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JPH0314043B2 - - Google Patents
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JPH0314043B2 - - Google Patents

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Publication number
JPH0314043B2
JPH0314043B2 JP3325983A JP3325983A JPH0314043B2 JP H0314043 B2 JPH0314043 B2 JP H0314043B2 JP 3325983 A JP3325983 A JP 3325983A JP 3325983 A JP3325983 A JP 3325983A JP H0314043 B2 JPH0314043 B2 JP H0314043B2
Authority
JP
Japan
Prior art keywords
base material
coating
fluorine
substrate
polymer compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3325983A
Other languages
Japanese (ja)
Other versions
JPS59159806A (en
Inventor
Takeaki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Priority to JP3325983A priority Critical patent/JPS59159806A/en
Publication of JPS59159806A publication Critical patent/JPS59159806A/en
Publication of JPH0314043B2 publication Critical patent/JPH0314043B2/ja
Granted legal-status Critical Current

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  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Surface Treatment Of Glass (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は耐久性の優れた含フツ素高分子化合物
被膜の形成方法に関する。 従来、各種金属、ガラス、有機高分子化合物な
どの無機質及び有機質基材の表面に含フツ素有機
重合体被膜を形成するため、フルオロアルケン又
はフルオロアルカンの雰囲気中に基材を置いてグ
ロー放電することによりプラズマ重合することが
行われている。例えば特開昭55−99932号に開示
されているように有機高分子化合物基材を含フツ
素プラズマに接触させることにより基材表面にフ
ツ素を導入し改質することにより表面硬度、疎水
性、耐薬品性等の向上を図つている。 しかしながら上記従来法により形成された含フ
ツ素有機重合体被膜の硬度を荷重を負荷した鋼球
により試験すると被膜が容易に破損し、また有機
溶剤や水に浸漬した後に水に対する接触角を測定
すると約75%以下に低下し、従つて耐久性が著し
く悪いという欠点を有することが判明した。 本発明の目的は被膜強度の向上された含フツ素
高分子化合物被膜の形成方法を提供することにあ
る。 本発明の他の目的は耐溶剤性及び耐水性が初期
値において従来の被膜より優れることは勿論のこ
と、該試験後における水の接触角が極めて僅かに
しか低下せず、約97〜98%以上という高い接触角
を保持し得る耐久性に著しく優れた含フツ素高分
子化合物被膜の形成方法を提供することにある。 本発明は(a) フルオロアルケン及び/又はフル
オロアルカンの雰囲気中に基材を置いてグロー放
電することにより基材上に含フツ素高分子化合物
被膜を形成し、(b) 必要に応じて、引き続いてフ
ルオロアルケン及び/又はフルオロアルカンのよ
り高い圧力の雰囲気に上記被膜を形成した基材を
置くことによつて形成被膜の膜厚を増大させ、(c)
次に上記被膜を形成した基材を熱処理すること
を特徴とする基材上に耐久性の優れた含フツ素高
分子化合物被膜を形成する方法に係る。 本発明においては基材を含フツ素プラズマに接
触させて、その表面に含フツ素高分子化合物被膜
を形成し、次いで該基材を熱処理するという極め
て簡単な操作を施こすことにより、被膜強度の向
上は勿論のこと、耐溶剤性、耐水性が初期値で熱
処理のないものに比し数%向上するだけでなく、
驚くべきことに耐溶剤、耐水試験後にも殆どその
特性が低下せず、97〜98%以上の極めて高い保持
率を有することが明らかとなつた。この理由は未
だ十分には解明されていないが、恐らく含フツ素
高分子化合物中の比較的低分子量の物質が熱処理
により除去され、あるいは形成された含フツ素化
合物の架橋反応が誘発され完結されたか、または
遊離ラジカルが消失したこと等によるものと考え
られる。 本発明において基材として無機質及び有機質の
基材が用いられる。前者の例としては鉄、銅、ア
ルミニウム、ステンレス等の金属又は合金、ガラ
ス、セラミツク等の全ゆる無機質の基材が包含さ
れる。また後者の例としてはポリオレフイン、ポ
リアクリレート、ポリアミド、ポリイミド、ポリ
エステル、エポキシ樹脂、ポリ塩化ビニル、ポリ
カーボネート、ポリビニルアルコール、ポリスチ
レン等の各種の基材を例示できる。 本発明で使用されるフルオロアルケンの好適な
例として炭素数2〜15の直鎖状、分枝状、環状の
アルケンの1以上の水素がフツ素により置換され
た化合物、好ましくは半数以上の水素がフツ素に
より置換された化合物、最も好ましくは全部の水
素が置換された化合物を例示できる。一部の水素
が塩素、臭素、沃素により置換されていてもよ
い。具体例としてC2F4(テトラフルオロエチレ
ン)、C3F6、C4F8、C2H3F、C2HF3、C2ClF3
CF2=CH2等を挙げることができる。 本発明においてフルオロアルカンの好ましいも
のは炭素数1〜10の直鎖状、分枝状、環状のアル
カンの1以上の水素がフツ素により置換された化
合物、好ましくは半数以上の水素がフツ素により
置換された化合物、最も好ましくは水素の数が0
〜2で他はフツ素で置換された化合物である。一
部の水素が塩素、臭素、沃素により置換されてい
てもよい。具体例としては、CF4、CBrF3
CCl2F2、CCl3F、CHClF2、CHCl2F、CHF3
C2F6、CCl2FCCl2F、CCl2FCClF2、CH3CClF2
CH3CHF2、C3F8、C4F10、cyclo−C4F8、C5F12
C6F14、C8F18、C10F22等を例示できる。上記フル
オロアルケン及びフルオロアルカンを併用するこ
とも可能で、また各々1種又は2種以上混合して
用いることができる。 本発明は上記フルオロアルケン及び/又はフル
オロアルカンの雰囲気中に基材を置いてグロー放
電を行う。フルオロアルケン及び/又はフルオロ
アルカンの流速については特に制限はないが通常
は放電域の体積1に対して約0.1〜20STPcm3
minとするのが好ましい。またグロー放電域に不
活性ガスを混合することも任意である。グロー放
電は公知の方法に従えば良く、例えば−10〜80
℃、好ましくは0〜40℃の温度、0.05〜2Torr、
好ましくは0.1〜0.5Torrの雰囲気を、容器1当
り2〜50Wの放電電力で、0.1〜100MHzの高周波
電界下に置くのが好ましい。装置としては外部電
極方式、内部電極方式の両方が使用できるが、電
極上に重合体が生成しない点より前者がより好ま
しい。 次に本発明では必要に応じて、引き続いてフル
オロアルケン及び/又はフルオロアルカンのより
高い圧力の雰囲気に上記被膜を形成した基材を置
くことにより形成被膜の膜厚を増大させることが
できる。より高い圧力とは好ましくは1〜2atm
の範囲であり、通常この圧力に約0.5〜10時間置
くことにより膜厚を約2〜10倍に増大させること
ができる。 本発明では次に上記被膜を形成した基材を熱処
理することにより被膜の強度及び耐久性を著しく
向上させることができる。熱処理の条件は基材の
耐熱性及び含フツ素高分子化合物の耐熱性に応じ
て選択すればよく、温度は一般には50〜700℃の
範囲で選択でき、処理時間はこの温度範囲で低温
程長く、高温程短くすることが適当であり、通常
0.5秒〜7日程度の範囲とするのが好ましい。基
材の耐熱性例えば軟化点、分解温度が約200℃以
下のときは基材の耐熱性に従つて定めるのが良
く、基材の耐熱性が約200℃以上のときは含フツ
素高分子化合物の耐熱性に従つて熱処理温度及び
時間を選択するのが良い。具体的には基材が鋼鉄
の場合には約200〜400℃、ガラスでは約150〜300
℃、ポリエステルでは約100〜200℃、ポリアミド
では約150〜300℃、ポリアクリレートでは約50〜
150℃、ポリオレフインでは約80〜200℃程度とす
るのが好ましい。熱処理工程は空気中で行うこと
もできるが、窒素、ヘリウム、アルゴン等の不活
性ガス中で行うのが好ましく、この場合には耐水
性、耐溶剤性などの耐久性がより優れた含フツ素
高分子化合物被膜を得ることができる。 以上述べたように本発明はグロー放電により形
成した含フツ素高分子化合物被膜の性質を改善す
るものであり、含フツ素高分子化合物被膜を形成
するための原料やグロー放電重合条件の如何を問
わず適用できるものであり、また基材の種類によ
つて処理温度や処理時間、場合により処理雰囲気
を調節する以外は基材の種類如何を問わず適用で
きるものである。 次いで実施例および比較例により本発明を説明
する。尚、以下において被膜の硬さ、耐溶剤性お
よび耐水性は次の方法で測定した。 1 被膜の硬さ 0.5±0.1μmの厚さの被膜を形成した基材を
その被膜面を上にしまたこれを水平に設置し
て、この上に、水平方向に移動せずまた回転し
ないように固定し、附属物を含めて重量を相殺
した直径8mmの磨き鋼球に荷重200gをかけて
置く。ついで被膜面を基材とともに水平面内で
直線に沿つて160mm/minの平均速度で20mm動
かした後、目視によつて被膜が破損しているか
どうかを観察した。 尚、評価は次の基準によつた。 〇……被膜に傷がついていないか又は被膜に傷
がついていることがあるが被膜は破損せず、
基材面が現われるには至つていない。 ×……被膜が破損し基材面が現われている。 2 耐溶剤性 被試験体を試験液の四塩化炭素または1,
1,2−トリクロロ−1,2,2−トリフルオ
ロエタン中で所定時間超音波を用いて十分接触
させる。次いで被試験体を試験液より取出し、
70〜80℃で1時間乾燥させた後、被膜の水に対
する接触角を測定した。超音波による接触はペ
ツトクリーナー(超音波工業株式会社製)、周
波数41kHz、35Wで行なつた。被膜の厚さはタ
リステツプ(テイラー・ホブソン社製)によ
り、接触角はゴニオメーター(エルマ光学株式
会社製)により測定した。 3 耐水性 被試験体を24時間水に浸漬した後、70〜80℃
で1時間乾燥して、水に対する接触角を測定し
た。接触角の測定は前述と同様にして行つた。 実施例1〜8及び比較例1 外部に誘導負荷励起装置を備えたプラズマ反応
管(直径約180mm、長さ約200mm、容積5)内に
アセトンにより脱脂したステンレス板(SUS−
304、長さ100mm、幅50mm、厚さ1mm)を入れ、
0.05Torrまで排気した後、C2F4ガスを10STP
cm3/minで流し圧力を0.15Torrに調整し、
13.56MHzの高周波電力を50Wで電極に印加して
プラズマを発生させ30分間処理したところ、厚さ
0.4μmの被膜を形成した。 次いで、C2F4をプラズマ反応管に大気圧まで
満たし30分経過せしめると被膜の厚さは0.6μmに
なつた。このように処理したステンレス板を第1
表に記載の雰囲気中で所定の温度及び時間、熱処
理を行つた。結果を第1表に示す。尚、耐溶剤性
は四塩化炭素中で15分間洗滌した後の水に対する
接触角を示す。また比較例1として熱処理を行わ
なかつた場合の結果をも示した。
The present invention relates to a method for forming a fluorine-containing polymer compound coating with excellent durability. Conventionally, in order to form a fluorine-containing organic polymer film on the surface of inorganic and organic substrates such as various metals, glass, and organic polymer compounds, the substrate is placed in a fluoroalkene or fluoroalkane atmosphere and glow discharge is performed. Plasma polymerization is carried out by this method. For example, as disclosed in JP-A-55-99932, surface hardness and hydrophobicity can be improved by introducing fluorine into the surface of an organic polymer compound by bringing it into contact with fluorine-containing plasma. , aiming to improve chemical resistance, etc. However, when the hardness of the fluorine-containing organic polymer coating formed by the above conventional method was tested using a loaded steel ball, the coating was easily damaged, and when the contact angle with water was measured after being immersed in an organic solvent or water. It was found that the durability was extremely poor. An object of the present invention is to provide a method for forming a fluorine-containing polymer compound coating with improved coating strength. Another object of the present invention is that not only the solvent resistance and water resistance are superior to conventional coatings at the initial value, but also that the contact angle of water after the test is only slightly reduced by about 97 to 98%. It is an object of the present invention to provide a method for forming a fluorine-containing polymer compound film that is extremely durable and can maintain such a high contact angle. The present invention comprises (a) forming a fluorine-containing polymer compound film on the substrate by placing the substrate in an atmosphere of fluoroalkene and/or fluoroalkane and performing glow discharge, and (b) optionally, Subsequently, the thickness of the formed coating is increased by placing the substrate on which the coating has been formed in a higher pressure atmosphere of fluoroalkene and/or fluoroalkane, and (c)
The present invention relates to a method for forming a highly durable fluorine-containing polymer compound coating on a substrate, which is characterized by heat-treating the substrate on which the coating has been formed. In the present invention, the coating strength is improved by carrying out an extremely simple operation of bringing the substrate into contact with fluorine-containing plasma to form a fluorine-containing polymer compound coating on the surface, and then heat-treating the substrate. Not only is the solvent resistance and water resistance improved by a few percent compared to the initial value without heat treatment, but also
Surprisingly, it was revealed that the properties hardly deteriorated even after solvent resistance and water resistance tests, and that it had an extremely high retention rate of 97 to 98% or more. The reason for this is not yet fully understood, but it is probably because relatively low molecular weight substances in the fluorine-containing polymer compound are removed by heat treatment, or the crosslinking reaction of the formed fluorine-containing compound is induced and completed. This is thought to be due to the disappearance of free radicals or the disappearance of free radicals. In the present invention, inorganic and organic base materials are used as the base material. Examples of the former include all inorganic base materials such as metals or alloys such as iron, copper, aluminum, and stainless steel, glass, and ceramics. Examples of the latter include various base materials such as polyolefin, polyacrylate, polyamide, polyimide, polyester, epoxy resin, polyvinyl chloride, polycarbonate, polyvinyl alcohol, and polystyrene. A preferable example of the fluoroalkene used in the present invention is a compound in which one or more hydrogens of a linear, branched, or cyclic alkene having 2 to 15 carbon atoms is replaced with fluorine, preferably half or more of the hydrogens. Examples include compounds in which is replaced with fluorine, most preferably all hydrogens are replaced. A part of hydrogen may be replaced with chlorine, bromine, or iodine. Specific examples include C2F4 (tetrafluoroethylene), C3F6 , C4F8 , C2H3F , C2HF3 , C2ClF3 ,
Examples include CF 2 =CH 2 . In the present invention, preferred fluoroalkane is a compound in which one or more hydrogens of a linear, branched, or cyclic alkane having 1 to 10 carbon atoms is replaced with fluorine, preferably half or more of the hydrogens are replaced with fluorine. Substituted compounds, most preferably the number of hydrogens is 0
~2 and the others are fluorine-substituted compounds. A part of hydrogen may be replaced with chlorine, bromine, or iodine. Specific examples include CF 4 , CBrF 3 ,
CCl2F2 , CCl3F , CHClF2 , CHCl2F , CHF3 ,
C 2 F 6 , CCl 2 FCCl 2 F, CCl 2 FCClF 2 , CH 3 CClF 2 ,
CH3CHF2 , C3F8 , C4F10 , cyclo - C4F8 , C5F12 ,
Examples include C 6 F 14 , C 8 F 18 , C 10 F 22 and the like. It is also possible to use the above-mentioned fluoroalkenes and fluoroalkanes in combination, and each can be used alone or in a mixture of two or more. In the present invention, glow discharge is performed by placing a base material in an atmosphere of the above-mentioned fluoroalkene and/or fluoroalkane. There is no particular limit to the flow rate of the fluoroalkene and/or fluoroalkane, but it is usually about 0.1 to 20 STP cm 3 / per volume of the discharge area.
It is preferable to set it to min. It is also optional to mix an inert gas into the glow discharge region. Glow discharge can be performed according to a known method, for example -10 to 80
℃, preferably a temperature of 0 to 40℃, 0.05 to 2 Torr,
Preferably, an atmosphere of 0.1 to 0.5 Torr is placed under a high frequency electric field of 0.1 to 100 MHz with a discharge power of 2 to 50 W per container. Although both an external electrode type and an internal electrode type can be used as the apparatus, the former is more preferable since no polymer is produced on the electrodes. Next, in the present invention, if necessary, the thickness of the formed coating can be increased by subsequently placing the substrate on which the coating has been formed in a higher pressure atmosphere of fluoroalkene and/or fluoroalkane. Higher pressure is preferably 1-2 atm
The film thickness can be increased approximately 2 to 10 times by applying this pressure for approximately 0.5 to 10 hours. In the present invention, the strength and durability of the coating can be significantly improved by heat-treating the substrate on which the coating has been formed. The conditions for heat treatment can be selected depending on the heat resistance of the base material and the heat resistance of the fluorine-containing polymer compound, and the temperature can generally be selected in the range of 50 to 700℃, and the treatment time can be selected at lower temperatures within this temperature range. It is appropriate to shorten it as the temperature increases, and usually
It is preferable to set it as the range of about 0.5 seconds - 7 days. Heat resistance of the base material For example, when the softening point or decomposition temperature is below about 200℃, it is best to determine according to the heat resistance of the base material, and when the heat resistance of the base material is about 200℃ or above, it is better to determine according to the heat resistance of the base material. The heat treatment temperature and time are preferably selected according to the heat resistance of the compound. Specifically, if the base material is steel, it will be about 200 to 400℃, and if the base material is glass, it will be about 150 to 300℃.
℃, about 100-200℃ for polyester, about 150-300℃ for polyamide, about 50-300℃ for polyacrylate
The temperature is preferably about 150°C, and about 80 to 200°C for polyolefins. Although the heat treatment process can be performed in air, it is preferable to perform it in an inert gas such as nitrogen, helium, or argon. A polymer compound coating can be obtained. As described above, the present invention improves the properties of a fluorine-containing polymer compound coating formed by glow discharge, and it is possible to improve the properties of the fluorine-containing polymer compound coating by changing the raw materials and glow discharge polymerization conditions for forming the fluorinated polymer compound coating. It can be applied regardless of the type of substrate, and can be applied regardless of the type of substrate, except that the treatment temperature, treatment time, and if necessary, the treatment atmosphere are adjusted depending on the type of substrate. Next, the present invention will be explained with reference to Examples and Comparative Examples. In the following, the hardness, solvent resistance, and water resistance of the coating were measured by the following methods. 1. Hardness of the film: A base material on which a film with a thickness of 0.5 ± 0.1 μm has been formed is placed horizontally with the film side facing up, and placed on top of it so as not to move horizontally or rotate. A load of 200 g is applied to a polished steel ball with a diameter of 8 mm, which is fixed and whose weight including accessories is offset. Next, the coating surface was moved along a straight line in a horizontal plane for 20 mm at an average speed of 160 mm/min, and then it was visually observed whether the coating was damaged or not. The evaluation was based on the following criteria. 〇...There may be no scratches on the coating, or there may be scratches on the coating, but the coating will not be damaged.
The base material surface has not yet appeared. ×...The coating is damaged and the base material surface is exposed. 2 Solvent resistance The test object was exposed to the test liquid carbon tetrachloride or 1,
Sufficient contact is made using ultrasound for a predetermined time in 1,2-trichloro-1,2,2-trifluoroethane. Next, remove the test object from the test liquid,
After drying at 70-80°C for 1 hour, the contact angle of the film with water was measured. Ultrasonic contact was carried out using Pet Cleaner (manufactured by Ultrasonic Industry Co., Ltd.) at a frequency of 41 kHz and 35 W. The thickness of the coating was measured using Talystep (manufactured by Taylor Hobson), and the contact angle was measured using a goniometer (manufactured by Elma Optical Co., Ltd.). 3 Water resistance After immersing the test object in water for 24 hours, 70-80℃
After drying for 1 hour, the contact angle with water was measured. The contact angle was measured in the same manner as described above. Examples 1 to 8 and Comparative Example 1 A stainless steel plate (SUS-
304, length 100mm, width 50mm, thickness 1mm),
10STP of C2F4 gas after pumping down to 0.05Torr
Adjust the flow pressure to 0.15 Torr at cm 3 /min,
When 50W of 13.56MHz high-frequency power was applied to the electrode to generate plasma and treated for 30 minutes, the thickness
A film of 0.4 μm was formed. Next, the plasma reaction tube was filled with C 2 F 4 to atmospheric pressure and after 30 minutes, the thickness of the film became 0.6 μm. The stainless steel plate treated in this way was
Heat treatment was performed at a predetermined temperature and time in the atmosphere listed in the table. The results are shown in Table 1. Note that solvent resistance indicates the contact angle with water after washing in carbon tetrachloride for 15 minutes. Furthermore, as Comparative Example 1, the results were also shown where no heat treatment was performed.

【表】 試験例 1 実施例3および比較例1で得た被膜形成ステン
レス板をそれぞれ1,1,2−トリクロロ−1,
2,2−トリフルオロエタン中に30分間浸漬して
耐溶剤性を測定した。その結果を第2表に示す。
[Table] Test Example 1 The film-formed stainless steel plates obtained in Example 3 and Comparative Example 1 were treated with 1,1,2-trichloro-1,
Solvent resistance was measured by immersing the sample in 2,2-trifluoroethane for 30 minutes. The results are shown in Table 2.

【表】 実施例9〜11および比較例2 実施例1〜8と同様にして被膜を形成し試験を
行つた。ただし異なる点は、ステンレス板の代り
にアセトンで洗滌したガラス板(厚さ1mm、長さ
50mm、幅20mm)4枚を並べて入れプラズマ処理を
30分に代えて45分にした点である。尚、(a) 工程
後の被膜の厚さは0.4μmであり、(b) 工程後は
0.6μmであつた。結果を第3表に示す。
[Table] Examples 9 to 11 and Comparative Example 2 Films were formed and tested in the same manner as in Examples 1 to 8. However, the difference is that instead of the stainless steel plate, a glass plate (1 mm thick, length
50mm, width 20mm) are placed side by side and subjected to plasma treatment.
The difference is that the duration was changed to 45 minutes instead of 30 minutes. Note that (a) the thickness of the film after the process is 0.4 μm, and (b) the thickness of the film after the process is
It was 0.6 μm. The results are shown in Table 3.

【表】 実施例12および比較例3 ポリメチルメタクリレートシート(長さ50mm、
幅20mm、厚さ8mm)を用い、高周波電力を30W、
プラズマ処理を45分に代えた以外は実施例1〜8
と同様にして被膜を形成し、耐水性(24時間)を
測定した。結果を第4表に示す。
[Table] Example 12 and Comparative Example 3 Polymethyl methacrylate sheet (length 50 mm,
(width 20mm, thickness 8mm), high frequency power of 30W,
Examples 1 to 8 except that the plasma treatment was changed to 45 minutes
A film was formed in the same manner as above, and its water resistance (24 hours) was measured. The results are shown in Table 4.

【表】 実施例 13 実施例1において本発明の(b)工程に相当する膜
厚増大工程を省略した以外は実施例1と同様にし
て得た被膜形成ステンレス板は、その膜厚が0.3μ
mである以外は、被膜硬度、耐溶剤性及び耐水性
において実施例1と同一であつた。
[Table] Example 13 A film-formed stainless steel plate obtained in the same manner as in Example 1 except that the film thickness increasing step corresponding to step (b) of the present invention was omitted had a film thickness of 0.3μ.
The coating hardness, solvent resistance, and water resistance were the same as in Example 1, except that m.

Claims (1)

【特許請求の範囲】 1 (a) フルオロアルケン及び/又はフルオロア
ルカンの雰囲気中に基材を置いてグロー放電す
ることにより基材上に含フツ素高分子化合物被
膜を形成し、 (b) 必要に応じて、引き続いてフルオロアルケン
及び/又はフルオロアルカンのより高い圧力の
雰囲気に上記被膜を形成した基材を置くことに
よつて形成被膜の膜厚を増大させ、 (c) 次に上記被膜を形成した基材を熱処理するこ
とを特徴とする基材上に耐久性の優れた含フツ
素高分子化合物被膜を形成する方法。 2 基材が無機質基材である請求の範囲第1項に
記載の方法。 3 基材が有機質基材である請求の範囲第1項に
記載の方法。 4 不活性ガス中で熱処理を行う請求の範囲第1
項に記載の方法。
[Scope of Claims] 1 (a) A film of a fluorine-containing polymer compound is formed on a base material by placing the base material in an atmosphere of fluoroalkene and/or fluoroalkane and performing glow discharge, (b) Necessary (c) increasing the thickness of the formed coating by subsequently placing the coated substrate in a higher pressure atmosphere of fluoroalkenes and/or fluoroalkanes; A method for forming a highly durable fluorine-containing polymer compound coating on a substrate, which comprises heat-treating the formed substrate. 2. The method according to claim 1, wherein the base material is an inorganic base material. 3. The method according to claim 1, wherein the base material is an organic base material. 4 Claim No. 1 in which heat treatment is performed in an inert gas
The method described in section.
JP3325983A 1983-02-28 1983-02-28 Method for forming fluorine-containing polymer compound film Granted JPS59159806A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3325983A JPS59159806A (en) 1983-02-28 1983-02-28 Method for forming fluorine-containing polymer compound film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3325983A JPS59159806A (en) 1983-02-28 1983-02-28 Method for forming fluorine-containing polymer compound film

Publications (2)

Publication Number Publication Date
JPS59159806A JPS59159806A (en) 1984-09-10
JPH0314043B2 true JPH0314043B2 (en) 1991-02-25

Family

ID=12381509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3325983A Granted JPS59159806A (en) 1983-02-28 1983-02-28 Method for forming fluorine-containing polymer compound film

Country Status (1)

Country Link
JP (1) JPS59159806A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3326376A1 (en) * 1983-07-22 1985-01-31 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING GLIMP POLYMERISATE LAYERS
JPS61227978A (en) * 1985-03-29 1986-10-11 ジェイエスアール株式会社 Plasma polymerization film-covered ceramics product
JPS62111739A (en) * 1985-11-11 1987-05-22 株式会社クラレ Multilayer sheet-shaped structure and manufacture thereof
DE3739994A1 (en) * 1987-11-25 1989-06-08 Linde Ag METHOD FOR FLUORINATING PLASTIC OBJECTS

Also Published As

Publication number Publication date
JPS59159806A (en) 1984-09-10

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