JPH0352543B2 - - Google Patents
Info
- Publication number
- JPH0352543B2 JPH0352543B2 JP16823884A JP16823884A JPH0352543B2 JP H0352543 B2 JPH0352543 B2 JP H0352543B2 JP 16823884 A JP16823884 A JP 16823884A JP 16823884 A JP16823884 A JP 16823884A JP H0352543 B2 JPH0352543 B2 JP H0352543B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- chemical conversion
- phosphate
- metal member
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 84
- 239000010949 copper Substances 0.000 claims description 84
- 229910052802 copper Inorganic materials 0.000 claims description 79
- 239000000126 substance Substances 0.000 claims description 64
- 229910052751 metal Inorganic materials 0.000 claims description 45
- 239000002184 metal Substances 0.000 claims description 45
- 238000006243 chemical reaction Methods 0.000 claims description 43
- 238000007739 conversion coating Methods 0.000 claims description 28
- 239000010953 base metal Substances 0.000 claims description 20
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 18
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 16
- 229910019142 PO4 Inorganic materials 0.000 claims description 11
- -1 copper halide Chemical class 0.000 claims description 11
- 239000010452 phosphate Substances 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 229910021591 Copper(I) chloride Inorganic materials 0.000 claims description 7
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 claims description 7
- 229940045803 cuprous chloride Drugs 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 229910021589 Copper(I) bromide Inorganic materials 0.000 claims 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 claims 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 claims 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 claims 1
- 238000000034 method Methods 0.000 description 12
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 11
- 229940077935 zinc phosphate Drugs 0.000 description 11
- 229910000165 zinc phosphate Inorganic materials 0.000 description 11
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 9
- 230000015556 catabolic process Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 229910021645 metal ion Inorganic materials 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000007800 oxidant agent Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000010273 cold forging Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000635 electron micrograph Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000000344 soap Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229960004643 cupric oxide Drugs 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000005246 galvanizing Methods 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229940085991 phosphate ion Drugs 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical class OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 238000010349 cathodic reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 229940077449 dichromate ion Drugs 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- AXZAYXJCENRGIM-UHFFFAOYSA-J dipotassium;tetrabromoplatinum(2-) Chemical compound [K+].[K+].[Br-].[Br-].[Br-].[Br-].[Pt+2] AXZAYXJCENRGIM-UHFFFAOYSA-J 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012772 electrical insulation material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- CPSYWNLKRDURMG-UHFFFAOYSA-L hydron;manganese(2+);phosphate Chemical compound [Mn+2].OP([O-])([O-])=O CPSYWNLKRDURMG-UHFFFAOYSA-L 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910000398 iron phosphate Inorganic materials 0.000 description 1
- WBJZTOZJJYAKHQ-UHFFFAOYSA-K iron(3+) phosphate Chemical compound [Fe+3].[O-]P([O-])([O-])=O WBJZTOZJJYAKHQ-UHFFFAOYSA-K 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 229940005654 nitrite ion Drugs 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000004968 peroxymonosulfuric acids Chemical class 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- 229910001487 potassium perchlorate Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- RYYKJJJTJZKILX-UHFFFAOYSA-M sodium octadecanoate Chemical compound [Na+].CCCCCCCCCCCCCCCCCC([O-])=O RYYKJJJTJZKILX-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- SPDJAIKMJHJYAV-UHFFFAOYSA-H trizinc;diphosphate;tetrahydrate Chemical compound O.O.O.O.[Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O SPDJAIKMJHJYAV-UHFFFAOYSA-H 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229940077934 zinc phosphate tetrahydrate Drugs 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
- C23C22/10—Orthophosphates containing oxidants
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Treatment Of Metals (AREA)
Description
[産業上の利用分野]
本発明は燐酸亜鉛等の燐酸塩系化成皮膜を有す
る銅系金属部材に関し、詳しくは、防錆性能、電
気絶縁性能及びプレス加工時の潤滑性能等に優れ
た銅系金属部材に関するもので、銅電線等に利用
することにより大きな効果が期待されるものであ
る。
[従来の技術]
従来鉄系材料においては、その表面に燐酸亜鉛
系、又はクロム酸亜鉛系等の化成処理を施したも
のが知られている。化成処理された鉄系材料はそ
の優れた性能により様々な分野で利用されてい
る。一方銅系金属部材においては、銅自体が化学
的に安定な金属である為、鉄系材料になされる上
記のような化成処理を行なうことは従来困難であ
つた。他の方法として塩素酸カリウム又は過塩素
酸カリウムの水溶液中にて80〜90℃で5〜10分処
理して得られる酸化第一銅皮膜を有する銅系金属
部材、又は水酸化ナトリウムと過硫酸カリウムを
含む水溶液中にて100℃以上で3〜10分処理して
得られる酸化第二銅系皮膜を有する銅系金属部材
が知られている。また燐酸塩皮膜が必要とされる
場合は銅系金属全体に亜鉛メツキ等を施した後燐
酸塩処理を行なつていた。
[発明が解決しようとする問題点]
従来の酸化銅系皮膜を有する銅系金属部材は、
その皮膜が鉄系材料に施される化成皮膜と比較す
ると反応性が乏しいために塗装しても希望の性能
が得られなかつた。また化成処理方法の煩わしさ
もあつて極めて限られた分野でのみ利用されてい
る状況である。
また、燐酸塩皮膜は反応性に富み好ましいもの
であるが、銅系基体金属に形成するためには予じ
め亜鉛メツキ等を施しておかねばならず、作業能
率及びコスト面等に問題があつた。
本発明者は上記問題点に鑑み、鋭意研究の結
果、銅系基体金属表面に燐酸塩系の化成皮膜を形
成させる方法を発見した。すなわち本発明は上記
発見に基づいた化成皮膜を有する銅系金属部材を
提供することを目的とする。
[問題点を解決するための手段]
本発明の銅系金属部材は、銅系基体金属と、該
銅系基体金属の少なくとも一部表面に形成された
燐酸塩及びハロゲナン化銅から成る化成皮膜とか
ら構成されることを特徴とするものである。
本発明にいう銅系基体金属には銅又は銅合金が
使用される。その形状には特に制限は無く板状、
棒状、或いは線状等の単純形状のものから成形体
の如き複雑な形状のもの迄、ほとんど全ての形状
のものが使用できる。
本発明にいう化成皮膜は、燐酸亜鉛、燐酸マン
ガン、燐酸鉄、及び燐酸カルシウムのうち少なく
とも一つの燐酸塩と、塩化銅、臭化銅及び沃化銅
のうち少なくとも一つのハロゲン化銅とから構成
される。なおハロゲン化銅は溶解度積の小さなハ
ロゲン化第一銅であることが望ましい。
上記化成皮膜は、燐酸イオン、金属イオン、ハ
ロゲンイオン等を含む化成処理浴を浸漬法、スプ
レー法等で上記銅系基体金属に接触させ、20〜30
℃の常温で銅と反応せしめて形成されるものであ
る。この化成皮膜は結晶状でもアモルフアス状で
もよい。また皮膜の厚さは要求性能に応じて変え
ることができるが、2μ〜30μが性能のバランスが
とれて好ましい。
上記化成皮膜は上記銅系基体金属の表面全体に
形成されていてもよいし、一部分のみに形成され
ていてもよい。例えば銅管の内面のみに形成され
ていてもよく、溝部又は穴部を有する銅系基体金
属の溝部又は穴部のみに形成されていてもよい。
なお第1図に本発明の銅系金属部材の模式図を示
す。これは化成皮膜2は銅系基体金属1の表面に
直接形成されていることを表している。
本発明の銅系金属部材の最大の特色は上記化成
皮膜を有しているところにある。以下にその化成
皮膜を形成する為の処理浴の組成及び皮膜形成機
構を説明する。
化成処理浴には燐酸イオンと、金属イオンと、
ハロゲンイオン及び酸化剤が含まれる。この化成
処理浴に含まれる金属イオンとしては、鉄鋼表面
の化成処理の場合と同様に、亜鉛、マンガン、
鉄、カルシウム等の、水溶液中で安定な燐酸2水
素化合物として存在し、次式(1)に示す脱水素反応
により、大きな溶解度の減少がみられる金属イオ
ンが使用できる。
xM(H2PO4)y→Mx(PO4)y+2yH+ ……(1)
ハロゲンイオンとしては、該ハロゲンの銅塩
の、溶解度積が充分に小さいものについて使用可
能であり、塩素、臭素、及び沃素が使用できる。
弗素は電気陰性度が酸素より大きく、電気陰性度
が酸素より小さい他のハロゲンとは水溶液中での
挙動が明らかに異なるため使用が困難である。
酸化剤として(4)式、又は(5)式に見られるよう
な、酸性溶液中で、銅の溶解を促進し、それ自体
は還元反応を行なう過酸化水素、亜硝酸イオン、
重クロム酸イオン等が使用できる。
上記の化成処理浴に銅系基体金属が接触するこ
とにより、該銅系基体金属表面に化成皮膜が形成
されるのであるが、その過程を順を追つて説明す
る。
上記化成処理浴に接触した銅系基体金属表面で
は、アノード反応(金属の溶解度の酸化反応)
と、カソード反応とが同時に起つている。まず銅
の溶解反応であるが、次式(2)、(3)のアノード反
応、及び次式(4)、(5)の酸化剤によるカソード反応
が起り、(4)式又は(5)式の電極電位が(2)式、及び(3)
式の電極電位より高いために、銅が化成処理浴中
に溶解するものと考えられる。
Cu→Cu++e ……(2)
Cu+→Cu2++e ……(3)
H2O2+2H++2e→2H2O ……(4)
NO2 -+2H++e→H2O+NO↑ ……(5)
すなわち、化成処理浴の酸性溶液中で酸化剤が
(4)式、(5)式のごとく反応して電子eを消費する
為、(2)式、(3)式の反応が進み、銅が溶解する。
次に皮膜形成反応であるが、金属イオンとして
亜鉛を用い、ハロゲンイオンとして塩素を用いた
場合を例にとると、銅系基体金属の表面の極く近
くにおいて(6)式のアノード反応、及び(7)式のカソ
ード反応が起り、溶解度積の小さな燐酸亜鉛と塩
化第一銅のコロイド粒子が生成し、それが銅系基
体金属表面に凝析して皮膜を形成するも
[Industrial Application Field] The present invention relates to a copper-based metal member having a phosphate-based chemical conversion coating such as zinc phosphate. It relates to metal members, and is expected to have great effects when used in copper electric wires, etc. [Prior Art] Conventional iron-based materials have been known to have their surfaces subjected to chemical conversion treatment such as zinc phosphate or zinc chromate. Chemically treated iron-based materials are used in various fields due to their excellent performance. On the other hand, in the case of copper-based metal members, since copper itself is a chemically stable metal, it has conventionally been difficult to perform the above-mentioned chemical conversion treatment applied to iron-based materials. Other methods include copper-based metal parts with a cuprous oxide film obtained by treatment in an aqueous solution of potassium chlorate or potassium perchlorate at 80 to 90°C for 5 to 10 minutes, or sodium hydroxide and persulfuric acid. Copper-based metal members having a cupric oxide-based film obtained by processing in an aqueous solution containing potassium at 100° C. or higher for 3 to 10 minutes are known. When a phosphate film was required, the entire copper metal was galvanized and then phosphated. [Problems to be solved by the invention] A conventional copper-based metal member having a copper oxide-based film has the following problems:
Because the coating has poor reactivity compared to chemical conversion coatings applied to iron-based materials, the desired performance could not be obtained even after coating. Furthermore, the chemical conversion treatment method is troublesome and is currently used only in extremely limited fields. In addition, although phosphate films are highly reactive and desirable, in order to form them on copper-based base metals, zinc plating, etc. must be applied in advance, which poses problems in terms of work efficiency and cost. Ta. In view of the above-mentioned problems, the inventors of the present invention conducted extensive research and discovered a method for forming a phosphate-based chemical conversion film on the surface of a copper-based base metal. That is, an object of the present invention is to provide a copper-based metal member having a chemical conversion film based on the above discovery. [Means for Solving the Problems] The copper-based metal member of the present invention comprises a copper-based base metal, and a chemical conversion coating formed on at least a portion of the surface of the copper-based base metal, comprising a phosphate and a copper halide. It is characterized by consisting of: Copper or a copper alloy is used as the copper-based base metal in the present invention. There are no particular restrictions on its shape; it can be plate-shaped,
Almost any shape can be used, from simple shapes such as rods or lines to complex shapes such as molded bodies. The chemical conversion film referred to in the present invention is composed of at least one phosphate selected from zinc phosphate, manganese phosphate, iron phosphate, and calcium phosphate, and at least one copper halide selected from copper chloride, copper bromide, and copper iodide. be done. Note that the copper halide is preferably cuprous halide, which has a small solubility product. The above chemical conversion film is produced by contacting the above copper base metal with a chemical conversion treatment bath containing phosphate ions, metal ions, halogen ions, etc. by a dipping method, a spray method, etc.
It is formed by reacting with copper at room temperature (°C). This chemical conversion film may be crystalline or amorphous. Further, the thickness of the film can be changed depending on the required performance, but it is preferably 2μ to 30μ because the performance is well balanced. The chemical conversion film may be formed on the entire surface of the copper base metal, or may be formed only on a portion of the surface. For example, it may be formed only on the inner surface of a copper tube, or it may be formed only on a groove or hole of a copper base metal having a groove or hole.
Note that FIG. 1 shows a schematic diagram of the copper-based metal member of the present invention. This indicates that the chemical conversion film 2 is directly formed on the surface of the copper base metal 1. The most distinctive feature of the copper-based metal member of the present invention is that it has the above-mentioned chemical conversion coating. The composition of the treatment bath for forming the chemical conversion film and the film forming mechanism will be explained below. The chemical conversion bath contains phosphate ions, metal ions,
Contains halogen ions and oxidizing agents. The metal ions contained in this chemical conversion treatment bath include zinc, manganese,
Metal ions, such as iron and calcium, which exist as stable dihydrogen phosphate compounds in aqueous solutions and whose solubility is significantly reduced by the dehydrogenation reaction shown in the following formula (1) can be used. xM( H2PO4 )y→Mx( PO4 )y+2yH + ...(1) As the halogen ion, copper salts of the halogen with sufficiently small solubility products can be used, including chlorine, bromine, and iodine can be used.
Fluorine is difficult to use because its electronegativity is larger than that of oxygen, and its behavior in aqueous solutions is clearly different from that of other halogens, which have smaller electronegativity than oxygen. As an oxidizing agent, hydrogen peroxide, nitrite ion, which promotes the dissolution of copper in an acidic solution and itself performs a reduction reaction, as shown in formula (4) or formula (5).
Dichromate ion etc. can be used. When the copper base metal comes into contact with the above chemical conversion treatment bath, a chemical conversion film is formed on the surface of the copper base metal, and the process will be explained step by step. On the surface of the copper base metal that comes into contact with the above chemical conversion treatment bath, an anode reaction (oxidation reaction of metal solubility)
and a cathode reaction are occurring at the same time. First, the dissolution reaction of copper occurs, and the anode reaction of the following formulas (2) and (3) and the cathode reaction by the oxidizing agent of the following formulas (4) and (5) occur, and the following formulas (4) and (5) occur. The electrode potential of is expressed by equation (2) and (3)
It is thought that copper dissolves in the chemical conversion treatment bath because the electrode potential is higher than that of the formula. Cu→Cu + +e ...(2) Cu + →Cu 2+ +e ...(3) H 2 O 2 +2H + +2e→2H 2 O ...(4) NO 2 - +2H + +e→H 2 O+NO↑ ... …(5) In other words, the oxidizing agent in the acidic solution of the chemical conversion treatment bath
Since the reactions in equations (4) and (5) consume electrons e, the reactions in equations (2) and (3) proceed, and copper dissolves. Next, regarding the film forming reaction, taking as an example the case where zinc is used as the metal ion and chlorine is used as the halogen ion, the anodic reaction of formula (6) occurs very close to the surface of the copper base metal, and The cathodic reaction of equation (7) occurs, and colloidal particles of zinc phosphate and cuprous chloride, which have a small solubility product, are generated, which coagulate on the surface of the copper base metal to form a film.
【表】
のと考えられる。
3Zn2 ++2H2PO4 -
→Zn3(PO4)2↓+4H+ ……(6)
Cu2 ++Cl-+e→CuCl↓ ……(7)
次に実際に形成した化成皮膜の分析結果に基づ
いてこの化成皮膜の構成を説明する。
分析にはA、B、C、Dの4種類の化成皮膜を
供した。第1表にその化成処理浴の組成を示す。
この場合金属イオンとして亜鉛イオンを、ハロゲ
ンイオンとして塩素イオンを使用し、酸化剤とし
て35%過酸化水素水を使用している。化成皮膜A
及びBは銅系基体金属として銅板を使用し、第1
票の組成の処理浴がはいつているビーカー内にそ
の銅板を浸漬して25℃で3分間処理し、水洗後乾
燥して形成されたものである。第2図及び第3図
にこの化成皮膜A及び化成皮膜Bの電子顕微鏡写
真図(倍率×1500、撮影角度45度)を示す。写真
図より、微細な結晶が表面を覆つているのが観察
されるが、この結晶1つの大きさは従来の鉄表面
に形成された燐酸亜鉛化成皮膜の結晶に比べ約1/
3〜1/5であり、かなり緻密である。
化成皮膜C及びDは、銅系基体金属として後述
の実施例2に使用したリング状銅部品を使用し、
実施例2と同様の実際の連続化成処理装置にて形
成されたものである。第4図及び第5図にこの化
成皮膜C及び化成皮膜Dの電子顕微鏡写真図(倍
率×1500、撮影角度45度)を示す。第4図、第5
図では第2図、第3図の様に、明らかに結晶と判
別できるものは見られない。[Table] 3Zn 2 + +2H 2 PO 4 - →Zn 3 (PO 4 ) 2 ↓+4H + ...(6) Cu 2 + +Cl - +e→CuCl↓ ...(7) Next, the analysis results of the chemical conversion film actually formed Based on this, the structure of this chemical conversion coating will be explained. Four types of chemical conversion coatings, A, B, C, and D, were used in the analysis. Table 1 shows the composition of the chemical conversion treatment bath.
In this case, zinc ions are used as metal ions, chlorine ions are used as halogen ions, and 35% hydrogen peroxide is used as an oxidizing agent. Chemical conversion film A
and B use a copper plate as the copper-based base metal;
The copper plate was immersed in a beaker containing a treatment bath having the composition shown above, treated at 25°C for 3 minutes, washed with water, and then dried. FIGS. 2 and 3 show electron micrographs (magnification x 1500, photographing angle 45 degrees) of the chemical conversion coating A and the chemical conversion coating B. From the photograph, it is observed that the surface is covered with fine crystals, and the size of each crystal is about 1/1 of that of the crystals of conventional zinc phosphate chemical conversion coatings formed on iron surfaces.
It is 3 to 1/5 and quite dense. For chemical conversion coatings C and D, the ring-shaped copper parts used in Example 2, which will be described later, were used as the copper-based base metal,
This was formed using the same actual continuous chemical conversion treatment apparatus as in Example 2. FIGS. 4 and 5 show electron micrographs (magnification x 1500, photographing angle 45 degrees) of the chemical conversion coating C and the chemical conversion coating D. Figures 4 and 5
In the figure, as in Figures 2 and 3, nothing that can be clearly identified as a crystal can be seen.
【表】
化成皮膜C及び化成皮膜DのX線回折チヤート
図を第6図及び第7図に示す。第7図の化成皮膜
Cには燐酸亜鉛4水塩[Zn3(PO4)2・4H2O]の
結晶のピーク1、塩化第一銅[CuCl]の結晶の
ピーク2及び銅のピーク3が見られる。ところが
第6図の化成皮膜Dのチヤート図には燐酸亜鉛4
水塩の結晶のピークが見られない。
第2表に化成皮膜C及び化成皮膜Dの蛍光X線
による定性分析の結果を示す。なお測定装置には[Table] X-ray diffraction charts of chemical conversion coating C and chemical conversion coating D are shown in FIGS. 6 and 7. Chemical conversion coating C in Figure 7 contains peak 1 of crystals of zinc phosphate tetrahydrate [Zn 3 (PO 4 ) 2 4H 2 O], peak 2 of crystals of cuprous chloride [CuCl], and peak 3 of copper. can be seen. However, in the chart diagram of chemical conversion coating D in Figure 6, zinc phosphate 4
No peak of aqueous salt crystals can be seen. Table 2 shows the results of qualitative analysis of chemical conversion coating C and chemical conversion coating D using fluorescent X-rays. In addition, the measuring device
【表】
単位 重量%
理学電機製System3080Eを用いた。この結果か
ら明らかに化成皮膜C及び化成皮膜Dはほとんど
同じ組成であり、燐酸亜鉛及び塩化第一銅で構成
されていると考えられる。すなわちこれらの分析
結果より化成皮膜Cは、燐酸亜鉛はX線回折チヤ
ート図にピークが見られないことから結晶状では
なくアモルフアス状となつているものと考えら
れ、化成皮膜Dは燐酸亜鉛は結晶状となつている
ものと考えられる。
次に皮膜構成成分の定量分析を行なつた。分析
方法はJIS−K−0102に基づき、亜鉛イオンは規
格53.2に該当する原子吸光法で、銅は規格52.2に
該当する原子吸光法で、燐酸イオンは規格46.1に
該当するモリブデン青吸光光度法で、塩素イオン
は規格35.1に該当する硝酸銀滴定法で測定し、結
果を第3表に示す。
すなわち化成皮膜Cは亜鉛イオン19重量%、銅
33重量%、燐酸イオン8重量%、塩素イオン19重
量%、その他21重量%から構成され、この割合は
皮膜のどこを採つても同じであつた。また化成皮
膜Dは亜鉛イオン27重量%、銅18重量%、燐酸イ
オン9重量%、塩素イオン6重量%、その他40重
量%から構成され、この割合は皮膜のどこを採つ
ても同じであつた。
上記3種類の分析結果より本発明の銅系金属部
材に形成されている化成皮膜は、均一な結晶状或
いはアモルフアス状の燐酸亜鉛及び塩化第一銅か
ら構成されていることが明らかである。
[実施例]
以下実施例により本発明の銅系金属部材をより
詳しく説明する。
実施例 1
銅系基体金属として銅板を選び、塩素イオン15
g/L、燐酸イオン40g/L、亜鉛イオン25g/
L及び35%過酸化水素水20g/Lを含む処理液に
浸漬し、25℃で3分間処理した後水洗、乾燥して
化成皮膜を形成した。この皮膜の厚さは5μであ
り、JIS−C−2110固体絶縁材料の短時間絶縁破
壊試験方法での交流絶縁破壊電圧は約200Vであ
つた。この本発明の化成皮膜を有した銅系金属部
材に、電線への適用を想定して、さらにエポキシ
樹脂系絶縁塗料(品名エポラツク−100赤錆色東
京ペイント(株)製)を乾燥膜厚が15μとなるように
塗布し、自然乾燥させた。
得られた絶縁塗膜を有した実施例1の銅系金属
部材は、JIS−C−2110固体電機絶縁材料の絶縁
破壊試験に供され、短時間破壊試験方法での交流
絶縁破壊電圧が測定された。その結果を第8図に
示す。
従来例 1
従来例1として実施例1に使用されたものと同
一の銅板に、実施例1と同一のエポキシ樹脂系絶
縁塗料を乾燥膜厚が15μとなるように塗布し自然
乾燥させた。そして実施例1と同様に交流絶縁破
壊電圧を測定し結果を第8図に示す。
第8図より本発明による実施例1の銅系金属部
材の交流絶縁破壊電圧は1200〜1600Vと従来例1
の400〜700Vに比較して著しく大きい。即ち本発
明の銅系金属部材は銅電線等に適用した場合に、
電機絶縁性において従来よりはるかに優れた性能
を有している。
実施例 2
銅系基体金属として第9図にその縦断面図を示
す外径40mm、内径30mm、高さ20.5mmのリング状の
自動車始動機用銅部品を使用し、実際の連続化成
処理装置にて前処理として脱脂、洗浄、酸エツチ
ング、洗浄を行なつた。続いて塩素イオン63g/
L、燐酸イオン67g/L、亜鉛イオン80g/L及
び35%過酸化水素水20g/Lから成る処理浴にて
20〜30℃で3分間化成処理して前述の化成皮膜C
を形成した。さらに金属セツケン槽にてステアリ
ン酸ナトリウムを主とした処理浴(日本パーカラ
イジング(株)製ボンダリユーベ235)を用いて、80
℃にて3分間金属セツケン処理を施した。この金
属セツケン処理さた実施例2の銅系金属部材を約
3万個冷間鍛造プレス加工して第10図にその縦
断面図を示す銅部品を製造した。このプレス加工
時におけるプレス機械にかかる荷重を測定し、結
果を第11図に示す。
従来例 2
従来例2として実施例2と同一形状の第9図に
示す銅部品を用い、まず溶融亜鉛メツキを施して
30μのメツキ層を形成し、続いて亜鉛イオン5
g/L、燐酸イオン20g/L、硝酸イオン10g/
L、弗素イオン1g/L、ニツケルイオン0.5
g/Lを含む従来の化成処理浴中で80℃にて1分
間処理し、80〜90℃の温風で2分間乾燥すること
により燐酸亜鉛化成皮膜を形成させた。この従来
例2の化成処理された銅部品は、実施例2と同条
件で金属セツケン処理され、同様にプレス加工し
て第10図に示す部品を約3万個製造した。この
プレス加工時におけるプレス機械にかかる荷重を
測定し、結果を第11図に示す。
第11図に示す矢印は約3万回のプレス加工時
のプレス機械にかかる荷重のばらつきの幅であ
る。第11図より明らかに本発明の銅系金属部材
に金属セツケン処理を施した実施例2の銅系金属
部材は荷重が71〜74tであり、亜鉛メツキした後
燐酸亜鉛処理し、さらに金属セツケン処理が施さ
れた従来例2の銅系金属部材の70〜72tと比較し
て、プレス機械にかかる荷重は僅に上昇するのみ
であり、充分実用に耐えるものである。即ち本発
明の銅系金属部材を冷間鍛造プレス加工に使用す
ることにより、従来行われなければならなかつた
亜鉛メツキ工程を省略することができ、かつプレ
ス機械にかかる荷重は従来と同程度であつて潤滑
性に優れている。
[発明の効果]
本発明の銅系金属部材は防錆性能及び絶縁性能
に優れ、かつ塗装下地材としても優れた性能を有
している。従つて例えば銅電線に本発明の銅系金
属部材を適用することにより大きな効果を得るこ
とができる。すなわち、本発明の銅系金属部材を
使用すれば、電線の絶縁を確保するために塗布さ
れる合成樹脂から形成された有機皮膜の電線への
密着性は、本発明の銅系金属部材を用いない場合
に比較し大幅に向上する。従つて本発明の銅系金
属部材を適用した銅電線コイルに巻線加工する際
の皮膜の損傷を防止する効果を有する。さらに本
発明の銅系金属部材はそれ自体も絶縁性を有する
ため、本発明の銅系金属部材を用いた電線は従来
の銅線上に直接有機皮膜を形成したものに比較
し、絶縁性能が大きく向上する。
本発明の銅系金属部材はプレス加工時におい
て、特に冷間鍛造プレス加工時において潤滑性に
優れている。また従来燐酸塩化成処理前に必要で
あつた亜鉛メツキ処理工程を省略することが可能
となり、工程を大幅に短縮できるという大きな効
果を有している。
本発明の銅系金属部材は、上記以外にも、鉄系
の化成処理皮膜を有する部材と同様に、産業上多
くの分野での利用の可能性が大きい。[Table] Unit Weight%
System 3080E manufactured by Rigaku Denki was used. From this result, it is clear that chemical conversion coating C and chemical conversion coating D have almost the same composition, and are considered to be composed of zinc phosphate and cuprous chloride. In other words, from these analysis results, chemical conversion coating C is considered to be in an amorphous rather than crystalline form since zinc phosphate does not have a peak in the X-ray diffraction chart, and chemical conversion coating D is considered to be amorphous rather than crystalline. It is thought that the situation is Next, quantitative analysis of the film constituents was performed. The analysis method is based on JIS-K-0102. Zinc ions are analyzed using atomic absorption spectrometry according to standard 53.2, copper is analyzed using atomic absorption spectrometry according to standard 52.2, and phosphate ions are analyzed using molybdenum blue absorption spectrophotometry according to standard 46.1. , chloride ions were measured by silver nitrate titration method corresponding to Standard 35.1, and the results are shown in Table 3. In other words, chemical conversion coating C contains 19% by weight of zinc ions and copper.
33% by weight, 8% by weight of phosphate ions, 19% by weight of chloride ions, and 21% by weight of other substances, and this proportion was the same no matter where in the film it was taken. Furthermore, chemical conversion coating D was composed of 27% by weight of zinc ions, 18% by weight of copper, 9% by weight of phosphate ions, 6% by weight of chloride ions, and 40% by weight of other substances, and these proportions were the same no matter where the coating was taken. . From the above three types of analysis results, it is clear that the chemical conversion film formed on the copper-based metal member of the present invention is composed of uniform crystalline or amorphous zinc phosphate and cuprous chloride. [Example] The copper-based metal member of the present invention will be explained in more detail with reference to Examples below. Example 1 A copper plate was selected as the copper-based base metal, and 15 chloride ions were added.
g/L, phosphate ion 40g/L, zinc ion 25g/L
The sample was immersed in a treatment solution containing 20 g/L of hydrogen peroxide and 35% hydrogen peroxide solution, treated at 25° C. for 3 minutes, washed with water, and dried to form a chemical conversion film. The thickness of this film was 5 μm, and the AC breakdown voltage was about 200 V according to the JIS-C-2110 short-time dielectric breakdown test method for solid insulating materials. The copper-based metal member having the chemical conversion film of the present invention is further coated with an epoxy resin-based insulating paint (product name: Eporakku-100 rust red, manufactured by Tokyo Paint Co., Ltd.) to a dry film thickness of 15 μm, assuming application to electric wires. It was applied and allowed to air dry. The copper-based metal member of Example 1 having the obtained insulating coating was subjected to the JIS-C-2110 dielectric breakdown test for solid electrical insulation materials, and the AC dielectric breakdown voltage was measured using the short-time breakdown test method. Ta. The results are shown in FIG. Conventional Example 1 As Conventional Example 1, the same epoxy resin insulating paint as in Example 1 was applied to the same copper plate as that used in Example 1 so that the dry film thickness was 15 μm, and the coating was air-dried. Then, the AC breakdown voltage was measured in the same manner as in Example 1, and the results are shown in FIG. From FIG. 8, the AC breakdown voltage of the copper-based metal member of Example 1 according to the present invention is 1200 to 1600 V, and that of the conventional example 1.
significantly larger than the 400-700V of That is, when the copper-based metal member of the present invention is applied to copper electric wires, etc.,
It has far superior performance in terms of electrical insulation than conventional products. Example 2 A ring-shaped copper part for an automobile starter with an outer diameter of 40 mm, an inner diameter of 30 mm, and a height of 20.5 mm, whose vertical cross-sectional view is shown in Fig. 9, was used as the copper-based base metal, and was used in an actual continuous chemical conversion treatment equipment. Degreasing, cleaning, acid etching, and cleaning were performed as pretreatment. Next, chlorine ion 63g/
In a treatment bath consisting of 67 g/L of phosphate ions, 80 g/L of zinc ions, and 20 g/L of 35% hydrogen peroxide.
Chemical conversion treatment was performed at 20 to 30℃ for 3 minutes to form the aforementioned chemical conversion film C.
was formed. Furthermore, using a treatment bath mainly containing sodium stearate (Bondaryube 235 manufactured by Nippon Parkerizing Co., Ltd.) in a metal bath,
A metal soap treatment was performed at ℃ for 3 minutes. Approximately 30,000 pieces of the copper-based metal member of Example 2 which had been subjected to the metal stamping treatment were subjected to cold forging press processing to produce a copper part whose vertical cross-sectional view is shown in FIG. The load applied to the press machine during this press process was measured, and the results are shown in FIG. Conventional Example 2 As Conventional Example 2, a copper part shown in Fig. 9 having the same shape as Example 2 was used, and first hot-dip galvanized.
Form a plating layer of 30μ, followed by zinc ion 5
g/L, phosphate ion 20g/L, nitrate ion 10g/L
L, fluorine ion 1g/L, nickel ion 0.5
A zinc phosphate chemical conversion film was formed by treatment at 80° C. for 1 minute in a conventional chemical conversion treatment bath containing g/L and drying with hot air at 80 to 90° C. for 2 minutes. The chemically treated copper parts of Conventional Example 2 were subjected to a metal sieving process under the same conditions as in Example 2, and pressed in the same manner to produce about 30,000 parts as shown in FIG. The load applied to the press machine during this press process was measured, and the results are shown in FIG. The arrows shown in FIG. 11 indicate the width of variation in the load applied to the press machine during approximately 30,000 press operations. It is clear from FIG. 11 that the copper-based metal member of Example 2, in which the copper-based metal member of the present invention was subjected to metal soap treatment, had a load of 71 to 74 tons, and was zinc-plated, then treated with zinc phosphate, and then subjected to metal soap treatment. Compared to the 70 to 72 tons of the copper-based metal member of Conventional Example 2, which was subjected to this process, the load applied to the press machine increases only slightly, and is sufficiently durable for practical use. That is, by using the copper-based metal member of the present invention in cold forging press processing, the galvanizing process that had to be performed in the past can be omitted, and the load on the press machine is the same as in the past. It is warm and has excellent lubricity. [Effects of the Invention] The copper-based metal member of the present invention has excellent rust prevention performance and insulation performance, and also has excellent performance as a coating base material. Therefore, great effects can be obtained by applying the copper-based metal member of the present invention to copper electric wires, for example. In other words, if the copper-based metal member of the present invention is used, the adhesion of the organic film formed from the synthetic resin applied to the wire to ensure the insulation of the wire will be improved. Significant improvement compared to without. Therefore, it has the effect of preventing damage to the coating when winding a copper wire coil to which the copper-based metal member of the present invention is applied. Furthermore, since the copper-based metal member of the present invention itself has insulating properties, electric wires using the copper-based metal member of the present invention have greater insulation performance than conventional ones in which an organic film is directly formed on the copper wire. improves. The copper-based metal member of the present invention has excellent lubricity during press processing, particularly during cold forging press processing. Furthermore, it is possible to omit the galvanizing process that was conventionally required before the phosphate chemical conversion treatment, which has the great effect of significantly shortening the process. In addition to the above, the copper-based metal member of the present invention has great potential for use in many industrial fields, similar to members having iron-based chemical conversion coatings.
第1図は本発明の銅系金属部材の模式的な断面
図、第2図、第3図、第4図及び第5図は本発明
の銅系金属部材が有する化成皮膜の電子顕微鏡写
真図、第6図及び第7図は本発明の銅系金属部材
が有する化成皮膜のX線回折チヤート図、第8図
は実施例1及び従来例1の銅系金属部材の絶縁破
壊電圧を示す線図、第9図は実施例2及び従来例
2で使用したリング状銅部品の縦断面図、第10
図は実施例2及び従来例2でプレス加工された後
のリング状銅部品の縦断面図、第11図は実施例
2及び従来例2で処理された銅部品のプレス加工
時の機械にかかる荷重を表わす線図である。
FIG. 1 is a schematic cross-sectional view of a copper-based metal member of the present invention, and FIGS. 2, 3, 4, and 5 are electron micrographs of chemical conversion coatings possessed by the copper-based metal member of the present invention. , FIGS. 6 and 7 are X-ray diffraction charts of the chemical conversion coatings of the copper-based metal members of the present invention, and FIG. 8 is a line showing the dielectric breakdown voltage of the copper-based metal members of Example 1 and Conventional Example 1. Figures 9 and 9 are longitudinal cross-sectional views of the ring-shaped copper parts used in Example 2 and Conventional Example 2, and Figure 10
The figure is a longitudinal cross-sectional view of the ring-shaped copper parts after being pressed in Example 2 and Conventional Example 2, and Figure 11 is the machine used to press the copper parts processed in Example 2 and Conventional Example 2. It is a diagram showing a load.
Claims (1)
れた燐酸塩と塩化第一銅、臭化第一銅及び沃化第
一銅のなかから選ばれるハロゲン化銅とから成る
化成皮膜と、から構成されることを特徴とする化
成皮膜を有する銅系金属部材。 2 燐酸塩を構成する金属は亜鉛、マンガン、鉄
及びカルシウムのなかから選ばれる特許請求の範
囲第1項記載の化成皮膜を有する銅系金属部材。[Scope of Claims] 1. A copper-based base metal; a phosphate formed on at least a portion of the surface of the copper-based base metal; and a phosphate selected from cuprous chloride, cuprous bromide, and cuprous iodide. A copper-based metal member having a chemical conversion film comprising: a chemical conversion film comprising a copper halide containing copper halide; 2. A copper-based metal member having a chemical conversion coating according to claim 1, wherein the metal constituting the phosphate is selected from zinc, manganese, iron, and calcium.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16823884A JPS6148572A (en) | 1984-08-11 | 1984-08-11 | Copper-base metallic member having film formed by chemical conversion |
| US06/754,231 US4788086A (en) | 1984-07-14 | 1985-07-12 | Copper-based metallic member having a chemical conversion film and method for producing same |
| DE8585305041T DE3586763T2 (en) | 1984-07-14 | 1985-07-15 | METALLIC ONE-PIECE COPPER-BASED WITH A CHEMICAL CONVERSION LAYER AND METHOD FOR THE PRODUCTION THEREOF. |
| EP85305041A EP0169047B1 (en) | 1984-07-14 | 1985-07-15 | Copper-based metallic member having a chemical conversion film and method for producing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16823884A JPS6148572A (en) | 1984-08-11 | 1984-08-11 | Copper-base metallic member having film formed by chemical conversion |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6148572A JPS6148572A (en) | 1986-03-10 |
| JPH0352543B2 true JPH0352543B2 (en) | 1991-08-12 |
Family
ID=15864327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16823884A Granted JPS6148572A (en) | 1984-07-14 | 1984-08-11 | Copper-base metallic member having film formed by chemical conversion |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6148572A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2640432B2 (en) * | 1994-10-20 | 1997-08-13 | 三井金属鉱業株式会社 | Chemical conversion solution for artificial patina and artificial patina treatment method |
| JP5776630B2 (en) * | 2012-06-01 | 2015-09-09 | 日立金属株式会社 | Copper-based material and method for producing the same |
-
1984
- 1984-08-11 JP JP16823884A patent/JPS6148572A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6148572A (en) | 1986-03-10 |
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