JPH0334002B2 - - Google Patents
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- Publication number
- JPH0334002B2 JPH0334002B2 JP56069189A JP6918981A JPH0334002B2 JP H0334002 B2 JPH0334002 B2 JP H0334002B2 JP 56069189 A JP56069189 A JP 56069189A JP 6918981 A JP6918981 A JP 6918981A JP H0334002 B2 JPH0334002 B2 JP H0334002B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- test
- tested
- measurement device
- reflected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Description
【発明の詳細な説明】
本発明は、面精度の測定に際し、特に大きな面
積の被検面を測定するのに好適な干渉測定装置に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an interferometric measuring device particularly suitable for measuring a large area of a surface to be measured when measuring surface accuracy.
一般に干渉測定装置では、基準となる参照面と
して試料の面積よりも大きな面積を有する反射鏡
を必要としている。即ち、試料の面積が大きくな
つた場合にその面積よりも大きく、かつ精度の良
い高価な参照面が不可欠となる。 Generally, an interference measuring device requires a reflecting mirror having an area larger than the area of the sample as a reference surface. That is, when the area of the sample becomes large, an expensive reference plane that is larger than the area and has good accuracy becomes essential.
本発明の目的は、試料よりも小さな面積の参照
面を用いて試料の面精度を測定する干渉測定装置
を提供するものであり、その要旨は、被検面と基
準参照面を照明し、前記被検面からの光と前記基
準参照面からの光を干渉させることにより前記被
検面を観察するための干渉測定装置に於いて、前
記被検面に対し反射参照面を斜めに対向して配置
し、前記被検面に斜めに入射した平行光束から成
る検査光が前記被検面で反射して前記反射参照面
に於いて入反射し、再び前記被検面の同一個所を
経由して元の光路を戻るように構成し、該光路を
経由した検査光を前記基準参照面からの光と干渉
させるようにしたことを特徴とするものである。 An object of the present invention is to provide an interference measuring device that measures the surface accuracy of a sample using a reference surface having an area smaller than that of the sample. In an interference measuring device for observing the test surface by interfering light from the test surface with light from the reference reference surface, a reflective reference surface is diagonally opposed to the test surface. The inspection light consisting of a parallel light beam incident obliquely on the test surface is reflected by the test surface, enters and reflects at the reflective reference surface, and passes through the same point on the test surface again. The present invention is characterized in that it is configured to return to the original optical path, and the inspection light that has passed through the optical path is caused to interfere with the light from the standard reference surface.
以下に図示の実施例に基づいて本発明を詳細に
説明する。 The present invention will be described in detail below based on illustrated embodiments.
第1図に於いて、1はレーザー光発光装置であ
り、レーザー光が発光されている。このレーザー
光の光軸に沿つて、レーザー光の強度を減少させ
る光量調整用フイルタ2、レーザー光を点光源と
するためのピンホール板を含む集光レンズ系3、
レーザー光を往路では透過して使い復路では反射
させて用いる半透鏡4、レーザー光をS方向に偏
光するための偏光板5、点光源の光を平行光束と
するコリメータレンズ系6、光を反射することに
より参照波面を発生させ、かつ残りの光を透過さ
せることが可能な半透参照平面7が順次配置され
ている。半透参照平面7の更に先には、例えばガ
ラス面から成る被検面8が斜め方向に向けて配置
され、半透参照平面7から射出される平行光束が
例えば60度以上の入射角で入射するようになつて
いる。又、この入射光の被検面8に於ける反射方
向には、反射光と垂直に反射参照平面9が配置さ
れており、半透参照平面7から被検面8に入射し
た光束が、被検面8、反射参照平面9、再び被検
面8を介して半透参照平面7に戻るような幾何学
的位置関係を有している。一方、コリメータレン
ズ系6方向から戻る光を反射させる半透鏡4の反
射方向には、スクリーン或いは撮像管等から成る
観察面10が配置され、シリンドリカルレンズ1
1により画像の大きさを変換するように構成され
ている。尚、このシリンドリカルレンズ11は必
要に応じて調整用のアライメントレンズ12と入
れ換え得るようになつている。 In FIG. 1, 1 is a laser light emitting device, which emits laser light. Along the optical axis of this laser beam, a light intensity adjustment filter 2 that reduces the intensity of the laser beam, a condensing lens system 3 that includes a pinhole plate that turns the laser beam into a point light source;
A semi-transparent mirror 4 that transmits the laser beam on the outward path and reflects it on the return path, a polarizing plate 5 that polarizes the laser beam in the S direction, a collimator lens system 6 that converts the light from the point light source into a parallel beam, and reflects the light. Semi-transparent reference planes 7 that can generate a reference wavefront and transmit the remaining light are sequentially arranged. Further beyond the semi-transparent reference plane 7, a test surface 8 made of, for example, a glass surface is arranged obliquely, and the parallel light flux emitted from the semi-transparent reference plane 7 is incident at an incident angle of, for example, 60 degrees or more. I'm starting to do that. In addition, in the direction of reflection of this incident light on the test surface 8, a reflection reference plane 9 is arranged perpendicular to the reflected light, so that the light flux incident on the test surface 8 from the semi-transparent reference plane 7 is reflected from the test surface 8. They have a geometrical positional relationship such as the inspection surface 8, the reflective reference plane 9, and returning to the semi-transparent reference plane 7 via the inspection surface 8 again. On the other hand, in the reflection direction of the semi-transparent mirror 4 that reflects the light returning from the collimator lens system 6 directions, an observation surface 10 consisting of a screen or an image pickup tube is disposed, and the cylindrical lens 1
1 to convert the size of the image. Incidentally, this cylindrical lens 11 can be replaced with an alignment lens 12 for adjustment if necessary.
発光装置1から射出されたレーザー光は、光量
調整フイルタ2で最適な光量に調整された後、集
光レンズ系3でノイズを除去した点光源とされ
る。この光は球面状の光波となり半透鏡4を透過
し、偏光板5でS方向に偏光される。そしてコリ
メータレンズ系6で平面化された光波は、その一
部の光量が半透参照平面7で反射され、参照波面
となつて往路を逆行し、半透鏡4で反射され点像
PAを形成する。一方、半透参照平面7を透過し
た光は、被検面8に対し斜めに入射してここで反
射され、反射参照平面9に向い反射され、再び被
検面8の同一個所に斜めに入反射して被検波面を
形成する。この被検波面は往路を逆行し半透参照
平面7及びコリメータレンズ系6を通過して、半
透鏡4で反射され点像PBを形成する。そこでシ
リンドリカルレンズ11の代りにアライメントレ
ンズ12を挿入し、反射参照平面9を回転調整す
ることにより点像PAとPBの共役像を同時に観察
面10上に結像させれば、参照波面と被検波面と
の間の傾きがなくなり、被検波面の形状の参照波
面に対する等高線を表わす干渉縞を観察面10上
に得ることが可能となる。 The laser beam emitted from the light emitting device 1 is adjusted to the optimum light intensity by a light intensity adjustment filter 2, and then converted into a point light source from which noise is removed by a condensing lens system 3. This light becomes a spherical light wave, passes through the semi-transparent mirror 4, and is polarized in the S direction by the polarizing plate 5. A part of the light wave that has been flattened by the collimator lens system 6 is reflected by the semi-transparent reference plane 7, becomes a reference wavefront, travels backward in the forward path, and is reflected by the semi-transparent mirror 4, resulting in a point image.
Form PA. On the other hand, the light transmitted through the semi-transparent reference plane 7 enters the test surface 8 obliquely, is reflected there, is reflected toward the reflective reference plane 9, and then obliquely enters the same spot on the test surface 8 again. It is reflected to form a wavefront to be detected. This test wavefront travels backward on the forward path, passes through the semi-transparent reference plane 7 and the collimator lens system 6, is reflected by the semi-transparent mirror 4, and forms a point image PB. Therefore, by inserting an alignment lens 12 in place of the cylindrical lens 11 and rotating and adjusting the reflective reference plane 9, the conjugate images of point images PA and PB can be simultaneously formed on the observation surface 10. There is no inclination between the wavefront and the reference wavefront, and it becomes possible to obtain interference fringes on the observation surface 10 that represent contour lines of the shape of the test wavefront with respect to the reference wavefront.
被検面8には光は斜め方向から入射するため
に、被検面8を光の進行方向から見た形状は、一
方向に縮少された形状となる。従つて被検面8の
外形々状を正しい大きさの比で観察するために、
次に結像光学系としてシリンドリカルレンズ11
を挿入し、縮少した方向をその直交方向に較べて
拡大して結像させるか、或いは縮少された方向の
直交方向を同様に縮少させて結像させればよい。
このようにシリンドリカルレンズ11を使用すれ
ば、スクリーン或いは撮像管等による観察面10
では被検面8の形状が観察できることになる。然
しながらこの拡大・縮少はレンズによる光学的手
段によることなく、撮像管により光電的な画像を
得て、これを電気的手段により拡大又は縮少して
も勿論支障はない。 Since the light enters the surface to be measured 8 from an oblique direction, the shape of the surface to be measured 8 viewed from the direction in which the light travels is reduced in one direction. Therefore, in order to observe the external shape of the surface to be inspected 8 with the correct size ratio,
Next, a cylindrical lens 11 is used as an imaging optical system.
may be inserted and the image may be formed by enlarging the reduced direction compared to the orthogonal direction, or the image may be formed by similarly reducing the orthogonal direction of the reduced direction.
If the cylindrical lens 11 is used in this way, the observation surface 10 by a screen or image pickup tube, etc.
Now, the shape of the surface to be inspected 8 can be observed. However, this enlargement/reduction is not done by optical means such as a lens, but there is of course no problem in obtaining a photoelectric image using an image pickup tube and enlarging or reducing this image by electrical means.
本発明に於いては、被検面8に光を斜めに入射
させるようにしたために、第1図からも明らかな
ように、被検面8は透過参照平面7及び反射参照
平面8よりも大きな面積を有するにも拘らず、被
検面8の全面を測定し得ることになる。又、被検
面8の凹凸量をdとし、被検面8への入射角をθ
とすれば被検面の凹凸量は2×d×cosθとして観
察することができる。従つて被検面8への光の入
射角を変化させれば、測定感度を変化させること
ができることになる。 In the present invention, since the light is made to enter the test surface 8 obliquely, the test surface 8 is larger than the transmission reference plane 7 and the reflection reference plane 8, as is clear from FIG. Despite the large area, the entire surface of the test surface 8 can be measured. Also, the amount of unevenness of the surface to be tested 8 is d, and the angle of incidence on the surface to be tested 8 is θ.
Then, the amount of unevenness on the surface to be inspected can be observed as 2×d×cosθ. Therefore, by changing the angle of incidence of light onto the surface to be measured 8, the measurement sensitivity can be changed.
更には被検面8への斜め入射の利点として、被
検面8の表面反射率を垂直入射する場合よりも高
くすることができる点が挙げられる。これは第1
図に示す実施例のように被検面8として平行平板
状のガラスの表面を測定する場合に大きな効果が
ある。即ち、ガラスを試料として光をガラス面に
垂直に入射した場合には、ガラス表面と裏面との
両方から反射が生じ、干渉も同時になされ両方の
反射強度が殆ど等しいためほぼ同じ強度の干渉縞
が生じ、表面形状と裏面形状との区別がつかなく
なる虞れがある。第2図はクラウンガラスの反射
率を示したグラフであり、Sは試料面に対するS
偏光を表わし、PはP偏光を示している。例えば
ガラスの表面反射率は垂直入射の場合には4%程
度であり、表面及び裏面の反射光の強度は、入射
光の強度に対してそれぞれ4%及び
3.7%{=(100−4)×0.04×(1−0.04)}
となり、殆ど同程度である。然しながら平行ガラ
ス面に対しS偏光を例えば入射角85度で入射させ
ると、表面の反射率が70%となる。裏面による反
射光の強度は6.3%{=(100−70)×0.7×(1−
0.7)}となり、10倍以上も表面反射による光の強
度の方が大きい。従つてガラス面への垂直入射の
時に問題となる裏面の反射による影響は、S偏光
を斜め入射することにより解決できることにな
る。 Furthermore, an advantage of oblique incidence on the surface to be measured 8 is that the surface reflectance of the surface to be measured 8 can be made higher than when the light is incident perpendicularly. This is the first
This is very effective when measuring the surface of parallel flat glass as the test surface 8 as in the embodiment shown in the figure. In other words, when a glass sample is used and light is incident perpendicularly to the glass surface, reflection occurs from both the front and back surfaces of the glass, and interference also occurs at the same time, and the intensity of both reflections is almost equal, resulting in interference fringes with approximately the same intensity. This may cause the surface shape and back surface shape to become indistinguishable. Figure 2 is a graph showing the reflectance of crown glass, where S is S with respect to the sample surface.
It represents polarized light, and P indicates P-polarized light. For example, the surface reflectance of glass is about 4% in the case of normal incidence, and the intensity of reflected light on the front and back surfaces is 4% and 3.7%, respectively, of the intensity of the incident light {= (100-4) x 0.04×(1−0.04)}, which is almost the same level. However, when S-polarized light is incident on a parallel glass surface at an incident angle of 85 degrees, for example, the reflectance of the surface becomes 70%. The intensity of the light reflected by the back surface is 6.3% {= (100-70) x 0.7 x (1-
0.7)}, and the intensity of light due to surface reflection is more than 10 times greater. Therefore, the influence of reflection on the back surface, which is a problem when the light is incident perpendicularly to the glass surface, can be solved by making the S-polarized light obliquely incident.
尚、観察面10に於いてコントラストの良い干渉
縞を得るために、参照波面の強度を被検波面の強
度と一致させることが好ましい。そのために被検
面8のS偏光に対する反射率をA%、反射参照平
面9の反射率を100%とした場合に、透過参照平
面7の反射率は次式に近似するものを選択するこ
とが望ましいことになる。 Note that in order to obtain interference fringes with good contrast on the observation surface 10, it is preferable to match the intensity of the reference wavefront with the intensity of the test wavefront. For this reason, if the reflectance of the surface to be inspected 8 for S-polarized light is A% and the reflectance of the reflective reference plane 9 is 100%, then the reflectance of the transparent reference plane 7 should be selected to approximate the following formula: It becomes desirable.
{2(A/100)2+1−√4(100)2+
1)/{2(A/100)2}×100(%)
第3図は第2の実施例を示し、装置を小型化す
るために3枚の反射鏡13,14,15を用いて
光路を略円環状に曲折するようにしている。この
実施例に於いては2枚の偏光板16,17が集光
レンズケ系3の前方に設置され、S偏光を行なう
ように構成されている。尚、第1図と同じ符号は
同じ部材を示しており、この実施例の作用効果に
ついては先に説明した第1の実施例と殆で同様で
ある。 {2(A/100) 2 +1-√4(100) 2 +
1)/{2(A/100) 2 }×100(%) Figure 3 shows the second embodiment, in which three reflecting mirrors 13, 14, and 15 are used to change the optical path in order to downsize the device. is bent into a substantially circular shape. In this embodiment, two polarizing plates 16 and 17 are installed in front of the condensing lens system 3, and are configured to produce S-polarized light. Note that the same reference numerals as in FIG. 1 indicate the same members, and most of the functions and effects of this embodiment are the same as those of the first embodiment described above.
被検面8がガラス面でない、例えばアルミニユ
ーム被膜面などであれば、S偏光は全く必要とし
ない。又、被検面8は平面でなく曲面であつて
も、反射参照面をこれを補償する曲面とすれば測
定は可能である。但し被検面8の各個所の入射角
がそれぞれ異なることになり、観察される干渉縞
が位置によつて感度が異なる問題点はある。 If the surface 8 to be tested is not a glass surface, for example, an aluminum coated surface, S-polarized light is not required at all. Furthermore, even if the surface 8 to be measured is not a flat surface but a curved surface, measurement is possible if the reflective reference surface is a curved surface that compensates for this. However, there is a problem in that the angle of incidence at each location on the surface to be measured 8 is different, and the sensitivity of the observed interference fringes varies depending on the position.
以上説明したように本発明に係る干渉測定装置
は、被検面に斜めに検査光を入射させ、再び同一
光路を逆行させるために、参照面の面積を被検面
の面積よりも小さくて済む大きな利点がある。
又、被検面に対しては反射が2度なされるため
に、被検面の凹凸量の情報が倍加して加わり、被
検面への入射角度の採り方により精度のよい測定
が可能となる。更には光をS偏光させれば、被検
面が平行ガラス板であつても裏面の影響を殆ど無
視して測定を行なうことができる。 As explained above, the interference measurement device according to the present invention allows the inspection light to enter the surface to be measured obliquely and retraces the same optical path, so that the area of the reference surface can be smaller than the area of the surface to be measured. There are big advantages.
In addition, since the surface to be tested is reflected twice, information on the amount of unevenness on the surface to be tested is doubled, and more accurate measurements can be made by determining the angle of incidence on the surface to be tested. Become. Furthermore, if the light is S-polarized, even if the surface to be tested is a parallel glass plate, the measurement can be carried out while almost ignoring the influence of the back surface.
図面は本発明に係る干渉測定装置の実施例を示
し、第1図はその構成図、第2図はガラスの表面
反射率のグラフ図、第3図は他の実施例の構成図
である。
符号1はレーザー光発光装置、2は光量調整フ
イルタ、3は集光レンズ係、4は半透鏡、5,1
6,17は偏光板、6はコリメータレンズ系、7
は半透参照平面、8は被検面、9は反射参照平
面、10は観察面、11はシリンドリカルレン
ズ、13,14,15は反射鏡である。
The drawings show an embodiment of the interference measuring device according to the present invention, and FIG. 1 is a block diagram thereof, FIG. 2 is a graph of the surface reflectance of glass, and FIG. 3 is a block diagram of another embodiment. Reference numeral 1 is a laser light emitting device, 2 is a light amount adjustment filter, 3 is a condensing lens, 4 is a semi-transparent mirror, 5, 1
6 and 17 are polarizing plates, 6 is a collimator lens system, 7
8 is a semi-transparent reference plane, 8 is a test surface, 9 is a reflection reference plane, 10 is an observation plane, 11 is a cylindrical lens, and 13, 14, and 15 are reflecting mirrors.
Claims (1)
らの光と前記基準参照面からの光を干渉させるこ
とにより前記被検面を観察するための干渉測定装
置に於いて、前記被検面に対し反射参照面を斜め
に対向して配置し、前記被検面に斜めに入射した
平行光束から成る検査光が前記被検面で反射して
前記反射参照面に於いて入反射し、再び前記被検
面の同一個所を経由して元の光路を戻るように構
成し、該光路を経由した検査光を前記基準参照面
からの光と干渉させるようにしたことを特徴とす
る干渉測定装置。 2 前記被検面と平行光束を作成するコリメータ
レンズ系との間に、半透鏡から成る前記基準参照
面を光束に対し垂直に挿入した特許請求の範囲第
1項記載の干渉測定装置。 3 前記被検面により形成された被検波面と、前
記基準参照面により形成された参照波面とにより
得られる干渉稿を、一方向に拡大又は縮小して前
記被検面の形状に相当する縦横比として観察する
ようにした特許請求の範囲第1項又は第2項記載
の干渉測定装置。 4 偏光板を用いて光源を被測定面に対しS偏光
して使用するようにした特許請求の範囲第1項記
載の干渉測定装置。 5 前記被検面をガラス表面とした特許請求の範
囲第4項記載の干渉測定装置。[Scope of Claims] 1. An interference measuring device for observing the test surface by illuminating the test surface and the standard reference surface and causing light from the test surface and light from the standard reference surface to interfere with each other. In this method, a reflective reference surface is disposed diagonally opposite to the surface to be tested, and an inspection light consisting of a parallel light flux that is obliquely incident on the surface to be tested is reflected by the surface to be tested, and the surface is reflected by the reflective reference surface. The inspection light is configured so that it enters and is reflected and returns to the original optical path via the same point on the test surface again, so that the inspection light that has passed through the optical path interferes with the light from the standard reference surface. An interference measurement device characterized by: 2. The interference measurement device according to claim 1, wherein the standard reference surface made of a semi-transparent mirror is inserted perpendicularly to the light beam between the test surface and a collimator lens system that creates a parallel light beam. 3. The interference pattern obtained by the test wavefront formed by the test surface and the reference wavefront formed by the reference reference surface is expanded or reduced in one direction to a length and width corresponding to the shape of the test surface. An interference measurement device according to claim 1 or 2, wherein the interference measurement device is configured to observe as a ratio. 4. The interference measurement device according to claim 1, wherein the light source is used with S-polarized light relative to the surface to be measured using a polarizing plate. 5. The interference measuring device according to claim 4, wherein the surface to be tested is a glass surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56069189A JPS57182604A (en) | 1981-05-07 | 1981-05-07 | Interference measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56069189A JPS57182604A (en) | 1981-05-07 | 1981-05-07 | Interference measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57182604A JPS57182604A (en) | 1982-11-10 |
| JPH0334002B2 true JPH0334002B2 (en) | 1991-05-21 |
Family
ID=13395526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56069189A Granted JPS57182604A (en) | 1981-05-07 | 1981-05-07 | Interference measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57182604A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19602445A1 (en) | 1996-01-24 | 1997-07-31 | Nanopro Luftlager Produktions | Device and method for measuring two opposing surfaces of a body |
| US7057741B1 (en) | 1999-06-18 | 2006-06-06 | Kla-Tencor Corporation | Reduced coherence symmetric grazing incidence differential interferometer |
| JP4583611B2 (en) * | 2001-01-11 | 2010-11-17 | 富士フイルム株式会社 | Oblique incidence interferometer device |
-
1981
- 1981-05-07 JP JP56069189A patent/JPS57182604A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57182604A (en) | 1982-11-10 |
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