JPH0331251B2 - - Google Patents
Info
- Publication number
- JPH0331251B2 JPH0331251B2 JP58206621A JP20662183A JPH0331251B2 JP H0331251 B2 JPH0331251 B2 JP H0331251B2 JP 58206621 A JP58206621 A JP 58206621A JP 20662183 A JP20662183 A JP 20662183A JP H0331251 B2 JPH0331251 B2 JP H0331251B2
- Authority
- JP
- Japan
- Prior art keywords
- developer
- plate
- water
- lithographic printing
- image area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
〔産業上の利用分野〕
本発明は、あらかじめアルミ支持体の表面に感
光材料を塗布して成る平版印刷版材(オフセツと
PS版)の現像剤に関するもので特に感光材料が
ジアゾ化合物とカルボン酸を含有するアクリル系
オフセツトPS版を露光したあと非画像部を除去
するための現像剤に関するものである。
〔従来の技術〕
現在市販されているほとんどすべてのネガテイ
ブオフセツト用PS版はP−ジアゾフエニルアミ
ンのホルムアルデヒド縮合物に代表されるジアゾ
化合物と画像部強化の目的で配合されたカルボン
酸を含有するアクリル系多元共重合体より成る感
光性樹脂組成物と表面親水性を付与したアルミ板
より構成されている。(特公昭52−7364、特公昭
56−4144参照)。かゝるPS版を用いて平版印刷用
刷版をつくる過程において、現像剤の極めて大き
な役割は速かに非画像部の感光性樹脂層を溶解除
去し、且つ現像によつて露出したアルミ表面の親
水性を低下させず、むしろそれを助長し、一方活
性光線により硬化した画像部の樹脂層の親油性を
損なわないことである。
〔発明が解決しようとする課題〕
しかしながら、上記現像剤として要求される役
割として非画像部の親水化を助長することは逆に
画像部の親油性を低下させることにもなりかねな
いし、現像速度を高めようとすれば画像部も相対
的に溶出され画像再現性に支障をきたすなど、
種々工夫を要し、現実に、印刷時の版のよごれや
刷り出し時の着肉不良が、現像剤に起因して発生
することも少なくない。
本発明者は、自社のアクリル系オフセツトPS
版用の現像剤の改良研究をおし進めるうち、現像
スピードや非画像部のアルミ表面の親水性維持能
力等において申し分のない、新規な現像剤に到達
した。
〔課題を解決するための手段と作用〕
即ち、本発明は、一般式R−O−CH2CH2OH
(式中Rはフエニル基又はベンジル基を示す)で
表わされるエーテル化合物−以下「特定エーテル
化合物」という−、陰イオン界面活性剤及びアル
カリ性物質を含むことを特徴とする、感光性平版
印刷版用現像剤を提供するものである。
本発明における特定エーテル化合物は、より具
体的には、エチレングリコールモノフエニルエー
テル(
[Industrial Application Field] The present invention is a lithographic printing plate material (offset and
This invention relates to a developer for PS plates (PS plates), and in particular to a developer for removing non-image areas after exposing an acrylic offset PS plate whose photosensitive material contains a diazo compound and a carboxylic acid. [Prior art] Almost all PS plates for negative offset currently on the market contain a diazo compound, typified by a formaldehyde condensate of P-diazophenylamine, and a carboxylic acid blended for the purpose of strengthening the image area. It is composed of a photosensitive resin composition made of an acrylic multi-component copolymer and an aluminum plate with surface hydrophilicity. (Tokuko Showa 52-7364, Tokuko Showa
56-4144). In the process of making a lithographic printing plate using such a PS plate, the extremely important role of the developer is to quickly dissolve and remove the photosensitive resin layer in the non-image area, and also to remove the exposed aluminum surface by development. The objective is not to reduce the hydrophilicity of the resin, but rather to enhance it, while not impairing the lipophilicity of the resin layer in the image area that has been cured by actinic rays. [Problems to be Solved by the Invention] However, promoting the hydrophilicity of non-image areas, which is the required role of the developer, may conversely reduce the lipophilicity of image areas, and the development speed may be reduced. If you try to increase the image area, the image area will also be relatively eluted, causing problems with image reproducibility.
Various measures are required, and in reality, staining of the plate during printing and poor inkling at the beginning of printing are often caused by the developer. The inventor has developed his own acrylic offset PS.
While conducting research to improve the developer for printing plates, we arrived at a new developer that is perfect in terms of development speed and ability to maintain the hydrophilicity of the aluminum surface in non-image areas. [Means and effects for solving the problem] That is, the present invention solves the problem by solving the following problems:
(wherein R represents a phenyl group or a benzyl group) - hereinafter referred to as "specific ether compound" - for photosensitive lithographic printing plates characterized by containing an anionic surfactant and an alkaline substance. It provides a developer. More specifically, the specific ether compound in the present invention is ethylene glycol monophenyl ether (
【式】)とエチレ
ングリコールモノベンジルエーテル
([Formula]) and ethylene glycol monobenzyl ether (
【式】)であり、こ
れ等は有機溶剤であつて、市販されている。
本発明に用いる陰イオン界面活性剤としては、
脂肪酸塩{(R1COO)oMm}、アルキルベンゼン
スルホン酸塩{[Formula]) These are organic solvents and are commercially available. As the anionic surfactant used in the present invention,
Fatty acid salt {(R 1 COO) o Mm}, alkylbenzene sulfonate {
【式】}
アルキルスルホン酸塩{(R1−SO3)oMm}、α−
オレフインスルホン酸塩
{[Formula]} Alkyl sulfonate {(R 1 −SO 3 ) o Mm}, α-
Olefin sulfonate {
【式】【formula】
【式】等の混合}、ジアル
キルスルホコハク酸塩
{Mixture of [formula], etc.}, dialkyl sulfosuccinate {
【式】α−スルホン化脂 肪酸塩{[Formula] α-sulfonated fat Fatty acid salts {
【式】}N−メチル−N−
オレイルタウリン
{[Formula] }N-methyl-N-oleyl taurine {
【式】}アルキルリン 酸塩{[Formula]} Alkyl phosphorus Acid acid {
以下、本発明を実施例等により、更に具体的に
説明する。
実施例 1
あらかじめ、清浄な逆流コンデンサー付1容
ガラス製反応容器にブチルセロソルブ400grを注
入し、反応容器内に窒素を流入しながら撹拌し、
反応容器の外部より加温する。ブチルセロソルブ
の温度が80℃になれば、次に示す組成物を上部分
液斗より1gr/分の割合で反応容器内に滴下し
反応させる。この時反応温度は80〜86℃の範囲で
調製する。
メチルメタアクリレート 45g
スチレン 10g
アクリル酸 40g
2・Wポリブタジエングリコール 5g
(数平均分子量1350±50
日本曹達製品 G−1000)
アゾビスイソブチロニトリル 2g
反応時間は上記組成物を滴下しはじめてから4
〜5時間行ない反応終了後常温にて四元共重合体
溶液にP−ジアゾジフエニルアミンとパラホルム
アルデヒドの縮合物の2−メトキシ−4−ヒドロ
キシ−5−ベンゾインベンゼンスルホン酸60gと
オイルブル−#603の0.05g及び1.6gのエチレンジ
アミンテトラ酢酸(EDTA)次いでブチルセロ
ソルブ240gを加えて室温にて3時間撹拌混合し
た後、ブフナー斗を用いて東洋紙12.5CM−
131を通して吸引過する。
次に得られた液のうち250gをイソプロピル
アルコール1500g、キシレン200gおよび錯酸エチ
ル200gから成る混合溶媒で希釈し、感光性樹脂
組成物溶液を調製した。
次に、この感光性樹脂組成物溶液をあらかじめ
疎面化し、親水化処理された厚さ0.25m/mのア
ルミニウム2S材上にバーコーターNo.6を用いて
塗布した後100℃の熱風乾燥器にて3分間乾燥し
て感光性樹脂板を作成した。
乾燥塗布重量は2.0g/m2であつた。この感光性
樹脂板を真空焼枠中で陰画を通して4KW容超高
圧水銀灯にて1mの距離から20秒間露光した後次
に示す現像液にて室温で1分間浸漬後とり出し水
洗して乾燥し平版印刷版を得た。
エチレングリコールモノフエニルエーテル 20g
アルキルナフタレンスルホン酸ソーダ 10g
第三燐酸ナトリウム 20g
水 950g
この印刷版をハイデルGTO印刷機にかけて上
質紙に印刷したところ10万部以上印刷することが
ができた。
次にこの現像液での20℃における現像幅を見
た。その結果、現像時間20秒から10分までグレー
スケールの感度は変化なく安定していた。
しかしながら10分以上現像時間が延長されると
やゝ画像部の褪色が認められたが感度には異常は
認められなかつた。
また、上記現像液を用いて前記露光後のPS版
をオートプロセツサー600E(富士写真フイルム株
式会社製)の自動現像機にて20℃で30秒間現像
し、その時の現像処理能力を調べたところ17m2/
以上であつた。今までの現像液では約10m2/
が限度で、これにくらべれば処理能力は極めて高
いものであつた。
比較例 1
実施例1にて製造したPS版を真空焼枠中で陰
画を通して4KW容超高圧水銀灯にて1mの距離か
ら20秒間露光した後次に示す現像液にて室温で1
分間浸漬後とり出し水洗したが非画像部はほとん
ど除去不能であつた。
エチレングリコールモノフエニルエーテル 20g
エマルゲン 106 (ポリオキシエチレンラウ
リルエーテル) 20g
燐酸三ソーダ 10g
水 950g
比較例 2
実施例1にて製造した露光終了後のPS版を次
に示す現像液にて室温で1分間浸漬後とり出し水
洗したが非画像部はほとんど除去不能であつた。
エチレングリコールモノフエニルエーテル 20g
コロミン E−331 (ステアリルアミンオレ
エート) 20g
炭酸ソーダ 10g
水 950g
比較例 3
実施例1にて製造した露光終了後のPS版を次
に示す現像液にて室温で1分間浸漬後とり出し、
水洗したが非画像部は完全に除去出来なかつた。
エチレングリコールモノフエニルエーテル 20g
アンヒトール 24B (ラウリルベタイン)
20g
セスキ炭酸ソーダ 10g
水 950g
実施例 2〜10
実施例1にて製造したPS版を真空焼枠中で陰
画を通して4KW超高圧水銀灯にて1mの距離から
20秒間露光した後、表1に示す現像液にて平版印
刷版を得た。その結果を同表に併せて示す。
Hereinafter, the present invention will be explained in more detail with reference to examples and the like. Example 1 400 gr of butyl cellosolve was injected into a clean 1-volume glass reaction vessel equipped with a backflow condenser in advance, and stirred while flowing nitrogen into the reaction vessel.
Heat the reaction vessel from the outside. When the temperature of butyl cellosolve reaches 80°C, the following composition is dropped into the reaction vessel from the upper funnel at a rate of 1gr/min to react. At this time, the reaction temperature is adjusted within the range of 80 to 86°C. Methyl methacrylate 45g Styrene 10g Acrylic acid 40g 2.W polybutadiene glycol 5g (Number average molecular weight 1350±50 Nippon Soda Products G-1000) Azobisisobutyronitrile 2g Reaction time is 4 from the start of dropping the above composition
After the reaction was completed for ~5 hours, 60 g of 2-methoxy-4-hydroxy-5-benzoinbenzenesulfonic acid, a condensate of P-diazodiphenylamine and paraformaldehyde, and Oil Blue #603 were added to the quaternary copolymer solution at room temperature. After adding 0.05g of ethylenediaminetetraacetic acid (EDTA) and 1.6g of ethylenediaminetetraacetic acid (EDTA) and 240g of butyl cellosolve and stirring and mixing at room temperature for 3 hours, Toyo Shi 12.5CM-
Suction through 131. Next, 250 g of the obtained liquid was diluted with a mixed solvent consisting of 1500 g of isopropyl alcohol, 200 g of xylene, and 200 g of ethyl complex acid to prepare a photosensitive resin composition solution. Next, this photosensitive resin composition solution was coated on an aluminum 2S material with a thickness of 0.25 m/m, which had been surface-roughened and hydrophilized in advance, using a bar coater No. 6, and then dried in a hot air dryer at 100°C. A photosensitive resin plate was prepared by drying for 3 minutes. The dry coating weight was 2.0 g/m 2 . This photosensitive resin plate was exposed to light for 20 seconds from a distance of 1 m using a 4KW ultra-high pressure mercury lamp through a negative image in a vacuum printing frame, and then immersed in the following developer for 1 minute at room temperature, taken out, washed with water, dried, and plated. Got the print version. Ethylene glycol monophenyl ether 20g Sodium alkylnaphthalene sulfonate 10g Sodium triphosphate 20g Water 950g When this printing plate was printed on high-quality paper using a Heidel GTO printing machine, more than 100,000 copies were printed. Next, we looked at the development width at 20°C with this developer. As a result, the gray scale sensitivity remained stable with no change from development time of 20 seconds to 10 minutes. However, as soon as the development time was extended for more than 10 minutes, fading of the image area was observed, but no abnormality was observed in the sensitivity. In addition, the exposed PS plate was developed using the above-mentioned developer at 20°C for 30 seconds in an automatic processing machine called Auto Processor 600E (manufactured by Fuji Photo Film Co., Ltd.), and the processing performance at that time was investigated. 17m 2 /
That's all. Approximately 10m 2 / with conventional developer
was the limit, and compared to this, the processing capacity was extremely high. Comparative Example 1 The PS plate produced in Example 1 was exposed to light for 20 seconds from a distance of 1 m using a 4KW ultra-high pressure mercury lamp through a negative image in a vacuum printing frame, and then processed with the following developer at room temperature.
After being immersed for a minute, it was taken out and washed with water, but the non-image area could hardly be removed. Ethylene glycol monophenyl ether 20g Emulgen 106 (polyoxyethylene lauryl ether) 20g Trisodium phosphate 10g Water 950g Comparative example 2 The PS plate produced in Example 1 after exposure was used in the following developer for 1 minute at room temperature. After immersion, it was taken out and washed with water, but the non-image area could hardly be removed. Ethylene glycol monophenyl ether 20g Colomine E-331 (stearylamine oleate) 20g Sodium carbonate 10g Water 950g Comparative example 3 The PS plate produced in Example 1 after exposure was developed in the following developer for 1 minute at room temperature. Take out after soaking,
Although it was washed with water, the non-image area could not be completely removed. Ethylene glycol monophenyl ether 20g Amhitol 24B (lauryl betaine)
20g Sesquicarbonate soda 10g Water 950g Examples 2 to 10 The PS plate produced in Example 1 was passed through a negative image in a vacuum printing frame from a distance of 1m using a 4KW ultra-high pressure mercury lamp.
After exposure for 20 seconds, a lithographic printing plate was obtained using the developer shown in Table 1. The results are also shown in the same table.
【表】【table】
【表】
実施例 11
実施例1で作成したPS版を真空焼枠中で陰画
を通して4KW容超高圧水銀灯にて1mの距離から
20秒間露光した後、次に示す現像液にて室温で1
分間浸漬後とり出して水洗して乾燥し、平版印刷
版を得た。
エチレングリコールモノベンジルエーテル 20g
ベレツクス NB−L 20g
水ガラス(固形分50%) 10g
四ホーサンソーダ 5g
水 945g
この印刷版を用いて実施例1に準じ印刷を行つ
た結果10万部以上印刷出来た。
又、20℃における現像幅は極めてすぐれており
30分までのグレースケールの感度は変化なく安定
であり、30分以上現像時間を延長しても画像部の
褪色は認められなかつた。又感度には異常は認め
られなかつた。又現像処理能力を調べたところ17
m2/以上で実施例1の場合とほとんど同程度で
あつた。
実施例 12〜28
実施例1で作成したPS版を、実施例11と同様
に露光した後、表2に示す現像液にて平版印刷版
を得た。その結果を同表に併せて示す。
尚表中の*1及び*2部分の意味は次の通りで
ある。
*1 A;エチレングリコールモノフエニルエ
ーテル
B;ペレツクスNB−L
C;水ガラス(固形分50%)/四ホーサ
ンソーダ
=4/1
*2 18時間現像液に浸漬した後水洗乾燥した
ものの非画像部の接触角(ゴニオメーターによ
る)[Table] Example 11 The PS plate prepared in Example 1 was printed through a negative image in a vacuum printing frame from a distance of 1 m using a 4KW ultra-high pressure mercury lamp.
After exposure for 20 seconds, the following developer was used at room temperature.
After being immersed for a minute, it was taken out, washed with water, and dried to obtain a lithographic printing plate. Ethylene glycol monobenzyl ether 20g Beretskus NB-L 20g Water glass (solid content 50%) 10g Shihosan soda 5g Water 945g Using this printing plate, printing was carried out in accordance with Example 1, and as a result, more than 100,000 copies were printed. In addition, the development width at 20°C is extremely excellent.
The gray scale sensitivity was stable without any change up to 30 minutes, and no fading of the image area was observed even when the development time was extended beyond 30 minutes. Also, no abnormality was observed in sensitivity. Also, when I investigated the development processing capacity, it was 17
m 2 / or more, which was almost the same as in Example 1. Examples 12 to 28 After exposing the PS plate prepared in Example 1 to light in the same manner as in Example 11, a lithographic printing plate was obtained using the developer shown in Table 2. The results are also shown in the same table. The meanings of *1 and *2 in the table are as follows. *1 A: Ethylene glycol monophenyl ether B: Pellex NB-LC C: Water glass (solid content 50%) / Tetra-hosan soda = 4/1 *2 The non-image area after immersed in a developer for 18 hours, washed with water and dried Contact angle (by goniometer)
(1) アルマツクスTAN 応化工業(株)製
(2) FNC−B 富士写真フイルム(株)製
(3) SWN 小西六写真工業(株)製
(4) アルスターNS 日本製箔(株)製
〔使用した現像液〕
(1) N−200 応化工業(株)製
(2) DN−3C 富士写真フイルム(株)製
(3) SDN−21 小西六写真工業(株)製
(4) 本発明
※現像速度底部寸法15cm×18cmのステンレス製
バツトの中に現像液の100mlを入れ
寸法10cm×10cmのPS版(生版)を
投入浸漬して10秒毎に取り出し水洗
してプロテクトインキで版の表面を
ぬぐい汚れが認められない時の浸漬
時間で示した。
(1) Almax TAN Manufactured by Ohka Kogyo Co., Ltd. (2) FNC-B Manufactured by Fuji Photo Film Co., Ltd. (3) SWN Manufactured by Konishiroku Photo Co., Ltd. (4) Ulster NS Manufactured by Nippon Seifaku Co., Ltd. (1) N-200 Manufactured by Ohka Kogyo Co., Ltd. (2) DN-3C Manufactured by Fuji Photo Film Co., Ltd. (3) SDN-21 Manufactured by Konishiroku Photo Co., Ltd. (4) Present invention *Development Pour 100 ml of developer into a stainless steel vat with bottom dimensions of 15 cm x 18 cm, insert a PS plate (raw plate) with dimensions of 10 cm x 10 cm, soak it, take it out every 10 seconds, wash it with water, and coat the surface of the plate with protect ink. It is indicated by the immersion time when no wipe stains are observed.
【表】
実験例 2
実験例1において用いた現像速度測定用バツト
に市販の各現像液100mlを加え40℃にて18時間放
置し、その後当該放置により減少した量の水を加
え、実験例1と同様にして現像速度を測定した。
その結果は表4に示す如くで本発明の場合、ほと
んど現像液放置による現像効果の低下は見られな
かつた。[Table] Experimental Example 2 Add 100 ml of each commercially available developer to the development rate measurement vat used in Experimental Example 1, leave it for 18 hours at 40°C, then add the amount of water that decreased due to the standing, and then The development speed was measured in the same manner.
The results are shown in Table 4, and in the case of the present invention, there was almost no deterioration in the developing effect due to leaving the developing solution.
【表】
実験例 3
実験例1で用いた各種現像液の中に市販のPS
版(生版)FNC−BおよびアルスターNSを浸漬
し容器を密閉し、室温で24hr浸漬したあとPS版
を取り出し、現像・露出したアルミ表面を水洗
し、室内で4時間自然乾燥した。次いで、アルミ
表面の色変化を観察するとともにゴニオメーター
を用いて水による接触角を測定した。その結果は
表5及び表6に示す通りで、本発明で現像したも
のはアルミ表面が変色せず又接触角も小さくほと
んど非画像部に支障を与えないすぐれた現像液で
あることが判明した。[Table] Experimental Example 3 Commercially available PS was included in the various developers used in Experimental Example 1.
The plates (raw plates) FNC-B and Ulster NS were immersed, the container was sealed, and the plates were immersed for 24 hours at room temperature, then the PS plates were taken out, developed, the exposed aluminum surface was washed with water, and air-dried indoors for 4 hours. Next, the color change of the aluminum surface was observed, and the contact angle with water was measured using a goniometer. The results are shown in Tables 5 and 6, and it was found that the developed solution according to the present invention does not discolor the aluminum surface, has a small contact angle, and is an excellent developer that hardly causes any trouble to non-image areas. .
【表】
表面の性質
[Table] Surface properties
Claims (1)
ニル基又はベンジル基を示す)で表わされるエー
テル化合物、陰イオン界面活性剤及びアルカリ性
物質を含むことを特徴とする、感光性平版印刷版
用現像剤。 2 陰イオン界面活性剤がアルキルナフタレンス
ルホン酸塩である特許請求の範囲第1項記載の感
光性平版印刷版用現像剤。 3 アルカリ性物質が、水ガラスと四ホーサン塩
とからなる、特許請求の範囲第1項記載の感光性
平版印刷版用現像剤。[Claims] 1. Characterized by containing an ether compound represented by the general formula R-O-CH 2 CH 2 OH (wherein R represents a phenyl group or a benzyl group), an anionic surfactant, and an alkaline substance. A developer for photosensitive lithographic printing plates. 2. The developer for photosensitive lithographic printing plates according to claim 1, wherein the anionic surfactant is an alkylnaphthalene sulfonate. 3. The developer for a photosensitive lithographic printing plate according to claim 1, wherein the alkaline substance comprises water glass and tetraphosane salt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20662183A JPS6097358A (en) | 1983-11-01 | 1983-11-01 | Developer for photosensitive lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20662183A JPS6097358A (en) | 1983-11-01 | 1983-11-01 | Developer for photosensitive lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6097358A JPS6097358A (en) | 1985-05-31 |
| JPH0331251B2 true JPH0331251B2 (en) | 1991-05-02 |
Family
ID=16526404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20662183A Granted JPS6097358A (en) | 1983-11-01 | 1983-11-01 | Developer for photosensitive lithographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6097358A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60130741A (en) * | 1983-12-19 | 1985-07-12 | Nippon Seihaku Kk | Photosensitive lithographic plate developer |
| JPS60237442A (en) * | 1984-05-09 | 1985-11-26 | Nippon Seihaku Kk | Developer for photosensitive lithographic plate |
| US5081003A (en) * | 1987-07-27 | 1992-01-14 | Hoechst Celanese Corporation | Developer compositions for newspaper plates |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5032643B2 (en) * | 1971-10-04 | 1975-10-23 | ||
| JPS5177401A (en) * | 1974-12-26 | 1976-07-05 | Fuji Photo Film Co Ltd | GENZOEKISOSE IBUTSU |
| JPS5217901A (en) * | 1975-07-31 | 1977-02-10 | Mitsubishi Chem Ind | Developer for lithographic press plate |
-
1983
- 1983-11-01 JP JP20662183A patent/JPS6097358A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6097358A (en) | 1985-05-31 |
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