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JPH0331680B2 - - Google Patents
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JPH0331680B2 - - Google Patents

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Publication number
JPH0331680B2
JPH0331680B2 JP61167847A JP16784786A JPH0331680B2 JP H0331680 B2 JPH0331680 B2 JP H0331680B2 JP 61167847 A JP61167847 A JP 61167847A JP 16784786 A JP16784786 A JP 16784786A JP H0331680 B2 JPH0331680 B2 JP H0331680B2
Authority
JP
Japan
Prior art keywords
powder
silicon nitride
hours
firing
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61167847A
Other languages
Japanese (ja)
Other versions
JPS6325299A (en
Inventor
Katsuro Masunaga
Yasuhiko Kamitoku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP16784786A priority Critical patent/JPS6325299A/en
Priority to EP87305058A priority patent/EP0251522A3/en
Publication of JPS6325299A publication Critical patent/JPS6325299A/en
Publication of JPH0331680B2 publication Critical patent/JPH0331680B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は複合材料の素材として有用なβ型窒化
珪素ウイスカーの製法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing β-type silicon nitride whiskers useful as a material for composite materials.

(従来の技術及びその問題点) 窒化珪素ウイスカーは欠陥のない微細な繊維状
に成長した単結晶であり、非常に高い引張強度、
弾性率を有しており、複合材料、特に高温度で用
いる金属又はセラミツクス複合材料の素材として
期待されている。
(Prior art and its problems) Silicon nitride whiskers are single crystals grown in the form of fine fibers without defects, and have extremely high tensile strength and
It has a high elastic modulus and is expected to be used as a material for composite materials, especially metal or ceramic composite materials used at high temperatures.

窯業協会91、43(1983)には、非晶質窒化珪素
粉末に酸化イツトリウム粉末を配合し、配合物を
形成した後に焼成して窒化珪素焼結体を製造する
方法が開示されている。この報文は酸化イツトリ
ウムを焼結助剤として焼結体を製造する方法を開
示しているのみであり、窒化珪素ウイスカーの製
法についてはまつたく記載がない。
Ceramic Industry Association 91 , 43 (1983) discloses a method of manufacturing a silicon nitride sintered body by blending yttrium oxide powder with amorphous silicon nitride powder, forming a blend, and then firing. This report only discloses a method for producing a sintered body using yttrium oxide as a sintering aid, and does not at all describe a method for producing silicon nitride whiskers.

特開昭59−147000号公報には、シリカ、カーボ
ン及び氷晶石の混合物をアンモニアと窒素との混
合雰囲気中で加熱反応させてβ型窒化珪素ウイス
カーを製造する方法が記載されている。この方法
は、生成するβ型窒化珪素ウイスカー中に原料の
シリカ及びカーボンが残留するため、これらの除
去に煩雑な操作を必要とし、さらにウイスカーの
収率が高くないという解決すべき問題点を有して
いる。
JP-A-59-147000 describes a method for producing β-type silicon nitride whiskers by subjecting a mixture of silica, carbon, and cryolite to a heating reaction in a mixed atmosphere of ammonia and nitrogen. This method requires complicated operations to remove raw materials such as silica and carbon that remain in the β-type silicon nitride whiskers that are produced, and also has the problem that the yield of whiskers is not high. are doing.

(発明の目的及び要旨) 本発明の目的は、β型窒化珪素ウイスカーを収
率よくかつ効率的に製造できる方法を提供するこ
とにある。
(Objective and Summary of the Invention) An object of the present invention is to provide a method for producing β-type silicon nitride whiskers with good yield and efficiency.

本発明の目的は、非晶質窒化珪素及びα型窒化
珪素から選ばれる原料粉末と、原料粉末100重量
部当たり酸化物換算で0.01〜20重量部の、稀土類
元素(但しイツトリウムを除く)の酸化物粉末又
は焼成時に酸化物に転化し得る稀土類元素(但し
イツトリウムを除く)の化合物粉末(以下両者を
総称して稀土類元素化合物とよぶことがある)と
の混合粉末を、非酸化性ガス雰囲気下で焼成する
ことによつて達成される。
The object of the present invention is to combine a raw material powder selected from amorphous silicon nitride and α-type silicon nitride with 0.01 to 20 parts by weight of rare earth elements (excluding yttrium) in terms of oxide per 100 parts by weight of the raw material powder. A mixed powder of an oxide powder or a compound powder of a rare earth element (excluding yttrium) that can be converted into an oxide during firing (hereinafter both may be collectively referred to as a rare earth element compound) is a non-oxidizing powder. This is achieved by firing under a gas atmosphere.

本発明で使用される非晶質窒化珪素粉末は、そ
れ自体公知の方法、たとえば四ハロゲン化珪素と
アンモニアとを液相又は気相で反応させた反応生
成物を加熱処理することによつて得ることがで
き、通常のX線回折によつて明確な回折現象が表
れない、いわゆる非晶質の物質である。なお、こ
の非晶質窒化珪素は珪素原子、窒素原子の他に水
素原子を含むことがある。
The amorphous silicon nitride powder used in the present invention is obtained by a method known per se, for example, by heat-treating a reaction product obtained by reacting silicon tetrahalide and ammonia in a liquid phase or a gas phase. It is a so-called amorphous material that does not show a clear diffraction phenomenon by ordinary X-ray diffraction. Note that this amorphous silicon nitride may contain hydrogen atoms in addition to silicon atoms and nitrogen atoms.

α型窒化珪素粉末は、上記の非晶質窒化珪素粉
末を仮焼する方法の他に、シリカの還元窒化法、
珪素の直接窒化法等の公知の方法で製造すること
ができる。α型窒化珪素粉末の比表面積は0.001
〜20m2/g、特に2〜13m2/gであることが好ま
しい。
In addition to the above-mentioned method of calcining the amorphous silicon nitride powder, α-type silicon nitride powder can be produced using the silica reduction nitriding method.
It can be manufactured by a known method such as direct silicon nitridation. The specific surface area of α-type silicon nitride powder is 0.001
It is preferably 20 m 2 /g, especially 2 to 13 m 2 /g.

イツトリウムを除く稀土類元素の具体例として
は、ランタン、セリウム、プラセオジム、ネオジ
ム、サマリウム、ユーロピウム、ガドリニウム、
ジスプロシウム、イツテルビウム等のランタン系
列元素及びスカンジウムが挙げられる。
Specific examples of rare earth elements other than ythtrium include lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium,
Examples include lanthanum series elements such as dysprosium and ytterbium, and scandium.

焼成時に稀土類元素の酸化物に転化し得る化合
物としては、窒化珪素ウイスカー成長時に一部又
は全部が酸化物に転化し得る化合物であればいか
なる化合物を使用してもよく、中でも稀土類元素
の水酸化物、炭酸塩が便利に採用される。そのよ
うな例として、炭酸ランタン、水酸化スカンジウ
ムが挙げられる。
As the compound that can be converted into an oxide of a rare earth element during firing, any compound can be used as long as it can be partially or completely converted into an oxide during silicon nitride whisker growth. Hydroxides and carbonates are conveniently employed. Such examples include lanthanum carbonate and scandium hydroxide.

稀土類元素化合物粉末の配合量は、非晶質窒化
珪素及びα型窒化珪素から選ばれる原料粉末100
重量部当り、酸化物換算で、0.01〜20重量部好ま
しくは0.5〜10重量部である。稀土類元素化合物
粉末の配合量が下限より小さいとウイスカーの収
率が小さくなり、その配合量が上限より多いとウ
イスカー同志の融着が起こるようになる。
The blending amount of the rare earth element compound powder is 100% of the raw material powder selected from amorphous silicon nitride and α-type silicon nitride.
Per part by weight, the amount is 0.01 to 20 parts by weight, preferably 0.5 to 10 parts by weight, in terms of oxide. If the amount of rare earth element compound powder blended is smaller than the lower limit, the yield of whiskers will be lower, and if the blended amount is more than the upper limit, fusion of whiskers will occur.

原料粉末と稀土類元素化合物粉末との混合粉末
の調製法については特に制限はなく、それ自体公
知の方法、たとえば両者を乾式混合する方法、不
活性液体中で両者を湿式混合した後に不活性液体
を除去する方法等を採用することができる。混合
装置としては、V型混合機、ボールミル又は振動
ボールミルが好ましく使用される。上記混合物の
別の調製法としては、非晶質窒化珪素粉末の前駆
体、たとえばシリコンジイミド又はシリコンテト
ラミドに稀土類元素化合物粉末を混合分散させ、
この分散物を加熱処理する方法を採用することも
できる。上記調製法において、非晶質窒化珪素又
はその前駆体を使用する場合、これらは酸素又は
水分に対してきわめて敏感であるので、制御され
た不活性雰囲気下で取り扱う必要がある。
There are no particular restrictions on the method for preparing the mixed powder of the raw material powder and the rare earth element compound powder, and methods known per se can be used, such as dry mixing the two, wet mixing the two in an inert liquid, and then mixing the two in an inert liquid. It is possible to adopt a method of removing . As the mixing device, a V-type mixer, a ball mill or a vibrating ball mill is preferably used. Another method for preparing the above mixture includes mixing and dispersing rare earth element compound powder in a precursor of amorphous silicon nitride powder, such as silicon diimide or silicon tetramide;
It is also possible to adopt a method of heat-treating this dispersion. If amorphous silicon nitride or its precursors are used in the above preparation method, they must be handled under a controlled inert atmosphere since they are very sensitive to oxygen or moisture.

焼成時の非酸化性ガスを構成する非酸化性ガス
の具体例としては、窒素、アルゴン、アンモニア
あるいはこれらの混合ガスが挙げられる。焼成条
件は、混合粉末が1000℃から最高温度の間を平均
して、4〜20時間で加熱されるように設定する。
焼成時の最高温度は1600〜1750℃の範囲内の温度
である。混合粉末の焼成の際に使用される炉につ
いては特に制限はなく、たとえば高周波誘導加熱
方式又は抵抗加熱方式によるバツチ式炉、ロータ
リー炉、プツシヤー炉等を使用することができ
る。
Specific examples of the non-oxidizing gas constituting the non-oxidizing gas during firing include nitrogen, argon, ammonia, or a mixed gas thereof. The firing conditions are set so that the mixed powder is heated from 1000° C. to the maximum temperature in an average of 4 to 20 hours.
The maximum temperature during firing is within the range of 1600-1750°C. There is no particular restriction on the furnace used for firing the mixed powder, and for example, a batch type furnace, rotary furnace, pusher furnace, etc. using a high frequency induction heating method or a resistance heating method can be used.

(発明の効果) 本発明によれば、使用原料の残留がない高純度
のβ型窒化珪素ウイスカーを収率よく製造するこ
とができる。本発明で得られるβ型窒化珪素ウイ
スカーは、金属又はセラミツクスの強化用材料と
して用いることができ、特に窒化珪素焼結体及び
サイアロン焼結体の強化用材料として好適に使用
することができる。
(Effects of the Invention) According to the present invention, highly pure β-type silicon nitride whiskers with no residual raw materials can be produced with good yield. The β-type silicon nitride whiskers obtained in the present invention can be used as a material for reinforcing metals or ceramics, and can be particularly suitably used as a material for reinforcing silicon nitride sintered bodies and sialon sintered bodies.

(実施例) 以下に実施例を示す。(Example) Examples are shown below.

実施例 1 シリコンジイミドを1200℃で加熱分解して得ら
れた非晶質窒化珪素粉末50gと、純度99.9%の酸
化ランタン(La2O3)粉末1.0gとを、窒素ガス
雰囲気下ボールミルで1時間混合した。混合粉末
を、内径120mm、内容積450mlの黒鉛製ルツボに入
れ、高波周誘導炉中にセツトし、窒素ガス雰囲気
下で、室温から1200℃を1.5時間、1200〜1400℃
で4時間、1400〜1700℃を3時間で昇温し、さら
に1700℃に7時間保持して、焼成した。
Example 1 50 g of amorphous silicon nitride powder obtained by thermally decomposing silicon diimide at 1200°C and 1.0 g of lanthanum oxide (La 2 O 3 ) powder with a purity of 99.9% were combined in a ball mill under a nitrogen gas atmosphere. Mixed for an hour. The mixed powder was placed in a graphite crucible with an inner diameter of 120 mm and an inner volume of 450 ml, set in a high frequency induction furnace, and heated from room temperature to 1200°C for 1.5 hours at 1200 to 1400°C under a nitrogen gas atmosphere.
The temperature was raised from 1400 to 1700°C over 3 hours for 4 hours, and the temperature was further maintained at 1700°C for 7 hours for firing.

得られた粉末をX線回折によつて調べたとこ
ろ、その結晶形態は第1図に示すようにβ型であ
り、また走査型電子顕微鏡による観察では、第2
図に示すように、長さ10〜30μm、径0.5〜1.5μm
のウイスカーであることが認められた。非晶質窒
化珪素を基準にしてウイスカーの収率(以下単に
収率という)は91%であつた。
When the obtained powder was examined by X-ray diffraction, its crystal form was β type as shown in Figure 1, and observation using a scanning electron microscope revealed that it was β type.
As shown in the figure, length 10~30μm, diameter 0.5~1.5μm
It was recognized that it was a whisker. The whisker yield (hereinafter simply referred to as yield) was 91% based on amorphous silicon nitride.

実施例 2 比表面積4.8m2/gのα型窒化珪素粉末50gと
純度99.9%の炭酸ランタンウム[La2(CO33]粉
末2.6gとを、振動ボールミルで1時間混合した。
混合粉末を、内径120mm、内容積450mlの黒鉛製ル
ツボに入れ、高周波誘導炉中にセツトし、窒素ガ
ス雰囲気下で、室温から1200℃を1時間、1200〜
1750℃を5.5時間で昇温し、さらに1750℃に4時
間保持して、焼成した。
Example 2 50 g of α-type silicon nitride powder with a specific surface area of 4.8 m 2 /g and 2.6 g of lanthanum carbonate [La 2 (CO 3 ) 3 ] powder with a purity of 99.9% were mixed in a vibrating ball mill for 1 hour.
The mixed powder was placed in a graphite crucible with an inner diameter of 120 mm and an inner volume of 450 ml, set in a high frequency induction furnace, and heated from room temperature to 1200°C for 1 hour in a nitrogen gas atmosphere.
The temperature was raised to 1750°C over 5.5 hours, and the temperature was further maintained at 1750°C for 4 hours for firing.

得られた粉末をX線回折によつて調べたとこ
ろ、その結晶形態はβ型であり、また走査型電子
顕微鏡による観察では、長さ25〜30μm、径0.7〜
1.0μmのウイスカーであることが認められた。収
率は93%であつた。
When the obtained powder was examined by X-ray diffraction, its crystal form was β-type, and observation using a scanning electron microscope revealed that it had a length of 25-30 μm and a diameter of 0.7-30 μm.
It was recognized that it was a 1.0 μm whisker. The yield was 93%.

実施例 3 シリコンジイミドを1200℃で加熱分解して得ら
れた非晶質窒化珪素粉末200gと、純度99.9%の
酸化セリウム(CeO2)粉末8gとを、窒素ガス
雰囲気下にナイロン製ボールポツトを用い1.5時
間振動ミルで混合した。混合粉末を、内径290mm、
高さ70mmの黒鉛製ルツボに入れ、抵抗加熱式高温
炉中にセツトし、窒素ガス雰囲気下で、室温から
1200℃を2時間、1200〜1400℃を4時間、1400〜
1700℃を3時間で昇温し、さらに1700℃に8時間
保持して、焼成した。
Example 3 200 g of amorphous silicon nitride powder obtained by thermally decomposing silicon diimide at 1200°C and 8 g of cerium oxide (CeO 2 ) powder with a purity of 99.9% were mixed in a nylon ball pot under a nitrogen gas atmosphere. Mixed on a vibratory mill for 1.5 hours. Mixed powder, inner diameter 290mm,
Place it in a graphite crucible with a height of 70 mm, set it in a resistance heating high temperature furnace, and heat it from room temperature under a nitrogen gas atmosphere.
1200℃ for 2 hours, 1200~1400℃ for 4 hours, 1400~
The temperature was raised to 1700°C over 3 hours, and the temperature was further maintained at 1700°C for 8 hours for firing.

得られた粉末をX線回折によつて調べたとこ
ろ、その結晶形態はβ型であり、また走査型電子
顕微鏡による観察では、長さ10〜40μm、径0.3〜
1.4μmのウイスカーであることが認められた。収
率は89%であつた。
When the obtained powder was examined by X-ray diffraction, its crystal form was β type, and observation using a scanning electron microscope revealed that it had a length of 10 to 40 μm and a diameter of 0.3 to 0.3 μm.
It was recognized that it was a 1.4 μm whisker. The yield was 89%.

実施例 4 シリコンジイミドを1200℃で加熱分解して得ら
れた非晶質窒化珪素粉末30gと、酸化スカンジウ
ム(SC2O3)粉末0.6gとを、窒素ガス雰囲気下
にボールミルで1時間混合した。混合粉末を、内
径120mm、内容積450mlの黒鉛製ルツボに入れ、高
周波誘導炉中にセツトし、窒素ガス雰囲気下で、
室温から1200℃を1.5時間、1200〜1450℃を5時
間、1450〜1650℃で2時間で昇温し、さらに1650
℃に10時間保持して、焼成した。
Example 4 30 g of amorphous silicon nitride powder obtained by thermally decomposing silicon diimide at 1200° C. and 0.6 g of scandium oxide (SC 2 O 3 ) powder were mixed for 1 hour in a ball mill under a nitrogen gas atmosphere. . The mixed powder was placed in a graphite crucible with an inner diameter of 120 mm and an inner volume of 450 ml, set in a high frequency induction furnace, and heated under a nitrogen gas atmosphere.
Raise the temperature from room temperature to 1200℃ for 1.5 hours, 1200 to 1450℃ for 5 hours, 1450 to 1650℃ for 2 hours, and then 1650℃ for 2 hours.
It was kept at ℃ for 10 hours and fired.

得られた粉末をX線回折によつて調べたとこ
ろ、その結晶形態はβ型であり、また走査型電子
顕微鏡による観察では、長さ15〜30μm、径0.2〜
1.0μmのウイスカーであることが認められた。収
率は92%であつた。
When the obtained powder was examined by X-ray diffraction, its crystal form was β type, and observation using a scanning electron microscope revealed that it had a length of 15 to 30 μm and a diameter of 0.2 to 0.2 μm.
It was recognized that it was a 1.0 μm whisker. The yield was 92%.

実施例 5 シリコンジイミドを1200℃で加熱分解して得ら
れた非晶質窒化珪素粉末50gと、純度99.9%の酸
化サマリウム(Sm2O3)粉末2.5gとを、窒素ガ
ス雰囲気下に密閉型V型混合器で3時間混合し
た。混合粉末を、内径120mm、内容積450mlの黒鉛
製ルツボに入れ、高周波誘導炉中にセツトし、窒
素ガス雰囲気下で、室温から1200℃を2時間、
1200〜1400℃を5時間、1400〜1600℃を2時間で
昇温し、さらに1600℃に15時間保持して、焼成し
た。
Example 5 50 g of amorphous silicon nitride powder obtained by thermally decomposing silicon diimide at 1200°C and 2.5 g of samarium oxide (Sm 2 O 3 ) powder with a purity of 99.9% were placed in a closed mold under a nitrogen gas atmosphere. Mixing was carried out in a V-type mixer for 3 hours. The mixed powder was placed in a graphite crucible with an inner diameter of 120 mm and an inner volume of 450 ml, set in a high frequency induction furnace, and heated from room temperature to 1200°C for 2 hours under a nitrogen gas atmosphere.
The temperature was raised to 1,200 to 1,400°C for 5 hours, to 1,400 to 1,600°C for 2 hours, and then held at 1,600°C for 15 hours for firing.

得られた粉末をX線回折によつて調べたとこ
ろ、その結晶形態はβ型であり、また走査型電子
顕微鏡による観察では、粉末の80%は長さ20〜
25μm、径1.0〜1.2μmのウイスカーであり、残り
20%はβ型粒状窒化珪素であることが認められ
た。ウイスカー状及び粒状窒化珪素の合計収率は
87%であつた。
When the obtained powder was examined by X-ray diffraction, its crystal morphology was found to be β-type, and observation using a scanning electron microscope revealed that 80% of the powder had a crystal shape of 20 to 20 mm in length.
The whiskers are 25 μm in diameter and 1.0 to 1.2 μm in diameter.
20% was found to be β-type granular silicon nitride. The total yield of whisker-like and granular silicon nitride is
It was 87%.

実施例 6 シリコンジイミドを1200℃で加熱分解して得ら
れた非晶質窒化珪素粉末250gと、純度99.9%の
酸化ジスプロシウム(Dy2O3)粉末6.3gとを、
窒素ガス雰囲気下に振動ミルで3時間混合した。
混合粉末を、内径290mm、高さ70mmの黒鉛製ルツ
ボに入れ、抵抗加熱式高温炉中にセツトし、窒素
ガス雰囲気下で、室温から1200℃を2時間、1200
〜1410℃を3時間、1410〜1720℃を3時間で昇温
し、さらに1720℃に6時間保持して、焼成した。
Example 6 250 g of amorphous silicon nitride powder obtained by thermally decomposing silicon diimide at 1200°C and 6.3 g of dysprosium oxide (Dy 2 O 3 ) powder with a purity of 99.9%,
The mixture was mixed for 3 hours using a vibrating mill under a nitrogen gas atmosphere.
The mixed powder was placed in a graphite crucible with an inner diameter of 290 mm and a height of 70 mm, set in a resistance heating high temperature furnace, and heated from room temperature to 1200°C for 2 hours at 1200°C under a nitrogen gas atmosphere.
The temperature was raised to ~1410°C for 3 hours, then to 1410~1720°C for 3 hours, and then held at 1720°C for 6 hours for firing.

得られた粉末をX線回折によつて調べたとこ
ろ、その結晶形態はβ型であり、また走査型電子
顕微鏡による観察では、長さ5〜40μm、径0.2〜
1.2μmのウイスカーであることが認められた。収
率は89%であつた。
When the obtained powder was examined by X-ray diffraction, its crystal form was β type, and observation using a scanning electron microscope revealed that it had a length of 5 to 40 μm and a diameter of 0.2 to 0.2 μm.
It was recognized that it was a 1.2 μm whisker. The yield was 89%.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は、それぞれ、実施例1で得
られたβ型窒化珪素ウイスカーのX線回折図及び
粒子構造を示す図である。
FIG. 1 and FIG. 2 are diagrams showing the X-ray diffraction pattern and particle structure of β-type silicon nitride whiskers obtained in Example 1, respectively.

Claims (1)

【特許請求の範囲】[Claims] 1 非晶質窒化珪素及びα型窒化珪素から選ばれ
る原料粉末と、原料粉末100重量部当たり酸化物
換算で0.01〜20重量部の、希土類元素(但しイツ
トリウムを除く)の酸化物粉末又は焼成時に酸化
物に転化し得る希土類元素(但しイツトリウムを
除く)の化合物粉末との混合粉末を、非酸化性ガ
ス雰囲気下で1000℃から最高温度の間を4〜20時
間で加熱し、最高温度1600〜1750℃の範囲で焼成
することを特徴とするβ型窒化珪素ウイスカーの
製法。
1 Raw material powder selected from amorphous silicon nitride and α-type silicon nitride, and 0.01 to 20 parts by weight of rare earth element (excluding yttrium) oxide powder or at the time of firing, in terms of oxide per 100 parts by weight of the raw material powder. A mixed powder of rare earth elements (excluding yttrium) that can be converted into oxides is heated in a non-oxidizing gas atmosphere from 1000°C to a maximum temperature of 4 to 20 hours until the maximum temperature reaches 1600°C. A method for producing β-type silicon nitride whiskers, which is characterized by firing at a temperature in the range of 1750°C.
JP16784786A 1986-06-24 1986-07-18 Production of beta-silicon nitride whisker Granted JPS6325299A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP16784786A JPS6325299A (en) 1986-07-18 1986-07-18 Production of beta-silicon nitride whisker
EP87305058A EP0251522A3 (en) 1986-06-24 1987-06-08 Process for production of beta-type silicon nitride

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16784786A JPS6325299A (en) 1986-07-18 1986-07-18 Production of beta-silicon nitride whisker

Publications (2)

Publication Number Publication Date
JPS6325299A JPS6325299A (en) 1988-02-02
JPH0331680B2 true JPH0331680B2 (en) 1991-05-08

Family

ID=15857189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16784786A Granted JPS6325299A (en) 1986-06-24 1986-07-18 Production of beta-silicon nitride whisker

Country Status (1)

Country Link
JP (1) JPS6325299A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63235437A (en) * 1986-10-24 1988-09-30 Ube Ind Ltd β-type silicon nitride whisker molded body and its manufacturing method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60155509A (en) * 1983-08-12 1985-08-15 Agency Of Ind Science & Technol Preparation of fine powder of high-purity silicon nitride of isometric system

Also Published As

Publication number Publication date
JPS6325299A (en) 1988-02-02

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