JPH0318389B2 - - Google Patents
Info
- Publication number
- JPH0318389B2 JPH0318389B2 JP56186354A JP18635481A JPH0318389B2 JP H0318389 B2 JPH0318389 B2 JP H0318389B2 JP 56186354 A JP56186354 A JP 56186354A JP 18635481 A JP18635481 A JP 18635481A JP H0318389 B2 JPH0318389 B2 JP H0318389B2
- Authority
- JP
- Japan
- Prior art keywords
- charge
- region
- shift register
- vertical shift
- transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/15—Charge-coupled device [CCD] image sensors
- H10F39/153—Two-dimensional or three-dimensional array CCD image sensors
Landscapes
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
Description
【発明の詳細な説明】
本発明は電荷転送装置を用いた撮像装置に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an imaging device using a charge transfer device.
電荷転送装置は固体撮像装置の特徴である小型
軽量,低消電力,高信頼性という観点から急速に
開発が進められている。 Charge transfer devices are being rapidly developed from the viewpoints of small size, light weight, low power consumption, and high reliability, which are characteristics of solid-state imaging devices.
しかし撮像装置として電荷転送装置の利害得失
を考えると、先に述べた固体撮像の利点の外に、
雑音,残像焼き付け等では現在使用されている撮
像管より優れているが、高集積化が困難であるた
め分解能に大きな問題を残している。 However, when considering the benefits and disadvantages of charge transfer devices as imaging devices, in addition to the advantages of solid-state imaging mentioned above,
Although it is superior to currently used image pickup tubes in terms of noise, afterimage burn-in, etc., it is difficult to achieve high integration, so there remains a major problem in resolution.
電荷転送装置を用いた撮像装置は、フレーム転
送方式,インターライン転送方式と呼ばれる方式
が開発されているが、本発明はインターライン転
送方式の電荷転送撮像装置に関するものである。 Imaging devices using charge transfer devices have been developed in systems called a frame transfer method and an interline transfer method, and the present invention relates to a charge transfer imaging device using an interline transfer method.
従来のインターライン転送方式による電荷転送
撮像装置は第1図に示すように同一電荷転送電極
群で駆動する複数列の垂直シフトレジスタ1と、
各垂直シフトレジスタの一側に隣接し、且つ互い
に電気的に分離され、マトリツクス状に配列され
た光変換部2と、垂直シフトレジスタと光電変換
部間の信号電荷を制御する転送電極3と、各垂直
シフトレジスタの一端に電気的に結合した電荷転
送水平シフトレジスタ4と、水平シフトレジスタ
の一端に信号電荷を検出する装置(出力部)5か
ら構成されている。 As shown in FIG. 1, a conventional charge transfer imaging device using an interline transfer method includes a plurality of columns of vertical shift registers 1 driven by the same charge transfer electrode group, and
A photoconversion section 2 adjacent to one side of each vertical shift register and electrically isolated from each other and arranged in a matrix; a transfer electrode 3 for controlling signal charges between the vertical shift register and the photoelectric conversion section; It consists of a charge transfer horizontal shift register 4 electrically coupled to one end of each vertical shift register, and a device (output section) 5 for detecting signal charges at one end of the horizontal shift register.
2相駆動インターライン転送方式の単位セルの
構成図を第2図aに示す。単位セルは光電変換部
1と、転送電極3と、バリヤ領域6とストレージ
領域7とからなる垂直シフトレジスタ1と、隣接
するセルを分離するため設けられたチヤネルスト
ツプ領域8とから構成されている。即ち水平方向
の1ピツチlの間に光電変換部2と、転送電極3
と、垂直シフトレジスタ1と、チヤネルストツプ
領域8との4つ領域で構成されている。インター
ライン転送方式で水平方向の解像度度を上げるた
め絵素数を増すためには、1ピツチlのまま絵素
数を単純に増すか、1ピツチlを小さくして増す
方法が考えられる。ピツチを変えずに絵素数を増
すとチツプ面積が増大し歩留り低下する。またピ
ツチlを小さくして絵素数を増加させるためには
光電変換部2と、転送電極3と、垂直シフトレジ
スタ1と、チヤネルストツプ領域8の4つ各領域
のパターン寸法を小さくしなければならない。パ
ターン寸法の微細化はプロセスと係りあつていて
パターン寸法法の微細化には限界がある。 A block diagram of a unit cell of the two-phase drive interline transfer method is shown in FIG. 2a. The unit cell is composed of a photoelectric conversion section 1, a transfer electrode 3, a vertical shift register 1 consisting of a barrier region 6 and a storage region 7, and a channel stop region 8 provided to separate adjacent cells. In other words, the photoelectric conversion unit 2 and the transfer electrode 3 are connected to each other during one pitch l in the horizontal direction.
It is composed of four areas: a vertical shift register 1, and a channel stop area 8. In order to increase the number of picture elements in order to increase the resolution in the horizontal direction using the interline transfer method, it is possible to simply increase the number of picture elements while keeping 1 pitch l, or to increase the number of picture elements by decreasing 1 pitch l. If the number of picture elements is increased without changing the pitch, the chip area will increase and the yield will decrease. Furthermore, in order to reduce the pitch l and increase the number of picture elements, it is necessary to reduce the pattern dimensions of each of the four regions: the photoelectric conversion section 2, the transfer electrode 3, the vertical shift register 1, and the channel stop region 8. The miniaturization of pattern dimensions is related to the process, and there is a limit to the miniaturization of pattern dimensions.
そこで単位セルを角度θだけ回転した場合を第
2図bに示す。水平方向のピツチはl′=lsinθとな
りsinθ≦1であることよりピツチl′はlより小さ
くなる。すなわち単位セルを角度θだけ回転して
マトリツクス状に配列すると同一チツプ内で水平
方向の寸法は縮まる。ところが垂直方向のピツチ
はm/sinθ(m:回転する前の垂直方向のピツチ)
となり増加し、垂直方向のチツプ寸法が増加し問
題となる。 Therefore, a case where the unit cell is rotated by an angle θ is shown in FIG. 2b. The pitch in the horizontal direction is l'=lsinθ, and since sinθ≦1, the pitch l’ is smaller than l. That is, when unit cells are rotated by an angle θ and arranged in a matrix, the horizontal dimension within the same chip is reduced. However, the vertical pitch is m/sinθ (m: vertical pitch before rotation)
This increases the chip size in the vertical direction, which becomes a problem.
本発明の目的は上記の欠点をなくした新しい構
造の固体撮像装置を提供することにある。 An object of the present invention is to provide a solid-state imaging device with a new structure that eliminates the above-mentioned drawbacks.
本発明によれば、半導体基板上に形成され、複
数の位相パルスで駆動できる複数の電荷転送電極
群と、前記複数の電荷転送電極群で駆動でき、電
荷蓄積領域と電過通過領域で構成され、互いに電
気的に分離された複数列の電荷転送を行う垂直シ
フトレジスタ群と、前記垂直シフトレジスタ間に
チヤネルストツプ手段によつて互いに電気的分離
され、マトリツクス状に配置され、電荷の蓄積が
可能な光電変換部と、光電変換部と前記電荷蓄積
領域の間に設けられた光電変換部で光電変換され
た電荷を前記電荷蓄積領域へ、転送する転送制御
部領域と、前記各垂直シフトレジスタの一端に電
気的に結合された電荷転送水平シフトレジスタ
と、前記水平シフトレジスタの一端に電荷検出装
置を有する電荷転送撮像装置において、前記光電
変換部と前記転送制御領域と前記垂直シフトレジ
スタの電荷通過領域と電荷蓄積領域とから成る第
N番目の単位セルが水平シフトレジスタに対し角
度を0゜<θ<90゜をもつてマトリクス状に配列さ
れると共に、上記垂直シフトレジスタの電荷通過
領域の下縁が第N番目の単位セルの垂直シフトレ
ジスタの電荷蓄積領域の上縁と一致し、かつこの
電荷通過領域の上縁が第(N−1)番目の単位セ
ルの垂直シフトレジスタの電荷蓄積領域の下縁と
も一致し、さらに垂直シフトレジスタが前記水平
レジスタに垂直となることを特徴とする電荷転送
撮像装置が得られる。 According to the present invention, a plurality of charge transfer electrode groups are formed on a semiconductor substrate and can be driven by a plurality of phase pulses, and a charge storage region and a current passing region can be driven by the plurality of charge transfer electrode groups. , a group of vertical shift registers that perform charge transfer in a plurality of columns that are electrically isolated from each other; and a group of vertical shift registers that are electrically isolated from each other by a channel stop means between the vertical shift registers, and are arranged in a matrix, and are capable of accumulating charges. a photoelectric conversion section, a transfer control section region that transfers charges photoelectrically converted in the photoelectric conversion section provided between the photoelectric conversion section and the charge accumulation region to the charge accumulation region, and one end of each of the vertical shift registers. a charge transfer horizontal shift register electrically coupled to a charge transfer horizontal shift register, and a charge detection device at one end of the horizontal shift register, the photoelectric conversion unit, the transfer control region, and the charge passing region of the vertical shift register; and a charge storage region are arranged in a matrix at an angle of 0° < θ < 90° with respect to the horizontal shift register, and the lower edge of the charge passing region of the vertical shift register. coincides with the upper edge of the charge accumulation region of the vertical shift register of the Nth unit cell, and the upper edge of this charge passing region coincides with the charge accumulation region of the vertical shift register of the (N-1)th unit cell. A charge transfer imaging device is obtained, characterized in that the vertical shift register is perpendicular to the horizontal register and also coincides with the lower edge.
次に本発明についてその実施例を示す図面を用
いて説明する。 Next, the present invention will be explained using drawings showing embodiments thereof.
第3図は本発明の固体撮像装置を説明するため
の構造模式図で、第4図は第3図の2つのセルを
示す本発明の拡大図、第5図は本発明の他実施例
である。 FIG. 3 is a schematic structural diagram for explaining the solid-state imaging device of the present invention, FIG. 4 is an enlarged view of the present invention showing two cells in FIG. 3, and FIG. 5 is a diagram showing another embodiment of the present invention. be.
インターライン転送方式の電荷転送撮像装置で
水平方向は光電変換部と、転送電極と、垂直シフ
トレジスタと、チヤネルストツプ領域との4つ領
域で構成されているため、水平方向の縮小は困難
である。しかし単位セルを角度θだけ回転させる
と水平方向にsinθ倍だけ縮小できるが、垂直方向
は1/sunθ倍に拡大されることは既に述べた。
インターライン転送方式の垂直方向は光電変換部
とチヤネルストツプ領域、または垂直シフトレジ
スタはバリヤ領域と、ストレージ領域とそれぞれ
2つの領域より構成されているので、水平方向と
比較して縮小が可能である。このことよりインタ
ーライン転送方式では単位セルを水平シフトレジ
スタに対して角度θだけ回転させ、垂直方向のパ
ターン寸法を縮小することにより、同一のチツプ
面積で水平方向の絵素数を増加させることが可能
である。第3図は従来のインターライン転送装置
を説明した第1図に対応するもので本発明の基本
的な構成を示すす模式図である。本発明の電荷転
送撮像装置は半導体基板上に形成され複数の位相
パルスで駆動できる複数の電荷転送電極群と、前
記複数の電荷転送電極群で駆動でき、且つ互いに
電気的に分離された3列の垂直シフトレジスタ
R1〜R3、と該垂直シフトレジスタ間にチヤネル
ストツプ11によつて互いに電気的に分離され、
3×3のマトリツクス状に配置され、電荷の蓄積
が可能な光電変換部P11〜P33と、垂直シフトレジ
スタと光電変換部の信号電荷転送を制御する転送
制御領域T11〜T33と、各垂直シフトレジスタR1
〜R3の一端に電気的に結合した電荷転送水平シ
フトレジスタと、水平シフトレジスタの一端に信
号電荷を検出する装置10から構成されている。
なお、第3図には図面が複雑となるため垂直シフ
トレジスタR1〜R3を駆動する電荷転送電極は省
略されている。本発明の電荷転送撮像装置におけ
る単位セルは例えば光電変換部P11と、転送制御
領域T11と、電荷通過領域11と、電荷蓄積領域S11
で構成されており、水平シフトレジスタに対して
角度θ1だけ回転して配置されていることが特徴で
ある。本発明の電荷転送撮像装置から撮像出力を
得るには、第3図において光電変換部P11〜P33で
入射光量に応じて蓄積した信号電荷を転送制御領
域T11〜T33を介してそれぞれ対応する垂直シフ
トレジスタの電荷蓄積領域S11〜S33に転送し、次
いで垂直シフトレジスタは順次転送すると共に、
水平シフトレジスタ9を通じて信号電荷を1水平
走査毎に読み出す。このようにすれば、水平シフ
トレジスタ9の出力部より目的の撮像出力が得ら
れる。 Since an interline transfer type charge transfer imaging device consists of four regions in the horizontal direction: a photoelectric conversion section, a transfer electrode, a vertical shift register, and a channel stop region, it is difficult to reduce the size in the horizontal direction. However, as already mentioned, if the unit cell is rotated by an angle θ, it can be reduced by a factor of sin θ in the horizontal direction, but it is enlarged by a factor of 1/sun θ in the vertical direction.
Since the vertical direction of the interline transfer method consists of a photoelectric conversion section and a channel stop region, or a vertical shift register is composed of two regions each, a barrier region and a storage region, it can be reduced in size compared to the horizontal direction. Therefore, in the interline transfer method, by rotating the unit cell by an angle θ with respect to the horizontal shift register and reducing the vertical pattern dimension, it is possible to increase the number of pixels in the horizontal direction with the same chip area. It is. FIG. 3 corresponds to FIG. 1 illustrating a conventional interline transfer device, and is a schematic diagram showing the basic configuration of the present invention. The charge transfer imaging device of the present invention includes a plurality of charge transfer electrode groups that are formed on a semiconductor substrate and can be driven by a plurality of phase pulses, and three rows that can be driven by the plurality of charge transfer electrode groups and that are electrically separated from each other. vertical shift register
R 1 to R 3 and the vertical shift register are electrically isolated from each other by a channel stop 11;
Photoelectric conversion units P 11 to P 33 arranged in a 3×3 matrix and capable of accumulating charges, and transfer control regions T 11 to T 33 that control signal charge transfer between the vertical shift register and the photoelectric conversion units; Each vertical shift register R 1
It consists of a charge transfer horizontal shift register electrically coupled to one end of ~ R3 , and a device 10 for detecting signal charges at one end of the horizontal shift register.
Note that charge transfer electrodes for driving the vertical shift registers R 1 to R 3 are omitted in FIG. 3 because the drawing is complicated. The unit cell in the charge transfer imaging device of the present invention includes, for example, a photoelectric conversion section P11 , a transfer control region T11 , a charge passing region 11 , and a charge accumulation region S11.
It is characterized by being rotated by an angle θ 1 with respect to the horizontal shift register. In order to obtain an imaging output from the charge transfer imaging device of the present invention, in FIG . The charges are transferred to the charge storage regions S 11 to S 33 of the corresponding vertical shift registers, and then the vertical shift registers sequentially transfer the charges, and
Signal charges are read out every horizontal scan through the horizontal shift register 9. In this way, the desired imaging output can be obtained from the output section of the horizontal shift register 9.
本発明の構成模式図第3図を拡大したものを第
4図に示す。単位セルは光電変換部P32と、転送
領域T12と、垂直シフトレジスタの電荷蓄積領域
S22と、垂直シフトレジスタの電荷通過領域B32
と、チヤネルストツプ領域12とで構成されてい
る。単位セルは水平シフトレジスタと角度θ1だけ
回転させており、垂直方向に関して垂直シフトレ
ジスタの電荷通過領域B22の寸法を小さくしてい
る。垂直シフトレジスタの電荷通過領域B22は垂
直シフトレジスタの電荷蓄積領域S22と電荷蓄積
領域S32との信号電荷の通過領域としているため、
チヤネル幅、チヤネル長とも小さくできる。この
ため同一のチツプサイズにおいて、本構造を用い
ることにより水平方向の絵素数を増加することが
できる。また電荷通過領域B32の上縁は、単位セ
ルを回転しても前段の垂直シフトレジスタの電荷
蓄積領域S22の下縁に一致させる必要があり垂直
シフトレジスタが水平シフトレジスタに対し垂直
に配置されていることも必要である。信号電荷が
垂直に転送されない場合、撮像出力に異常をきた
すことになる。第4図に示す垂直シフトレジスタ
は同じ転送電極で電荷通過領域B32と、電荷蓄積
領域S32とより構成されている。電荷通過領域B32
のチヤネル幅が狭められていると狭チヤネル効果
により異に電荷通過領域B32のチヤネル電位は電
荷蓄積積領域のチヤネル電位より浅くなるためバ
リヤ領域の働きをして信号電荷転送の方向性が出
てくる。即ち2相駆動で動作させることができ
る。また2相駆動の電荷転送の方向性をつけるた
め電荷通過領域を基板半導体と異つた導電型で形
成しても良い。駆動は2相だけでなく1〜n相で
も駆動できる。 FIG. 4 shows an enlarged version of FIG. 3, which is a schematic diagram of the structure of the present invention. The unit cell consists of the photoelectric conversion section P32 , the transfer region T12 , and the charge storage region of the vertical shift register.
S 22 and vertical shift register charge passing area B 32
and a channel stop region 12. The unit cell is rotated by an angle θ 1 with respect to the horizontal shift register, and the size of the charge passing region B 22 of the vertical shift register is reduced in the vertical direction. Since the charge passing region B 22 of the vertical shift register is a passing region for signal charges between the charge accumulation region S 22 and the charge accumulation region S 32 of the vertical shift register,
Both channel width and channel length can be made smaller. Therefore, with the same chip size, by using this structure, the number of picture elements in the horizontal direction can be increased. Furthermore, even if the unit cell is rotated, the upper edge of the charge passing region B 32 must match the lower edge of the charge accumulation region S 22 of the vertical shift register in the previous stage, so that the vertical shift register is arranged perpendicularly to the horizontal shift register. It is also necessary that the If the signal charges are not transferred vertically, an abnormality will occur in the imaging output. The vertical shift register shown in FIG. 4 is composed of a charge passing region B 32 and a charge storage region S 32 using the same transfer electrode. Charge passing area B 32
When the channel width is narrowed, the channel potential of the charge passing region B32 becomes shallower than the channel potential of the charge storage accumulation region due to the narrow channel effect, which acts as a barrier region and improves the directionality of signal charge transfer. It's coming. That is, it can be operated with two-phase drive. Further, in order to improve the directionality of charge transfer in two-phase drive, the charge passing region may be formed of a conductivity type different from that of the substrate semiconductor. It can be driven not only in two phases but also in 1 to n phases.
第5図は本発明の他のセル形状の実施例を示す
構成模式図である。単位セルは光電変換部P11と
転送領域T11,垂直シフトレジスタの電荷蓄積領
域S11と、垂直シフトレジスタの電荷通過領域B11
と、チヤネルストツプ領域11とで構成されてい
る。第3図お異る点は光電変換部のセル形状を楕
円形にすることにより、高密度した時感度が低下
することができるだけ少くできる形状にしたとい
うことである。この様に単位セルが、第3図に示
す矩形のセル形状だけでなく、他の単位セル形状
についても本発明の実施が可能である。 FIG. 5 is a schematic structural diagram showing an embodiment of another cell shape of the present invention. The unit cell includes a photoelectric conversion section P 11 , a transfer region T 11 , a charge storage region S 11 of a vertical shift register, and a charge passing region B 11 of a vertical shift register.
and a channel stop region 11. The difference from FIG. 3 is that the cell shape of the photoelectric conversion section is made into an ellipse so that the drop in sensitivity at high density can be minimized. In this way, the present invention can be practiced not only when the unit cell has a rectangular cell shape as shown in FIG. 3, but also when the unit cell has other shapes.
尚本発明において、単位セルの水平シフトレジ
スタに対する角度θは45゜のとき最も理想的にな
るが、0゜<θ<90゜において好ましい結果が得ら
れる。また、半導体基板はN型,P型でもよく、
光電変換部はMOS型キヤパシタ,P−N接合で
も良く、垂直シフトレジスタは表面チヤネル型,
埋込みチヤネル型でも全く変りない動作が実現で
きる。 In the present invention, the angle θ of the unit cell with respect to the horizontal shift register is most ideal when it is 45°, but preferable results are obtained when 0°<θ<90°. Further, the semiconductor substrate may be of N type or P type,
The photoelectric conversion section may be a MOS type capacitor or a P-N junction, and the vertical shift register may be a surface channel type.
Even with the embedded channel type, the same operation can be achieved.
第1図は従来の電荷転送撮像装置の構成図、第
2図は本発明の原理を説明するための図、第3図
は本発明によるる電荷転送撮像装置の構造模式
図、第4図は第3図の部分的拡大図、第5図は他
の応用例を示す。
図において、1……垂直シフトレジスタ、2…
…光電変換部、3……転送電極、4……水平シフ
トレジスタ、5……出力部、6……バリヤ領域、
7……ストレージ領域、8……チヤネルストツプ
領域、9……水平シフトレジスタ、10……出力
部、11……チヤネルストツプ領域、12……チ
ヤネルストツプ領域、13,14……垂直シフト
レジスタの転送電極、15……チヤネルストツプ
領域、16……水平シフトレジスタ、17……出
力部、P11〜P33……光電変換部、S11〜S33……垂
直シフトレジスタの電荷蓄積領域、B11〜B33…
…垂直シフトレジスタの電荷通過領域、T11〜
T33…光電変換部から垂直シフトレジスタの電荷
蓄積領域への転送制御領域である。
FIG. 1 is a block diagram of a conventional charge transfer imaging device, FIG. 2 is a diagram for explaining the principle of the present invention, FIG. 3 is a schematic structural diagram of a charge transfer imaging device according to the present invention, and FIG. 4 is a diagram for explaining the principle of the present invention. A partially enlarged view of FIG. 3 and FIG. 5 show another example of application. In the figure, 1...vertical shift register, 2...
... Photoelectric conversion section, 3 ... Transfer electrode, 4 ... Horizontal shift register, 5 ... Output section, 6 ... Barrier region,
7... Storage area, 8... Channel stop area, 9... Horizontal shift register, 10... Output section, 11... Channel stop area, 12... Channel stop area, 13, 14... Transfer electrode of vertical shift register, 15 ... Channel stop region, 16 ... Horizontal shift register, 17 ... Output section, P 11 to P 33 ... Photoelectric conversion section, S 11 to S 33 ... Charge storage region of vertical shift register, B 11 to B 33 ...
...Charge passing region of vertical shift register, T 11 ~
T33 ...Transfer control area from the photoelectric conversion unit to the charge storage area of the vertical shift register.
Claims (1)
で駆動できる複数の電荷転送電極群と、前記複数
の電荷転送電極群で駆動でき、電荷蓄積領域と電
荷通過領域で構成され、互いに電気的に分離され
た複数列の電荷転送を行う垂直シフトレジスタ群
と、前記垂直シフトレジスタ間にチヤネルストツ
プ手段によつて互いに電気的分離され、マトリク
ス状に配置され、電荷の蓄積が可能な光電変換部
と、光電変換部と前記電荷蓄積領域の間に設けら
れ光電変換部で光電変換された電荷を前記電荷蓄
積領域へ転送する転送制御領域と、前記各垂直シ
フトレジスタの一端に電気的に結合された電荷転
送水平シフトレジスタと、前記水平シフトレジス
タの一端に電荷検出装置を有する電荷転送撮像装
置において、前記光電変換部と前記転送制御領域
と前記垂直シフトレジスタの電荷通過領域と電荷
蓄積領域とから成る第N番目の単位セルが水平シ
フトレジスタに対し角度を0゜<θ<90゜をもつて
マトリクス状に配列されると共に、上記垂直シフ
トレジスタの電荷通過領域の下縁が第N番目の単
位セルの垂直シフトレジスタの電荷蓄積領域の上
縁と一致し、かつこの電荷通過領域の上縁が第
(N−1)番目の単位セルの垂直シフトレジスタ
の電荷蓄積領域の下縁と一致し、さらに垂直シフ
トレジスタが前記水平レジスタに垂直となること
を特徴とする電荷転送撮像装置。1 A charge transfer electrode group formed on a semiconductor substrate that can be driven by a plurality of phase pulses, and a charge storage region and a charge passage region that can be driven by the plurality of charge transfer electrode groups and are electrically separated from each other. a group of vertical shift registers that perform charge transfer in a plurality of columns; a photoelectric conversion unit that is electrically isolated from each other by a channel stop means between the vertical shift registers, is arranged in a matrix, and is capable of accumulating charges; a transfer control region that is provided between the conversion section and the charge storage region and transfers the charge photoelectrically converted in the photoelectric conversion section to the charge storage region; and a charge transfer region that is electrically coupled to one end of each of the vertical shift registers. In a charge transfer imaging device having a horizontal shift register and a charge detection device at one end of the horizontal shift register, an N-th charge transfer imaging device comprising the photoelectric conversion section, the transfer control region, and a charge passing region and a charge accumulation region of the vertical shift register. The Nth unit cells are arranged in a matrix at an angle of 0° < θ < 90° with respect to the horizontal shift register, and the lower edge of the charge passing area of the vertical shift register is perpendicular to the Nth unit cell. The upper edge of the charge accumulation region of the shift register coincides with the upper edge of this charge passing region, and the upper edge of this charge passing region coincides with the lower edge of the charge accumulation region of the vertical shift register of the (N-1)th unit cell, and the vertical shift A charge transfer imaging device characterized in that a register is perpendicular to the horizontal register.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56186354A JPS5888976A (en) | 1981-11-20 | 1981-11-20 | Charge transfer image pickup device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56186354A JPS5888976A (en) | 1981-11-20 | 1981-11-20 | Charge transfer image pickup device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5888976A JPS5888976A (en) | 1983-05-27 |
| JPH0318389B2 true JPH0318389B2 (en) | 1991-03-12 |
Family
ID=16186890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56186354A Granted JPS5888976A (en) | 1981-11-20 | 1981-11-20 | Charge transfer image pickup device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5888976A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS613575A (en) * | 1984-06-18 | 1986-01-09 | Victor Co Of Japan Ltd | Solid-state image pickup device |
| US5488239A (en) * | 1994-07-14 | 1996-01-30 | Goldstar Electron Co., Ltd. | Solid state image sensor with shaped photodiodes |
| US5793071A (en) * | 1996-09-27 | 1998-08-11 | Kabushiki Kaisha Toshiba | Solid-State imaging device |
| US6037643A (en) * | 1998-02-17 | 2000-03-14 | Hewlett-Packard Company | Photocell layout for high-speed optical navigation microchips |
-
1981
- 1981-11-20 JP JP56186354A patent/JPS5888976A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5888976A (en) | 1983-05-27 |
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