JPH0341436B2 - - Google Patents
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- Publication number
- JPH0341436B2 JPH0341436B2 JP14574886A JP14574886A JPH0341436B2 JP H0341436 B2 JPH0341436 B2 JP H0341436B2 JP 14574886 A JP14574886 A JP 14574886A JP 14574886 A JP14574886 A JP 14574886A JP H0341436 B2 JPH0341436 B2 JP H0341436B2
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- gas
- carbon
- substrate
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 239000010432 diamond Substances 0.000 claims description 86
- 229910003460 diamond Inorganic materials 0.000 claims description 77
- 239000007789 gas Substances 0.000 claims description 42
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 150000001722 carbon compounds Chemical class 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- 238000002156 mixing Methods 0.000 claims description 6
- 239000012808 vapor phase Substances 0.000 claims description 6
- 230000002194 synthesizing effect Effects 0.000 claims description 4
- 239000012071 phase Substances 0.000 claims description 3
- 230000001376 precipitating effect Effects 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 24
- 229910052799 carbon Inorganic materials 0.000 description 23
- 239000000758 substrate Substances 0.000 description 21
- 239000002994 raw material Substances 0.000 description 15
- 239000013078 crystal Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 229930195733 hydrocarbon Natural products 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 150000002430 hydrocarbons Chemical class 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000001556 precipitation Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 230000005281 excited state Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- -1 nitrogen-containing organic compounds Chemical class 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N methyl monoether Natural products COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は有機炭素化合物から気相法で膜状、粒
状等のダイヤモンドの合成法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for synthesizing diamonds in the form of films, particles, etc. from organic carbon compounds by a gas phase method.
従来の技術
気相法でダイヤモンドを合成する方法は有機炭
素化合物に水素ガスを混合し、これを熱、電子
線、イオンビーム、マイクロ波、高周波等によつ
て励起あるいは分解し、原子状水素、炭化水素ラ
ジカル等を発生させ、これを加熱した基板等に導
き、そこで分解生成した炭素原子をダイヤモンド
構造にして析出させるものである。原料ガスは従
来のものは殆んどが炭化水素であるが、これに
COガスを混合したものも提案されている(特開
昭60−191097)
発明が解決しようとする問題点
気相法ダイヤモンド合成では、有機炭素化合物
が分解して生成する炭素はダイヤモンド及び非ダ
イヤモンド炭素(以下非ダイヤ炭素という)の混
合物として析出する。そして非ダイヤ炭素は原子
状の水素により除去される。ダイヤモンドは原子
状水素と殆んど反応しないのでそのまま残る。こ
のダイヤモンド及び非ダイヤ炭素の析出、ダイヤ
炭素の除去の作用が繰り返されてダイヤモンドが
成長していく。従つて非ダイヤ炭素の除去作用が
充分でないとダイヤモンドの生成速度を早めるこ
とはできない。従来炭化水素と原料としたもので
はしばしばダイヤモンドとダイヤ炭素とが混在し
た生成物が得られているのはこの非ダイヤ炭素の
除去作用が充分でないからである。また炭化水素
にCOガスを混合したものも非ダイヤ炭素の除去
作用は充分でない。Conventional technology The gas phase method for synthesizing diamond involves mixing hydrogen gas with an organic carbon compound, which is excited or decomposed using heat, electron beams, ion beams, microwaves, radio frequency waves, etc., to produce atomic hydrogen, Hydrocarbon radicals and the like are generated and guided to a heated substrate, where the decomposed carbon atoms are precipitated into a diamond structure. Most conventional raw material gases are hydrocarbons, but
A mixture of CO gas has also been proposed (Japanese Unexamined Patent Publication No. 60-191097) Problems to be Solved by the Invention In vapor phase diamond synthesis, the carbon produced by the decomposition of organic carbon compounds is diamond and non-diamond carbon. (hereinafter referred to as non-diamond carbon). Non-diamond carbon is then removed by atomic hydrogen. Diamond hardly reacts with atomic hydrogen, so it remains as is. This action of precipitation of diamond and non-diamond carbon and removal of diamond carbon is repeated to grow diamond. Therefore, unless the removal action of non-diamond carbon is sufficient, the rate of diamond formation cannot be accelerated. Conventional products using hydrocarbons as raw materials often yield products containing a mixture of diamond and diamond carbon because the removal action of this non-diamond carbon is not sufficient. Also, a mixture of hydrocarbons and CO gas does not have a sufficient effect of removing non-diamond carbon.
気相法による合成で得られるダイヤモンドの結晶
は一般に(111)面の成長したものと(100)面の
成長したものとが混在したものである。そして結
晶の方位によつてダイヤモンドの性質が異なり、
例えば(111)面の成長したものは原子の充填が
密であつて、ビツカース硬度も高く、また化学反
応も起りにくい。従来の炭化水素と水素を原料ガ
スとして用いた方法では生成ダイヤモンドの結晶
成長の方位を制御することは困難であつた。Diamond crystals synthesized by the vapor phase method are generally a mixture of (111) and (100) crystals. The properties of diamond differ depending on the orientation of the crystal.
For example, materials grown on the (111) plane have densely packed atoms, high Vickers hardness, and are less likely to cause chemical reactions. In the conventional method using hydrocarbon and hydrogen as raw material gases, it was difficult to control the crystal growth direction of the produced diamond.
本発明の目的は、ダイヤモンドの析出速度を早
めることを可能とし、あるいは析出物のダイヤモ
ンド純度を上げ、さらにはダイヤモンドの結晶の
方位の制御も可能なダイヤモンド合成法を提供す
るにある。 An object of the present invention is to provide a diamond synthesis method that makes it possible to accelerate the precipitation rate of diamond, increase the diamond purity of the precipitate, and furthermore, make it possible to control the orientation of diamond crystals.
問題点を解決するための手段及び作用
本発明は気相法ダイヤモンド合成において、原
料となる有機炭素化合物、水素又はこれらの混合
ガスに水分を混合することにより上記目的を達成
したものである。Means and Effects for Solving the Problems The present invention achieves the above object by mixing water with an organic carbon compound, hydrogen, or a mixed gas thereof as raw materials in vapor phase diamond synthesis.
原料となる有機炭素化合物はメタン、エタン、
プロパン、ブタン、ペンタン、エチレン、アセチ
レン、ミクロヘキサン等の炭化水素、メチルアル
コール、エチルアルコール、プロピルアルコー
ル、ジメチルアルコール、アリルアルコール等の
アルコール類、アセトン、エチルメチルケトン、
ジエチルケトン、アセトフエノン等のケトン類、
酢酸メチル、酢酸エチル等のエステル類、ホルム
アルデヒド、アセトアルデヒド等のアルデヒド
類、その他窒素を含む化合物、例えばメチルアミ
ン、エチルアミン、トリメチルアミン、ハロゲン
を含む化合物等も使用可能である。気相法ダイヤ
モンド合成では生成したメチル基からの炭素がダ
イヤモンド構造になり易いと考えられており、こ
の意味で原料ガスは分解してメチル基が生成する
ものが好ましい。 Organic carbon compounds used as raw materials include methane, ethane,
Hydrocarbons such as propane, butane, pentane, ethylene, acetylene, microhexane, alcohols such as methyl alcohol, ethyl alcohol, propyl alcohol, dimethyl alcohol, allyl alcohol, acetone, ethyl methyl ketone,
Ketones such as diethyl ketone and acetophenone,
Esters such as methyl acetate and ethyl acetate, aldehydes such as formaldehyde and acetaldehyde, and other nitrogen-containing compounds such as methylamine, ethylamine, trimethylamine, and halogen-containing compounds can also be used. In the vapor phase diamond synthesis method, it is thought that carbon from the generated methyl groups tends to form a diamond structure, and in this sense, it is preferable that the raw material gas be decomposed to generate methyl groups.
従来原料ガスには殆んど炭化水素が使われてい
たが、本発明者の研究によれば上記のような含酸
素有機化合物、含窒素有機化合物等から従来以上
の速度でダイヤモンド生成することがわかり、特
許出願した(特願昭60−264519)。 Conventionally, most of the raw material gases used were hydrocarbons, but according to research by the present inventors, diamonds can be produced from oxygen-containing organic compounds, nitrogen-containing organic compounds, etc. mentioned above at a faster rate than before. I understand, so I applied for a patent (patent application 1986-264519).
本発明はさらに研究を進めた結果、上記の炭化
水素、含酸素有機化合物等に水分を混合すること
がダイヤモンド合成に一層有効であることに基づ
きなされたものである。 As a result of further research, the present invention was made based on the fact that mixing water with the above-mentioned hydrocarbons, oxygen-containing organic compounds, etc. is more effective for diamond synthesis.
原料ガスに水分を加えることにより一層早い速
度でダイヤモンドを析出させることが可能であ
る。それは水分により析出したダイヤ炭素の除去
作用が大きくなるので、原料ガスの供給量及びエ
ネルギーを大きくして、全体の析出量を大きくし
てもダイヤモンドだけを残すことができるからで
ある。このことはまた純度の高いダイヤモンドを
生成させることができることをも意味する。水分
の炭素除去作用についてはその機構は明らかでな
いが、水蒸気と炭素の水成ガス反応(C+H2O
→CO+H2)などが一つの機構として考えられ
る。原料ガスにCOガスを混合する方法が知られ
ていることは前述したが、COガスでは水成ガス
反応は起らないので、H2OとCOガスでは炭素に
対する作用は全く異なると考えられる。 By adding moisture to the raw material gas, diamond can be deposited at a faster rate. This is because moisture increases the removal effect of the diamond carbon precipitated, so that even if the supply amount and energy of the raw material gas are increased and the total amount of precipitation is increased, only the diamonds can remain. This also means that diamonds of high purity can be produced. The mechanism of the carbon removal effect of water is not clear, but it is due to the hydrogas reaction between water vapor and carbon (C + H 2 O
→CO+H 2 ) can be considered as one mechanism. As mentioned above, a method of mixing CO gas with the raw material gas is known, but since the hydrogas reaction does not occur with CO gas, it is thought that H 2 O and CO gas have completely different effects on carbon.
水分の添加量はキヤリアガス中の水素を基準に
して決めるのが適当である。実験によればこの水
素対水分の割合はガスの容量比でH2O/H2=
0.0001〜0.1が適する。 It is appropriate to determine the amount of water added based on the hydrogen in the carrier gas. According to experiments, the ratio of hydrogen to water is the gas volume ratio: H 2 O/H 2 =
0.0001 to 0.1 is suitable.
従つて、この範囲になるように、原料ガスに水
分を添加する。上記範囲より水分が少ないと効果
が少なく、反面多過ぎるとダイヤモンドの析出速
度が遅くなるばかりでなく、析出したダイヤモン
ドが浸されるようになる。 Therefore, water is added to the raw material gas so that it falls within this range. If the water content is less than the above range, there will be little effect, while if it is too much, not only will the speed of diamond precipitation slow down, but the precipitated diamond will become immersed.
水素に対する水分の割合は上記した通りである
が、有機炭素化合物と水素ガスの割合はガス容量
比で有機炭素化合物/水素が0.0001〜1が適す
る。 The ratio of water to hydrogen is as described above, but the ratio of organic carbon compound to hydrogen gas is suitably 0.0001 to 1 (organic carbon compound/hydrogen) in terms of gas volume ratio.
本発明において、水分を使用する以外の工程に
ついては従来公知の方法がそのまま使用できる。
その概略を説明すれば、先ずガスを1500〜2500℃
程度に加熱されている熱フイラメントを通すこと
により、あるいはマイクロ波、高周波等でプラズ
マ化し、さらには電子ビーム、紫外線照射等によ
り、原子状の水素、メチルラジカル、そのイオン
等いわゆる励起状態にすることが必要である。こ
の場合の水素ガスの役割については先に述べたよ
うに析出した非ダイヤ炭素の除去作用であり、そ
のためには水素は原子状水素等にして、これを析
出した非ダイヤ炭素に接触させることが必要であ
る。従つて水素ガスは原子状水素等の励起状態に
することが不可欠である。一方、有機炭素化合物
は分解し、中間にメチル基を通してその非ダイヤ
炭素がダイヤモンドとして析出すると考えられて
おり、従つてダイヤモンドを基材の上に析出させ
る場合、有機炭素化合物を水素ガスと混合して励
起せず、基材の近傍ないし基材面で有機炭素化合
物を分解し、ダイヤモンドにすることも可能であ
る。このことは基材の温度等により基材面で有機
炭素化合物の分解が可能であるならば、必ずしも
有機炭素化合物は上記した熱フイラメントやプラ
ズマで分解する必要はない事を意味する。 In the present invention, conventionally known methods can be used as they are for steps other than the use of water.
To explain the outline, first, the gas is heated to 1500 to 2500℃.
By passing through a thermal filament that has been heated to a certain degree, or by turning it into plasma using microwaves, high frequency waves, etc., and further by irradiating electron beams, ultraviolet rays, etc., atomic hydrogen, methyl radicals, and their ions can be brought into a so-called excited state. is necessary. As mentioned earlier, the role of hydrogen gas in this case is to remove the precipitated non-diamond carbon, and for that purpose, it is necessary to convert hydrogen into atomic hydrogen and bring it into contact with the precipitated non-diamond carbon. is necessary. Therefore, it is essential to bring the hydrogen gas into an excited state such as atomic hydrogen. On the other hand, it is believed that organic carbon compounds decompose and the non-diamond carbon is precipitated as diamond through methyl groups in the middle. Therefore, when depositing diamond on a substrate, the organic carbon compound must be mixed with hydrogen gas. It is also possible to decompose the organic carbon compound into diamond near the base material or on the base material surface without excitation. This means that if the organic carbon compound can be decomposed on the surface of the substrate depending on the temperature of the substrate, it is not necessarily necessary to decompose the organic carbon compound using the above-mentioned thermal filament or plasma.
本発明において一般的には有機炭素化合物と水
分とをガスにして混合し、さらにこれに水素ガス
を混合して前記した励起帯に導かれる。 In the present invention, generally, an organic carbon compound and water are mixed in the form of a gas, and then hydrogen gas is mixed with the gas to lead to the above-described excitation zone.
しかし、前記したように水素ガスのみを励起
し、他のガスは励起帯を通さずにダイヤモンド析
出装置内に供給し、基材の上に導いてもよい。 However, as described above, only hydrogen gas may be excited, and other gases may be supplied into the diamond precipitation apparatus without passing through the excitation zone, and guided onto the base material.
ダイヤモンドの析出は基材上で行なわれる。基
材としてはSi,W,Mo等の基板、あるいはSiC,
Si等の粒状物が用いられる。Si基板の場合は鏡面
研摩したもの、あるいはこれをダイヤモンド微粉
で表面に傷をつけたものが適する。基材は300〜
1000℃に加熱される。熱フイラメントでガスの励
起を行なうときはその輻射熱で基材はほぼ上記の
温度範囲に入ることが多い。基材には別に加熱機
構を取付けることもできる。 Diamond deposition takes place on the substrate. The base material is a substrate of Si, W, Mo, etc., or SiC,
Particulate materials such as Si are used. In the case of a Si substrate, a mirror-polished one or one whose surface has been scratched with diamond fine powder is suitable. Base material is 300~
Heated to 1000℃. When a gas is excited with a thermal filament, the radiant heat often brings the temperature of the base material into the above-mentioned temperature range. A heating mechanism can also be separately attached to the base material.
ダイヤモンドを析出させる場合の基材の位置は
励起された水素が励起状態を失う前に非ダイヤ炭
素に接触させることが必要であり、そのためには
基材と例えば熱フイラメントの場合、その間の間
隔はできるだけ小さい方がよく、熱フイラメント
の温度にも依存するが、一般的には5mm以下が適
している。基材はその表面にダイヤモンドを均一
に析出させるためにゆつくり回転させるとよい。 When depositing diamond, the position of the substrate must be such that the excited hydrogen comes into contact with the non-diamond carbon before it loses its excited state, and for this the distance between the substrate and, for example, in the case of a thermal filament, must be It is better to be as small as possible, and although it depends on the temperature of the thermal filament, 5 mm or less is generally suitable. The substrate may be rotated slowly to uniformly deposit the diamond on its surface.
本発明においてダイヤモンドを析出させる場合
のガス圧は広範囲に変えることができ、これも本
発明の特徴の一つである。実験によれば30Torr
位から1000Torr位まで殆んどダイヤモンド成長
速度が変らない。従つて常圧(760Torr)で行な
うことができるのも本発明の大きな利点である。
ガスの供給量は有機炭素化合物のガス、水蒸気、
水素ガスの混合ガスで、ダイヤモンド析出面1cm3
当り0.1〜100c.c./分が適当である。 In the present invention, the gas pressure when depositing diamond can be varied over a wide range, which is also one of the features of the present invention. According to experiment 30Torr
The diamond growth rate hardly changes from 1000 Torr to 1000 Torr. Therefore, it is a great advantage of the present invention that it can be carried out at normal pressure (760 Torr).
The amount of gas supplied is organic carbon compound gas, water vapor,
Diamond precipitation surface 1cm 3 with hydrogen gas mixture
0.1 to 100c.c./min is appropriate.
本発明によつて得られるダイヤモンドの形状は
基材の種類等によつて異なり、シリコン(Si)基
板の鏡面研摩したものを用いると粒状ダイヤモン
ドが析出し、またこの鏡面研摩面をダイヤモンド
ペースト等で表面を研摩し傷をつけたものを使用
すると膜状ダイヤモンドとなる。またSiC等の粒
状基材を使用すると粒状物の表面にダイヤモンド
粒子が相互に間隔をあけ、あるいは接触して析出
する。ダイヤモンドの析出速度は、本発明の方法
は非ダイヤ炭素の除去能力が大きいので、従来の
方法より高く、膜状ダイヤモンドの場合、その膜
で表わせば10〜15μm/hrの速度が可能である。 The shape of the diamond obtained by the present invention varies depending on the type of substrate, etc. If a mirror-polished silicon (Si) substrate is used, granular diamonds will precipitate, and this mirror-polished surface can be coated with diamond paste or the like. If the surface is polished and scratched, it becomes a membrane diamond. Furthermore, when a granular base material such as SiC is used, diamond particles are deposited on the surface of the granule at intervals or in contact with each other. The diamond deposition rate is higher than that of conventional methods because the method of the present invention has a greater ability to remove non-diamond carbon, and in the case of film-like diamond, a rate of 10 to 15 μm/hr is possible in terms of the film.
次に析出したダイヤモンドの結晶形についてで
あるが、一般に気相法ダイヤモンドは結晶形が
(111)面と(100)面の成長したものが混在して
いる。そしてこれらの結晶形を任意に制御するこ
とはむずかしい。ところが本発明によれば炭素原
子が密に充填した(111)面のものが多く得られ
る。そして水分の濃度を可能な範囲で高めれば殆
んどすべて(111)面の成長した粒子の集合体に
することも可能である。この理由については定か
でないところもあるが、水分(H2O)は炭素と
の反応性が水素より大きく、ダイヤモンドの中で
密充填でないため反応性の比較的大きい(100)
面成長ダイヤモンドが水分と反応し、除去される
ためではないかと考えられる。 Next, regarding the crystal form of the precipitated diamond, vapor-grown diamond generally has a mixture of (111) and (100) crystal forms. It is difficult to arbitrarily control these crystal forms. However, according to the present invention, many of the (111) planes in which carbon atoms are densely packed can be obtained. If the water concentration is increased as much as possible, it is possible to form an aggregate of particles with almost all (111) planes grown. The reason for this is not clear, but water (H 2 O) has a higher reactivity with carbon than hydrogen, and because it is not tightly packed in diamond, it has a relatively high reactivity (100).
It is thought that this is because surface-grown diamond reacts with moisture and is removed.
その他本発明によるダイヤモンドは純度が高
い。通常は基材の析出面は中心部は殆んど(111)
面や(100)面が成長したダイヤモンド、周囲に
いくに従つて球状ダイヤモンド、その外側に非ダ
イヤ炭素、例えばアモルフアスカーボン、黒鉛に
なる。本発明方法によるものは、水分によるダイ
ヤ炭素の除去作用が強いので、基板の中心部に
(111)面の成長したダイヤモンドのみかあるいは
これを主体としたダイヤモンドのみとなる。 Additionally, the diamond according to the invention has high purity. Usually, the precipitation surface of the base material is mostly (111) in the center.
Diamonds have grown faces or (100) faces, and as they move toward the periphery, they become spherical diamonds, and on the outside, non-diamond carbon, such as amorphous carbon, and graphite. In the method of the present invention, the removal effect of diamond carbon by moisture is strong, so that only diamond grown with (111) planes or diamond mainly composed of (111) planes are grown in the center of the substrate.
発明の効果
本発明によれば従来より一層早い速度でダイヤ
モンドを析出させることができ、しかも常圧付近
でも可能なので工業的には極めて有利である。ま
た純度の高いダイヤモンドが得られること、さら
にはダイヤモンドの結晶形を制御することも可能
であることも本発明の特徴である。そして本発明
は原料ガスに水分を混合するという簡単な操作に
より上記のような効果をもたらすものであり、産
業上の利用価値は大きなものである。Effects of the Invention According to the present invention, diamond can be precipitated at a faster rate than conventional methods, and it is also possible to precipitate diamond at near normal pressure, which is extremely advantageous from an industrial perspective. Another feature of the present invention is that it is possible to obtain diamonds with high purity, and furthermore, it is also possible to control the crystal form of diamonds. The present invention brings about the above-mentioned effects through a simple operation of mixing water into raw material gas, and has great industrial utility value.
実施例1 (炭化水素系)
図1に概略を示す装置で実験した。図において
1は反応容器でその上部に原料ガスの入口2、下
部に排気口7、側面に圧力計4が取付けられてい
る。また入口からのガスはガス導入管2′により
タングステンフイラメント3の真上に放出され
る。フイラメント3は両端が電源に接続され、そ
の電圧調整により温度が制御される。(フイラメ
ントコイル部分の長さ0.5cm)の真下にシリコン
基板(鏡面研摩後ダイヤモンドペーストで表面に
傷をつけたもの、基板の大きさ:1cm×1cm)を
基板支持台6の上に載置した。基板の表面とフイ
ラメントの下部(コイルの下面)との間隔は約3
mmである。Example 1 (Hydrocarbon system) An experiment was conducted using the apparatus schematically shown in FIG. In the figure, reference numeral 1 denotes a reaction vessel, which has a raw material gas inlet 2 at its upper part, an exhaust port 7 at its lower part, and a pressure gauge 4 at its side. Further, the gas from the inlet is discharged directly above the tungsten filament 3 through the gas introduction pipe 2'. Both ends of the filament 3 are connected to a power source, and the temperature is controlled by adjusting the voltage. (The length of the filament coil part is 0.5 cm). A silicon substrate (the surface was scratched with diamond paste after mirror polishing, size of the substrate: 1 cm x 1 cm) was placed on the substrate support 6. . The distance between the surface of the substrate and the bottom of the filament (bottom surface of the coil) is approximately 3
mm.
この装置を用い、原料ガスとしてCH41容量%、
H2O1容量%、H298容量%の混合ガスを用い、こ
れをガス入口2から50c.c./分の割合で供給し、フ
イラメントの温度約2000℃(パイロメーターによ
り測定)、圧力50Torr、基板温度(熱電対により
測定)650℃で、1時間ダイヤモンドを生成させ
た。結果はシリコン基板の上に厚さ4μmのダイヤ
モンド膜が生成した。ダイヤモンドの結晶は
(111)面で覆われた膜であつた。 Using this device, CH 4 1% by volume was used as the raw material gas,
Using a mixed gas of 1% by volume of H 2 O and 98% by volume of H 2 , this was supplied from gas inlet 2 at a rate of 50 c.c./min, and the filament temperature was approximately 2000°C (measured with a pyrometer) and the pressure was 50 Torr. , diamond was grown for 1 hour at a substrate temperature (measured by thermocouple) of 650°C. As a result, a 4 μm thick diamond film was formed on the silicon substrate. The diamond crystal was a film covered with (111) planes.
実施例2 (含酸素有機化合物系)
CH4の代りにCH3COCH3(アセトン)のガスを
用いた。組成はCH3COCH32容量%、H2O0.5容
量%、H297.5容量%で、混合ガス圧は100Torrと
した。その他は実施例1と同様の条件である。Example 2 (Oxygen-containing organic compound system) CH 3 COCH 3 (acetone) gas was used instead of CH 4 . The composition was 2% by volume of CH 3 COCH 3 , 0.5% by volume of H 2 O, and 97.5% by volume of H 2 , and the mixed gas pressure was 100 Torr. Other conditions were the same as in Example 1.
結果は3時間で35μmのダイヤモンド膜が生成
した。ダイヤモンド結晶は実施例1と同様であつ
た。 As a result, a 35 μm diamond film was formed in 3 hours. The diamond crystal was the same as in Example 1.
実施例 3
メチルアルコール(CH3OH)を原料ガスとし
て用い、組成はCH3OH1.5容量%、H2O1容量%、
残H297.5容量%で混合ガス圧は760Torrとした。
その他は実施例1と同様である。Example 3 Methyl alcohol (CH 3 OH) was used as the raw material gas, and the composition was CH 3 OH 1.5% by volume, H 2 O 1% by volume,
The residual H 2 was 97.5% by volume, and the mixed gas pressure was 760 Torr.
The rest is the same as in Example 1.
結果は4時間で8μmのダイヤモンド膜が合成さ
れた。結晶形は実施例1と同様でああつた。 As a result, an 8 μm diamond film was synthesized in 4 hours. The crystal form was the same as in Example 1.
実施例 4
基材としてガラス基板上に9μmのSiC粒子を散
布したものを用い、混合ガスを760Torrとした以
外は実施例2と同様にした。Example 4 The same procedure as in Example 2 was carried out except that a glass substrate on which SiC particles of 9 μm were dispersed was used as the base material, and the mixed gas was set to 760 Torr.
結果は1時間で5μ〜7μのダイヤモンド粒子が
SiC粒子のまわりに数個ついていた。 The results showed that diamond particles of 5μ to 7μ were produced in 1 hour.
Several were attached around the SiC particles.
図1は本発明の実施に用いる装置の1例を示す
概略断面図である。
1……反応容器、2……ガス導入口、3……タ
ングステンフイラメント、5……基板、7……排
気口。
FIG. 1 is a schematic cross-sectional view showing one example of an apparatus used for carrying out the present invention. DESCRIPTION OF SYMBOLS 1... Reaction container, 2... Gas inlet, 3... Tungsten filament, 5... Substrate, 7... Exhaust port.
Claims (1)
ヤモンドを析出させる方法において、前記ガスに
水分を混合することを特徴とする気相法によるダ
イヤモンドの合成法。 2 水素ガスと水分のガス混合比がH2O/H2の
容量比で表わして0.0001〜0.1である特許請求の
範囲第1項記載の気相法によるダイヤモンドの合
成法。[Scope of Claims] 1. A method for synthesizing diamond by a vapor phase method, characterized in that in a method of precipitating diamond from an organic carbon compound and hydrogen gas by a vapor phase method, water is mixed with the gas. 2. The method for synthesizing diamond by a gas phase method according to claim 1, wherein the gas mixing ratio of hydrogen gas and water is 0.0001 to 0.1 expressed as a volume ratio of H 2 O/H 2 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14574886A JPS632897A (en) | 1986-06-21 | 1986-06-21 | Method for synthesizing diamond by vapor phase method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14574886A JPS632897A (en) | 1986-06-21 | 1986-06-21 | Method for synthesizing diamond by vapor phase method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS632897A JPS632897A (en) | 1988-01-07 |
| JPH0341436B2 true JPH0341436B2 (en) | 1991-06-24 |
Family
ID=15392240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14574886A Granted JPS632897A (en) | 1986-06-21 | 1986-06-21 | Method for synthesizing diamond by vapor phase method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS632897A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0768079B2 (en) * | 1986-07-11 | 1995-07-26 | 京セラ株式会社 | Diamond film manufacturing method |
| JP2730144B2 (en) * | 1989-03-07 | 1998-03-25 | 住友電気工業株式会社 | Single crystal diamond layer formation method |
| JPH075433B2 (en) * | 1990-02-15 | 1995-01-25 | 洋一 広瀬 | Method for synthesizing diamond or hard carbon film and method for holding organic compound as raw material thereof |
| JP5822259B2 (en) * | 2011-06-16 | 2015-11-24 | 国立研究開発法人物質・材料研究機構 | Diamond crystal growth method and diamond crystal growth apparatus |
-
1986
- 1986-06-21 JP JP14574886A patent/JPS632897A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS632897A (en) | 1988-01-07 |
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