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JPH0319313B2 - - Google Patents
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JPH0319313B2 - - Google Patents

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Publication number
JPH0319313B2
JPH0319313B2 JP4362485A JP4362485A JPH0319313B2 JP H0319313 B2 JPH0319313 B2 JP H0319313B2 JP 4362485 A JP4362485 A JP 4362485A JP 4362485 A JP4362485 A JP 4362485A JP H0319313 B2 JPH0319313 B2 JP H0319313B2
Authority
JP
Japan
Prior art keywords
plating
zinc
ions
acid
protein hydrolyzate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4362485A
Other languages
Japanese (ja)
Other versions
JPS61204390A (en
Inventor
Motonobu Kubo
Mitsuyasu Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uemera Kogyo Co Ltd
Original Assignee
Uemera Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uemera Kogyo Co Ltd filed Critical Uemera Kogyo Co Ltd
Priority to JP4362485A priority Critical patent/JPS61204390A/en
Publication of JPS61204390A publication Critical patent/JPS61204390A/en
Publication of JPH0319313B2 publication Critical patent/JPH0319313B2/ja
Granted legal-status Critical Current

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Description

【発明の詳现な説明】[Detailed description of the invention]

産業䞊の利甚分野 本発明は酢酞むオン、硌酞を含たず、塩玠むオ
ン無含有又は䜎濃床の酞性亜鉛め぀き液を甚いお
め぀きする方法に関する。 埓来技術及びその問題点 最近、塩玠むオンを高濃床で含む酞性亜鉛め぀
き液に代えお、硫酞亜鉛を亜鉛源ずする塩玠むオ
ン無含有又は䜎濃床の酞性亜鉛め぀き液が装眮を
腐食せず、たた高濃床塩玠むオンによる公害䞊の
問題がないずいう点から泚目されおいる。 しかしながら、埓来より、硫酞亜鉛め぀き液
は、光沢剀成分ずしおペプトンやデキストリンな
どが甚いられおいるが、この皮の光沢剀成分を含
んだ硫酞亜鉛め぀き液から埗られため぀き被膜の
光沢やレベリング性は、他の酞性亜鉛め぀き液、
特に塩化亜鉛め぀き液を甚いお埗られため぀き被
膜の光沢やレベリング性に比べお非垞に劣り、こ
のためその甚途も光沢、レベリング性が十分でな
い䞊に、぀きたわりも悪いので、鋌板の亜鉛め぀
きに甚いられる皋床であり、䞀般の装食め぀きに
は䞍適圓であ぀た。 たた、通垞この皮の酞性亜鉛め぀き液には酢酞
ナトリりム、硌酞等のPH緩衝剀が含たれおいるの
で、廃氎凊理に際しおPHを䞊げるずめ぀き液䞭の
酢酞むオンが亜鉛等ず錯塩を生じ、たたこれらの
むオンはCODを䞊昇させるなどの廃氎凊理䞊の
問題が生じる。たた、硌酞も同様に廃氎凊理䞊の
問題がある。だが、これら酢酞むオン、硌酞の二
者を同時に含有しおいない酞性亜鉛め぀き液は、
PH緩衝䜜甚がなく、たため぀き被膜を粗雑化させ
たり、高電流密床郚分に焌けを生じさせたり等の
め぀き䞍良を起こさせる。このため、埓来は酞性
亜鉛め぀き液に酢酞むオン、硌酞の少なくずも
皮は含有させおいるものである。 発明の抂芁 本発明者は、䞊蚘事情に鑑み、塩玠むオンを含
有しないか又は50dl以䞋の䜎濃床で䜿甚する
酞性亜鉛め぀き液においお、酢酞むオン、硌酞の
いずれもが含有しなくずも良奜なPH緩衝䜜甚を有
する䞊、め぀き䞍良が生ぜず、光沢、レベリング
性及び぀きたわりの良奜な酞性亜鉛め぀き被膜が
埗られる酞性亜鉛電気め぀き方法に぀き鋭意怜蚎
を行な぀た結果、亜鉛むオンdl以䞊を含有
し、しかも塩玠むオンを含たないか又は50dl
以䞋の濃床で含む酞性亜鉛め぀き液に察し、アミ
ノカルボン酞又はその塩を奜たしくはdl以
䞊ず、アミノ酞ずしおグリシン、ヒドロキシプロ
リン及びプロリンを含む蛋癜質加氎分解物を奜た
しくはdl以䞊ずを添加しため぀き液を甚い
おめ぀きを行な぀た堎合、意倖にもペプトンなど
を添加した堎合には埗られない優れた光沢、レベ
リング性、぀きたわり性が発揮されるず共に、酢
酞むオン、硌酞が党く存圚しおいなくずも良奜な
PH緩衝䜜甚を有し、か぀硌酞などを甚いる堎合よ
りもめ぀き被膜が均䞀ずなり、高電流密床郚分も
焌けが生じ難く、良奜なめ぀き被膜が埗られるこ
ずを知芋し、本発明をなすに至぀たものである。 以䞋、本発明に぀き曎に詳しく説明する。 発明の構成 本発明に係る酞性亜鉛め぀き方法は、亜鉛むオ
ンdl以䞊ず、塩玠むオン〜50dlず、
アミノカルボン酞又はその塩ず、アミノ酞ずしお
グリシン、ヒドロキシプロリン及びプロリンを含
む蛋癜質加氎分解物ずを含有し、酢酞むオン䞊び
に硌酞を含有しない酞性亜鉛め぀き液を甚いお被
め぀き物を電気め぀きするこずを特城ずするもの
である。 ここで、本発明に甚いるめ぀き液を構成する亜
鉛むオンの䟛絊源ずしおは、硫酞亜鉛が奜たしく
甚いられるが、これに制限されない。なお、本発
明においおは酢酞むオンは甚いないものであるか
ら、酢酞亜鉛は䜿甚しない。亜鉛むオンの含有量
は䞊述したようにめ぀き液圓り以䞊であ
るが、奜たしくは〜140、より奜たしくは20
〜60である。 たた、本発明は塩玠むオンを党く添加せずにめ
぀きを行なうこずができるが、塩玠むオンを䜎濃
床で添加しおもよい。塩玠むオンを含有させる堎
合、塩化亜鉛を甚いるずきはこれから䟛絊される
ものであるが、䞍足しおいる堎合、或いは塩化亜
鉛を甚いない堎合は塩化カリりム、塩化ナトリり
ム等によ぀お䟛絊するこずができる。その含有量
はめ぀き液圓り50以䞋の量であるが、奜た
しくは〜35、より奜たしくは10〜25であ
る。 本発明め぀き液には、曎にアミノカルボン酞又
はその塩を加えるもので、これにより䞊述したよ
うに塩玠むオン無含有又は䜎濃床系においお酢酞
むオン、硌酞を含たなくずも良奜なめ぀きが行な
われるものである。この堎合、アミノカルボン酞
ずしおはグリシン、アラニン、セリン、システむ
ン、グルタミン酞、リシン、チロシン、トリプト
フアン、β−アラニン、アミノ安息銙酞などが挙
げられるが、特にアラニン、グルタミン酞が奜適
に甚いられる。たた、アミノカルボン酞塩ずしお
はこれらアミノカルボン酞のナトリりム等が甚い
られる。 なお、本発明においおは、アミノカルボン酞や
その塩は皮を単独で甚いおも皮以䞊を䜵甚す
るようにしおもよい。 アミノカルボン酞やその塩の含有量はめ぀き液
圓り奜たしくは以䞊であり、曎に奜たし
くは〜20である。本発明によればアミノカル
ボン酞類の配合量がこのように少なくずも、特定
のアミノ酞を含む蛋癜質加氎分解物ずの䜵甚効果
により、PH緩衝䜜甚が良奜であり、か぀埗られる
め぀き被膜が粗雑化したり、高電流密床郚分に焌
けが生じるこずもなく、良奜なめ぀き被膜が埗ら
れ、本発明の目的が達成される。 本発明に甚いるめ぀き液には、曎にアミノカル
ボン酞及び又はその塩ず共に特定のアミノ酞を
含む加氎分解物を添加するものであり、これによ
り本発明め぀き液のPH緩衝䜜甚、め぀き被膜の性
状を良奜なものずするこずができ、高電流密床郚
分から䜎電流密床郚分にる党おの郚分をより確実
に均䞀で平滑な析出状態にし埗、高電流密床郚分
における焌けの発生を顕著に防止するこずができ
る。 ここで本発明の蛋癜質加氎分解物は埓来より知
られおいる蛋癜質加氎分解物ずは若干異なるもの
である。即ち、埓来より知られおいる蛋癜質加氎
分解物のうち、分子量の倧きいものはペプトン、
分子量の小さいものはポリペプタむドず呌ばれ、
それぞれ区別されおいる。ここで、ペプトンは硫
酞亜鉛め぀き济に光沢剀ずしお䜿甚するこず、こ
れがリレベリング䜜甚を若干有しおいるこずは知
られおいるが、その䜜甚は䞍十分であ぀お優れた
性質を有するめ぀き被膜はこのペプトンを䜿甚し
おも埗られない。 本発明の蛋癜質加氎分解物は皮々のアミノ酞を
含有するものであ぀お、アミノ酞ずしおはグリシ
ン、アラニン、セリン、スレオオニン、プロリ
ン、ヒドロキシプロリン、バリン、む゜ロむシ
ン、ロむシン、プニルアラニン、チロシン、メ
チオニン、アスパラギン酞、グルタミン酞、アル
ギニン、ヒスチゞン、リゞン、ヒドロキシリゞ
ン、トリブトフアンなどが挙げられ、これらアミ
ノ酞のうちで、本発明の蛋癜質加氎分解物䞭には
必ずグリシン、ヒドロキシプロリン及びプロリン
を含有するこずが必芁であり、䟋えばヒドロキシ
プロリンを含有しない蛋癜質加氎分解物を䜿甚し
た堎合には、め぀き被膜に察する䜜甚効果は著し
く劣り、埓来のペプトンを䜿甚しお埗られた皋床
の効果しか埗られない。 この際、加氎分解物䞭のグリシン、ヒドロキシ
プロリン及びプロリンの合蚈含有量は20〜80
重量、以䞋同じであるこずが奜たしく、特
には40〜60であるこずが望たしい。 本発明の蛋癜質加氎分解物は前蚘のようにアミ
ノ酞類を含有するものであるが、分子量ずしお
250〜50000、特に、800〜10000のものが奜たし
い。 たた、蛋癜質加氎分解物の含有量はめ぀き液
圓り奜たしくは0.1以䞊であり、曎に奜たし
くは0.1〜10である。 本発明においおは、これら添加剀に加えお曎に
ポリ゚ヌテル系非むオン掻性剀、芳銙族カルボン
酞、基を有する化合物アルデヒド、ケト
ンの皮、奜たしくは党郚を添加するこずが有
効であり、なおたたスルホン酞塩系アニオン掻性
剀、カルボキシ系又はむミダゟリン系䞡性掻性剀
の少なくずも皮を添加するこずも䞀局有効であ
り、これにより高電流密床郚分の析出状態を曎に
改良するこずができる。 ここで、ポリ゚ヌテル系非むオン掻性剀ずしお
は、 (1) −−CH2CH2Oo は又は炭玠数〜20のアルキル基、
〜60 (2) は又は炭玠数〜20のアルキル基、
〜60 (3) 10〜70 (4) ポリオキシ゚チレンポリプロピレングリコヌ
ルブロツクポリマヌ PPG分子量500〜3000EO含有量20〜
80wt (5) ポリオキシ゚チレン倚䟡アルコヌル脂肪族゚
ステル EO付加量〜50mol などが挙げられ、その添加量は〜10dl、特
に0.05〜10dl、より望たしくは0.5〜dl
ずするこずが奜たしい。 たた、芳銙族カルボン酞塩ずしおは安息銙酞
塩、サルチル酞塩、−クロル安息銙酞塩、
−ゞクロル安息銙酞塩、桂皮酞塩等が挙げ
られ、その添加量は〜10dl、特に0.05〜10
dl、より望たしくは0.5〜dlずするこ
ずが奜たしい。 曎に、基を有する化合物アルデヒド、
ケトンを䟋瀺するず、ベンゞリデンアセトン、
ケむ皮アルデヒド、クロルベンズアルデヒド、ゞ
クロルベンズアルデヒド、フルフラヌルアセトン
等の芳銙族カルボニル化合物及びむ゜ブチルメチ
ルケトン、メチルビニルケトン等の脂肪族ケトン
などが挙げられ、その添加量は〜dl、特
に0.005〜dl、より望たしくは0.005〜0.2
dlずするこずが奜たしい。 たた曎に、スルホン酞塩系アニオン掻性剀、カ
ルボキシ系又はむミダゟリン系䞡性掻性剀ずしお
はゞアルキルスルホこはく酞塩、アルキルナフタ
レンスルホン酞塩、ナフタレンスルホン酞塩ホル
マリン瞮合物、−ゞメチル−−アルキル
−−カルボキシアルキレンアンモニりムベタむ
ン、−アルキル−−ヒドロキシ゚チル−−
カルボキシメチルむミダゟリニりム塩等が挙げら
れ、スルホン酞塩系アニオン掻性剀の添加量は
〜dl、特に0.05〜dl、より望たしく
は0.2〜0.5dlが奜たしく、たた䞡性掻性剀の
添加量は〜dl、特に0.05〜dl、よ
り望たしくは0.5〜1.0dlずするこずが奜たし
い。 なお、本発明に甚いるめ぀き液のPHは2.5〜
6.5、特に4.5〜5.5ずするこずが奜たしい。 䞊述しため぀き液を甚いおめ぀きを行なう堎
合、被め぀き物の皮類等に制限はなく、適宜な前
凊理を行な぀た埌、亜鉛め぀きが斜こされる。こ
の堎合、め぀き条件は皮々倉曎可胜であるが、通
垞め぀き枩床は15〜40℃、特に20〜35℃、陰極電
流密床は0.1〜5Am2、特に0.5〜3Am2の
条件が採甚される。め぀き液の攪拌は必ずしも必
芁ずしないが、カ゜ヌドロツカヌ、空気による攪
拌などが採甚され埗る。たた、陜極板には亜鉛を
䜿甚するこずが奜たしい。なお、め぀き時間は所
望するめ぀き膜厚により適宜遞定される。 なおたた、本発明め぀き法はバレルめ぀き法を
採甚しお行なうこずもできる。 め぀き埌は、必芁によりクロメヌト凊理、その
他の埌凊理を行なうこずができる。 発明の効果 本発明方法は、亜鉛むオンをdl以䞊含有
するず共に、塩玠むオンを含たないか又は50dl
以䞋の濃床で含み、か぀アミノカルボン酞又は
その塩ず、アミノ酞ずしおグリシン、ヒドロキシ
プロリン及びプロリンを含む蛋癜質加氎分解物ず
を含有し、酢酞むオン䞊びに硌酞を含有しない酞
性亜鉛め぀き液を甚いお被め぀き物を電気め぀き
するこずを特城ずするもので、本発明法によ぀お
埗られため぀き被膜は、均䞀でなめらかな倖芳を
有し、クロメヌト被膜の密着性も良奜であり、た
た本発明に甚いるめ぀き液は酢酞むオン、硌酞を
含たないので廃氎凊理が容易に行なわれるもので
あり、埓来の酢酞むオン、硌酞を含む硫酞亜鉛め
぀き法等の塩玠むオン無含有又は䜎濃床系の酞性
亜鉛め぀き液に代えお奜適に採甚されるものであ
る。 以䞋、比范䟋ず実斜䟋、比范䟋ずを瀺し、本発
明を曎に具䜓的に説明するが、本発明は䞋蚘実斜
䟋に制限されるものではない。 なお、䜿甚した蛋癜質加氎分解物及びの組
成重量を以䞋に瀺す。 蛋癜質コラヌゲン加氎分解物 グリシン 20.9 アラニン 8.8 プロリン 13.8 ヒドロキシプロリン 12.2 アスパラギン酞 5.8 グルタミン酞 10.0 アルギニン 7.9 リゞン 3.9 その他 残 100.0 蛋癜質カれむン加氎分解物 リゞン 7.0 アルギニン 2.8 アスパラギン酞 6.6 グルタミン酞 18.1 プロリン 9.0 グリシン 1.8 アラニン 2.8 その他 残 100.0 〔参考䟋〕 䞋蚘組成 ZoSO4・7H2O 300 Na2SO4 30 〃 ホり酞 30 〃 蛋癜質加氎分解物又は  〃 PH 3.5 の酞性亜鉛め぀き液を䜜成し、ハルセル詊隓噚を
甚いおめ぀き被膜の倖芳を調べた。 め぀き被膜の倖芳 陰極ずしお脱脂、酞掗した10cm×cmのみがき
鋌板を䜿甚し、電流2A、時間10分、液枩25℃に
おいおハルセル詊隓を行ない、埗られため぀き被
膜の倖芳を評䟡した。 結果を第衚に瀺す。
INDUSTRIAL APPLICATION FIELD The present invention relates to a method of plating using an acidic zinc plating solution that does not contain acetate ions or boric acid, and does not contain chlorine ions or has a low concentration. Prior art and its problems Recently, instead of the acidic zinc plating solution containing high concentration of chlorine ions, an acidic zinc plating solution that does not contain chlorine ions or has a low concentration and uses zinc sulfate as the zinc source has been introduced, which does not corrode the equipment. It is also attracting attention because there are no pollution problems caused by high concentrations of chlorine ions. However, conventionally, zinc sulfate plating solutions have used peptone, dextrin, etc. as brightener components, but the luster of the matte film obtained from zinc sulfate plating solutions containing these types of brightener components has decreased. The leveling properties are different from other acidic galvanizing solutions,
In particular, the gloss and leveling properties of the plating film obtained using zinc chloride plating solution are very inferior to those obtained using zinc chloride plating solution. It was only used for plating and was unsuitable for general decorative plating. In addition, this type of acidic zinc plating solution usually contains pH buffering agents such as sodium acetate and boric acid, so when the pH is increased during wastewater treatment, acetate ions in the plating solution form complex salts with zinc, etc. These ions also cause problems in wastewater treatment, such as increasing COD. In addition, boric acid similarly has problems in wastewater treatment. However, acidic zinc plating solutions that do not contain both acetate ion and boric acid at the same time,
It has no PH buffering effect, and causes plating defects such as roughening of the glare film and burning in high current density areas. For this reason, conventionally, at least one of acetate ions and boric acid was added to the acidic zinc plating solution.
The seeds are what is contained. Summary of the Invention In view of the above circumstances, the present inventor has discovered that an acidic zinc plating solution that does not contain chlorine ions or is used at a low concentration of 50 dl/lower has good properties even if it does not contain either acetate ions or boric acid. As a result of intensive research into an acid zinc electroplating method that has a PH buffering effect, does not cause plating defects, and provides an acid zinc plating film with good gloss, leveling properties, and coverage, we found that zinc ion 8dl / or more and does not contain chlorine ions or 50dl/
To an acidic galvanizing solution containing the following concentration, preferably 1 dl/or more of an aminocarboxylic acid or its salt and preferably 1 dl/or more of a protein hydrolyzate containing glycine, hydroxyproline, and proline as amino acids are added. Surprisingly, when plating is performed using a staining solution, excellent gloss, leveling and throwing power that cannot be obtained when peptone is added, and acetate ions and boric acid are removed. It's good even if it doesn't exist at all
It has been found that it has a PH buffering effect, and that the plating film is more uniform than when using boric acid or the like, and that burns are less likely to occur even in high current density areas, and a good plating film can be obtained, which led to the creation of the present invention. It is something. The present invention will be explained in more detail below. Structure of the Invention The acidic galvanizing method according to the present invention includes zinc ions of 8 dl/or more, chlorine ions of 0 to 50 dl/,
Electroplating of a plated object using an acidic zinc plating solution containing an aminocarboxylic acid or a salt thereof and a protein hydrolyzate containing glycine, hydroxyproline, and proline as amino acids and not containing acetate ions or boric acid. It is characterized by: Here, as a source of zinc ions constituting the plating solution used in the present invention, zinc sulfate is preferably used, but the source is not limited thereto. In addition, since acetate ion is not used in the present invention, zinc acetate is not used. As mentioned above, the content of zinc ions is 8 g or more per plating solution, preferably 8 to 140 g, more preferably 20 g
~60g. Further, in the present invention, plating can be performed without adding any chlorine ions, but chlorine ions may be added at a low concentration. When containing chloride ions, when zinc chloride is used, it is supplied from this, but if it is insufficient or when zinc chloride is not used, it can be supplied with potassium chloride, sodium chloride, etc. . The content thereof is 50 g or less per plating solution, preferably 5 to 35 g, more preferably 10 to 25 g. The plating solution of the present invention further contains an aminocarboxylic acid or a salt thereof, and as a result, good plating can be achieved in a chloride-free or low-concentration system without acetate ions or boric acid, as described above. It is. In this case, examples of the aminocarboxylic acid include glycine, alanine, serine, cysteine, glutamic acid, lysine, tyrosine, tryptophan, β-alanine, and aminobenzoic acid, with alanine and glutamic acid being particularly preferred. Furthermore, as the aminocarboxylic acid salt, sodium of these aminocarboxylic acids and the like can be used. In the present invention, the aminocarboxylic acids and their salts may be used alone or in combination of two or more. The content of aminocarboxylic acid or its salt is preferably 1 g or more, more preferably 5 to 20 g per plating solution. According to the present invention, even if the blended amount of aminocarboxylic acids is at least as above, the PH buffering effect is good due to the combined effect with a protein hydrolyzate containing a specific amino acid, and the resulting plated film is not roughened. Therefore, a good plated film is obtained without causing burning in the high current density portion, and the object of the present invention is achieved. The plating solution used in the present invention is further added with a hydrolyzate containing a specific amino acid along with an aminocarboxylic acid and/or its salt, which improves the PH buffering effect of the plating solution of the present invention and the plating film. It is possible to improve the properties of the film, ensure that all parts from the high current density part to the low current density part are in a uniform and smooth deposition state, and significantly reduce the occurrence of burns in the high current density part. It can be prevented. The protein hydrolyzate of the present invention is slightly different from conventionally known protein hydrolysates. That is, among the conventionally known protein hydrolysates, those with large molecular weights are peptone,
Those with small molecular weight are called polypeptides.
Each is distinct. Here, peptone is used as a brightening agent in a zinc sulfate plating bath, and although it is known that it has a slight leveling effect, this effect is insufficient and it has excellent properties. A sticky coating cannot be obtained using this peptone. The protein hydrolyzate of the present invention contains various amino acids, and the amino acids include glycine, alanine, serine, threonine, proline, hydroxyproline, valine, isoleucine, leucine, phenylalanine, tyrosine, methionine, and asparagine. Among these amino acids, the protein hydrolyzate of the present invention must necessarily contain glycine, hydroxyproline, and proline. For example, when a protein hydrolyzate containing no hydroxyproline is used, the effect on the plated film is significantly inferior, and the effect is only comparable to that obtained using conventional peptone. At this time, the total content of glycine, hydroxyproline, and proline in the hydrolyzate is 20 to 80%.
(% by weight, the same applies hereinafter), and particularly preferably 40 to 60%. The protein hydrolyzate of the present invention contains amino acids as described above, but the molecular weight is
250 to 50,000, particularly preferably 800 to 10,000. In addition, the content of protein hydrolyzate is plating solution 1
The amount is preferably 0.1 g or more, more preferably 0.1 to 10 g. In the present invention, in addition to these additives, it is effective to further add one type, preferably all, of a polyether nonionic surfactant, an aromatic carboxylic acid, and a compound having a C═O group (aldehyde, ketone). It is also more effective to add at least one of a sulfonate-based anionic activator, a carboxy-based or imidazoline-based amphoteric activator, and this can further improve the precipitation state in the high current density area. can. Here, as the polyether-based nonionic activator, (1) R-O-(CH 2 CH 2 O) o H (R is H or an alkyl group having 1 to 20 carbon atoms, n =
5-60) (2) (R is H or an alkyl group having 1 to 20 carbon atoms, n
=5~60) (3) (n=10~70) (4) Polyoxyethylene polypropylene glycol block polymer (PPG: molecular weight 500~3000, EO content 20~
(80 wt%) (5) Polyoxyethylene polyhydric alcohol aliphatic ester (EO addition amount 5 to 50 mol), etc., and the amount added is 0 to 10 dl/, especially 0.05 to 10 dl/, more preferably 0.5 to 2 dl/
It is preferable that In addition, aromatic carboxylates include benzoate, salicylate, m,p-chlorobenzoate,
Examples include 2,4-dichlorobenzoate, cinnamate, etc., and the amount added is 0 to 10 dl/, especially 0.05 to 10
dl/, more preferably 0.5 to 2 dl/. Furthermore, compounds having a C=0 group (aldehydes,
Examples of ketones include benzylidene acetone,
Examples include aromatic carbonyl compounds such as cinnamic aldehyde, chlorobenzaldehyde, dichlorobenzaldehyde, and furfural acetone, and aliphatic ketones such as isobutyl methyl ketone and methyl vinyl ketone, and the amount added is 0 to 3 dl/, particularly 0.005 to 3 dl. /, more preferably 0.005 to 0.2
It is preferable to set it to dl/. Furthermore, sulfonate-based anionic activators, carboxy-based or imidazoline-based amphoteric activators include dialkyl sulfosuccinates, alkylnaphthalene sulfonates, naphthalene sulfonate formalin condensates, N,N-dimethyl-N-alkyl -N-carboxyalkylene ammonium betaine, 2-alkyl-1-hydroxyethyl-1-
Examples include carboxymethylimidazolinium salts, and the amount of sulfonate anion activator added is 0.
-5 dl/, especially 0.05-5 dl/, more preferably 0.2-0.5 dl/, and the amount of the amphoteric active agent added is 0-5 dl/, especially 0.05-5 dl/, more preferably 0.5-1.0 dl/. It is preferable. The pH of the plating solution used in the present invention is 2.5 to 2.5.
6.5, particularly preferably 4.5 to 5.5. When plating is carried out using the above-mentioned plating liquid, there are no restrictions on the type of object to be plated, and zinc plating is performed after appropriate pretreatment. In this case, the plating conditions can be changed in various ways, but usually the plating temperature is 15 to 40°C, especially 20 to 35°C, and the cathode current density is 0.1 to 5 A/ dm2 , especially 0.5 to 3 A/dm2. will be adopted. Stirring of the plating solution is not necessarily required, but stirring using a cathode rocker, air, etc. may be employed. Further, it is preferable to use zinc for the anode plate. Note that the plating time is appropriately selected depending on the desired plating film thickness. Furthermore, the plating method of the present invention can also be carried out by employing a barrel plating method. After plating, chromate treatment and other post-treatments can be performed if necessary. Effects of the invention The method of the present invention contains 8 dl/or more of zinc ions and no chlorine ions or 50 dl/
An acidic zinc plating solution containing an aminocarboxylic acid or a salt thereof and a protein hydrolyzate containing glycine, hydroxyproline and proline as amino acids, and containing no acetate ion or boric acid, It is characterized by electroplating a plated object, and the plating film obtained by the method of the present invention has a uniform and smooth appearance, and the adhesion of the chromate film is also good. The plating solution used in the invention does not contain acetate ions or boric acid, so wastewater treatment is easy. It is suitable for use in place of acidic zinc plating solution. Hereinafter, the present invention will be explained in more detail by showing comparative examples, working examples, and comparative examples, but the present invention is not limited to the following examples. The compositions (% by weight) of the protein hydrolysates A and B used are shown below. Protein (collagen) hydrolyzate A Glycine 20.9% Alanine 8.8 Proline 13.8 Hydroxyproline 12.2 Aspartic acid 5.8 Glutamic acid 10.0 Arginine 7.9 Lysine 3.9 Others Remaining 100.0% Protein (casein) hydrolyzate B Lysine 7.0% Arginine 2.8 Aspartic acid 6.6 Glutamine Acid 18.1 Proline 9.0 Glycine 1.8 Alanine 2.8 Others Remaining 100.0% [Reference example] The following composition Z o SO 4・7H 2 O 300g / Na 2 SO 4 30 Boric acid 30 Protein hydrolyzate A or B 2 Acidic zinc with pH 3.5 A plating solution was prepared, and the appearance of the plating film was examined using a Hull cell tester. Appearance of plating film A degreased and pickled 10 cm x 7 cm polished steel plate was used as a cathode, and a Hull cell test was conducted at a current of 2 A, for 10 minutes, and at a liquid temperature of 25° C., and the appearance of the resulting plating film was evaluated. The results are shown in Table 1.

【衚】 蛋癜質加氎分解物はグリシン、ヒドロキシプ
ロリン、プロリンの䞉皮類のアミノ酞を含有しお
いるが、蛋癜質加氎分解物はヒドロキシプロリ
ンを含有しおいない。埓぀お第衚から刀るよう
に、め぀きの倖芳は蛋癜質加氎分解物を甚いた
堎合は良奜であるが、蛋癜質加氎分解物を甚い
た堎合は劣るものである。 実斜䟋、比范䟋 䞋蚘組成 ZoSO4・7H2O 300 Na2SO4 50 〃 アミノカルボン酞塩 第衚に瀺す量 蛋癜質加氎分解物 第衚に瀺す量 PH 3.5 の酞性亜鉛め぀き液を䜜成し、ハルセル詊隓噚を
甚いおめ぀き被膜の倖芳を調べた。 なお、め぀き被膜の倖芳評䟡法は前蚘参考䟋ず
同様にしお行な぀た。 結果を第衚に瀺す。
[Table] Protein hydrolyzate A contains three types of amino acids: glycine, hydroxyproline, and proline, but protein hydrolyzate B does not contain hydroxyproline. Therefore, as can be seen from Table 1, the appearance of plating is good when protein hydrolyzate A is used, but is poor when protein hydrolyzate B is used. Example 1, Comparative Example The following composition Z o SO 4・7H 2 O 300g/ Na 2 SO 4 50 〃 Aminocarboxylic acid/salt Amount shown in Table 2 Protein hydrolyzate A Amount shown in Table 2 Acidic pH 3.5 A galvanizing solution was prepared and the appearance of the galvanized film was examined using a Hull cell tester. The appearance of the plating film was evaluated in the same manner as in the reference example. The results are shown in Table 2.

【衚】 実斜䟋  ZoSO4 200 KCl 60 〃 アスパラギン酞 10 〃 蛋癜質加氎分解物  〃 PH 3.5 め぀き枩床 25℃ Dk 2A め぀き時間 10分 䞊蚘組成及び条件で1dm2のベントカ゜ヌドを
め぀きしたずころ、PH倉動も少なく、か぀高電流
密床郚分から䜎電流密床郚分に至る党䜓が均䞀で
良奜な倖芳の亜鉛め぀き被膜が埗られた。 実斜䟋 
[Table] Example 2 Z o SO 4 200g/ KCl 60 〃 Aspartic acid 10 〃 Protein hydrolyzate A 2 〃 PH 3.5 Plating temperature 25℃ D k 2A Plating time 10 minutes 1 dm 2 vent with the above composition and conditions When the cathode was plated, a galvanized film with a good appearance was obtained, with little pH fluctuation and uniform throughout from the high current density area to the low current density area. Example 3

【衚】【table】

【衚】 䞊蚘組成及び条件で1dm2のベントカ゜ヌドを
め぀きしたずころ、PH倉動も少なく、か぀高電流
密床郚分から䜎電流密床郚分に至る党䜓が均䞀で
良奜な倖芳の亜鉛め぀き被膜が埗られた。
[Table] When a bent cathode of 1 dm 2 was plated under the above composition and conditions, a galvanized film with good appearance was obtained, with little pH fluctuation and uniform throughout from the high current density area to the low current density area. It was done.

Claims (1)

【特蚱請求の範囲】  亜鉛むオンをdl以䞊ず、塩玠むオン
〜50dlず、アミノカルボン酞又はその塩ず、
アミノ酞ずしおグリシン、ヒドロキシプロリン及
びプロリンを含む蛋癜質加氎分解物ずを含有し、
酢酞むオン䞊びに硌酞を含有しない酞性亜鉛め぀
き液を甚いお被め぀き物を電気め぀きするこずを
特城ずする酞性亜鉛め぀き方法。  酞性亜鉛め぀き液がアミノカルボン酞又はそ
の塩dl以䞊ず蛋癜質加氎分解物0.1dl
以䞊ずを含有する特蚱請求の範囲第項蚘茉の酞
性亜鉛め぀き方法。  蛋癜質加氎分解物䞭のグリシン、ヒドロキシ
プロリン及びプロリンの含有量が20〜80重量で
ある特蚱請求の範囲第項又は第項蚘茉の酞性
亜鉛め぀き方法。
[Claims] 1. 8 dl/or more of zinc ions and 0 chlorine ions
~50dl/, and an aminocarboxylic acid or its salt,
Contains a protein hydrolyzate containing glycine, hydroxyproline and proline as amino acids,
An acidic zinc plating method characterized by electroplating a plated object using an acidic zinc plating solution that does not contain acetate ions or boric acid. 2 The acidic galvanizing solution contains 1 dl/or more of aminocarboxylic acid or its salt and 0.1 dl/ml of protein hydrolyzate.
An acidic zinc plating method according to claim 1, which comprises the above. 3. The acidic zinc plating method according to claim 1 or 2, wherein the content of glycine, hydroxyproline, and proline in the protein hydrolyzate is 20 to 80% by weight.
JP4362485A 1985-03-07 1985-03-07 Acidic galvanizing method Granted JPS61204390A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4362485A JPS61204390A (en) 1985-03-07 1985-03-07 Acidic galvanizing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4362485A JPS61204390A (en) 1985-03-07 1985-03-07 Acidic galvanizing method

Publications (2)

Publication Number Publication Date
JPS61204390A JPS61204390A (en) 1986-09-10
JPH0319313B2 true JPH0319313B2 (en) 1991-03-14

Family

ID=12669001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4362485A Granted JPS61204390A (en) 1985-03-07 1985-03-07 Acidic galvanizing method

Country Status (1)

Country Link
JP (1) JPS61204390A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022186183A1 (en) * 2021-03-05 2022-09-09

Also Published As

Publication number Publication date
JPS61204390A (en) 1986-09-10

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