JPH0342699B2 - - Google Patents
Info
- Publication number
- JPH0342699B2 JPH0342699B2 JP60098281A JP9828185A JPH0342699B2 JP H0342699 B2 JPH0342699 B2 JP H0342699B2 JP 60098281 A JP60098281 A JP 60098281A JP 9828185 A JP9828185 A JP 9828185A JP H0342699 B2 JPH0342699 B2 JP H0342699B2
- Authority
- JP
- Japan
- Prior art keywords
- cap
- low melting
- melting point
- point glass
- sealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W76/00—Containers; Fillings or auxiliary members therefor; Seals
- H10W76/60—Seals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/68—Shapes or dispositions thereof
- H10W70/682—Shapes or dispositions thereof comprising holes having chips therein
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
- H10W72/07551—Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】
[概要]
キヤツプ封着面の融着材料を、半導体パツケー
ジとの接着部分で、間欠的に凸部状に厚い層に形
成されている半導体装置。DETAILED DESCRIPTION OF THE INVENTION [Summary] A semiconductor device in which a thick layer of fusing material on a cap sealing surface is formed intermittently in the shape of convex portions at the bonded portion with a semiconductor package.
また、キヤツプ封着面の融着材料を、半導体パ
ツケージとの接着部内側で、間欠的、または、連
続的に凸部状に厚い層に形成されている半導体装
置。 Also, a semiconductor device in which the sealing material of the cap sealing surface is formed into a thick layer intermittently or continuously in the shape of convex portions inside the bonded portion with the semiconductor package.
[産業上の利用分野]
本発明は半導体装置のうち、特に気密封止に用
いられる封止用キヤツプの改良に関する。[Industrial Field of Application] The present invention relates to improvements in sealing caps used for hermetic sealing of semiconductor devices, particularly.
ICなどの半導体装置は半導体パツケージに収
容されて、気密に封止されている。これは、半導
体素子が雰囲気に影響され易い活性な材料である
からである。 Semiconductor devices such as ICs are housed in semiconductor packages and hermetically sealed. This is because the semiconductor element is an active material that is easily influenced by the atmosphere.
このような半導体パツケージは、大別してモー
ルド型パツケージとセラミツク型パツケージとに
分けられ、後者のセラミツクパツケージは気密性
が良く、信頼性が高いパツケージとして知られて
いる。 Such semiconductor packages can be broadly classified into molded packages and ceramic packages, and the latter type of ceramic package is known to have good airtightness and high reliability.
しかし、セラミツク型はキヤツプを融着して、
気密封止する方式であるから、このキヤツプに塗
布した融着材料について、形状その他の点で十分
に配慮されなければならない。 However, with the ceramic type, the cap is fused and
Since this is an airtight sealing method, sufficient consideration must be given to the shape and other aspects of the fusing material applied to the cap.
[従来の技術]
セラミツクパツケージにおいては、従来からキ
ヤツプを低融点ガラスなどの融着材料で接着する
方法が採られており、そのため、キヤツプ融着面
の全面に低融点ガラス(融点350〜400℃程度)を
塗布したキヤツプが作成されている。[Prior Art] For ceramic packages, a method has traditionally been adopted in which the cap is bonded with a fusing material such as low melting point glass. A cap has been created that has been coated with
第6図aおよびbは従来のキヤツプの平面図と
断面図を示し、1はセラミツクキヤツプ、2は低
融点ガラスで、厚さ0.6〜0.7mmのキヤツプに対し
て、厚さ0.2mm程度の低融点ガラス2が塗布され
ている。 Figures 6a and 6b show a plan view and a cross-sectional view of conventional caps, 1 is a ceramic cap, 2 is a low melting point glass, and the cap is 0.6 to 0.7 mm thick, while the cap is about 0.2 mm thick. Melting point glass 2 is applied.
かくして、このようなキヤツプを融着して、気
密封止したセラミツクパツケージの断面図を第7
図に示しており、3は半導体素子4を収容したリ
ードベース(素子収容容器)である。このよう
に、リードベース3の周縁部とキヤツプ1とが低
融点ガラス2で融着され、内部が気密に保持され
るが、このキヤツプの融着には、キヤツプ1とリ
ードベース3との両方を加熱して、約400℃に昇
温して行なわれる。 Thus, a cross-sectional view of a ceramic package in which such a cap is fused and hermetically sealed is shown in Fig. 7.
As shown in the figure, 3 is a lead base (element housing container) that houses a semiconductor element 4. In this way, the peripheral edge of the lead base 3 and the cap 1 are fused with the low melting point glass 2, and the inside is kept airtight. This is done by heating the temperature to approximately 400°C.
[発明が解決しようとする問題点]
ところで、このような低融点ガラスを溶融し
て、キヤツプとリードベースを融着する工程は、
通常、室温でリードベースの上にキヤツプを載置
し、これを窒素雰囲気中の加熱炉に装入して加熱
融着し、次いで、冷却固化させている。[Problems to be Solved by the Invention] By the way, the process of melting such low melting point glass and fusing the cap and lead base is as follows:
Usually, a cap is placed on a lead base at room temperature, placed in a heating furnace in a nitrogen atmosphere to heat and fuse, and then cooled and solidified.
その時、室温でリードベースの上にキヤツプを
載置しているため、リードベース内の空間Sが外
部と遮断されていて、次第に加熱され、低融点ガ
ラスが次第に溶融するとキヤビテイ内部空間Sの
ガスが膨張する状態になる。そうすると、低融点
ガラスが外側に押し出されて、キヤツプの接着力
が弱められる問題が起こる。また、接着力の弱体
化だけでなく、甚だしい場合、融着した低融点ガ
ラスを突き破つて、空間Sのガスを噴出すること
もある。その場合、その噴出口は埋められずに、
気密封止が不完全になる。 At that time, since the cap is placed on the lead base at room temperature, the space S inside the lead base is isolated from the outside, and as it gradually heats up and the low melting point glass gradually melts, the gas in the cavity interior space S It becomes inflated. This causes a problem in that the low melting point glass is pushed outward, weakening the adhesive strength of the cap. In addition to weakening the adhesive force, in extreme cases, the fused low melting point glass may be broken and the gas in the space S may be blown out. In that case, the spout is not filled,
Hermetic seal becomes incomplete.
また、加熱溶融した時、リードベースの上でキ
ヤツプが溶融ガラスの上で浮いている状態になる
ために、その時にキヤツプが動いて位置ずれを起
こして接着力が弱くなる場合がある。更に、それ
が甚だしくなると、気密封止が不完全になつた
り、外形不良になる。 Furthermore, when heated and melted, the cap on the lead base floats on the molten glass, which may cause the cap to move and shift position, weakening the adhesive strength. Furthermore, if this becomes severe, the hermetic seal may become incomplete or the outer shape may be defective.
本発明は、このような接着強度の低下が防止で
きるパツケージを提案するものである。 The present invention proposes a package that can prevent such a decrease in adhesive strength.
[問題点を解決するための手段]
その問題は、キヤツプ封着面に設けた融着材料
が、半導体パツケージと接着する枠状部分におい
て、間欠的に凸状に層厚く形成されている半導体
封止用キヤツプ、あるいは、キヤツプ封着面に設
けた融着材料が、半導体パツケージとの枠状接着
部分に接する接着部内側において、間欠的に、あ
るいは、連続的に凸状に層厚く形成されている半
導体装置によつて解決される。[Means for solving the problem] The problem lies in semiconductor sealing in which the fusion material provided on the cap sealing surface is formed intermittently in a convex and thick layer in the frame-shaped portion that adheres to the semiconductor package. The sealing cap or the sealing material provided on the cap sealing surface is formed in a thick layer intermittently or continuously in a convex shape on the inside of the adhesive part that contacts the frame-shaped adhesive part with the semiconductor package. The problem is solved by a semiconductor device that uses
[作用]
即ち、半導体パツケージ(リードベース)との
接着枠状部分に、間欠的に凸状に層厚く形成した
キヤツプを用いると、パツケージとキヤツプとの
間に隙間があり、融着材料が溶融するまでパツケ
ージ内の空間は加圧されず、内圧は小さくなる。
従つて、融着材料の押し出し等による接着強度低
下の問題は低減される。[Function] In other words, if a thick, intermittently convex cap is used in the bonding frame-like portion with the semiconductor package (lead base), there will be a gap between the package and the cap, and the bonding material will melt. Until this happens, the space inside the package will not be pressurized, and the internal pressure will decrease.
Therefore, the problem of reduced adhesive strength due to extrusion of the fusion material is reduced.
又、半導体パツケージ(リードベース)との接
着枠状部分内側に、間欠的、または連続的に凸状
に層厚く形成したキヤツプを用いると、パツケー
ジの接着部内側の側壁にも融着材料が接着して、
接着部が幅広くなり、キヤツプの接着強度が強く
なる。且つ、キヤツプのずれによる不整合も解消
される。 In addition, if a thick cap is formed intermittently or continuously in a convex shape on the inside of the adhesive frame-shaped part with the semiconductor package (lead base), the adhesive material will also adhere to the side wall inside the adhesive part of the package. do,
The adhesive area becomes wider and the adhesive strength of the cap becomes stronger. In addition, misalignment caused by misalignment of the caps is also eliminated.
[実施例]
以下、図面を参照して実施例によつて詳細に説
明する。[Examples] Hereinafter, examples will be described in detail with reference to the drawings.
第1図aおよびbは本発明にかかるキヤツプの
平面図と断面図を示しており、11はセラミツク
キヤツプ、21,22は低融点ガラスで、低融点
ガラスはキヤツプ全面に塗布した厚さ0.2mm程度
の低融点ガラス21と、リードベースと接着する
部分に、枠状に間欠的凸状に形成した厚さ0.1mm
程度、幅1mm位の低融点ガラス22とからなつて
いる。このように、低融点ガラスを形成するに
は、最初の全面塗布、焼付の後、パターンマスク
を通して、その上から二度目の塗布、焼付をおこ
なえば、容易に作成できる。 Figures 1a and 1b show a plan view and a sectional view of a cap according to the present invention, in which 11 is a ceramic cap, 21 and 22 are low melting glasses, and the low melting glasses are coated on the entire surface of the cap to a thickness of 0.2 mm. A 0.1 mm thick frame-shaped intermittent convex shape is formed on the part to be bonded to the lead base and the low melting point glass 21.
It consists of a low melting point glass 22 with a width of about 1 mm. In this way, low melting point glass can be easily formed by first coating and baking the entire surface, then applying and baking a second time from above through a pattern mask.
このようなキヤツプをリードベース3に融着す
る封止工程の封止部分断面図を第2図に示してお
り、同図aは融着前、同図bは融着後の状態であ
る。融着前には、間欠的凸状に形成した低融点ガ
ラス22の隙間からキヤビテイ内部空間のガスを
逃がすことができ、融着後は低融点ガラス量が凸
状低融点ガラス22分だけ増量されているから、
接着強度が強くて、内部空間からの加圧による低
融点ガラスの押し出しも少なくなつて、勿論、内
部からのガス噴出は抑止される。 FIG. 2 shows a partial cross-sectional view of a sealing process in which such a cap is fused to the lead base 3, and FIG. 2A shows the state before fusion bonding, and FIG. 2B shows the state after fusion bonding. Before fusing, the gas in the cavity interior space can escape through the gaps between the low melting point glass 22 formed in an intermittent convex shape, and after fusing, the amount of low melting point glass is increased by the amount of the convex low melting point glass 22. Because I have
The adhesive strength is strong, and the extrusion of the low melting point glass due to pressure from the internal space is reduced, and gas ejection from the internal space is of course suppressed.
次に、第3図aおよびbは本発明にかかる他の
キヤツプの平面図と断面図を示しており、11は
セラミツクキヤツプ、21,23は低融点ガラス
で、低融点ガラスはキヤツプ全面に塗布した厚さ
0.2mm程度の低融点ガラス21と、リードベース
と接着する部分に接した内側に、枠状に間欠的凸
状に形成した厚さ0.1mm、幅1mm程度の低融点ガ
ラス23とからなつている。 Next, FIGS. 3a and 3b show a plan view and a sectional view of another cap according to the present invention, in which 11 is a ceramic cap, 21 and 23 are low melting glasses, and the low melting glasses are coated on the entire surface of the cap. thickness
It consists of a low melting point glass 21 of about 0.2 mm, and a low melting point glass 23 of about 0.1 mm thick and 1 mm wide, which is formed into a frame shape with intermittent convex shapes on the inside in contact with the part to be bonded to the lead base. .
このようなキヤツプをリードベース3に融着す
る封止工程の封止部部分断面図を第4図に示して
おり、同図aは融着面、同図bは融着後の状態で
ある。融着前は、間欠的凸状に形成した低融点ガ
ラス23のために、リードベース3に対するキヤ
ツプ11の位置が規制されており、また、低融点
ガラス23が溶融した後でも、その部分が凸状の
ため、キヤツプが動くことは少なくなる。そうし
て、融着後は、増量された凸状低融点ガラス23
分がリードベース接着部の内側の側壁に融着し
て、それだけ接着強度が強くなる。そのため、封
止不完全などの事故は防止される。 A partial sectional view of the sealing part in the sealing process of fusing such a cap to the lead base 3 is shown in Fig. 4, where a shows the fused surface and b shows the state after welding. . Before fusing, the position of the cap 11 with respect to the lead base 3 is restricted by the low melting point glass 23 formed in an intermittent convex shape, and even after the low melting point glass 23 is melted, the portion does not become convex. Because of the shape, the cap moves less. After fusion, the increased convex low melting point glass 23
The portion of the lead base is fused to the inner side wall of the adhesive portion, increasing the adhesive strength accordingly. Therefore, accidents such as incomplete sealing are prevented.
次に、第5図aおよびbは本発明にかかる更に
他のキヤツプの平面図と断面図を示しており、1
1はセラミツクキヤツプ、21,24は低融点ガ
ラスで、低融点ガラスはキヤツプ全面に塗布した
低融点ガラス21と、リードベースと接着する部
分に接した内側に、枠状に連続的に形成した低融
点ガラス24とからなつている。本例は第4図の
実施例と同じ効果が得られるが、これらのキヤツ
プはリードベース接着部側壁への接着量が多いか
ら、キヤビテイ内部からのガスの逃げを期待する
必要がなく、このように連続的に凸状低融点ガラ
ス24を設けても、接着強度の強い封止がおこな
える。 Next, FIGS. 5a and 5b show a plan view and a sectional view of still another cap according to the present invention, and 1
1 is a ceramic cap, and 21 and 24 are low melting glasses. It consists of a melting point glass 24. This example achieves the same effect as the example shown in Figure 4, but since these caps have a large amount of adhesive on the side wall of the lead base adhesive part, there is no need to expect gas to escape from inside the cavity. Even if the convex low-melting point glass 24 is continuously provided on the surface, sealing with strong adhesive strength can be achieved.
[発明の効果]
以上の説明から明らかなように、本発明によれ
ばセラミツクパツケージにおいて、その気密封止
の信頼性が向上する効果が大きいものである。[Effects of the Invention] As is clear from the above description, the present invention has a significant effect of improving the reliability of hermetic sealing in a ceramic package.
第1図aおよびb、第3図aおよびb、第5図
aおよびbは本発明にかかるキヤツプの平面図と
断面図、第2図aおよびb、第4図aおよびbは
その封止工程の部分断面図(同図aは融着前、同
図bは融着後)、第6図aおよびbは従来のキヤ
ツプの平面図と断面図、第7図は封止したセラミ
ツクパツケージの断面図である。
図において、1,11はキヤツプ、2,21は
低融点ガラス、22,23,24は凸状低融点ガ
ラス、3はリードベースを示している。
Figures 1a and b, Figures 3a and b, and Figures 5a and b are plan views and sectional views of the cap according to the invention, Figures 2a and b, and Figures 4a and b are its sealing. A partial sectional view of the process (Figure a before fusion, Figure b after fusion), Figures 6a and b are a plan view and sectional view of a conventional cap, and Figure 7 shows a sealed ceramic package. FIG. In the figure, 1 and 11 are caps, 2 and 21 are low-melting glasses, 22, 23, and 24 are convex low-melting glasses, and 3 is a lead base.
Claims (1)
パツケージと接着する枠状部分において、間欠的
に凸状に層厚く形成されていることを特徴とする
半導体装置。 2 キヤツプ封着面に設けた融着材料が、半導体
パツケージとの枠状接着部分に接する接着部内側
において、間欠的に、あるいは、連続的に凸状に
層厚く形成されていることを特徴とする半導体装
置。[Scope of Claims] 1. A semiconductor device characterized in that a fusion material provided on a cap sealing surface is formed in a thick layer intermittently in a convex shape in a frame-shaped portion that is bonded to a semiconductor package. 2. The adhesive material provided on the cap sealing surface is formed in a thick layer intermittently or continuously in a convex shape on the inside of the adhesive part that contacts the frame-shaped adhesive part with the semiconductor package. semiconductor devices.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60098281A JPS61256656A (en) | 1985-05-08 | 1985-05-08 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60098281A JPS61256656A (en) | 1985-05-08 | 1985-05-08 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61256656A JPS61256656A (en) | 1986-11-14 |
| JPH0342699B2 true JPH0342699B2 (en) | 1991-06-28 |
Family
ID=14215542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60098281A Granted JPS61256656A (en) | 1985-05-08 | 1985-05-08 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61256656A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63275147A (en) * | 1987-05-07 | 1988-11-11 | Nec Corp | Manufacture of hermetically sealed type semiconductor device |
| US7242088B2 (en) * | 2000-12-29 | 2007-07-10 | Intel Corporation | IC package pressure release apparatus and method |
| JP5595196B2 (en) | 2010-09-16 | 2014-09-24 | 日本電波工業株式会社 | Piezoelectric device |
| JP7177328B2 (en) * | 2017-09-29 | 2022-11-24 | 日亜化学工業株式会社 | light emitting device |
-
1985
- 1985-05-08 JP JP60098281A patent/JPS61256656A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61256656A (en) | 1986-11-14 |
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