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JPH0319620B2 - - Google Patents
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JPH0319620B2 - - Google Patents

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Publication number
JPH0319620B2
JPH0319620B2 JP56178846A JP17884681A JPH0319620B2 JP H0319620 B2 JPH0319620 B2 JP H0319620B2 JP 56178846 A JP56178846 A JP 56178846A JP 17884681 A JP17884681 A JP 17884681A JP H0319620 B2 JPH0319620 B2 JP H0319620B2
Authority
JP
Japan
Prior art keywords
substrate
cans
ferromagnetic layer
roller
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56178846A
Other languages
Japanese (ja)
Other versions
JPS5880135A (en
Inventor
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56178846A priority Critical patent/JPS5880135A/en
Publication of JPS5880135A publication Critical patent/JPS5880135A/en
Publication of JPH0319620B2 publication Critical patent/JPH0319620B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/85Coating a support with a magnetic layer by vapour deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】 本発明は高分子成形物基板上に蒸着された強磁
性層を磁気記録層とする磁気記録媒体の製造方法
および同装置に係る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method and apparatus for producing a magnetic recording medium in which the magnetic recording layer is a ferromagnetic layer deposited on a polymer molded substrate.

磁気記録に於て短波長記録に強磁性金属薄膜を
磁気記録層として用いることの有価値性は良く知
られ、かかる媒体も実験室規模で湿式めつき法、
真空蒸着法、スパツタリング法、イオンプレーテ
イング法等により製造されてきたが、一部は低速
オーデイオ用として実用化され、ビデオ用途の実
用化も近ずいて、工業レベルでの諸問題の解決へ
の努力が各方面でなされている。
In magnetic recording, the value of using a ferromagnetic metal thin film as a magnetic recording layer for short wavelength recording is well known, and such media can also be produced using wet plating and wet plating methods on a laboratory scale.
They have been manufactured using vacuum evaporation methods, sputtering methods, ion plating methods, etc., and some of them have been put into practical use for low-speed audio, and practical use for video applications is on the horizon. Efforts are being made on all fronts.

一般に磁気記録媒体は第2図a〜dに示すいく
つかの構成のいずれかに属する場合が多い。なお
同図においてバツクコート層は図示を省略してあ
る。
In general, magnetic recording media often belong to one of several configurations shown in FIGS. 2a to 2d. Note that illustration of the back coat layer is omitted in the figure.

第2図aは基板22上に強磁性層23が1層設
けられている場合を示し、同図bは非磁性層25
を基板24上に配しその上に強磁性層26を設け
た場合を示し、同図cは基板27上に非磁性層2
8,30、強磁性層29,31を交互に配し多層
構造にした場合を示し、同図dは基板32上に強
磁性層33、保護層34を有する場合を示す。他
に、同図b又はcにおける強磁性層26(又は3
1)上に保護層を配するなどした変形も勿論可能
である。
FIG. 2a shows a case where one ferromagnetic layer 23 is provided on the substrate 22, and FIG.
is arranged on a substrate 24 and a ferromagnetic layer 26 is provided thereon; FIG.
8, 30, and ferromagnetic layers 29, 31 are arranged alternately to form a multilayer structure. FIG. In addition, the ferromagnetic layer 26 (or 3
1) Of course, modifications such as disposing a protective layer thereon are also possible.

本発明は第2図b,c,dにそれぞれ示した磁
気記録媒体を工業規模で製造する場合にそうぐう
する問題を解決することを目的とする。
The object of the present invention is to solve the problems that occur when manufacturing magnetic recording media on an industrial scale as shown in FIGS. 2b, 2c, and d, respectively.

勿論、第2図aに示した磁気記録媒体でも、磁
性層を分割してくり返し蒸着で構成する場合で蒸
着後表面を積極的に処理する場合にも同様の問題
が発生するから、媒体の構成を選択するのが重要
ではなく、どういつた製造プロセスを採用するか
により本発明の対象となるかどうかが決るのであ
る。
Of course, even in the magnetic recording medium shown in FIG. 2a, a similar problem occurs when the magnetic layer is divided and constructed by repeated vapor deposition, and the surface is actively treated after vapor deposition, so the structure of the medium It is not important to select a material, but whether or not it is a target of the present invention is determined by the manufacturing process adopted.

なおここでいう蒸着は、真空蒸着、イオンプレ
ーテイング、スパツタリングを含む真空内で薄膜
形成を行うプロセスを指すものとする。
Note that vapor deposition here refers to a process of forming a thin film in a vacuum, including vacuum vapor deposition, ion plating, and sputtering.

本発明は、高分子成形物基板上に強磁性層を形
成したのち、保護層を蒸着する場合、2個以上の
回転キヤンにて、一種類の強磁性層を例えば斜方
蒸着にて所定の厚みに達するまで、くり返し蒸着
する場合、強磁性層を形成後表面を酸化処理する
場合等を連続プロセスとして取り扱つた場合に起
る磁性層の亀裂発生の問題に詳細な検討を重ね、
改良を加えた結果なされたものである。
In the present invention, when a protective layer is deposited after forming a ferromagnetic layer on a polymer molded substrate, one type of ferromagnetic layer is deposited in a predetermined manner, for example, by oblique deposition using two or more rotating cans. We have conducted detailed studies on the problem of cracks in the magnetic layer that occur when the process is treated as a continuous process, such as when repeated evaporation is performed until a certain thickness is reached, or when the surface is oxidized after forming a ferromagnetic layer.
This was achieved as a result of improvements.

以下に図面を用い本発明の実施例を説明する。
第1図は本発明による蒸着装置の一例を示す。
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 shows an example of a vapor deposition apparatus according to the present invention.

なお第1図では回転キヤンが2個の場合を示し
ているが、3個以上の場合も思想は同一である。
また第1図では真空槽7を3室に分割した場合を
示したが、これにこだわらず、グロー処理するた
めにさらに分割することもできるが、本発明の基
本要件を詳述するに足る程度に簡素化を図つてい
る。
Although FIG. 1 shows a case where there are two rotary cans, the concept is the same when there are three or more rotary cans.
Further, although FIG. 1 shows the case where the vacuum chamber 7 is divided into three chambers, it is not limited to this, and it may be further divided for glow treatment, but this is sufficient to explain the basic requirements of the present invention in detail. We are trying to simplify the process.

さて第1図に示すように、上室10は主として
捲き取り系を配設し、蒸着室は8,9に分けられ
ている。この場合、電子ビーム蒸着とスパツタリ
ングの組み合わせの例を引いたが、これにこだわ
らないのは前述した通りである。第1キヤン5と
蒸発源2を対向配設し、第2キヤン6とはスパツ
タ源4を対向配設してある。部屋10,9,8は
それぞれ独立した排気系13,11,12により
排気される。
Now, as shown in FIG. 1, the upper chamber 10 is mainly provided with a winding system, and the vapor deposition chamber is divided into 8 and 9. In this case, an example of a combination of electron beam evaporation and sputtering has been cited, but as mentioned above, the combination is not limited to this. A first can 5 and an evaporation source 2 are arranged to face each other, and a spatter source 4 is arranged to face a second can 6. The rooms 10, 9, 8 are evacuated by independent exhaust systems 13, 11, 12, respectively.

基板1は送り出し軸14より第1キヤン5、第
2キヤン6を介して捲き取り軸15へ捲き取られ
る。16はフリーローラでエキスパンダローラは
図示してない。17は各キヤン間の周速変動分を
吸収するために設けられたローラーで、例えば支
点19とレバーで結ばれ、一定の張力がフイルム
にかけられるように構成する。なおこの構成は一
例であつて、ローラー17の回転軸を上下にスラ
イドさせるだけでも良い。3は斜方蒸着するため
のマスクで、20,21はかく壁であり、ガス導
入部は図示を省略してある。
The substrate 1 is rolled up from the feed shaft 14 via the first can 5 and the second can 6 onto the winding shaft 15. 16 is a free roller, and the expander roller is not shown. A roller 17 is provided to absorb variations in circumferential speed between each can, and is connected to the fulcrum 19 by a lever, for example, so as to apply a constant tension to the film. Note that this configuration is just an example, and the rotation shaft of the roller 17 may simply be slid up and down. 3 is a mask for oblique vapor deposition, 20 and 21 are walls, and the gas introduction part is not shown.

なおここでローラー17の作用について説明す
る。複数のキヤンで捲き取りを行う場合、真空で
あることから基板1とキヤンとにすべりは殆んど
生じない。一方回転キヤンの回転数は、電動機を
制御することで一定に保持するよう構成するので
あるが、周速変動を0.2%程度以下に制御するの
は、例えば直径1mの回転キヤンの自重が幅500mm
のフイイルム搬送用に用いられるものでは1000Kg
に近いことから伺い知れる。又、周速変動の原因
はメカロスにもよるため、同一形状に仕上げても
各キヤンの周速を全く同じにすることもできな
い。従つて、例えば第1キヤン5と第2キヤン6
の関係を等速化しても前記した変動分の変位がフ
イルムに生じることになり、磁性層を形成したの
ち、かかる変動を受けると長手の一部の蒸着層に
亀裂が生じ、これは短波長記録時ノイズの限因と
なり、防止しなければならないが、ローラー17
の吸収によりこれを完全に防止できるものであ
る。
Note that the function of the roller 17 will be explained here. When winding is performed using a plurality of cans, there is almost no slippage between the substrate 1 and the cans because of the vacuum. On the other hand, the rotational speed of the rotating can is maintained constant by controlling the electric motor, but controlling the peripheral speed variation to less than 0.2% is necessary, for example, if the dead weight of a rotating can with a diameter of 1 m is 500 mm wide.
1000 kg for those used for transporting film.
I can tell because it's close to. Further, since the cause of circumferential speed fluctuations is also due to mechanical loss, it is not possible to make the circumferential speeds of each can completely the same even if the cans are finished in the same shape. Therefore, for example, the first can 5 and the second can 6
Even if the relationship is made constant, a displacement corresponding to the above-mentioned fluctuation will occur in the film, and when the magnetic layer is subjected to such fluctuation after forming the magnetic layer, cracks will occur in the vapor deposited layer in a part of the long side, and this will occur due to the short wavelength. The roller 17 is a limiting cause of noise during recording and must be prevented.
This can be completely prevented by absorbing .

次により具体的に本発明の実施例を説明する。 Next, embodiments of the present invention will be described in more detail.

実施例 1 第1図に示した蒸着装置を用い、直径1mと直
径50cmの回転キヤン2個を用いポリエチレンテレ
フタレートフイルム(強化延伸形、厚さ12μm、
幅500mm)上に酸素を外部より0.2/min導入
し、真空度3×10-5Torrで電子ビーム加熱によ
り得たCo100%の蒸気流により、入射角40゜以上
で斜方蒸着し、強磁性層を形成した。その膜厚は
0.2μmであつた。次に、N2ガスを0.1/min導入
し、Si3N4をターゲツトとし、1×10-3Torrでマ
グネトロンスパツタを行い、保護層を0.02μmの
厚さに形成した。
Example 1 A polyethylene terephthalate film (reinforced stretched type, thickness 12 μm,
Oxygen was introduced from the outside at 0.2/min onto the surface (width 500 mm), and a vapor flow of 100% Co obtained by electron beam heating at a vacuum degree of 3 formed a layer. The film thickness is
It was 0.2 μm. Next, N 2 gas was introduced at 0.1/min, and magnetron sputtering was performed using Si 3 N 4 as a target at 1×10 −3 Torr to form a protective layer with a thickness of 0.02 μm.

第1図におけるローラー17の重量を4Kgに設
定した場合と、ローラー17をバイパスした従来
方式のそれぞれにより前記工程を実施した。捲き
取り速度は30m/minで、第1キヤン5と第2キ
ヤン6の変動はそれぞれ±0.15%、±0.22%であ
つた。
The above steps were carried out in the case where the weight of the roller 17 in FIG. 1 was set to 4 kg and in the conventional method in which the roller 17 was bypassed. The winding speed was 30 m/min, and the fluctuations in the first can 5 and the second can 6 were ±0.15% and ±0.22%, respectively.

以上のようにして強磁性層および保護層を形成
した基板を熱処理し、基板背面に滑性付与のため
の樹脂コートを行い、1/4インチにスリツトして
製造した磁気テープについてノイズを調べた。
The noise was investigated on the magnetic tape produced by heat-treating the substrate on which the ferromagnetic layer and protective layer were formed as described above, applying a resin coating to the back surface of the substrate to impart lubricity, and slitting it into 1/4 inch pieces. .

その結果、本発明により製造された磁気テープ
では、1000mの長さにわたつて均一でかつ、低ノ
イズを達成できたのに対し、従来方式により製造
された磁気テープでは1000m長の中で、ノイズが
4〜6dB高い領域が180m存在していた。
As a result, the magnetic tape manufactured by the present invention was able to achieve uniform and low noise over a length of 1000 m, whereas the magnetic tape manufactured by the conventional method achieved low noise within a length of 1000 m. There was an area of 180 m where the value was 4 to 6 dB higher.

そこでその領域を観察したところ、基板の移動
方向とほぼ直交する方向に亀裂が生じていた。発
生位置は規則性がないため、実用に供するために
全長にわたり検査することが必要であるが、かか
る検査は実工程で行うことはできないため、この
テープは実用に供し得ない。
When we observed that area, we found that cracks had formed in a direction almost perpendicular to the direction of movement of the substrate. Since the occurrence position is not regular, it is necessary to inspect the entire length for practical use, but such an inspection cannot be performed in the actual process, so this tape cannot be used for practical use.

実施例 2 直径500mmのキヤンに沿つた状態のポリアミド
フイルム(厚さ8μm)上にCo90%Cr10%を1×
10-5Torrの真空中で入射角45゜以上で0.28μm厚に
斜方蒸着して強磁性層を形成し、次の直径500mm
のキヤンに沿つた状態で、酸素分圧0.03Torrで
の高周波グロー放電による表面処理を行つた。フ
イルムの捲き取り速度は25m/minで2つのキヤ
ンの周速変動はそれぞれ±0.21%であつた。ロー
ラー17により25Kgの張力を与えて周速変動を吸
収した場合と、従来方式によりローラー17をバ
イパスした場合のそれぞれにより製造した磁気テ
ープの長さ850mにわたつて実施例1におけると
同様のノイズ比較を行つた。
Example 2 Co90% Cr10% was applied 1× on a polyamide film (thickness 8 μm) along a can with a diameter of 500 mm.
A ferromagnetic layer is formed by oblique deposition to a thickness of 0.28 μm at an incident angle of 45° or more in a vacuum of 10 -5 Torr, and then a ferromagnetic layer with a diameter of 500 mm is formed.
Surface treatment was carried out using high-frequency glow discharge at an oxygen partial pressure of 0.03 Torr under the following conditions. The film winding speed was 25 m/min, and the peripheral speed fluctuations of the two cans were each ±0.21%. Comparison of noise similar to that in Example 1 over a length of 850 m of magnetic tape manufactured by applying a tension of 25 kg by the roller 17 to absorb circumferential speed fluctuations and by bypassing the roller 17 using the conventional method. I went there.

その結果、従来方式により製造されたもので
は、8dB〜12dBノイズの高い領域が全部で90m
あり、また3〜5dB高い領域が140mあつたのに
比べ本発明により製造されたものでは、全長にわ
たり均一かつ低ノイズであつた。これは、ローラ
−17の重さを3Kg〜7Kg変化させても変化なか
つた。
As a result, for products manufactured using conventional methods, the area with high noise of 8dB to 12dB was a total of 90m long.
Moreover, compared to the 140m high area with 3 to 5 dB, the noise produced by the present invention was uniform and low over the entire length. This did not change even when the weight of the roller 17 was changed from 3 kg to 7 kg.

実施例 3 第1の回転キヤン(直径500mm)に沿つたポリ
イミドフイルム(厚さ25μm)上に電子ビーム蒸
着にてパーマロイ層を1μmの厚さに形成した後、
ローラー17にて9Kgの張力を与え、第2のキヤ
ン(直径500mm)にて、Co85%Cr15%を垂直入射
で電子ビーム蒸着にて、0.33μmの厚さに形成し
垂直記録用を媒体を製造した。比較用として、ロ
ーラー17をバイパスせしめ媒体を製造した。
Example 3 After forming a permalloy layer with a thickness of 1 μm by electron beam evaporation on a polyimide film (thickness 25 μm) along the first rotation can (diameter 500 mm),
A tension of 9 kg was applied with the roller 17, and Co85% Cr15% was deposited to a thickness of 0.33 μm by electron beam evaporation with perpendicular incidence in the second can (diameter 500 mm) to produce a medium for perpendicular recording. did. For comparison, a media was produced in which roller 17 was bypassed.

フイルムの捲取速度が10m/min〜30m/min、
各キヤンの周速変動が±0.3%、±0.27%の場合に
ついて調べたが、本発明により製造したものでは
1300mの範囲にわたり亀裂がまつたく見られなか
つた。
Film winding speed is 10m/min to 30m/min,
We investigated cases where the circumferential speed fluctuation of each can was ±0.3% and ±0.27%, but it was found that
No cracks were observed over an area of 1300m.

これに対し従来方式により製造したものでは、
全体で470mにわたり亀裂が生じていた。垂直記
録に於ても、この亀裂によるノイズは分解能を落
とす欠点を有しており、本発明の効果は大きい。
In contrast, those manufactured using conventional methods,
A total of 470 meters of cracks were observed. Even in perpendicular recording, the noise caused by these cracks has the disadvantage of reducing resolution, and the present invention is highly effective.

この他、ポリエチレンテレフタレート5.5μm〜
27μm厚、ポリアミド3.8μm〜9.7μm厚、ポリイミ
ド25μm〜190μm厚のそれぞれのフイルムを基板
として用い、Cr0.2μm厚上にCo80%Ni20%、
Co70%Ni25%Cr5%、Co95%Pt5%、Co95%W5
%等を0.1μm〜0.3μmの厚さに本発明により形成
したが、同様に亀裂はみられなかつた。
In addition, polyethylene terephthalate 5.5 μm ~
Using 27 μm thick polyamide films, 3.8 μm to 9.7 μm thick polyamide films, and 25 μm to 190 μm thick polyimide films as substrates, Cr0.2 μm thick films were coated with Co80%Ni20%,
Co70%Ni25%Cr5%, Co95%Pt5%, Co95%W5
% etc. was formed to a thickness of 0.1 μm to 0.3 μm according to the present invention, but similarly no cracks were observed.

第1図の装置において、基板が送り出し軸14
より捲き取り軸15へ移動する時、それぞれのキ
ヤンで70゜以上の入射角でCo80%Ni20%を斜方蒸
着(各キヤンで0.05μm厚さづつ)し、さらに同
じく、Co80%Ni20%を70゜以上の入射角で電子ビ
ーム蒸着し、全厚み0.2μmの磁性層を、前記基板
上に本発明により形成して討た磁気テープにもや
はり亀裂は見られず均一かつ低ノイズが実現され
ていた。
In the apparatus shown in FIG.
When moving to the winding shaft 15, Co80%Ni20% is obliquely evaporated at an incident angle of 70° or more in each can (0.05μm thick in each can), and then Co80%Ni20% is deposited at a thickness of 70% in each can. No cracks were observed in the magnetic tape produced by electron beam evaporation at an incident angle of 0.2 μm or more, and a magnetic layer with a total thickness of 0.2 μm was formed on the substrate according to the present invention, and uniform and low noise was achieved. .

本発明の急唆な周速変動により生ずるフイルム
の変位から発生する亀裂の防止作用は、他の多く
の実施例についても確かめられた。直径500mmの
キヤン2ケ、同1000mmのキヤン1ケの計3ケを有
する装置を用い製造した場合についても全く同様
の効果を確認した。
The effect of the present invention on preventing cracks caused by displacement of the film caused by sudden changes in circumferential speed was also confirmed in many other examples. Exactly the same effect was confirmed in the case of manufacturing using a device with three cans, two cans with a diameter of 500 mm and one can with a diameter of 1000 mm.

以上の説明から明らかなように、本発明により
得られる媒体は短波長記録の長所をそこなわない
優れたもので、本発明の工業的価値は大である。
As is clear from the above description, the medium obtained by the present invention is excellent without detracting from the advantages of short wavelength recording, and the present invention has great industrial value.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による製造装置の一例を示す
図、第2図a,b,c,dはそれぞれ磁気記録媒
体の構成例を示す断面図である。 1,22,24,27,32……基板、2……
蒸発源、3……マスク、4……スパツタ源、5,
6……キヤン、7……真空槽、14……送り出し
軸、15……捲き取り軸、16,17……ロー
ラ、20,21……かく壁、23,25,26,
29,31,33……強磁性層。
FIG. 1 is a diagram showing an example of a manufacturing apparatus according to the present invention, and FIGS. 2a, b, c, and d are sectional views each showing an example of the structure of a magnetic recording medium. 1, 22, 24, 27, 32... board, 2...
Evaporation source, 3...mask, 4... spatter source, 5,
6... Can, 7... Vacuum chamber, 14... Feeding shaft, 15... Winding shaft, 16, 17... Roller, 20, 21... Scratching wall, 23, 25, 26,
29, 31, 33... ferromagnetic layer.

Claims (1)

【特許請求の範囲】 1 直列に並んだ個別モータにより等速に周速制
御された複数個の回転キヤンに沿つて移動する高
分子成形物基板上に強磁性層を蒸着にて形成する
際、隣り合つた上記回転キヤン間において上記基
板に張力を付与することを特徴とする磁気記録媒
体の製造方法。 2 蒸着により面上に強磁性層を形成しようとす
る高分子成形基板を周面に沿わせて移動せしめる
等速に周速制御された回転ローラが複数個直列に
配置され、かつ隣り合つた上記回転キヤン間にお
いて移動中の上記基板に張力を付与するための手
段が設けられたことを特徴とする磁気記録媒体の
製造装置。
[Claims] 1. When forming a ferromagnetic layer by vapor deposition on a polymer molded substrate that moves along a plurality of rotation cans whose peripheral speed is controlled at a constant speed by individual motors arranged in series, A method for manufacturing a magnetic recording medium, comprising applying tension to the substrate between adjacent rotating cans. 2. A plurality of rotating rollers whose circumferential speed is controlled at a constant speed are arranged in series to move the polymer molded substrate on which a ferromagnetic layer is to be formed by vapor deposition along the circumferential surface, and the above-mentioned adjacent rollers are arranged in series. An apparatus for manufacturing a magnetic recording medium, comprising means for applying tension to the substrate while it is being moved between rotating cans.
JP56178846A 1981-11-06 1981-11-06 Method and device for production of magnetic recording medium Granted JPS5880135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56178846A JPS5880135A (en) 1981-11-06 1981-11-06 Method and device for production of magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56178846A JPS5880135A (en) 1981-11-06 1981-11-06 Method and device for production of magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS5880135A JPS5880135A (en) 1983-05-14
JPH0319620B2 true JPH0319620B2 (en) 1991-03-15

Family

ID=16055688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56178846A Granted JPS5880135A (en) 1981-11-06 1981-11-06 Method and device for production of magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS5880135A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167137A (en) * 1981-04-06 1982-10-14 Olympus Optical Co Ltd Formation for thin film

Also Published As

Publication number Publication date
JPS5880135A (en) 1983-05-14

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