JPH032936B2 - - Google Patents
Info
- Publication number
- JPH032936B2 JPH032936B2 JP3139187A JP3139187A JPH032936B2 JP H032936 B2 JPH032936 B2 JP H032936B2 JP 3139187 A JP3139187 A JP 3139187A JP 3139187 A JP3139187 A JP 3139187A JP H032936 B2 JPH032936 B2 JP H032936B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- oxygen
- organic solvent
- containing organic
- anhydrous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 72
- 239000002184 metal Substances 0.000 claims description 72
- 238000000034 method Methods 0.000 claims description 29
- 239000003960 organic solvent Substances 0.000 claims description 29
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 28
- 229910052760 oxygen Inorganic materials 0.000 claims description 28
- 239000001301 oxygen Substances 0.000 claims description 28
- 229910001507 metal halide Inorganic materials 0.000 claims description 26
- 150000005309 metal halides Chemical class 0.000 claims description 26
- 229910052758 niobium Inorganic materials 0.000 claims description 25
- 229910052735 hafnium Inorganic materials 0.000 claims description 22
- 229910052726 zirconium Inorganic materials 0.000 claims description 22
- 229910052719 titanium Inorganic materials 0.000 claims description 21
- 150000002739 metals Chemical class 0.000 claims description 17
- 229910052715 tantalum Inorganic materials 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 238000004821 distillation Methods 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 8
- 239000002274 desiccant Substances 0.000 claims description 8
- -1 Metal Ti Inorganic materials 0.000 claims description 6
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 6
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 5
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 4
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 claims description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 239000001103 potassium chloride Substances 0.000 claims description 4
- 235000011164 potassium chloride Nutrition 0.000 claims description 4
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims description 4
- MPCRDALPQLDDFX-UHFFFAOYSA-L Magnesium perchlorate Chemical compound [Mg+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O MPCRDALPQLDDFX-UHFFFAOYSA-L 0.000 claims description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000292 calcium oxide Substances 0.000 claims description 3
- 235000012255 calcium oxide Nutrition 0.000 claims description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 3
- 229910021536 Zeolite Inorganic materials 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 239000010457 zeolite Substances 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 150000004696 coordination complex Chemical class 0.000 claims 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 1
- 229940071870 hydroiodic acid Drugs 0.000 claims 1
- 239000010446 mirabilite Substances 0.000 claims 1
- 229910017604 nitric acid Inorganic materials 0.000 claims 1
- 239000010955 niobium Substances 0.000 description 27
- 239000010936 titanium Substances 0.000 description 25
- 239000007789 gas Substances 0.000 description 15
- 150000004820 halides Chemical class 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 10
- 239000012535 impurity Substances 0.000 description 9
- 239000011777 magnesium Substances 0.000 description 9
- 239000002994 raw material Substances 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- 229910007926 ZrCl Inorganic materials 0.000 description 7
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 7
- 238000000605 extraction Methods 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 239000011575 calcium Substances 0.000 description 5
- 229910052791 calcium Inorganic materials 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 229910052845 zircon Inorganic materials 0.000 description 5
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- 238000000638 solvent extraction Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- 229910019800 NbF 5 Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 239000013626 chemical specie Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 229910052745 lead Inorganic materials 0.000 description 3
- 239000011133 lead Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 238000011946 reduction process Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910004529 TaF 5 Inorganic materials 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- ZNSMNVMLTJELDZ-UHFFFAOYSA-N Bis(2-chloroethyl)ether Chemical compound ClCCOCCCl ZNSMNVMLTJELDZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- AQZGPSLYZOOYQP-UHFFFAOYSA-N Diisoamyl ether Chemical compound CC(C)CCOCCC(C)C AQZGPSLYZOOYQP-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000003869 acetamides Chemical class 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 235000019439 ethyl acetate Nutrition 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000001640 fractional crystallisation Methods 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000003832 thermite Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- ZMBHCYHQLYEYDV-UHFFFAOYSA-N trioctylphosphine oxide Chemical compound CCCCCCCCP(=O)(CCCCCCCC)CCCCCCCC ZMBHCYHQLYEYDV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
Description
〔産業上の利用分野〕
本発明は金属チタン(Ti)、金属ジルコニウム
(Zr)、金属ハフニウム(Hf)、金属ニオブ(Nb)
及び金属タンタル(Ta)の製造方法に関する。
〔従来の技術〕
従来、金属チタンを製造する方法として、天然
ルチル及び合成ルチルの如き、不純物の少ない
TiO2に炭素を加え、高温で次式に示す如くチタ
ンの塩化物を造る方法がある。
TiO2+2C+2Cl2→TiCl4+2CO
原料の中には、Feの他にV等の不純物が含ま
れているので、生成したTiCl4を蒸留によ精製
し、次に、金属マグネシウム及び金属ナトリウム
を接触させる方法が多く採用されている。
TiCl4+2Mg→Ti+2MgCl2
TiCl4+4Na→Ti+4NaCl
この時に副生されるMgCl2やNaClは溶融塩電
解工程へリサイクルされ、金属Mg,Na及びCl2
ガスとなりサイクルさせる方法である。
次に、従来、金属ジルコニウムを造る方法とし
て、先ずジルコンサンドをアーク炉で処理し、
SiO2を気化分離すると同時にジルコンカーバイ
トを得、次に、ジルコンカーバイトを次式のよう
に塩化する。
ZrC+2Cl2→ZrCl4
あるいは、SiO2を分離すると共にジルコン酸
化物を造り、これを塩化する方法も採用されてい
る。
ZrO2+2C+2Cl2→ZrCl4+2CO
このようにして得られたZrCl4を酸容解して溶
媒抽出装置で不純物及びハフニウムを分離する。
次に、これを晶出沈澱させた後、加熱分解する。
得られた酸化物を更に塩化して精製ZrCl4を造り、
これを金属Mgで還元する方法がある。
また、ジルコンサンドをK2SiF6と混合反応さ
せ、可溶性のフツ化物とした後、浸出し、更に、
晶析を行ない、不純物を分離する。得られた
K2ZrF6とK2HfF6の混合結晶を分別晶析法により
Hfを分離して精製K2ZrF6が得られる。次に、こ
のK2ZrF6を溶融塩電解工程にて金属Zrを造る方
法がある。これらはいずれも極めて長い工程であ
り、分離精製工程とハロゲン化工程及び還元して
金属を造る工程に分離されている。
金属ハフニウムを造る工程はHfがZrと共存し
ている天然資源から造られることから、金属ジル
コニウムの製造方法と全く同一であり、複雑な製
造方法により造られる。
また、金属ニオブの従来の製造方法は濃縮され
た天然原料をフツ酸と硫酸で溶解した後、溶媒抽
出工程において、含有する不純物とタンタルを分
離し、この溶液をNH3で中和し、この沈澱物を
高温酸化分解工程に導き、精製Nb2O5を得る。
精製Nb2O5をAl粉末と混合し、そのテルミツ
ト反応を利用して粗製金属ニオブを得る。次に、
粗製金属ニオブをエレクトロンビーム炉に導き、
高温にすることにより不純物を分離して精製する
方法が採用されている。
金属タンタルの製造方法は天然原料がニオブと
共存することから、溶媒抽出工程にて不純物とニ
オブを分離しKOHを加えて精製K2TaF7の結晶
を得、次に、これを金属Mg、金属Naで還元し、
粗製金属タンタルを得るか、またはK2TaF7を溶
融塩電解工程にて粗製の金属タンタルを得、得ら
れた粗製の金属タンタルを王水の如き強酸で洗浄
して不純物を除き、粗製金属タンタルを造るのが
一般的な方法である。
〔発明が解決しようとする問題点〕
上述の如き従来法では、中間体である精製され
た金属ハロゲン化物を造るまでの工程が長く、複
雑であるために、収率が低く、コストがかかると
いう欠点があつた。
金属ニオブのように精製された酸化物をAl等
で還元した場合、不純物の含有量が高く、また、
酸素含有量も多いために、これを精製するために
エレクトロビーム炉で何回もの溶融精製が必要と
なり、コストがかかるという欠点があつた。ジル
コニウムやハフニウムのように一旦ハロゲン化物
を造り、これを再溶解してハフニウムとジルコニ
ウムとを分離して精製酸化物を造り、また、これ
をハロゲン化物にするという精製を必要とするた
めに、コストが嵩むだけではなく、収率も低下す
るという欠点があつた。
〔問題点を解決するための手段〕
本発明はTi,Zr,Hf,Nb及びTiよりなる群
より選択された1種のハロゲン化金属錯体を抽
出・含有せしめた含酸素有機溶媒を、無水芒硝、
無水塩化カルシウム、無水硫酸マグネシウム、無
水塩化マグネシウム、無水塩化カリウム、五酸化
リン、付活アルミナ、過塩素酸マグネシウム、無
水炭酸カリウム、生石灰、酸化バリウム及びゼオ
ライト等よりなる群より選択された乾燥剤と接触
させた後、前記含酸素有機溶媒を減圧または常圧
で加熱蒸留することによりハロゲン化金属を生成
させると共に含酸素有機を再生し;次に、得られ
たハロゲン化金属を亜鉛、鉛、アルミニウム、カ
ルシウム、マグネシウム及びナトリウムの単一金
属及びこれらの金属を主体とする合金と接触させ
ることにより金属Ti,Zr,Hf,Nb及びTaを得
ることを特徴とする金属Ti,金属Zr、金属Hf、
金属Nb及び金属Taの製造方法を提供するにあ
る。
〔作用〕
本発明は高品質な原料や高価な原料を使用せ
ず、また、ハロゲン化物を何回も造ることをせ
ず、一般に天然に存在する鉱物資源から、あるい
は産業廃棄物のような低級な資源から一挙に高純
度な金属ハロゲン化物を造り、これを還元して金
属とするもので、従来法のように分離操作を数回
繰り帰して行なう長い工程を経て得られた精製金
属ハロゲン化物を金属Naや金属Mgで還元するた
めに生ずる複雑な工程や収率が低いという欠点を
克服するものである。
すなわち、本発明はTi,Zr,Hf,Nb及びTi
よりなる群より選択された1種のハロゲン化金属
錯体を抽出含有せしめた含酸素有機溶媒を、無水
芒硝、無水塩化カルシウム、無水硫酸マグネシウ
ム、無水塩化マグネシウム、無水塩化カリウム、
五酸化リン、付活アルミナ、過塩素酸マグネシウ
ム、無水炭酸カリウム、生石灰、酸化バリウム及
びゼオライト等よりなる群より選択された乾燥剤
と接触させることにより含酸素有機溶媒に物理的
に含有する水あるいは抽出含有しているH2Oを
脱水し、該含酸素有機溶媒を乾燥し、次に、装置
内に不活性ガスを充満させて、装置内の大気を追
い出した後、または不活性ガスを充満させつつ、
常圧状態または減圧状態で加熱蒸発あるいは加熱
蒸留を行なうことにより、有機溶媒と金属ハロゲ
ン化物の蒸気圧差を利用して次式に示すように有
機溶媒を再生回収すると共に金属のハロゲン化物
を造る。
H2TiF6・nOrg加熱
――→
nOrg+TiF4+2HF
H2TiCl6・nOrg加熱
――→
nOrg+TiCl4+2HCl
HNbF6・nOrg加熱
――→
nOrg+NbF5+HF
HNbCl6・nOrg加熱
――→
nOrg+NbCl5+HCl
HTaF6・nOrg加熱
――→
nOrg+TaF5+HF
HTaCl6・nOrg加熱
――→
nOrg+TaCl5+HF
HZrCl5・nOrg加熱
――→
nOrg+ZrCl4+HCl
HHfCl5・nOrg加熱
――→
nOrg+HfCl0+HCl
式中、Orgは含酸素有機溶媒を示し、エーテル
の群、エステルの群、ケトンの群、アミドの群及
びアルコールの群の各群より選択された1種また
は2種以上を使用することができる。
また、上述の各金属抽出種は一例を示したにす
ぎず、一定のものではなく含酸素有機溶媒に抽出
含有せしめる際、金属錯化合物の化学種に大きく
影響を与えるハロゲンイオン濃度及びH+イオン
濃度によつて異なることは当然であり、ハロゲン
化金属錯体の抽出種が上述の式により限定される
ものではないことを理解されたい。
更に、ハロゲン化金属錯体の抽出種は塩化物錯
体、フツ化物錯体もあれば臭化物錯体やヨウ化物
錯体も存在する。
含酸素有機溶媒に依存してハロゲン化金属錯体
イオンと共に抽出されるH2Oの量も一定ではな
い。
蒸発、蒸留工程において得られた上述の金属
((Ti,Zr,Hi,Nb及びTa)のハロゲン化物を
金属Na,Mg,Zn,Pb,Ca及びAlの群より選択
された1種または2種以上の気体状金属及び液体
状金属と接触させることにより金属Ti,Zr,Hf,
Nb及びTaを造る方法である。
このように本発明は原料を酸溶解し、溶媒抽出
工程で共存金属を分離精製して一挙に高純度金属
ハロゲン化物を造り、これを還元して金属Ti,
金属Zr,Hf、金属Nb及び金属Taを製造するも
のである。
上述の金属(Ti,Zr,Hf,Nb及びTa)のハ
ロゲン化物を金属ナトリウム、金属マグネシウ
ム、金属アルミニウム、金属亜鉛、金属カルシウ
ム及び金属鉛よりなる群から選択された1種また
は2種以上の気体状金属及び液体状金属と接触さ
せることにより、次式に示すように金属を得るこ
とができる。
TiCl4+4Na→Ti+4NaCl
TiF4+2Mg→Ti+2MgF2
ZrCl4+4Na→Zr+4NaCl
ZrF4+2Mg→Zr+2MgF2
HfCl4+4Na→Hf+4NaCl
HfF4+2Mg→Hf+2MgF2
NbF5+2.5Zn→Nb+2.5ZnF2
NbCl5+5Na→Nb+5NaCl
TaF5+2.5Zn→Ta+2.5ZnF2
TaCl5+2.5Mg→Ta+2.5MgCl2
NbF5+2.5Pb→Nb+2.5PbF2
上式は、金属の製造法の一例を示すもので、塩
化物もあればフツ化物もあり、還元剤も単独ある
いは複数の合金を用いることができる。
還元プロセスについても、溶融するハロゲン化
金属の中に還元金属の液状品を滴下させたり、還
元金属の気体を吹き込んだり、溶融している還元
用金属の上へハロゲン化金属の気体を吹き込む方
法を採用したりして目的の金属を造ることができ
る。また、ハロゲン化金属の気体と還元金属の気
体を反応器へ導き、ガス〜ガス反応により目的と
する気体をも造ることができるなど、各種の組み
合わせが可能であることを理解されたい。
還元反応器には、通常不活性ガスを充満させて
還元反応を遂行させるが、H2ガスの如き還元ガ
スを混合して用いることもある。
本発明で出発原料となる含酸素有機溶媒に、抽
出含有せしめた各金属(Ti,Zr,Hf,Nb及び
Ta)のハロゲン化金属錯体は例えば下記のよう
にして造ることができる。
エーテルの群、ケトンの群、エステルの群、ア
ミドの群及びアルコールの群の各群から選択され
た抽出剤を水溶液中に存在するハロゲン化金属錯
体と接触させて造る。
HTiF6 -+H++nOrg→H2TiF6・nOrg
(水相) (水相) (有機相) (有機相)
NbF6 - +H+ +nOrg→ HNbF6・nOrg
TaF6 - +H+ +nOrg→ HTaF6・nOrg
ZrCl5 - +H+ +nOrg→ HZrCl5・nOrg
HfCl5 - +H+ +nOrg→ HHfCl5・nOrg
上記の各金属のハロゲン化錯イオンの化学種は
一例を示したにすぎず、塩化物もあればフツ化物
もあるし、存在するハロゲンイオン濃度、H+イ
オン濃度によつても錯体の化学種は異なることは
公知の通りである。
本発明に使用する含酸素有機溶媒は次の群より
選択される。
(a) エーテルの群:
ジイソアミルエーテル、ジエチルエーテル、ジ
イソプロピルエーテル、ジクロールエチルエーテ
ル及びこれらと類似する形態を示すエーテルを含
む。
(b) ケトンの群:
メチルイソブチルケトン、メチルプロピルケト
ン、メチルアミルケトン、シクロヘキサノン、メ
チルシクロヘキサノン及び類似のケトン類を含
む。
(c) エステルの群:
リン酸エステル、酢酸エステル及びTOPO(ト
リオクチルホスフインオキシド)等の抽出剤も当
然含まれる。
(d) アミドの群:
アセトアミド、C4〜C15脂肪族カルボン酸のア
ミド。
(e) アルコールの群:
炭素数4〜18の各種(n−、第2、第3)アル
コール。
本発明で使用する乾燥剤とは、蒸留する前に物
理的に混入した水及び金属ハロゲン化錯体と共に
抽出された水を除くために使用するもので、無水
芒硝、無水塩化カルシウム、無水硫酸マグネシウ
ム、無水塩化マグネシウム、無水塩化カリウム、
五酸化リン、付活アルミナ、過塩素酸マグネシウ
ム、無水炭酸カリウム、生石灰、酸化バリウム及
び合成ゼオライト等のモレキユラーシーブを使用
することができる。
本発明で使用する不活性ガスとはN2ガス及び
Arガスであり、乾燥工程においては、含酸素有
機溶媒内の大気を追い出し、乾燥剤の吸湿による
劣化防止のために適宜導入することができる。ま
た、加熱蒸発及び加熱蒸留工程においては、含酸
素有機溶媒の酸化を防止するためあるいは生成さ
れた各金属ハロゲン化物の変質を防止するために
も使用することができる。
また、加熱蒸発及び加熱蒸留条件に応じて、該
工程内に適宜不活性ガスを導入することもでき
る。
本発明で還元剤として使用する金属はNa,
Mg,Ca,Al,Pb及びZnの単一金属あるいは2
種以上の合金で、気体状、液体状及び赤熱した固
体状の形態で使用することができる。
また、還元は目的金属のハロゲン化物も気体
状、液体状及び固体状の形態でも使用することが
でき、還元雰囲気は通常は変質防止のために不活
性ガス単独あるいはH2ガスとの混合ガスとして
使用することもできる。
以下、本発明を図面に基づき説明するが、本発
明はこれに限定されるものではないことを理解さ
れたい。
第1図のフローシートは本発明操作の基本型を
示す図であり、各金属(Ti,Zr,Hf,Nb及び
Ta)のハロゲン化金属錯体を抽出・含有する含
酸素有機溶媒Aを乾燥工程Bに導き、乾燥剤と接
触させることにより、含酸素有機溶媒中に物理的
に存在する水あるいは抽出含有している水を脱水
して含酸素有機溶媒を乾燥する。この場合に、含
酸素有機溶媒内に存在している大気を追い出すた
めに適宜不活性ガスを導入することができる。
次に、含水乾燥剤Dを除去し、更に、加熱・蒸
発または加熱・蒸留工程Cにて、不活性ガスを導
入して不活性ガスの充満した常圧状態で加熱・蒸
発または加熱・蒸留するか、または減圧状態で加
熱・蒸留することにより各金属のハロゲン化物E
及び再生された含酸素有機溶媒Fを回収する。
次に、各金属のハロゲン化物Eを還元工程Gに
おいて還元用金属(Na,Mg,Ca,Al,Pb及ぼ
Zn)の気体状、液体状または赤熱した固体状の
ものと接触させることにより各金属(Ti,Zr,
Hf,Nb及びTa)Hを製造する。還元用金属は
ハロゲン化物Jとして分離される。
第2図のフローシートは各金属(Ti,Zr,Hf,
Nb及びTa)のハロゲン化金属錯体含有溶液と、
再生された含酸素有機溶媒Fとを抽出工程Kにて
接触させることにより本発明の出発原料である各
金属(Ti,Zr,Hf,Nb及びTa)のハロゲン化
金属錯体を抽出・含有する各酸素有機溶媒を造る
工程を組み込んだ本発明の他の実施態様を説明す
るものである。
〔実施例〕
以下に実施例を挙げ、本発明を更に説明する。
実施例
各金属毎のハロゲン化金属を造る実験内容を第
1表に示す。
試料の量は生成する金属ハロゲン化物が約0.2
モルになるように金属を抽出せしめた含酸素有機
溶媒量を決定した。
各実験とも、加熱蒸留及び乾燥前に予めArガ
スを吹き込み、装置内の大気及び水を置換した。
[Industrial Application Field] The present invention is applicable to metal titanium (Ti), metal zirconium (Zr), metal hafnium (Hf), metal niobium (Nb).
and a method for producing metal tantalum (Ta). [Prior art] Conventionally, as a method for manufacturing titanium metal, materials with low impurities such as natural rutile and synthetic rutile have been used.
There is a method of adding carbon to TiO 2 and producing titanium chloride at high temperature as shown in the following formula. TiO 2 +2C+2Cl 2 →TiCl 4 +2CO The raw material contains impurities such as V in addition to Fe, so the TiCl 4 produced is purified by distillation, and then metal magnesium and metal sodium are brought into contact. Many methods are used to do this. TiCl 4 +2Mg→Ti+2MgCl 2 TiCl 4 +4Na→Ti+4NaCl The MgCl 2 and NaCl by-produced at this time are recycled to the molten salt electrolysis process, and metal Mg, Na and Cl 2
This method turns it into a gas and cycles it. Next, the conventional method for producing metallic zirconium is to first process zircon sand in an arc furnace,
Zircon carbide is obtained at the same time as SiO 2 is vaporized and separated, and then the zircon carbide is chlorinated as shown in the following formula. ZrC + 2Cl 2 →ZrCl 4 Alternatively, a method of separating SiO 2 and creating zircon oxide, which is then chlorinated, has also been adopted. ZrO 2 +2C+2Cl 2 →ZrCl 4 +2CO The ZrCl 4 thus obtained is dissolved in acid and impurities and hafnium are separated using a solvent extraction device.
Next, this is crystallized and precipitated, and then thermally decomposed.
The obtained oxide is further chlorinated to produce purified ZrCl 4 ,
There is a method of reducing this with metallic Mg. In addition, zircon sand is mixed and reacted with K 2 SiF 6 to form a soluble fluoride, which is then leached and further processed.
Perform crystallization to separate impurities. obtained
Mixed crystals of K 2 ZrF 6 and K 2 HfF 6 were obtained by fractional crystallization.
Purified K 2 ZrF 6 is obtained by separating Hf. Next, there is a method of producing metal Zr from this K 2 ZrF 6 through a molten salt electrolysis process. All of these processes are extremely long and are separated into a separation and purification process, a halogenation process, and a reduction process to produce metals. The manufacturing process for metal hafnium is exactly the same as that for metal zirconium, as it is manufactured from natural resources in which Hf coexists with Zr, and is manufactured using a complicated manufacturing method. In addition, the conventional method for producing niobium metal is to dissolve concentrated natural raw materials in hydrofluoric acid and sulfuric acid, then separate impurities and tantalum in a solvent extraction process, neutralize this solution with NH 3 , and extract the tantalum. The precipitate is passed through a high temperature oxidative decomposition process to obtain purified Nb2O5 . Purified Nb 2 O 5 is mixed with Al powder and the thermite reaction is used to obtain crude niobium metal. next,
The crude metal niobium is introduced into an electron beam furnace,
A method has been adopted in which impurities are separated and purified by raising the temperature to high temperatures. The manufacturing method for tantalum metal involves the coexistence of natural raw materials with niobium, so impurities and niobium are separated in a solvent extraction process, KOH is added to obtain purified K 2 TaF 7 crystals, and this is then extracted with metal Mg, metal Reduced with Na,
Either obtain crude tantalum metal, or obtain crude tantalum metal by subjecting K 2 TaF 7 to a molten salt electrolysis process, and wash the obtained crude tantalum metal with a strong acid such as aqua regia to remove impurities. The common method is to create. [Problems to be solved by the invention] In the conventional method as described above, the process to produce the purified metal halide intermediate is long and complicated, resulting in low yield and high cost. There were flaws. When purified oxides such as niobium metal are reduced with Al etc., the content of impurities is high, and
Because it has a high oxygen content, it has to be melted and refined many times in an electrobeam furnace to refine it, resulting in high costs. As halides such as zirconium and hafnium are first created, they are redissolved to separate hafnium and zirconium to create purified oxides, and purification is required to convert this into halides, which increases costs. The drawback was that not only was the amount bulky, but the yield was also reduced. [Means for solving the problems] The present invention provides an oxygen-containing organic solvent containing and extracting one type of metal halide complex selected from the group consisting of Ti, Zr, Hf, Nb, and Ti. ,
A desiccant selected from the group consisting of anhydrous calcium chloride, anhydrous magnesium sulfate, anhydrous magnesium chloride, anhydrous potassium chloride, phosphorus pentoxide, activated alumina, magnesium perchlorate, anhydrous potassium carbonate, quicklime, barium oxide, zeolite, etc. After contacting, the oxygen-containing organic solvent is heated and distilled under reduced pressure or normal pressure to generate a metal halide and regenerate the oxygen-containing organic solvent; , metal Ti, metal Zr, metal Hf, characterized in that metal Ti, Zr, Hf, Nb and Ta are obtained by contacting with single metals of calcium, magnesium and sodium and alloys mainly composed of these metals.
The present invention provides a method for producing metal Nb and metal Ta. [Operation] The present invention does not use high-quality raw materials or expensive raw materials, nor does it require the production of halides over and over again. This method creates highly pure metal halides at once from natural resources and reduces them to metals.Refined metal halides are obtained through a long process of repeating the separation process several times as in conventional methods. This method overcomes the drawbacks of complex steps and low yields that occur when reducing oxidation with metallic Na or metallic Mg. That is, the present invention uses Ti, Zr, Hf, Nb and Ti.
An oxygen-containing organic solvent containing one type of metal halide complex selected from the group consisting of anhydrous sodium sulfate, anhydrous calcium chloride, anhydrous magnesium sulfate, anhydrous magnesium chloride, anhydrous potassium chloride,
Water physically contained in an oxygen-containing organic solvent or Dehydrate the H 2 O contained in the extraction, dry the oxygen-containing organic solvent, and then fill the device with inert gas to expel the atmosphere inside the device or fill it with inert gas. While letting
By performing thermal evaporation or thermal distillation at normal pressure or reduced pressure, the organic solvent is regenerated and recovered, and a metal halide is produced as shown in the following formula using the vapor pressure difference between the organic solvent and the metal halide. H 2 TiF 6・nOrg heating---→ nOrg+TiF 4 +2HF H 2 TiCl 6・nOrg heating---→ nOrg+TiCl 4 +2HCl HNbF 6・nOrg heating---→ nOrg+NbF 5 +HF HNbCl 6・nOrg heating---→ nOrg+NbCl 5 +HCl HTaF 6・nOrg heating---→ nOrg+TaF 5 +HF HTaCl 6・nOrg heating---→ nOrg+TaCl 5 +HF HZrCl 5・nOrg heating---→ nOrg+ZrCl 4 +HCl HHfCl 5・nOrg heating---→ nOrg+HfCl 0 +HCl In the formula, Org is an oxygen-containing organic One or more solvents selected from the group of ethers, esters, ketones, amides, and alcohols can be used. In addition, the above-mentioned metal extraction species are merely examples, and the halogen ion concentration and H + ion concentration, which greatly affect the chemical species of the metal complex compound when extracted and contained in an oxygen-containing organic solvent, are not fixed. It should be understood that the extraction species of the metal halide complex is not limited by the above formula, as it is a matter of course that it varies depending on the concentration. Furthermore, the extracted species of metal halide complexes include chloride complexes, fluoride complexes, bromide complexes, and iodide complexes. Depending on the oxygen-containing organic solvent, the amount of H 2 O extracted together with the metal halide complex ions is also not constant. One or two halides of the above-mentioned metals ((Ti, Zr, Hi, Nb and Ta) obtained in the evaporation and distillation process are selected from the group of metals Na, Mg, Zn, Pb, Ca and Al. By contacting with the above gaseous metals and liquid metals, metal Ti, Zr, Hf,
This is a method of building Nb and Ta. In this way, the present invention dissolves raw materials in an acid, separates and refines the coexisting metals in a solvent extraction process, creates high-purity metal halides all at once, and reduces them to produce metal Ti,
It manufactures metals Zr, Hf, Nb and Ta. The halides of the above metals (Ti, Zr, Hf, Nb and Ta) are mixed with one or more gases selected from the group consisting of sodium metal, magnesium metal, aluminum metal, zinc metal, calcium metal and lead metal. By contacting a liquid metal with a liquid metal, a metal can be obtained as shown in the following formula. TiCl 4 +4Na→Ti+4NaCl TiF 4 +2Mg→Ti+2MgF 2 ZrCl 4 +4Na→Zr+4NaCl ZrF 4 +2Mg→Zr+2MgF 2 HfCl 4 +4Na→Hf+4NaCl HfF 4 +2Mg→Hf+2MgF 2 NbF 5 +2.5Zn→Nb+2.5Z nF 2 NbCl 5 +5Na→Nb+5NaCl TaF 5 +2.5Zn→Ta+2.5ZnF 2 TaCl 5 +2.5Mg→Ta+2.5MgCl 2 NbF 5 +2.5Pb→Nb+2.5PbF 2The above equation shows an example of a method for producing metals, including chlorides and fluorides. A single reducing agent or an alloy of multiple reducing agents can be used. Regarding the reduction process, there are methods such as dropping a reduced metal liquid into the molten metal halide, blowing the reduced metal gas, and blowing the reduced metal gas onto the molten reducing metal. You can use it to create the desired metal. Furthermore, it should be understood that various combinations are possible, such as introducing a metal halide gas and a reduced metal gas into a reactor to produce a desired gas through a gas-to-gas reaction. The reduction reactor is usually filled with an inert gas to carry out the reduction reaction, but a reducing gas such as H 2 gas may also be mixed therein. In the present invention, various metals (Ti, Zr, Hf, Nb and
The metal halide complex of Ta) can be produced, for example, as follows. An extractant selected from the group of ethers, ketones, esters, amides and alcohols is prepared by contacting the metal halide complex present in an aqueous solution. HTiF 6 - +H + +nOrg→H 2 TiF 6・nOrg (Aqueous phase) (Aqueous phase) (Organic phase) (Organic phase) NbF 6 - +H + +nOrg→ HNbF 6・nOrg TaF 6 - +H + +nOrg→ HTaF 6・nOrg ZrCl 5 - +H + +nOrg→ HZrCl 5・nOrg HfCl 5 - +H + +nOrg→ HHfCl 5・nOrg The chemical species of the halogenated complex ions of each metal listed above are just examples; It is well known that the chemical species of complexes also differ depending on the concentration of halogen ions and H + ions present. The oxygen-containing organic solvent used in the present invention is selected from the following group. (a) Group of ethers: Includes diisoamyl ether, diethyl ether, diisopropyl ether, dichloroethyl ether and ethers exhibiting forms similar to these. (b) Group of Ketones: Includes methyl isobutyl ketone, methyl propyl ketone, methyl amyl ketone, cyclohexanone, methyl cyclohexanone and similar ketones. (c) Group of esters: Of course, extractants such as phosphoric esters, acetic esters and TOPO (trioctylphosphine oxide) are also included. (d) Group of amides: acetamides, amides of C4 - C15 aliphatic carboxylic acids. (e) Group of alcohols: Various (n-, secondary, tertiary) alcohols having 4 to 18 carbon atoms. The desiccant used in the present invention is used to remove physically mixed water and water extracted together with the metal halide complex before distillation, and includes anhydrous sodium sulfate, anhydrous calcium chloride, anhydrous magnesium sulfate, Anhydrous magnesium chloride, anhydrous potassium chloride,
Molecular sieves such as phosphorus pentoxide, activated alumina, magnesium perchlorate, anhydrous potassium carbonate, quicklime, barium oxide, and synthetic zeolites can be used. The inert gas used in the present invention is N2 gas and
Ar gas is Ar gas, which can be introduced as appropriate in the drying process to expel the atmosphere in the oxygen-containing organic solvent and prevent deterioration of the desiccant due to moisture absorption. Furthermore, in the heating evaporation and heating distillation steps, it can also be used to prevent oxidation of the oxygen-containing organic solvent or to prevent deterioration of each metal halide produced. Further, an inert gas can be introduced into the process as appropriate depending on the conditions of thermal evaporation and thermal distillation. The metals used as reducing agents in the present invention are Na,
Single or dual metals of Mg, Ca, Al, Pb and Zn
It is an alloy of more than one species and can be used in gaseous, liquid and red-hot solid forms. In addition, the target metal halide can also be used in gaseous, liquid, or solid forms for reduction, and the reducing atmosphere is usually an inert gas alone or a mixture of H2 gas to prevent deterioration. You can also use The present invention will be described below based on the drawings, but it should be understood that the present invention is not limited thereto. The flow sheet in Figure 1 is a diagram showing the basic type of operation of the present invention.
The oxygen-containing organic solvent A that extracts and contains the metal halide complex of Ta) is led to the drying step B, and is brought into contact with a desiccant, thereby removing the water physically present in the oxygen-containing organic solvent or extracting it. The water is dehydrated and the oxygen-containing organic solvent is dried. In this case, an inert gas can be introduced as appropriate to expel the atmosphere existing in the oxygen-containing organic solvent. Next, the water-containing desiccant D is removed, and in a heating/evaporation or heating/distillation step C, an inert gas is introduced and heating/evaporation or heating/distillation is performed under normal pressure conditions filled with inert gas. Or, by heating and distilling under reduced pressure, halides of each metal E can be obtained.
and the regenerated oxygen-containing organic solvent F is recovered. Next, the halides E of each metal are converted into reducing metals (Na, Mg, Ca, Al, Pb and
Each metal (Ti, Zr,
Hf, Nb and Ta)H are produced. The reducing metal is separated as halide J. The flow sheet in Figure 2 is for each metal (Ti, Zr, Hf,
A solution containing a metal halide complex of Nb and Ta),
By contacting the regenerated oxygen-containing organic solvent F in the extraction step K, the halogenated metal complexes of each metal (Ti, Zr, Hf, Nb, and Ta), which are the starting materials of the present invention, are extracted and contained. 3 illustrates another embodiment of the invention that incorporates a process for making an oxy-organic solvent. [Example] The present invention will be further explained with reference to Examples below. Examples Table 1 shows the details of experiments to produce metal halides for each metal. The amount of sample is approximately 0.2% of the metal halide produced.
The amount of oxygen-containing organic solvent that extracted the metal was determined in moles. In each experiment, Ar gas was injected in advance to replace the air and water in the apparatus before heating and distillation and drying.
【表】【table】
【表】
第1表の実験例で得られた各金属のハロゲン化
物を環状電気炉で密閉されたルツボに入れ、各種
の還元用金属による還元試験を行なつた結果を以
下の第2表に示す。[Table] The halides of each metal obtained in the experimental examples in Table 1 were placed in a sealed crucible in a circular electric furnace, and reduction tests using various reducing metals were conducted. The results are shown in Table 2 below. show.
【表】【table】
本発明によると、従来法による各金属(Ti,
Zr,Hf,Nb及びTa)の製造に比して工程が簡
素化され、且つ原料制限もなくなり、各種の原料
を使用することができ、更に、収率が高く省エネ
ルギーな製造方法である。
According to the present invention, each metal (Ti,
Compared to the production of Zr, Hf, Nb, and Ta), the process is simplified, there are no restrictions on raw materials, various raw materials can be used, and the production method has a high yield and is energy-saving.
第1図は本発明操作の基本型を示すフローシー
トであり、第2図は抽出工程Kを組み込んだ本発
明の別の実施態様のフローシートである。
図中:A……各金属(Ti,Zr,Hf,Nb及び
Ta)のハロゲン化金属錯体を抽出・含有する含
酸素有機溶媒、B……乾燥工程、C……加熱・蒸
発または加熱・蒸留工程、D……含水乾燥剤、E
……各金属(Ti,Zr,Hf,Nb及びTa)のハロ
ゲン化物、F……再生された含酸素有機溶媒、G
……還元工程、H……各金属(Ti,Zr,Hf,Nb
及びTa)、J……ハロゲン化物、K……抽出工
程。
FIG. 1 is a flow sheet showing the basic type of operation of the invention, and FIG. 2 is a flow sheet of another embodiment of the invention incorporating extraction step K. In the figure: A...Each metal (Ti, Zr, Hf, Nb and
Oxygen-containing organic solvent extracting and containing the metal halide complex of Ta), B...Drying step, C...Heating/evaporation or heating/distillation step, D...Water-containing desiccant, E
...Halides of each metal (Ti, Zr, Hf, Nb and Ta), F ... Regenerated oxygen-containing organic solvent, G
...Reduction process, H...Each metal (Ti, Zr, Hf, Nb
and Ta), J...halide, K...extraction step.
Claims (1)
択された1種のハロゲン化金属錯体を抽出・含有
せしめた含酸素有機溶媒を、無水芒硝、無水塩化
カルシウム、無水硫酸マグネシウム、無水塩化マ
グネシウム、無水塩化カリウム、五酸化リン、付
活アルミナ、過塩素酸マグネシウム、無水炭酸カ
リウム、生石灰、酸化バリウム及びゼオライトよ
りなる群より選択された乾燥剤と接触させた後、
前記含酸素有機溶媒を減圧または常圧で加熱蒸留
することによりハロゲン化金属を生成させると共
に含酸素有機を再生し; 次に、得られたハロゲン化金属を亜鉛、鉛、ア
ルミニウム、カルシウム、マグネシウム及びナト
リウムの単一金属及びこれらの金属を主体とする
合金と接触させることにより金属Ti,Zr,Hf,
Nb及びTaを得ることを特徴とする金属Ti,金属
Zr、金属Hf、金属Nb及び金属Taの製造方法。 2 乾燥剤と接触させることにより含酸素有機溶
媒中の水を除去し、次に、不活性ガスを充満させ
つつ常圧で蒸留を行なう特許請求の範囲第1項記
載の製造方法。 3 ハロゲン化金属錯体を含有する含酸素有機溶
媒が塩酸、硫酸、臭化水素酸、ヨウ化水素酸、硝
酸、リン酸及びフツ酸よりなる群より選択された
1種または2種以上を含有する水溶液中で生成し
たTi,Zr,Hf,Nb及びTaのうちの1種のハロ
ゲン化金属錯イオンを含酸素有機溶媒と接触さ
せ、該錯イオンを抽出することにより得られたも
のである特許請求の範囲第1項または第2項記載
の製造方法。[Scope of Claims] 1. An oxygen-containing organic solvent extracted and containing one type of metal halide complex selected from the group consisting of Ti, Zr, Hf, Nb, and Ti, anhydrous mirabilite, anhydrous calcium chloride, anhydrous After contacting with a desiccant selected from the group consisting of magnesium sulfate, anhydrous magnesium chloride, anhydrous potassium chloride, phosphorus pentoxide, activated alumina, magnesium perchlorate, anhydrous potassium carbonate, quicklime, barium oxide and zeolite,
The oxygen-containing organic solvent is heated and distilled under reduced pressure or normal pressure to generate metal halides and regenerate the oxygen-containing organic solvent; Metals Ti, Zr, Hf,
Metal Ti, metal characterized by obtaining Nb and Ta
Method for manufacturing Zr, metal Hf, metal Nb and metal Ta. 2. The manufacturing method according to claim 1, wherein water in the oxygen-containing organic solvent is removed by bringing it into contact with a desiccant, and then distillation is carried out at normal pressure while being filled with an inert gas. 3. The oxygen-containing organic solvent containing the halogenated metal complex contains one or more selected from the group consisting of hydrochloric acid, sulfuric acid, hydrobromic acid, hydroiodic acid, nitric acid, phosphoric acid, and hydrofluoric acid. A patent claim obtained by contacting a halide metal complex ion of one of Ti, Zr, Hf, Nb, and Ta generated in an aqueous solution with an oxygen-containing organic solvent and extracting the complex ion. The manufacturing method according to item 1 or 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3139187A JPS63199831A (en) | 1987-02-16 | 1987-02-16 | Production of metallic ti, zr, hf, nb and ta |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3139187A JPS63199831A (en) | 1987-02-16 | 1987-02-16 | Production of metallic ti, zr, hf, nb and ta |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63199831A JPS63199831A (en) | 1988-08-18 |
| JPH032936B2 true JPH032936B2 (en) | 1991-01-17 |
Family
ID=12329962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3139187A Granted JPS63199831A (en) | 1987-02-16 | 1987-02-16 | Production of metallic ti, zr, hf, nb and ta |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63199831A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4949960B2 (en) * | 2007-07-27 | 2012-06-13 | Dowaホールディングス株式会社 | Method for producing tantalum oxide |
| JP6427698B1 (en) * | 2018-03-26 | 2018-11-21 | 株式会社アサカ理研 | Extraction method |
| KR102638196B1 (en) * | 2023-06-23 | 2024-02-16 | 충남대학교산학협력단 | Thermal reduction reaction mixture for preparing low-oxygen transition metal powder from group IV transition metal oxide and method for preparing low-oxygen transition metal powder using the same |
-
1987
- 1987-02-16 JP JP3139187A patent/JPS63199831A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63199831A (en) | 1988-08-18 |
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