Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0314220B2 - - Google Patents
[go: Go Back, main page]

JPH0314220B2 - - Google Patents

Info

Publication number
JPH0314220B2
JPH0314220B2 JP26922384A JP26922384A JPH0314220B2 JP H0314220 B2 JPH0314220 B2 JP H0314220B2 JP 26922384 A JP26922384 A JP 26922384A JP 26922384 A JP26922384 A JP 26922384A JP H0314220 B2 JPH0314220 B2 JP H0314220B2
Authority
JP
Japan
Prior art keywords
specific gravity
manganese nitrate
manganese
dioxide layer
aqueous solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP26922384A
Other languages
Japanese (ja)
Other versions
JPS61166020A (en
Inventor
Hirohisa Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP26922384A priority Critical patent/JPS61166020A/en
Publication of JPS61166020A publication Critical patent/JPS61166020A/en
Publication of JPH0314220B2 publication Critical patent/JPH0314220B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Thermistors And Varistors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明は固体電解コンデンサの製造方法に係
り、特に二酸化マンガン層形成工程に関する。 表面に誘電体として陽極酸化被膜が形成されて
なるアルミニウムやタンタルの箔や板を陽極素子
とし、これに二酸化マンガン層(MnO2)の固体
電解質を密接させて陰極とする固体電解コンデン
サの製造において、二酸化マンガン層を陽極素子
に密接させて形成する手段として、陽極素子が有
する複雑な空洞に硝酸マンガンの水溶液を含浸し
熱分解して二酸化マンガンに置換している。 しかし陽極素子の空洞に含浸する硝酸マンガン
溶液の比重が小さいと、一度の含浸と熱分解によ
り形成される二酸化マンガン層が薄く、含浸と熱
分解を多数繰り返す必要があり非能率的である。
しかも繰り返し熱を加えるため熱歪みによつて空
洞が破壊される。また陽極素子に含浸する硝酸マ
ンガン溶液の比重が大きいと、空洞の先端まで硝
酸マンガン溶液を含浸させることができない。 そこで少ない回数の含浸と熱分解によつて空洞
の先端にまで十分二酸化マンガン層を形成できる
方法の開発が望まれている。 〔従来の技術〕 第1図は陽極素子の断面を拡大した図、第2図
は硝酸マンガン溶液の比重および処理回数とtanδ
との関係を示す図、第3図は硝酸マンガン溶液の
比重および処理回数と静電容量との関係を示す図
である。 第1図において陽極素子1は表面積を拡大する
ために拡面処理が施されており、箔や板の内部に
形成された複雑な空洞2の表面に陽極酸化被膜3
が被着されている。単位面積当たりのコンデンサ
の静電容量を大きくするためには、二酸化マンガ
ンをこの空洞2の先端にまで充填する必要があ
る。そこで従来の二酸化マンガン層形成は同一比
重の硝酸マンガン溶液を用い、硝酸マンガン溶液
の含浸と熱分解を所定の特性が得られるまで繰り
返し行つている。 第2図は静電容量に寄与する実行表面積が見掛
けの表面積の70倍以上に拡大された陽極素子を用
い、従来の方法で二酸化マンガン層を形成した固
体電解コンデンサの、硝酸マンガン溶液の比重お
よび処理回数とtanδとの関係を示し、第3図はそ
のときの硝酸マンガン溶液の比重および処理回数
と静電容量の関係を示している。 同一比重の硝酸マンガン溶液を用いる従来の方
法において、tanδと静電容量を維持しながら処理
回数を最低限まで低減できる硝酸マンガン溶液の
比重は、第2図および第3図でも明らかなように
1.8が限度であり、比重が1.9になるとtanδが急増
し静電容量は急に減少する。 なお第1表は硝酸マンガン溶液の比重および処
理回数とリーク不良率との関係を示す表で、処理
回数とリーク不良率は硝酸マンガン溶液の比重が
高くなるに伴つて減少するが、比重1.8が限界で
比重が1.9になつても処理回数とリーク不良率は
減少しない。
[Industrial Field of Application] The present invention relates to a method for manufacturing a solid electrolytic capacitor, and particularly to a step of forming a manganese dioxide layer. In the production of solid electrolytic capacitors, an aluminum or tantalum foil or plate with an anodic oxide film formed on the surface as a dielectric is used as an anode element, and a solid electrolyte of manganese dioxide layer (MnO 2 ) is closely attached to this as a cathode. As a means of forming a manganese dioxide layer in close contact with an anode element, the complicated cavity of the anode element is impregnated with an aqueous solution of manganese nitrate, which is thermally decomposed and replaced with manganese dioxide. However, if the specific gravity of the manganese nitrate solution impregnated into the cavity of the anode element is small, the manganese dioxide layer formed by one-time impregnation and thermal decomposition will be thin, and the impregnation and thermal decomposition must be repeated many times, which is inefficient.
Furthermore, since heat is repeatedly applied, the cavity is destroyed due to thermal distortion. Furthermore, if the specific gravity of the manganese nitrate solution impregnated into the anode element is large, it is not possible to impregnate the manganese nitrate solution up to the tip of the cavity. Therefore, it is desired to develop a method that can sufficiently form a manganese dioxide layer up to the tip of the cavity by a small number of impregnations and thermal decomposition. [Prior art] Figure 1 is an enlarged cross-sectional view of an anode element, and Figure 2 shows the specific gravity of manganese nitrate solution, the number of treatments, and tanδ.
FIG. 3 is a diagram showing the relationship between the specific gravity of the manganese nitrate solution, the number of treatments, and the capacitance. In Fig. 1, an anode element 1 has been subjected to surface expansion treatment to increase its surface area, and an anodized film 3 is applied to the surface of a complex cavity 2 formed inside the foil or plate.
is covered. In order to increase the capacitance of the capacitor per unit area, it is necessary to fill the cavity 2 up to the tip with manganese dioxide. Therefore, conventional manganese dioxide layer formation uses a manganese nitrate solution having the same specific gravity, and repeats impregnation and thermal decomposition of the manganese nitrate solution until predetermined characteristics are obtained. Figure 2 shows the specific gravity of the manganese nitrate solution and The relationship between the number of treatments and tan δ is shown, and FIG. 3 shows the relationship between the specific gravity of the manganese nitrate solution at that time, the number of times of treatment, and capacitance. In the conventional method using a manganese nitrate solution with the same specific gravity, the specific gravity of the manganese nitrate solution can reduce the number of treatments to the minimum while maintaining tan δ and capacitance, as is clear from Figures 2 and 3.
The limit is 1.8, and when the specific gravity reaches 1.9, tanδ increases rapidly and capacitance decreases suddenly. Table 1 shows the relationship between the specific gravity of manganese nitrate solution, the number of treatments, and the leak defect rate.The number of treatments and the leak defect rate decrease as the specific gravity of the manganese nitrate solution increases, but when the specific gravity is 1.8, Even if the specific gravity reaches the limit of 1.9, the number of treatments and the leak defect rate do not decrease.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

第1表でも明らかなように同一比重の硝酸マン
ガン溶液を用いる従来の方法では、硝酸マンガン
溶液の比重を1.8より大きくし1.9にしても、リー
ク不良率を2%以下に減少させることができない
という問題がある。 〔問題点を解決するための手段〕 上記問題点は第一段階として比重1.8の硝酸マ
ンガンの水溶液を陽極素子に含浸し、硝酸マンガ
ンの水溶液を熱分解して二酸化マンガン層を形成
した後、第二段階として比重1.9の硝酸マンガン
の水溶液を陽極素子に含浸し、硝酸マンガンの水
溶液を熱分解して二酸化マンガン層を形成する、
本発明になる固体電解コンデンサの製造方法によ
つて解決される。 〔作用〕 比重1.8の硝酸マンガンの水溶液を用いて前半
の二酸化マンガン層を形成し、且つ比重1.9の硝
酸マンガンの水溶液を用いて後半の二酸化マンガ
ン層を形成することによつて、形成された二酸化
マンガン層が空洞の先端まで充填され且つ組成が
緻密になつて、tanδの急増や静電容量の急な減少
を招くことなくリーク不良率を大幅に低減するこ
とができる。 〔実施例〕 以下本発明の実施例について説明する。 二酸化マンガン層形成工程においてリーク不良
率を左右する要因として、熱硝酸による陽極酸化
被膜の腐食と陽極酸化被膜に発生する亀裂があ
る。一般に熱分解の過程で陽極酸化被膜が熱硝酸
に腐食される時間が短い程リーク不良率は小さ
い。即ち、陽極酸化被膜が熱硝酸に腐食される時
間は比重が1.8の硝酸マンガンの水溶液よりも、
比重が1.9の硝酸マンガンの水溶液を用いた場合
の方が短くリーク不良率も小さくなる。 しかるに比重1.9の硝酸マンガンの水溶液を陽
極素子に含浸し熱分解しても、陰極層として二酸
化マンガン層が付着するのは通常60%が限度であ
る。しかも平均口径数μmの空洞は先端部分の口
径が1μm以下になるため、含浸と熱分解を繰り
返しても1回目の処理で空洞の入り口が封鎖さ
れ、十分緻密な二酸化マンガン層を空洞の先端ま
で形成することができない。 即ち、空洞の先端まで二酸化マンガン層が形成
されないため、境界線で陽極酸化被膜に亀裂が生
じて地の金属箔や金属板と二酸化マンガン層が接
触し、リーク不良率が第1表に示す如く2%以下
に低減しない。しかも比重が1.8の硝酸マンガン
の水溶液の場合よりも第2図に示す如くtanδが大
きくなる。 一方、比重が1.8の硝酸マンガンの水溶液を用
いる従来の方法は、十分緻密な二酸化マンガン層
を空洞の先端まで形成できるためtanδが小さくな
るが、比重が1.9の硝酸マンガンの水溶液の場合
に比べ陽極酸化被膜が熱硝酸に腐食される時間は
長く、リーク不良率は第1表に示す如く2%を限
度としそれ以上向上することは無い。 そこで本発明になる二酸化マンガン層形成方法
は従来の形成方法と異なり、二酸化マンガン層の
形成を第一段階と第二段階に分けて行つている。
即ち、第1段階では空洞の先端まで十分緻密な二
酸化マンガン層を形成するために、比重が1.8の
硝酸マンガンの水溶液を用いた処理を2度繰り返
して行い、第二段階では陽極酸化被膜が熱硝酸に
腐食される時間を短縮するために、比重が1.9の
硝酸マンガンの水溶液を用いた処理を2度繰り返
して行つている。 このように二酸化マンガン層の形成を第一段階
と第二段階に分けて行うことによつて、比重が
1.8の硝酸マンガンの水溶液を用いた場合におけ
る利点と、比重1.9の硝酸マンガンの水溶液を用
いた場合における利点が加算され、形成された二
酸化マンガン層が空洞の先端まで充填され且つ組
成が緻密になつて、tanδの急増や静電容量の急な
減少を招くことなくリーク不良率を0.5%まで低
減することができる。 〔発明の効果〕 上述の如く本発明によればtanδの急増や静電容
量の急な減少を招くことなく、リーク不良率を
0.5%まで低減できる二酸化マンガン層形成方法
を提供することができる。
As is clear from Table 1, in the conventional method using manganese nitrate solutions with the same specific gravity, even if the specific gravity of the manganese nitrate solution is increased from 1.8 to 1.9, it is not possible to reduce the leak defect rate to 2% or less. There's a problem. [Means for solving the problem] The above problem can be solved by impregnating the anode element with an aqueous solution of manganese nitrate with a specific gravity of 1.8 as a first step, thermally decomposing the aqueous solution of manganese nitrate to form a manganese dioxide layer, and then As a second step, the anode element is impregnated with an aqueous solution of manganese nitrate having a specific gravity of 1.9, and the aqueous solution of manganese nitrate is thermally decomposed to form a manganese dioxide layer.
This problem is solved by the method of manufacturing a solid electrolytic capacitor according to the present invention. [Operation] By forming the first half manganese dioxide layer using an aqueous solution of manganese nitrate with a specific gravity of 1.8, and forming the second half manganese dioxide layer using an aqueous solution of manganese nitrate with a specific gravity of 1.9, the formed dioxide The manganese layer is filled up to the tip of the cavity and has a dense composition, making it possible to significantly reduce the leak defect rate without causing a sudden increase in tan δ or a sudden decrease in capacitance. [Examples] Examples of the present invention will be described below. Factors that affect the leak failure rate in the manganese dioxide layer forming process include corrosion of the anodic oxide film by hot nitric acid and cracks that occur in the anodic oxide film. Generally, the shorter the time during which the anodic oxide film is corroded by hot nitric acid during the thermal decomposition process, the lower the leak defect rate will be. In other words, the time it takes for an anodic oxide film to be corroded by hot nitric acid is longer than for an aqueous solution of manganese nitrate with a specific gravity of 1.8.
If an aqueous solution of manganese nitrate with a specific gravity of 1.9 is used, the time will be shorter and the leak failure rate will be smaller. However, even if an anode element is impregnated with an aqueous solution of manganese nitrate having a specific gravity of 1.9 and thermally decomposed, the amount of manganese dioxide layer deposited as a cathode layer is usually at most 60%. Furthermore, since the diameter of a cavity with an average diameter of several μm is less than 1μm at the tip, even if impregnation and thermal decomposition are repeated, the entrance to the cavity is sealed in the first treatment, and a sufficiently dense manganese dioxide layer is applied to the tip of the cavity. cannot be formed. In other words, since the manganese dioxide layer is not formed up to the tip of the cavity, cracks occur in the anodic oxide film at the boundary line, causing the manganese dioxide layer to come into contact with the underlying metal foil or metal plate, resulting in a leak failure rate as shown in Table 1. Do not reduce below 2%. Furthermore, as shown in FIG. 2, tan δ is larger than in the case of an aqueous solution of manganese nitrate with a specific gravity of 1.8. On the other hand, in the conventional method using an aqueous solution of manganese nitrate with a specific gravity of 1.8, a sufficiently dense manganese dioxide layer can be formed up to the tip of the cavity, resulting in a smaller tanδ. It takes a long time for the oxide film to be corroded by hot nitric acid, and the leak failure rate is limited to 2% as shown in Table 1 and cannot be improved any further. Therefore, the method for forming a manganese dioxide layer according to the present invention differs from conventional methods in that the formation of the manganese dioxide layer is performed in a first stage and a second stage.
That is, in the first stage, in order to form a sufficiently dense manganese dioxide layer up to the tip of the cavity, treatment using an aqueous solution of manganese nitrate with a specific gravity of 1.8 is repeated twice, and in the second stage, the anodic oxide film is heated In order to shorten the time required for corrosion by nitric acid, treatment using an aqueous solution of manganese nitrate with a specific gravity of 1.9 was repeated twice. By dividing the formation of the manganese dioxide layer into the first and second stages, the specific gravity can be reduced.
The advantages of using an aqueous solution of manganese nitrate with a specific gravity of 1.8 and the advantages of using an aqueous solution of manganese nitrate with a specific gravity of 1.9 are added, and the formed manganese dioxide layer fills up to the tip of the cavity and has a dense composition. As a result, the leak failure rate can be reduced to 0.5% without causing a sudden increase in tanδ or a sudden decrease in capacitance. [Effects of the Invention] As described above, according to the present invention, the leak failure rate can be reduced without causing a sudden increase in tanδ or a sudden decrease in capacitance.
A method for forming a manganese dioxide layer that can reduce the amount to 0.5% can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は陽極素子の断面を拡大した図、第2図
は硝酸マンガン溶液の比重および処理回数とtanδ
との関係を示す図、第3図は硝酸マンガン溶液の
比重および処理回数と静電容量との関係を示す
図、である。
Figure 1 is an enlarged cross-sectional view of the anode element, Figure 2 is the specific gravity of the manganese nitrate solution, the number of treatments, and tanδ.
FIG. 3 is a diagram showing the relationship between the specific gravity of the manganese nitrate solution, the number of treatments, and the capacitance.

Claims (1)

【特許請求の範囲】[Claims] 1 第一段階として比重1.8の硝酸マンガンの水
溶液を陽極素子に含浸し、該硝酸マンガンの水溶
液を熱分解して二酸化マンガン層を形成した後、
第二段階として比重1.9の硝酸マンガンの水溶液
を陽極素子に含浸し、該硝酸マンガンの水溶液を
熱分解して二酸化マンガン層を形成することを特
徴とした固体電解コンデンサの製造方法。
1. As a first step, the anode element is impregnated with an aqueous solution of manganese nitrate having a specific gravity of 1.8, and the aqueous solution of manganese nitrate is thermally decomposed to form a manganese dioxide layer.
A method for manufacturing a solid electrolytic capacitor, comprising impregnating an anode element with an aqueous solution of manganese nitrate having a specific gravity of 1.9 as a second step, and thermally decomposing the aqueous solution of manganese nitrate to form a manganese dioxide layer.
JP26922384A 1984-12-20 1984-12-20 Manufacture of solid electrolytic capacitor Granted JPS61166020A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26922384A JPS61166020A (en) 1984-12-20 1984-12-20 Manufacture of solid electrolytic capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26922384A JPS61166020A (en) 1984-12-20 1984-12-20 Manufacture of solid electrolytic capacitor

Publications (2)

Publication Number Publication Date
JPS61166020A JPS61166020A (en) 1986-07-26
JPH0314220B2 true JPH0314220B2 (en) 1991-02-26

Family

ID=17469375

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26922384A Granted JPS61166020A (en) 1984-12-20 1984-12-20 Manufacture of solid electrolytic capacitor

Country Status (1)

Country Link
JP (1) JPS61166020A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003234253A (en) * 2002-02-06 2003-08-22 Rohm Co Ltd Method for manufacturing solid electrolytic capacitor

Also Published As

Publication number Publication date
JPS61166020A (en) 1986-07-26

Similar Documents

Publication Publication Date Title
US3345543A (en) Solid electrolytic capacitor with anodized aluminum electrode and method of making
JP3748851B2 (en) Manufacturing method of capacitor element used for solid electrolytic capacitor
US3302074A (en) Capacitor with solid oxide electrolyte pyrolytically produced in wet atmosphere
JPH0314220B2 (en)
JPH0396210A (en) Manufacture of solid electrolytic capacitor
JP2000068160A (en) Ta SOLID ELECTROLYTIC CAPACITOR AND ITS MANUFACTURE
JP3119009B2 (en) Method for manufacturing solid electrolytic capacitor
JPH02267915A (en) Manufacture of solid-state electrolytic capacitor
JP3158448B2 (en) Method for manufacturing solid electrolytic capacitor
JP3750476B2 (en) Manufacturing method of solid electrolytic capacitor
JP2847001B2 (en) Manufacturing method of solid electrolytic capacitor
JP3150464B2 (en) Manufacturing method of solid electrolytic capacitor
JPH0338011A (en) Manufacture of solid electrolytic capacitor
JPH04137517A (en) Manufacture of solid electrolytic capacitor
JPH06132167A (en) Manufacture of solid electrolytic capacitor
JP3315714B2 (en) Method for manufacturing solid electrolytic capacitor
JPS62185307A (en) Solid electrolytic capacitor
JPS6258526B2 (en)
JP2772154B2 (en) Method for manufacturing solid electrolytic capacitor
KR200211021Y1 (en) Porous Tantalum Pellets of Tantalum Solid Electrolytic Capacitors
JP2949750B2 (en) Method for manufacturing solid electrolytic capacitor
JPS59115517A (en) Method of producing electrolytic condenser
JP2002222735A (en) Method for manufacturing solid-state electrolyte capacitor
JPH01105525A (en) Manufacture of solid electrolytic capacitor
JPH03252117A (en) Solid electrolytic capacitor