Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0351782B2 - - Google Patents
[go: Go Back, main page]

JPH0351782B2 - - Google Patents

Info

Publication number
JPH0351782B2
JPH0351782B2 JP58132796A JP13279683A JPH0351782B2 JP H0351782 B2 JPH0351782 B2 JP H0351782B2 JP 58132796 A JP58132796 A JP 58132796A JP 13279683 A JP13279683 A JP 13279683A JP H0351782 B2 JPH0351782 B2 JP H0351782B2
Authority
JP
Japan
Prior art keywords
weight
less
iron
lead frame
based alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58132796A
Other languages
Japanese (ja)
Other versions
JPS6026642A (en
Inventor
Susumu Kawauchi
Masaharu Tazaki
Original Assignee
Nippon Mining Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co filed Critical Nippon Mining Co
Priority to JP13279683A priority Critical patent/JPS6026642A/en
Publication of JPS6026642A publication Critical patent/JPS6026642A/en
Publication of JPH0351782B2 publication Critical patent/JPH0351782B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、すぐれた機械的強度、耐食性、低熱
膨張係数、メツキ密着性等を有する電子機器用部
材、特に半導体用セラミツク又は樹脂封着リード
フレーム材として好適なクロムもしくはこれにニ
ツケルを含有する鉄基合金に関するものである。 従来、リードフレーム材としてはコバール合金
(Fe−29Ni−16Co)、42アロイ(Fe−42Ni)など
の高ニツケル合金やりん青銅のような合金がよく
知られている。 リードフレームは半導体IC回路チツプを支持
し、これを装置内に安定的に保持する必要上、良
好な機械的強度を有することが極めて重要であ
る。前記の既知の合金はこれらの性質を一応保有
しているが、前者の高ニツケル合金は硬く延性に
劣り、リードフレーム材を製造する際、正確な厚
みに圧延加工することが難しいという欠点があ
り、また後者のりん青銅は熱膨張が大きく、セラ
ミツク等の密封カプセルとした場合に、製作途中
または使用中の熱応力によつて、リードフレーム
とカプセルとの間の密封が破壊するおそれがあつ
た。しかもこれらの合金はいずれも価格が著しく
高く、半導体IC回路を低価格に製造しようとす
る現在のすう勢からして利用が制限される。 このようなことから本発明者は、安価で良好な
機械的性質を有し、加工性も良好でかつ低熱膨張
係数をもつクロムもしくはこれにニツケルを含有
する鉄基合金をリードフレーム材とすることを想
案した。 しかしながら一般にリードフレーム材には電気
的接続を与えるために金又は銀メツキが施される
が、前記クロムもしくはニツケルを含有する鉄基
合金に施した銀メツキ層の密着性が悪く、半導体
集積回路装置の組立工程においてはワイヤボンデ
イング、シーリング等の加熱によりメツキ層にフ
クレが生じて剥離するという問題が生じることが
分つた。このフクレの原因は必ずしも明らかでな
いが、鉄基合金のリードフレーム材の表面に形成
されたクロムカーバイドの周辺が電気化学的に腐
食され易くなり、その結果微少な腐食溝が形成さ
れ、そしてこの溝中にリードフレームの処理工程
中の汚れが残存し、その後メツキを施したリード
フレーム材を添加した時に、前記溝中の残存物が
膨張してメツキ層のフクレの原因となると考えら
れる。また鉄基合金中の酸素が粒界に多く析出す
る傾向があり、このような炭素はメツキ密着性を
低下させる。いずれにしてもクロム含有鉄基合金
は材料の強度、低熱膨張性、安価である点を考慮
してもリードフレーム材としてそのまま用いるこ
とは好ましいものではなかつた。 本発明者はこの点の鋭意研究の結果、クロムも
しくはこれにニツケルを含有する鉄基合金の炭素
量を0.05重量%以下、好ましくは0.03重量%以下
とすることにより、前記のメツキ層のフクレの現
象を著しく減少させることができた。 すなわち本発明は0.05重量%以下、より好まし
くは0.03重量%以下の炭素および10.5重量%を超
え20重量%以下のクロムもしくはこれに1重量%
以上15重量%以下のニツケルを含有するリードフ
レーム用鉄基合金が優れたメツキ性を有すること
を見出したものである。 これにより本発明のリードフレーム用鉄基合金
は、良好な機械的強度、耐食性を有し、加工性が
良好で、低熱膨張であり、しかもメツキ密着にす
ぐれ、かつ安価である特徴を有するものである。 本発明のリードフレーム材に用いる鉄基合金に
おいて、クロムの含有量は10.5重量%を超え20重
量%以下とする必要がある。クロム10.5重量%以
下では十分な強度と耐食性が得られず、また20重
量%を超えると耐熱強度が得られず、耐食性が劣
るためである。又さらに添加されるニツケルは1
重量%以上15重量%以下とする。このニツケルは
単独では用いず、クロムと併せて使用するが、耐
熱性、耐腐食性を改善する目的で使用する。炭素
量は0.05重量%以下、好ましくは0.03重量%以下
とする。炭素量が0.05重量%を超えるとメツキの
フクレが多発し、メツキ密着性が悪化する。そし
て0.03重量%以下では殆んどメツキのフクレが発
生しない。 この他合金に含有されるマグネシウム、珪素、
モリブデン、燐、硫黄、アルミニウム、銅などの
付加的元素又は不純物は総計1重量%以下とす
る。次に実施例について説明する。 実施例 第1表に示される各成分組成の試料片(25mm×
50mm×0.25mm(厚))を次の如く処理して評価に
供した。 各試料片をまずアセトン超音波脱脂処理したの
ち、アルカリ脱脂処理し、次いでアルカリ電解脱
脂酸洗処理した後、銀メツチを2.5μm施した。メ
ツキ性の評価方法としては、集積回路組立作業に
おけるワイヤボンデイング時の加熱条件と類似す
る条件として、大気中で450℃5分間加熱し、銀
メツキ面1cm2あたりに発生したフクレの数を調べ
た。 第1表において試料番号3〜5、8〜10及び13
〜17はいずれも炭素の量が本発明の範囲を超える
ものであり、炭素量の上昇に伴つてメツキ層のフ
クレが急増している。 これに反し、本発明合金の範囲にある試料番号
1〜2、6〜7及び11〜12はフクレ数がゼロか又
は極めて少数でリードフレーク材として十分使用
に耐えるものである。 以上より本発明合金は機械的強度、耐熱性、耐
食性等に富み、しかも上記のようにメツキのフク
レがなく優れたメツキ性を有することが分る。
The present invention is directed to materials for electronic devices having excellent mechanical strength, corrosion resistance, low coefficient of thermal expansion, plating adhesion, etc., especially iron containing chromium or nickel, which is suitable as ceramic for semiconductors or resin-sealed lead frame material. It concerns base alloys. Conventionally, high nickel alloys such as Kovar alloy (Fe-29Ni-16Co) and 42 alloy (Fe-42Ni) and alloys such as phosphor bronze are well known as lead frame materials. The lead frame supports the semiconductor IC circuit chip and is required to stably hold it within the device, so it is extremely important that the lead frame has good mechanical strength. Although the above-mentioned known alloys possess these properties, the former high nickel alloy is hard and has poor ductility, and has the disadvantage that it is difficult to roll it to an accurate thickness when manufacturing lead frame materials. In addition, the latter phosphor bronze has a large thermal expansion, and if it is made into a sealed capsule made of ceramic or the like, there is a risk that the seal between the lead frame and the capsule will break due to thermal stress during manufacturing or use. . Moreover, all of these alloys are extremely expensive, limiting their use in light of the current drive to manufacture semiconductor IC circuits at low cost. For this reason, the present inventor has decided to use an iron-based alloy containing chromium or nickel as the lead frame material, which is inexpensive, has good mechanical properties, good workability, and has a low coefficient of thermal expansion. I devised a. However, lead frame materials are generally plated with gold or silver to provide electrical connection, but the adhesion of the silver plating layer applied to the iron-based alloy containing chromium or nickel is poor, resulting in poor adhesion to semiconductor integrated circuit devices. It has been found that during the assembly process, the plating layer blisters and peels off due to heating during wire bonding, sealing, etc. The cause of this blistering is not necessarily clear, but the area around the chromium carbide formed on the surface of the iron-based alloy lead frame material is susceptible to electrochemical corrosion, resulting in the formation of minute corrosion grooves. It is thought that dirt from the processing of the lead frame remains in the groove, and when the plated lead frame material is added afterwards, the residue in the groove expands and causes blistering of the plated layer. Further, oxygen in iron-based alloys tends to precipitate in large amounts at grain boundaries, and such carbon reduces plating adhesion. In any case, it is not preferable to use the chromium-containing iron-based alloy as a lead frame material as it is, even considering the material's strength, low thermal expansion, and low cost. As a result of intensive research on this point, the inventor of the present invention has found that by controlling the carbon content of the iron-based alloy containing chromium or nickel to 0.05% by weight or less, preferably 0.03% by weight or less, the blistering of the plating layer can be prevented. We were able to significantly reduce the phenomenon. That is, the present invention contains carbon of 0.05% by weight or less, more preferably 0.03% by weight or less, and chromium of more than 10.5% by weight and less than 20% by weight, or 1% by weight thereof.
It has been found that an iron-based alloy for lead frames containing 15% by weight or less of nickel has excellent plating properties. As a result, the iron-based alloy for lead frames of the present invention has the characteristics of having good mechanical strength, corrosion resistance, good workability, low thermal expansion, excellent plating adhesion, and low cost. be. In the iron-based alloy used for the lead frame material of the present invention, the chromium content must be more than 10.5% by weight and less than 20% by weight. This is because if chromium is less than 10.5% by weight, sufficient strength and corrosion resistance cannot be obtained, and if it exceeds 20% by weight, heat-resistant strength cannot be obtained and corrosion resistance is poor. Furthermore, the amount of nickel added is 1
% by weight or more and 15% by weight or less. Nickel is not used alone, but in combination with chromium, for the purpose of improving heat resistance and corrosion resistance. The carbon content is 0.05% by weight or less, preferably 0.03% by weight or less. If the carbon content exceeds 0.05% by weight, blistering of plating occurs frequently and adhesion of plating deteriorates. At 0.03% by weight or less, almost no blisters occur. In addition, magnesium, silicon,
The total amount of additional elements or impurities such as molybdenum, phosphorus, sulfur, aluminum, copper, etc. is 1% by weight or less. Next, an example will be described. Example Sample piece of each component composition shown in Table 1 (25mm x
50 mm x 0.25 mm (thickness)) was processed as follows and subjected to evaluation. Each sample piece was first subjected to acetone ultrasonic degreasing treatment, followed by alkaline degreasing treatment, then alkaline electrolytic degreasing treatment and pickling treatment, followed by silver meshing of 2.5 μm. To evaluate the plating quality, we heated the silver plated surface at 450°C for 5 minutes under conditions similar to the heating conditions used during wire bonding in integrated circuit assembly work, and measured the number of blisters that occurred per 1 cm 2 of the silver plated surface. . Sample numbers 3-5, 8-10 and 13 in Table 1
All of Samples 1 to 17 have a carbon content exceeding the range of the present invention, and as the carbon content increases, the number of blisters in the plating layer increases rapidly. On the contrary, sample numbers 1 to 2, 6 to 7, and 11 to 12, which fall within the scope of the alloy of the present invention, had zero or very few blisters and were sufficiently usable as lead flake materials. From the above, it can be seen that the alloy of the present invention is rich in mechanical strength, heat resistance, corrosion resistance, etc., and has excellent plating properties without blistering as described above.

【表】【table】

【表】【table】

Claims (1)

【特許請求の範囲】 1 クロム10.5重量%を超え20重量%以下、炭素
0.05重量%以下、残部鉄及び不可避的不純物から
なるリードフレーム用鉄基合金。 2 炭素0.03重量%以下である特許請求の範囲第
1項記載のリードフレーム用鉄基合金。 3 クロム10.5重量%を超え20重量%以下、ニツ
ケル1重量%以上15重量%以下、炭素0.05重量%
以下、残部鉄及び不可避的不純物からなるリード
フレーム用鉄基合金。 4 炭素0.03重量%以下である特許請求の範囲第
3項記載のリードフレーム用鉄基合金。
[Claims] 1 More than 10.5% by weight of chromium and not more than 20% by weight, carbon
Iron-based alloy for lead frames consisting of 0.05% by weight or less, the balance being iron and unavoidable impurities. 2. The iron-based alloy for lead frames according to claim 1, which contains 0.03% by weight or less of carbon. 3 More than 10.5% by weight and less than 20% by weight of chromium, 1% by weight and less than 15% by weight of nickel, 0.05% by weight of carbon
The following is an iron-based alloy for lead frames consisting of the balance iron and unavoidable impurities. 4. The iron-based alloy for lead frames according to claim 3, which contains 0.03% by weight or less of carbon.
JP13279683A 1983-07-22 1983-07-22 Iron alloy for lead frame Granted JPS6026642A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13279683A JPS6026642A (en) 1983-07-22 1983-07-22 Iron alloy for lead frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13279683A JPS6026642A (en) 1983-07-22 1983-07-22 Iron alloy for lead frame

Publications (2)

Publication Number Publication Date
JPS6026642A JPS6026642A (en) 1985-02-09
JPH0351782B2 true JPH0351782B2 (en) 1991-08-07

Family

ID=15089759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13279683A Granted JPS6026642A (en) 1983-07-22 1983-07-22 Iron alloy for lead frame

Country Status (1)

Country Link
JP (1) JPS6026642A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2702061B2 (en) * 1993-09-03 1998-01-21 ユニタック株式会社 Drill head

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599149A (en) * 1982-07-07 1984-01-18 Daido Steel Co Ltd Material for lead frame

Also Published As

Publication number Publication date
JPS6026642A (en) 1985-02-09

Similar Documents

Publication Publication Date Title
JPS6250425A (en) Copper alloy for electronic appliance
JPS60245754A (en) High strength copper alloy having high electric conductivity
JPS60245753A (en) High strength copper alloy having high electric conductivity
JPS61183426A (en) High strength, highly conductive heat resisting copper alloy
JPS6045698B2 (en) Lead material for semiconductor equipment
JPS6314056B2 (en)
EP0158509B1 (en) Lead materials for semiconductor devices
JPS6365039A (en) Copper alloy for electronic and electrical equipment
JPS6158536B2 (en)
JPS60245752A (en) High strength copper alloy having high electric conductivity
JPS6256937B2 (en)
JPS6046340A (en) Copper alloy for lead frame
JPH0351782B2 (en)
JPS594493B2 (en) Copper alloy for lead material of semiconductor equipment
JPS6250426A (en) Copper alloy for electronic appliance
JPS6250428A (en) Copper alloy for electronic appliance
JPS6140290B2 (en)
JPS6393835A (en) Copper alloy for lead material of semiconductor equipment
JPH06184666A (en) High strength and high electric conductivity copper alloy
JPS58147140A (en) Lead wire of semiconductor device
JPS63192835A (en) Lead material for ceramic package
JPS6157379B2 (en)
JPH06235035A (en) High tensile strength and high conductivity copper alloy
JPS60218442A (en) Copper alloy for lead frame
JPS59140342A (en) Copper alloy for lead frame