JPH0332763B2 - - Google Patents
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- JPH0332763B2 JPH0332763B2 JP18236883A JP18236883A JPH0332763B2 JP H0332763 B2 JPH0332763 B2 JP H0332763B2 JP 18236883 A JP18236883 A JP 18236883A JP 18236883 A JP18236883 A JP 18236883A JP H0332763 B2 JPH0332763 B2 JP H0332763B2
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- refractive index
- optical waveguide
- glass transition
- temperature
- difference
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Description
【発明の詳細な説明】
本発明は高分子材料を用いた光導波路、更に詳
細にはレーザーなどを用いて熱エネルギーを非晶
性物質に加えることにより熱履歴差を生じさせ、
これにより高い屈折率差を利用した光導波路に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention uses an optical waveguide using a polymeric material, and more specifically, uses a laser or the like to apply thermal energy to an amorphous substance to generate a difference in thermal history.
This relates to an optical waveguide that utilizes a high refractive index difference.
高分子材料は可視から近赤外領域まで比較的低
損失で均質・広面積な薄膜を容易に作製すること
ができることから光導波路用の材料として注目さ
れている。しかし、現状では高い屈折率の差を得
る方法がないため実用化に至つていない。例えば
光損失が小さく、最も大きな屈折率変化が得られ
ている光重合によるメタクリル酸メチルの場合で
もその屈折率変化は0.1%程度であり、光導波路
形成用としては実用的でない。 Polymer materials are attracting attention as materials for optical waveguides because they can be easily fabricated into homogeneous, wide-area thin films with relatively low loss in the visible to near-infrared range. However, as there is currently no way to obtain a high difference in refractive index, this method has not been put to practical use. For example, even in the case of photopolymerized methyl methacrylate, which has the smallest optical loss and the largest change in refractive index, the change in refractive index is about 0.1%, which is not practical for forming optical waveguides.
本発明はかかる現状に鑑みてなされたもので、
その目的は可視から近赤外領域まで比較的光損失
が小さく、均質で広面積な薄膜作成が容易で、高
い屈折率差を得ることができ、書き込みが容易に
できる高分子光導波路を提供することにある。 The present invention was made in view of the current situation, and
The purpose is to provide a polymer optical waveguide that has relatively low optical loss from visible to near-infrared regions, can easily create a homogeneous and wide-area thin film, can obtain a high refractive index difference, and can be easily written. There is a particular thing.
すなわち、本発明は、次式で示されるシアン化
ビニリデンと、他のビニル化合物、ビニリデン化
合物又はジエン類との共重合体から構成され、
かつ部分的に熱処理すことにより屈折率の異なる
部分を生じさせて光導波回路を形成したことを特
徴とする高分子光導波路に関する。 That is, the present invention is composed of a copolymer of vinylidene cyanide represented by the following formula and another vinyl compound, vinylidene compound, or diene, The present invention also relates to a polymer optical waveguide characterized in that the optical waveguide circuit is formed by partially heat-treating the parts to produce parts having different refractive indexes.
次に本発明について詳細に説明する。本発明に
おいて光導波路形成用材料として用いられる高分
子化合物はシアン化ビニリデンと他のビニル化合
物、ビニリデン化合物あるいはジエン類との共重
合あるいは交互共重合により得られるものであ
る。 Next, the present invention will be explained in detail. The polymer compound used as a material for forming an optical waveguide in the present invention is obtained by copolymerization or alternating copolymerization of vinylidene cyanide and other vinyl compounds, vinylidene compounds, or dienes.
他のビニル化合物、ビニリデン化合物、ジエン
類として、スチレン、ジクロロスチレン、アクリ
ル酸及びそのエステル、メタクリル酸及びそのエ
ステル、ビニルアルコール及びそのエステル、塩
化ビニル、塩化ビニリデン、弗化ビニル、弗化ビ
ニリデン、三弗化エチレン、ブタジエン、クロロ
ブタジエン、イソブチレン、無水マレイン酸、ア
クリロニトリル、α−クロロアクリロニトリル、
メチルビニルケトン、ビニルイソブチルエーテ
ル、シアノアクリレート類などが例としてあげら
れる。エステル化合物については重合後その一部
あるいは全部について加水分解等の化学変性を行
なうことも可能である。 Other vinyl compounds, vinylidene compounds, and dienes include styrene, dichlorostyrene, acrylic acid and its esters, methacrylic acid and its esters, vinyl alcohol and its esters, vinyl chloride, vinylidene chloride, vinyl fluoride, vinylidene fluoride, Fluorinated ethylene, butadiene, chlorobutadiene, isobutylene, maleic anhydride, acrylonitrile, α-chloroacrylonitrile,
Examples include methyl vinyl ketone, vinyl isobutyl ether, and cyanoacrylates. It is also possible to chemically modify a part or all of the ester compound after polymerization, such as hydrolysis.
シアン化ビニリデンと他のモノマーの共重合体
中における組成比はモルで0.5〜1.5:1、好まし
くは0.8:1〜1.2:1の範囲が用いられ、特に好
ましくは、1:1の交互共重合体が用いられる。 The mole composition ratio of vinylidene cyanide and other monomers in the copolymer is 0.5 to 1.5:1, preferably 0.8:1 to 1.2:1, particularly preferably 1:1 alternating copolymerization. Consolidation is used.
上記単量体の重合は、この種単量体の重合方法
として知られた方法を用いて行なうことができ、
ラジカル開始剤例えばα,α′−アゾビスイソブチ
ロニトリルの共存下に熱を加えることにより重合
することができる。 The polymerization of the above monomer can be carried out using a method known as a method for polymerizing this type of monomer,
Polymerization can be carried out by applying heat in the presence of a radical initiator such as α,α'-azobisisobutyronitrile.
手段としては乳化重合、けんだく重合、塊状重
合、溶液重合等を採用することができるが、好ま
しくは、単量体をトルエンあるいはトルエン−ヘ
キサン混合溶剤等の溶媒に溶解して重合を行な
い、重合の進行と共に析出する重合体を回収する
ことによつて行なわれる。 As the means, emulsion polymerization, suspension polymerization, bulk polymerization, solution polymerization, etc. can be adopted, but preferably, the monomer is dissolved in a solvent such as toluene or a mixed solvent of toluene and hexane, and then the polymerization is carried out. This is done by collecting the polymer that precipitates as the process progresses.
通常、非晶質の高分子をそのガラス転移温度よ
り若干低い温度で熱処理を施すと、ガラス転移温
度より高い温度で加熱後急冷したものに比し、密
度の高いガラス状態の高分子が得られる。この現
象は体積緩和現象と呼ばれている。 Normally, when an amorphous polymer is heat-treated at a temperature slightly lower than its glass transition temperature, a glassy polymer with higher density can be obtained than when it is heated at a temperature higher than its glass transition temperature and then rapidly cooled. . This phenomenon is called volume relaxation phenomenon.
すなわち、ガラス転移温度より高い温度に加熱
後急冷したものを、ガラス転移温度より10℃程度
低い温度で熱処理を施すと、密度はしだいに増加
し、ある平衡値に近づく。また、この熱処理を施
したものをガラス転移温度より高い温度に加熱後
急冷すと、密度はほぼ熱処理前の値にもどり、こ
の密度変化は可逆的である。 That is, when a material that has been heated to a temperature higher than the glass transition temperature and then rapidly cooled is heat-treated at a temperature approximately 10° C. lower than the glass transition temperature, the density gradually increases and approaches a certain equilibrium value. Furthermore, when the heat-treated material is heated to a temperature higher than the glass transition temperature and then rapidly cooled, the density returns to approximately the value before the heat treatment, and this change in density is reversible.
同様な密度差は、ガラス転移温度より高い温度
から早い速度で冷却したものと徐冷したものの間
でも観測される。また、仮に冷却速度が同じで
も、高圧下でその圧力下でのガラス転移温度より
高い温度からガラス転移温度以下に冷却した後常
圧に戻したものと、常圧でガラス転移温度以上の
温度から冷却したものの間でも同様な密度差が観
測される。これらの現象は全て、ガラス転移が緩
和現象であることに由来するものである。 Similar density differences are observed between samples cooled quickly and slowly from temperatures above the glass transition temperature. Even if the cooling rate is the same, there is a difference between cooling from a temperature higher than the glass transition temperature under high pressure to below the glass transition temperature and then returning to normal pressure, and one from a temperature higher than the glass transition temperature at normal pressure. A similar density difference is observed between cooled samples. All of these phenomena originate from the fact that glass transition is a relaxation phenomenon.
この密度差は通常ごく小さい。例えばポリスチ
レンを1℃/3分で冷却した場合と、1℃/1日
で冷却して得られるガラスの密度差は約0.18%常
圧と600気圧下で1℃/3分で冷却して得られガ
ラスの密度差はポリスチレンで約0.6%であるに
すぎない(Polymer Journal,2,644(1971))。
この密度差に基づく屈折率の差は1℃/1日とい
う遅い速度で冷却したものと急冷したものの差で
やつと0.001程度であり、従来光導波路形成用材
料としての利用の対象とはならなかつた。 This density difference is usually very small. For example, the difference in density between polystyrene cooled at 1°C/3 minutes and glass obtained by cooling it at 1°C/1 day is approximately 0.18%. The difference in density between glass and polystyrene is only about 0.6% (Polymer Journal, 2, 644 (1971)).
The difference in refractive index based on this density difference is about 0.001 between those cooled at a slow rate of 1°C/day and those cooled rapidly, and has not been used as a material for forming optical waveguides. Ta.
本発明は、シアン化ビニリデンを他のモノマー
との共重合体とすることにより、この密度差が通
常の非晶性高分子にくらべ格段に大きく、それに
伴つて光導波路として利用出来る程大きな屈折率
差を得ることができることを可能としたものであ
る。 In the present invention, by making vinylidene cyanide into a copolymer with other monomers, this density difference is much larger than that of ordinary amorphous polymers, and along with this, the refractive index is large enough to be used as an optical waveguide. This made it possible to obtain the difference.
本発明の光導波路形成用材料はフイルム、シー
ト、モノフイラメントなど目的に応じた形状に成
形される。また光導波路としては、本発明共重合
体の単独相で構成することもできるが、本発明共
重合合体を溶融石英などの基材と積層して用いる
こともできる。 The material for forming an optical waveguide of the present invention is molded into a desired shape such as a film, sheet, or monofilament. Further, the optical waveguide can be constructed of a single phase of the copolymer of the present invention, but it can also be used by laminating the copolymer of the present invention with a base material such as fused silica.
本発明光導波路形成用材料に光導波回路を書き
込むときは、成形された光導波路形成用材料を一
旦ガラス転移点以上に加熱した後、徐冷又は急冷
して、均一な状態となるように処理をし、次いで
導波回路を書き込むべき位置の屈折率が周辺に対
して変化する様にレーザ光、高周波、超音波など
を照射して部分的にガラス転移点以上に昇温した
後、急冷又は徐冷することによつて前記予備処理
とは異つた熱履暦を与えて屈折率の相異する部分
を形成し、これによつて書き込みが行なわれる。 When writing an optical waveguide circuit on the optical waveguide forming material of the present invention, the molded optical waveguide forming material is heated above the glass transition point and then slowly or rapidly cooled to a uniform state. Then, after irradiating laser light, high frequency, ultrasonic waves, etc. to partially raise the temperature to above the glass transition point so that the refractive index of the position where the waveguide circuit is to be written changes with respect to the surrounding area, it is rapidly cooled or By slow cooling, a heat history different from that in the pretreatment is provided to form portions with different refractive indexes, and writing is thereby performed.
従つて、予備処理は書き込み時の熱履歴とは対
照的な熱履暦を与えるように行ない、書き込むと
きに急冷する場合には、光導波路形成材料を加熱
炉又はレーザー光線等でガラス転移点以上に加熱
した後に徐冷するか、あるいはガラス転移点より
若干低い温度、一般にはガラス転移点より3〜50
℃、好ましくは5〜15℃低い温度で熱処理を行な
う。加圧下に徐冷又は熱処理することもできる。 Therefore, the preliminary treatment is performed to give a thermal history that is in contrast to the thermal history during writing, and when rapidly cooling during writing, the optical waveguide forming material is heated to a temperature above the glass transition point using a heating furnace or a laser beam, etc. After that, it is cooled slowly or at a temperature slightly lower than the glass transition point, generally 3 to 50 degrees below the glass transition point.
The heat treatment is carried out at a temperature lower than 5°C, preferably 5 to 15°C. Slow cooling or heat treatment under pressure can also be carried out.
一方、書き込み時に徐冷されるときは、予備処
理は急冷される。 On the other hand, when slow cooling is performed during writing, rapid cooling is performed during preliminary processing.
通常、ガラス転移は幅を持つた温度域で起こ
る。したがつて本発明の光導波路形成用材料をガ
ラス転移温度以上で加熱し転移を起こさせる場
合、このことを考慮に入れる必要がある。 Glass transition usually occurs over a wide range of temperatures. Therefore, when heating the optical waveguide-forming material of the present invention above the glass transition temperature to cause a transition, this must be taken into consideration.
一般に、予備処理又は書き込時の加熱は、ガラ
ス転移温度よりも5℃以上、好ましくは10℃以上
で加熱すると良い。温度の上限は特になく光導波
路形成材料の分解温度以下で行なわれる。 Generally, heating during pretreatment or writing is preferably performed at a temperature of 5° C. or higher, preferably 10° C. or higher, above the glass transition temperature. There is no particular upper limit to the temperature, and the temperature is below the decomposition temperature of the optical waveguide forming material.
書き込まれた光導波回路の保存は、通常ガラス
転移点より30℃以上、好ましくは50℃以上低い温
度で行なわれる。 The written optical waveguide circuit is normally stored at a temperature lower than the glass transition point by 30° C. or more, preferably 50° C. or more.
履歴差による屈折率の差は、シアン化ビニリデ
ンと共重合するモノマーの種類や組成比、履歴を
与える条件にもよるが、組成比が0.5:1〜1.5:
1の場合で0.003から0.03程度である。この値は、
同じ条件下のポリスチレンが0.001という屈折率
の差しか生じないことに比べ、非常に大きい。 The difference in refractive index due to history difference depends on the type and composition ratio of the monomer copolymerized with vinylidene cyanide, and the conditions for providing history, but when the composition ratio is 0.5:1 to 1.5:
In the case of 1, it is about 0.003 to 0.03. This value is
This is extremely large compared to polystyrene under the same conditions, which has a refractive index difference of only 0.001.
本発明の一具体例を第1図に示す。 A specific example of the present invention is shown in FIG.
1は低屈折率からなる基材、例えばパイレツク
スガラス、溶融石英等を用いることができる。2
は本発明の共重合体よりなる高分子膜、3は高分
子膜2中に作成された光導波回路である。このよ
うな構造からなる光導波路においては、例えば光
を導波回路端面4から入射させると、導波回路3
の屈折率が外部り高いため、光は導波回路内に閉
じこめられたまま導波し、2本の導波回路の端部
5,5′から2つの光に分けられて出射させるこ
とができる。 1 may be a base material having a low refractive index, such as Pyrex glass or fused silica. 2
3 is a polymer film made of the copolymer of the present invention, and 3 is an optical waveguide circuit formed in the polymer film 2. In an optical waveguide having such a structure, for example, when light is incident from the waveguide circuit end face 4, the waveguide circuit 3
Since the refractive index of the light is higher on the outside, the light can be guided while being confined within the waveguide circuit, and can be split into two lights and emitted from the ends 5 and 5' of the two waveguide circuits. .
以下、シアン化ビニリデンと他のモノマーの交
互共重合体を中心に説明するが、組成比が前述の
範囲であれば比較的容易に光導波路として使用で
きる程度の屈折率の差を生ずるので本発明は以下
の説明によりなんら制約されるものではない。 The following explanation will focus on alternating copolymers of vinylidene cyanide and other monomers, but if the composition ratio is within the above-mentioned range, a difference in refractive index that can be used relatively easily as an optical waveguide will be generated, so the present invention is not restricted in any way by the following explanation.
次に本発明を実施例によつて説明するが、本発
明はこれによつてなんら限定されるものではな
い。 Next, the present invention will be explained with reference to Examples, but the present invention is not limited thereto in any way.
実施例 1
シアン化ビニリデンと酢酸ビニルの交互共重合
体のフイルム(ガラス転移点175℃)を作成し、
このフイルムを180℃迄加熱後急冷した。この急
冷フイルムを部分的に160℃に加熱し、24時間160
℃に保つた後、急冷して得られたフイルムの屈折
率を測定した。180℃で急冷した部分と比べて160
℃で24時間熱処理を施した部分の屈折率は約0.7
%高くなつた。これらの熱処理フイルムを再180
℃に短時間加熱後急冷したものの屈折率は約
1.4892であり、急冷と熱処理による屈折率の変化
は可逆的であつた。2時間程度の熱処理でも、屈
折率上昇は約0.33%であり、通常の非晶性高分子
に比べて非常に大きな変化を示した。Example 1 A film (glass transition point: 175°C) of an alternating copolymer of vinylidene cyanide and vinyl acetate was prepared,
This film was heated to 180°C and then rapidly cooled. This quenched film was partially heated to 160°C and kept at 160°C for 24 hours.
After being kept at ℃, the refractive index of the obtained film was measured. 160 compared to the part quenched at 180℃
The refractive index of the part heat-treated for 24 hours at °C is approximately 0.7.
% has increased. These heat treated films are re-180
The refractive index of the product heated to ℃ for a short time and then rapidly cooled is approximately
1.4892, and the change in refractive index due to rapid cooling and heat treatment was reversible. Even after heat treatment for about 2 hours, the refractive index increased by about 0.33%, which was a very large change compared to ordinary amorphous polymers.
実施例 2
実施例1と同じシアン化ビニリデンと酢酸ビニ
ルの交互共重合体の急冷フイルムを4000気圧下で
それぞれ180℃及び200℃で1時間熱処理した後冷
却し除圧した。得られたフイルムの屈折率は180
℃で処理したもので1.5141また200℃で熱処理し
たものでは1.5213であり、常圧で180℃及び200℃
より急冷したフイルムにくらべ屈折率は約1.7な
いし2.2%高くなつた。これらのフイルムの中に
作られる光導波路の部分を除いて再度常圧で180
℃まで加熱した後急冷すことにより光導波路を得
た。Example 2 A quenched film of the same alternating copolymer of vinylidene cyanide and vinyl acetate as in Example 1 was heat treated at 180° C. and 200° C. for 1 hour under 4000 atmospheres, and then cooled and depressurized. The refractive index of the obtained film is 180
1.5141 for those treated at ℃ and 1.5213 for those heat treated at 200℃, and 180℃ and 200℃ at normal pressure.
The refractive index was approximately 1.7 to 2.2% higher than that of the more rapidly cooled film. These films were heated to 180°C at normal pressure, except for the optical waveguide part that was created inside these films.
An optical waveguide was obtained by heating to ℃ and then rapidly cooling.
実施例 3
シアン化ビニリデンとメタクリル酸メチルの交
互共重合体のフイルム(ガラス転移点148℃)を
実施例1と同様にして175℃から急冷した後、140
℃で24時間熱処理をしたものの屈折率を測定し
た。175℃から急冷したものと比べて140℃で24時
間熱処理を施したものの屈折率は約0.4%高くな
つた。この変化も可逆的であり、再度175℃に加
熱した後急冷したものの屈折率は1.5174であつ
た。Example 3 A film of an alternating copolymer of vinylidene cyanide and methyl methacrylate (glass transition point: 148°C) was rapidly cooled from 175°C in the same manner as in Example 1, and then cooled to 140°C.
The refractive index was measured after heat treatment at ℃ for 24 hours. The refractive index of the material heat-treated at 140°C for 24 hours was approximately 0.4% higher than that of the material rapidly cooled from 175°C. This change was also reversible, and the refractive index was 1.5174 when the sample was heated again to 175°C and then rapidly cooled.
実施例 4
シアン化ビニリデンと安息香酸ビニルの交互共
重合体のフイルム(ガラス転移点175℃)を実施
例1と同様にして190℃から急冷した後、160℃で
24時間熱処理をしたものの屈折率を測定した。
190℃から急冷したものと比べ160℃で24時間熱処
理を施したものの屈折率は約0.3%高くなつた。
また、急冷と熱処理による屈折率の変化は実施例
1と同様可逆的であつた。Example 4 A film of an alternating copolymer of vinylidene cyanide and vinyl benzoate (glass transition point: 175°C) was rapidly cooled from 190°C in the same manner as in Example 1, and then cooled to 160°C.
The refractive index was measured after heat treatment for 24 hours.
The refractive index of the material heat-treated at 160°C for 24 hours was approximately 0.3% higher than that of the material rapidly cooled from 190°C.
Further, the change in refractive index due to rapid cooling and heat treatment was reversible as in Example 1.
第1図は、本発明の一具体例の斜視図である。
1……基材、2……高分子膜、3……光導波回
路、4,5,5′……導波回路の端面。
FIG. 1 is a perspective view of one embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Base material, 2... Polymer film, 3... Optical waveguide circuit, 4, 5, 5'... End surface of the waveguide circuit.
Claims (1)
ビニル化合物、ビニリデン化合物又はジエン類と
の共重合体から構成され、 かつ部分的に熱処理することにより屈折率の異な
る部分を生じさせて光導波回路を形成したことを
特徴とする高分子光導波路。[Scope of Claims] Consisting of a copolymer of vinylidene cyanide represented by the following formula and another vinyl compound, vinylidene compound or diene, A polymer optical waveguide characterized in that an optical waveguide circuit is formed by partially heat-treating the portions to produce portions having different refractive indexes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18236883A JPS6073602A (en) | 1983-09-30 | 1983-09-30 | Optical waveguide of polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18236883A JPS6073602A (en) | 1983-09-30 | 1983-09-30 | Optical waveguide of polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6073602A JPS6073602A (en) | 1985-04-25 |
| JPH0332763B2 true JPH0332763B2 (en) | 1991-05-14 |
Family
ID=16117086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18236883A Granted JPS6073602A (en) | 1983-09-30 | 1983-09-30 | Optical waveguide of polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6073602A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0813862B2 (en) * | 1986-10-09 | 1996-02-14 | 三菱化学株式会社 | Vinylidene cyanide copolymer |
| WO2025197963A1 (en) * | 2024-03-22 | 2025-09-25 | 株式会社クラレ | Film, layered product, film capacitor, and method for providing said film |
-
1983
- 1983-09-30 JP JP18236883A patent/JPS6073602A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6073602A (en) | 1985-04-25 |
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