JPH031427U - - Google Patents
Info
- Publication number
- JPH031427U JPH031427U JP5945989U JP5945989U JPH031427U JP H031427 U JPH031427 U JP H031427U JP 5945989 U JP5945989 U JP 5945989U JP 5945989 U JP5945989 U JP 5945989U JP H031427 U JPH031427 U JP H031427U
- Authority
- JP
- Japan
- Prior art keywords
- heater
- vertical
- tweezers
- divided
- manufacturing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 230000003028 elevating effect Effects 0.000 claims 1
- 229910000953 kanthal Inorganic materials 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Landscapes
- Resistance Heating (AREA)
Description
第１図は本考案ヒータの一実施例の構成を示す
縦断正面図、第２図はその縦断側面図、第３図は
第２図の部の拡大側面図、第４図は本考案ヒー
タの概観図である。
１……縦形角形ヒータ、１ａ……前面ヒータ（
発熱体）、１ｂ……背面ヒータ（発熱体）、２…
…ウエーハ、３……昇降ツイーザ、４……均熱管
、５……反応管、６……断熱材、７……ヒータコ
イル、８……ガス導入管、９……ヒータ端板、１
０……ヒータ開口部、１１……ウエーハ保持溝。
Fig. 1 is a longitudinal sectional front view showing the configuration of one embodiment of the heater of the invention, Fig. 2 is a longitudinal sectional side view thereof, Fig. 3 is an enlarged side view of the part shown in Fig. 2, and Fig. 4 is a diagram of the heater of the invention. It is an overview diagram. 1...Vertical square heater, 1a...Front heater (
heating element), 1b... back heater (heating element), 2...
... Wafer, 3 ... Lifting tweezers, 4 ... Soaking tube, 5 ... Reaction tube, 6 ... Heat insulating material, 7 ... Heater coil, 8 ... Gas introduction pipe, 9 ... Heater end plate, 1
0...Heater opening, 11...Wafer holding groove.
Claims (1)
を２枚組合せ、ヒータ下部に角形のヒータ開口部
１０を有し、その他の面を密閉した構造とし、こ
のヒータ開口部１０より１枚または数枚のウエー
ハ２をウエーハ保持溝１１で保持した昇降ツイー
ザ３を昇降可能に設け、この昇降ツイーザ３の上
昇時にウエーハ２の面に平行に複数ゾーンに分割
された縦形角形ヒータ１を位置せしめると共に、
当該ヒータ１をウエーハ温度を均一に保つように
制御してなる縦形半導体製造装置用ヒータ。 (2) 各ゾーンのヒータ１はカンタル線をヒータ
素線とした電気抵抗ヒータである実用新案登録請
求の範囲第１項記載の縦形半導体製造装置用ヒー
タ。[Claims for Utility Model Registration] (1) Vertical square heater 1 divided into multiple zones
The heater opening 10 has a rectangular heater opening 10 at the bottom of the heater, and the other surfaces are sealed. The tweezers 3 are provided to be movable up and down, and when the elevating tweezers 3 are raised, the vertical rectangular heater 1 divided into a plurality of zones is positioned parallel to the surface of the wafer 2.
A heater for a vertical semiconductor manufacturing apparatus, in which the heater 1 is controlled to maintain a uniform wafer temperature. (2) The heater for a vertical semiconductor manufacturing apparatus according to claim 1, wherein the heater 1 in each zone is an electric resistance heater using Kanthal wire as a heater wire.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5945989U JPH031427U (en) | 1989-05-22 | 1989-05-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5945989U JPH031427U (en) | 1989-05-22 | 1989-05-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH031427U true JPH031427U (en) | 1991-01-09 |
Family
ID=31585968
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5945989U Pending JPH031427U (en) | 1989-05-22 | 1989-05-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH031427U (en) |
-
1989
- 1989-05-22 JP JP5945989U patent/JPH031427U/ja active Pending
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