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JPH0348605B2 - - Google Patents
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JPH0348605B2 - - Google Patents

Info

Publication number
JPH0348605B2
JPH0348605B2 JP26843084A JP26843084A JPH0348605B2 JP H0348605 B2 JPH0348605 B2 JP H0348605B2 JP 26843084 A JP26843084 A JP 26843084A JP 26843084 A JP26843084 A JP 26843084A JP H0348605 B2 JPH0348605 B2 JP H0348605B2
Authority
JP
Japan
Prior art keywords
conductive film
film
transparent conductive
transparent
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP26843084A
Other languages
Japanese (ja)
Other versions
JPS61146526A (en
Inventor
Junji Tanaka
Kyuichi Hirano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP26843084A priority Critical patent/JPS61146526A/en
Publication of JPS61146526A publication Critical patent/JPS61146526A/en
Publication of JPH0348605B2 publication Critical patent/JPH0348605B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は高分子に金属および/または金属酸化
物を主成分とする導電膜を付与した耐擦過傷性に
優れた透明導電性フイルム回路板の製造方法に関
するものである。
Detailed Description of the Invention [Industrial Field of Application] The present invention provides a transparent conductive film circuit board with excellent scratch resistance, in which a conductive film containing a metal and/or metal oxide as a main component is applied to a polymer. This relates to a manufacturing method.

[従来技術] 従来、透明導電フイルムは主にポリエステルフ
イルムをベースとし、エレクトロルミネツセンデ
イスプレイやエレクトロミツクデイスプレイの透
明電極、デイフロスタ、透明ヒータ等の面発熱体
やタツチパネル等の面スイツチ、赤外線反射膜、
及び透明フレキシブル回路等に広く用いられてき
たが、最近は液晶表示素子への適用も検討されて
いる。
[Prior art] Conventionally, transparent conductive films are mainly based on polyester films, and are used for transparent electrodes in electroluminescent displays and electromic displays, day frosters, surface heating elements such as transparent heaters, surface switches such as touch panels, infrared reflective films,
It has been widely used in transparent flexible circuits and the like, but recently, its application to liquid crystal display elements is also being considered.

透明導電性フイルムは、フイルム状の回路板電
極を使用することにより素子を薄型化できる点、
生産工程において取り扱い易く打ち抜き加工等も
可能である点、フイルム状素材から連続生産が可
能であり、コスト面でも有利になるという点等よ
り注目されている。
Transparent conductive films have the advantage of allowing devices to be made thinner by using film-shaped circuit board electrodes.
It is attracting attention because it is easy to handle in the production process, it can be punched out, etc., it can be continuously produced from a film-like material, and it is advantageous in terms of cost.

透明導電性フイルムの用途が拡大されてくるに
つれて、その要求性能も過酷なものが増大してき
た。
As the uses of transparent conductive films have expanded, the performance requirements have also become more severe.

特にタツチパネル等に使用するためには、耐擦
過傷性が非常に重要である。
Scratch resistance is very important, especially for use in touch panels and the like.

耐擦過傷性を向上させるためには、フイルム基
材の上に半無機ポリマー(珪素樹脂等)や有機化
合物等を形成させ、更にその上に導電性層を形成
させる方法(特開昭56−10450号公報)や、導電
性膜の上に硬質の有機化合物や有機化合物の層を
保護層として設けることが試みられて来たが透明
導電性フイルムはパターン加工し回路板としてか
ら使用することが通常である。
In order to improve the scratch resistance, a method is proposed in which semi-inorganic polymers (silicon resins, etc.), organic compounds, etc. are formed on the film base material, and a conductive layer is further formed thereon (Japanese Unexamined Patent Publication No. 56-10450). Although attempts have been made to provide a hard organic compound or organic compound layer as a protective layer on a conductive film, it is common practice to process a transparent conductive film into a pattern before using it as a circuit board. It is.

しかしながらこのような絶縁物を用いたトツプ
コートの場合、トツプコート層の厚みがある値以
上になると急激に接触抵抗が増大するため回路板
電極としての機能をはたさなくなる。
However, in the case of a top coat using such an insulator, when the thickness of the top coat layer exceeds a certain value, the contact resistance increases rapidly and the top coat no longer functions as a circuit board electrode.

一方当然のことながら耐擦過傷性を向上するた
めにはトツプコート層は厚い方がよい。
On the other hand, it goes without saying that in order to improve the scratch resistance, the top coat layer should be thicker.

そこで本出願者等は従来の発想を全く変え導電
性を有する塗料をトツプコート層としてを付与す
ることに着目した。
Therefore, the present applicants completely changed the conventional idea and focused on applying a conductive paint as a top coat layer.

[発明の目的] 本発明は、従来の方法では得られなかつた耐擦
過傷性に優れ、かつ透明性に優れた透明導電フイ
ルムを得んとして研究した結果、透明でかつ導電
性を有する塗料を導電膜上にトツプコートすれば
要求性能をすべて満足する透明導電性フイルムが
得られるとの知見を得、更にこの知見に基づき
種々研究を進めて本発明を完成するに致つたもの
である。
[Purpose of the Invention] The present invention was developed as a result of research aimed at obtaining a transparent conductive film with excellent abrasion resistance and transparency, which could not be obtained using conventional methods. It was discovered that a transparent conductive film that satisfies all required performances could be obtained by top-coating the film, and based on this knowledge, various studies were carried out and the present invention was completed.

[発明の構成] 本発明は導電性を有する透明な塗料をトツプコ
ートすることを特徴とする透明導電性フイルムの
製造方法である。
[Structure of the Invention] The present invention is a method for producing a transparent conductive film, which is characterized by top coating with a transparent paint having conductivity.

本発明に用いる高分子フイルムは、真空蒸着、
イオンプレーテイング又はスパツタ法等で導電性
膜を形成するために耐熱性のある高分子フイルム
が用いられ、ポリイミド、ポリアミドイミド、ポ
リアミド、ポリスルホン、ポリエーテルスルホ
ン、ポリエーテルケトンをはじめとしポリエステ
ル系樹脂、芳香族ポリアミド系樹脂等があげられ
る。
The polymer film used in the present invention can be produced by vacuum deposition,
Heat-resistant polymer films are used to form conductive films by ion plating or sputtering methods, and include polyester resins such as polyimide, polyamideimide, polyamide, polysulfone, polyethersulfone, and polyetherketone. Examples include aromatic polyamide resins.

もちろんこれ等はホモポリマー、コポリマーと
して単独又はブレンドして使用しても何等さしつ
かえはない。
Of course, these may be used alone or as a blend as homopolymers or copolymers.

又導電性膜素材である金属および/金属酸化物
としては、金、銀、ジルコニウム、インジウム、
スズ、チタン等や又は酸化スズ、酸化インジウ
ム、スズ−カドミウム酸化物等を使用することが
出来る。
Metals and/metal oxides that are conductive film materials include gold, silver, zirconium, indium,
Tin, titanium, etc. or tin oxide, indium oxide, tin-cadmium oxide, etc. can be used.

当然該導電性膜を高分子フイルムに付与するに
は、真空蒸着法、スパツタ法等の物理堆積法や化
学メツキ法、気相法等の化学堆積法で導電性膜を
付与しても何らさしつかえはない。
Naturally, in order to apply the conductive film to the polymer film, there is no problem in applying the conductive film by a physical deposition method such as vacuum evaporation method or sputtering method, or a chemical deposition method such as chemical plating method or vapor phase method. There isn't.

又これ等の導電性膜を高分子フイルムに付与す
るのに、その密着性等を向上させるために高分子
フイルムと導電性膜の間に第3層を形成させたも
のであつても何らさしさわりはなく、むしろ高分
子フイルムと導電性膜の密着性をあげるというこ
とは、その透明導電性フイルムの可撓性や加工性
を向上させるために望ましいものである。
Furthermore, when applying these conductive films to a polymer film, there is no problem even if a third layer is formed between the polymer film and the conductive film in order to improve the adhesion, etc. Rather, it is desirable to increase the adhesion between the polymer film and the conductive film in order to improve the flexibility and processability of the transparent conductive film.

高分子フイルムに導電性膜を付与し、その上に
トツプコートする。
A conductive film is applied to the polymer film and then top coated.

トツプコートとして用いる透明導電性塗料は、
フイラーとして導電性素材である金属および/又
は金属酸化物として金、銀、ジルコニウム、イン
ジウム、スズ、チタン等や又は酸化スズ、酸化イ
ンジウム、スズ−カドミウム酸化物等の粉末を用
いる。
The transparent conductive paint used as the top coat is
As the filler, a conductive material such as metal and/or metal oxide such as gold, silver, zirconium, indium, tin, titanium, etc., or powder of tin oxide, indium oxide, tin-cadmium oxide, etc. is used.

透明導電性塗料のバインダーとしてはアクリル
樹脂、スチレン樹脂、酢酸ビニル樹脂などの熱可
塑性樹脂を用いてもよいし、エポキシ樹脂、フエ
ノール樹脂などの熱硬化性樹脂を用いてもよい。
As a binder for the transparent conductive paint, a thermoplastic resin such as an acrylic resin, a styrene resin, or a vinyl acetate resin may be used, or a thermosetting resin such as an epoxy resin or a phenolic resin may be used.

もちろんこれらはホモポリマーとして用いても
よいしコポリマーとして用いても何らさしつかえ
ない。
Of course, these may be used as homopolymers or copolymers.

この導電性塗料を導電性膜上にコーテイングす
る。
This conductive paint is coated on the conductive film.

これは導電性膜をパターン加工する前でも後で
も何らさしつかえない。
This can be done either before or after patterning the conductive film.

尚、通常市販されている導電性塗料としては神
東塗料(株)のシントロン等があるが、単独で厚み
2μmにコーテイングした場合表面抵抗値が105
Ω/□、可視光の光線透過率が85%という性能を
有しているが、タツチパネル等の電極として用い
るには表面抵抗値が103Ω/□以下好ましくは102
Ω/□以下であることが必要であるためこれらの
市販の導電性塗料を単独で電極として用いること
は困難である。
Incidentally, there are commercially available conductive paints such as Shintron from Shinto Paint Co., Ltd., but the thickness
When coated with a thickness of 2 μm, the surface resistance value is 10 5
Ω/□, visible light transmittance of 85%, but the surface resistance value is preferably 10 3 Ω/□ or less for use as an electrode for touch panels , etc.
It is difficult to use these commercially available conductive paints alone as electrodes because it is necessary that the resistance is Ω/□ or less.

一方真空蒸着法、イオンプレーテイング法やス
パツタリング法で作製した導電性薄膜は透明性、
導電性は非常に優れているが耐擦過傷性に乏しく
タツチパネル用電極等には使用できないという欠
点を有している。
On the other hand, conductive thin films made by vacuum evaporation, ion plating, and sputtering are transparent and
Although it has very good conductivity, it has a drawback that it has poor scratch resistance and cannot be used as electrodes for touch panels.

これらの各々の欠点を相おぎない、従来考えら
れなかつた耐擦過傷性、透明性及び導電性に優れ
た積層導電フイルムが得られる。
It is possible to obtain a laminated conductive film which overcomes these drawbacks and has excellent scratch resistance, transparency and conductivity, which were hitherto unimaginable.

[発明の効果] 本発明は導電性膜上に、透明導電性塗料をコー
テイングしたものであり、絶縁物を用いてトツプ
コートしたものに比べて充分に厚い保護層を付与
し得ることにより従来得られなかつた耐擦過傷性
を持ち、かつ高透明性の透明導電性フイルムが得
られるものできわめて優れたものである。
[Effects of the Invention] The present invention coats a conductive film with a transparent conductive paint, and can provide a sufficiently thick protective layer compared to a top coat using an insulating material. This is an extremely excellent film that provides a transparent conductive film with excellent abrasion resistance and high transparency.

[実施例] 実施例 ポリエーテルスルホンフイルムを基板とし、真
空蒸着法にて厚さ300〓にインジウムを主成分と
した透明導電膜を形成した。
[Example] Example Using a polyether sulfone film as a substrate, a transparent conductive film containing indium as a main component was formed to a thickness of 300 mm by vacuum evaporation.

この透明導電性フイルムにパターン加工を施こ
し、これに導電性塗料(神東塗料(株)製シントロン
C−4423)を2μmになるようにコーテイングし
た。
This transparent conductive film was patterned and coated with conductive paint (Cintron C-4423, manufactured by Shinto Paint Co., Ltd.) to a thickness of 2 μm.

このようにして作製した透明導電性フイルムは
シート抵抗310Ω/□、可視光の透過率81%であ
つた。
The transparent conductive film thus produced had a sheet resistance of 310Ω/□ and a visible light transmittance of 81%.

また、100g/cm2の荷重をかけたガーゼで10万
回摩擦したが抵抗値の変化はまつたく見られなか
つた。
In addition, no change in resistance value was observed even after rubbing 100,000 times with gauze under a load of 100 g/cm 2 .

比較例 実施例と同一の条件で導電膜を形成し、トツプ
コートを形成しなかつた。
Comparative Example A conductive film was formed under the same conditions as in the example, but no top coat was formed.

シート抵抗値は300Ω/□、可視光の透過率は
83%であつた。
Sheet resistance value is 300Ω/□, visible light transmittance is
It was 83%.

また100g/cm2の荷重をかけたガーゼで5千回
摩擦すると、シート抵抗値が10KΩ/□になり、
耐擦過傷性が不良であつた。
Furthermore, when rubbed 5,000 times with gauze with a load of 100g/ cm2 , the sheet resistance value becomes 10KΩ/□.
Scratch resistance was poor.

以上の理由で本発明の透明導電性フイルムは優
れたものであつた。
For the above reasons, the transparent conductive film of the present invention was excellent.

Claims (1)

【特許請求の範囲】[Claims] 1 高分子フイルムに真空蒸着法、イオンプレー
テイング法、あるいはスパツタリング法にて金属
および/または金属酸化物の薄膜を導電層として
形成し、更に導電性を有する塗料をトツプコート
層としてを形成することを特徴とする透明導電フ
イルムの製造方法。
1 Forming a thin film of metal and/or metal oxide as a conductive layer on a polymer film by vacuum evaporation, ion plating, or sputtering, and further forming a conductive paint as a top coat layer. A method for manufacturing a transparent conductive film.
JP26843084A 1984-12-21 1984-12-21 Preparation of laminated conductive film Granted JPS61146526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26843084A JPS61146526A (en) 1984-12-21 1984-12-21 Preparation of laminated conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26843084A JPS61146526A (en) 1984-12-21 1984-12-21 Preparation of laminated conductive film

Publications (2)

Publication Number Publication Date
JPS61146526A JPS61146526A (en) 1986-07-04
JPH0348605B2 true JPH0348605B2 (en) 1991-07-25

Family

ID=17458379

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26843084A Granted JPS61146526A (en) 1984-12-21 1984-12-21 Preparation of laminated conductive film

Country Status (1)

Country Link
JP (1) JPS61146526A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008088059A1 (en) 2007-01-16 2008-07-24 Teijin Limited Transparent conductive multilayer body and touch panel made of the same
WO2009054464A1 (en) 2007-10-26 2009-04-30 Teijin Limited Transparent conductive laminate and transparent touch panel

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009057637A1 (en) * 2007-10-31 2009-05-07 Sumitomo Metal Mining Co., Ltd. Flexible transparent conductive film and flexible functional device using same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008088059A1 (en) 2007-01-16 2008-07-24 Teijin Limited Transparent conductive multilayer body and touch panel made of the same
WO2009054464A1 (en) 2007-10-26 2009-04-30 Teijin Limited Transparent conductive laminate and transparent touch panel
KR20100075550A (en) 2007-10-26 2010-07-02 데이진 가부시키가이샤 Transparent conductive laminate and transparent touch panel

Also Published As

Publication number Publication date
JPS61146526A (en) 1986-07-04

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