JPH0354961B2 - - Google Patents
Info
- Publication number
- JPH0354961B2 JPH0354961B2 JP7662384A JP7662384A JPH0354961B2 JP H0354961 B2 JPH0354961 B2 JP H0354961B2 JP 7662384 A JP7662384 A JP 7662384A JP 7662384 A JP7662384 A JP 7662384A JP H0354961 B2 JPH0354961 B2 JP H0354961B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- atom
- acid
- methyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 Hydroxyethyl group Chemical group 0.000 claims description 33
- 150000001875 compounds Chemical class 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 229910052801 chlorine Inorganic materials 0.000 claims description 9
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical class OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical class OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 claims description 6
- 150000007513 acids Chemical class 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000001931 aliphatic group Chemical group 0.000 claims description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 125000004434 sulfur atom Chemical group 0.000 claims description 4
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims description 3
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 2
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 claims description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 claims description 2
- 239000003999 initiator Substances 0.000 description 13
- 239000011342 resin composition Substances 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- PAAVDLDRAZEFGW-UHFFFAOYSA-N 2-butoxyethyl 4-(dimethylamino)benzoate Chemical compound CCCCOCCOC(=O)C1=CC=C(N(C)C)C=C1 PAAVDLDRAZEFGW-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- YDIYEOMDOWUDTJ-UHFFFAOYSA-N 4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- SODPIMGUZLOIPE-UHFFFAOYSA-N (4-chlorophenoxy)acetic acid Chemical compound OC(=O)COC1=CC=C(Cl)C=C1 SODPIMGUZLOIPE-UHFFFAOYSA-N 0.000 description 1
- SUDVPELGFZKOMD-UHFFFAOYSA-N 1,2-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C(C)C)C(C(C)C)=CC=C3SC2=C1 SUDVPELGFZKOMD-UHFFFAOYSA-N 0.000 description 1
- ILBBNQMSDGAAPF-UHFFFAOYSA-N 1-(6-hydroxy-6-methylcyclohexa-2,4-dien-1-yl)propan-1-one Chemical compound CCC(=O)C1C=CC=CC1(C)O ILBBNQMSDGAAPF-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- XSBUXVWJQVTYLC-UHFFFAOYSA-N 2-(3-chlorophenoxy)acetic acid Chemical compound OC(=O)COC1=CC=CC(Cl)=C1 XSBUXVWJQVTYLC-UHFFFAOYSA-N 0.000 description 1
- QMOKVFCLFRLSTN-UHFFFAOYSA-N 2-(3-chlorophenyl)sulfanylacetic acid Chemical compound OC(=O)CSC1=CC=CC(Cl)=C1 QMOKVFCLFRLSTN-UHFFFAOYSA-N 0.000 description 1
- MBNHCNDYGNYTMZ-UHFFFAOYSA-N 2-(3-methylanilino)acetic acid Chemical compound CC1=CC=CC(NCC(O)=O)=C1 MBNHCNDYGNYTMZ-UHFFFAOYSA-N 0.000 description 1
- YPKLXLYGMAWXDO-UHFFFAOYSA-N 2-(4-chlorophenyl)sulfanylacetic acid Chemical compound OC(=O)CSC1=CC=C(Cl)C=C1 YPKLXLYGMAWXDO-UHFFFAOYSA-N 0.000 description 1
- NJVJSULZTHOJGT-UHFFFAOYSA-N 2-(4-methoxyanilino)acetic acid Chemical compound COC1=CC=C(NCC(O)=O)C=C1 NJVJSULZTHOJGT-UHFFFAOYSA-N 0.000 description 1
- BHFSBJHPPFJCOS-UHFFFAOYSA-N 2-(4-methoxyphenoxy)acetic acid Chemical compound COC1=CC=C(OCC(O)=O)C=C1 BHFSBJHPPFJCOS-UHFFFAOYSA-N 0.000 description 1
- WPRFIGTZKOUYRL-UHFFFAOYSA-N 2-(4-methoxyphenyl)sulfanylacetic acid Chemical compound COC1=CC=C(SCC(O)=O)C=C1 WPRFIGTZKOUYRL-UHFFFAOYSA-N 0.000 description 1
- SFTDDFBJWUWKMN-UHFFFAOYSA-N 2-(4-methylphenoxy)acetic acid Chemical compound CC1=CC=C(OCC(O)=O)C=C1 SFTDDFBJWUWKMN-UHFFFAOYSA-N 0.000 description 1
- XCRDQVBOVYWDPH-UHFFFAOYSA-N 2-(4-methylphenyl)sulfanylacetic acid Chemical compound CC1=CC=C(SCC(O)=O)C=C1 XCRDQVBOVYWDPH-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- YJQMXVDKXSQCDI-UHFFFAOYSA-N 2-ethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3SC2=C1 YJQMXVDKXSQCDI-UHFFFAOYSA-N 0.000 description 1
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- MOTOSAGBNXXRRE-UHFFFAOYSA-N 2-phenylsulfanylacetic acid Chemical compound OC(=O)CSC1=CC=CC=C1 MOTOSAGBNXXRRE-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- FAXDZWQIWUSWJH-UHFFFAOYSA-N 3-methoxypropan-1-amine Chemical compound COCCCN FAXDZWQIWUSWJH-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- KQTRLTKMZKGHJP-UHFFFAOYSA-N 7-oxa-14-thiapentacyclo[11.8.0.02,10.05,9.015,20]henicosa-1(13),2(10),3,5(9),11,15,19-heptaene-6,8,17-trione Chemical compound C1=CC2=C(C=3C=CC=4SC5=CC(CC=C5CC=4C=31)=O)C(=O)OC2=O KQTRLTKMZKGHJP-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- OFSAUHSCHWRZKM-UHFFFAOYSA-N Padimate A Chemical compound CC(C)CCOC(=O)C1=CC=C(N(C)C)C=C1 OFSAUHSCHWRZKM-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- APZPSKFMSWZPKL-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)CO APZPSKFMSWZPKL-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- MCPLVIGCWWTHFH-UHFFFAOYSA-L methyl blue Chemical compound [Na+].[Na+].C1=CC(S(=O)(=O)[O-])=CC=C1NC1=CC=C(C(=C2C=CC(C=C2)=[NH+]C=2C=CC(=CC=2)S([O-])(=O)=O)C=2C=CC(NC=3C=CC(=CC=3)S([O-])(=O)=O)=CC=2)C=C1 MCPLVIGCWWTHFH-UHFFFAOYSA-L 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- MXHTZQSKTCCMFG-UHFFFAOYSA-N n,n-dibenzyl-1-phenylmethanamine Chemical compound C=1C=CC=CC=1CN(CC=1C=CC=CC=1)CC1=CC=CC=C1 MXHTZQSKTCCMFG-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N p-toluenesulfonic acid Substances CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000001044 red dye Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- BHZOKUMUHVTPBX-UHFFFAOYSA-M sodium acetic acid acetate Chemical class [Na+].CC(O)=O.CC([O-])=O BHZOKUMUHVTPBX-UHFFFAOYSA-M 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Pyrane Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Description
本発明は光重合性樹脂組成物に関する。更に詳
しくは式(1)
(式(1a)及び(1b)中R1は水素原子、塩素原
子又はメチル基を、R2は水素原子、塩素原子、
メチル基又はメトキシ基を、R3はC1〜4のアルキ
ル基;炭素数3乃至4のアルコキシアルキル基;
ヒドロキシエチル基;アセチル基;プロピオニル
基;メチル基、プロピル基、カルボエトキシ基で
置換していてもよいベンゾイル基を表わす。Zは
酸素原子又は硫黄原子を表わす。但し式(1)は式
(1a)および式(1b)の異性体からなる混合物で
ある)
で表わされる化合物又は式(2)
(式(2)においてR4はC1〜8のアルキル基;1乃至
2個の酸素原子で中断されていてもよいC4〜7のア
ルキル基;水酸基で置換されたエチル基又はプロ
ピル基;N,N−ジメチルアミノプロピル基;塩
素原子、ブチル基で置換されていてもよいフエニ
ル基を、R5は水素原子、メチル基、メトキシ基、
エトキシ基、ジメチルアミノ基又はジエチルアミ
ノ基を各々表わす。又Xは水素原子又は塩素原子
を、Yは酸素原子又は硫黄原子を表わす。)
で表わされる化合物及び必要に応じて光重合促進
剤として脂肪族第3級アミン類;芳香族第3級ア
ミン類;N−フエニルグリシン類;フエノキシ酢
酸類;チオフエノキシ酢酸類;芳香族第3級アミ
ン類及びチオキサントン類から選ばれる化合物並
びに少なくとも1個のエチレン性不飽和二重結合
を有する化合物を含有することを特徴とする光重
合性樹脂組成物に関する。
最近情報記録の分野においては従来から広く用
いられている紫外線に代えてレーザー光線を含む
可視光線の利用が盛んに検討されている。例えば
アルゴンレーザー等の500nm近傍の可視光を利
用して感光性樹脂膜に画像を形成させることが行
われている。その目的は高密度エネルギーであ
る、およびコンピユーターと連動させて走査露光
が可能である等のレーザービームの特徴を利用し
て画像形成に於ける工程の簡略化(例えばダイレ
クト製版)が期待されるからである。さらに連続
スペクトルの紫外部をカツトして可視光のみを利
用せざるを得ないような分野においても可視光に
感応する光重合開始剤の開発が望まれている。
本発明の目的は紫外光はもちろん可視光にも十
分感応する新規な光重合開始剤を含む可視光域重
合性樹脂組成物を提供することにある。従来のベ
ンゾインアルキルエーテル、ベンジルジメチルケ
タールのようなラジカル型光重合開始剤は230〜
400nmの紫外線に対しては比較的効率よく感応
するが可視光、特に500nm近傍の光に対しては
殆んど光重合開始剤能を有しない。
本発明者等は可視光にも開始剤効果のある化合
物について鋭意検討した結果本発明に至つた。
即ち本発明の式(1)又は(2)の有機色素は330〜
650nmに感光波長領域があり紫外線のみならず
可視光特に500nm近傍の光にも秀れた開始剤効
果が認められる。
さらに前記式(1)又は(2)の有機色素に脂肪族又は
芳香族第3級アミン;N−フエニルグリシン類;
フエノキシ酢酸類;チオフエノキシ酢酸類又は芳
香族第3級アミン類及びチオキサントン類から選
ばれる化合物を重合開始捉進剤として含有せしめ
ることにより一段と高感度の光重合性樹脂組成物
がえられることも明らかになつた。式(1)の化合物
は一般的には次の反応式に従つて合成される。
(上式においてR1,R2,R3及びZは前記と同じ
意味を表わす。Wはハロゲン、p−トルエンスル
ホン酸エステル残基、硫酸エステル残基、ベンゼ
ンスルホン酸エステル残基等のアシル化又はアル
キル化反応基を示す)式(1a)及び(1b)は異
性体でありこれらは分離することなく混合物のま
ま使用される。
又式(2)の化合物は一般的には次の反応式に従つ
て合成される。
(上式においてR4,R5,X及びYは前記と同じ
意味を表わす)
式(1)におけるR3の具体的な例としてはメチル
基エチル基ブチル基のようなC1〜4のアルキル基;
メトキシエチル基、エトキシエチル基のような炭
素数3乃至4のアルコキシアルキル基;ヒドロキ
シエチル基;アセチル基;プロピオニル基;メチ
ル基、プロピル基、カルボエトキシ基で置換して
いてもよいベンゾイル基が挙げられる。
又式(2)におけるR4の具体的な例としてはメチ
ル基、エチル基、ブチル基、オクチル基のような
C1〜8のアルキル基、メトキシプロピル基、ブトキ
シプロピル基、メトキシエトキシエチル基、エト
キシエトキシエチル基のようなアルキル鎖が1乃
至2個の酸素原子で中断されていてもよいC4〜7の
アルキル基、ヒドロキシエチル基、β−ヒドロキ
シプロピル基のようなヒドロキシプロピル基、
N,N−ジメチルアミノプロピル基、フエニル
基、p−クロルフエニル基、p−ブチルフエニル
基のような塩素原子又はブチル基で置換されてい
てもよいフエニル基が挙げられる。
上記の式(1)又は(2)の光重合開始剤は光重合促進
剤と併用して使用してもよい。好ましい光重合促
進剤としては脂肪族又は芳香族第3級アミン、
N′−フエニルグリシン類、フエノキシ酢酸類、
チオフエノキシ酢酸類が挙げられ、さらに芳香族
第3級アミンとチオキサントン類からなる系が挙
げられる。
脂肪族又は芳香族第3級アミンとしてはトリブ
チルアミン、N,N−ジメチルアニリン、トリベ
ンジルアミン、p−ジメチルアミノベンゾイツク
アシツドエチルエステル、p−ジメチルアミノベ
ンゾイツクアシツドブトキシエチルエステル、p
−ジメチルアミノベンゾイツクアシツドアミルエ
ステル、p−ジメチルアミノベンゾイツクアシツ
ドイソアミルエステル、p−ジメチルアミノベン
ゾイツクアシツド、p−ジメチルアミノベンズア
ルデヒド、ミヒラーケトン、4,4′−ビスジエチ
ルアミノベンゾフエノン等が挙げられる。N−フ
エニルグリシン類としてはN−フエニルグリシ
ン、p−クロル−N−フエニルグルシン、m−メ
チル−N−フエニルグリシン、p−メトキシフエ
ニルグリシン等が挙げられる。フエキシ酢酸類又
はチオフエノキシ酢酸類としてはフエノキシ酢
酸、チオフエノキシ酢酸、p−クロルフエノキシ
酢酸、p−クロルチオフエノキシ酢酸、p−メチ
ルフエノキシ酢酸、p−メチルチオフエノキシ酢
酸、p−メトキシフエノキシ酢酸、p−メトキシ
チオフエノキシ酢酸、m−クロルフエノキシ酢
酸、m−クロルチオフエノキシ酢酸等が挙げられ
る。
又チオキサントン類としては2−メチルチオキ
サントン、2−エチルチオキサントン、2−イソ
プロピルチオキサントン、2,4−ジメチルチオ
キサントン、2,4−ジエチルチオキサントン、
2,4−ジイソプロピルチオキサントン、2−ク
ロルチオキサントン等が挙げられる。
本発明の光重合性樹脂組成物は前記した重合開
始剤、必要に応じて使用される光重合促進剤の他
通常有機高分子からなるバインダー、更に必要に
応じて熱重合禁止剤、可塑剤等の通常の添加剤を
混合することによつて調製される。
光重合性樹脂とはエチレン性不飽和二重結合を
有し紫外線及び可視光線の照射下で架橋及び重合
しうるモノマー、オリゴマー、プレポリマー又は
これらの混合物でありその具体的な例としてはエ
チルアクリレート、ブチルアクリレート、エチル
メタアクリレート、ブチルメタアクリレート、エ
チレングリコールケタアクリレート、ペンタエリ
スリトールメタアクリレート、ジペンタエリスリ
トールテトラメタアクリレートのような1価又は
多価アルコールのアクリル酸又はメタアクリル酸
エステル類;多価アルコールと一塩基酸又は多塩
基酸を縮合して得られるポリエステルプレポリマ
ーにメタアクリル酸を反応させて得られるポリエ
ステルアクリレート;ポリオール基とジイソシア
ネート基をもつ化合物を反応させた後メタアクリ
ル酸を反応させて得られるポリウレタンアクリレ
ート;ビスフエノールジクリシジルエーテル系又
はエポキシ化ポリブタジエンのような低分子量の
エポキシ化樹脂とメタアクリル酸との反応生成物
であるエポキシメタアクリレート等が挙げられ
る。バインダーとしてはポリメタアクリル酸エス
テル又はその部分加水分解物ポリスチレン、ポリ
酢酸ビニル、又はその部分加水分解物、ポリビニ
ルブチラール、ポリクロロプレン、ポリ塩化ビニ
ル、塩素化ポリエチレン、塩素化ポリプロピレ
ン、ポリビニルピロリドン、ポリエチレンオキサ
イド、ポリメタアクリル酸又は側鎖にカルボキシ
ル基を有するメタアクリル酸共重合体などの有機
高分子物質が用いられる。そしてこれらのバイン
ダーは光重合性樹脂とほぼ同量用いられる。
前記の式(1)ないし(2)の光重合開始剤の使用量は
光重合性樹脂100部に対して0.1〜30部好ましくは
0.5〜15部の範囲内で用いられる。さらに場合に
よつて使用される脂肪族又は芳香族第3級アミ
ン、N−フエニルグリシン類、フエノキシ酢酸
類、チオフエノキシ酢酸類、などから選ばれる光
重合促進剤は、光重合開始剤1部に対して0.1〜
10部、好ましくは0.2ないし5部の割合で使用さ
れる。さらに芳香族第3級アミンおよびチオキサ
ントン類から成る光重合促進剤の場合も光重合開
始剤に対して上記と同様な割合で使用され、芳香
族アミン1部に対するチオキサントン類の割合は
0.2乃至5部の割合である。
本発明の光重合性樹脂組成物を硬化せしめる光
源としては水銀ランプ、キセノンランプ、ハロゲ
ンランプ、レーザー光等通常の硬化用光源が用い
られるがハロゲンランプ、ガスレーザー殊にアル
ゴンレーザーの使用が最も好都合であり必要に応
じてフイルターを使用して紫外線又は可視光線の
みを利用することも可能である。
以下実施例により本発明を更に具体的に説明す
る。
参考例 1
式(1)の光重合開始剤の合成例:
ベンゾチオキサントン−3,4−ジカルボン酸
無水物とフエニニル酢酸および酢酸カリと反応さ
せて得られる。次式の化合物(イ)45.2gを
ジメチルホルムアミド200g中に溶解し無水炭
酸カリ8.4gを加え30分間還流下に加熱する。生
成水を留去し60℃に冷却し、ジメチル硫酸25.2g
を2時間で加え、更に2時間同温度で撹拌する。
冷却後、反応液中にメタノールを加え、結晶を析
出せしめ過、乾燥して下記の暗赤色の色素(混
合物)をえた。
o−アシル化物も上記の(イ)の化合物と酸クロラ
イド又は酸無水物から通常の方法で合成される。
上記と類似な方法で合成された式(1)の光重合開
始剤を表1に示した。
The present invention relates to a photopolymerizable resin composition. For more details, use formula (1) (In formulas (1a) and (1b), R 1 is a hydrogen atom, a chlorine atom, or a methyl group, R 2 is a hydrogen atom, a chlorine atom,
a methyl group or a methoxy group; R 3 is a C 1-4 alkyl group; an alkoxyalkyl group having 3 to 4 carbon atoms;
Hydroxyethyl group; Acetyl group; Propionyl group; Represents a benzoyl group which may be substituted with a methyl group, propyl group, or carboethoxy group. Z represents an oxygen atom or a sulfur atom. However, formula (1) is a mixture of isomers of formula (1a) and formula (1b)) or formula (2) (In formula (2), R 4 is a C 1-8 alkyl group; a C 4-7 alkyl group which may be interrupted by 1 to 2 oxygen atoms; an ethyl group or a propyl group substituted with a hydroxyl group; N,N-dimethylaminopropyl group; chlorine atom, phenyl group which may be substituted with butyl group, R 5 is hydrogen atom, methyl group, methoxy group,
Each represents an ethoxy group, a dimethylamino group, or a diethylamino group. Further, X represents a hydrogen atom or a chlorine atom, and Y represents an oxygen atom or a sulfur atom. ) and optionally as a photopolymerization accelerator, aliphatic tertiary amines; aromatic tertiary amines; N-phenylglycines; phenoxyacetic acids; thiophenoxyacetic acids; aromatic tertiary amines; The present invention relates to a photopolymerizable resin composition containing a compound selected from class amines and thioxanthone and a compound having at least one ethylenically unsaturated double bond. Recently, in the field of information recording, the use of visible light including laser light has been actively studied in place of the conventionally widely used ultraviolet light. For example, an image is formed on a photosensitive resin film using visible light of around 500 nm such as an argon laser. The purpose of this is because it is expected to simplify the process of image formation (for example, direct plate making) by utilizing the features of laser beams, such as high-density energy and the ability to perform scanning exposure in conjunction with a computer. It is. Furthermore, in fields where it is necessary to cut out the ultraviolet part of the continuous spectrum and use only visible light, there is a desire to develop photopolymerization initiators that are sensitive to visible light. An object of the present invention is to provide a visible light region polymerizable resin composition containing a novel photopolymerization initiator that is sufficiently sensitive not only to ultraviolet light but also to visible light. Conventional radical type photoinitiators such as benzoin alkyl ether and benzyl dimethyl ketal are 230~
Although it is relatively efficiently sensitive to ultraviolet light of 400 nm, it has almost no photopolymerization initiator ability to visible light, especially light around 500 nm. The present inventors have conducted intensive studies on compounds that have an initiator effect even with visible light, and have arrived at the present invention. That is, the organic dye of formula (1) or (2) of the present invention is 330-
It has a photosensitive wavelength range of 650 nm, and its excellent initiator effect is observed not only in ultraviolet rays but also in visible light, especially light around 500 nm. Furthermore, the organic dye of formula (1) or (2) is an aliphatic or aromatic tertiary amine; N-phenylglycine;
It is also clear that a photopolymerizable resin composition with even higher sensitivity can be obtained by containing a compound selected from phenoxyacetic acids; thiophenoxyacetic acids, aromatic tertiary amines, and thioxanthone as a polymerization initiation scavenger. Summer. The compound of formula (1) is generally synthesized according to the following reaction formula. (In the above formula, R 1 , R 2 , R 3 and Z have the same meanings as above. W is a halogen, p-toluenesulfonic acid ester residue, sulfuric acid ester residue, benzenesulfonic acid ester residue, etc.) Formulas (1a) and (1b) (representing an alkylation reactive group) are isomers and are used as a mixture without separation. The compound of formula (2) is generally synthesized according to the following reaction formula. (In the above formula, R 4 , R 5 , X and Y have the same meanings as above) Specific examples of R 3 in formula (1) include C 1-4 alkyl such as methyl group, ethyl group, and butyl group. Base;
Examples include alkoxyalkyl groups having 3 to 4 carbon atoms such as methoxyethyl group and ethoxyethyl group; hydroxyethyl group; acetyl group; propionyl group; benzoyl group optionally substituted with methyl group, propyl group, and carboethoxy group. It will be done. Specific examples of R 4 in formula (2) include methyl group, ethyl group, butyl group, and octyl group.
C 1-8 alkyl group, C 4-7 alkyl group such as methoxypropyl group, butoxypropyl group, methoxyethoxyethyl group, ethoxyethoxyethyl group where the alkyl chain may be interrupted with 1 or 2 oxygen atoms. hydroxypropyl groups such as alkyl groups, hydroxyethyl groups, β-hydroxypropyl groups,
Examples include phenyl groups which may be substituted with a chlorine atom or a butyl group, such as an N,N-dimethylaminopropyl group, a phenyl group, a p-chlorophenyl group, and a p-butylphenyl group. The photopolymerization initiator of formula (1) or (2) above may be used in combination with a photopolymerization accelerator. Preferred photopolymerization accelerators include aliphatic or aromatic tertiary amines,
N'-phenylglycines, phenoxyacetic acids,
Examples include thiophenoxyacetic acids, and further examples include systems consisting of aromatic tertiary amines and thioxanthones. Aliphatic or aromatic tertiary amines include tributylamine, N,N-dimethylaniline, tribenzylamine, p-dimethylaminobenzoic acid ethyl ester, p-dimethylaminobenzoic acid butoxyethyl ester, p-dimethylaminobenzoic acid butoxyethyl ester,
-dimethylaminobenzoic acid amyl ester, p-dimethylaminobenzoic acid isoamyl ester, p-dimethylaminobenzoic acid, p-dimethylaminobenzaldehyde, Michler's ketone, 4,4'-bisdiethylaminobenzophenone, etc. Can be mentioned. Examples of N-phenylglycine include N-phenylglycine, p-chloro-N-phenylglucine, m-methyl-N-phenylglycine, and p-methoxyphenylglycine. Examples of phenoxyacetic acids or thiophenoxyacetic acids include phenoxyacetic acid, thiophenoxyacetic acid, p-chlorophenoxyacetic acid, p-chlorothiophenoxyacetic acid, p-methylphenoxyacetic acid, p-methylthiophenoxyacetic acid, p-methoxyphenoxyacetic acid, Examples include p-methoxythiophenoxyacetic acid, m-chlorophenoxyacetic acid, m-chlorothiophenoxyacetic acid, and the like. In addition, thioxanthone includes 2-methylthioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone,
Examples include 2,4-diisopropylthioxanthone and 2-chlorothioxanthone. The photopolymerizable resin composition of the present invention includes the above-mentioned polymerization initiator, a photopolymerization accelerator used if necessary, a binder usually made of an organic polymer, and further a thermal polymerization inhibitor, a plasticizer, etc. if necessary. It is prepared by mixing the usual additives. Photopolymerizable resins are monomers, oligomers, prepolymers, or mixtures thereof that have ethylenically unsaturated double bonds and can be crosslinked and polymerized under irradiation with ultraviolet rays and visible light, and specific examples include ethyl acrylate. , butyl acrylate, ethyl methacrylate, butyl methacrylate, ethylene glycol ketacrylate, pentaerythritol methacrylate, dipentaerythritol tetramethacrylate, acrylic or methacrylic esters of monohydric or polyhydric alcohols; polyhydric alcohols Polyester acrylate obtained by reacting methacrylic acid with a polyester prepolymer obtained by condensing monobasic or polybasic acid; The resulting polyurethane acrylate includes epoxy methacrylate, which is a reaction product of methacrylic acid and a low molecular weight epoxidized resin such as bisphenol dicrycidyl ether or epoxidized polybutadiene. As a binder, polymethacrylic acid ester or its partial hydrolyzate polystyrene, polyvinyl acetate or its partial hydrolyzate, polyvinyl butyral, polychloroprene, polyvinyl chloride, chlorinated polyethylene, chlorinated polypropylene, polyvinylpyrrolidone, polyethylene oxide. An organic polymer substance such as polymethacrylic acid or a methacrylic acid copolymer having a carboxyl group in a side chain is used. These binders are used in approximately the same amount as the photopolymerizable resin. The amount of the photopolymerization initiator of formula (1) or (2) above is preferably 0.1 to 30 parts per 100 parts of the photopolymerizable resin.
It is used in a range of 0.5 to 15 parts. Furthermore, a photopolymerization accelerator selected from aliphatic or aromatic tertiary amines, N-phenylglycines, phenoxyacetic acids, thiophenoxyacetic acids, etc., which is used depending on the case, is added to one part of the photopolymerization initiator. 0.1~
It is used in a proportion of 10 parts, preferably 0.2 to 5 parts. Furthermore, in the case of a photopolymerization accelerator consisting of an aromatic tertiary amine and a thioxanthone, it is used in the same ratio as above to the photopolymerization initiator, and the ratio of the thioxanthone to 1 part of the aromatic amine is
The ratio is from 0.2 to 5 parts. As a light source for curing the photopolymerizable resin composition of the present invention, ordinary curing light sources such as a mercury lamp, a xenon lamp, a halogen lamp, and a laser beam can be used, but it is most convenient to use a halogen lamp, a gas laser, and especially an argon laser. Therefore, it is also possible to use only ultraviolet rays or visible rays by using a filter if necessary. The present invention will be explained in more detail with reference to Examples below. Reference Example 1 Synthesis example of photopolymerization initiator of formula (1): Obtained by reacting benzothioxanthone-3,4-dicarboxylic anhydride with phenynylacetic acid and potassium acetate. 45.2g of compound (a) of the following formula Dissolve in 200 g of dimethylformamide, add 8.4 g of anhydrous potassium carbonate, and heat under reflux for 30 minutes. Distill the produced water, cool to 60℃, and add 25.2g of dimethyl sulfate.
was added over a period of 2 hours, and the mixture was further stirred at the same temperature for 2 hours.
After cooling, methanol was added to the reaction solution to precipitate crystals, which were filtered and dried to obtain the following dark red dye (mixture). The o-acylated product is also synthesized from the above compound (a) and acid chloride or acid anhydride by a conventional method. Table 1 shows photopolymerization initiators of formula (1) synthesized by a method similar to the above.
【表】【table】
【表】
参考例 2
式(2)の合成例:
下記の化合物4.0g、
γ−メトキシプロピルアミン0.9g、クロルベ
ンゼン200mlからなる混合物を70〜100℃で約3時
間撹拌すると赤色の透明溶液となる。これを冷却
して多量のメタノール中に注ぎ析出した結晶を
別して下記式の赤色結晶を得た。
λmax498nm(メチルセルソルブ中)
ほぼ同様な操作により式(2)で示される化合物を
得た。表2にえられた化合物の構造式及びλmax
(メチルセルソルブ中)を示した。[Table] Reference example 2 Synthesis example of formula (2): 4.0g of the following compound, A mixture of 0.9 g of γ-methoxypropylamine and 200 ml of chlorobenzene is stirred at 70 to 100° C. for about 3 hours to form a red transparent solution. This was cooled, poured into a large amount of methanol, and the precipitated crystals were separated to obtain red crystals of the following formula. λmax 498 nm (in methylcellosolve) A compound represented by formula (2) was obtained by almost the same operation. Structural formula and λmax of the compounds obtained in Table 2
(in methylcellosolve).
【表】【table】
前記実施例1〜37でえられた光重合性樹脂組成
物を1000部のメチルセルソルブに均一に溶解し
た。次いでこの溶液を陽極酸化したアルミ板上に
乾燥膜厚さ1μmとなるようにスピンナーを用い
て塗布した。
次いで感光性試験を可視光及びレーガー光につ
いて行つた。レーザー光は5Wのアルゴンレーザ
ーの488nmシングルラインをビーム径1.25mmで使
用した。可視光は蛍光ケミカルランプにシヤープ
カツトフイルターY−43(東芝製)を用い紫外光
をカツトして使用した。各光源を用いて前記乾燥
膜に露光したのちエタノールにより未硬化部分を
溶出し、メチルブルー/エタノール溶液で染色す
ることにより硬化の有無を判定した。塗膜が光硬
化するに必要な最低照射エネルギーにより感度を
測定した。
レーザー露光の場合にはビーム径と同一の硬化
径が得られるに必要とされる照射エネルギーを感
度とした。数値が小さいもの程感光性樹脂組成物
の光に対する感度がたかいということでありこれ
は光重合開始剤又は光重合促進剤の効果がすぐれ
ていることを示すものである。
The photopolymerizable resin compositions obtained in Examples 1 to 37 were uniformly dissolved in 1000 parts of methyl cellosolve. Next, this solution was applied onto an anodized aluminum plate using a spinner so that the dry film thickness was 1 μm. Photosensitivity tests were then conducted for visible light and Reger light. The laser beam used was a 488 nm single line of a 5W argon laser with a beam diameter of 1.25 mm. Visible light was used by using a fluorescent chemical lamp with a sharp cut filter Y-43 (manufactured by Toshiba) to cut out ultraviolet light. After exposing the dried film to light using each light source, the uncured portion was eluted with ethanol, and the presence or absence of curing was determined by staining with a methyl blue/ethanol solution. Sensitivity was measured by the minimum irradiation energy required to photocure the coating. In the case of laser exposure, the sensitivity was defined as the irradiation energy required to obtain the same cured diameter as the beam diameter. The smaller the numerical value, the higher the sensitivity of the photosensitive resin composition to light, which indicates that the effect of the photopolymerization initiator or photopolymerization accelerator is excellent.
【表】【table】
【表】【table】
【表】
実施例38〜45
光重合促進剤として芳香族第3級アミン類およ
びチオキサントン類を使用して実施例1〜37と同
様にして光重性樹脂組成物を調製しその感度を測
定した。その結果を表4に示した。[Table] Examples 38 to 45 Photopolymerized resin compositions were prepared in the same manner as Examples 1 to 37 using aromatic tertiary amines and thioxanthone as photopolymerization accelerators, and their sensitivities were measured. . The results are shown in Table 4.
【表】【table】
【表】
実施例 46〜73
ペンタエリスリトールトリアクリレート100部、
ポリ−N−ビニルピロリドン100部に表5の光重
合開始剤及び光重合促進剤を混合して光重合性樹
脂組成物をえた。[Table] Examples 46 to 73 100 parts of pentaerythritol triacrylate,
A photopolymerizable resin composition was obtained by mixing 100 parts of poly-N-vinylpyrrolidone with the photopolymerization initiator and photopolymerization accelerator shown in Table 5.
【表】【table】
【表】【table】
【表】
実施例 74〜76
表2における色素番号42の化合物6部、2,4
−ジイソプロピルチオキサントン8部、p−ジメ
チルアミノ安息香酸8部、ポリエチレンオキサイ
ド(バインダー)100部及び下記の表6に示され
る光重合性樹脂100部から光重合性樹脂組成物を
得、これについて実施例1〜37におけるのと同様
にして感度(可視光による)を測定した。その結
果を表6に示した。[Table] Examples 74-76 6 parts of compound of dye number 42 in Table 2, 2,4
- A photopolymerizable resin composition was obtained from 8 parts of diisopropylthioxanthone, 8 parts of p-dimethylaminobenzoic acid, 100 parts of polyethylene oxide (binder), and 100 parts of the photopolymerizable resin shown in Table 6 below, and this was used in Examples Sensitivity (by visible light) was measured in the same manner as in Nos. 1 to 37. The results are shown in Table 6.
Claims (1)
子又はメチル基を、R2は水素原子、塩素原子、
メチル基又はメトキシ基を、R3はC1〜4のアルキ
ル基;炭素数3乃至4のアルコキシアルキル基;
ヒドロキシエチル基;アセチル基;プロピオニル
基;メチル基、プロピル基、カルボエトキシ基で
置換していてもよいベンゾイル基を表わす。Zは
酸素原子又は硫黄原子を表わす。但し式(1)は式
(1a)及び式(1b)の異性体からなる混合物であ
る) で表わされる化合物又は式(2) (式(2)においてR4はC1〜8のアルキル基;1乃至
2個の酸素原子で中断されていてもよいC4〜7のア
ルキル基;水酸基で置換されたエチル基又はプロ
ピル基;N,N−ジメチルアミノプロピル基;塩
素原子、ブチル基で置換されていてもよいフエニ
ル基を、R5は水素原子、メチル基、メトキシ基、
エトキシ基、ジメチルアミノ基又はジエチルアミ
ノ基を各々表わす。又Xは水素原子又は塩素原子
を、Yは酸素原子又は硫黄原子を表わす。) で表わされる化合物並びに少なくとも1個のエチ
レン性不飽和二重結合を有する化合物を含有する
ことを特徴とする光重合性樹脂組成物。 2 脂肪族又は芳香族第3級アミン類;N−フエ
ニルグリシン類;フエノキシ酢酸類;チオフエノ
キシ酢酸類;芳香族第3級アミン類及びチオキサ
ントン類から選ばれる化合物を含有することを特
徴とする特許請求の範囲第1項記載の組成物。[Claims] 1 Formula (1) (In formulas (1a) and (1b), R 1 is a hydrogen atom, a chlorine atom, or a methyl group, R 2 is a hydrogen atom, a chlorine atom,
a methyl group or a methoxy group; R 3 is a C 1-4 alkyl group; an alkoxyalkyl group having 3 to 4 carbon atoms;
Hydroxyethyl group; Acetyl group; Propionyl group; Represents a benzoyl group which may be substituted with a methyl group, propyl group, or carboethoxy group. Z represents an oxygen atom or a sulfur atom. However, formula (1) is a mixture consisting of isomers of formula (1a) and formula (1b)) or formula (2) (In formula (2), R 4 is a C 1-8 alkyl group; a C 4-7 alkyl group which may be interrupted by 1 to 2 oxygen atoms; an ethyl group or a propyl group substituted with a hydroxyl group; N,N-dimethylaminopropyl group; chlorine atom, phenyl group which may be substituted with butyl group, R 5 is hydrogen atom, methyl group, methoxy group,
Each represents an ethoxy group, a dimethylamino group, or a diethylamino group. Further, X represents a hydrogen atom or a chlorine atom, and Y represents an oxygen atom or a sulfur atom. ) and a compound having at least one ethylenically unsaturated double bond. 2. A patent characterized by containing a compound selected from aliphatic or aromatic tertiary amines; N-phenylglycines; phenoxyacetic acids; thiophenoxyacetic acids; aromatic tertiary amines and thioxanthones A composition according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7662384A JPS60221403A (en) | 1984-04-18 | 1984-04-18 | Polymerizable resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7662384A JPS60221403A (en) | 1984-04-18 | 1984-04-18 | Polymerizable resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60221403A JPS60221403A (en) | 1985-11-06 |
| JPH0354961B2 true JPH0354961B2 (en) | 1991-08-21 |
Family
ID=13610478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7662384A Granted JPS60221403A (en) | 1984-04-18 | 1984-04-18 | Polymerizable resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60221403A (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6231844A (en) * | 1985-08-01 | 1987-02-10 | Nippon Paint Co Ltd | Lithographic plate material |
| GB2189496B (en) * | 1986-04-23 | 1989-11-29 | Hitachi Chemical Co Ltd | Photopolymerizable composition |
| JPH0797213B2 (en) * | 1986-11-22 | 1995-10-18 | 日本油脂株式会社 | Photopolymerization initiator composition |
| JPS63144342A (en) * | 1986-12-09 | 1988-06-16 | Nippon Oil & Fats Co Ltd | Dry film photoresist |
| JPH02157761A (en) * | 1988-12-10 | 1990-06-18 | Toyobo Co Ltd | Photopolymerizable composition |
| JP3141517B2 (en) | 1992-05-14 | 2001-03-05 | ブラザー工業株式会社 | Photocurable composition |
| US6114092A (en) * | 1997-09-29 | 2000-09-05 | Kansai Paint Co., Ltd. | Photosensitive resin compositions for photoresist |
| US7410746B2 (en) | 2002-03-29 | 2008-08-12 | Dai Nippon Printing Co., Ltd. | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition |
| CN100406461C (en) | 2003-04-30 | 2008-07-30 | 华东理工大学 | Sulfur-containing heterocyclic naphthoimide compounds and their application in tumor cells |
| JP5034269B2 (en) | 2005-03-31 | 2012-09-26 | 大日本印刷株式会社 | Pattern forming material and polyimide precursor resin composition |
| WO2013075980A1 (en) * | 2011-11-23 | 2013-05-30 | Sicpa Holding Sa | Polycyclic aromatic compounds containing an s atom or s(=0)2 group and their use as dyes |
-
1984
- 1984-04-18 JP JP7662384A patent/JPS60221403A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60221403A (en) | 1985-11-06 |
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