとも開気孔の内面
が金属酸化合物と酸化珪素とからなる酸化物被膜
で覆われている高温用構造部材において、前記酸
化物被膜が珪素化合物と、アルミニウム化合物
と、アルカリ土類金属化合物またはバナジウム化
合物の3者の化合物からなるガラス被膜にて構成
され、同酸化物被膜の前記焼結多孔体に対する付
着量が酸化物換算で0.1〜0.8重量%であることを
特徴とするものである。 当該高温用構造部材を構成する焼結体は開気孔
率5〜30%、一般には20%弱の多孔体であつて、
酸化物被膜はガラス被膜であり、ガラス被膜形成
剤としては、マグネシウム、カルシウム等のアル
カリ土類金属の化合物またはバナジウムの化合物
とアルミニウム化合物、珪素の化合物からなる。
同被膜形成剤として好ましい化合物としては硫酸
マグネシウム、塩化マグネシウム、酢酸マグネシ
ウム、炭酸マグネシウム、酸化マグネシウム、塩
化カルシウム、酢酸カルシウム、硫酸カルシウ
ム、水酸化カルシウム、炭酸カルシウム、酸化硫
酸バナジウム、塩化バナジウム、酸化バナジウ
ム、水酸化アルミニウム、燐酸アルミニウム、コ
ロイダルシリカ等を挙げることができる。 ガラス被膜形成剤の付着量に関しては、アルカ
リ土類金属を含む場合には焼結体に対して酸化物
換算で0.1〜0.6重量%、バナジウムの化合物単独
を含む場合には焼結体に対して酸化物換算で0.1
〜0.8重量%であることが好ましい。アルミニウ
ムの化合物の混合比は、アルカリ土類金属の化合
物に対しては酸化物換算で80〜30重量%、バナジ
ウムの化合物に対しては酸化物換算で20〜80重量
%であることが好ましい。 本発明の第2の発明は上記した高温用構造部材
の製造法であり、当該製造法は、前記焼結多孔体
の少なくとも開気孔の内面にアルミニウム化合物
とアルカリ土類金属化合物またはバナジウム化合
物からなる液状の被膜形成剤を付着する工程と、
この焼結多孔体を焼成して前記酸化物被膜を形成
する工程とからなり、前記被膜形成剤の粘度が
0.5〜3.0ポイズであることを特徴とするものであ
る。 ガラス被膜形成剤等酸化物被膜形成剤としては
上記した種々の化合物を単独または組合せて用い
るが、これらの化合物が水その他の溶媒に可溶性
である場合には溶液として用い、難溶性である場
合は懸濁液として用いる。この場合には化合物を
1μm以下、0.5μm前後の超微粉末として用いるこ
とが好ましい。同被膜形成剤の圧入手段として
は、焼結体および同被膜形成剤の溶液または懸濁
液を同一容器に入れ同容器を高度に減圧すること
により、溶液または懸濁液は焼結体の開気孔中に
容易に圧入される。圧入されたガラス被膜形成剤
は重力や乾燥速度の相違により焼結体内で移動し
て不均一な分布になるおそれがあり、この対策と
しては、下記の手段が採られる。その第1の手段
は乾燥に先立つて被膜形成剤をゲル化する方法で
あり、所定の温度で所定時間例えば10時間静置す
るか、被膜形成剤のPHを所定の値例えばPH6以
上に調整することによりゲル化される。また、そ
の第2の手段は焼結体を回転させながら圧入され
た被膜形成剤を乾燥する方法であり、筒状の焼結
体にとつてその効果が大きい、焼結体はその後焼
成されて圧入された被膜形成剤により炭化珪素の
結晶の表面に珪素化合物と、アルミニウム化合物
と、アルカリ土類金属化合物またはバナジユウム
化合物からなるガラス被膜が形成されるが、焼成
は1200〜1500℃の温度、酸素濃度2%以上の酸化
雰囲気中で行うことが好ましい。 (発明の作用・効果) 本発明に係る高温用構造部材においては、その
開気孔の炭化珪素の結晶の表面に酸化物被膜等ガ
ラス被膜が形成されているため、高温の酸化雰囲
気中にあつても炭化珪素の結晶に対する酸素が遮
断され、炭化珪素が酸化されることがない。従つ
て、かかる高温用構造部材は高耐酸化性を有し、
高温の酸化雰囲気中での使用によつても体積膨張
の発生による強度低下を惹起するようなことはな
い。 しかして、当該高温用構造部材におけるガラス
被膜形成剤等酸化物被膜形成剤の付着量について
は、同被膜形成剤がアルカリ土類金属の化合物を
含む場合には酸化物換算で0.1〜0.6重量%、同被
膜形成剤がバナジウムの化合物を含む場合には酸
化物換算で0.1〜0.8重量%であることが好まし
い。被膜形成剤の付着量が0.1重量%未満の場合
には酸化物被膜が炭化珪素の結晶の表面を完全に
被膜するには十分とはいえず、これとは逆に0.6
または0.8重量%を越る場合には酸化物被膜の量
が多すぎて高温での使用時酸化物被膜形成剤が構
造部材の表面に融出するおそれがある。 また、本発明に係る製造法によれば、上記した
高温用構造部材を得ることができるが、ガラス被
膜形成剤等酸化物被膜形成剤を粘度0.5〜3.0ポイ
ズの溶液、懸濁液等の液状で焼結体の開気孔中に
圧入することが必要である。被膜形成剤の粘度が
0.5ポイズ未満の場合には、圧入後被膜形成剤が
ゲル化するまでに重力による移動が発生し被膜形
成剤の分布に斑を生じ、これとは逆に粘度が3.0
ポイズを越える場合には被膜形成剤の粘性が高く
て焼結体の開気孔中に十分には侵入しない。 なお、ガラス被膜形成剤等酸化物被膜形成剤の
圧入後の焼結体の焼成は1200〜1500℃の温度、酸
素濃度2%以上の酸化雰囲気中で行うことが好ま
しい。焼成温度が1200℃未満の場合には焼結体か
らの酸化珪素の生成が不足して酸化物被膜が十分
には形成されないおそれがあり、かつ焼成温度が
1500℃を越えると焼結体からの酸化珪素の生成が
多すぎて酸化物被膜の融出の原因になるととも
に、高温用構造部材の寿命を短くする。また、雰
囲気中の酸素濃度に関しては、2%以上ない場合
には焼結体からの酸化珪素の生成がなく酸化物被
膜の形成が難しい。 実施例 1 炭化珪素の粗粒(平均粒径210μm)と微粒(平
均粒径0.6μm)とを1:1の割合で配合して水を
15重量%添加し、これをポツトミルで混合して泥
漿を作製した。この泥漿を石膏型へ鋳込んで作つ
た成形体を窒素雰囲気中、2100℃の温度で焼成し
て平板状の高純度炭化珪素焼結体を得た。 得られた焼結体の開気孔中に、ガラス被膜形成
剤である硫酸マグネシウムとアルミナゾルとの
1:1配合の各種濃度の水溶液を真空処理法にて
圧入して乾燥した後、同焼結体を空気中1300℃の
温度で再焼成した。得られた焼結体の特性を第1
表に示す。なお、第1表における%は重量%で、
圧入量は酸化物換算による重量%あり、また耐酸
化性の値は試料を大気中1300℃で1000〜2000時間
曝露した時の1時間当たりの重量増加率(10−3
%)を示す。
(Industrial Application Field) The present invention relates to a high temperature structural member and a method for manufacturing the same. (Prior art) Currently, sintered bodies such as high-purity silicon carbide with a purity of 95% or higher are being used in the field of application as structural members for high temperatures, taking advantage of their properties such as strength at high temperatures and thermal shock resistance. . However, when such structural members are used in a high-temperature oxidizing atmosphere, the crystals in the high-purity silicon carbide sintered body react with oxygen and change to silicon oxide according to the reaction formula: SiC + 3/20 2 → SiO 2 + CO. . At this time, volumetric expansion occurs within the sintered body, causing a decrease in strength of the sintered body. Therefore, it is extremely important to improve oxidation resistance in high-purity silicon carbide sintered bodies. As a means to deal with this, there are two methods: adding sintering aids such as boric acid to fine powder of high-purity silicon carbide in advance to make the structure of the sintered body denser, and open pores in the silicon carbide sintered body. A method of press-fitting silicon into the material to achieve densification is known. Also, JP-A-56-
As shown in Japanese Patent No. 52869, a method of forming a mullite film on the surface of carbon silicon particles is known. (Problems to be Solved by the Invention) By the way, in the above-mentioned first means, a sintering aid such as boric acid is added to fine silicon carbide powder and mixed,
By shaping and firing in a high-temperature reducing atmosphere, a high-strength, dense sintered body with excellent oxidation resistance is obtained. However, the sintered body undergoes large shrinkage during firing, making it large and complicated There is a problem that a sintered body having a specific shape cannot be obtained. In addition, in the second method described above, a high-strength, dense high-temperature structural member with excellent oxidation resistance is obtained by press-fitting silicon into the open pores of the sintered body. Since it is press-fitted in a molten state at high temperatures, there is a problem in that equipment and processing costs are extremely high. Furthermore, in the third means described above,
Although a high-temperature structural member with excellent acid resistance can be obtained, it is still not satisfactory. SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a high-temperature structural member that does not have the above-mentioned problems, and a method for producing the same. (Means for Solving the Problems) Accordingly, the first aspect of the present invention is that at least the inner surface of the open pores of a sintered porous body made of high-purity silicon carbide is coated with an oxide coating made of a metal acid compound and silicon oxide. In the high-temperature structural member covered with The amount of adhesion to the sintered porous body is 0.1 to 0.8% by weight in terms of oxide. The sintered body constituting the high temperature structural member is a porous body with an open porosity of 5 to 30%, generally less than 20%,
The oxide film is a glass film, and the glass film forming agent includes a compound of an alkaline earth metal such as magnesium or calcium, or a vanadium compound, an aluminum compound, or a silicon compound.
Preferred compounds as the film forming agent include magnesium sulfate, magnesium chloride, magnesium acetate, magnesium carbonate, magnesium oxide, calcium chloride, calcium acetate, calcium sulfate, calcium hydroxide, calcium carbonate, vanadium sulfate oxide, vanadium chloride, vanadium oxide, Examples include aluminum hydroxide, aluminum phosphate, and colloidal silica. The amount of glass film forming agent deposited is 0.1 to 0.6% by weight based on the sintered body when it contains an alkaline earth metal, and 0.1 to 0.6% by weight based on the sintered body when it contains only a vanadium compound. 0.1 in terms of oxide
Preferably it is ~0.8% by weight. The mixing ratio of the aluminum compound is preferably 80 to 30% by weight in terms of oxide for the alkaline earth metal compound, and 20 to 80% by weight in terms of oxide for the vanadium compound. A second invention of the present invention is a method for manufacturing the above-described high-temperature structural member, in which the inner surface of at least the open pores of the sintered porous body is made of an aluminum compound and an alkaline earth metal compound or a vanadium compound. a step of applying a liquid film forming agent;
The sintered porous body is fired to form the oxide film, and the viscosity of the film forming agent is
It is characterized by a poise of 0.5 to 3.0. As oxide film forming agents such as glass film forming agents, the various compounds mentioned above are used alone or in combination, but when these compounds are soluble in water or other solvents, they are used as a solution, and when they are poorly soluble, they are used as a solution. Use as a suspension. In this case, the compound
It is preferable to use it as an ultrafine powder of 1 μm or less and around 0.5 μm. The method for press-fitting the film-forming agent is to place the sintered body and a solution or suspension of the film-forming agent in the same container and highly reduce the pressure in the container, so that the solution or suspension is released into the sintered body. It is easily pressed into the pores. There is a risk that the press-fitted glass film forming agent may move within the sintered body due to differences in gravity and drying speed, resulting in uneven distribution. As a countermeasure against this, the following measures are taken. The first method is to gel the film-forming agent prior to drying, by leaving it at a predetermined temperature for a predetermined period of time, for example, 10 hours, or by adjusting the pH of the film-forming agent to a predetermined value, for example, PH6 or higher. This results in gelation. The second method is to dry the press-fitted film forming agent while rotating the sintered body, which is highly effective for cylindrical sintered bodies.The sintered body is then fired. A glass film consisting of a silicon compound, an aluminum compound, and an alkaline earth metal compound or a vanadium compound is formed on the surface of the silicon carbide crystal by the injected film forming agent. It is preferable to carry out in an oxidizing atmosphere with a concentration of 2% or more. (Operations and Effects of the Invention) In the high-temperature structural member according to the present invention, a glass film such as an oxide film is formed on the surface of the silicon carbide crystal in the open pores, so that it cannot be used in a high-temperature oxidizing atmosphere. Also, oxygen to the silicon carbide crystals is blocked, and the silicon carbide is not oxidized. Therefore, such high-temperature structural members have high oxidation resistance,
Even when used in a high-temperature oxidizing atmosphere, there is no reduction in strength due to volumetric expansion. Therefore, the amount of oxide film-forming agents such as glass film-forming agents deposited on the high-temperature structural member is 0.1 to 0.6% by weight in terms of oxides if the film-forming agent contains an alkaline earth metal compound. When the film-forming agent contains a vanadium compound, it is preferably 0.1 to 0.8% by weight in terms of oxide. If the amount of the film forming agent deposited is less than 0.1% by weight, the oxide film will not be sufficient to completely cover the surface of the silicon carbide crystal;
If it exceeds 0.8% by weight, the amount of the oxide film is too large and the oxide film forming agent may melt onto the surface of the structural member when used at high temperatures. Further, according to the manufacturing method of the present invention, it is possible to obtain the above-mentioned high-temperature structural member. It is necessary to press fit into the open pores of the sintered body. The viscosity of the film forming agent
If the viscosity is less than 0.5 poise, movement due to gravity will occur before the film-forming agent gels after press-fitting, causing uneven distribution of the film-forming agent, and conversely, the viscosity will be 3.0
If the poise is exceeded, the viscosity of the film forming agent is so high that it does not fully penetrate into the open pores of the sintered body. The sintered body after press-fitting the oxide film forming agent such as the glass film forming agent is preferably fired at a temperature of 1200 to 1500° C. in an oxidizing atmosphere with an oxygen concentration of 2% or more. If the firing temperature is less than 1200°C, there is a risk that silicon oxide will not be sufficiently produced from the sintered body and an oxide film will not be formed sufficiently.
If the temperature exceeds 1500°C, too much silicon oxide is produced from the sintered body, causing melting of the oxide film and shortening the life of the high-temperature structural member. Regarding the oxygen concentration in the atmosphere, if it is less than 2%, silicon oxide will not be generated from the sintered body and it will be difficult to form an oxide film. Example 1 Coarse particles (average particle size 210 μm) and fine particles (average particle size 0.6 μm) of silicon carbide were mixed in a 1:1 ratio and water was added.
15% by weight was added and mixed in a pot mill to prepare a slurry. This slurry was cast into a plaster mold, and the molded body was fired at a temperature of 2100°C in a nitrogen atmosphere to obtain a flat plate-shaped high-purity silicon carbide sintered body. Aqueous solutions of various concentrations containing a 1:1 mixture of magnesium sulfate and alumina sol, which are glass film forming agents, were injected into the open pores of the obtained sintered body using a vacuum treatment method, and after drying, the sintered body was was recalcined in air at a temperature of 1300°C. The characteristics of the obtained sintered body were
Shown in the table. In addition, % in Table 1 is weight %,
The injected amount is expressed as % by weight in terms of oxide, and the oxidation resistance value is expressed as the weight increase rate per hour ( 10-3
%).

【表】 実施例 2 炭酸カルシウムとアルミナ微粉との各種配合
(重量)の5重量%懸濁液(酸化物換算)をガラ
ス被膜形成剤として用いた点を除き、実施例1と
同様にして得た高温用構造部材の特性を第2表に
示す。なお、耐酸性化性の試験も実施例1と同様
である。
[Table] Example 2 Samples were obtained in the same manner as in Example 1, except that a 5% by weight suspension (in terms of oxide) of various combinations (by weight) of calcium carbonate and fine alumina powder was used as the glass film forming agent. Table 2 shows the properties of the high temperature structural members. Note that the acid resistance test was also the same as in Example 1.

【表】 実施例 3 実施例1で得た未圧入の焼結体の開気孔中に、
ガラス被膜形成剤である硫酸マグネシウムとアル
ミナゾルとの1:1配合の5重量%水溶液を真空
処理法にて圧入して乾燥後、各種の条件で再焼成
した。得られた高温用構造部材の実施例1、2に
対応する特性を第3表に示す。なお、焼結体への
被膜形成剤の圧入量は酸化物換算で、0.2重量%
である。
[Table] Example 3 In the open pores of the uninjected sintered body obtained in Example 1,
A 5% by weight aqueous solution of a 1:1 mixture of magnesium sulfate and alumina sol, which are glass film forming agents, was injected by a vacuum treatment method, dried, and then refired under various conditions. Table 3 shows the properties of the obtained high-temperature structural members corresponding to Examples 1 and 2. The amount of film forming agent injected into the sintered body is 0.2% by weight in terms of oxide.
It is.

【表】 実施例 4 酸化硫酸バナジウムとアルミナゾルとの1:1
配合(重量)の粘度1.8ポイズ、5重量%懸濁液
(酸化物換算)をガラス被膜形成剤として用い、
圧入量を0.3重量%とした点を除き実施例1と同
様にして高温用構造部材を得た。得られた高温用
構造部材の耐酸化性(10-3%)は0.14であり、ま
たガラス融出度については問題はなかつた。 実施例 5 実施例1と同様の方法で外径30mm、内径20mmで
長さ2000mmのチユーブ状の高純度炭化珪素焼結体
を形成し、これにガラス被膜形成剤である硫酸マ
グネシウムとリン酸アルミニウムとの1:1配合
の各種粘度の水溶液を圧入した。この場合の圧入
量のバラツを第4表に示す。なお、バラツキの値
は焼結体の長さ方向の5箇所での圧入量(重量
%)を測定し、これら圧入量の最大値と最小値の
差をもつて示している。
[Table] Example 4 Vanadium oxide sulfate and alumina sol 1:1
Using a 5% by weight suspension (calculated as oxide) with a viscosity of 1.8 poise (by weight) as a glass film forming agent,
A high-temperature structural member was obtained in the same manner as in Example 1 except that the injection amount was 0.3% by weight. The oxidation resistance (10 -3 %) of the obtained high-temperature structural member was 0.14, and there were no problems with the degree of glass melting. Example 5 A tube-shaped high-purity silicon carbide sintered body with an outer diameter of 30 mm, an inner diameter of 20 mm, and a length of 2000 mm was formed in the same manner as in Example 1, and magnesium sulfate and aluminum phosphate, which are glass film forming agents, were added to the tube-shaped sintered body. Aqueous solutions of various viscosities in a 1:1 ratio were injected. Table 4 shows the variation in the amount of press-fitting in this case. Note that the value of the variation is determined by measuring the amount of press-in (wt%) at five locations in the length direction of the sintered body, and is shown as the difference between the maximum value and the minimum value of the amount of press-in.

【表】 実施例 6 実施例5にて得たチユーブ状の焼結体を3本用
い、焼結体Aにはガラス被膜形成剤である硫酸マ
グネシウムとリン酸アルミニウムとの1:1配合
の5重量%水溶液を圧入し、同焼結体Aを乾燥台
に横に静置して80℃の温度で12時間乾燥した。焼
結体Bにもこれと同様に圧入し、同焼結体Bを1
分間5回転の速度で回転させながら80℃の温度で
12時間乾燥した。焼結体Cに対してはガラス被膜
形成剤である硫酸マグネシウムとアルミナゾルと
の1:1配合の5重量%水溶液を圧入し、同焼結
体Cを80℃に加熱してゲル化した後同温度で12時
間乾燥した。これら各焼結体A〜Cにおける圧入
量のバラツキを第5表に示す。なお、バラツキの
値は実施例5と同様にして測定し算出したもので
ある。
[Table] Example 6 Three tube-shaped sintered bodies obtained in Example 5 were used, and sintered body A was treated with a 1:1 mixture of magnesium sulfate and aluminum phosphate, which are glass film forming agents. A weight % aqueous solution was injected into the sintered body A, and the sintered body A was placed horizontally on a drying table and dried at a temperature of 80° C. for 12 hours. In the same way, sintered body B is also press-fitted, and the same sintered body B is
At a temperature of 80°C while rotating at a speed of 5 revolutions per minute.
Dry for 12 hours. A 5% by weight aqueous solution of a 1:1 mixture of magnesium sulfate and alumina sol, which are glass film forming agents, was injected into the sintered body C, and the sintered body C was heated to 80°C to gel. Dry at temperature for 12 hours. Table 5 shows the variation in the amount of press-fit in each of these sintered bodies A to C. Note that the value of variation was measured and calculated in the same manner as in Example 5.

【表】【table】

Claims (1)

【特許請求の範囲】 1 高純度炭化珪素からなる焼結多孔体の少なく
とも開気孔の内面が金属酸化物と酸化珪素とから
なる酸化物被膜で覆われている高温用構造部材に
おいて、前記酸化物被膜が珪素化合物と、アルミ
ニウム化合物と、アルカリ土類金属化合物または
バナジウム化合物の3者の化合物からなるガラス
被膜にて構成され、同酸化物被膜の前記焼結多孔
体に対する付着量が酸化物換算で0.1〜0.8重量%
であることを特徴とする高温用構造部材。 2 高純度炭化珪素からなる焼結多孔体の少なく
とも開気孔の内面が金属酸化物と酸化珪素とから
なる酸化物被膜で覆われ、同酸化物被膜が珪素化
合物と、アルミニウム化合物と、アルカリ土類金
属化合物またはバナジウム化合物の3者の化合物
からなるガラス被膜にて構成されて、同酸化物被
膜の前記焼結多孔体に対する付着量が酸化物換算
で0.1〜0.8重量%である高温用構造部材の製造方
法であり、前記焼結多孔体の少なくとも開気孔の
内面にアルミニウム化合物とアルカリ土類金属化
合物またはバナジウム化合物からなる液状の被膜
形成剤を付着する工程と、この焼結多孔体を焼成
して前記酸化物被膜を形成する工程とからなり、
前記被膜形成剤の粘度が0.5〜3.0ポイズであるこ
とを特徴とする高温用構造部材の製造方法。
[Scope of Claims] 1. A high-temperature structural member in which at least the inner surface of open pores of a sintered porous body made of high-purity silicon carbide is covered with an oxide film made of a metal oxide and silicon oxide, The coating is composed of a glass coating consisting of a silicon compound, an aluminum compound, and an alkaline earth metal compound or a vanadium compound, and the amount of the oxide coating attached to the sintered porous body is expressed in terms of oxide. 0.1-0.8% by weight
A high temperature structural member characterized by: 2 The inner surface of at least the open pores of the sintered porous body made of high-purity silicon carbide is covered with an oxide film made of a metal oxide and silicon oxide, and the oxide film is covered with a silicon compound, an aluminum compound, and an alkaline earth compound. A structural member for high temperature use, which is composed of a glass coating made of a three-component compound of a metal compound or a vanadium compound, and the amount of the oxide coating attached to the sintered porous body is 0.1 to 0.8% by weight in terms of oxide. The manufacturing method includes a step of attaching a liquid film forming agent consisting of an aluminum compound and an alkaline earth metal compound or a vanadium compound to the inner surface of at least the open pores of the sintered porous body, and firing the sintered porous body. forming the oxide film,
A method for producing a high temperature structural member, characterized in that the film forming agent has a viscosity of 0.5 to 3.0 poise.
JP23329587A 1987-09-17 1987-09-17 Structural member for high temperature and production thereof Granted JPS6476986A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23329587A JPS6476986A (en) 1987-09-17 1987-09-17 Structural member for high temperature and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23329587A JPS6476986A (en) 1987-09-17 1987-09-17 Structural member for high temperature and production thereof

Publications (2)

Publication Number Publication Date
JPS6476986A JPS6476986A (en) 1989-03-23
JPH0313196B2 true JPH0313196B2 (en) 1991-02-21

Family

ID=16952865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23329587A Granted JPS6476986A (en) 1987-09-17 1987-09-17 Structural member for high temperature and production thereof

Country Status (1)

Country Link
JP (1) JPS6476986A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19634855C2 (en) * 1996-08-28 1998-07-02 Haldenwanger Tech Keramik Gmbh Process for the production of an oxidation protection for porous ceramics based on SiC and Si¶3¶N¶4¶
JP4437785B2 (en) * 2003-08-12 2010-03-24 日本碍子株式会社 Method for producing silicon carbide based catalyst body

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5652869A (en) * 1979-10-01 1981-05-12 Matsushita Electric Ind Co Ltd Manufacture of electrode for battery

Also Published As

Publication number Publication date
JPS6476986A (en) 1989-03-23

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