JPH0332722B2 - - Google Patents
Info
- Publication number
- JPH0332722B2 JPH0332722B2 JP6276582A JP6276582A JPH0332722B2 JP H0332722 B2 JPH0332722 B2 JP H0332722B2 JP 6276582 A JP6276582 A JP 6276582A JP 6276582 A JP6276582 A JP 6276582A JP H0332722 B2 JPH0332722 B2 JP H0332722B2
- Authority
- JP
- Japan
- Prior art keywords
- inspected
- circuit
- defect
- scratches
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007547 defect Effects 0.000 claims description 43
- 238000000605 extraction Methods 0.000 claims description 26
- 239000000284 extract Substances 0.000 claims description 5
- 230000002950 deficient Effects 0.000 claims 2
- 206010070245 Foreign body Diseases 0.000 description 13
- 238000007689 inspection Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000011179 visual inspection Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Description
【発明の詳細な説明】
本発明はカラーフイルタ等の格子部をもつた微
細パターン上の欠陥を抽出する表面欠陥抽出装置
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a surface defect extraction device for extracting defects on a fine pattern having a lattice portion, such as a color filter.
固体撮像板のカラー化のため固体撮像板に直接
貼合わされる格子部をもつたカラーフイルタの欠
陥には異物附着、キズ等がある。カラーフイルタ
ーの要部を拡大したものを第1図に示す。また主
な異物及びキズがついた同カラーフイルタの要部
を拡大したものを第2図に示す。 Defects of color filters having a lattice portion that are bonded directly to a solid-state image pickup plate for colorizing the solid-state image pickup plate include adhesion of foreign matter and scratches. Figure 1 shows an enlarged view of the main parts of the color filter. Fig. 2 shows an enlarged view of the main parts of the same color filter with the main foreign objects and scratches.
カラーフイルタに異物、キズ等があると、固体
撮像板に貼合わせるとき固体撮像板の一部を壊し
たり、映像上に色むら等の悪影響を及ぼしてしま
う。このため従来検査員がカラーフイルタの表面
状態を顕微鏡で拡大し目視観察により、くまなく
検査していた。 If there are foreign objects or scratches on the color filter, part of the solid-state image pickup plate may be damaged when it is bonded to the solid-state image pickup plate, or an adverse effect such as color unevenness may occur on the image. For this reason, conventionally, inspectors thoroughly inspected the surface condition of the color filter by enlarging it with a microscope and visually observing it.
その他に従来より二次元二値映像を切り出し、
拡大縮小法により表面欠陥を検出する方法もある
が、この方法は、微小な欠陥については抽出可能
であるが、異物、キズが大きい場合には欠陥抽出
が困難である。また大型コンピユーターに格子の
基準パターンを入力しておきこの基準パターンと
被検査物の格子情報とをマツチング処理すること
により格子情報を抜き取り、異物、キズ等の欠陥
基準パターンと、新たに記憶した2値化映像信号
とのパターンマツチングを行い格子情報以外にあ
る欠陥を抽出するため、処理が複雑となる。第3
図を用いて同構成を説明する。 In addition, we have traditionally cut out two-dimensional binary images,
There is also a method of detecting surface defects using a scaling method, but although this method can extract minute defects, it is difficult to extract defects when foreign objects or scratches are large. In addition, a reference grid pattern is input into a large computer, and the grid information is extracted by matching this reference pattern with the grid information of the object to be inspected. Processing is complicated because defects other than grid information are extracted by pattern matching with the digitized video signal. Third
The configuration will be explained using figures.
同図において、1は被検査物、2は被検査物1
の光学像を走査により光電変換するテレビジヨン
カメラ、3は光電変換された信号を2値化する回
路である。4は2値化された信号を記憶する回路
である。同構成において記憶された被検査物1の
2値化信号と大型コンピユータに予め入力されて
いる欠陥のない状態の被検査物1の基準情報とを
比較し、両者の違いを求める。 In the figure, 1 is the object to be inspected, 2 is the object to be inspected 1
3 is a circuit that converts the photoelectrically converted signal into a binary value. 4 is a circuit that stores the binarized signal. The binarized signal of the inspected object 1 stored in the same configuration is compared with the reference information of the inspected object 1 in a defect-free state that has been inputted in advance to a large-sized computer, and the difference between the two is determined.
このようにして、被検査物1の欠陥を抽出す
る。しかしこのような構成であると装置が大型と
なり、また処理時間が長くかかつてしまい、実際
の生産工程へ導入することはあまり現実的でな
い。このため目視による検査が通常よく行なわれ
ているのが現状である。 In this way, defects in the object to be inspected 1 are extracted. However, with such a configuration, the apparatus becomes large-sized and the processing time is long, so it is not very practical to introduce it into an actual production process. For this reason, visual inspection is commonly performed at present.
しかし検査員の目視による欠陥検査では、欠陥
自体が微小なため、発見ミスもあり安定した検査
精度が得にくく、また検査時間が極めて長くかか
つてしまう欠点がある。 However, defect inspection by visual inspection by an inspector has the disadvantage that since the defects themselves are minute, it is difficult to obtain stable inspection accuracy due to detection errors, and the inspection time is extremely long.
本発明はこのような格子部をもつた被検査物の
格子部以外の欠陥を簡単な構成で抽出する表面欠
陥抽出装置を提供するものである。 The present invention provides a surface defect extraction device that extracts defects other than the lattice portion of an object to be inspected having such a lattice portion with a simple configuration.
本発明の表面欠陥抽出装置の構成を第4図によ
り説明する。6は格子部をもつたカラーフイルタ
等の被検査物、7は被検査物6を顕微鏡で拡大し
たのち、光学像を走査することにより光電変換す
るテレビジヨンカメラ等の装置、9はその信号を
2値化する2値化回路である。2値化した被検査
物6の一部の拡大図を第5図に示す。第5図にお
いて、b,c,dは異物、キズを示している。e
は格子線部である。カラーフイルタの異物、キズ
の欠陥抽出には大きく分けて2項目あり、1つは
カラーフイルタを固体撮像板に貼合わせるときに
障害となる異物の欠陥抽出であり、この異物は格
子部の幅より大きいものが対象となる。もう一つ
は固体撮像板の映像上に障害となる異物、キズの
欠陥抽出であり、格子幅より小さいものも対象と
なる格子部にあつても障害とならず抽出する必要
はない。 The configuration of the surface defect extraction device of the present invention will be explained with reference to FIG. 6 is an object to be inspected such as a color filter having a grating section; 7 is a device such as a television camera that magnifies the object to be inspected 6 with a microscope and converts it photoelectrically by scanning the optical image; 9 is a device that converts the signal into electricity. This is a binarization circuit that performs binarization. FIG. 5 shows an enlarged view of a portion of the binarized inspection object 6. In FIG. 5, b, c, and d indicate foreign objects and scratches. e
is the grid line part. There are two main ways to extract defects such as foreign matter and scratches on color filters. One is the extraction of foreign matter that becomes an obstacle when pasting color filters onto a solid-state image sensor. Targets large items. The other is the extraction of defects such as foreign objects and scratches that are an obstacle on the image of the solid-state image pickup plate. Even if objects smaller than the grid width are present in the target grid section, they do not become an obstacle and do not need to be extracted.
このため被検査物6の欠陥の大きさ、位置、個
数を抽出するため2値化信号18を2系路にて処
理する。1方は格子線巾より大きい異物について
抽出する系路である。もう1方は被検査物6の2
値化信号18より格子情報を抜き取り、固体撮像
板の映像上、障害となる異物、キズを抽出する系
路である。 Therefore, in order to extract the size, position, and number of defects in the inspection object 6, the binary signal 18 is processed in two paths. One is a path for extracting foreign substances larger than the grid line width. The other is the object to be inspected 6-2
This is a path for extracting grid information from the digitized signal 18 and extracting foreign objects and scratches that may be obstacles on the image of the solid-state imaging board.
まず、格子線巾より大きい異物についてカラー
フイルタ全域を対象とした欠陥抽出について説明
する。2値化回路9を通つて得られた被検査物6
の2値化された映像信号18は画像直並列回路1
0に入り、2次元的に信号が取出され、マツチン
グ回路11により格子線巾より大きい異物の情報
が時系列に抽出される。 First, a description will be given of defect extraction targeting the entire color filter for foreign particles larger than the grid line width. The object to be inspected 6 obtained through the binarization circuit 9
The binarized video signal 18 is sent to the image serial/parallel circuit 1
0, a signal is extracted two-dimensionally, and the matching circuit 11 extracts information on foreign objects larger than the grid line width in time series.
画像直並列回路10は時系列に2値化回路より
抽出された被検査物6の2値化信号18を第6図
に示すシフトレジスター等の直並列変換器21を
用いて被検査物6の絵素を二次元的に信号を得る
ようにした回路である。 The image serial/parallel circuit 10 converts the binarized signal 18 of the inspected object 6 extracted from the binarization circuit in time series to the inspected object 6 using a serial/parallel converter 21 such as a shift register shown in FIG. This is a circuit that uses picture elements to obtain signals two-dimensionally.
マツチング回路11は画像直並列回路10によ
り抽出された時系列の2次元信号19を第6図に
示すようにAND構成の回路にて第7図に示す測
定領域Aよりも、大きい異物Bがあつたときに論
理状態を反転するような回路である。Aは縦横の
格子線幅より大きければ形状は任意である。 The matching circuit 11 converts the time-series two-dimensional signal 19 extracted by the image serial/parallel circuit 10 into an AND-configured circuit as shown in FIG. This is a circuit that inverts its logic state when A can have any shape as long as it is larger than the vertical and horizontal grid line widths.
マツチング回路11の出力信号20は第4図の
欠陥抽出回路12に入る。欠陥抽出回路12
では、マツチング回路11の出力信号20より欠
陥信号を抽出し、個数、大きさを計数し、CPU
16のRAM(Random Access Memory)に欠
陥情報を格納する。 The output signal 20 of the matching circuit 11 is input to the defect extraction circuit 12 shown in FIG. Defect extraction circuit 12
Then, defect signals are extracted from the output signal 20 of the matching circuit 11, the number and size are counted, and the CPU
Defect information is stored in 16 RAMs (Random Access Memory).
この内容によりCPU(Central Processing
Unit)16は格子線巾以上の異物について認識
する。第5図は被検査物6の一部の拡大図でb,
c,dが異物およびキズを示すが、これが画像直
並列回路10及びマツチング回路11を通過する
と第8図のようになり、第7図の異物Aより小さ
い異物、キズは抽出されない。よつて、異物、キ
ズb及びcは抽出されるが異物dは抽出されな
い。 This content allows CPU (Central Processing)
Unit) 16 recognizes foreign objects larger than the grid line width. FIG. 5 is an enlarged view of a part of the object to be inspected 6b,
C and d indicate foreign matter and scratches, but when they pass through the image serial/parallel circuit 10 and the matching circuit 11, they become as shown in FIG. 8, and foreign matter and scratches smaller than foreign matter A in FIG. 7 are not extracted. Therefore, foreign matter and scratches b and c are extracted, but foreign matter d is not extracted.
次に被検査物6の2値化信号18より格子情報
を消失し、異物、キズ等の欠陥を抽出する系路に
ついて説明する。 Next, a system for eliminating grid information from the binary signal 18 of the inspected object 6 and extracting defects such as foreign objects and scratches will be explained.
2値化信号18は画像直並列回路10に入ると
ともに記憶回路13に入る。記憶回路13では格
子消去回路14の動作により格子情報が消去され
る。 The binarized signal 18 enters the image serial/parallel circuit 10 and also enters the storage circuit 13. In the memory circuit 13, the grid information is erased by the operation of the grid erase circuit 14.
格子消去回路14は記憶回路13より被検査物
6の一走査分の信号を取り出し、基準の格子情報
と被検査物6の格子情報とをマツチングさせ、順
次、走査を更新し全面の格子部を消去する。第5
図の被検査物6がこの系路を通過すると第9図の
ようになる。つまり、第5図の異物、キズb,
c,dは全て抽出される。しかし格子情報を抜き
取つた後には全絵素の抽出を行なうため第7図に
示す測定領域Aの大きさよりも小さくて、抽出さ
れなかつた異物dは抽出されるようになるが、格
子情報を消去しているため格子上にあつた異物b
は4分割されてしまう。 The lattice erasing circuit 14 takes out the signal for one scan of the object to be inspected 6 from the memory circuit 13, matches the reference lattice information with the lattice information of the object 6 to be inspected, and sequentially updates the scanning to erase the entire lattice portion. to erase. Fifth
When the inspected object 6 shown in the figure passes through this path, it becomes as shown in FIG. 9. In other words, foreign matter, scratch b,
c and d are all extracted. However, after extracting the lattice information, all pixels are extracted, so the foreign object d, which was smaller than the measurement area A shown in FIG. 7 and was not extracted, is extracted. Foreign matter b on the grid due to erasing
is divided into four parts.
次にそれぞれの系路を通過して抽出された欠陥
情報は、欠陥抽出回路12及び欠陥抽出回路
15により、個数、大きさが把握されCPU16
のRAMに欠陥情報が格納される。CPU16はそ
れらの情報を統合して第10図のように、抽出結
果として異物、キズb,c,dを明確な形で得
る。 Next, the defect information extracted after passing through each path is grasped by the defect extraction circuit 12 and defect extraction circuit 15 in terms of number and size, and the CPU 16
Defect information is stored in RAM. The CPU 16 integrates the information and obtains the foreign matter and scratches b, c, and d in a clear form as an extraction result, as shown in FIG.
このように異物、キズの統合処理をしつつ、
CPU16は、欠陥抽出回路12及び欠陥抽出
回路15が働いた後、駆動回路17を動かし、
被検査物6の載置台8を移動され、次の画面の欠
陥抽出を実行する。これを繰返して被検査物6の
全域の欠陥抽出を行なう。 While performing integrated treatment of foreign objects and scratches in this way,
After the defect extraction circuit 12 and the defect extraction circuit 15 operate, the CPU 16 operates the drive circuit 17.
The mounting table 8 for the object to be inspected 6 is moved, and defect extraction for the next screen is executed. This process is repeated to extract defects in the entire area of the object 6 to be inspected.
本発明の表面欠陥抽出装置は、上記のような構
成をとることにより次に示す効果を得る。 The surface defect extraction device of the present invention obtains the following effects by adopting the above configuration.
まず、目視検査を自動化することができ省力化
がはかれるとともに検査精度を上げられる。また
大型コンピユータを使つた複雑なパターンマツチ
ングを必要とせず、簡単な回路構成で短時間に格
子部をもつたカラーフイルタ等のパターン上の異
物、キズが抽出できる。 First, visual inspection can be automated, saving labor and improving inspection accuracy. Furthermore, foreign objects and scratches on patterns such as color filters with grid portions can be extracted in a short time with a simple circuit configuration without the need for complicated pattern matching using a large computer.
さらに、格子線巾より大きい異物、キズの抽出
部と格子を消去した後、絵素単位での異物、キズ
の抽出部を分けて処理することにより格子上にま
たがつて存在する異物、キズについて容易に認識
することができる。 Furthermore, after erasing the extraction part of foreign matter and scratches larger than the grid line width and the grid, the foreign matter and scratch extraction part of each pixel are processed separately to eliminate foreign matter and scratches that exist across the grid. can be easily recognized.
以上のように本発明の表面欠陥抽出装置は格子
部をもつた被検査物の欠陥を簡単な構成で抽出す
るものであり、工業上の利用価値が高い。 As described above, the surface defect extraction device of the present invention extracts defects of an object to be inspected having a lattice portion with a simple configuration, and has high industrial utility value.
第1図は被検査物の要部拡大図、第2図は同被
検査物に異物が付いた状態を示す要部拡大図、第
3図は従来の表面欠陥抽出装置の構成を示す図、
第4図は本発明の実施例における表面欠陥抽出装
置の構成を示すブロツク図、第5図は被検査物に
異物、キズの付いた状態を示す図、第6図は格子
線巾より大きい異物およびキズを抽出するマツチ
ング回路を示す図、第7図は抽出される異物のサ
イズを説明するための図、第8図は格子線巾より
大きい異物、キズを抽出した結果を示す図、第9
図は格子を消去した後、全絵素の異物、キズを抽
出した結果を示す図、第10図は第8図、第9図
で示した抽出結果をCPUで演算処理で統合した
結果を示す図である。
6……被検査物、7……光電変換装置、9……
2値化回路、10……画像直並列回路、11……
マツチング回路、12……欠陥抽出回路、13…
…記憶回路、14……格子消去回路、15……欠
陥抽出回路。
Fig. 1 is an enlarged view of the main part of the object to be inspected, Fig. 2 is an enlarged view of the main part showing the state in which foreign matter is attached to the object to be inspected, and Fig. 3 is a diagram showing the configuration of a conventional surface defect extraction device.
Fig. 4 is a block diagram showing the configuration of a surface defect extraction device according to an embodiment of the present invention, Fig. 5 is a drawing showing a state in which an object to be inspected has foreign matter and scratches, and Fig. 6 shows a foreign matter larger than the grid line width. FIG. 7 is a diagram for explaining the size of foreign matter extracted; FIG. 8 is a diagram showing the result of extracting foreign matter and scratches larger than the grid line width; FIG. 9
The figure shows the result of extracting foreign objects and scratches from all picture elements after erasing the grid, and Figure 10 shows the result of integrating the extraction results shown in Figures 8 and 9 through arithmetic processing on the CPU. It is a diagram. 6...Object to be inspected, 7...Photoelectric conversion device, 9...
Binarization circuit, 10... Image serial/parallel circuit, 11...
Matching circuit, 12... Defect extraction circuit, 13...
...memory circuit, 14...grid erasure circuit, 15...defect extraction circuit.
Claims (1)
換する手段と、所定のレベルで前記光電変換手段
による電気信号を2値化する2値化手段と、格子
線幅よりも大きい2次元領域で前記2値化手段の
信号を取り出し、前記2次元領域の論理状態が所
定値である場合に欠陥であるとする第一の欠陥抽
出手段と、前記2値化手段の信号と基準格子情報
とを比較して格子部信号を抜き取る格子部抜取り
手段と、前記格子部抜取り手段の出力の論理状態
によつて欠陥とする第二の欠陥抽出手段とを備
え、前記第1、第2の欠陥抽出手段より抽出され
た欠陥抽出信号を統合して前記被検査物の欠陥部
を抽出することを特徴とする表面欠陥抽出装置。1 means for photoelectrically converting an object to be inspected having a grating portion while scanning it; a binarizing means for binarizing the electrical signal from the photoelectric converter at a predetermined level; a first defect extraction means that extracts the signal of the binarization means and determines that the two-dimensional area is defective when the logical state is a predetermined value; the first and second defect extracting means, comprising: a lattice part extracting means for comparing and extracting a lattice part signal; and a second defect extracting means for detecting a defect depending on the logic state of the output of the lattice part extracting means; 1. A surface defect extraction apparatus, characterized in that the defect extraction signals extracted from the above are integrated to extract a defective part of the object to be inspected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57062765A JPS58179304A (en) | 1982-04-14 | 1982-04-14 | Surface defect extraction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57062765A JPS58179304A (en) | 1982-04-14 | 1982-04-14 | Surface defect extraction device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58179304A JPS58179304A (en) | 1983-10-20 |
| JPH0332722B2 true JPH0332722B2 (en) | 1991-05-14 |
Family
ID=13209805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57062765A Granted JPS58179304A (en) | 1982-04-14 | 1982-04-14 | Surface defect extraction device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58179304A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0541551Y2 (en) * | 1987-02-16 | 1993-10-20 |
-
1982
- 1982-04-14 JP JP57062765A patent/JPS58179304A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58179304A (en) | 1983-10-20 |
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