JPH0342419B2 - - Google Patents
Info
- Publication number
- JPH0342419B2 JPH0342419B2 JP57134140A JP13414082A JPH0342419B2 JP H0342419 B2 JPH0342419 B2 JP H0342419B2 JP 57134140 A JP57134140 A JP 57134140A JP 13414082 A JP13414082 A JP 13414082A JP H0342419 B2 JPH0342419 B2 JP H0342419B2
- Authority
- JP
- Japan
- Prior art keywords
- moisture
- sample gas
- path
- removal path
- remover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N25/00—Investigating or analyzing materials by the use of thermal means
- G01N25/56—Investigating or analyzing materials by the use of thermal means by investigating moisture content
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Sampling And Sample Adjustment (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Description
【発明の詳細な説明】
この発明は水晶発振式水分計システムに関す
る。詳しくは試料ガスまたは他の対照ガスの第1
水分除去路と試料ガス導入路とを水晶発振式水分
計システムに連結し、更に上記第1水分除去路と
並列に第2水分除去路を並列に連結してなる水晶
発振式水分計システムに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a crystal oscillation type moisture meter system. For details, please refer to the first sample gas or other reference gas.
The present invention relates to a crystal oscillation type moisture meter system in which a moisture removal path and a sample gas introduction path are connected to a crystal oscillation type moisture meter system, and further a second moisture removal path is connected in parallel with the first moisture removal path.
従来、水晶発振式水分計で試料ガスの水分を測
定する場合は、一般に第1図に示したようなシス
テムが用いられており、以下に説明する。 Conventionally, when measuring the moisture content of a sample gas using a crystal oscillation type moisture meter, a system as shown in FIG. 1 has generally been used, and will be explained below.
まず試料ガスまたはその他の対照ガスがその導
入路1を通じて水分除去路2に送られて通過して
水分が除去され開かれた電磁弁3を通過して水晶
発振式水分計4に送られその発振周波数が測定さ
れる〔このとき電磁弁5は閉鎖〕、次いで、電磁
弁3を閉じて電磁弁5を開き、試料ガスを試料ガ
ス導入路6から電磁弁5を通過させて水分計4に
送りその発振周波数が測定される。このようにし
て得られたふたつの発振周波数データの差から試
料ガスの水分が測定される。また上記操作を連続
的に繰返すことによつて連続的に試料ガスの水分
含有量が測定される。そして一般に水分除去器2
にはモレキユラーシーブ、シリカゲルなどの吸湿
剤が充填されているがその吸湿能力が低下すると
水分の測定誤差の原因になるという問題点があ
る。 First, the sample gas or other reference gas is sent to the moisture removal path 2 through the introduction path 1, where the moisture is removed, and through the opened electromagnetic valve 3, which is sent to the crystal oscillation type moisture meter 4, where it oscillates. The frequency is measured [at this time, the solenoid valve 5 is closed], then the solenoid valve 3 is closed and the solenoid valve 5 is opened, and the sample gas is sent from the sample gas introduction path 6 through the solenoid valve 5 to the moisture meter 4. Its oscillation frequency is measured. The moisture content of the sample gas is measured from the difference between the two oscillation frequency data obtained in this way. Furthermore, by continuously repeating the above operation, the water content of the sample gas can be continuously measured. And generally water remover 2
is filled with a moisture absorbing agent such as a molecular sieve or silica gel, but there is a problem in that if the moisture absorption ability of the moisture absorbing agent decreases, it may cause an error in moisture measurement.
この発明は上記問題点を解消するためになされ
たもので、試料ガスまたは他の対照ガスの導入路
と、水分除去器の前後にそれぞれ開閉弁を備えた
第1水分除去路と、水晶発振式水分計とをこの順
に適宜連結すると共に、開閉弁を備えた試料ガス
導入路を前記水晶発振式水分計に連結し、更にも
うひとつの水分除去器の前後にそれぞれ開閉弁を
備えた第2水分除去路を前記第1水分除去路に並
列に連結してなる水晶発振式水分計システムを提
供するもである。 This invention was made in order to solve the above problems, and includes an introduction path for sample gas or other reference gas, a first moisture removal path equipped with on-off valves before and after the moisture remover, and a crystal oscillation type A moisture meter is connected as appropriate in this order, a sample gas introduction path equipped with an on-off valve is connected to the crystal oscillation type moisture meter, and a second moisture remover is connected with an on-off valve before and after another moisture remover. The present invention provides a crystal oscillation type moisture meter system in which a removal path is connected in parallel to the first moisture removal path.
このシステムは、第1水分除去路の外にこれと
並列に第2水分除去路を設置したことを特徴とす
るものである。試料ガス導入路からの試料ガスの
該水分計への導入と試料ガスまたは他の対照ガス
の導入路から第1水分除去器を経由した試料ガス
または他の対照ガスの該水分計への導入を交互に
行い両者のガスによる発振周波数の差によつて試
料ガス水分が測定される。そして時々、第1水分
除去路の代りに第2水分除去路を用いて第1水分
除去路の水分吸収能を検査しながら水分測定を行
い、水分吸収能が一定限度以下に低下した場合、
第1水分除去路の代りに第2水分除去路が用いら
れる。従つて水分測定精度は極めて高いものであ
る。そして第2水分除去路使用している間に、第
1水分除去路の水分除去器を吸湿能力の高いもの
と交換するとか、吸湿剤の吸湿能力を復活させる
などの処理を行い、試料ガス中の水分測定を連続
して行うことができる。 This system is characterized in that a second moisture removal path is installed outside and in parallel with the first moisture removal path. Introducing the sample gas into the moisture meter from the sample gas introduction path, and introducing the sample gas or other reference gas into the moisture meter from the sample gas or other reference gas introduction path via the first moisture remover. The water content of the sample gas is measured based on the difference in oscillation frequency between the two gases. Then, from time to time, a second moisture removal path is used in place of the first moisture removal path to perform moisture measurement while testing the moisture absorption capacity of the first moisture removal path, and if the moisture absorption capacity falls below a certain limit,
A second moisture removal path is used instead of the first moisture removal path. Therefore, the accuracy of moisture measurement is extremely high. Then, while the second moisture removal path is in use, treatments such as replacing the moisture remover in the first moisture removal path with one with a higher moisture absorption capacity or restoring the moisture absorption ability of the moisture absorbent are performed to remove the moisture in the sample gas. water content can be measured continuously.
次に図面によつてこの発明を詳細に説明する。
第2図はこの発明のシステムの一実施例の構成説
明図である。 Next, the present invention will be explained in detail with reference to the drawings.
FIG. 2 is an explanatory diagram of the configuration of an embodiment of the system of the present invention.
試料ガスまたはその他の対照ガスの導入路10
と、電磁弁12と水分除去器13と電磁弁14を
備えた第1除去路11と、水晶発振式水分計15
とが連結され、一方電磁弁17を有する試料ガス
導入路16が水分計15に連結されている。さら
に電磁弁19と水分除去器20と電磁弁21を備
えた第2水分除去路18が前記第1水分除去路1
1と並列に連結されている。 Introduction channel 10 for sample gas or other reference gas
, a first removal path 11 equipped with a solenoid valve 12, a moisture remover 13, and a solenoid valve 14, and a crystal oscillation type moisture meter 15.
On the other hand, a sample gas introduction path 16 having a solenoid valve 17 is connected to a moisture meter 15. Further, a second moisture removal path 18 including a solenoid valve 19, a moisture remover 20, and a solenoid valve 21 is connected to the first moisture removal path 1.
1 and connected in parallel.
試料ガスの水分含有量の測定は次のような操作
によつて行われる。 The water content of the sample gas is measured by the following procedure.
試料ガスまたは他の対照ガスが一定時間、その
導入路10から導入され、第1水分除去路11の
電磁弁12と水分除去器13と電磁弁14とを経
由してその水分が実質的に除去された水分計15
に送られる〔この際第2水分除去路18の電磁弁
19,21と試料ガス導入路16の電磁弁17は
閉鎖〕。次いで試料ガスが一定時間、その導入路
16から導入され、電磁弁17を通過させて水分
計15に送られる〔この際他の電磁弁は閉鎖〕。
そしてこの2つの操作によつて水分計15から発
振される2つの周波数の差から試料ガスの水分含
有量が測定される。この操作を連続して繰返し、
試料ガスの水分含有量が連続的に測定される。そ
して適宜時間間隔をおいて、第1水分除去路11
の代りに第2水分除去路18を用いて(すなわち
電磁弁12と14を閉鎖して電磁弁19と21を
開いて)試料ガスまたは他の対照ガスを水分計1
5に送り、その場合発振周波数と第1水分除去路
11を用いて得られた発振周波数との差が一定限
度以上高くなれば(例えば水分量として1ppm以
上に相当)、第1水分除去路11から第2水分除
去路18に切換えられる。そしてその間に水分除
去器13を取替えるなどの方法で第1水分除去路
11の水分除去性能を復活させる。このような操
作を繰返して試料ガスの水分量の連続測定がなさ
れる。 A sample gas or other control gas is introduced through its introduction path 10 for a certain period of time, and its moisture is substantially removed via the solenoid valve 12 of the first moisture removal path 11, the moisture remover 13, and the solenoid valve 14. Moisture meter 15
[At this time, the solenoid valves 19 and 21 of the second moisture removal path 18 and the solenoid valve 17 of the sample gas introduction path 16 are closed]. Next, the sample gas is introduced from the introduction path 16 for a certain period of time, passes through the solenoid valve 17, and is sent to the moisture meter 15 (at this time, the other solenoid valves are closed).
Through these two operations, the moisture content of the sample gas is measured from the difference between the two frequencies oscillated from the moisture meter 15. Repeat this operation continuously,
The moisture content of the sample gas is continuously measured. Then, at appropriate time intervals, the first moisture removal path 11
The sample gas or other control gas is transferred to the moisture analyzer 1 using the second moisture removal path 18 instead (i.e. by closing the solenoid valves 12 and 14 and opening the solenoid valves 19 and 21).
In that case, if the difference between the oscillation frequency and the oscillation frequency obtained using the first moisture removal path 11 becomes higher than a certain limit (for example, equivalent to 1 ppm or more as a moisture content), the first moisture removal path 11 The water removal path 18 is then switched to the second water removal path 18. During this time, the moisture removal performance of the first moisture removal path 11 is restored by replacing the moisture remover 13 or the like. By repeating such operations, the water content of the sample gas is continuously measured.
なおこれらの操作は手動で行うことができる
が、電子式制御系を用いて自動的に行うこともで
きる。自動的に行つて得られた発振周波数のチヤ
ートの一例を第3図に示した。すなわちB、D、
F、I、KおよびMのレベルは、電磁弁12,1
4,19,21を閉じ電磁弁17を開いて試料ガ
スを試料ガス導入路16から導入して水分計15
に送つて得られた発振周波数である。またA、
C、EおよびGのレベルは第1水分除去路11に
試料ガスを通過させてその水分を実質的に除去し
て水分計15に送つて得られた発振周波数であ
る。そしてHのレベルは水分除去路を第1から第
2に切換えて得た発振周波数であり、GとHとの
レベルの差が1ppm以上の水分量に相当する差で
あつたのでH以後は第1水分除去路11の代りに
第2水分除去路18が用いられ、J、LおよびN
の発振周波数が得られた。 Note that these operations can be performed manually, but they can also be performed automatically using an electronic control system. An example of a chart of oscillation frequencies obtained automatically is shown in FIG. That is, B, D,
F, I, K and M levels are set by solenoid valves 12,1
4, 19, and 21 are closed, the solenoid valve 17 is opened, and the sample gas is introduced from the sample gas introduction path 16.
This is the oscillation frequency obtained by sending the signal to Also A,
Levels C, E, and G are oscillation frequencies obtained by passing the sample gas through the first moisture removal path 11 to substantially remove moisture therefrom and sending it to the moisture meter 15. The level of H is the oscillation frequency obtained by switching the moisture removal path from the first to the second, and since the difference between the levels of G and H was equivalent to a moisture content of 1 ppm or more, after H, the A second moisture removal path 18 is used instead of the first moisture removal path 11, and J, L and N
The oscillation frequency was obtained.
さらに、この発明のシステムの別の実施例の構
成説明図を第4図と第5図とに示した。 Furthermore, diagrams illustrating the configuration of another embodiment of the system of the present invention are shown in FIGS. 4 and 5.
第4図に示したこの発明のシステムの実施例
は、第1および第2水分除去路31および38の
電磁弁を3方弁とし、各除去路の一方の弁32,
39に各除去器内の吸湿剤乾燥用の乾燥ガス導入
路42,44を連結し、各除去路の他方の弁3
4,41に該ガスの排出路43,45を連結した
ものである。そして例えば第1水分除去路31を
用いて水分測定を行つていた場合にその水分除去
器33の吸湿能力か低下したことが判明した際、
電磁弁32と34を閉じ一方電磁弁39と41と
を開いて試料ガスまたは他の対照ガスをその導入
部30から第2水分除去路38を通過させて、第
1水分除去路31を第2水分除去路38に切換え
て試料ガス水分の測定を続ける。この間に三方電
磁弁の32と34を切替え、乾燥ガスが乾燥ガス
導入路42から電磁弁32を経て送られ水分除去
器33内を通過し電磁弁34を経て乾燥ガス排出
路43から排出され、水分除去器33内に充填さ
れたモレキユラーシーブ、シリカゲルなどの吸湿
剤が乾燥される。このようにして吸湿剤の水分吸
収能が再生され、第2水分除去路38中の水分除
去器40の吸湿能力が一定限度以下に低下したと
きの切替えにそなえられる。この実施例のシステ
ムは特別の場合を除いて水分除去器を取外さずに
その吸湿能力を再生することができる。更にこれ
らの水分除去器にその加熱器を設けたシステムも
この発明に含まれ、水分除去器の吸湿能力再生時
にこの加熱器で水分除去器を加熱することによつ
てより速やかに水分除去器の吸湿能力を再生でき
るものである。 The embodiment of the system of the present invention shown in FIG.
39 is connected to dry gas introduction paths 42 and 44 for drying the moisture absorbent in each remover, and the other valve 3 of each removal path is connected to
4 and 41 are connected to exhaust passages 43 and 45 for the gas. For example, when measuring moisture using the first moisture removal path 31, when it is found that the moisture absorption capacity of the moisture remover 33 has decreased,
The solenoid valves 32 and 34 are closed, while the solenoid valves 39 and 41 are opened to allow the sample gas or other control gas to pass from its inlet 30 through the second water removal passage 38, and the first water removal passage 31 to the second moisture removal passage 38. Switch to the moisture removal path 38 and continue measuring the sample gas moisture. During this time, the three-way solenoid valves 32 and 34 are switched, and the dry gas is sent from the dry gas introduction path 42 through the solenoid valve 32, passes through the moisture remover 33, passes through the solenoid valve 34, and is discharged from the dry gas discharge path 43. Moisture absorbents such as molecular sieves and silica gel filled in the moisture remover 33 are dried. In this way, the moisture absorption capacity of the desiccant is regenerated and is ready for switching when the moisture absorption capacity of the moisture remover 40 in the second moisture removal path 38 falls below a certain limit. The system of this embodiment can regenerate its moisture absorption capacity without removing the moisture remover except in special cases. Furthermore, a system in which these moisture removers are equipped with a heater is also included in the present invention, and by heating the moisture remover with this heater when regenerating the moisture absorption capacity of the moisture remover, the moisture remover can be heated more quickly. It can regenerate its moisture absorption ability.
第5図に示したこの発明のシステムの実施例
は、第4図に示した実施例のシステムの2つの水
分除去器の間にこれらに接してサーモモジユール
を設置したものである。 The embodiment of the system of the invention shown in FIG. 5 has a thermomodule placed between and adjacent to the two moisture removers of the system of the embodiment shown in FIG.
例えば第2水分除去路58を用いて試料ガス水
分を測定中で一方第1水分除去路51の三方電磁
弁52,54を切替えて乾燥ガスをその導入路6
2から導入して水分除去器53内を通過させて充
填されている吸湿剤を乾燥させ、乾燥ガス排出路
63から排出している場合についてその作動を説
明する。この場合、サーモモジユール67に直流
電流を通して水分除去器53と接している側の面
68で発熱させて水分除去器53を加熱すること
によつて水分除去器53の吸湿能力再生を速める
とともに水分除去器60と接してる側の面69で
吸熱させて水分除去器60を冷却してその吸湿能
力を高めることができる。また電流を逆方向に通
すことによつて逆の加熱、冷却を行うこともでき
る。 For example, while measuring the moisture content of a sample gas using the second moisture removal path 58, the three-way solenoid valves 52 and 54 of the first moisture removal path 51 are switched to supply dry gas to its introduction path 58.
The operation will be described in the case where the moisture absorbent is introduced from the dry gas discharge path 63, is introduced through the moisture remover 53, is dried, and is discharged from the dry gas discharge path 63. In this case, direct current is passed through the thermo module 67 to generate heat on the surface 68 on the side that is in contact with the moisture remover 53, thereby heating the moisture remover 53, thereby speeding up regeneration of the moisture absorbing ability of the moisture remover 53 and removing moisture. The surface 69 in contact with the remover 60 absorbs heat to cool the moisture remover 60 and increase its moisture absorption ability. In addition, reverse heating and cooling can be performed by passing current in the opposite direction.
第1図は水晶発振式水分計システムの従来例の
構成説明図、第2図、第4図および第5図はこの
発明の水晶発振式水分計システムの実施例の構成
説明図、第3図は第2図の水晶発振式水分計シス
テムによつて得られた発振周波数のチヤートであ
る。
1,10,30,50……試料ガスまたは他の
対照ガス導入路、2,13,20,33,40,
53,60……水分除去器、4,15,35,5
5……水晶発振式水分計、6,16,36,56
……試料ガス導入路、3,5,12,14,1
9,21……電磁弁、32,34,39,41,
52,54,59,61……三方電磁弁、42,
44,62,64……乾燥ガス導入路、43,4
5,63,65……乾燥ガス排出路、67……サ
ーモモジユール、68,69……サーモモジユー
ルの発熱または吸熱面。
FIG. 1 is an explanatory diagram of the configuration of a conventional example of a crystal oscillation type moisture meter system, FIGS. 2, 4, and 5 are configuration explanatory diagrams of an embodiment of the crystal oscillation type moisture meter system of the present invention. is a chart of oscillation frequencies obtained by the crystal oscillation type moisture meter system shown in FIG. 1, 10, 30, 50...Sample gas or other control gas introduction path, 2, 13, 20, 33, 40,
53,60...moisture remover, 4,15,35,5
5...Crystal oscillation type moisture meter, 6, 16, 36, 56
...Sample gas introduction path, 3, 5, 12, 14, 1
9, 21... Solenoid valve, 32, 34, 39, 41,
52, 54, 59, 61...Three-way solenoid valve, 42,
44, 62, 64...Dry gas introduction path, 43, 4
5, 63, 65... Dry gas discharge path, 67... Thermo module, 68, 69... Heat generating or endothermic surface of thermo module.
Claims (1)
分除去器の前後にそれぞれ三方開閉弁を備えた第
1水分除去路と、水晶発振式水分計とをこの順に
適宜連結すると共に、開閉弁を備えた試料ガス導
入路を前記水晶発振式水分計に連結し、更にもう
ひとつの水分除去器の前後にそれぞれ三方開閉弁
を備えた第2水分除去路を前記第1水分除去路に
並列に連結し、さらに上記のふたつの水分除去器
間にサーモモジユールを設置してなる水晶発振式
水分計システム。1. Connect the sample gas or other control gas introduction path, the first moisture removal path each equipped with a three-way on-off valve before and after the moisture remover, and the crystal oscillation type moisture meter in this order, and connect the on-off valves. A sample gas introduction path provided therein is connected to the crystal oscillation type moisture meter, and a second moisture removal path each having a three-way opening/closing valve before and after another moisture remover is connected in parallel to the first moisture removal path. In addition, a crystal oscillation type moisture meter system consists of a thermo module installed between the two moisture removers mentioned above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13414082A JPS5924252A (en) | 1982-07-30 | 1982-07-30 | Crystal oscillation moisture meter system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13414082A JPS5924252A (en) | 1982-07-30 | 1982-07-30 | Crystal oscillation moisture meter system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5924252A JPS5924252A (en) | 1984-02-07 |
| JPH0342419B2 true JPH0342419B2 (en) | 1991-06-27 |
Family
ID=15121403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13414082A Granted JPS5924252A (en) | 1982-07-30 | 1982-07-30 | Crystal oscillation moisture meter system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5924252A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59100847A (en) * | 1982-12-02 | 1984-06-11 | Seikosha Co Ltd | Detecting device of humidity |
| JPS60201233A (en) * | 1984-03-26 | 1985-10-11 | Shimadzu Corp | Component concentration measurement method |
| JPS61196134A (en) * | 1985-02-27 | 1986-08-30 | Shimadzu Corp | Moisture measuring cell |
| JPH0446203Y2 (en) * | 1986-09-30 | 1992-10-29 | ||
| JPS63111441A (en) * | 1986-10-30 | 1988-05-16 | Shimadzu Corp | Moisture meter |
| JPH0769256B2 (en) * | 1987-06-19 | 1995-07-26 | 株式会社島津製作所 | Crystal oscillation type moisture meter |
| JP3830788B2 (en) * | 2001-08-27 | 2006-10-11 | 三菱電機株式会社 | Odor management device and odor management method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5644826A (en) * | 1979-09-21 | 1981-04-24 | Toshiba Corp | Measuring method and system of tritium concentration |
-
1982
- 1982-07-30 JP JP13414082A patent/JPS5924252A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5924252A (en) | 1984-02-07 |
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