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JPH0314787B2 - - Google Patents
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JPH0314787B2 - - Google Patents

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Publication number
JPH0314787B2
JPH0314787B2 JP14022383A JP14022383A JPH0314787B2 JP H0314787 B2 JPH0314787 B2 JP H0314787B2 JP 14022383 A JP14022383 A JP 14022383A JP 14022383 A JP14022383 A JP 14022383A JP H0314787 B2 JPH0314787 B2 JP H0314787B2
Authority
JP
Japan
Prior art keywords
rod
tube
optical fiber
layer
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP14022383A
Other languages
Japanese (ja)
Other versions
JPS6033225A (en
Inventor
Toshikazu Omae
Yoshinori Kikukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Cable Industries Ltd
Original Assignee
Mitsubishi Cable Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Cable Industries Ltd filed Critical Mitsubishi Cable Industries Ltd
Priority to JP14022383A priority Critical patent/JPS6033225A/en
Publication of JPS6033225A publication Critical patent/JPS6033225A/en
Publication of JPH0314787B2 publication Critical patent/JPH0314787B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/01205Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
    • C03B37/01225Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing
    • C03B37/01228Removal of preform material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/01205Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
    • C03B37/01211Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments by inserting one or more rods or tubes into a tube
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/01205Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
    • C03B37/01225Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing
    • C03B37/01248Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing by collapsing without drawing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Surface Treatment Of Glass (AREA)

Description

【発明の詳細な説明】 技術分野 本発明は、フツ酸溶液でロツドの表層を除去す
ること及びロツドとチユーブの被融着部を変性処
理することを特徴とする、ロツド・イン・チユー
ブ法に属する光フアイバ母材の製造法に関し、
OHイオン含有率の少ない母材を提供するもので
ある。 背景技術 石英系光フアイバにおいて、波長1.3μm帯の光
を伝送する場合OHイオン含有率が問題となる。
殊に光の実質的伝送路となるコア部は、吸収損失
を少なくするためOHイオン含有率の低いことが
強く要請される。一方、光フアイバ全体として
は、気泡、異物等による放射損失や散乱損失の少
ないことも必要な条件である。 従来、チユーブ内にロツドを装てんし加熱下に
両者を融着一体化せしめて光フアイバ母材を製造
するロツド・イン・チユーブ(RT)法が知られ
ている(特公昭41−第11071号公報)。この方法
は、製造効率、歩留り、得られる母材の寸法精
度、コア部の低編心性などの点ですぐれている
が、気泡や異物をその融着界面に残在させやすい
欠点を有している。他方、石英ガラス棒の軸方向
にガラス形成酸化物スートを順次堆積させ、これ
を酸水素バーナなどによつて加熱し、焼結させて
透明ガラス棒とする気相軸付け(VAD:Vapor
Phase Axial Deposition)方式も知られている
(特公昭54−第35217号公報)。しかし、得られた
透明ガラス棒は、OHイオン含有率の点で十分に
満足できるものでない。 発明の要旨 本発明者らは、上記したRT法及びVAD方式で
得たガラス棒の欠点を克服し、界面欠陥がなく、
かつ、OHイオン含有率の少ない光フアイバ母材
を得るために鋭意研究を重ねた結果、その目的を
達成しうる方法を見出し、本発明をなすに至つ
た。 すなわち、本発明は、気相軸付け方法で作製し
た石英系ガラスロツドをフツ酸溶液で処理してそ
の表層を30μm厚以上除去する第1工程、得られ
た処理ロツドを、内付け化学的気相沈着方式で形
成したドーパント含有石英ガラス層を内壁に有す
る石英系ガラスチユーブ内に装てんし、当該ロツ
ドとチユーブとの間に形成された空〓に酸素ガス
ないし不活性ガスのみを供給しつつ加熱して当該
ロツドとチユーブの被融着部を変性処理する第2
工程及び編成された当該ロツドとチユーブとを加
熱下に融着一体化する第3工程からなる光フアイ
バ母材の製造法を提供するものである。 従来、チユーブ内に装てんする石英系ガラスロ
ツドをその装てん前にフツ酸溶液で処理すること
及びロツドとチユーブの被融着部を変性処理する
ことは知られていた(特開昭55−第90434号公
報)。 しかし、そのフツ酸溶液による処理は、ロツド
に付着する汚れを取るためにロツドの表面を洗浄
することを目的とするものであつた。すなわち、
ロツドの表層を取除くための処理ではなかつた。
むしろ、内部への浸入力が強いフツ化水素ガスで
ロツドを処理したときには、波長1.3μm帯の光に
対する透過度の低下する場合が多々あり、したが
つて、フツ酸溶液による処理の場合にも、内部に
まで及ぶ処理は好ましくないと考えられていた。 また、上記の公報において提案されているロツ
ドとチユーブの変性処理は、酸素ガスとともに特
殊な処理剤を用いるものである。そこでは、むし
ろ、当該処理剤を併用しない酸素ガスのみによる
処理は、好結果が得られないとして排斥されてい
る。 本発明は、これらの従来好ましくないとされて
いた技術を組合せて適用したものであり、その結
果、予想外の効果を奏したものである。 発明の開示 (第1工程) 本発明の第1工程は、気相軸付け方法で作製し
た石英系ガラスロツドをフツ酸溶液で処理し、当
該ロツドの表層を30μm厚以上除去する工程であ
る。これにより、OHイオンによる吸収損失ある
いはOHイオンの起因する影響の少ないコア部を
形成するための石英系ガラスロツドを得ることが
できる。用いるフツ酸溶液は水溶液で十分であ
り、その濃度は、限定するものではないが、溶液
の取扱い性、処理操作性、処理効率性などの点で
10〜50重量%、なかんづく20〜30重量%が適当で
ある。処理操作は、フツ酸溶液中に当該ロツドを
浸漬する方式が作業性、除去層の制御性などの点
で有利である。この処理により除去する当該ロツ
ドの表層厚さは、30〜150μm、なかんづく50〜
100μmで十分である。この処理の対象となる石
英系ガラスロツドは、気相軸付け方式で作製され
たものであり、これは純石英ガラスよりなつてい
てもよいし、屈折率を変化させるために1種又は
2種以上のドーパントを含有するものであつても
よい。そのドーパントとしては、例えばP2O5
GeO2、TeO2、Sb2O3、TiO2、Al2O3、Ta2O5
Nb2O5、B2O3、Fなどをあげることができる。
また、前記ロツドは、最終目的の光フアイバにお
けるコアとなる部分のみからなるものであつても
よいし、その外周にクラツド層となる部分を有す
るものであつてもよい。さらに、ステツプ型光フ
アイバを与えるものであつてもよいし、グレーデ
ツド型光フアイバを与えるものであつてもよい。
加えて、前記ロツドは、その径が大きい場合フツ
酸溶液で処理するに先立つて、気相軸付け方式で
作製したものを加熱下に0.25〜0.5倍径に延伸し
たものであつてもよい。延伸してその径を8〜10
mmと細くしたものは、御続の第1〜3工程におけ
る作業を容易化し、ひいては良好な光フアイバ母
材を能率的に製造できる利点を有している。フツ
酸溶液で処理して得た処理ロツドは、純水洗浄、
超音波洗浄など公知の方式で洗浄されたのち、次
の第2工程におかれる。 (第2工程) 第2工程は、第1工程で得た処理ロツドを、内
付け化学的気相沈着方式で形成したドーパント含
有石英ガラス層を内壁に有する石英系ガラスチユ
ーブ内に装てんし、当該ロツドとチユーブとの間
に形成された空〓に酸素ガスないし不活性ガスの
みを供給しつつ加熱して当該ロツドとチユーブの
被融着部を変性処理する工程である。この変性処
理により、その界面に放射損失や散乱損失の原因
となる気泡などの欠陥をほとんど残存させずに、
当該ロツドとチユーブを融着一体化することが可
能になる。この工程において処理ロツドを装てん
するために用いる石英系ガラスチユーブは、その
内壁に内付け化学的気相沈着方式で形成されたド
ーパント含有石英ガラス層を有するものである。
そのドーパントとしては、上記した石英系ガラス
ロツドにおける場合と同様のものをあげることが
できる(特公昭51−23185号公報、特開昭50−
120352号公報、特開昭52−35654号公報など)。当
該チユーブは、実質的に最終目的物である光フア
イバにおけるクラツド層となるものであつてもよ
いし、サポート層あるいはクラツド層とサポート
層との両方となるものであつてもよい。したがつ
て前記したロツドとチユーブとを適当に組合せて
部分的に屈折率勾配を有するモデイフアイドステ
ツプ型の光フアイバを与える母材とすることも可
能である。なお、当該チユーブは、フツ酸溶液、
純水、超音波などの適宜な洗浄手段で処理し、表
面を洗浄にして用いることが好ましい。 また、この工程において用いる不活性ガスとし
てはヘリウムガス、ネオンガス、アルコンガスの
ような希ガスをあげることができる。 変性処理は、その温度が低過ぎると十分に変性
されないし、高過ぎると当該チユーブやロツドが
軟化変形したり、含有するドーパントが揮散した
り、含有ドーパントの分布状態が変化したりする
ので好ましくない。適当な変性処理温度は、当該
チユーブの外周面に基づいて1000〜1900℃、なか
んづく1200〜1400℃である。その加熱方式につい
ては、特に限定はなく、例えば当該ロツドとチユ
ーブを軸回転させながら、酸水素バーナなどを用
いてその加熱源を当該チユーブの軸方向にゆつく
りと往復ないし反復移動させる加熱源移動方式な
どをあげることができる。この場合、加熱源の移
動速度は、10〜500mm/分、なかんづく50〜300
mm/分が適当であり、当該ロツドとチユーブの回
転速度は、10〜100r.p.mが適当である。この条件
内であれば、ほとんどの場合に当該ロツドとチユ
ーブの円周方向にわたり均一温度に加熱すること
ができる。 本発明において変性処理とは、当該ロツドとチ
ユーブの間〓に供給するガスを供給し、その供給
下に当該ロツドとチユーブを外部より加熱し、被
融着部であるロツドの表面ないし表層及びチユー
ブの内壁に、これらを融着一体化する際良好な融
着界面が形成させるように変化を与えることをい
う。しかし、その変化の内容については十分に解
明されていない。本発明者らは、その変化を下記
のように考えている。すなわち、温度、ガス、ガ
ス圧及びロツド及又はチユーブ内の、殊にその表
層部のドーパントが相互作用して、被融着部の軟
質化、溶融年度低下あるいはロツド及びチユーブ
の被融着部の同質化が起り(変性)、各被融着部
の物理的ないし化学的親和性が増大する結果、融
着一体化に際して良好な界面が形成され、放射損
失、散乱損失の原因となる欠陥が生じないものと
考えられる。 変性処理は、当該ロツド及びチユーブのごく表
面層を変性するのみで十分に効果がある。処理所
要時間は、不活性ガスの圧力、流量などによつて
決定され、圧力が高いほど、流量が多いほど短い
傾向にある。その圧力が500〜1000mmHg、流量
が50〜2000ml/分の下で上記した加熱源移動方式
を適用した場合、通常1〜20回程度上記した移動
速度の範囲内で往復移動させることにより、変性
処理を行うことができる。変性処理が終ると、次
の第3工程に移る。 (第3工程) 第3工程は、変性処理された当該ロツドとチユ
ーブとの加熱して融着一体化させ、光フアイバ母
材の形態とする工程である。本発明においてこの
工程は、公知の方式により進めることができる。
例えば、当該ロツドとチユーブを両者の中心軸が
一致するように配置し、同期回転させながら酸水
素バーナなどを用いて、当該チユーブを1900〜
2300℃程度に加熱し、熱と炎圧でチユーブを潰
し、両者を融合密着せしめて一体化することによ
り行うことができる。 得られた光フアイバー母材からは、常法にした
がつて光フアイバを作製することができる。すな
わち、例えば当該母材を電気炉などを用いて約
2000℃程度に加熱し、10〜100m/分ほどの速度
で線引きし、外径50〜200μmほどの光フアイバ
とする。 発明の利点 本発明によれば、フツ酸溶液の処理して得た
OHイオンによる吸収損失のきわめて少ない石英
系ガラスロツドを、界面欠陥のほとんどない状態
に石英系ガラスチユーブで融着被覆することがで
きる。そして、得られた母材よりOHイオンによ
り吸収損失、気泡、異物等による放射損失、散乱
損失の著しく少ない光フアイバを得ることがで
き、したがつて、波長が1.3μm及びその付近の光
を伝送するフアイバを得るための方法として好適
である。 実施例、比較例 参考例 1 (CAD法によるグレーデツド系ロツドの作製) 同心五重官バーナを用い、中心部の第1層より
SiCl4:150ml/分、GeCl4:20ml/分、POCl3
5ml/分、Ar:500ml/分、第2層よりSiCl4
50ml/分、Ar:200ml/分、中間の第3層より
H2:4/分、第4層よりAr:1/分そして
最外部の第5層よりO2:6/分の条件で原料
ガスを供給し、火炎加水分解反応方式により生成
させたスートを種棒の先端に堆積成長させて、直
径60mm、長さ200mmの多孔質母材を調製した。 ついで、電気炉を用いて前記の多孔質母材を、
脱水材として酸素ガスを2モル%含有するヘリウ
ムガスを約10/分の割合で供給しながら1600℃
に加熱し、200mm/時間の速度で焼結して透明ガ
ラス体とし、ドーパントとしてGeを含有する直
径20mm、長さ100mm、屈折率(n20 Dmax)1.465の
グレーデツド型石英系ガラスロツドを得た。 参考例 2 (VAD法により擬似ステツプ系ロツドの作製) 第1層よりSiCl4:200ml/分、GeCl4:20ml/
分、POCl3:5ml/分、Ar:500ml/分、第2層
よりAr:200ml/分、第3層よりH2:4/分、
第4層よりAr:1/分、第5層よりO2:6
/分の条件で原料ガスを供給したほかは参考例
1と同様にしてGe(ドーパント)を含有する直径
18mm、長さ100mm、屈折率(n20 Dmax)1.465の擬
似ステツプ型石英系ガラスロツドを得た。 参考例 3 (内付CVD層付チユーブの作製) 外径20mm、厚さ1.5mm、屈折率(n20 D)1.452の石
英ガラスチユーブ内に、O2(800ml/分)、CCl2F2
(200ml/分)を供給し、酸水素バーナを150mm/
分の割合で移動させながら該チユーブを1200℃に
加熱し、その内面を平滑処理したのち、チユーブ
内に、SiCl4:240ml/分、SiF4:30ml/分
GeCl4:30ml/分、POCl3:10ml/分及びO2
1000ml/分、の条件で各原料ガスを供給し、酸水
素バーナを150mm/分の割合で移動させつつ1800
℃に加熱し、化学的気相沈着方法によるGe、F、
Pをドーパントとして含有し、屈折率(n20 D
1.450、厚さ1.6mmの内付CVD層を有する石英系ガ
ラスチユーブを得た。 参考例 4 原料ガスとしてSiCl4(240ml/分)、BF3(150
ml/分)を用い、加熱温度を1500℃としたほかは
参考例3と同様にしてB、Fをドーパントとして
含有し、屈折率(n20 D)1.450、厚さ1.6mmの内付
CVD層を有する石英系ガラスチユーブを得た。 実施例 1 参考例1と同様にして得たグレーデツド型ロツ
ドを酸水素バーナで約2000℃に加熱し、これを延
伸して直径が10mm(0.5倍径)のロツドとしたの
ち、これを25重量%フツ酸水溶液(室温)中に2
時間浸漬し、その表層約50μmを除去した。 次にこの処理ロツドを参考例3と同様にして得
たチユーブ内に同心的に装てんし、ロツドとチユ
ーブを80r.p.m.で同期的に軸回転させながら、酸
素ガス(室温で760mmHg)を800ml/分の流量で
ロツドとチユーブとの間に形成された空〓に連続
供給するとともに、酸水素バーナを150mm/分の
速度でチユーブに平行に5回反復移動させて外部
よりチユーブとロツドを加熱し、変性処理を行つ
た。なお、変性処理温度は、チユーブ外表面にお
いて1600℃(赤外線温度計)であつた。 ついで、変性処理後直ちにロツドとの同期回転
を続けるチユーブを酸水素バーナを用いて約2200
℃に加熱して潰し、ロツドとチユーブとを融着一
体化させて外径13mm(コア部10mm)の一次母材を
得、これを石英パイプで被覆して外径25mmの光フ
アイバ母材を得た。 この母材を電気炉により2100℃に加熱しながら
40m/分の速度で線引きし、コア径50μm、クラ
ツド装10μm、外径125μmの光フアイバとした。 得られた光フアイバの損失特性は、表のとおり
であつた。なお、散乱損失値はλ-4表示法による
損失特性曲線における波長0.7〜1.1μm間の直線
領域を波長無限大にまで外挿して得たものであ
り、波長に依存しない損失値(放射損失、散乱損
失)として評価される。また、波長0.95μmの光
の損失値(dB/Km)は、ほとんどそのままの数
値がコア部におけるOH基含率(ppm)として評
価することができる。 この結果より、OHイオンによる吸収損失、気
泡、異物等による放射損失、散乱損失が著しく少
ないことがわかる。 比較例 1 フツ素溶液で処理しないほかは実施例1と同様
にして、コア径50μm、クラツド挿10μm、外径
125μmの光フアイバを得た。その損失特性は表
のとおりであつた。この結果より、OHイオンに
よる吸収損失の多いことがわかる。 比較例 2 フツ酸溶液でロツドを表面洗浄(浸漬時間10
秒、除去層の厚さ3μm以下)したほかは、実施
例1と同様にしてコア径50μm、クラツド層10μ
m、外径125μmの光フアイバを得た。その損失
特性は表のとおりであつた。 比較例 3 変性処理を施さないほかは実施例1と同様にし
てコア径50μm、クラツド層10μm、外径125μm
の光フアイバを得た。その損失特性は表のとおり
であつた。この結果より、散乱損失、放射損失の
多いことがわかる。 実施例 2 フツ酸溶液による除去層を150μmとしたほか
は実施例1と同様にして、コア径50μm、クラツ
ド層10μm、外径125μmの光フアイバを得た。そ
の損失特性は表のとおりであつた。 実施例 3 ロツドを延伸処理せず、外径28mm、肉厚1.5mm、
内付CVD層1.5mmのチユーブを用いたほかは実施
例1と同様の条件でコア径100μm、クラツド層
8μm、外径150μmの光フアイバを得た。その損
失特性は表のとおりであつた。 比較例 4 内壁にCVD層を有しないチユーブを用いたほ
かは実施例1と同様にして、コア径50μm、外径
125μmの光フアイバを得た。その損失特性は表
のとおりであつた。 実施例 4 参考例2の擬似ステツプ型ロツドを0.56倍径
(直径10mm)に延伸して用いたほかは実施例1と
同様にしてコア径50μm、クラツド層10μm、外
径125μmの光フアイバを得た。その損失特性を
表に示した。 実施例 5 変性処理をヘリウムガス(1000ml/分)、1800
℃で行つたほかは実施例1と同様にして、同一寸
法の光フアイバを得た。その損失特性は表のとお
りであつた。 実施例 6 参考例4で得たチユーブを用い、変性処理をア
ルゴンガス(800ml/分)、1200℃で行つたほかは
実施例1と動じ条件で同一寸法の光フアイバを得
た。その損失特性は表のとおりであつた。
Detailed Description of the Invention Technical Field The present invention relates to a rod-in-tube method, which is characterized by removing the surface layer of the rod with a hydrofluoric acid solution and modifying the part to be fused between the rod and tube. Regarding the manufacturing method of the optical fiber base material,
This provides a base material with a low OH ion content. Background Art When transmitting light in the wavelength band of 1.3 μm in a silica-based optical fiber, the OH ion content becomes a problem.
In particular, the core portion, which serves as a substantial transmission path for light, is strongly required to have a low OH ion content in order to reduce absorption loss. On the other hand, it is also necessary for the optical fiber as a whole to have little radiation loss and scattering loss due to bubbles, foreign matter, etc. Conventionally, a rod-in-tube (RT) method has been known in which an optical fiber base material is produced by loading a rod into a tube and fusing and integrating the rods under heating (Japanese Patent Publication No. 11071-1971). ). Although this method is superior in terms of manufacturing efficiency, yield, dimensional accuracy of the obtained base material, and low knitting of the core, it has the disadvantage that air bubbles and foreign matter tend to remain at the fused interface. There is. On the other hand, vapor deposition (VAD) involves sequentially depositing glass-forming oxide soot in the axial direction of a quartz glass rod, heating it with an oxyhydrogen burner, etc., and sintering it to form a transparent glass rod.
A method (Phase Axial Deposition) is also known (Japanese Patent Publication No. 35217 of 1983). However, the obtained transparent glass rod is not fully satisfactory in terms of OH ion content. Summary of the Invention The present inventors have overcome the drawbacks of the glass rods obtained by the above-mentioned RT method and VAD method, and have no interfacial defects.
In addition, as a result of extensive research in order to obtain an optical fiber base material with a low OH ion content, we have discovered a method that can achieve this objective, and have completed the present invention. That is, the present invention includes a first step in which a silica-based glass rod produced by a vapor phase shafting method is treated with a hydrofluoric acid solution to remove the surface layer with a thickness of 30 μm or more; A dopant-containing quartz glass layer formed by a deposition method is placed in a quartz-based glass tube having an inner wall, and heated while supplying only oxygen gas or inert gas to the air space formed between the rod and the tube. The second step is to modify the parts of the rod and tube to be fused together.
The present invention provides a method for manufacturing an optical fiber base material, which comprises a third step of fusing and integrating the knitted rod and tube under heating. Conventionally, it has been known to treat a silica-based glass rod to be loaded into a tube with a hydrofluoric acid solution before loading it, and to modify the welded part of the rod and tube (Japanese Patent Laid-Open No. 90434/1983). Public bulletin). However, the purpose of the treatment with the hydrofluoric acid solution was to clean the surface of the rod in order to remove dirt adhering to the rod. That is,
The treatment was not intended to remove the surface layer of the rod.
On the contrary, when a rod is treated with hydrogen fluoride gas, which has a strong penetration force into the inside, the transmittance of light in the 1.3 μm wavelength band often decreases. , treatment that extended to the inside was considered undesirable. Further, the modification treatment of rods and tubes proposed in the above-mentioned publication uses a special treatment agent together with oxygen gas. Rather, treatment using oxygen gas alone without the treatment agent in combination is rejected because good results cannot be obtained. The present invention combines and applies these techniques that have been considered undesirable in the past, and as a result, has produced unexpected effects. DISCLOSURE OF THE INVENTION (First Step) The first step of the present invention is a step of treating a silica-based glass rod produced by a vapor phase shafting method with a hydrofluoric acid solution to remove the surface layer of the rod to a thickness of 30 μm or more. As a result, it is possible to obtain a silica-based glass rod for forming a core portion with less absorption loss due to OH ions or less influence caused by OH ions. An aqueous solution is sufficient as the hydrofluoric acid solution to be used, and its concentration is not limited, but should be determined in terms of ease of handling, processing operability, processing efficiency, etc.
10 to 50% by weight, especially 20 to 30% by weight is suitable. As for the treatment operation, a method in which the rod is immersed in a hydrofluoric acid solution is advantageous in terms of workability and controllability of the removed layer. The surface layer thickness of the rod to be removed by this treatment is 30 to 150 μm, especially 50 to 150 μm.
100 μm is sufficient. The silica-based glass rod to be subjected to this treatment is manufactured using the vapor phase axis attachment method, and may be made of pure silica glass or may be made of one or more types of glass to change the refractive index. It may contain a dopant of. Examples of the dopant include P 2 O 5 ,
GeO2 , TeO2 , Sb2O3 , TiO2 , Al2O3 , Ta2O5 ,
Examples include Nb 2 O 5 , B 2 O 3 and F.
Furthermore, the rod may consist only of a portion that will become the core of the final target optical fiber, or may have a portion that will become a cladding layer around its outer periphery. Further, it may be a step-type optical fiber or a graded-type optical fiber.
In addition, if the rod has a large diameter, it may be one that is produced by a vapor phase axis-setting method and stretched to a diameter of 0.25 to 0.5 times while heating, prior to treatment with a hydrofluoric acid solution. Stretch it to a diameter of 8 to 10
A fiber as thin as mm facilitates the work in the first to third steps, and has the advantage of efficiently producing a good optical fiber base material. The treated rods obtained by treatment with hydrofluoric acid solution are washed with pure water,
After being cleaned by a known method such as ultrasonic cleaning, it is subjected to the next second step. (Second Step) In the second step, the treated rod obtained in the first step is loaded into a quartz-based glass tube whose inner wall has a dopant-containing quartz glass layer formed by an internal chemical vapor deposition method. This is a process in which the welded portion of the rod and tube is modified by heating while supplying only oxygen gas or inert gas to the space formed between the rod and tube. This modification treatment leaves almost no defects such as bubbles that cause radiation loss or scattering loss at the interface.
It becomes possible to fuse and integrate the rod and tube. The quartz-based glass tube used to load the treatment rod in this process has a dopant-containing quartz glass layer formed by internal chemical vapor deposition on its inner wall.
As the dopant, the same ones as in the case of the above-mentioned silica-based glass rod can be mentioned (Japanese Patent Publication No. 51-23185, Japanese Patent Application Laid-Open No. 1983-1983).
120352, JP-A-52-35654, etc.). The tube may essentially serve as a cladding layer, a support layer, or both a cladding layer and a support layer in the final optical fiber. Therefore, it is also possible to appropriately combine the rods and tubes described above to form a base material that provides a modified step type optical fiber having a partially refractive index gradient. In addition, the tube contains a hydrofluoric acid solution,
It is preferable to treat the surface with an appropriate cleaning means such as pure water or ultrasonic waves before use. In addition, examples of the inert gas used in this step include rare gases such as helium gas, neon gas, and alcon gas. In the modification treatment, if the temperature is too low, the modification will not be sufficient, and if the temperature is too high, the tube or rod may be softened and deformed, the dopant contained therein may volatilize, or the distribution state of the dopant contained may change, which is undesirable. . A suitable modification temperature is 1000 to 1900°C, especially 1200 to 1400°C, based on the outer peripheral surface of the tube. There are no particular limitations on the heating method; for example, the heating source is moved slowly back and forth or repeatedly in the axial direction of the tube using an oxyhydrogen burner while rotating the rod and tube. I can list methods etc. In this case, the moving speed of the heating source is 10 to 500 mm/min, especially 50 to 300 mm/min.
mm/min is suitable, and the rotational speed of the rod and tube is suitably 10 to 100 rpm. Within these conditions, in most cases it is possible to heat the rod and tube to a uniform temperature over the circumferential direction. In the present invention, modification treatment refers to supplying a gas between the rod and tube, heating the rod and tube from the outside while supplying the gas, and heating the surface or surface layer of the rod and the tube as the welded parts. This refers to changing the inner wall of a material so that a good fusion interface is formed when these are fused and integrated. However, the content of this change has not been fully elucidated. The present inventors consider the change as follows. In other words, the temperature, gas, gas pressure, and dopant in the rod and/or tube, especially in the surface layer, interact to soften the part to be welded, reduce the melting age, or cause the part of the rod and tube to be welded to soften. As homogenization occurs (denaturation) and the physical or chemical affinity of each welded part increases, a good interface is formed during fusion and integration, and defects that cause radiation loss and scattering loss occur. It is thought that there is no such thing. The modification treatment is sufficiently effective by modifying only the very surface layer of the rods and tubes. The time required for processing is determined by the pressure, flow rate, etc. of the inert gas, and tends to be shorter as the pressure is higher and the flow rate is larger. When the heat source movement method described above is applied at a pressure of 500 to 1000 mmHg and a flow rate of 50 to 2000 ml/min, the denaturation treatment is normally performed by moving the heat source back and forth within the above-mentioned movement speed range about 1 to 20 times. It can be performed. When the denaturation treatment is completed, the next third step is carried out. (Third Step) The third step is a step in which the modified rod and tube are heated and fused together to form an optical fiber base material. In the present invention, this step can be carried out by a known method.
For example, place the rod and tube so that their central axes coincide, and use an oxyhydrogen burner while rotating them synchronously to heat the tube to 1900~
This can be done by heating the tube to about 2300℃, crushing the tube with heat and flame pressure, and fusing and adhering the two to form a single body. An optical fiber can be produced from the obtained optical fiber base material according to a conventional method. That is, for example, the base material is heated using an electric furnace or the like.
It is heated to about 2000°C and drawn at a speed of about 10 to 100 m/min to form an optical fiber with an outer diameter of about 50 to 200 μm. Advantages of the invention According to the present invention, the hydrofluoric acid solution obtained by treating
A quartz-based glass rod with extremely low absorption loss due to OH ions can be fused and coated with a quartz-based glass tube with almost no interface defects. From the obtained base material, it is possible to obtain an optical fiber that has extremely low absorption loss due to OH ions, radiation loss due to bubbles, foreign objects, etc., and scattering loss, and therefore transmits light with a wavelength of 1.3 μm and its vicinity. This method is suitable as a method for obtaining a fiber with Examples, Comparative Examples Reference Example 1 (Production of graded rod by CAD method) Using a concentric five-layer burner, from the first layer in the center
SiCl 4 : 150ml/min, GeCl 4 : 20ml/min, POCl 3 :
5ml/min, Ar: 500ml/min, SiCl 4 from the second layer:
50ml/min, Ar: 200ml/min, from the third layer in the middle
The raw material gas was supplied under the conditions of H 2 : 4/min, Ar from the 4th layer: 1/min, and O 2 : 6/min from the outermost 5th layer, and the soot produced by the flame hydrolysis reaction method was A porous matrix with a diameter of 60 mm and a length of 200 mm was prepared by depositing and growing on the tip of a seed rod. Then, using an electric furnace, the porous base material is
1600℃ while supplying helium gas containing 2 mol% oxygen gas as a dehydrating agent at a rate of approximately 10/min.
and sintered at a rate of 200 mm/hour to obtain a graded quartz-based glass rod containing Ge as a dopant and having a diameter of 20 mm, a length of 100 mm, and a refractive index (n 20 D max) of 1.465. . Reference example 2 (Preparation of pseudo step rod using VAD method) From the first layer, SiCl 4 : 200ml/min, GeCl 4 : 20ml/min
min, POCl 3 : 5 ml/min, Ar: 500 ml/min, Ar from the second layer: 200 ml/min, H 2 from the third layer: 4/min,
Ar from the 4th layer: 1/min, O 2 from the 5th layer: 6
The diameter containing Ge (dopant) was prepared in the same manner as in Reference Example 1 except that the raw material gas was supplied under the conditions of /min.
A pseudo-step type silica-based glass rod of 18 mm in length, 100 mm in length, and a refractive index (n 20 D max) of 1.465 was obtained. Reference example 3 (Preparation of tube with internal CVD layer) O 2 (800 ml/min), CCl 2 F 2 were placed inside a quartz glass tube with an outer diameter of 20 mm, a thickness of 1.5 mm, and a refractive index (n 20 D ) of 1.452.
(200ml/min) and oxyhydrogen burner to 150mm/min.
The tube was heated to 1200°C while being moved at a rate of 30 minutes, and the inner surface was smoothed, and then SiCl 4 : 240 ml/minute, SiF 4 : 30 ml/minute were added to the tube.
GeCl 4 : 30ml/min, POCl 3 : 10ml/min and O 2 :
Each raw material gas was supplied under the conditions of 1000ml/min, and the oxyhydrogen burner was moved at a rate of 150mm/min.
Ge, F, by chemical vapor deposition method by heating to °C.
Contains P as a dopant and has a refractive index (n 20 D )
A quartz-based glass tube with an internal CVD layer of 1.450 mm and a thickness of 1.6 mm was obtained. Reference example 4 SiCl 4 (240 ml/min), BF 3 (150 ml/min) as raw material gas
ml/min), the heating temperature was 1500°C, and the same procedure was used as in Reference Example 3, but the inner layer contained B and F as dopants, had a refractive index (n 20 D ) of 1.450, and a thickness of 1.6 mm.
A quartz-based glass tube with a CVD layer was obtained. Example 1 A graded rod obtained in the same manner as in Reference Example 1 was heated to about 2000°C with an oxyhydrogen burner, and stretched to make a rod with a diameter of 10 mm (0.5 times the diameter). 2% in aqueous hydrofluoric acid solution (room temperature)
The sample was immersed for a period of time, and about 50 μm of the surface layer was removed. Next, this treated rod was placed concentrically in a tube obtained in the same manner as in Reference Example 3, and while the rod and tube were rotated synchronously at 80 rpm, oxygen gas (760 mmHg at room temperature) was supplied at 800 ml/hour. The tube and rod were heated from the outside by continuously supplying the tube and rod at a flow rate of 150 mm/min to the air space formed between the rod and the tube, and by moving an oxyhydrogen burner repeatedly in parallel to the tube 5 times at a speed of 150 mm/min. , denaturation treatment was performed. The denaturation treatment temperature was 1600°C (infrared thermometer) on the outer surface of the tube. Immediately after the denaturation treatment, the tube, which continues to rotate synchronously with the rod, is heated for about 2200 m using an oxyhydrogen burner.
The rod and tube were heated to ℃ and crushed, and the rod and tube were fused and integrated to obtain a primary base material with an outer diameter of 13 mm (core part 10 mm), which was then covered with a quartz pipe to form an optical fiber base material with an outer diameter of 25 mm. Obtained. While heating this base material to 2100℃ in an electric furnace,
It was drawn at a speed of 40 m/min to obtain an optical fiber with a core diameter of 50 μm, a cladding of 10 μm, and an outer diameter of 125 μm. The loss characteristics of the obtained optical fiber were as shown in the table. Note that the scattering loss value is obtained by extrapolating the linear region between wavelengths 0.7 to 1.1 μm in the loss characteristic curve using the λ -4 display method to wavelength infinity, and is a loss value that does not depend on wavelength (radiation loss, scattering loss). Furthermore, the loss value (dB/Km) of light at a wavelength of 0.95 μm can be evaluated as the OH group content (ppm) in the core portion. The results show that absorption loss due to OH ions, radiation loss due to bubbles, foreign matter, etc., and scattering loss are significantly small. Comparative Example 1 A core diameter of 50 μm, a cladding insertion of 10 μm, an outer diameter of
A 125 μm optical fiber was obtained. Its loss characteristics were as shown in the table. This result shows that there is a large amount of absorption loss due to OH ions. Comparative example 2 Surface cleaning of rod with hydrofluoric acid solution (soaking time 10
The core diameter was 50 μm and the clad layer was 10 μm in the same manner as in Example 1, except that the thickness of the removed layer was 3 μm or less).
An optical fiber with an outer diameter of 125 μm was obtained. Its loss characteristics were as shown in the table. Comparative Example 3 Same as Example 1 except that no modification treatment was performed, core diameter 50 μm, cladding layer 10 μm, outer diameter 125 μm.
obtained optical fiber. Its loss characteristics were as shown in the table. This result shows that there are large scattering losses and radiation losses. Example 2 An optical fiber having a core diameter of 50 μm, a cladding layer of 10 μm, and an outer diameter of 125 μm was obtained in the same manner as in Example 1, except that the layer removed by the hydrofluoric acid solution was 150 μm. Its loss characteristics were as shown in the table. Example 3 The rod was not stretched, had an outer diameter of 28 mm, and a wall thickness of 1.5 mm.
The core diameter was 100 μm and the cladding layer was made under the same conditions as Example 1 except that a tube with an internal CVD layer of 1.5 mm was used.
An optical fiber with an outer diameter of 8 μm and an outer diameter of 150 μm was obtained. Its loss characteristics were as shown in the table. Comparative Example 4 A tube with a core diameter of 50 μm and an outer diameter of 50 μm was used, except that a tube without a CVD layer on the inner wall was used.
A 125 μm optical fiber was obtained. Its loss characteristics were as shown in the table. Example 4 An optical fiber with a core diameter of 50 μm, a cladding layer of 10 μm, and an outer diameter of 125 μm was obtained in the same manner as in Example 1, except that the pseudo step type rod of Reference Example 2 was stretched to 0.56 times the diameter (10 mm in diameter). Ta. The loss characteristics are shown in the table. Example 5 Denaturation treatment was performed using helium gas (1000ml/min) at 1800 ml/min.
An optical fiber having the same dimensions was obtained in the same manner as in Example 1 except that the temperature was 0.degree. The loss characteristics were as shown in the table. Example 6 Using the tube obtained in Reference Example 4, an optical fiber of the same size was obtained under the same conditions as Example 1, except that the modification treatment was carried out using argon gas (800 ml/min) at 1200°C. The loss characteristics were as shown in the table.

【表】【table】

【表】【table】

Claims (1)

【特許請求の範囲】 1 気相軸付け方式で作製した石英系ガラスロツ
ドをフツ酸溶液で処理してその表層を30μm厚以
上除去する第1工程、得られた処理ロツドを、内
付け化学的気相沈着方式で形成したドーパント含
有石英ガラス層を内壁に有する石英系ガラスチユ
ーブ内に装てんし、当該ロツドとチユーブとの間
に形成された空隙に酸素ガスないし不活性ガスの
みを供給しつつ加熱して当該ロツドとチユーブの
被融着部を変性処理する第2工程、及び変性され
た当該ロツドとチユーブとを加熱下に融着一体化
する第3工程からなる光フアイバ母材の製造法。 2 石英系ガラスロツドが、気相軸付け方式で作
製したのち0.25〜0.5倍径に延伸したものである
特許請求の範囲第1項記載の製造法。
[Claims] 1. The first step is to treat a silica-based glass rod produced by a vapor phase shafting method with a hydrofluoric acid solution to remove a surface layer of 30 μm or more. A dopant-containing quartz glass layer formed by a phase deposition method is placed in a quartz glass tube having an inner wall, and heated while supplying only oxygen gas or inert gas to the gap formed between the rod and tube. A method for producing an optical fiber base material, comprising: a second step of modifying the welded portions of the rod and tube; and a third step of integrating the modified rod and tube under heating. 2. The manufacturing method according to claim 1, wherein the quartz-based glass rod is produced by a vapor-phase axial method and then stretched to a diameter 0.25 to 0.5 times.
JP14022383A 1983-07-30 1983-07-30 Preparation of base material for optical fiber Granted JPS6033225A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14022383A JPS6033225A (en) 1983-07-30 1983-07-30 Preparation of base material for optical fiber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14022383A JPS6033225A (en) 1983-07-30 1983-07-30 Preparation of base material for optical fiber

Publications (2)

Publication Number Publication Date
JPS6033225A JPS6033225A (en) 1985-02-20
JPH0314787B2 true JPH0314787B2 (en) 1991-02-27

Family

ID=15263767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14022383A Granted JPS6033225A (en) 1983-07-30 1983-07-30 Preparation of base material for optical fiber

Country Status (1)

Country Link
JP (1) JPS6033225A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6428241A (en) * 1987-07-24 1989-01-30 Sumitomo Electric Industries Production of porous preform for optical fiber
EP1061054A1 (en) * 1999-06-18 2000-12-20 Lucent Technologies Inc. Method of making optical fiber by a rod-in tube process and fiber made by the method

Also Published As

Publication number Publication date
JPS6033225A (en) 1985-02-20

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