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JPH0343225B2 - - Google Patents
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JPH0343225B2 - - Google Patents

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Publication number
JPH0343225B2
JPH0343225B2 JP57198900A JP19890082A JPH0343225B2 JP H0343225 B2 JPH0343225 B2 JP H0343225B2 JP 57198900 A JP57198900 A JP 57198900A JP 19890082 A JP19890082 A JP 19890082A JP H0343225 B2 JPH0343225 B2 JP H0343225B2
Authority
JP
Japan
Prior art keywords
ferrite
glass
mol
temperature
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57198900A
Other languages
Japanese (ja)
Other versions
JPS5988370A (en
Inventor
Junji Niihara
Nobuo Kaihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP57198900A priority Critical patent/JPS5988370A/en
Publication of JPS5988370A publication Critical patent/JPS5988370A/en
Publication of JPH0343225B2 publication Critical patent/JPH0343225B2/ja
Granted legal-status Critical Current

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  • Magnetic Ceramics (AREA)
  • Inorganic Insulating Materials (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は低温焼結型で高いQを有する誘電体磁
器材料に係るもので、特にLC複合チツプ素子の
一括焼結体を製造するのに適した低温焼結誘電体
磁器材料とその製造法に関する。 従来、LC複合チツプ素子は、別個に製造され
たチツプインダクタ及びチツプコンデンサを組合
わせて構成され、共振作用を有する回路素子、例
えばトラツプ回路やフイルタ回路として広く使用
されている。その製造方法は、シート法、印刷法
などにより誘電体層と電極層の積層、及び磁性体
層とコイル形成用導体の積層を行い、個々の積層
体を所定の温度で焼成してそれぞれ焼結チツプコ
ンデンサ及び焼結チツプインダクタとし、これら
を1個1個接着してLC複合チツプ素子とするこ
とが一般的に行われている。別法として、LC複
合チツプ素子を一括焼成して一体的な素子とする
方法も行われている。この場合にはコンデンサ材
料として結晶化ガラスが使用されているが、チツ
プインダクタのフエライト焼結体と結晶化ガラス
焼結体の熱膨脹係数の差が大きいため長期間使用
しているうちに接合面でのクラツクやはがれが生
じる。これに対処するためにこれら両材料の中間
の熱膨脹係数を有するガラス等の歪緩和層を介在
させる必要があるのが現状である。 上記の方法のうち、チツプ焼結体を接着する方
法は、チツプ焼結体が微小なため製造工程がはん
雑になり大量生産が容易にできない欠点がある。
また、中間緩和層を形成する方法は余分な層を要
する点で製造工程がはん雑になり、また回路的に
機能しない無駄な部分を含むことになる。 従つて、本発明の目的は、一括焼成に適し、中
間緩和層を必要としない、誘電体磁器材料を提供
することにあり、特にフエライト磁性体と共に焼
結されるときにすぐれた特性を発揮する低温焼結
誘電体磁器材料を提供することにある。 本発明者は磁性フエライトと一緒に焼成される
ときに、磁性フエライトとの間に熱膨脹係数の実
質的な差がなく、且つそれに対して十分な接着強
度を有する材料を探求した結果、スピネル型フエ
ライト系の素材とガラスとの混合焼結体が所期の
目的を達成するものであることを見出した。しか
も、本発明の材料は電気特性も高く、比較的低温
で焼結しうるものであることが分つた。 本発明者はチツプインダクタ用磁性材料とし
て、低温焼結フエライトを発明したが(特願昭56
−182307号)、現在それと同程度の焼結温度を有
するLC共振回路素子に使用できる高いQを呈す
る誘電体としては結晶化ガラスしかないが、上記
のように結晶化ガラスは磁性フエライトとの熱膨
脹係数の差が大きいため、接合面に中間層を介在
させなければならなかつたが、本発明の誘電体磁
器材料は中間層を用いないで上記の磁性フエライ
トと一括焼結するのに適した誘電体材料であるこ
とが分つた。 本発明の低温焼結誘電体磁器材料は回路素子と
して必要な電気特性を有し、そして焼結特性とし
て磁性フエライトと同程度の焼結温度及び縮率を
有し、さらに焼結体として同程度の熱膨脹係数を
有するものである。従つて、焼成前にLC一体化
した形状の予成形体を焼結してLC複合チツプを
製造でき、上記のように焼結体を1個づつ接着し
たり、接合部に中間緩和層を形成する必要もな
く、大量生産が容易で、材料の消費量も中間層が
不要であるので少なくて済み、製造コストを低減
できる利点がある。 以下、本発明を詳しく説明する。一般に、スピ
ネル型フエライトは高周波磁性材料として実用に
供されており、CuZnフエライトはその1例であ
る。このフエライトはCuを含むことにより他の
スピネル型フエライトよりも低温で焼結する。ま
た非磁性のZuフエライトの含有量に応じてこの
タイプのフエライトのキユリー温度は変化し、常
温の一般に各種電気機器が実用に供される温度範
囲で非磁性のものとしうることが知られている。
さらにフエライトの誘電率εは一般に10以上の常
誘電体であるし、またフエライト焼結体の熱膨脹
係数αは2価イオンの種類によらず約80〜110×
10-7/℃の範囲にある。以上から、非磁性の
CuZnフエライトは磁性フエライトと共に一括焼
成するに適する誘電体として用いうるかを検討し
た。 非磁性CuZnフエライトの特性を詳しく調べた
結果を第1図に示す。同図は1000℃で焼成した
CuZnフエライトの組成とε、Q、d.sh(ε:比誘
電率、Q:誘電体のQ、d:焼結密度g/cm3
sh:縮率%)の関係を示すもので、Fe2O340〜
50wt%、CuO0〜20wt%、ZnO残部の範囲でTc
=−50℃以下の部分、すなわち−50℃以上で非磁
性となる。しかし、この図から分るように、焼結
性は良好で低温焼結するがCuZnフエライトのQ
は著しく低く、LC複合チツプの誘電体としては
不適当なことが分つた。 フエライトの誘電体としてのQはその固有抵
抗、すなわち、結晶粒の抵抗と結晶粒界の抵抗に
依存すると思われるので、本発明者はこれらをで
きるだけ大きくしてCuZnフエライトの抵抗を上
げることを試みた。その結果、非磁性のCuZnフ
エライト(Cu=0mol%も含む)を主成分とする
酸化物にガラス成分を添加して高抵抗粒界を導入
すると、Qの値が著しく増大することが分つた。
このガラスとしては、焼成温度付近で軟化する、
固有抵抗が109Ω−cm以上のガラスであれば良く、
ホウ酸ガラス、ホウケイ酸ガラス、ケイ酸ソーダ
ガラス等が使用でき、さらにMgO、Al2O3
PbO、ZnO、CaOなどのいずれの成分を含んでい
ても良い。 主成分となる非磁性CuZnフエライトは、第1
図に示した範囲のうち、右下部分のキユリー温度
Tc=−50℃以上の部分を除いた組成から選択す
る。Fe2O350mol%を越える組成は焼結体の中に
Fe2+イオンを生じる可能性があり、Fe2+、Fe3+
イオンの電気伝導が生じてガラスを含有させたと
してもQを著しく低下させ、また化学量論量に対
してFe2O3が多くなると焼結体を著しく劣下する
ので好ましくない。これに対してFe2O350mol%
以下であるとスピネル型フエライトの化学量論量
から外れるためスピネル固溶体は2相以上のスピ
ネル型フエライトを主成分とする酸化物となる
が、誘電体として何らの支障がないことが分つ
た。上に規定したCuZnフエライトは800〜1000℃
の温度範囲で焼成したとき良好な焼結特性を有し
ており、LC複合チツプ素子の材料としてすぐれ
ている。焼成温度が1000℃を越える酸化物とガラ
スの混合焼結体の場合、酸化物の焼結反応が緩慢
で焼結密度が低いためその焼結体内部に多数の空
孔が生じるため誘電体としては耐湿性に劣り実用
に供するのが困難となる。 混合されるガラスの量は、焼結体の全量に対し
て1〜50wt%の範囲で選択する。一般に上記の
ガラスはその熱膨脹係数が10〜50×10-7/℃程度
であり、これを熱膨脹係数が90〜100×10-7/℃
程度のCuZnフエライトと混合焼成した焼結体の
熱膨脹係数はその混合割合によつて変化する。低
温焼成磁性フエライトの熱膨脹係数は約90×
10-7/℃程度なので、これに複合させる誘電体材
料の熱膨脹係数αは70〜110×10-7/℃の範囲、
すなわち磁性フエライトの熱膨脹係数の±20×
10-7/℃の範囲にあればよい。この範囲はガラス
の量約50%以下において実現される。 低温焼成フエライトはその粉末の製造に於て、
適当な条件を選択すれば焼成温度800〜900℃の範
囲で電気的、磁気的特性を損うことなくその縮率
を10〜20%の範囲で制御しうる。したがつてLC
複合チツプを一括焼成で製造する場合に誘電体材
料として満足な電気的特性を有する非磁性CuZn
系フエライトを主成分とする、酸化物とガラスの
混合物の焼結体の縮率±1%にある低温焼成磁性
フエライトと組合せてやれば、磁性体部分と誘電
体部分の縮率の差による変形、まがりなどの生じ
ることがなく、LC複合チツプとして十分実用に
供せられるものが容易に製造できる。 低温焼成磁性フエライトを用いるチツプインダ
クタは内部巻線としてAgを用いた焼結体であり、
そのQは50程度である。トラツプ回路やフイルタ
ー回路に要求される減衰量は一般に−20dB以上
であり、組合せる誘電体のQによつてこの減衰量
は変化する。第2図は組合わせる誘電体のQを変
えたときのLC共振回路の減衰量を示すもので、
曲線に沿えた数字1はμ=108、Q=50(4MHz)、
sh=12%、α=95×10-7/℃の焼結チツプインダ
クタ、数字2はμ=153、Q=42、sh=17%、α
=89×10-7/℃の焼結チツプインダクタ、数字3
はμ=125、Q=47、sh=15%、α=92×10-7
℃の焼結チツプインダクタを示し、いずれも焼成
温度900℃のものである。第2図から分るように
チツプコンデンサのQが100以上あれば十分に実
用に供しうることが分るが、本発明のガラスを混
在したCuZnフエライト(Cu=0mol%も含む)は
この要件を十分に満足する。 次に、本発明の実施例を説明する。 実施例 1 市販の酸化鉄、酸化亜鉛、酸化銅粉体を
Fe2O340.5mol%、CuO10.0mol%、ZnO49.5mol
%の割合で重量300gになるように秤量し、これ
に水600gを加えボールミルに入れて2時間混合
し、混合後乾燥した。次いでこの乾燥粉体を空気
中で700℃、2時間仮焼成した。仮焼成した粉体
に、ZnO−B2O3−SiO2系ガラスを0〜100wt%加
え、混合物の重量240gに水480gを加え、ボール
ミルで100時間粉砕し、粉砕後乾燥した。 乾燥粉体50g、結着剤としてエチルセルロース
の8%溶液(溶媒はターピネオール)16g、溶剤
としてターピネオール25gを秤量しらいかい機で
2時間撹拌しペーストを作つた。このペースト及
びAg粉のペーストをスクリーン印刷法により交
互に積層してチツプコンデンサを作り、乾燥後、
焼結体寸法4.5×3.2mmのチツプに切断し、850℃
及び900℃で2時間空気中で焼結してチツプコン
デンサを得た。諸特性は表1に通す通りであつ
た。
The present invention relates to a low-temperature sintered dielectric porcelain material having a high Q, and more particularly to a low-temperature sintered dielectric porcelain material suitable for producing a bulk sintered body of an LC composite chip element and a method for producing the same. . Conventionally, LC composite chip elements are constructed by combining separately manufactured chip inductors and chip capacitors, and are widely used as circuit elements having a resonant effect, such as trap circuits and filter circuits. The manufacturing method is to laminate dielectric layers and electrode layers, and to laminate magnetic layers and coil-forming conductors using sheet methods, printing methods, etc., and then sinter each laminate by firing each laminate at a predetermined temperature. It is common practice to use a chip capacitor and a sintered chip inductor and glue them one by one to form an LC composite chip element. As an alternative method, a method is also used in which LC composite chip devices are fired all at once to form an integrated device. In this case, crystallized glass is used as the capacitor material, but due to the large difference in coefficient of thermal expansion between the ferrite sintered body of the chip inductor and the crystallized glass sintered body, the joint surface may deteriorate after long-term use. Cracks and peeling may occur. In order to cope with this problem, it is currently necessary to interpose a strain relaxation layer made of glass or the like having a coefficient of thermal expansion between those of these two materials. Among the above methods, the method of gluing sintered chips has the drawback that the manufacturing process is complicated because the sintered chips are minute and mass production is not easy.
Furthermore, the method of forming the intermediate relaxation layer requires an extra layer, which complicates the manufacturing process, and also includes unnecessary parts that do not function in terms of circuitry. It is therefore an object of the present invention to provide a dielectric porcelain material that is suitable for bulk firing, does not require an intermediate relaxation layer, and exhibits excellent properties especially when sintered with ferrite magnetic material. The object of the present invention is to provide a low-temperature sintered dielectric porcelain material. The inventor of the present invention searched for a material that has no substantial difference in coefficient of thermal expansion with magnetic ferrite and has sufficient adhesive strength when fired together with the magnetic ferrite, and found that spinel-type ferrite We have discovered that a mixed sintered body of glass and other materials achieves the desired purpose. Furthermore, it was found that the material of the present invention has high electrical properties and can be sintered at a relatively low temperature. The present inventor invented low-temperature sintered ferrite as a magnetic material for chip inductors (Japanese patent application No. 56
Currently, crystallized glass is the only dielectric material exhibiting a high Q that can be used for LC resonant circuit elements with a similar sintering temperature, but as mentioned above, crystallized glass is Due to the large difference in coefficients, it was necessary to interpose an intermediate layer on the joint surface, but the dielectric ceramic material of the present invention is a dielectric material suitable for bulk sintering with the above magnetic ferrite without using an intermediate layer. It turned out to be a body material. The low-temperature sintered dielectric porcelain material of the present invention has the electrical properties necessary for a circuit element, and has the same sintering temperature and shrinkage rate as magnetic ferrite. It has a coefficient of thermal expansion of Therefore, an LC composite chip can be manufactured by sintering a preformed body with an integrated LC shape before firing, and the sintered bodies can be bonded one by one as described above, or an intermediate relaxation layer can be formed at the joint. There is no need to do this, mass production is easy, and the amount of material consumed is small because no intermediate layer is required, which has the advantage of reducing manufacturing costs. The present invention will be explained in detail below. Generally, spinel-type ferrite is used practically as a high-frequency magnetic material, and CuZn ferrite is one example thereof. This ferrite sinters at a lower temperature than other spinel-type ferrites because it contains Cu. It is also known that the Curie temperature of this type of ferrite changes depending on the content of non-magnetic Zu ferrite, and that it can be made non-magnetic at room temperature, a temperature range where various electrical devices are generally put into practical use. .
Furthermore, the dielectric constant ε of ferrite is generally 10 or more, making it a paraelectric material, and the coefficient of thermal expansion α of sintered ferrite is approximately 80 to 110×, regardless of the type of divalent ion.
It is in the range of 10 -7 /℃. From the above, non-magnetic
We investigated whether CuZn ferrite can be used as a dielectric suitable for simultaneous firing with magnetic ferrite. Figure 1 shows the results of a detailed investigation of the characteristics of nonmagnetic CuZn ferrite. The figure was fired at 1000℃
Composition of CuZn ferrite and ε, Q, d.sh (ε: relative dielectric constant, Q: Q of dielectric, d: sintered density g/cm 3 ,
sh: Shrinkage ratio (%)), Fe 2 O 3 40~
Tc in the range of 50wt%, CuO0~20wt%, balance ZnO
= The part below -50℃, that is, becomes non-magnetic at temperatures above -50℃. However, as can be seen from this figure, although the sinterability is good and low temperature sintering is possible, the Q of CuZn ferrite is
was found to be extremely low, making it unsuitable as a dielectric material for LC composite chips. The Q of ferrite as a dielectric material seems to depend on its specific resistance, that is, the resistance of crystal grains and the resistance of crystal grain boundaries, so the inventors attempted to increase the resistance of CuZn ferrite by increasing these as much as possible. Ta. As a result, it was found that when a glass component was added to an oxide whose main component was non-magnetic CuZn ferrite (including Cu = 0 mol%) to introduce high-resistance grain boundaries, the Q value increased significantly.
This glass softens near the firing temperature.
Any glass with a specific resistance of 10 9 Ω-cm or more is sufficient.
Boric acid glass, borosilicate glass, soda silicate glass, etc. can be used, as well as MgO, Al 2 O 3 ,
It may contain any component such as PbO, ZnO, or CaO. The non-magnetic CuZn ferrite, which is the main component, is the first
The Curie temperature in the lower right part of the range shown in the figure
Select from the composition excluding the part where Tc=-50℃ or higher. Fe 2 O 3 If the composition exceeds 50 mol%, it will be contained in the sintered body.
May generate Fe 2+ ions, Fe 2+ , Fe 3+
Even if glass is included due to electrical conduction of ions, Q will be significantly lowered, and if the amount of Fe 2 O 3 increases relative to the stoichiometric amount, the sintered body will deteriorate significantly, which is not preferable. In contrast, Fe 2 O 3 50mol%
If it is below, the spinel solid solution deviates from the stoichiometry of spinel ferrite, and the spinel solid solution becomes an oxide mainly composed of two or more phases of spinel ferrite, but it has been found that there is no problem as a dielectric material. The CuZn ferrite specified above is 800~1000℃
It has good sintering properties when fired in the temperature range of 200 to 3000, making it an excellent material for LC composite chip devices. In the case of a mixed sintered body of oxide and glass where the firing temperature exceeds 1000℃, the sintering reaction of the oxide is slow and the sintered density is low, resulting in a large number of pores inside the sintered body, making it difficult to use as a dielectric material. has poor moisture resistance and is difficult to put into practical use. The amount of glass to be mixed is selected in the range of 1 to 50 wt% based on the total amount of the sintered body. Generally, the above-mentioned glass has a coefficient of thermal expansion of about 10 to 50 x 10 -7 /℃, which is 90 to 100 x 10 -7 /℃.
The coefficient of thermal expansion of the sintered body mixed with CuZn ferrite varies depending on the mixing ratio. The thermal expansion coefficient of low-temperature fired magnetic ferrite is approximately 90×
10 -7 /℃, so the thermal expansion coefficient α of the dielectric material to be combined with this is in the range of 70 to 110 × 10 -7 /℃,
In other words, the coefficient of thermal expansion of magnetic ferrite is ±20×
It is sufficient if it is within the range of 10 -7 /℃. This range is achieved with an amount of glass of about 50% or less. In the production of low-temperature fired ferrite powder,
By selecting appropriate conditions, the shrinkage ratio can be controlled within the range of 10 to 20% at a firing temperature of 800 to 900° C. without impairing the electrical and magnetic properties. Therefore LC
Non-magnetic CuZn has satisfactory electrical properties as a dielectric material when manufacturing composite chips by batch firing.
When combined with low-temperature-sintered magnetic ferrite, which has a shrinkage ratio of ±1% of a sintered body of a mixture of oxide and glass, which has ferrite as its main component, deformation due to the difference in shrinkage ratio between the magnetic part and the dielectric part will occur. , no curling occurs, and it is easy to manufacture LC composite chips that can be used for practical purposes. A chip inductor using low-temperature fired magnetic ferrite is a sintered body using Ag as the internal winding.
Its Q is about 50. The amount of attenuation required for trap circuits and filter circuits is generally -20 dB or more, and this amount of attenuation changes depending on the Q of the dielectric material used in combination. Figure 2 shows the attenuation of the LC resonant circuit when the Q of the combined dielectrics is changed.
The number 1 that follows the curve is μ = 108, Q = 50 (4MHz),
Sintered chip inductor with sh=12%, α=95×10 -7 /℃, number 2 is μ=153, Q=42, sh=17%, α
=89×10 -7 /℃ sintered chip inductor, number 3
is μ=125, Q=47, sh=15%, α=92×10 -7 /
℃ sintered chip inductors, all of which were fired at a firing temperature of 900℃. As can be seen from Figure 2, if the chip capacitor has a Q of 100 or more, it can be put to practical use, but the glass-mixed CuZn ferrite (including Cu = 0 mol%) of the present invention does not meet this requirement. fully satisfied. Next, examples of the present invention will be described. Example 1 Commercially available iron oxide, zinc oxide, and copper oxide powders were
Fe 2 O 3 40.5 mol%, CuO 10.0 mol%, ZnO 49.5 mol
%, and 600 g of water was added to it, mixed in a ball mill for 2 hours, and dried after mixing. Next, this dry powder was calcined in air at 700°C for 2 hours. 0 to 100 wt % of ZnO-B 2 O 3 -SiO 2 glass was added to the calcined powder, 480 g of water was added to 240 g of the mixture, pulverized in a ball mill for 100 hours, and dried after pulverization. A paste was prepared by weighing out 50 g of dry powder, 16 g of an 8% solution of ethyl cellulose (solvent: terpineol) as a binder, and 25 g of terpineol as a solvent, and stirring for 2 hours with a shaker. Chip capacitors are made by laminating this paste and Ag powder paste alternately by screen printing method, and after drying,
Cut the sintered body into chips with dimensions of 4.5 x 3.2 mm and heat at 850℃.
A chip capacitor was obtained by sintering in air at 900°C for 2 hours. The various properties were as shown in Table 1.

【表】 第3図の曲線1は本実施例(850℃焼成のもの)
による誘電体のガラス含有率と熱膨脹係数αの関
係を示すもので、ガラス量が約50wt%を超える
とαが70×10-7/℃以下となつて、磁性フエライ
トのα≒90×10-7/℃と相当に違つてしまうので
好ましくない。 また、本例のチツプコンデンサのうち、ガラス
含有量が0%のものと10wt%のものについて4M
HzのQは、850℃で焼成のものは、第4図の線1
で示す通りガラス0%でQ=62であつたものが
10wt%ではQ=350となつた。また900℃で焼成
のものは線2で示すように0%ではQ=46のもの
が10wt%ではQ=280であつた。 実施例 2 実施例1において、ガラスとしてB2O3−SiO2
を0〜100%用いて同じ方法で(焼成温度850℃及
び900℃)誘電体を製造した。第3図の曲線2で
示す通り、ガラス含有量が約50wt%以下で熱膨
脹係数αが約70〜95×10-7/℃であつた。諸特性
を次表に示す。
[Table] Curve 1 in Figure 3 is this example (calcined at 850℃)
This shows the relationship between the glass content of the dielectric and the coefficient of thermal expansion α.When the amount of glass exceeds about 50wt%, α becomes 70×10 -7 /℃ or less, and α of magnetic ferrite is approximately 90×10 - 7 /℃, which is not desirable. Also, among the chip capacitors in this example, 4M
The Q of Hz is the line 1 in Figure 4 for those fired at 850℃.
As shown in , the one with 0% glass and Q=62 is
At 10wt%, Q=350. In addition, as shown by line 2, for those fired at 900°C, Q = 46 at 0%, but Q = 280 at 10wt%. Example 2 In Example 1, B2O3 - SiO2 was used as the glass.
Dielectrics were manufactured using the same method (firing temperatures of 850°C and 900°C) using 0 to 100% of As shown by curve 2 in FIG. 3, the glass content was about 50 wt% or less and the coefficient of thermal expansion α was about 70 to 95×10 -7 /°C. The characteristics are shown in the table below.

【表】 実施例 3 実施例1において、ガラスとしてB2O3(水和物
H3BO3)を0、3.2及び8.8wt%用いて同じ方法で
(焼成温度850℃及び900℃)チツプコンデンサを
製造した。第4図の線3は850℃焼成のもの、線
4は900℃焼成のものを示す。明らかにガラス1
%以上でQは100以上であり、8.8%で600以上と
なつている。諸特性を次表に示す。
[Table] Example 3 In Example 1, B 2 O 3 (hydrate
Chip capacitors were manufactured using the same method (firing temperatures of 850° C. and 900° C.) using 0, 3.2 and 8.8 wt% of H 3 BO 3 ). Line 3 in FIG. 4 shows the product fired at 850°C, and line 4 shows the product fired at 900°C. obviously glass 1
% or more, Q is 100 or more, and 8.8% is 600 or more. The characteristics are shown in the table below.

【表】 実施例 4 非磁性フエライトの原料としてCuOを含まない
でFe2O348mol%、ZnO52mol%を用い、ガラス
としてB2O30〜5wt%用いた他は実施例1と同じ
方法でチツプコンデンサを製造した。第5図に示
すように、Qはガラス1%以上で200以上であつ
た。諸特性を次表に示す。
[Table] Example 4 The same method as in Example 1 was used except that 48 mol% of Fe 2 O 3 and 52 mol% of ZnO were used as raw materials for non-magnetic ferrite without CuO, and 0 to 5 wt% of B 2 O 3 was used as glass. Manufactured chip capacitors. As shown in FIG. 5, Q was 200 or more when the glass was 1% or more. The characteristics are shown in the table below.

【表】 実施例 5 焼成温度850℃で空気中焼成して得たNiCuZn
フエライトで特性としてμ=108、Q(4MHz)=
49、sh=13.2%、α=94×10-7/℃を有する磁性
フエライトをAgペーストによる内部コイル形成
導体のターンが18巻となるように積層して厚さ
1200μの積層体とし、その上に実施例1の誘電体
材料の4層をAgペースト電極と交互に積層して
厚さ900μの積層コンデンサとして複合し、850℃
で2時間空気中焼成してLC複合チツプを得た。
その減衰量の周波数f特性を第6図に示す。この
LC回路のfrは4.72MHzで減衰量−21.5dBであり、
十分に実用に供せられる。
[Table] Example 5 NiCuZn obtained by firing in air at a firing temperature of 850°C
The characteristics of ferrite are μ=108, Q (4MHz)=
49, sh = 13.2%, α = 94 × 10 -7 /℃ Magnetic ferrite is laminated with Ag paste so that the conductor has 18 turns to form an internal coil.
A laminate with a thickness of 1200μ was formed, and four layers of the dielectric material of Example 1 were laminated alternately with Ag paste electrodes on top of the laminate to form a multilayer capacitor with a thickness of 900μ.
The chips were fired in air for 2 hours to obtain LC composite chips.
The frequency f characteristic of the attenuation amount is shown in FIG. this
The f r of the LC circuit is 4.72MHz and the attenuation is -21.5dB,
Sufficient for practical use.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は非磁性CuZnフエライトの組成と特性
を示す図、第2図はチツプコンデンサのQがLC
複合チツプの減衰量に及ぼす影響を示すグラフ、
第3図は非磁性フエライト誘電体に混合されるガ
ラスの混合比と熱膨脹係数の関係を示すグラフ、
第4図及び第5図は非磁性フエライト誘電体に混
合されるガラスの混合比とチツプコンデンサのQ
の関係を示すグラフ、及び第6図は本発明の誘電
体によつて構成したLC複合チツプの減衰特性を
示すグラフである。
Figure 1 shows the composition and characteristics of non-magnetic CuZn ferrite, and Figure 2 shows the chip capacitor with a Q of LC.
Graph showing the effect of composite chips on attenuation,
Figure 3 is a graph showing the relationship between the mixing ratio of glass mixed into the non-magnetic ferrite dielectric and the coefficient of thermal expansion.
Figures 4 and 5 show the mixing ratio of glass mixed into the non-magnetic ferrite dielectric and the Q of the chip capacitor.
FIG. 6 is a graph showing the attenuation characteristics of an LC composite chip constructed using the dielectric of the present invention.

Claims (1)

【特許請求の範囲】 1 Fe2O340〜50mol%及び残部ZnOの範囲でキ
ユリー温度Tc=−50℃以下の組成のZn系フエラ
イトを主成分とする酸化物(ただしCuは含まな
い)、およびFe2O340〜50mol%、CuO20mol%以
下及び残部ZnOの範囲でキユリー温度Tc=−50
℃以下の組成のCuZn系フエライトを主成分とす
る酸化物から選択された酸化物に、1〜50wt%
のガラス組成物を混合してなる誘電体磁器材料。 2 Fe2O340〜50mol%及び残部ZnOの範囲でキ
ユリー温度Tc=−50℃以下の組成のZn系フエラ
イトを主成分とする酸化物(ただしCuは含まな
い)、及びFe2O340〜50mol%、CuO20mol%以下
及び残部ZnOの範囲でキユリー温度Tc=−50℃
以下の組成のCuZn系フエライトを主成分とする
酸化物から選択された酸化物に、1〜50wt%の
ガラス組成物を混合し、ついで800〜900℃の温度
で焼成することによりなる誘電体磁器材料の製造
法。
[Claims] 1. An oxide containing Zn-based ferrite as a main component (but not including Cu) with a composition of 40 to 50 mol% Fe 2 O 3 and the balance ZnO and a Curie temperature Tc = -50°C or less, and Fe 2 O 3 40 to 50 mol%, CuO 20 mol% or less, and the balance ZnO, the Curie temperature Tc = -50
1 to 50 wt% to an oxide selected from oxides whose main component is CuZn-based ferrite with a composition below ℃.
A dielectric porcelain material made by mixing a glass composition. 2 An oxide whose main component is Zn-based ferrite (but does not contain Cu) with a composition in the range of 40 to 50 mol% Fe 2 O 3 and the balance ZnO and a Curie temperature Tc = -50°C or less, and Fe 2 O 3 40 ~50 mol%, CuO below 20 mol% and balance ZnO, Curie temperature Tc = -50℃
Dielectric porcelain made by mixing 1 to 50 wt% of a glass composition to an oxide selected from oxides whose main component is CuZn-based ferrite having the following composition, and then firing at a temperature of 800 to 900°C. Method of manufacturing materials.
JP57198900A 1982-11-15 1982-11-15 Low temperature baked dielectric ceramic material and manufacture Granted JPS5988370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57198900A JPS5988370A (en) 1982-11-15 1982-11-15 Low temperature baked dielectric ceramic material and manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57198900A JPS5988370A (en) 1982-11-15 1982-11-15 Low temperature baked dielectric ceramic material and manufacture

Publications (2)

Publication Number Publication Date
JPS5988370A JPS5988370A (en) 1984-05-22
JPH0343225B2 true JPH0343225B2 (en) 1991-07-01

Family

ID=16398804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57198900A Granted JPS5988370A (en) 1982-11-15 1982-11-15 Low temperature baked dielectric ceramic material and manufacture

Country Status (1)

Country Link
JP (1) JPS5988370A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158706A (en) * 1987-12-16 1989-06-21 Tdk Corp Inductor
JPH0787047B2 (en) * 1987-12-16 1995-09-20 ティーディーケイ株式会社 Inductor core
JPH01222414A (en) * 1988-03-01 1989-09-05 Tdk Corp High frequency core
JP4873959B2 (en) * 2006-02-17 2012-02-08 Tcm株式会社 Transportation vehicle
CN101889319B (en) * 2007-12-25 2013-01-02 日立金属株式会社 Multilayer inductor and power conversion device using same
JP6205149B2 (en) * 2013-03-19 2017-09-27 Fdk株式会社 Nonmagnetic material and method for producing nonmagnetic porcelain composition

Also Published As

Publication number Publication date
JPS5988370A (en) 1984-05-22

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