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JPH0346512B2 - - Google Patents
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JPH0346512B2 - - Google Patents

Info

Publication number
JPH0346512B2
JPH0346512B2 JP61076106A JP7610686A JPH0346512B2 JP H0346512 B2 JPH0346512 B2 JP H0346512B2 JP 61076106 A JP61076106 A JP 61076106A JP 7610686 A JP7610686 A JP 7610686A JP H0346512 B2 JPH0346512 B2 JP H0346512B2
Authority
JP
Japan
Prior art keywords
formula
polyimide
polymaleimide
bismaleimide
adhesive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61076106A
Other languages
Japanese (ja)
Other versions
JPS62232475A (en
Inventor
Shuichi Matsura
Yasuo Myadera
Toshihiko Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7610686A priority Critical patent/JPS62232475A/en
Publication of JPS62232475A publication Critical patent/JPS62232475A/en
Publication of JPH0346512B2 publication Critical patent/JPH0346512B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Landscapes

  • Adhesives Or Adhesive Processes (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesive Tapes (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明は可撓性、耐熱性に優れた熱硬化性接着
フイルムに関する。 〔従来の技術〕 従来、電気絶縁材料、構造材料等に用いられて
いるポリイミド接着剤としては、N,N′−(4,
4−ジフエニルメタン)ビスマレイミドと4,
4′−ジアミノジフエニルメタンからなる予備縮合
物が知られている。 〔発明が解決しようとする問題点〕 しかしながら上記の予備縮合物自体は、固くて
脆いため流延してフイルムとすることができなか
つた。また積層材等の接着シートとして用いる場
合にはその溶液をガラス布などの基材に含浸した
後溶剤を除去しプリプレグとしなければならない
ため基材の厚さに限定され、したがつて薄いもの
を得ることができなかつた。 本発明はかゝる状況に鑑みなされたものであつ
て、可撓性、耐熱性に優れた熱硬化性接着フイル
ムを提供せんとするものである。 〔問題点を解決するための手段〕 すなわち、本発明は一般式 〔式中Arは、式(a) 又は式(b) である2価の基を示す〕で表わされる繰り返し単
位を有し、式(a)の基と式(b)の基を前者/後者がモ
ル比で10/90〜50/50の割合で含むポリイミド(A)
及び 一般式 (式中mは2以上の整数であり、Rは炭素数2
以上のm価の基を示す)で表わされるポリマレイ
ミド(B) を含む樹脂組成物を流延成形してなる熱硬化性接
着フイルムに関する。 本発明においてポリイミド(A)はクレゾール、フ
エノール等の溶媒中で3,3′,4,4′−ベンゾフ
エノンテトラカルボン酸二無水物(以下BTDA
と略す)3,3′−ジアミノジフエニルスルホン
(以下3,3′−DDSと略す)および2,4−ジア
ミノトルエン(以下2,4−DATと略す)とを
加熱撹拌することによつて得られるが、ジメチル
アセトアミド、ジメチルホルムアミド等の非プロ
トン性極性溶媒中で室温以下の温度で反応させ、
対応するポリアミド酸を合成し、無水酢酸−ポリ
ジン等の脱水剤を用いて脱水閉環させることによ
つて得ることもできる。 ポリイミド(A)中3,3′−DDS成分と2,4−
DAT成分は前者/後者がモル比で10/90〜50/
50の割合で含まれる。2,4−DAT成分が90モ
ル%を越えるとポリイミド(A)が固くなり、成形性
が悪くなる。また3,3′−DDSが50モル%を越え
ると製膜性が悪化する。 本発明に用いることのできるポリマレイミド(B)
の具体例としてはN,N′−(4,4′−ジフエニル
メタン)ビスマレイミド、N,N′−(4,4′−ジ
フエニルオキシ)ビスマレイミド、N,N′−p
−フエニレンビスマレイミド、N,N′−m−フ
エニレンビスマレイミド、N,N′−2,4−ト
リレンビスマレイミド、N,N′−2,6−トリ
レンビスマレイミド、N,N′−エチレンビスマ
レイミド、N,N′−ヘキサメチレンビスマレイ
ミド、あるいは といつた構造式で表わされるポマレイミドがあ
り、これらを単独あるいは二種以上混合して用い
ることができる。 ポリイミド(A)とポリマレイミド(B)の混合割合
は、ポリマレイミド(B)をポリイミド(A)に対して10
〜50重量%で用いるのが好ましく、さらに好まし
くは15〜30重量%である。ポリマレイミド(B)が10
重量%未満では硬化が十分でなく50重量%を越え
ると樹脂組成物がもろく成形性がなくなる。 ポリイミドとポリマレイミドの混合は粉状で行
なつてもよいが、通常はDMFのような溶剤に溶
解したポリイミドワニスにポリマレイミドを添加
溶解することによつて行なわれる。 このようにして得たポリイミドとポリマレイミ
ドとの混合ワニスをガラス板、ステンレス板等に
流延、乾燥することにより接着フイルムを得る。
乾燥温度と時間は用いる溶剤、ポリマレイミドの
種類によつて異なるが、温度はポリマレイミドの
反応が顕著になる温度よりも低く保つ必要があ
り、時間は残存溶剤量が約1%以下になるように
しなければならない。 得られた接着フイルムは被着体と重ねた後、軟
化点以上の温度で加熱加圧することによつて耐熱
性に優れ、良好な接着力を有する成形品を得るこ
とができる。 本発明に係る接着フイルムは可撓性に富んでい
るため、フレキシブル配線板の銅箔と耐熱フイル
ムの接着剤として適している。 以下実施例によつて本発明を詳細に説明する
が、本発明はこれらの実施例に限定されるもので
はない。 実施例 1 BTDA32.2g、3,3′−DDS9.9g、2,4−
DAT7.3g撹拌機、温度計、窒素ガス導入管、冷
却管を備えた四つ口フラスコに入れ、m−クレゾ
ール450g、トルエン108gを添加し、窒素ガスを
流しながら加熱撹拌した。150〜160℃で16時間反
応させて、樹脂分18.2%、粘度18Pのポリイミド
ワニスを得た。このポリイミドワニスをアセトン
中に注いで再沈し粉砕、洗浄、乾燥することによ
つてポリイミド粉末を得た。ポリイミド粉末の還
元粘度(濃度0.1g/d1、溶媒N,N−ジメチル
ホルムアミド(DMF)、温度30.0℃)は0.46dl/
gであつた。得られたポリイミド粉末100gとN,
N′−(4,4′−ジフエニルメタン)ビスマレイミ
ド(BMI)10gをDMF400gに溶解してワニス
を得た。このワニスをガラス板上に流延し、130
℃10分乾燥した後、剥離し、鉄枠に止めて200℃
1時間乾燥して接着フイルムを得た。得られた接
着フイルムは厚さ25μm、残存溶媒量1%、軟化
点260℃であり、180゜に折曲げても割れず可撓性
に優れたものであつた。 実施例 2 N,N′−(4,4′−ジフエニルメタン)ビスマ
レイミドのかわりにBMI−M(三井東圧化学(株)製
ポリマレイミド)20gを添加する以外は実施例1
と同様にして接着フイルムを得た。得られた接着
フイルムは厚さ25μm、残存溶媒量1.1%、軟化点
220℃であり、180゜に折曲げても割れず可撓性に
優れたものであつた。 比較例 1 ケルイミド601(日本ポリイミド(株)製ポリアミノ
ビスマレイミド樹脂)100gをDMF100gに溶解
したワニスをガラス板上に流延後、130℃10分、
つにで170℃20分乾燥したが、もろくてフイルム
とならなかつた。 実施例3〜5、比較例2 実施例1のBMI量を表1のように変更する以
外は実施例1と同様にして得た接着フイルムを1
mm厚のアルミ板と35μm厚の片面粗化銅箔の間に
はさんで50Kgf/cm2、275℃、30分の条件で積層
して銅張基板を得た。基板の特性を表1に示す。
[Industrial Application Field] The present invention relates to a thermosetting adhesive film with excellent flexibility and heat resistance. [Prior Art] Conventionally, polyimide adhesives used for electrical insulation materials, structural materials, etc. are N, N'-(4,
4-diphenylmethane) bismaleimide and 4,
A precondensate consisting of 4'-diaminodiphenylmethane is known. [Problems to be Solved by the Invention] However, the above-mentioned precondensate itself was hard and brittle and could not be cast into a film. In addition, when used as an adhesive sheet for laminated materials, the solution must be impregnated into a base material such as glass cloth, and then the solvent must be removed to form a prepreg, which is limited by the thickness of the base material, and therefore thin sheets cannot be used. I couldn't get it. The present invention was made in view of the above situation, and it is an object of the present invention to provide a thermosetting adhesive film having excellent flexibility and heat resistance. [Means for solving the problem] That is, the present invention solves the general formula [In the formula, Ar is the formula (a) or formula (b) It has a repeating unit represented by [representing a divalent group] and contains a group of formula (a) and a group of formula (b) in a molar ratio of 10/90 to 50/50. Polyimide (A)
and general formula (In the formula, m is an integer of 2 or more, and R has 2 carbon atoms.
The present invention relates to a thermosetting adhesive film formed by casting a resin composition containing a polymaleimide (B) represented by the above m-valent group. In the present invention, the polyimide (A) is 3,3',4,4'-benzophenonetetracarboxylic dianhydride (hereinafter referred to as BTDA) in a solvent such as cresol or phenol.
) 3,3'-diaminodiphenylsulfone (hereinafter abbreviated as 3,3'-DDS) and 2,4-diaminotoluene (hereinafter abbreviated as 2,4-DAT) obtained by heating and stirring. However, by reacting in an aprotic polar solvent such as dimethylacetamide or dimethylformamide at a temperature below room temperature,
It can also be obtained by synthesizing the corresponding polyamic acid and subjecting it to dehydration and ring closure using a dehydrating agent such as acetic anhydride-polydine. 3,3'-DDS component and 2,4- in polyimide (A)
The molar ratio of DAT components is 10/90 to 50/
Contained at a rate of 50. If the 2,4-DAT component exceeds 90 mol%, the polyimide (A) becomes hard and has poor moldability. Furthermore, if the content of 3,3'-DDS exceeds 50 mol%, film forming properties deteriorate. Polymaleimide (B) that can be used in the present invention
Specific examples include N,N'-(4,4'-diphenylmethane)bismaleimide, N,N'-(4,4'-diphenyloxy)bismaleimide, N,N'-p
-phenylene bismaleimide, N,N'-m-phenylene bismaleimide, N,N'-2,4-tolylene bismaleimide, N,N'-2,6-tolylene bismaleimide, N,N' - ethylene bismaleimide, N,N'-hexamethylene bismaleimide, or There are pomaleimides represented by the following structural formulas, and these can be used alone or in a mixture of two or more. The mixing ratio of polyimide (A) and polymaleimide (B) is 10% of polymaleimide (B) to polyimide (A).
It is preferably used in an amount of ~50% by weight, more preferably 15-30% by weight. Polymaleimide (B) is 10
If it is less than 50% by weight, curing will not be sufficient, and if it exceeds 50% by weight, the resin composition will become brittle and have no moldability. Mixing of polyimide and polymaleimide may be carried out in powder form, but it is usually carried out by adding and dissolving the polymaleimide in a polyimide varnish dissolved in a solvent such as DMF. The thus obtained mixed varnish of polyimide and polymaleimide is cast onto a glass plate, stainless steel plate, etc. and dried to obtain an adhesive film.
The drying temperature and time vary depending on the solvent used and the type of polymerimide, but the temperature needs to be kept lower than the temperature at which the reaction of the polymaleimide becomes noticeable, and the drying time is set so that the amount of residual solvent is about 1% or less. must be done. The obtained adhesive film is laminated on an adherend and then heated and pressed at a temperature above the softening point, thereby making it possible to obtain a molded article with excellent heat resistance and good adhesive strength. Since the adhesive film according to the present invention is highly flexible, it is suitable as an adhesive between a copper foil and a heat-resistant film of a flexible wiring board. The present invention will be explained in detail below with reference to Examples, but the present invention is not limited to these Examples. Example 1 BTDA32.2g, 3,3′-DDS9.9g, 2,4-
7.3 g of DAT was placed in a four-necked flask equipped with a stirrer, a thermometer, a nitrogen gas inlet tube, and a cooling tube, and 450 g of m-cresol and 108 g of toluene were added thereto, followed by heating and stirring while flowing nitrogen gas. The reaction was carried out at 150 to 160°C for 16 hours to obtain a polyimide varnish with a resin content of 18.2% and a viscosity of 18P. This polyimide varnish was poured into acetone, reprecipitated, crushed, washed and dried to obtain polyimide powder. The reduced viscosity of polyimide powder (concentration 0.1 g/d1, solvent N,N-dimethylformamide (DMF), temperature 30.0°C) is 0.46 dl/
It was hot at g. 100g of the obtained polyimide powder and N,
A varnish was obtained by dissolving 10 g of N'-(4,4'-diphenylmethane) bismaleimide (BMI) in 400 g of DMF. This varnish was cast onto a glass plate and
After drying for 10 minutes at ℃, peel it off, fix it on an iron frame and heat it at 200℃.
After drying for 1 hour, an adhesive film was obtained. The resulting adhesive film had a thickness of 25 μm, a residual solvent content of 1%, a softening point of 260° C., and was excellent in flexibility without cracking even when bent at 180°. Example 2 Example 1 except that 20 g of BMI-M (polymaleimide manufactured by Mitsui Toatsu Chemical Co., Ltd.) was added instead of N,N'-(4,4'-diphenylmethane)bismaleimide.
An adhesive film was obtained in the same manner as above. The obtained adhesive film has a thickness of 25 μm, a residual solvent amount of 1.1%, and a softening point.
It was 220°C and had excellent flexibility without cracking even when bent at 180°. Comparative Example 1 A varnish prepared by dissolving 100 g of Kelimide 601 (polyamino bismaleimide resin manufactured by Nippon Polyimide Co., Ltd.) in 100 g of DMF was cast on a glass plate, and then heated at 130°C for 10 minutes.
I dried it in the oven at 170℃ for 20 minutes, but it was too brittle to form a film. Examples 3 to 5, Comparative Example 2 Adhesive films obtained in the same manner as in Example 1 except that the BMI amount in Example 1 was changed as shown in Table 1.
A copper-clad board was obtained by sandwiching a mm-thick aluminum plate and a 35-μm-thick single-sided roughened copper foil and laminating them at 50 kgf/cm 2 at 275° C. for 30 minutes. Table 1 shows the characteristics of the substrate.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように、本発明になる
接着フイルム成膜性、可撓性ならびに耐熱性にす
ぐれ各種接着用途に適用が可能であり、その工業
的価値は大きいものである。
As is clear from the above description, the adhesive film of the present invention has excellent film formability, flexibility, and heat resistance, and can be applied to various adhesive applications, and has great industrial value.

Claims (1)

【特許請求の範囲】 1 一般式 〔式中Arは、式(a) 又は式(b) である2価の基を示す〕で表わされる繰り返し単
位を有し、式(a)の基と式(b)の基を前者/後者がモ
ル比で10/90〜50/50の割合で含むポリイミド(A)
及び 一般式 (式中mは2以上の整数であり、Rは炭素数2
以上のm価の基を示す)で表わされるポリマレイ
ミド(B) を含む樹脂組成物を流延成形してなる熱硬化性接
着フイルム。
[Claims] 1. General formula [In the formula, Ar is the formula (a) or formula (b) It has a repeating unit represented by [representing a divalent group] and contains a group of formula (a) and a group of formula (b) in a molar ratio of 10/90 to 50/50. Polyimide (A)
and general formula (In the formula, m is an integer of 2 or more, and R has 2 carbon atoms.
A thermosetting adhesive film formed by casting a resin composition containing a polymaleimide (B) represented by the above m-valent group.
JP7610686A 1986-04-02 1986-04-02 Heat-curable bonding film Granted JPS62232475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7610686A JPS62232475A (en) 1986-04-02 1986-04-02 Heat-curable bonding film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7610686A JPS62232475A (en) 1986-04-02 1986-04-02 Heat-curable bonding film

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP7322489A Division JPH0671139B2 (en) 1989-03-24 1989-03-24 Manufacturing method of printed wiring board

Publications (2)

Publication Number Publication Date
JPS62232475A JPS62232475A (en) 1987-10-12
JPH0346512B2 true JPH0346512B2 (en) 1991-07-16

Family

ID=13595639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7610686A Granted JPS62232475A (en) 1986-04-02 1986-04-02 Heat-curable bonding film

Country Status (1)

Country Link
JP (1) JPS62232475A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4826927A (en) * 1986-01-13 1989-05-02 Ciba-Geigy Corporation Mixtures containing polymides alkenyphenols and either epoxide group-free adducts or another polyimide
EP0456515B1 (en) * 1990-05-10 1995-11-08 Hitachi Chemical Co., Ltd. Polyimides and thermosetting resin compositions containing the same
JP2007197590A (en) * 2006-01-27 2007-08-09 Fujifilm Corp Film manufacturing method and film

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3908165A (en) * 1974-06-10 1975-09-23 Arvin Ind Inc Field strength meter
JPS5211688A (en) * 1975-07-15 1977-01-28 Matsushita Electric Works Ltd Shoulder patting device
DE2637338C3 (en) * 1976-08-19 1979-08-09 Heraeus Quarzschmelze Gmbh, 6450 Hanau Coolable infrared radiator element
JPS56161457A (en) * 1980-05-17 1981-12-11 Kanegafuchi Chem Ind Co Ltd Heat-resisting resin composition

Also Published As

Publication number Publication date
JPS62232475A (en) 1987-10-12

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