JPH0338947B2 - - Google Patents
Info
- Publication number
- JPH0338947B2 JPH0338947B2 JP60220971A JP22097185A JPH0338947B2 JP H0338947 B2 JPH0338947 B2 JP H0338947B2 JP 60220971 A JP60220971 A JP 60220971A JP 22097185 A JP22097185 A JP 22097185A JP H0338947 B2 JPH0338947 B2 JP H0338947B2
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- metal
- brazing
- thin film
- pure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- 238000005219 brazing Methods 0.000 claims description 20
- 239000010409 thin film Substances 0.000 claims description 19
- 238000009792 diffusion process Methods 0.000 claims description 11
- 229910021364 Al-Si alloy Inorganic materials 0.000 claims description 9
- 229910000838 Al alloy Inorganic materials 0.000 claims description 7
- 229910001182 Mo alloy Inorganic materials 0.000 claims description 7
- 229910001080 W alloy Inorganic materials 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- 239000002131 composite material Substances 0.000 claims description 5
- 239000000945 filler Substances 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 229910002092 carbon dioxide Inorganic materials 0.000 description 6
- 239000001569 carbon dioxide Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000012733 comparative method Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Description
〔産業上の利用分野〕
この発明は、軽量にして、冷却効果が高く、例
えば炭酸ガスレーザーの反射鏡や、真空炉の熱反
射壁材などとしての使用に適した複合ろう付け部
材の製造法に関するものである。
〔従来の技術〕
従来、一般に、例えば炭酸ガスレーザーの反射
鏡として、純Cu製表面を鏡面仕上げしたものや、
さらにこの表面にAuめつきを施したものなどが
用いられている。
しかしながら、これらの純Cu製反射鏡では、
レーザー照射時間が長くなると、鏡面に加工材か
ら発生した金属や非金属の蒸気が蒸着し、その反
射率が低下するようになるばかりでなく、鏡面が
レーザーのエネルギーを吸収して溶融し、反射鏡
を破損してしまうなどの事故が発生するようにな
る。
このような事故を防止するには、定期的に鏡面
の蒸着物を除去しなければならないが、反射鏡を
構成する純CuやAlめつきは非常に軟かいために、
ふき取るときに鏡面を傷つけ易く、反射特性を損
うことが多発していた。
このようなことから、近年、炭酸ガスレーザー
の反射鏡の材料として、純Cuに代つて硬質の金
属Moや金属Wを使用することが定着しつつあ
る。この金属Moまたは金属W製反射鏡として
は、特に単結晶のものや、微細な結晶粒の多結晶
のものが蒸発物の付着も少なく、すぐれたもので
ある。
〔発明が解決しようとする問題点〕
一方、炭酸ガスレーザー装置は、地上設備ばか
りでなく、宇宙ステーシヨンにも設置されるもの
であるため、装置自体の軽量化が要求されるよう
になつており、これに伴つて比重の大きい、すな
わち重質の金属Moまたは金属W製の反射鏡の重
量軽減が強く望まれている。
〔問題点を解決するための手段〕
そこで、本発明者等は、上述のような観点か
ら、炭酸ガスレーザーの反射鏡や真空炉の熱反射
壁材などの金属Mo部材や、Mo合金部材、さら
に金属W部材やW合金部材に着目し、これの軽量
化をはかるべく研究を行なつた結果、金属Mo、
Mo合金、金属W、およびW合金のうちのいずれ
かからなる部材の一部を軽量の純AlまたはAl合
金で構成し、一方、例えば金属Moと純Alは、比
重(金属Moは10.2、純Alは2.7)、熱膨張率(金
属Moは5×10-6/℃、純Alは23.3×10-6/℃)、
および熱伝導率(金属Moは0.35cal/cm−s−
℃、純Alは0.53cal/cm−s−℃)などの種々の
点で特性上著しく異るので、これら両部材を高い
接合強度でろう付けすることはきわめて困難であ
るが、上記の金属Mo、Mo合金、金属W、およ
びW合金のうちのいずれかからなる部材のろう付
け面に、Al−Si系合金の薄膜を形成し、この薄
膜に拡散処理を施した状態で、Si:6〜14重量%
(以下%は重量%を示す)を含有するAl−Si系合
金からなるろう材を用いて真空ろう付けすると、
これら部材は純AlまたはAl合金からなる基体に、
著しく高い接合強度でろう付けされるようになる
という知見を得たのである。
この発明は、上記知見にもとづいてなされたも
ので、金属Mo、Mo合金、金属W、およびW合
金のうちのいずれかからなる被ろう付け部材のろ
う付け面に、平均層厚で0.1〜70μmのAl−Si系合
金薄膜を形成し、
ついで、この薄膜形成の被ろう付け部材に、真
空中あるいは非酸化性雰囲気中、670〜850℃の温
度に加熱の条件で薄膜拡散処理を施し、
引続いて、この被ろう付け部材を、薄膜拡散層
を介し、Si:6〜14%を含有するAl−Si系合金
からなるろう材を用いて、純AlまたはAl合金の
基体に真空ろう付けすることからなる複合ろう付
け部材の製造法に特徴を有するものである。
なお、この発明の方法において、Al−Si系合
金薄膜の平均層厚を0.1〜70μmに限定したのは、
その平均層厚が0.1μm未満では、薄膜拡散層が薄
すぎたり、あるいはこの存在しない個所が生じた
りして、所望の接合強度を確保することが難し
く、一方その平均層厚が70μmを越えると、スパ
ツタリングなどによにり薄膜を形成した場合、発
生した内部残留歪によつて薄膜拡散処理時に、被
ろう付け部材の表面から剥離するようになるとい
う理由によるものである。
また、薄膜拡散処理温度を670〜850℃としたの
は、その温度が670℃未満では薄膜と被ろう付け
部材の拡散が不十分で、所望のろう付け接合強度
を確保することができず、一方、その温度が850
℃を越えると、薄膜の拡散反応が進行しすぎて、
被ろう付け部材のろう付け面における基体とのろ
う付け性が低下するようになるという理由による
ものである。
さらに、ろう材のSi含有量を6〜14%に限定し
たのは、その含有量が6%未満では、ろう材の融
点が高くなりすぎ、基体の融点より高いろう付け
温度を必要とする場合が生じるようになつて、ろ
う付けが不可能となる場合が生じ、一方、その含
有量が14%を越えても、ろう材の融点が650℃を
越えるようになる場合が生じるほか、ろう付け部
の接合強度が著しく低下するようになるという理
由にもとづくものである。
〔実施例〕
つぎに、この発明の方法を実施例により具体的
に説明する。
いずれも直径:100mm×厚さ:2mmの寸法を有
し、かつそれぞれ第1表に示される組成をもつた
被ろう付け部材を用意し、これらの被ろう付け部
材の片面に、通常のプレーナーマグネトロンスパ
ツタリング装置を用い、
雰囲気:Ar、
雰囲気圧力:1×10-3torr、
ターゲツト:直径100×厚さ5mmの寸法を有す
る各種のAl−Si系合金、
ろう付け部材とターゲツト間距離:60mm、
スパツタ電圧:2000V、
スパツタ電力:1.5KW、
時間:8秒〜90分の範囲内の所定時間、
の条件で、第1表に示される組成および平均層厚
を有するAl−Si系合金薄膜を形成し、ついで、
これらの薄膜形成の被ろう付け部材に、圧力:5
×10-6torrのAr雰囲気中、第1表に示される条件
で薄膜拡散処理を施した後、同じく第1表に示さ
れる組成を有する直径:100mm×厚さ:0.3mmの寸
法をもつたろう材を用い、同じく第1表に示され
る組成を有し、かつ直径:100mm×厚さ:18mmの
寸法をもつた基体の上面に、前記ろう材および薄
膜拡散層を介して前記被ろう付け部材を重ね合せ
た状態で、1×10-5torrの真空中、600〜650℃の
範囲内の所定温度に20分間保持の条件で真空ろう
付けを行なうことによつて本発明法1〜5および
比較法1〜5をそれぞれ実施した。
なお、比較法1〜5は、この発明を構成する条
件のうちのいずれかの条件(第1表に*印を付し
た条件)がこの発明の範囲から外れた条件で実施
したものである。
ついで、この結果得られた複合ろう付け部材の
ろう付け部における剪断強度を測定した。この測
定結果も第1表に示した。
[Industrial Application Field] The present invention provides a method for producing a composite brazed member that is lightweight, has a high cooling effect, and is suitable for use as, for example, a reflector for a carbon dioxide laser or a heat-reflecting wall material for a vacuum furnace. It is related to. [Prior art] Conventionally, for example, as a reflecting mirror for a carbon dioxide laser, a pure Cu surface with a mirror finish,
Furthermore, those with Au plating applied to this surface are also used. However, with these pure Cu reflectors,
As the laser irradiation time becomes longer, metal and non-metal vapors generated from the processed material will deposit on the mirror surface, reducing its reflectance, and the mirror surface will absorb the laser energy and melt, causing reflections. Accidents such as damaging mirrors begin to occur. To prevent such accidents, it is necessary to periodically remove deposits from the mirror surface, but since the pure Cu and Al plating that makes up the reflector is very soft,
The mirror surface was easily damaged when wiping it off, often impairing its reflective properties. For these reasons, in recent years, the use of hard metals Mo and W as materials for carbon dioxide laser reflectors instead of pure Cu has become commonplace. As the reflecting mirror made of metal Mo or metal W, single-crystal mirrors and polycrystal mirrors with fine crystal grains are particularly excellent because they have less adhesion of evaporated substances. [Problems to be solved by the invention] On the other hand, since carbon dioxide laser devices are installed not only in ground equipment but also in space stations, there is a growing demand for the device itself to be lightweight. Along with this, there is a strong desire to reduce the weight of reflective mirrors made of metal Mo or metal W, which have a large specific gravity, that is, are heavy. [Means for Solving the Problems] Therefore, from the above-mentioned viewpoint, the present inventors developed metal Mo members such as reflectors for carbon dioxide lasers and heat reflecting wall materials for vacuum furnaces, Mo alloy members, Furthermore, we focused on metal W members and W alloy members and conducted research to reduce their weight.
A part of a member made of any one of Mo alloy, metal W, and W alloy is made of lightweight pure Al or Al alloy, while, for example, metal Mo and pure Al have a specific gravity (metal Mo is 10.2, pure Al is 2.7), thermal expansion coefficient (metallic Mo is 5×10 -6 /℃, pure Al is 23.3×10 -6 /℃),
and thermal conductivity (metal Mo is 0.35 cal/cm-s-
℃, pure Al is 0.53 cal/cm-s-℃), and it is extremely difficult to braze these two parts with high bonding strength. , Mo alloy, metal W, and W alloy. A thin film of Al-Si alloy is formed on the brazing surface of a member made of any one of the following: Si:6~ 14% by weight
(Hereinafter, % indicates weight %) When vacuum brazing is performed using a brazing filler metal made of Al-Si alloy containing
These parts have a base made of pure Al or Al alloy,
They obtained the knowledge that brazing can be performed with extremely high bonding strength. This invention was made based on the above findings, and is based on the fact that an average layer thickness of 0.1 to 70 μm is applied to the brazing surface of a member to be brazed made of any one of metal Mo, Mo alloy, metal W, and W alloy. A thin Al-Si alloy thin film is formed, and then a thin film diffusion treatment is performed on the parts to be brazed on which the thin film is formed, under heating conditions of 670 to 850°C in a vacuum or non-oxidizing atmosphere. Subsequently, this member to be brazed is vacuum brazed to a pure Al or Al alloy base via a thin film diffusion layer using a brazing material made of an Al-Si alloy containing 6 to 14% Si. This method is characterized by a method of manufacturing a composite brazing member consisting of the following. In addition, in the method of this invention, the average layer thickness of the Al-Si alloy thin film is limited to 0.1 to 70 μm because
If the average layer thickness is less than 0.1 μm, the thin film diffusion layer may be too thin or may not exist in some areas, making it difficult to secure the desired bonding strength. On the other hand, if the average layer thickness exceeds 70 μm, This is because when a thin film is formed by sputtering or the like, the generated internal residual strain causes the thin film to peel off from the surface of the member to be brazed during the thin film diffusion process. In addition, the thin film diffusion treatment temperature was set at 670 to 850°C because if the temperature is less than 670°C, the diffusion between the thin film and the brazed component will be insufficient, making it impossible to secure the desired brazing joint strength. while its temperature is 850
When the temperature exceeds ℃, the diffusion reaction of the thin film progresses too much,
This is because the brazability of the brazing surface of the member to be brazed with the base body is reduced. Furthermore, the Si content of the brazing filler metal is limited to 6 to 14% because if the Si content is less than 6%, the melting point of the brazing filler metal becomes too high and requires a brazing temperature higher than the melting point of the base material. On the other hand, even if the content exceeds 14%, the melting point of the filler metal may exceed 650℃, and brazing may become impossible. This is based on the reason that the joint strength of the parts is significantly reduced. [Example] Next, the method of the present invention will be specifically explained with reference to Examples. Prepare parts to be brazed that have dimensions of diameter: 100 mm x thickness: 2 mm and have the compositions shown in Table 1, and place a regular planar magnetron on one side of these parts. Using sputtering equipment, atmosphere: Ar, atmospheric pressure: 1 x 10 -3 torr, target: various Al-Si alloys with dimensions of 100 mm in diameter x 5 mm in thickness, distance between brazing member and target: 60 mm. , Sputtering voltage: 2000V, Sputtering power: 1.5KW, Time: A predetermined time within the range of 8 seconds to 90 minutes, under the following conditions, an Al-Si alloy thin film having the composition and average layer thickness shown in Table 1 was formed. form, then
Pressure: 5 on the parts to be brazed with these thin films formed.
After performing thin film diffusion treatment in an Ar atmosphere of ×10 -6 torr under the conditions shown in Table 1, a wax having dimensions of diameter: 100 mm x thickness: 0.3 mm having the composition also shown in Table 1 is formed. The material to be brazed is placed on the upper surface of a substrate having the composition shown in Table 1 and having dimensions of 100 mm in diameter and 18 mm in thickness, via the brazing material and the thin film diffusion layer. Methods 1 to 5 of the present invention and Comparative methods 1 to 5 were each carried out. In addition, Comparative Methods 1 to 5 were carried out under conditions in which one of the conditions constituting the present invention (the conditions marked with an asterisk in Table 1) was outside the scope of the present invention. Then, the shear strength at the brazed portion of the resulting composite brazed member was measured. The measurement results are also shown in Table 1.
第1表に示される結果から、本発明法1〜5に
おいては、いずれも従来ろう付けが不可能とされ
ていた金属Mo、Mo合金、金属W、およびW合
金のうちのいずれかからなる部材と、純Alまた
Al合金からなる部材とを強固な接合強度でろう
付けすることができることが明らかである。
一方、比較法1〜5に見られるように、いずれ
かの条件がこの発明の範囲から外れると、良好な
接合強度が得られないことがわかる。
上述のように、この発明の方法によれば、金属
Mo、Mo合金、金属W、およびW合金のうちの
いずれかからなる重質部材の一部を軽質の純Al
またはAl合金で置換構成することが可能となる
ので、これら重質部材の軽量化を可能とし、さら
に純AlやAl合金はすぐれた冷却作用をもつので、
この結果の複合ろう付け部材を、例えば炭酸ガス
レーザーの反射鏡や真空炉の熱反射壁材などとし
て用いた場合に、すぐれた性能を長期に亘つて発
揮するようになるなど工業上有用な効果がもたら
されるのである。
From the results shown in Table 1, in Methods 1 to 5 of the present invention, members made of any one of metal Mo, Mo alloy, metal W, and W alloy, which were conventionally considered impossible to braze. And, pure Al also
It is clear that it is possible to braze with a member made of an Al alloy with strong joint strength. On the other hand, as seen in Comparative Methods 1 to 5, it can be seen that if any of the conditions deviates from the scope of the present invention, good bonding strength cannot be obtained. As mentioned above, according to the method of the present invention, metal
Part of a heavy member made of Mo, Mo alloy, metal W, or W alloy is replaced with light pure Al
Alternatively, since it is possible to replace the structure with Al alloy, it is possible to reduce the weight of these heavy components, and since pure Al and Al alloy have excellent cooling effects,
When the resulting composite brazed parts are used, for example, as reflective mirrors for carbon dioxide lasers or heat-reflecting wall materials for vacuum furnaces, they exhibit excellent performance over a long period of time, resulting in industrially useful effects. is brought about.
Claims (1)
のうちのいずれかからなる被ろう付け部材のろう
付け面に、平均層厚で0.1〜70μmのAl−Si系合金
薄膜を形成し、 この薄膜形成の被ろう付け部材に、真空中ある
いは非酸化性雰囲気中、670〜850℃の温度に加熱
の薄膜拡散処理を施し、 引続いて、この被ろう付け部材を、薄膜拡散層
を介し、Si:6〜14重量%を含量するAl−Si系
合金からなるろう材を用いて、純AlまたはAl合
金の基体に真空ろう付けすることを特徴とする複
合ろう付け部材の製造法。[Claims] 1. An Al-Si alloy thin film having an average layer thickness of 0.1 to 70 μm on the brazing surface of a member to be brazed made of any one of metal Mo, Mo alloy, metal W, and W alloy. This thin-film-formed brazing member is subjected to thin-film diffusion treatment by heating at a temperature of 670 to 850°C in a vacuum or non-oxidizing atmosphere. A composite brazing member characterized by vacuum brazing to a pure Al or Al alloy substrate via a diffusion layer using a brazing filler metal made of an Al-Si alloy containing 6 to 14% by weight of Si. Manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60220971A JPS6281267A (en) | 1985-10-03 | 1985-10-03 | Production of composite brazing member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60220971A JPS6281267A (en) | 1985-10-03 | 1985-10-03 | Production of composite brazing member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6281267A JPS6281267A (en) | 1987-04-14 |
| JPH0338947B2 true JPH0338947B2 (en) | 1991-06-12 |
Family
ID=16759429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60220971A Granted JPS6281267A (en) | 1985-10-03 | 1985-10-03 | Production of composite brazing member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6281267A (en) |
-
1985
- 1985-10-03 JP JP60220971A patent/JPS6281267A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6281267A (en) | 1987-04-14 |
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